JP5723612B2 - Plate member support device - Google Patents

Plate member support device Download PDF

Info

Publication number
JP5723612B2
JP5723612B2 JP2011015988A JP2011015988A JP5723612B2 JP 5723612 B2 JP5723612 B2 JP 5723612B2 JP 2011015988 A JP2011015988 A JP 2011015988A JP 2011015988 A JP2011015988 A JP 2011015988A JP 5723612 B2 JP5723612 B2 JP 5723612B2
Authority
JP
Japan
Prior art keywords
wafer
plate
mounting surface
guide
guide means
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2011015988A
Other languages
Japanese (ja)
Other versions
JP2012156418A (en
Inventor
幹 中田
幹 中田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lintec Corp
Original Assignee
Lintec Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lintec Corp filed Critical Lintec Corp
Priority to JP2011015988A priority Critical patent/JP5723612B2/en
Publication of JP2012156418A publication Critical patent/JP2012156418A/en
Application granted granted Critical
Publication of JP5723612B2 publication Critical patent/JP5723612B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Description

本発明は、板状部材の支持装置に係り、更に詳しくは、板状部材を精度良く位置決めして支持することができる板状部材の支持装置に関する。   The present invention relates to a plate-shaped member support device, and more particularly to a plate-shaped member support device capable of positioning and supporting a plate-shaped member with high accuracy.

従来より、半導体ウエハ(以下、単に「ウエハ」と称する場合がある)等の板状部材を支持する支持装置が広く利用されるに至っており、かかる支持装置としては、例えば、特許文献1に開示されている。特許文献1の支持装置は、ウエハを支持可能な3本のアームを備え、このアームの先端側にウエハWが載置される受部がそれぞれ設けられている。各受部には、ウエハが載置される面から鉛直方向に起立する突起が設けられ、この突起を介してウエハの面方向の移動が規制されるようになっている。   Conventionally, a support device for supporting a plate-like member such as a semiconductor wafer (hereinafter sometimes simply referred to as “wafer”) has been widely used. Such a support device is disclosed in, for example, Patent Document 1. Has been. The support device of Patent Document 1 includes three arms that can support a wafer, and a receiving portion on which the wafer W is placed is provided on the tip side of the arms. Each receiving portion is provided with a protrusion that stands in the vertical direction from the surface on which the wafer is placed, and the movement of the wafer in the surface direction is regulated via this protrusion.

ここで、図2に示されるように、ウエハWは、その外縁の断面形状が円弧状に形成される。ウエハWは、裏面研削等の所定の処理を施すために、基材シートBSと、この基材シートBSの一方の面に設けられた接着剤層ADとを備えた接着シートSが回路面(同図中下面)側に貼付される。接着シートSは、前記所定の処理が行われる際に、研削粉や冷却水等が侵入することを防止するために、ウエハWの外縁の円弧状部に回り込むように貼付される。このような貼付は、ウエハWの外縁からはみ出す大きさの接着シートSを貼付した後、ウエハWにおける円弧部の接線方向に切断刃を傾けて当該接着シートSを切断する。   Here, as shown in FIG. 2, the wafer W has an outer edge formed in an arc shape. The wafer W has an adhesive sheet S including a base sheet BS and an adhesive layer AD provided on one surface of the base sheet BS in order to perform a predetermined process such as back grinding. Affixed to the lower surface side of the figure. The adhesive sheet S is affixed so as to wrap around the arc-shaped portion of the outer edge of the wafer W in order to prevent the grinding powder, cooling water and the like from entering when the predetermined processing is performed. In such sticking, an adhesive sheet S having a size protruding from the outer edge of the wafer W is pasted, and then the adhesive sheet S is cut by inclining a cutting blade in the tangential direction of the arc portion of the wafer W.

特開2000−21956号公報JP 2000-211956 A

しかしながら、特許文献1にあっては、支持するウエハの位置の精度向上を図るべく突起とウエハとの間の隙間を小さくすると、支持装置に搬送されるウエハに位置的なずれが生じていた場合、ウエハが突起に乗り上げて傾いた状態になり易くなる等、却ってウエハ位置の精度が低下する、という不都合がある。   However, in Patent Document 1, if the gap between the protrusion and the wafer is reduced in order to improve the accuracy of the position of the wafer to be supported, the wafer transferred to the support device is displaced in position. However, there is a disadvantage that the accuracy of the wafer position is rather lowered, for example, the wafer is likely to be tilted by riding on the protrusion.

ところで、図2に示されるように、ウエハWに貼付された接着シートSを切断すると、接着シートSの接着剤層ADがウエハWの外縁側に表出することとなる。このため、特許文献1の突起にあっては、アームの幅に対応する領域でウエハW外縁に線状に接触するので、突起と接着剤層ADとが接着し易くなり、支持装置からウエハWを搬出できなくなったり、搬出するときにウエハWを破損させてしまう、という不都合を生じる。   By the way, as shown in FIG. 2, when the adhesive sheet S attached to the wafer W is cut, the adhesive layer AD of the adhesive sheet S is exposed to the outer edge side of the wafer W. For this reason, in the protrusions of Patent Document 1, the protrusions and the adhesive layer AD are easily bonded to each other in a region corresponding to the width of the arm, so that the protrusions and the adhesive layer AD are easily bonded to each other. Cannot be unloaded, or the wafer W is damaged when unloaded.

また、前記搬送装置においてウエハを挟み込むチャックに接着剤層ADの接着剤が付着し、ひいては、チャックとウエハWとが接着した状態になる場合がある。これにより、ウエハWを搬送して載置する際に、ウエハWをチャックから切り離すことができず、搬送先のウエハWの載置位置がずれてしまったり、チャックとウエハWとが接着したまま搬送装置が次の動作に移行し、ウエハWが予期しない位置に落下して破損してしまったりする、という不都合を招来する。   In addition, the adhesive of the adhesive layer AD may adhere to the chuck that sandwiches the wafer in the transfer device, and as a result, the chuck and the wafer W may be in a bonded state. As a result, when the wafer W is transported and placed, the wafer W cannot be separated from the chuck, and the placement position of the transport destination wafer W is shifted, or the chuck and the wafer W remain bonded. The transfer device shifts to the next operation, causing a disadvantage that the wafer W falls to an unexpected position and is damaged.

[発明の目的]
本発明の目的は、板状部材を精度良く支持することができる板状部材の支持装置を提供することにある。
また、本発明の他の目的は、板状部材に貼付された接着シートの接着剤がガイド手段に付着することを抑制することができる板状部材の支持装置を提供することにある。
[Object of invention]
The objective of this invention is providing the support apparatus of the plate-shaped member which can support a plate-shaped member with a sufficient precision.
Another object of the present invention is to provide a support device for a plate-like member that can prevent the adhesive of the adhesive sheet affixed to the plate-like member from adhering to the guide means.

前記目的を達成するため、本発明は、状部材の支持装置であって、
記板状部材が載置される載置面を有する載置手段と、当該載置面に載置される板状部材の外方に位置するとともに、前記載置面から離れる方向に突設したガイド手段とを備え、
前記載置手段は、前記載置面に形成された孔に接続される減圧手段及び加圧手段を含む吸着離脱手段を備え、前記孔を介して減圧手段で減圧することで、減圧された気体で前記載置面に接する板状部材を吸着支持可能に設けられるとともに、前記孔を介して加圧手段で加圧することで、加圧された気体を前記板状部材に吹き付けて当該板状部材を載置面から浮上可能に設けられ、
前記ガイド手段は、前記載置面から離れるに従って平面視で板状部材の中心から離れる方向に延びる傾斜する案内部を備え
前記孔を介して加圧手段で前記板状部材に吹き付ける気体の量を次第に少なくすることで、前記案内部により板状部材を滑り落として載置面に向かって板状部材の下降を案内す緩衝手段を有する、という構成を採っている。
In order to achieve the above object, the present invention is a support device for a plate- shaped member,
A mounting means having a mounting surface on which pre-Symbol plate member is placed, as well as positioned outside of the plate-like member to be placed on the mounting surface, projecting in a direction away from the mounting surface A guide means,
The placement means includes an adsorption / desorption means including a decompression means and a pressurization means connected to a hole formed in the placement surface, and the decompressed gas is decompressed by the decompression means through the hole. The plate-like member in contact with the mounting surface is provided so as to be capable of being adsorbed and supported, and the pressurized gas is blown onto the plate-like member by pressurizing the plate-like member through the hole. Can be levitated from the mounting surface,
The guide means includes an inclined guide portion that extends in a direction away from the center of the plate-like member in plan view as the distance from the placement surface increases .
By gradually reducing the amount of gas blown to the plate-like member by the pressurizing means through the hole, the plate-like member is slid down by the guide portion to guide the lowering of the plate-like member toward the mounting surface. It has a configuration of having a buffer means .

本発明において、前記ガイド手段は、平面視で載置面に載置される板状部材の中心方向に膨出する凸状部を備えた形状に設けられ、この凸状部は板状部材の外縁側に点接触可能に設けられる、という構成を採ってもよい。   In the present invention, the guide means is provided in a shape having a convex portion that bulges in the center direction of the plate-like member placed on the placement surface in a plan view, and the convex portion is provided on the plate-like member. You may take the structure of being provided in the outer edge side so that a point contact is possible.

また、前記ガイド手段の先端は、前記板状部材を搬送する搬送装置が板状部材を支持及びその支持を解除するときに、当該板状部材より高い位置に設定される、という構成も好ましくは採用される。   Also preferably, the tip of the guide means is set at a higher position than the plate-like member when the conveying device that conveys the plate-like member supports the plate-like member and releases the support. Adopted.

更に、前記載置面は、前記板状部材の外縁に隣接する所定幅領域だけに当接可能に設けられる、という構成を採ることができる。   Furthermore, the above-mentioned mounting surface can take the structure that it can be contact | abutted only to the predetermined width area | region adjacent to the outer edge of the said plate-shaped member.

本発明によれば、案内部が前述した方向に延びるので、ガイド手段の上方では案内部と板状部材外縁との隙間を大きく設定でき、板状部材が搬送されてくる位置に多少のずれが生じたとしても、ガイド手段の内側に板状部材を容易に入り込ませることが可能となる。しかも、ガイド手段の下方における案内部と板状部材外縁との隙間が小さくなるように設定したり殆どなくしたりすることにより、案内部の上方から搬入された板状部材を載置面上の所定の位置に案内し、当該板状部材を精度良く位置決めして支持することが可能となる。   According to the present invention, since the guide portion extends in the above-described direction, a large gap can be set between the guide portion and the outer edge of the plate-like member above the guide means, and there is a slight shift in the position where the plate-like member is conveyed. Even if it occurs, the plate-like member can easily enter inside the guide means. In addition, by setting the gap between the guide portion and the outer edge of the plate-like member below the guide means to be small, the plate-like member carried from the upper side of the guide portion is set on the placement surface. Thus, it is possible to accurately position and support the plate member.

また、板状部材の外縁側に点接触可能な凸状部を有するので、当該外縁側とガイド手段との接触領域をなるべく小さくして、板状部材とガイド手段とが接着することを防止することができる。これにより、板状部材の搬出時に、接着に起因する板状部材の損傷を回避することが可能となる。   In addition, since the convex portion capable of point contact is provided on the outer edge side of the plate-like member, the contact area between the outer edge side and the guide means is made as small as possible to prevent the plate-like member and the guide means from adhering. be able to. Thereby, at the time of carrying out a plate-shaped member, it becomes possible to avoid the damage of the plate-shaped member resulting from adhesion | attachment.

更に、ガイド手段の高さが前述のように設定されるので、仮に、搬送装置のチャックと板状部材とが接着していても、搬入時のチャックの移動に伴って板状部材がガイド手段の外側に移動したり、板状部材がガイド手段に乗り上げて傾いた状態となったりすることを確実に防止することが可能となる。これにより、搬入時に載置面に載置される予定の板状部材がチャックと接着したままになることを回避でき、当該板状部材が破損することを防止することが可能となる。   Further, since the height of the guide means is set as described above, even if the chuck of the transport device and the plate-like member are bonded, the plate-like member is guided by the movement of the chuck at the time of loading. It is possible to reliably prevent the plate-like member from moving to the outside or being inclined when riding on the guide means. Thereby, it can avoid that the plate-shaped member scheduled to be mounted on the mounting surface at the time of carry-in remains adhered to the chuck, and it is possible to prevent the plate-shaped member from being damaged.

実施形態に係る支持装置の概略平面図。The schematic plan view of the support apparatus which concerns on embodiment. 前記支持装置の部分概略正面図。The partial schematic front view of the said support apparatus. 変形例に係る支持装置の概略平面図。The schematic plan view of the support apparatus which concerns on a modification. 図3の支持装置の部分概略正面図。FIG. 4 is a partial schematic front view of the support device of FIG. 3. 他の変形例に係るガイド手段の概略平面図。The schematic plan view of the guide means which concerns on another modification.

以下、本発明の実施の形態について図面を参照しながら説明する。
なお、本明細書において、特に明示しない限り、「上」、「下」は、図2を基準として用いる。
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
In this specification, “upper” and “lower” are used with reference to FIG. 2 unless otherwise specified.

図1及び図2において、支持装置10は、板状部材としてのウエハWが載置される載置手段11と、この載置手段11に載置されたウエハWの周方向約120°間隔毎に3体設けられたガイド手段12とを備えて構成されている。   1 and 2, the support device 10 includes a mounting unit 11 on which a wafer W as a plate-like member is mounted, and an interval of about 120 ° in the circumferential direction of the wafer W mounted on the mounting unit 11. And three guide means 12 are provided.

前記ウエハWは、平面視略円形をなし、図2中上面W1が回路面とされ、同図中下面W2の外縁側にリング状の凸部W3を有する形状に設けられている。ウエハWの外縁形状は、径方向に断面視したときに円弧状に形成されている。ウエハWの上面W1には、前述と同様の基材シートBS及び接着剤層ADを含む接着シートSが貼付されている。この接着シートSの貼付及びその後の切断も前述のように行われ、接着シートSがウエハWの外縁に達する位置まで貼付されて接着剤層ADがウエハWの外縁側に表出している。   The wafer W is substantially circular in plan view, and the upper surface W1 in FIG. 2 is a circuit surface, and the wafer W is provided with a ring-shaped convex portion W3 on the outer edge side of the lower surface W2. The outer edge shape of the wafer W is formed in an arc shape when viewed in cross section in the radial direction. On the upper surface W1 of the wafer W, an adhesive sheet S including the base material sheet BS and the adhesive layer AD similar to the above is attached. The adhesive sheet S is pasted and then cut as described above, and the adhesive sheet S is pasted to a position where it reaches the outer edge of the wafer W, and the adhesive layer AD is exposed on the outer edge side of the wafer W.

前記載置手段11は、ベース15と、このベース15上に設けられて平面視でウエハWと略同一サイズの円形に形成されるとともに、上方を開放する円筒容器状のテーブル16と、このテーブル16に設けられる吸着離脱手段17とを備えている。テーブル16の上端面は、ウエハWが載置される載置面19とされ、この載置面19は、円形の閉ループ状に形成されてウエハWの外縁に隣接する所定幅領域だけに当接して支持可能となっている。   The placing means 11 includes a base 15, a cylindrical container-like table 16 that is provided on the base 15 and is formed in a circular shape that is substantially the same size as the wafer W in a plan view, and the table is open. 16 is provided with an adsorption / desorption means 17 provided at 16. The upper end surface of the table 16 is a mounting surface 19 on which the wafer W is mounted. The mounting surface 19 is formed in a circular closed loop shape and contacts only a predetermined width region adjacent to the outer edge of the wafer W. Can be supported.

前記吸着離脱手段17は、載置面19上であってテーブル16の周方向所定間隔毎に形成された孔20と、これらの孔20からテーブル11内を延びる通路21と、この通路21に接続される図示しない減圧手段としての減圧ポンプ及び加圧手段としての加圧ポンプとを備えている。吸着離脱手段17は、図示しない切替弁を介して減圧ポンプの減圧力を通路21及び孔20を介して載置面19に接するウエハWに付与することで、当該ウエハWを吸着支持可能に設けられ、同様に加圧ポンプで加圧された気体をウエハWに付与することで、当該ウエハWを載置面19から浮上させることが可能に設けられている。   The suction / removal means 17 is provided with holes 20 formed on the mounting surface 19 at predetermined intervals in the circumferential direction of the table 16, passages 21 extending from the holes 20 into the table 11, and connected to the passages 21. A decompression pump as a decompression means (not shown) and a pressurization pump as a pressurization means are provided. The adsorption / desorption means 17 is provided so as to be capable of adsorbing and supporting the wafer W by applying the depressurizing force of the depressurization pump to the wafer W in contact with the mounting surface 19 via the passage 21 and the hole 20 via a switching valve (not shown). Similarly, by applying a gas pressurized by a pressure pump to the wafer W, the wafer W can be floated from the mounting surface 19.

前記各ガイド手段12は、テーブル16の外周面にそれぞれ隣接するよう設けられ、載置面19に載置されるウエハWの外方にそれぞれ位置するとともに、ベース15上から立設して載置面19から離れる方向すなわち上方向にそれぞれ突設している。各ガイド手段12は、テーブル16側の端部に案内部24をそれぞれ備え、当該案内部24は、上方に向かうに従って平面視でウエハWの中心から離れる方向に延びるように傾斜している。各ガイド手段12の案内部24下端では、載置面19上に載置されたウエハWの外縁3箇所位置に接して当該ウエハWの面方向の移動が規制される。一方、各ガイド手段12の案内部24上端側では、ウエハW外縁との間に隙間を設けることができ、ウエハWが多少の位置ずれを起こして搬送されてきたとしても、各ガイド手段12の間にウエハWを搬送し得るようになっている。案内部24は、平面視で、載置面19上のウエハW中心方向に円弧状に膨出する凸状部25を備えた形状に設けられ、これにより、凸状部25がウエハWの外縁側に点接触可能となる。ここで、ガイド手段12の先端(上端)は、後述する搬送装置がウエハWを支持及び当該支持を解除するときに、ウエハWの上面W1より高い位置に設定されている。   Each guide means 12 is provided so as to be adjacent to the outer peripheral surface of the table 16, located on the outside of the wafer W placed on the placement surface 19, and placed upright on the base 15. It protrudes in a direction away from the surface 19, that is, upward. Each guide means 12 includes a guide portion 24 at an end portion on the table 16 side, and the guide portion 24 is inclined so as to extend in a direction away from the center of the wafer W in plan view as it goes upward. At the lower end of the guide portion 24 of each guide means 12, the movement in the surface direction of the wafer W is restricted in contact with the three positions of the outer edge of the wafer W placed on the placement surface 19. On the other hand, on the upper end side of the guide portion 24 of each guide means 12, a gap can be provided between the outer edge of the wafer W, and even if the wafer W is transported with some positional deviation, The wafer W can be transferred between them. The guide portion 24 is provided in a shape having a convex portion 25 that bulges in an arc shape toward the center of the wafer W on the mounting surface 19 in a plan view. Point contact is possible on the edge side. Here, the front end (upper end) of the guide unit 12 is set to a position higher than the upper surface W1 of the wafer W when a transfer device described later supports the wafer W and releases the support.

支持装置10へのウエハWの搬送は、図1及び図2中二点鎖線で示される搬送装置Bを用いて行われる。搬送装置Bは、二股状に分岐したアーム部材B1と、このアーム部材B1の下面側に設けられ、同図中左右方向に移動可能に設けられたチャックB2とを備えている。アーム部材B1は、図示しない多関節ロボットのアーム等により支持される。チャックB2は、ウエハWの外縁側に対応する位置に設けられ、当該ウエハWを図1中左右方向から挟み込んでウエハWを把持可能に設けられている。   The transfer of the wafer W to the support device 10 is performed using a transfer device B indicated by a two-dot chain line in FIGS. The conveying device B includes an arm member B1 that is bifurcated and a chuck B2 that is provided on the lower surface side of the arm member B1 and is movable in the left-right direction in FIG. The arm member B1 is supported by an arm or the like of an articulated robot (not shown). The chuck B2 is provided at a position corresponding to the outer edge side of the wafer W, and is provided so as to be able to hold the wafer W by sandwiching the wafer W from the left and right directions in FIG.

次に、本実施形態におけるウエハWの支持方法について説明する。   Next, a method for supporting the wafer W in the present embodiment will be described.

図示しない多関節ロボットのアーム等の作動によりアーム部材B1をテーブル16の上方に移動させ、図2に示されるように、チャックB2で把持されたウエハWを各ガイド手段12の内側に配置させる。このとき、平面視でウエハWと載置面19との位置が大まかに一致するようにし、また、図2に示されるように、ガイド手段12上端よりウエハW上面W1が低くなり、ウエハWの凸部W3下面と載置面19との間に隙間が空いた状態とする。次いで、図示しない切替弁を介して加圧ポンプで加圧された気体をウエハWに付与する。その後、チャックB2によるウエハWの支持を解除させると、自重によりウエハWが落下しようとするが、気体の吹き付けによってウエハWが上方に付勢され、ウエハWと載置面19との間に隙間が生じるように、それらを離脱した状態が保たれる。   The arm member B1 is moved above the table 16 by the operation of an arm of a multi-joint robot (not shown), and the wafer W held by the chuck B2 is placed inside each guide means 12 as shown in FIG. At this time, the positions of the wafer W and the mounting surface 19 are roughly coincident in plan view, and the upper surface W1 of the wafer W is lower than the upper end of the guide means 12 as shown in FIG. It is assumed that there is a gap between the lower surface of the convex portion W3 and the placement surface 19. Next, a gas pressurized by a pressure pump is applied to the wafer W through a switching valve (not shown). Thereafter, when the support of the wafer W by the chuck B <b> 2 is released, the wafer W tries to fall due to its own weight, but the wafer W is biased upward by the blowing of gas, and a gap is formed between the wafer W and the mounting surface 19. So that they are removed.

その後、図示しない電空レギュレータ等の緩衝手段を作動し孔20から吹き付ける気体の量を次第に少なくすることにより、ウエハWをゆっくりと下降させる。このとき、各ガイド手段12の案内部24にウエハW外縁が点接触して、当該ウエハWがテーブル16上から脱落することなく、傾斜する案内部24によりウエハWの下降が案内される。そして、載置面19上にウエハWが接触して載置され、この状態で、各ガイド手段12の下端側でウエハWが面方向にずれないように位置決めされる。その後、図示しない切替弁を介して減圧ポンプの減圧力を孔20を介してウエハWに付与することにより、載置面19上でウエハWの外縁側が吸着支持される。   Thereafter, the wafer W is slowly lowered by operating a buffer means such as an electropneumatic regulator (not shown) to gradually reduce the amount of gas blown from the hole 20. At this time, the outer edge of the wafer W is brought into point contact with the guide portions 24 of the respective guide means 12, and the wafer W is guided by the inclined guide portions 24 without dropping from the table 16. Then, the wafer W is placed in contact with the placement surface 19, and in this state, the wafer W is positioned on the lower end side of each guide means 12 so as not to be displaced in the surface direction. Thereafter, the outer edge side of the wafer W is adsorbed and supported on the mounting surface 19 by applying the depressurizing force of the depressurizing pump to the wafer W through the hole 20 via a switching valve (not shown).

接着シートSの剥離等の工程を終えた後、テーブル16上のウエハWを搬出する場合、吸着を解除し、孔20から気体をウエハWに吹き付けて載置面19から離脱させた後、搬送装置BのチャックB2によりウエハWを把持して後工程に搬送される。ウエハWの載置面19からの離脱時も、ウエハWの外方に各ガイド手段12が位置するので、当該ガイド手段12によりウエハWがテーブル16上から脱落することを防止できる。また、案内部24が傾斜しているので、ウエハWがガイド部材12に接触しないように搬出可能となる。   When the wafer W on the table 16 is unloaded after the steps such as peeling of the adhesive sheet S are finished, the suction is released, the gas is blown from the hole 20 to the wafer W, and then the wafer W is detached from the mounting surface 19. The wafer W is gripped by the chuck B2 of the apparatus B and transferred to the subsequent process. Even when the wafer W is detached from the mounting surface 19, each guide means 12 is located outside the wafer W, so that the wafer W can be prevented from dropping from the table 16 by the guide means 12. Further, since the guide portion 24 is inclined, the wafer W can be unloaded so as not to contact the guide member 12.

従って、このような実施形態によれば、載置面19上にウエハWを載置するときに、案内部24上で搬入されたウエハWを滑り落として載置面19に向かって案内でき、且つ、案内部24によって載置面19に載置されたウエハWの面方向の移動を規制することが可能となる。これにより、搬送装置BによるウエハWの搬送されてくる位置が多少ずれていたとしても、載置面19上にウエハWを精度良く位置決めして支持することができる。また、凸状部25によってウエハW外縁側とガイド手段12とが点接触するので、ガイド手段12とウエハWとが接着した状態となることを抑制でき、それらが接着してウエハWが搬出不能となることを回避することができる。更に、チャックB2によるウエハWの支持を解除するときに、ガイド手段12上端よりウエハW上面W1が低くなるので、チャックB2とウエハW外縁とが接着しても、ガイド手段12によって、チャックB2の移動方向にウエハWが移動することを規制して、その接着を解除することが可能となる。   Therefore, according to such an embodiment, when the wafer W is placed on the placement surface 19, the wafer W loaded on the guide portion 24 can be slid down and guided toward the placement surface 19, In addition, the movement of the wafer W placed on the placement surface 19 in the surface direction can be restricted by the guide unit 24. Thereby, even if the position where the wafer W is transferred by the transfer device B is slightly shifted, the wafer W can be accurately positioned and supported on the mounting surface 19. Further, since the outer edge side of the wafer W and the guide means 12 are in point contact with each other by the convex portion 25, it is possible to prevent the guide means 12 and the wafer W from being bonded, and the wafer W cannot be unloaded by bonding them. Can be avoided. Further, when the support of the wafer W by the chuck B2 is released, the upper surface W1 of the wafer W becomes lower than the upper end of the guide means 12, so that even if the chuck B2 and the outer edge of the wafer W are bonded, the guide means 12 It is possible to restrict the movement of the wafer W in the movement direction and release the adhesion.

以上のように、本発明を実施するための最良の構成、方法等は、前記記載で開示されているが、本発明は、これに限定されるものではない。
すなわち、本発明は、主に特定の実施形態に関して特に図示、説明されているが、本発明の技術的思想及び目的の範囲から逸脱することなく、以上説明した実施形態に対し、形状、位置若しくは配置等に関し、必要に応じて当業者が様々な変更を加えることができるものである。
従って、上記に開示した形状などを限定した記載は、本発明の理解を容易にするために例示的に記載したものであり、本発明を限定するものではないから、それらの形状などの限定の一部若しくは全部の限定を外した部材の名称での記載は、本発明に含まれるものである。
As described above, the best configuration, method and the like for carrying out the present invention have been disclosed in the above description, but the present invention is not limited to this.
In other words, the present invention has been illustrated and described mainly with respect to specific embodiments, but without departing from the scope of the technical idea and object of the present invention, the shape, position, or With respect to the arrangement and the like, those skilled in the art can make various changes as necessary.
Therefore, the description limited to the shape disclosed above is an example for easy understanding of the present invention, and does not limit the present invention. The description by the name of the member which remove | excluded one part or all part is included in this invention.

前記載置手段11は、種々の設計変更が可能であり、例えば、図3及び図4に示される構成としてもよい。同図の載置手段30は、平面視三叉状のベース31と、ガイド手段12の上面に載置面32を形成する支持部33とを備えている。ベース31の平面視中央部には駆動機器としての回転モータ35が設けられている。載置面32には、接着シートSを下向きとしてウエハWが載置される。ウエハWの外縁側には、カメラからなる検出手段36が設けられ、回転モータ35の作動によるウエハWの回転中に、ウエハWの外縁を撮像することで、Vノッチ等の位置を検出可能となっている。従って、検出手段36の結果に基づき回転モータ35の作動を制御することで、ウエハWのアライメントが行えるようになる。   The placement unit 11 can be variously modified, and may be configured as shown in FIGS. 3 and 4, for example. The mounting means 30 shown in the figure includes a base 31 having a tridental shape in plan view and a support portion 33 that forms a mounting surface 32 on the upper surface of the guide means 12. A rotation motor 35 as a driving device is provided at the center of the base 31 in plan view. On the mounting surface 32, the wafer W is mounted with the adhesive sheet S facing downward. On the outer edge side of the wafer W, a detection means 36 comprising a camera is provided, and the position of the V notch or the like can be detected by imaging the outer edge of the wafer W while the wafer W is rotating by the operation of the rotation motor 35. It has become. Therefore, the wafer W can be aligned by controlling the operation of the rotary motor 35 based on the result of the detection means 36.

更に、前記凸状部25は、ウエハWの外縁側と点接触可能な限りにおいて、図5に示されるように、ウエハWに向かって尖った形状に膨出するように形成してもよい。   Further, the convex portion 25 may be formed so as to bulge out toward the wafer W as shown in FIG. 5 as long as it can make point contact with the outer edge side of the wafer W.

また、前記実施形態における駆動機器は、回動モータ、直動モータ、リニアモータ、単軸ロボット、多関節ロボット等の電動機器、エアシリンダ、油圧シリンダ、ロッドレスシリンダ及びロータリシリンダ等のアクチュエータ等を採用することができる上、それらを直接的又は間接的に組み合せたものを採用することもできる(実施形態で例示したものと重複するものもある)。   The drive device in the embodiment includes an electric device such as a rotation motor, a linear motion motor, a linear motor, a single-axis robot, and an articulated robot, an actuator such as an air cylinder, a hydraulic cylinder, a rodless cylinder, and a rotary cylinder. In addition to these, a combination of them directly or indirectly may be employed (some of them overlap with those exemplified in the embodiment).

更に、本発明において、板状部材は、ガラス板、鋼板、または、樹脂板等、その他の被着体も対象とすることができ、半導体ウエハは、シリコン半導体ウエハや化合物半導体ウエハであってもよい。   Further, in the present invention, the plate-like member can be a target of other adherends such as a glass plate, a steel plate, or a resin plate, and the semiconductor wafer may be a silicon semiconductor wafer or a compound semiconductor wafer. Good.

10 搬送装置
11 載置手段
12 ガイド手段
19 載置面
24 案内部
25 凸状部
AD 接着剤層
BS 基材シート
S 接着シート
W 半導体ウエハ(板状部材)
DESCRIPTION OF SYMBOLS 10 Conveyance apparatus 11 Mounting means 12 Guide means 19 Mounting surface 24 Guide part 25 Convex part AD Adhesive layer BS Base material sheet S Adhesive sheet W Semiconductor wafer (plate-shaped member)

Claims (1)

状部材の支持装置であって、
記板状部材が載置される載置面を有する載置手段と、当該載置面に載置される板状部材の外方に位置するとともに、前記載置面から離れる方向に突設したガイド手段とを備え、
前記載置手段は、前記載置面に形成された孔に接続される減圧手段及び加圧手段を含む吸着離脱手段を備え、前記孔を介して減圧手段で減圧することで、減圧された気体で前記載置面に接する板状部材を吸着支持可能に設けられるとともに、前記孔を介して加圧手段で加圧することで、加圧された気体を前記板状部材に吹き付けて当該板状部材を載置面から浮上可能に設けられ、
前記ガイド手段は、前記載置面から離れるに従って平面視で板状部材の中心から離れる方向に延びる傾斜する案内部を備え
前記孔を介して加圧手段で前記板状部材に吹き付ける気体の量を次第に少なくすることで、前記案内部により板状部材を滑り落として載置面に向かって板状部材の下降を案内す緩衝手段を有することを特徴とする板状部材の支持装置。
A support device for a plate- shaped member,
A mounting means having a mounting surface on which pre-Symbol plate member is placed, as well as positioned outside of the plate-like member to be placed on the mounting surface, projecting in a direction away from the mounting surface A guide means,
The placement means includes an adsorption / desorption means including a decompression means and a pressurization means connected to a hole formed in the placement surface, and the decompressed gas is decompressed by the decompression means through the hole. The plate-like member in contact with the mounting surface is provided so as to be capable of being adsorbed and supported, and the pressurized gas is blown onto the plate-like member by pressurizing the plate-like member through the hole. Can be levitated from the mounting surface,
The guide means includes an inclined guide portion that extends in a direction away from the center of the plate-like member in plan view as the distance from the placement surface increases .
By gradually reducing the amount of gas blown to the plate-like member by the pressurizing means through the hole, the plate-like member is slid down by the guide portion to guide the lowering of the plate-like member toward the mounting surface. A plate-like member supporting apparatus comprising a buffering means .
JP2011015988A 2011-01-28 2011-01-28 Plate member support device Active JP5723612B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011015988A JP5723612B2 (en) 2011-01-28 2011-01-28 Plate member support device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011015988A JP5723612B2 (en) 2011-01-28 2011-01-28 Plate member support device

Publications (2)

Publication Number Publication Date
JP2012156418A JP2012156418A (en) 2012-08-16
JP5723612B2 true JP5723612B2 (en) 2015-05-27

Family

ID=46837809

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011015988A Active JP5723612B2 (en) 2011-01-28 2011-01-28 Plate member support device

Country Status (1)

Country Link
JP (1) JP5723612B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6366531B2 (en) * 2015-03-27 2018-08-01 三菱電機株式会社 Semiconductor wafer inspection apparatus and semiconductor wafer automatic inspection method
JP6402227B2 (en) * 2017-09-20 2018-10-10 株式会社東京精密 Wafer transfer device
JP7148373B2 (en) * 2018-11-20 2022-10-05 株式会社東京精密 Wafer delivery device

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01121932U (en) * 1988-02-15 1989-08-18
JPH05343506A (en) * 1992-06-11 1993-12-24 Toshiba Ceramics Co Ltd Chuck for wafer use
JPH06196543A (en) * 1992-12-24 1994-07-15 Sumitomo Metal Ind Ltd Sample carrier device
WO1995023428A2 (en) * 1994-02-23 1995-08-31 Applied Materials, Inc. Chemical vapor deposition chamber
JPH08335583A (en) * 1995-06-08 1996-12-17 Murata Mfg Co Ltd Wafer heater
JPH09148225A (en) * 1995-11-27 1997-06-06 Hitachi Ltd Wafer holder and apparatus for micromachining
US6205870B1 (en) * 1997-10-10 2001-03-27 Applied Komatsu Technology, Inc. Automated substrate processing systems and methods
JP3245833B2 (en) * 1999-07-08 2002-01-15 日本エー・エス・エム株式会社 Semiconductor substrate aligner apparatus and method
JP4502547B2 (en) * 2000-08-07 2010-07-14 日東電工株式会社 Method and apparatus for removing protective tape of semiconductor wafer
JP2002252273A (en) * 2001-02-26 2002-09-06 Rohm Co Ltd Film thickness measuring device and polishing device
JP2002313874A (en) * 2001-04-17 2002-10-25 Dainippon Screen Mfg Co Ltd Substrate support member, substrate retention mechanism using the same, substrate conveyance apparatus and method therefor, and substrate treatment apparatus and method therefor
JP4079679B2 (en) * 2002-04-24 2008-04-23 日東電工株式会社 Unnecessary semiconductor wafer removal method and apparatus
JP2004338849A (en) * 2003-05-14 2004-12-02 Olympus Corp Substrate positioning device
JP2004363452A (en) * 2003-06-06 2004-12-24 Tokyo Seimitsu Co Ltd Work positioning device
JP4750724B2 (en) * 2007-01-25 2011-08-17 東京応化工業株式会社 Overlay unit and bonding apparatus
JP2008300521A (en) * 2007-05-30 2008-12-11 Disco Abrasive Syst Ltd Semiconductor wafer and its processing method
JP4851415B2 (en) * 2007-10-10 2012-01-11 日東電工株式会社 Ultraviolet irradiation method and apparatus using the same
JP4797027B2 (en) * 2008-01-18 2011-10-19 信越ポリマー株式会社 Substrate body sticking apparatus and substrate body handling method
JP2010258170A (en) * 2009-04-23 2010-11-11 Tokyo Electron Ltd Substrate holding member, substrate transfer arm, and substrate carrier

Also Published As

Publication number Publication date
JP2012156418A (en) 2012-08-16

Similar Documents

Publication Publication Date Title
TWI512877B (en) Workpiece transport method and workpiece transport device
KR20150144713A (en) Conveyance apparatus
KR20110106814A (en) Adhesive tape joining method and adhesive tape joining apparatus
KR20130007585A (en) Substrate separation device, load lock device, substrate adhesion device and substrate separation method
JP2012216606A (en) Substrate transfer method and substrate transfer device
JP5723612B2 (en) Plate member support device
WO2020066285A1 (en) Wafer breaking device, inverting device, and conveyance system
JP4238669B2 (en) Expanding method and expanding apparatus
JP6762220B2 (en) Transfer mechanism of processing equipment
JP6386866B2 (en) Separation device and separation method
JP5329916B2 (en) Semiconductor wafer support
JP6420623B2 (en) Separation device and separation method
JP5261030B2 (en) Semiconductor wafer transfer method
JP4812660B2 (en) Substrate handling equipment and substrate handling method
JP5005904B2 (en) Transfer device and transfer method
JP4856593B2 (en) MOUNTING DEVICE AND MOUNTING METHOD
JP6177622B2 (en) Sheet sticking device and sheet sticking method
JP5551878B2 (en) Semiconductor wafer transfer device
JP6818576B2 (en) Sheet pasting device and pasting method
JP5093852B2 (en) Sheet sticking device and sticking method
JP5596579B2 (en) Plate member conveying device
JP6796952B2 (en) Sheet pasting device and pasting method
JP2009200390A (en) Probe card transfer apparatus
JP7002260B2 (en) Separation device and separation method
JP4913772B2 (en) Sheet sticking device and sticking method

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20131018

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20140709

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140729

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140929

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20150324

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20150330

R150 Certificate of patent or registration of utility model

Ref document number: 5723612

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250