JP2012054491A5 - - Google Patents

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Publication number
JP2012054491A5
JP2012054491A5 JP2010197648A JP2010197648A JP2012054491A5 JP 2012054491 A5 JP2012054491 A5 JP 2012054491A5 JP 2010197648 A JP2010197648 A JP 2010197648A JP 2010197648 A JP2010197648 A JP 2010197648A JP 2012054491 A5 JP2012054491 A5 JP 2012054491A5
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JP
Japan
Prior art keywords
vacuum processing
chamber
processing apparatus
gate valve
valve
Prior art date
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Application number
JP2010197648A
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English (en)
Japanese (ja)
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JP5685405B2 (ja
JP2012054491A (ja
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Priority to JP2010197648A priority Critical patent/JP5685405B2/ja
Priority claimed from JP2010197648A external-priority patent/JP5685405B2/ja
Publication of JP2012054491A publication Critical patent/JP2012054491A/ja
Publication of JP2012054491A5 publication Critical patent/JP2012054491A5/ja
Application granted granted Critical
Publication of JP5685405B2 publication Critical patent/JP5685405B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2010197648A 2010-09-03 2010-09-03 真空処理装置 Expired - Fee Related JP5685405B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010197648A JP5685405B2 (ja) 2010-09-03 2010-09-03 真空処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010197648A JP5685405B2 (ja) 2010-09-03 2010-09-03 真空処理装置

Publications (3)

Publication Number Publication Date
JP2012054491A JP2012054491A (ja) 2012-03-15
JP2012054491A5 true JP2012054491A5 (cg-RX-API-DMAC7.html) 2013-10-03
JP5685405B2 JP5685405B2 (ja) 2015-03-18

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ID=45907484

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010197648A Expired - Fee Related JP5685405B2 (ja) 2010-09-03 2010-09-03 真空処理装置

Country Status (1)

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JP (1) JP5685405B2 (cg-RX-API-DMAC7.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6960830B2 (ja) 2017-11-17 2021-11-05 株式会社日立ハイテク 真空処理装置および真空処理装置の運転方法
JP7580186B2 (ja) * 2019-07-26 2024-11-11 東京エレクトロン株式会社 基板処理装置
US12211674B2 (en) 2021-05-17 2025-01-28 Hitachi High-Tech Corporation Plasma processing apparatus

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0772340B2 (ja) * 1992-01-28 1995-08-02 スタンレー電気株式会社 真空蒸着装置
US6170428B1 (en) * 1996-07-15 2001-01-09 Applied Materials, Inc. Symmetric tunable inductively coupled HDP-CVD reactor
JP2001004505A (ja) * 1999-06-22 2001-01-12 Sumitomo Metal Ind Ltd ゲートバルブ，それを備える試料処理装置及び試料処理方法
JP4291499B2 (ja) * 2000-06-28 2009-07-08 パナソニック株式会社 真空処理装置
JP4606947B2 (ja) * 2005-03-16 2011-01-05 東京エレクトロン株式会社 リークレート測定方法並びにリークレート測定に用いるプログラムおよび記憶媒体
JP4079157B2 (ja) * 2005-04-12 2008-04-23 東京エレクトロン株式会社 ゲートバルブ装置及び処理システム
JP5074741B2 (ja) * 2006-11-10 2012-11-14 株式会社日立ハイテクノロジーズ 真空処理装置

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