JP2012004335A5 - - Google Patents
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- Publication number
- JP2012004335A5 JP2012004335A5 JP2010137935A JP2010137935A JP2012004335A5 JP 2012004335 A5 JP2012004335 A5 JP 2012004335A5 JP 2010137935 A JP2010137935 A JP 2010137935A JP 2010137935 A JP2010137935 A JP 2010137935A JP 2012004335 A5 JP2012004335 A5 JP 2012004335A5
- Authority
- JP
- Japan
- Prior art keywords
- diisocyanate
- isocyanate
- toluenediamine
- aminobenzoate
- tert
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920005862 polyol Polymers 0.000 claims 7
- 150000003077 polyols Chemical class 0.000 claims 7
- 238000005498 polishing Methods 0.000 claims 6
- -1 polytetramethylene Polymers 0.000 claims 6
- 239000003795 chemical substances by application Substances 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- 239000000203 mixture Substances 0.000 claims 3
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 claims 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims 2
- 150000001412 amines Chemical group 0.000 claims 2
- 239000007795 chemical reaction product Substances 0.000 claims 2
- 239000012948 isocyanate Substances 0.000 claims 2
- 229920001451 polypropylene glycol Polymers 0.000 claims 2
- YPFDHNVEDLHUCE-UHFFFAOYSA-N propane-1,3-diol Chemical compound OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 claims 2
- 239000000126 substance Substances 0.000 claims 2
- FKTHNVSLHLHISI-UHFFFAOYSA-N 1,2-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC=C1CN=C=O FKTHNVSLHLHISI-UHFFFAOYSA-N 0.000 claims 1
- ALQLPWJFHRMHIU-UHFFFAOYSA-N 1,4-diisocyanatobenzene Chemical compound O=C=NC1=CC=C(N=C=O)C=C1 ALQLPWJFHRMHIU-UHFFFAOYSA-N 0.000 claims 1
- SBJCUZQNHOLYMD-UHFFFAOYSA-N 1,5-Naphthalene diisocyanate Chemical compound C1=CC=C2C(N=C=O)=CC=CC2=C1N=C=O SBJCUZQNHOLYMD-UHFFFAOYSA-N 0.000 claims 1
- PISLZQACAJMAIO-UHFFFAOYSA-N 2,4-diethyl-6-methylbenzene-1,3-diamine Chemical compound CCC1=CC(C)=C(N)C(CC)=C1N PISLZQACAJMAIO-UHFFFAOYSA-N 0.000 claims 1
- WABOBVQONKAELR-UHFFFAOYSA-N 2-methyl-4-(2-methylbutan-2-yl)benzene-1,3-diamine Chemical compound CCC(C)(C)C1=CC=C(N)C(C)=C1N WABOBVQONKAELR-UHFFFAOYSA-N 0.000 claims 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 claims 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 claims 1
- VIOMIGLBMQVNLY-UHFFFAOYSA-N 4-[(4-amino-2-chloro-3,5-diethylphenyl)methyl]-3-chloro-2,6-diethylaniline Chemical compound CCC1=C(N)C(CC)=CC(CC=2C(=C(CC)C(N)=C(CC)C=2)Cl)=C1Cl VIOMIGLBMQVNLY-UHFFFAOYSA-N 0.000 claims 1
- AOFIWCXMXPVSAZ-UHFFFAOYSA-N 4-methyl-2,6-bis(methylsulfanyl)benzene-1,3-diamine Chemical compound CSC1=CC(C)=C(N)C(SC)=C1N AOFIWCXMXPVSAZ-UHFFFAOYSA-N 0.000 claims 1
- YJIHNAUJGMTCFJ-UHFFFAOYSA-N 4-methyl-6-(2-methylbutan-2-yl)benzene-1,3-diamine Chemical compound CCC(C)(C)C1=CC(C)=C(N)C=C1N YJIHNAUJGMTCFJ-UHFFFAOYSA-N 0.000 claims 1
- DVPHIKHMYFQLKF-UHFFFAOYSA-N 4-tert-butyl-2-methylbenzene-1,3-diamine Chemical compound CC1=C(N)C=CC(C(C)(C)C)=C1N DVPHIKHMYFQLKF-UHFFFAOYSA-N 0.000 claims 1
- HLDUVPFXLWEZOG-UHFFFAOYSA-N 4-tert-butyl-6-methylbenzene-1,3-diamine Chemical compound CC1=CC(C(C)(C)C)=C(N)C=C1N HLDUVPFXLWEZOG-UHFFFAOYSA-N 0.000 claims 1
- 239000004743 Polypropylene Substances 0.000 claims 1
- 230000006835 compression Effects 0.000 claims 1
- 238000007906 compression Methods 0.000 claims 1
- 229920001577 copolymer Polymers 0.000 claims 1
- 125000005442 diisocyanate group Chemical group 0.000 claims 1
- 150000002148 esters Chemical class 0.000 claims 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 229920001155 polypropylene Polymers 0.000 claims 1
- 229920000909 polytetrahydrofuran Polymers 0.000 claims 1
- 229920002635 polyurethane Polymers 0.000 claims 1
- 239000004814 polyurethane Substances 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical group CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 claims 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010137935A JP5715770B2 (ja) | 2010-06-17 | 2010-06-17 | 低欠陥の一体型窓を有する化学機械研磨パッド及び当該化学機械研磨パッドを用いて基体を化学機械研磨する方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010137935A JP5715770B2 (ja) | 2010-06-17 | 2010-06-17 | 低欠陥の一体型窓を有する化学機械研磨パッド及び当該化学機械研磨パッドを用いて基体を化学機械研磨する方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012004335A JP2012004335A (ja) | 2012-01-05 |
| JP2012004335A5 true JP2012004335A5 (enrdf_load_stackoverflow) | 2013-07-18 |
| JP5715770B2 JP5715770B2 (ja) | 2015-05-13 |
Family
ID=45535996
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010137935A Active JP5715770B2 (ja) | 2010-06-17 | 2010-06-17 | 低欠陥の一体型窓を有する化学機械研磨パッド及び当該化学機械研磨パッドを用いて基体を化学機械研磨する方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5715770B2 (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9064806B1 (en) * | 2014-03-28 | 2015-06-23 | Rohm and Haas Electronics Materials CMP Holdings, Inc. | Soft and conditionable chemical mechanical polishing pad with window |
| US9314897B2 (en) * | 2014-04-29 | 2016-04-19 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Chemical mechanical polishing pad with endpoint detection window |
| US9731398B2 (en) * | 2014-08-22 | 2017-08-15 | Rohm And Haas Electronic Materials Cmp Holding, Inc. | Polyurethane polishing pad |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3288151B2 (ja) * | 1993-09-02 | 2002-06-04 | 三井化学株式会社 | 二成分系ポリウレタン発泡型シーリング材組成物、シーリング方法及び灯具 |
| US6171181B1 (en) * | 1999-08-17 | 2001-01-09 | Rodel Holdings, Inc. | Molded polishing pad having integral window |
| US6641471B1 (en) * | 2000-09-19 | 2003-11-04 | Rodel Holdings, Inc | Polishing pad having an advantageous micro-texture and methods relating thereto |
| JP4620331B2 (ja) * | 2003-01-31 | 2011-01-26 | ニッタ・ハース株式会社 | 研磨パッド及び研磨パッドの製造方法 |
| JP4977962B2 (ja) * | 2004-04-28 | 2012-07-18 | Ｊｓｒ株式会社 | 化学機械研磨パッド、その製造方法及び半導体ウエハの化学機械研磨方法 |
| US7018581B2 (en) * | 2004-06-10 | 2006-03-28 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Method of forming a polishing pad with reduced stress window |
| JP2007118106A (ja) * | 2005-10-26 | 2007-05-17 | Toyo Tire & Rubber Co Ltd | 研磨パッド及びその製造方法 |
| US8697217B2 (en) * | 2010-01-15 | 2014-04-15 | Rohm and Haas Electronics Materials CMP Holdings, Inc. | Creep-resistant polishing pad window |
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2010
- 2010-06-17 JP JP2010137935A patent/JP5715770B2/ja active Active