JP2012004108A5 - - Google Patents

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Publication number
JP2012004108A5
JP2012004108A5 JP2011106983A JP2011106983A JP2012004108A5 JP 2012004108 A5 JP2012004108 A5 JP 2012004108A5 JP 2011106983 A JP2011106983 A JP 2011106983A JP 2011106983 A JP2011106983 A JP 2011106983A JP 2012004108 A5 JP2012004108 A5 JP 2012004108A5
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JP
Japan
Prior art keywords
upper electrode
processing apparatus
plasma processing
space
inert gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011106983A
Other languages
English (en)
Japanese (ja)
Other versions
JP5749071B2 (ja
JP2012004108A (ja
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Publication date
Application filed filed Critical
Priority to JP2011106983A priority Critical patent/JP5749071B2/ja
Priority claimed from JP2011106983A external-priority patent/JP5749071B2/ja
Publication of JP2012004108A publication Critical patent/JP2012004108A/ja
Publication of JP2012004108A5 publication Critical patent/JP2012004108A5/ja
Application granted granted Critical
Publication of JP5749071B2 publication Critical patent/JP5749071B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011106983A 2010-05-18 2011-05-12 プラズマ処理装置 Expired - Fee Related JP5749071B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011106983A JP5749071B2 (ja) 2010-05-18 2011-05-12 プラズマ処理装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010114377 2010-05-18
JP2010114377 2010-05-18
JP2011106983A JP5749071B2 (ja) 2010-05-18 2011-05-12 プラズマ処理装置

Publications (3)

Publication Number Publication Date
JP2012004108A JP2012004108A (ja) 2012-01-05
JP2012004108A5 true JP2012004108A5 (cg-RX-API-DMAC7.html) 2014-06-19
JP5749071B2 JP5749071B2 (ja) 2015-07-15

Family

ID=45535848

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011106983A Expired - Fee Related JP5749071B2 (ja) 2010-05-18 2011-05-12 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JP5749071B2 (cg-RX-API-DMAC7.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120043636A (ko) * 2010-10-26 2012-05-04 가부시키가이샤 한도오따이 에네루기 켄큐쇼 플라즈마 처리 장치 및 플라즈마 ｃｖｄ 장치

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60114577A (ja) * 1983-11-26 1985-06-21 Matsushita Electric Ind Co Ltd 化学処理装置
JP4499005B2 (ja) * 2004-09-29 2010-07-07 積水化学工業株式会社 プラズマ処理装置
JP5122805B2 (ja) * 2006-12-20 2013-01-16 株式会社アルバック 成膜装置
JP2008186939A (ja) * 2007-01-29 2008-08-14 Tokyo Electron Ltd プラズマ処理装置及びプラズマ処理方法並びに記憶媒体
US8247315B2 (en) * 2008-03-17 2012-08-21 Semiconductor Energy Laboratory Co., Ltd. Plasma processing apparatus and method for manufacturing semiconductor device
JP5328685B2 (ja) * 2010-01-28 2013-10-30 三菱電機株式会社 プラズマ処理装置及びプラズマ処理方法

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