JP2011528856A5 - - Google Patents

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Publication number
JP2011528856A5
JP2011528856A5 JP2011519048A JP2011519048A JP2011528856A5 JP 2011528856 A5 JP2011528856 A5 JP 2011528856A5 JP 2011519048 A JP2011519048 A JP 2011519048A JP 2011519048 A JP2011519048 A JP 2011519048A JP 2011528856 A5 JP2011528856 A5 JP 2011528856A5
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JP
Japan
Prior art keywords
exposure apparatus
projection exposure
plane
plate
microlithographic projection
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Application number
JP2011519048A
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English (en)
Japanese (ja)
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JP2011528856A (ja
JP5465247B2 (ja
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Priority claimed from DE102008040611A external-priority patent/DE102008040611A1/de
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Publication of JP2011528856A publication Critical patent/JP2011528856A/ja
Publication of JP2011528856A5 publication Critical patent/JP2011528856A5/ja
Application granted granted Critical
Publication of JP5465247B2 publication Critical patent/JP5465247B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011519048A 2008-07-22 2009-06-17 マイクロリソグラフィ投影露光装置における偏光分布を修正する方法及びマイクロリソグラフィ投影露光装置 Expired - Fee Related JP5465247B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US8263408P 2008-07-22 2008-07-22
DE102008040611.2 2008-07-22
DE102008040611A DE102008040611A1 (de) 2008-07-22 2008-07-22 Verfahren zum Modifizieren einer Polarisationsverteilung in einer mikrolithographischen Projektionsbelichtungsanlage, sowie mikrolithographische Projektionsbelichtungsanlage
US61/082,634 2008-07-22
PCT/EP2009/004372 WO2010009788A1 (en) 2008-07-22 2009-06-17 Method for modifying a polarization distribution in a microlithographic projection exposure apparatus, and microlithographic projection exposure apparatus

Publications (3)

Publication Number Publication Date
JP2011528856A JP2011528856A (ja) 2011-11-24
JP2011528856A5 true JP2011528856A5 (OSRAM) 2012-07-12
JP5465247B2 JP5465247B2 (ja) 2014-04-09

Family

ID=41428796

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011519048A Expired - Fee Related JP5465247B2 (ja) 2008-07-22 2009-06-17 マイクロリソグラフィ投影露光装置における偏光分布を修正する方法及びマイクロリソグラフィ投影露光装置

Country Status (4)

Country Link
US (1) US9128389B2 (OSRAM)
JP (1) JP5465247B2 (OSRAM)
DE (1) DE102008040611A1 (OSRAM)
WO (1) WO2010009788A1 (OSRAM)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010029905A1 (de) 2010-06-10 2011-12-15 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
JP6120001B2 (ja) * 2011-10-24 2017-04-26 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
DE102012203944A1 (de) * 2012-03-14 2013-10-02 Carl Zeiss Smt Gmbh Verfahren zur Justage eines optischen Systems einer mikrolithographischen Projektionsbelichtungsanlage

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08313842A (ja) * 1995-05-15 1996-11-29 Nikon Corp 照明光学系および該光学系を備えた露光装置
KR100480620B1 (ko) * 2002-09-19 2005-03-31 삼성전자주식회사 마이크로 미러 어레이를 구비한 노광 장치 및 이를 이용한노광 방법
TW200412617A (en) * 2002-12-03 2004-07-16 Nikon Corp Optical illumination device, method for adjusting optical illumination device, exposure device and exposure method
JP2005005521A (ja) * 2003-06-12 2005-01-06 Nikon Corp 露光装置、露光方法、および偏光状態測定装置
US7714983B2 (en) * 2003-09-12 2010-05-11 Carl Zeiss Smt Ag Illumination system for a microlithography projection exposure installation
US7408616B2 (en) * 2003-09-26 2008-08-05 Carl Zeiss Smt Ag Microlithographic exposure method as well as a projection exposure system for carrying out the method
TWI453795B (zh) 2005-01-21 2014-09-21 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
US8675176B2 (en) * 2005-02-25 2014-03-18 Asml Netherlands B.V. Parameter control in a lithographic apparatus using polarization
US8206116B2 (en) 2005-07-14 2012-06-26 United Technologies Corporation Method for loading and locking tangential rotor blades and blade design
JP4920041B2 (ja) * 2005-10-04 2012-04-18 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学系とりわけマイクロリソグラフィック投影露光機における偏光分布に影響を与えるための装置及び方法
JP2007180088A (ja) * 2005-12-27 2007-07-12 Nikon Corp 照明光学装置、照明光学装置の調整方法、露光装置、およびデバイスの製造方法
JP2007220767A (ja) * 2006-02-15 2007-08-30 Canon Inc 露光装置及びデバイス製造方法
US7525642B2 (en) * 2006-02-23 2009-04-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2008066565A (ja) * 2006-09-08 2008-03-21 Sony Corp 露光方法および露光装置

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