JP2011528180A - Euvリソグラフィ装置の放射源モジュール、リソグラフィ装置、およびデバイス製造方法 - Google Patents
Euvリソグラフィ装置の放射源モジュール、リソグラフィ装置、およびデバイス製造方法 Download PDFInfo
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- JP2011528180A JP2011528180A JP2011517886A JP2011517886A JP2011528180A JP 2011528180 A JP2011528180 A JP 2011528180A JP 2011517886 A JP2011517886 A JP 2011517886A JP 2011517886 A JP2011517886 A JP 2011517886A JP 2011528180 A JP2011528180 A JP 2011528180A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Public Health (AREA)
- Epidemiology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Environmental & Geological Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
【選択図】 図2
Description
[0001] 本願は、2008年7月14日に出願した米国仮出願第61/129,715号の優先権を主張し、その全体を本願に参考として組み込む。
Claims (14)
- リソグラフィ装置における使用のための放射源モジュールであって、前記放射源モジュールは極端紫外(EUV)放射および2次放射を生成し、前記放射源モジュールはEUV放射の放射源と協働するバッファガスを含み、前記バッファガスは前記EUV放射に対して少なくとも50%の透過と、前記2次放射に対して少なくとも70%の吸収とを有する、放射源モジュール。
- 前記バッファガスは、C2H4、NH3、O3、CH3OH、CO2、CH4、C2H6、C2H2、NH2D、SiH3Cl、SiH3F、およびSiH3Brの群から選択される、請求項1に記載の放射源モジュール。
- 前記バッファガスは、第1のガス試料と第2のガス試料の混合物を含む、請求項1または2に記載の放射源モジュール。
- 前記第2のガス試料は、前記第1のガス試料の吸収線を広げる、請求項3に記載の放射源モジュール。
- 前記第1のガス試料は、C2H4、NH3、O3、CH3OH、CO2、CH4、C2H6、C2H2、NH2D、SiH3Cl、SiH3F、およびSiH3Brの群から選択され、第2のガス試料は、H2、He、Ne、およびArの群から選択される、請求項4に記載の放射源モジュール。
- 前記2次放射は、約1〜11マイクロメートルの範囲内の波長を有する、請求項1〜5のいずれか一項に記載の放射源モジュール。
- 前記2次放射は複数の波長を含み、前記第2のガス試料は前記複数の波長に対して少なくとも70%の吸収を有する、請求項3、4、5、または6に記載の放射源モジュール。
- 前記バッファガスの圧力積分は、0.5〜5mbar・cmの範囲内にある、請求項1〜7のいずれか一項に記載の放射源モジュール。
- レーザの光が第1の領域および第2の領域を通って伝播し、レーザ生成プラズマが前記第1の領域内で生成され、前記放射源モジュールは前記バッファガスを前記第2の領域に閉じ込める圧力バリアをさらに含む、請求項1〜8のいずれか一項に記載の放射源モジュール。
- 前記圧力バリアはフォイルトラップを含む、請求項9に記載の放射源モジュール。
- 前記フォイルトラップは、ガスが注入された固定フォイルトラップである、請求項10に記載の放射源モジュール。
- 請求項1〜11のいずれか一項に記載の放射源モジュールを含む、パターニングデバイスからのパターンを基板上に投影するリソグラフィ装置。
- 極端紫外(EUV)放射のパターン付きビームを基板上に投影することを含むデバイス製造方法であって、前記EUV放射は、請求項1〜11のいずれか一項に記載の放射源モジュールによって、または、請求項12に記載のリソグラフィ装置によって、生成される。デバイス製造方法。
- 極端紫外線および2次放射を放射源内で生成することと、
前記放射源に、前記極端紫外線に対して少なくとも50%の透過と、前記2次放射に対して少なくとも70%の吸収とを有するバッファガスを供給することと、
前記極端紫外線のパターン付きビームを基板上に投影することと、
を含む、デバイス製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12971508P | 2008-07-14 | 2008-07-14 | |
US61/129,715 | 2008-07-14 | ||
PCT/EP2009/058894 WO2010007015A1 (en) | 2008-07-14 | 2009-07-13 | Source module of an euv lithographic apparatus, lithographic apparatus, and method for manufacturing a device |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011528180A true JP2011528180A (ja) | 2011-11-10 |
JP5341992B2 JP5341992B2 (ja) | 2013-11-13 |
Family
ID=41061157
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011517886A Active JP5341992B2 (ja) | 2008-07-14 | 2009-07-13 | Euvリソグラフィ装置の放射源モジュール、リソグラフィ装置、およびデバイス製造方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US9465306B2 (ja) |
EP (1) | EP2300878B1 (ja) |
JP (1) | JP5341992B2 (ja) |
KR (1) | KR20110028659A (ja) |
CN (1) | CN102084299B (ja) |
NL (1) | NL2003181A1 (ja) |
TW (1) | TW201007384A (ja) |
WO (1) | WO2010007015A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018508936A (ja) * | 2015-01-09 | 2018-03-29 | ケーエルエー−テンカー コーポレイション | レーザ維持プラズマ光源の放射性輻射を阻害するシステム及び方法 |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8158960B2 (en) * | 2007-07-13 | 2012-04-17 | Cymer, Inc. | Laser produced plasma EUV light source |
NL2004706A (nl) * | 2009-07-22 | 2011-01-25 | Asml Netherlands Bv | Radiation source. |
CN102231935A (zh) * | 2011-05-31 | 2011-11-02 | 长春理工大学 | 一种产生相干极紫外辐射的方法及装置 |
JP5778093B2 (ja) * | 2011-08-10 | 2015-09-16 | エーエスエムエル ネザーランズ ビー.ブイ. | 基板テーブルアセンブリ、液浸リソグラフィ装置及びデバイス製造方法 |
NL2009359A (en) * | 2011-09-23 | 2013-03-26 | Asml Netherlands Bv | Radiation source. |
NL2009358A (en) * | 2011-09-23 | 2013-03-26 | Asml Netherlands Bv | Radiation source. |
JP6253641B2 (ja) * | 2012-05-21 | 2017-12-27 | エーエスエムエル ネザーランズ ビー.ブイ. | リフレクタ、ペリクル、リソグラフィマスク、膜、スペクトル純度フィルタ、および、装置 |
WO2014127151A1 (en) | 2013-02-14 | 2014-08-21 | Kla-Tencor Corporation | System and method for producing an exclusionary buffer gas flow in an euv light source |
US9899205B2 (en) * | 2016-05-25 | 2018-02-20 | Kla-Tencor Corporation | System and method for inhibiting VUV radiative emission of a laser-sustained plasma source |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2006135286A (ja) * | 2004-05-11 | 2006-05-25 | Asml Netherlands Bv | リソグラフィ装置およびデバイス製造方法 |
WO2006134512A2 (en) * | 2005-06-14 | 2006-12-21 | Philips Intellectual Property & Standards Gmbh | Debris mitigation system with improved gas distribution |
US20070012889A1 (en) * | 2005-07-13 | 2007-01-18 | Nikon Corporation | Gaseous extreme-ultraviolet spectral purity filters and optical systems comprising same |
JP2007129209A (ja) * | 2005-10-07 | 2007-05-24 | Xtreme Technologies Gmbh | プラズマに基づくeuv放射線源における望ましくないスペクトル成分を抑制する装置 |
JP2007298980A (ja) * | 2003-04-08 | 2007-11-15 | Cymer Inc | Euv光源用コレクタ |
JP2008027623A (ja) * | 2006-07-18 | 2008-02-07 | Komatsu Ltd | ターゲット物質供給装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7671349B2 (en) * | 2003-04-08 | 2010-03-02 | Cymer, Inc. | Laser produced plasma EUV light source |
SG109523A1 (en) * | 2002-08-15 | 2005-03-30 | Asml Netherlands Bv | Lithographic projection apparatus and reflector assembly for use in said apparatus |
US8075732B2 (en) * | 2004-11-01 | 2011-12-13 | Cymer, Inc. | EUV collector debris management |
-
2009
- 2009-07-10 NL NL2003181A patent/NL2003181A1/nl not_active Application Discontinuation
- 2009-07-13 KR KR1020117003284A patent/KR20110028659A/ko not_active Application Discontinuation
- 2009-07-13 JP JP2011517886A patent/JP5341992B2/ja active Active
- 2009-07-13 US US13/003,137 patent/US9465306B2/en active Active
- 2009-07-13 EP EP09780491.8A patent/EP2300878B1/en active Active
- 2009-07-13 CN CN2009801260249A patent/CN102084299B/zh active Active
- 2009-07-13 WO PCT/EP2009/058894 patent/WO2010007015A1/en active Application Filing
- 2009-07-14 TW TW098123778A patent/TW201007384A/zh unknown
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007298980A (ja) * | 2003-04-08 | 2007-11-15 | Cymer Inc | Euv光源用コレクタ |
JP2006135286A (ja) * | 2004-05-11 | 2006-05-25 | Asml Netherlands Bv | リソグラフィ装置およびデバイス製造方法 |
WO2006134512A2 (en) * | 2005-06-14 | 2006-12-21 | Philips Intellectual Property & Standards Gmbh | Debris mitigation system with improved gas distribution |
US20070012889A1 (en) * | 2005-07-13 | 2007-01-18 | Nikon Corporation | Gaseous extreme-ultraviolet spectral purity filters and optical systems comprising same |
JP2007129209A (ja) * | 2005-10-07 | 2007-05-24 | Xtreme Technologies Gmbh | プラズマに基づくeuv放射線源における望ましくないスペクトル成分を抑制する装置 |
JP2008027623A (ja) * | 2006-07-18 | 2008-02-07 | Komatsu Ltd | ターゲット物質供給装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018508936A (ja) * | 2015-01-09 | 2018-03-29 | ケーエルエー−テンカー コーポレイション | レーザ維持プラズマ光源の放射性輻射を阻害するシステム及び方法 |
Also Published As
Publication number | Publication date |
---|---|
NL2003181A1 (nl) | 2010-01-18 |
TW201007384A (en) | 2010-02-16 |
WO2010007015A1 (en) | 2010-01-21 |
CN102084299B (zh) | 2013-09-11 |
US9465306B2 (en) | 2016-10-11 |
US20110109892A1 (en) | 2011-05-12 |
CN102084299A (zh) | 2011-06-01 |
KR20110028659A (ko) | 2011-03-21 |
EP2300878B1 (en) | 2014-11-12 |
JP5341992B2 (ja) | 2013-11-13 |
EP2300878A1 (en) | 2011-03-30 |
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