JP2011517066A - マルチパス光パワー増幅器 - Google Patents
マルチパス光パワー増幅器 Download PDFInfo
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- JP2011517066A JP2011517066A JP2011501927A JP2011501927A JP2011517066A JP 2011517066 A JP2011517066 A JP 2011517066A JP 2011501927 A JP2011501927 A JP 2011501927A JP 2011501927 A JP2011501927 A JP 2011501927A JP 2011517066 A JP2011517066 A JP 2011517066A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2308—Amplifier arrangements, e.g. MOPA
- H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
- H01S3/2333—Double-pass amplifiers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2308—Amplifier arrangements, e.g. MOPA
- H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
- H01S3/2341—Four pass amplifiers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0064—Anti-reflection devices, e.g. optical isolaters
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/0602—Crystal lasers or glass lasers
- H01S3/061—Crystal lasers or glass lasers with elliptical or circular cross-section and elongated shape, e.g. rod
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/1601—Solid materials characterised by an active (lasing) ion
- H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/1601—Solid materials characterised by an active (lasing) ion
- H01S3/162—Solid materials characterised by an active (lasing) ion transition metal
- H01S3/1623—Solid materials characterised by an active (lasing) ion transition metal chromium, e.g. Alexandrite
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/163—Solid materials characterised by a crystal matrix
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/163—Solid materials characterised by a crystal matrix
- H01S3/1671—Solid materials characterised by a crystal matrix vanadate, niobate, tantalate
- H01S3/1673—YVO4 [YVO]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2308—Amplifier arrangements, e.g. MOPA
- H01S3/2316—Cascaded amplifiers
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- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Abstract
【選択図】図4B
Description
Claims (9)
- レーザエネルギの偏光に依存する増幅を行い、ビーム歪みが低減されたレーザ出力を生成するマルチパス光パワー増幅器を構成する方法において、
生来的な特異な軸利得及び関連する生来的な特異な熱複屈折によって特徴付けられる、互いに直交するように関係づけられた第1及び第2の利得軸をする異方性利得媒質を準備するステップと、
偏光されたシードレーザビームを誘導して、前記異方性利得媒質を複数回通過させるステップであって、前記複数回の通過のそれぞれのためのシードレーザビームは、共通ビーム経路に沿って伝播し、前記共通ビーム経路から実質的に変位せず、前記シードレーザビームは、前記共通ビーム経路を横断する偏光方向を有するステップと、
前記利得媒質の第1及び第2の利得軸に対して、前記偏光されたシードレーザビームの偏光方向の整列を調整し、前記複数の通過の回数を確定し、レーザ出力ビームを生成するステップとを有し、
前記ビーム経路から実質的に変位しない前記シードレーザビームは、レーザ出力ビーム歪みを低減し、前記生来的な特異な熱複屈折は、レーザ出力エネルギー抽出効率を高める方法。 - 前記異方性利得媒質は、希土類イオンドープ結晶性固体材料を含む請求項1記載の方法。
- 前記希土類イオンドープ結晶性固体材料は、Nd:YVO4、Nd:YLF、Nd:GdVO4、Tm:YLF、Tm:YVO4、Ho:Tm:YLF、Ho:Tm:YVO4、Ho:Tm:GdVO4、Yb:YLF、Yb:YVO4又はYb:GdVO4を含む請求項2記載の方法。
- 前記異方性利得媒質は、Cr:LiSAF、Cr:LiCAF、Ti:サファイア又はアレキサンドライトを含む請求項1記載の方法。
- 前記異方性利得媒質は、断面が円形の筒状ロッドの形状の結晶性固体材料である請求項1記載の方法。
- 前記異方性利得媒質は、断面が多角形状の筒状ロッドの形状の結晶性固体材料である請求項1記載の方法。
- 前記筒状ロッドの多角形状の断面は、正方形である請求項6記載の方法。
- 前記筒状ロッドの多角形状の断面は、六角形である請求項6記載の方法。
- 前記偏光されたシードレーザビームの偏光方向の整列を調整するステップは、ビームスプリッタに前記偏光されたシードレーザビームを複数回通過させ、前記ビームスプリッタから前記レーザ出力ビームを出射させるステップを含む請求項1記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/059,955 | 2008-03-31 | ||
US12/059,955 US7796671B2 (en) | 2008-03-31 | 2008-03-31 | Multi-pass optical power amplifier |
PCT/US2009/037719 WO2009145971A1 (en) | 2008-03-31 | 2009-03-19 | Multi-pass optical power amplifier |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011517066A true JP2011517066A (ja) | 2011-05-26 |
JP5615259B2 JP5615259B2 (ja) | 2014-10-29 |
Family
ID=41117139
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011501927A Expired - Fee Related JP5615259B2 (ja) | 2008-03-31 | 2009-03-19 | マルチパス光パワー増幅器 |
Country Status (6)
Country | Link |
---|---|
US (1) | US7796671B2 (ja) |
JP (1) | JP5615259B2 (ja) |
KR (1) | KR20100135772A (ja) |
CN (1) | CN101981769B (ja) |
TW (1) | TW200952298A (ja) |
WO (1) | WO2009145971A1 (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014139969A (ja) * | 2013-01-21 | 2014-07-31 | Mitsubishi Electric Corp | 固体レーザ増幅装置および多段レーザ増幅装置 |
WO2015029285A1 (ja) * | 2013-09-02 | 2015-03-05 | 三菱電機株式会社 | レーザ増幅装置 |
WO2016142980A1 (ja) * | 2015-03-12 | 2016-09-15 | ソニー株式会社 | 光増幅装置、及び光源装置 |
JP2019192757A (ja) * | 2018-04-24 | 2019-10-31 | パナソニックIpマネジメント株式会社 | レーザ発振器及びそれを用いたレーザ加工装置、レーザ発振器の点検方法 |
JP2019207989A (ja) * | 2018-05-30 | 2019-12-05 | 浜松ホトニクス株式会社 | レーザ装置 |
JP7427209B2 (ja) | 2021-06-24 | 2024-02-05 | 学校法人近畿大学 | 光ファイバ出力光源装置とそれに用いる単一偏波反射型偏光ビームスプリッタ |
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US8670129B2 (en) * | 2009-09-03 | 2014-03-11 | Axsun Technologies, Inc. | Filtered ASE swept source for OCT medical imaging |
US8526472B2 (en) | 2009-09-03 | 2013-09-03 | Axsun Technologies, Inc. | ASE swept source with self-tracking filter for OCT medical imaging |
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US8896915B2 (en) | 2009-11-24 | 2014-11-25 | Applied Energetics | Axial walk off multi-pass amplifiers |
DE102010009048A1 (de) * | 2010-02-23 | 2011-08-25 | LPKF Laser & Electronics AG, 30827 | Laseranordnung |
JP2012015266A (ja) * | 2010-06-30 | 2012-01-19 | Sony Corp | 半導体光増幅器 |
WO2012058599A1 (en) | 2010-10-29 | 2012-05-03 | Lawrence Livermore National Security, Llc | Method and system for compact efficient laser architecture |
CN102570264A (zh) * | 2011-04-02 | 2012-07-11 | 北京国科世纪激光技术有限公司 | 提高灯泵激光放大器工作频率的装置及方法 |
FR2977989B1 (fr) * | 2011-07-11 | 2013-10-25 | Ecole Polytech | Dispositif et procede passif de combinaison coherente d'une pluralite d'amplificateurs optiques |
CN102545009A (zh) * | 2011-08-25 | 2012-07-04 | 北京国科世纪激光技术有限公司 | 消除激光放大器中热退偏效应的装置 |
DE102012000510A1 (de) | 2012-01-13 | 2013-07-18 | Neolase Gmbh | Nichtregenerativer optischer Verstärker |
US20140056321A1 (en) * | 2012-08-22 | 2014-02-27 | Xiaoyuan Peng | Optical amplifier and process |
BR112015010016A2 (pt) | 2012-11-07 | 2017-07-11 | Koninklijke Philips Nv | compilador, computador, método de compilação e programa de computador |
US9748725B2 (en) * | 2014-04-04 | 2017-08-29 | Advanced Optowave Corporation | Multipass fiber amplifiers |
US9531149B2 (en) * | 2014-04-04 | 2016-12-27 | Advanced Optowave Corporation | Multipass fiber amplifiers |
US9160136B1 (en) * | 2014-05-30 | 2015-10-13 | Lee Laser, Inc. | External diffusion amplifier |
CN107430063B (zh) * | 2014-10-06 | 2023-07-14 | 应用光物理公司 | 校准装置及其使用 |
KR101750821B1 (ko) * | 2015-04-24 | 2017-07-11 | 학교법인 한동대학교 | 레이저 증폭장치 |
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CN105552702A (zh) * | 2016-02-21 | 2016-05-04 | 中国科学院光电研究院 | 带实时光束监测功能的激光放大装置 |
CN106711751B (zh) * | 2017-02-08 | 2023-10-24 | 北京宏强富瑞技术有限公司 | 一种全固态双波长超快激光器及其工作方法 |
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CN108011285A (zh) * | 2017-12-29 | 2018-05-08 | 成都心无界光电技术有限公司 | 一种激光放大器 |
CN108923231B (zh) * | 2018-07-30 | 2020-02-18 | 中国工程物理研究院应用电子学研究所 | 一种基于偏振双通侧泵的直接液冷分布式增益激光器 |
CN112952539B (zh) * | 2021-04-16 | 2023-07-07 | 福州市纳飞光电科技有限公司 | 一种多次增益光纤放大器 |
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2008
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2009
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- 2009-03-19 WO PCT/US2009/037719 patent/WO2009145971A1/en active Application Filing
- 2009-03-19 KR KR1020107021925A patent/KR20100135772A/ko not_active Application Discontinuation
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Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2014139969A (ja) * | 2013-01-21 | 2014-07-31 | Mitsubishi Electric Corp | 固体レーザ増幅装置および多段レーザ増幅装置 |
WO2015029285A1 (ja) * | 2013-09-02 | 2015-03-05 | 三菱電機株式会社 | レーザ増幅装置 |
JPWO2015029285A1 (ja) * | 2013-09-02 | 2017-03-02 | 三菱電機株式会社 | レーザ増幅装置 |
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WO2016142980A1 (ja) * | 2015-03-12 | 2016-09-15 | ソニー株式会社 | 光増幅装置、及び光源装置 |
JP2019192757A (ja) * | 2018-04-24 | 2019-10-31 | パナソニックIpマネジメント株式会社 | レーザ発振器及びそれを用いたレーザ加工装置、レーザ発振器の点検方法 |
JP7038323B2 (ja) | 2018-04-24 | 2022-03-18 | パナソニックIpマネジメント株式会社 | レーザ発振器及びそれを用いたレーザ加工装置、レーザ発振器の点検方法 |
JP2019207989A (ja) * | 2018-05-30 | 2019-12-05 | 浜松ホトニクス株式会社 | レーザ装置 |
JP7097236B2 (ja) | 2018-05-30 | 2022-07-07 | 浜松ホトニクス株式会社 | レーザ装置 |
JP7427209B2 (ja) | 2021-06-24 | 2024-02-05 | 学校法人近畿大学 | 光ファイバ出力光源装置とそれに用いる単一偏波反射型偏光ビームスプリッタ |
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CN101981769B (zh) | 2012-08-22 |
US7796671B2 (en) | 2010-09-14 |
JP5615259B2 (ja) | 2014-10-29 |
US20090245304A1 (en) | 2009-10-01 |
WO2009145971A1 (en) | 2009-12-03 |
CN101981769A (zh) | 2011-02-23 |
TW200952298A (en) | 2009-12-16 |
KR20100135772A (ko) | 2010-12-27 |
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