JP2011511999A - パルス電子源、パルス電子源への電力供給方法およびパルス電子源制御方法 - Google Patents
パルス電子源、パルス電子源への電力供給方法およびパルス電子源制御方法 Download PDFInfo
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- JP2011511999A JP2011511999A JP2010541820A JP2010541820A JP2011511999A JP 2011511999 A JP2011511999 A JP 2011511999A JP 2010541820 A JP2010541820 A JP 2010541820A JP 2010541820 A JP2010541820 A JP 2010541820A JP 2011511999 A JP2011511999 A JP 2011511999A
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- electron source
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
- H01J3/021—Electron guns using a field emission, photo emission, or secondary emission electron source
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J33/00—Discharge tubes with provision for emergence of electrons or ions from the vessel; Lenard tubes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/09707—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using an electron or ion beam
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/0955—Processes or apparatus for excitation, e.g. pumping using pumping by high energy particles
- H01S3/0959—Processes or apparatus for excitation, e.g. pumping using pumping by high energy particles by an electron beam
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- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Electron Sources, Ion Sources (AREA)
- Particle Accelerators (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Plasma Technology (AREA)
- Lasers (AREA)
Abstract
【選択図】図1
Description
Claims (12)
- イオン化チャンバ(4)と、一次イオンを抽出および加速させるとともに二次電子のビームを形成するための電極(3)が設けられた加速チャンバ(2)とを備えるパルス電子源(1)であって、前記加速チャンバ(2)外の一次プラズマ(17)を駆動させるための正電圧と、一次イオンを抽出および加速させるとともに二次電子のビームを形成するための負電圧パルスと、を該電極(3)に加えるように構成される電源(11)を備えることを特徴とする、電子源。
- 前記電極(3)は、概して凸形円柱形状であるとともに、イオン化チャンバ(4)と加速チャンバ(2)とを接続するスロット(6)と対向位置にある平坦または凹形の中央部(3a)が設けられることを特徴とする、請求項1に記載の電子源。
- 前記イオン化チャンバ(4)と前記加速チャンバ(2)はオープンスロット(6)により接続されることを特徴とする、請求項1または2に記載の電子源。
- 前記イオン化チャンバ(4)と前記加速チャンバ(2)は、前記電極(3)の前記中央部(3a)と前記イオン化チャンバ(4)の出口(10)との間に配置されるスロット(6)により接続されることを特徴とする、請求項1〜3のいずれか1項に記載の電子源。
- 前記出口(10)は開いていることを特徴とする、請求項4に記載の電子源。
- 前記出口(10)は、少なくとも1つのグリッドが設けられることを特徴とする、請求項4に記載の電子源。
- 前記出口(10)は、電子をX線に変換する金属層を備えるシート(16)により塞がれることを特徴とする、請求項4に記載の電子源。
- 前記電源(11)は、キャパシタ(21)を介して直流電圧源に接続されるプライマリ(19)と、アースと前記プライマリの反対側におけるキャパシタの端子との間に配置されるスイッチ(22)と、前記電極に接続されるセカンダリ(20)とが設けられるパルス変換器(18)と;該電極に前記正電圧を加えるためにアースと前記電極との間に配置される補助電圧源(23)と;を備えることを特徴とする、請求項1〜7のいずれか1項に記載の電子源。
- 前記電源は、前記補助電圧源(23)に連続して保護装置(24)を備えることを特徴とする、請求項8に記載の電子源。
- 前記補助電圧源(23)は、前記変換器の前記セカンダリに連続して取り付けられることを特徴とする、請求項8または9に記載の電子源。
- キャパシタが、前記補助電源に平行に取り付けられることを特徴とする、請求項10に記載の電子源。
- イオン化チャンバ(4)と、一次イオンを抽出および加速させるとともに二次電子のビームを形成するための電極(3)が設けられた加速チャンバ(2)とを備えるパルス化電子源の制御方法であって、前記加速チャンバ外の一次プラズマを駆動させるための電源(11)により供給される正電圧を該電極(3)に加えるステップと、一次イオンを抽出および加速させるとともに二次電子のビームを形成するために前記電源(11)により供給される負電圧パルスを該電極に加えるステップとを含む、方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0800165A FR2926395B1 (fr) | 2008-01-11 | 2008-01-11 | Source pulsee d'electrons, procede d'alimentation electrique pour source pulsee d'electrons et procede de commande d'une source pulsee d'electrons |
FR0800165 | 2008-01-11 | ||
PCT/FR2009/000018 WO2009106759A1 (fr) | 2008-01-11 | 2009-01-08 | Source puisée d'électrons, procédé d'alimentation électrique pour source puisée d'électrons et procédé de commande d'une source puisée d'électrons |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011511999A true JP2011511999A (ja) | 2011-04-14 |
JP5340310B2 JP5340310B2 (ja) | 2013-11-13 |
Family
ID=40810366
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010541820A Active JP5340310B2 (ja) | 2008-01-11 | 2009-01-08 | パルス電子源、パルス電子源への電力供給方法およびパルス電子源制御方法 |
Country Status (9)
Country | Link |
---|---|
US (1) | US8698402B2 (ja) |
EP (1) | EP2227819B1 (ja) |
JP (1) | JP5340310B2 (ja) |
KR (1) | KR20100126679A (ja) |
CN (1) | CN101952926B (ja) |
AT (1) | ATE546822T1 (ja) |
FR (1) | FR2926395B1 (ja) |
TW (1) | TWI446395B (ja) |
WO (1) | WO2009106759A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101564680B1 (ko) * | 2015-01-20 | 2015-11-02 | 성균관대학교산학협력단 | 전자총 전원공급장치 |
CN105301278B (zh) * | 2015-11-10 | 2018-06-26 | 华中科技大学 | 一种实现电子和离子速度影像同时测量的方法及装置 |
RU2759425C1 (ru) * | 2020-11-27 | 2021-11-12 | федеральное государственное бюджетное образовательное учреждение высшего образования «Томский государственный университет систем управления и радиоэлектроники» | Плазменный эмиттер импульсного форвакуумного источника электронов на основе дугового разряда |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05211052A (ja) * | 1992-01-30 | 1993-08-20 | Toshiba Corp | パルス電子銃 |
JPH08236053A (ja) * | 1995-02-28 | 1996-09-13 | Toshiba Corp | 電子銃 |
JPH10332897A (ja) * | 1997-05-27 | 1998-12-18 | Sumitomo Heavy Ind Ltd | イオン・プラズマ型電子銃とその制御方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2204882B1 (ja) | 1972-10-30 | 1976-10-29 | Onera (Off Nat Aerospatiale) | |
US3831052A (en) * | 1973-05-25 | 1974-08-20 | Hughes Aircraft Co | Hollow cathode gas discharge device |
US3970892A (en) | 1975-05-19 | 1976-07-20 | Hughes Aircraft Company | Ion plasma electron gun |
US4642522A (en) * | 1984-06-18 | 1987-02-10 | Hughes Aircraft Company | Wire-ion-plasma electron gun employing auxiliary grid |
FR2591035B1 (fr) | 1985-11-29 | 1988-02-26 | Onera (Off Nat Aerospatiale) | Canon a electrons operant par emission secondaire sous bombardement ionique |
US4786844A (en) | 1987-03-30 | 1988-11-22 | Rpc Industries | Wire ion plasma gun |
TW521295B (en) * | 1999-12-13 | 2003-02-21 | Semequip Inc | Ion implantation ion source, system and method |
JP2004281230A (ja) * | 2003-03-14 | 2004-10-07 | Ebara Corp | ビーム源及びビーム処理装置 |
US7244474B2 (en) * | 2004-03-26 | 2007-07-17 | Applied Materials, Inc. | Chemical vapor deposition plasma process using an ion shower grid |
US7291360B2 (en) * | 2004-03-26 | 2007-11-06 | Applied Materials, Inc. | Chemical vapor deposition plasma process using plural ion shower grids |
-
2008
- 2008-01-11 FR FR0800165A patent/FR2926395B1/fr not_active Expired - Fee Related
-
2009
- 2009-01-08 EP EP09714160A patent/EP2227819B1/fr active Active
- 2009-01-08 JP JP2010541820A patent/JP5340310B2/ja active Active
- 2009-01-08 CN CN2009801019267A patent/CN101952926B/zh active Active
- 2009-01-08 AT AT09714160T patent/ATE546822T1/de active
- 2009-01-08 KR KR1020107017762A patent/KR20100126679A/ko not_active Application Discontinuation
- 2009-01-08 US US12/812,270 patent/US8698402B2/en active Active
- 2009-01-08 WO PCT/FR2009/000018 patent/WO2009106759A1/fr active Application Filing
- 2009-01-09 TW TW098100597A patent/TWI446395B/zh not_active IP Right Cessation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05211052A (ja) * | 1992-01-30 | 1993-08-20 | Toshiba Corp | パルス電子銃 |
JPH08236053A (ja) * | 1995-02-28 | 1996-09-13 | Toshiba Corp | 電子銃 |
JPH10332897A (ja) * | 1997-05-27 | 1998-12-18 | Sumitomo Heavy Ind Ltd | イオン・プラズマ型電子銃とその制御方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2009106759A1 (fr) | 2009-09-03 |
FR2926395B1 (fr) | 2010-05-14 |
CN101952926B (zh) | 2012-11-21 |
FR2926395A1 (fr) | 2009-07-17 |
US8698402B2 (en) | 2014-04-15 |
CN101952926A (zh) | 2011-01-19 |
KR20100126679A (ko) | 2010-12-02 |
ATE546822T1 (de) | 2012-03-15 |
JP5340310B2 (ja) | 2013-11-13 |
TWI446395B (zh) | 2014-07-21 |
US20110057566A1 (en) | 2011-03-10 |
EP2227819A1 (fr) | 2010-09-15 |
TW200939279A (en) | 2009-09-16 |
EP2227819B1 (fr) | 2012-02-22 |
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