ATE546822T1 - Elektronenpumpquelle, stromversorgungsverfahren für eine elektronenpumpquelle und verfahren zur steuerung einer elektronenpumpquelle - Google Patents
Elektronenpumpquelle, stromversorgungsverfahren für eine elektronenpumpquelle und verfahren zur steuerung einer elektronenpumpquelleInfo
- Publication number
- ATE546822T1 ATE546822T1 AT09714160T AT09714160T ATE546822T1 AT E546822 T1 ATE546822 T1 AT E546822T1 AT 09714160 T AT09714160 T AT 09714160T AT 09714160 T AT09714160 T AT 09714160T AT E546822 T1 ATE546822 T1 AT E546822T1
- Authority
- AT
- Austria
- Prior art keywords
- pump source
- electron pump
- power supply
- electron
- controlling
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
- H01J3/021—Electron guns using a field emission, photo emission, or secondary emission electron source
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J33/00—Discharge tubes with provision for emergence of electrons or ions from the vessel; Lenard tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/09707—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using an electron or ion beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/0955—Processes or apparatus for excitation, e.g. pumping using pumping by high energy particles
- H01S3/0959—Processes or apparatus for excitation, e.g. pumping using pumping by high energy particles by an electron beam
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Electron Sources, Ion Sources (AREA)
- Particle Accelerators (AREA)
- Plasma Technology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Lasers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0800165A FR2926395B1 (fr) | 2008-01-11 | 2008-01-11 | Source pulsee d'electrons, procede d'alimentation electrique pour source pulsee d'electrons et procede de commande d'une source pulsee d'electrons |
PCT/FR2009/000018 WO2009106759A1 (fr) | 2008-01-11 | 2009-01-08 | Source puisée d'électrons, procédé d'alimentation électrique pour source puisée d'électrons et procédé de commande d'une source puisée d'électrons |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE546822T1 true ATE546822T1 (de) | 2012-03-15 |
Family
ID=40810366
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT09714160T ATE546822T1 (de) | 2008-01-11 | 2009-01-08 | Elektronenpumpquelle, stromversorgungsverfahren für eine elektronenpumpquelle und verfahren zur steuerung einer elektronenpumpquelle |
Country Status (9)
Country | Link |
---|---|
US (1) | US8698402B2 (de) |
EP (1) | EP2227819B1 (de) |
JP (1) | JP5340310B2 (de) |
KR (1) | KR20100126679A (de) |
CN (1) | CN101952926B (de) |
AT (1) | ATE546822T1 (de) |
FR (1) | FR2926395B1 (de) |
TW (1) | TWI446395B (de) |
WO (1) | WO2009106759A1 (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101564680B1 (ko) * | 2015-01-20 | 2015-11-02 | 성균관대학교산학협력단 | 전자총 전원공급장치 |
CN105301278B (zh) * | 2015-11-10 | 2018-06-26 | 华中科技大学 | 一种实现电子和离子速度影像同时测量的方法及装置 |
RU2759425C1 (ru) * | 2020-11-27 | 2021-11-12 | федеральное государственное бюджетное образовательное учреждение высшего образования «Томский государственный университет систем управления и радиоэлектроники» | Плазменный эмиттер импульсного форвакуумного источника электронов на основе дугового разряда |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2204882B1 (de) | 1972-10-30 | 1976-10-29 | Onera (Off Nat Aerospatiale) | |
US3831052A (en) * | 1973-05-25 | 1974-08-20 | Hughes Aircraft Co | Hollow cathode gas discharge device |
US3970892A (en) | 1975-05-19 | 1976-07-20 | Hughes Aircraft Company | Ion plasma electron gun |
US4642522A (en) * | 1984-06-18 | 1987-02-10 | Hughes Aircraft Company | Wire-ion-plasma electron gun employing auxiliary grid |
FR2591035B1 (fr) | 1985-11-29 | 1988-02-26 | Onera (Off Nat Aerospatiale) | Canon a electrons operant par emission secondaire sous bombardement ionique |
US4786844A (en) | 1987-03-30 | 1988-11-22 | Rpc Industries | Wire ion plasma gun |
JPH05211052A (ja) | 1992-01-30 | 1993-08-20 | Toshiba Corp | パルス電子銃 |
JPH08236053A (ja) | 1995-02-28 | 1996-09-13 | Toshiba Corp | 電子銃 |
JP3135864B2 (ja) | 1997-05-27 | 2001-02-19 | 住友重機械工業株式会社 | イオン・プラズマ型電子銃とその制御方法 |
EP1245036B1 (de) * | 1999-12-13 | 2013-06-19 | Semequip, Inc. | Ionenquelle |
JP2004281230A (ja) * | 2003-03-14 | 2004-10-07 | Ebara Corp | ビーム源及びビーム処理装置 |
US7291360B2 (en) * | 2004-03-26 | 2007-11-06 | Applied Materials, Inc. | Chemical vapor deposition plasma process using plural ion shower grids |
US7244474B2 (en) * | 2004-03-26 | 2007-07-17 | Applied Materials, Inc. | Chemical vapor deposition plasma process using an ion shower grid |
-
2008
- 2008-01-11 FR FR0800165A patent/FR2926395B1/fr not_active Expired - Fee Related
-
2009
- 2009-01-08 CN CN2009801019267A patent/CN101952926B/zh active Active
- 2009-01-08 AT AT09714160T patent/ATE546822T1/de active
- 2009-01-08 KR KR1020107017762A patent/KR20100126679A/ko not_active Application Discontinuation
- 2009-01-08 US US12/812,270 patent/US8698402B2/en active Active
- 2009-01-08 WO PCT/FR2009/000018 patent/WO2009106759A1/fr active Application Filing
- 2009-01-08 EP EP09714160A patent/EP2227819B1/de active Active
- 2009-01-08 JP JP2010541820A patent/JP5340310B2/ja active Active
- 2009-01-09 TW TW098100597A patent/TWI446395B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP2011511999A (ja) | 2011-04-14 |
FR2926395B1 (fr) | 2010-05-14 |
CN101952926B (zh) | 2012-11-21 |
FR2926395A1 (fr) | 2009-07-17 |
US20110057566A1 (en) | 2011-03-10 |
EP2227819A1 (de) | 2010-09-15 |
TWI446395B (zh) | 2014-07-21 |
CN101952926A (zh) | 2011-01-19 |
TW200939279A (en) | 2009-09-16 |
WO2009106759A1 (fr) | 2009-09-03 |
EP2227819B1 (de) | 2012-02-22 |
US8698402B2 (en) | 2014-04-15 |
JP5340310B2 (ja) | 2013-11-13 |
KR20100126679A (ko) | 2010-12-02 |
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