JP2011243780A - 基板支持装置及び真空処理装置 - Google Patents
基板支持装置及び真空処理装置 Download PDFInfo
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- JP2011243780A JP2011243780A JP2010115160A JP2010115160A JP2011243780A JP 2011243780 A JP2011243780 A JP 2011243780A JP 2010115160 A JP2010115160 A JP 2010115160A JP 2010115160 A JP2010115160 A JP 2010115160A JP 2011243780 A JP2011243780 A JP 2011243780A
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- 239000000758 substrate Substances 0.000 title claims abstract description 167
- 238000009489 vacuum treatment Methods 0.000 title 1
- 230000005484 gravity Effects 0.000 claims description 2
- 230000002093 peripheral effect Effects 0.000 claims description 2
- 239000012636 effector Substances 0.000 abstract description 23
- 230000006641 stabilisation Effects 0.000 abstract 1
- 238000011105 stabilization Methods 0.000 abstract 1
- 230000000087 stabilizing effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 8
- 210000000078 claw Anatomy 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67727—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations using a general scheme of a conveying path within a factory
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J15/00—Gripping heads and other end effectors
- B25J15/0052—Gripping heads and other end effectors multiple gripper units or multiple end effectors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J9/00—Programme-controlled manipulators
- B25J9/02—Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type
- B25J9/04—Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type by rotating at least one arm, excluding the head movement itself, e.g. cylindrical coordinate type or polar coordinate type
- B25J9/041—Cylindrical coordinate type
- B25J9/042—Cylindrical coordinate type comprising an articulated arm
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67346—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders characterized by being specially adapted for supporting a single substrate or by comprising a stack of such individual supports
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67712—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67718—Changing orientation of the substrate, e.g. from a horizontal position to a vertical position
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/6776—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette
- Y10S414/138—Wafers positioned vertically within cassette
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/141—Associated with semiconductor wafer handling includes means for gripping wafer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S901/00—Robots
- Y10S901/30—End effector
- Y10S901/31—Gripping jaw
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Manipulator (AREA)
Abstract
【解決手段】本発明に係るエンドエフェクターは、センタ孔9aを有する基板を鉛直姿勢で支持するものであり、進退方向及び上下方向の動作を駆動源よって制御されるアーム部材6aと、アーム部材6aに取り付けられ、基板9を支持する係止機構6bとを備え、係止機構6bは、センタ孔9a内側の縁部分が載せられる、上方に開放された窪み状の支持溝32が形成された支持ブロック8を有する。また、支持溝32は、センタ孔9a内側の縁部分と4箇所の接点31で接した状態で、鉛直姿勢の基板9を支持することができるため、基板支持姿勢を安定させることができる。
【選択図】図6
Description
これらの基板支持姿勢の異常に起因して、基板移載動作中に基板の外周部と基板ホルダとの接触、または基板の外周部の下端が基板ホルダから脱落することで、基板の受け渡しが失敗する懸念があった。
基板を支持する支持部と、支持部を進退方向及び上下方向に動作させる駆動源とを備え、支持部は、重力方向を横切る方向に連続して形成された断面V字状の支持溝を備え、支持溝の両端部は、基板を支持する際に、センタ孔内側の縁部に接しないように拡幅されていることを特徴とする。また、本発明に係る真空処理装置はこのような基板支持装置を備えることを特徴とする。
図5にピック8の斜視図を示す。支持部としてのピック8は断面V字状の支持溝32を有しており、基板9のセンタ孔9aの内縁上側を支持溝32に載せることで基板を支持することができる。基板9が支持溝32に支持された状態では、支持溝32の水平方向の幅内に基板9の重心が位置するため基板9は確実に支持される。なお、ここでいう断面V字状の溝とは、溝の幅が上方(反重力方向)に向けて徐々に広がる形状の溝をいい、曲面から構成されているものも含むものとする。
UL アンロードチャンバ
LU 移載チャンバ
S,T 真空処理装置
S1 成膜室
GV ゲートバルブ
1 ロボット本体
2 接続フランジ
3 第一アーム
4 第二アーム
5 アダプター
6 エンドエフェクター
6a アーム部材
6b 係止機構
7 ピック接続ブロック
8,38,108 ピック(支持ブロック)
9 基板
10 キャリア
11 スライダー
13 ホルダ
14 基板支持爪
15 ロボット
22 基板搬送路
27 基板収納部
28 基板カセット
30 カセット間移載ロボット
31 接点
32 支持溝
32a 両端部分
39 第1ピック
40 第2ピック
Claims (4)
- センタ孔を有する基板を支持する基板支持装置であって、
前記基板を支持する支持部と、
前記支持部を進退方向及び上下方向に動作させる駆動源とを備え、
前記支持部は、重力方向を横切る方向に連続して形成された断面V字状の支持溝を備え、
前記支持溝の両端部は、前記基板を支持する際に、前記センタ孔内側の縁部に接しないように拡幅されていることを特徴とする基板支持装置。 - 前記支持溝は、反重力方向に凸の円弧状に形成されており、
該円弧の曲率半径は、前記基板の前記センタ孔の曲率半径よりも大きいことを特徴とする請求項1に記載の基板支持装置。 - 前記支持部は、前記支持溝を備えた第1支持ブロックと、前記基板の外周側に接する第2支持ブロックとを有してなることを特徴する請求項1または2に記載の基板支持装置。
- 請求項1乃至3のいずれか1項に記載の基板支持装置を備えることを特徴とする真空処理装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
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JP2010115160A JP5539019B2 (ja) | 2010-05-19 | 2010-05-19 | 基板支持装置及び真空処理装置 |
US13/105,246 US8920107B2 (en) | 2010-05-19 | 2011-05-11 | Substrate support apparatus and vacuum processing apparatus |
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JP2010115160A JP5539019B2 (ja) | 2010-05-19 | 2010-05-19 | 基板支持装置及び真空処理装置 |
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JP2011243780A true JP2011243780A (ja) | 2011-12-01 |
JP5539019B2 JP5539019B2 (ja) | 2014-07-02 |
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US (1) | US8920107B2 (ja) |
JP (1) | JP5539019B2 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JP5582895B2 (ja) * | 2010-07-09 | 2014-09-03 | キヤノンアネルバ株式会社 | 基板ホルダーストッカ装置及び基板処理装置並びに該基板ホルダーストッカ装置を用いた基板ホルダー移動方法 |
US9070730B2 (en) * | 2011-10-07 | 2015-06-30 | Varian Semiconductor Equipment Associates, Inc. | Method and apparatus for removing a vertically-oriented substrate from a cassette |
KR20200078773A (ko) * | 2018-12-21 | 2020-07-02 | 세메스 주식회사 | 반전 유닛 및 이를 가지는 기판 처리 장치 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0523570U (ja) * | 1991-08-27 | 1993-03-26 | 富士通テン株式会社 | プリント回路基板組立装置 |
JPH07243037A (ja) * | 1994-03-07 | 1995-09-19 | Anelva Corp | 薄膜形成方法および装置 |
JPH08161745A (ja) * | 1994-12-06 | 1996-06-21 | Kao Corp | ディスク保持装置 |
JP2000236010A (ja) * | 1999-02-16 | 2000-08-29 | Anelva Corp | 基板支持装置 |
JP2001089851A (ja) * | 1999-09-17 | 2001-04-03 | Anelva Corp | 基板支持装置および基板搬送機構 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
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US5217341A (en) * | 1989-08-18 | 1993-06-08 | Applied Materials, Inc. | Method for aligning wafers within a semiconductor wafer cassette |
JP2756734B2 (ja) * | 1991-03-22 | 1998-05-25 | 大日本スクリーン製造株式会社 | 表面処理装置のウエハ移替装置 |
JP3732250B2 (ja) | 1995-03-30 | 2006-01-05 | キヤノンアネルバ株式会社 | インライン式成膜装置 |
US5980195A (en) * | 1996-04-24 | 1999-11-09 | Tokyo Electron, Ltd. | Positioning apparatus for substrates to be processed |
KR100306301B1 (ko) * | 1998-11-17 | 2001-10-20 | 정문술 | 모듈아이씨핸들러에서고객트레이내의모듈아이씨픽킹방법및그장치 |
JP4526151B2 (ja) | 2000-01-28 | 2010-08-18 | キヤノンアネルバ株式会社 | 基板処理装置の基板移載装置 |
US7654596B2 (en) * | 2003-06-27 | 2010-02-02 | Mattson Technology, Inc. | Endeffectors for handling semiconductor wafers |
JP4871910B2 (ja) * | 2007-05-16 | 2012-02-08 | 株式会社日立ハイテクノロジーズ | ディスクチャック機構およびディスクハンドリングロボット |
JP5570296B2 (ja) | 2010-05-19 | 2014-08-13 | キヤノンアネルバ株式会社 | 基板回転装置及び真空処理装置並びに成膜方法 |
-
2010
- 2010-05-19 JP JP2010115160A patent/JP5539019B2/ja active Active
-
2011
- 2011-05-11 US US13/105,246 patent/US8920107B2/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0523570U (ja) * | 1991-08-27 | 1993-03-26 | 富士通テン株式会社 | プリント回路基板組立装置 |
JPH07243037A (ja) * | 1994-03-07 | 1995-09-19 | Anelva Corp | 薄膜形成方法および装置 |
JPH08161745A (ja) * | 1994-12-06 | 1996-06-21 | Kao Corp | ディスク保持装置 |
JP2000236010A (ja) * | 1999-02-16 | 2000-08-29 | Anelva Corp | 基板支持装置 |
JP2001089851A (ja) * | 1999-09-17 | 2001-04-03 | Anelva Corp | 基板支持装置および基板搬送機構 |
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Publication number | Publication date |
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JP5539019B2 (ja) | 2014-07-02 |
US8920107B2 (en) | 2014-12-30 |
US20110286826A1 (en) | 2011-11-24 |
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