JP2011243748A5 - - Google Patents
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- Publication number
- JP2011243748A5 JP2011243748A5 JP2010114708A JP2010114708A JP2011243748A5 JP 2011243748 A5 JP2011243748 A5 JP 2011243748A5 JP 2010114708 A JP2010114708 A JP 2010114708A JP 2010114708 A JP2010114708 A JP 2010114708A JP 2011243748 A5 JP2011243748 A5 JP 2011243748A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- electronic device
- manufacturing
- forming
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 11
- 238000005530 etching Methods 0.000 claims description 7
- 230000003595 spectral effect Effects 0.000 claims description 5
- 238000002834 transmittance Methods 0.000 claims description 5
- 239000011347 resin Substances 0.000 claims description 4
- 229920005989 resin Polymers 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 3
- 238000009832 plasma treatment Methods 0.000 claims 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010114708A JP5735756B2 (ja) | 2010-05-18 | 2010-05-18 | 電子装置の製造方法 |
| US13/104,269 US8647816B2 (en) | 2010-05-18 | 2011-05-10 | Method of manufacturing electronic device |
| CN201110128547.6A CN102254923B (zh) | 2010-05-18 | 2011-05-18 | 制造电子器件的方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010114708A JP5735756B2 (ja) | 2010-05-18 | 2010-05-18 | 電子装置の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011243748A JP2011243748A (ja) | 2011-12-01 |
| JP2011243748A5 true JP2011243748A5 (enExample) | 2013-06-27 |
| JP5735756B2 JP5735756B2 (ja) | 2015-06-17 |
Family
ID=44972761
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010114708A Active JP5735756B2 (ja) | 2010-05-18 | 2010-05-18 | 電子装置の製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US8647816B2 (enExample) |
| JP (1) | JP5735756B2 (enExample) |
| CN (1) | CN102254923B (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105372726A (zh) * | 2015-12-14 | 2016-03-02 | 中山大学 | 一种金刚石微透镜阵列及其制备方法 |
| KR102749135B1 (ko) * | 2019-03-06 | 2025-01-03 | 삼성전자주식회사 | 이미지 센서 및 이미징 장치 |
| KR20220110783A (ko) * | 2019-12-06 | 2022-08-09 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 광학 층 및 광학 시스템 |
| CN111208961B (zh) * | 2019-12-30 | 2024-07-23 | 西安闻泰电子科技有限公司 | 将镜面影像映射到电子屏幕的装置及方法 |
| CN114078888A (zh) * | 2020-08-14 | 2022-02-22 | 格科微电子（上海）有限公司 | 光学指纹器件 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04268763A (ja) | 1991-02-23 | 1992-09-24 | Sony Corp | オンチップマイクロレンズの形成方法 |
| US5689372A (en) * | 1995-12-22 | 1997-11-18 | Eastman Kodak Company | Integral imaging with anti-halation |
| US5948281A (en) | 1996-08-30 | 1999-09-07 | Sony Corporation | Microlens array and method of forming same and solid-state image pickup device and method of manufacturing same |
| JP4186238B2 (ja) | 1996-08-30 | 2008-11-26 | ソニー株式会社 | マイクロレンズアレイの形成方法及び固体撮像素子の製造方法 |
| KR100595788B1 (ko) | 1998-12-10 | 2006-07-03 | 칼라 액세스, 인크. | 광보호 효과가 강화된 조성물 및 이의 사용 방법 |
| US20060029890A1 (en) * | 2004-08-09 | 2006-02-09 | Sharp Laboratories Of America, Inc. | Lens formation by pattern transfer of a photoresist profile |
| JP4696927B2 (ja) | 2006-01-23 | 2011-06-08 | 凸版印刷株式会社 | マイクロレンズアレイの製造方法 |
| JP5045057B2 (ja) * | 2006-03-13 | 2012-10-10 | 東京エレクトロン株式会社 | プラズマ処理方法 |
| KR100868636B1 (ko) | 2007-08-31 | 2008-11-12 | 주식회사 동부하이텍 | 이미지센서의 제조방법 |
-
2010
- 2010-05-18 JP JP2010114708A patent/JP5735756B2/ja active Active
-
2011
- 2011-05-10 US US13/104,269 patent/US8647816B2/en active Active
- 2011-05-18 CN CN201110128547.6A patent/CN102254923B/zh active Active
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