CN102254923B - 制造电子器件的方法 - Google Patents

制造电子器件的方法 Download PDF

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Publication number
CN102254923B
CN102254923B CN201110128547.6A CN201110128547A CN102254923B CN 102254923 B CN102254923 B CN 102254923B CN 201110128547 A CN201110128547 A CN 201110128547A CN 102254923 B CN102254923 B CN 102254923B
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layer
forming
antihalation
curved convex
material layer
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Chinese (zh)
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CN102254923A (zh
Inventor
渡边杏平
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Canon Inc
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Canon Inc
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
    • H10F39/024—Manufacture or treatment of image sensors covered by group H10F39/12 of coatings or optical elements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/806—Optical elements or arrangements associated with the image sensors
    • H10F39/8063—Microlenses

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  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
CN201110128547.6A 2010-05-18 2011-05-18 制造电子器件的方法 Active CN102254923B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2010-114708 2010-05-18
JP2010114708A JP5735756B2 (ja) 2010-05-18 2010-05-18 電子装置の製造方法

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CN102254923A CN102254923A (zh) 2011-11-23
CN102254923B true CN102254923B (zh) 2014-06-25

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US (1) US8647816B2 (enExample)
JP (1) JP5735756B2 (enExample)
CN (1) CN102254923B (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105372726A (zh) * 2015-12-14 2016-03-02 中山大学 一种金刚石微透镜阵列及其制备方法
KR102749135B1 (ko) * 2019-03-06 2025-01-03 삼성전자주식회사 이미지 센서 및 이미징 장치
JP2023505183A (ja) * 2019-12-06 2023-02-08 スリーエム イノベイティブ プロパティズ カンパニー 光学層及び光学システム
CN111208961B (zh) * 2019-12-30 2024-07-23 西安闻泰电子科技有限公司 将镜面影像映射到电子屏幕的装置及方法
CN114078888A (zh) * 2020-08-14 2022-02-22 格科微电子（上海）有限公司 光学指纹器件

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7713777B2 (en) * 2007-08-31 2010-05-11 Dongbu Hitek Co., Ltd. Method for manufacturing image sensor

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04268763A (ja) 1991-02-23 1992-09-24 Sony Corp オンチップマイクロレンズの形成方法
US5689372A (en) * 1995-12-22 1997-11-18 Eastman Kodak Company Integral imaging with anti-halation
JP4186238B2 (ja) 1996-08-30 2008-11-26 ソニー株式会社 マイクロレンズアレイの形成方法及び固体撮像素子の製造方法
US5948281A (en) 1996-08-30 1999-09-07 Sony Corporation Microlens array and method of forming same and solid-state image pickup device and method of manufacturing same
ATE395104T1 (de) 1998-12-10 2008-05-15 Color Access Inc Zusamensetzung mit verbessertem lichtschutz und verfahren zu deren verwendung
US20060029890A1 (en) * 2004-08-09 2006-02-09 Sharp Laboratories Of America, Inc. Lens formation by pattern transfer of a photoresist profile
JP4696927B2 (ja) 2006-01-23 2011-06-08 凸版印刷株式会社 マイクロレンズアレイの製造方法
JP5045057B2 (ja) * 2006-03-13 2012-10-10 東京エレクトロン株式会社 プラズマ処理方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7713777B2 (en) * 2007-08-31 2010-05-11 Dongbu Hitek Co., Ltd. Method for manufacturing image sensor

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
JP特开平10-148704A 1998.06.02

Also Published As

Publication number Publication date
JP5735756B2 (ja) 2015-06-17
CN102254923A (zh) 2011-11-23
JP2011243748A (ja) 2011-12-01
US20110287368A1 (en) 2011-11-24
US8647816B2 (en) 2014-02-11

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