JP2011241165A5 - - Google Patents

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Publication number
JP2011241165A5
JP2011241165A5 JP2010113935A JP2010113935A JP2011241165A5 JP 2011241165 A5 JP2011241165 A5 JP 2011241165A5 JP 2010113935 A JP2010113935 A JP 2010113935A JP 2010113935 A JP2010113935 A JP 2010113935A JP 2011241165 A5 JP2011241165 A5 JP 2011241165A5
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Japan
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JP2010113935A
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Japanese (ja)
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JP5666170B2 (ja
JP2011241165A (ja
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Publication of JP2011241165A5 publication Critical patent/JP2011241165A5/ja
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JP2010113935A 2010-05-18 2010-05-18 組成物 Active JP5666170B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010113935A JP5666170B2 (ja) 2010-05-18 2010-05-18 組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010113935A JP5666170B2 (ja) 2010-05-18 2010-05-18 組成物

Publications (3)

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JP2011241165A JP2011241165A (ja) 2011-12-01
JP2011241165A5 true JP2011241165A5 (enExample) 2013-07-04
JP5666170B2 JP5666170B2 (ja) 2015-02-12

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ID=45408193

Family Applications (1)

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JP2010113935A Active JP5666170B2 (ja) 2010-05-18 2010-05-18 組成物

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JP (1) JP5666170B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5820572B2 (ja) * 2010-06-21 2015-11-24 ポーラ化成工業株式会社 組成物
JP6194165B2 (ja) * 2012-10-24 2017-09-06 花王株式会社 皮膚外用剤
JP6086705B2 (ja) * 2012-11-14 2017-03-01 ポーラ化成工業株式会社 高い紫外線吸収効果を有する皮膚外用組成物
JP6086706B2 (ja) * 2012-11-14 2017-03-01 ポーラ化成工業株式会社 高い紫外線吸収効果を有する皮膚外用組成物

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3520098A1 (de) * 1985-06-05 1986-12-11 Bayer Ag, 5090 Leverkusen Azolderivate enthaltende formulierungen sowie ihre verwendung zur atraumatischen nagelentfernung
JPH08337511A (ja) * 1995-06-15 1996-12-24 Advanced Sukin Res Kenkyusho:Kk メラニン生成抑制剤
FR2738484B1 (fr) * 1995-09-07 1997-10-03 Oreal Utilisation de l'acide cysteique ou homocysteique pour favoriser la desquamation de la peau ou stimuler le renouvellement epidermique
JP3589785B2 (ja) * 1996-03-27 2004-11-17 ポーラ化成工業株式会社 抗真菌剤
JPH1121225A (ja) * 1997-06-27 1999-01-26 Tanabe Seiyaku Co Ltd 美白用成分およびこれを含有する美白用皮膚外用剤
JP2000109417A (ja) * 1998-10-05 2000-04-18 Pola Chem Ind Inc くすみ改善用の化粧料
JP4249958B2 (ja) * 2002-08-01 2009-04-08 日本メナード化粧品株式会社 特定のジフェニル酢酸エステル及びこれらを含有する皮膚外用剤
JP2005306831A (ja) * 2004-04-20 2005-11-04 Sakamoto Yakusoen:Kk 皮膚外用剤
JP4341501B2 (ja) * 2004-08-10 2009-10-07 東亞合成株式会社 チロシナーゼ活性阻害剤
JP2008105976A (ja) * 2006-10-24 2008-05-08 Shinichiro Isobe 化粧用組成物
RU2537186C2 (ru) * 2008-12-22 2014-12-27 Пола Кемикал Индастриз Инк. Ингибитор продуцирования меланина

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