JP2011224438A - Apparatus and method for cleaning of substrate - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an apparatus and method for cleaning of a substrate, capable of ensuring the effect of cleaning that is uniform and good in both sides, concerning the cleaning of edges of the substrate targeted.SOLUTION: The method includes: controlling first and second on-off valves 29, 30 of first and second cleaner supply mechanisms for supplying a cleaning liquid on respective pressing surfaces of two pressing members sandwiching the edges of the substrate; and performing individual applying operation for supplying the cleaner by using two nozzles to respective pressing surfaces of both sides at a different timing that is temporally separated by a predetermined time lag specified by a predetermined interval time T3. By this arrangement, the effect of cleaning the substrate that is uniform and good in both sides can be ensured, even if using different piping from a supply tank to both sides of edges targeted for supplying the cleaner.

Description

  The present invention relates to a substrate cleaning apparatus and a substrate cleaning method for cleaning an edge of a substrate such as a display panel to remove foreign matters.

  In a manufacturing process of a display panel such as a liquid crystal panel, a sub-substrate is connected to a terminal formed on an edge portion of a glass substrate. As a method for this connection, a method of bonding a sub-substrate to a glass substrate with an anisotropic conductive material is used. Prior to this bonding, the removal of foreign matter adhered to the front and back surfaces of the edge of the glass substrate and the adhesion of ACF (anisotropic conductive adhesive) to be mounted on the glass substrate surface for mounting electronic components Edge cleaning is performed for the purpose of improvement.

  This edge cleaning is performed by cleaning the glass substrate with the cleaning cloth impregnated with the cleaning agent on both the front and back surfaces of the glass substrate against the front and back surfaces by a pair of pressing members and sandwiching the edge portion. This is done by sliding relative to. Thereby, the deposit | attachment adhering to the upper and lower surfaces of a glass plate is wiped off by the washing | cleaning cloth (for example, refer patent document 1). In the prior art shown in this patent document, during the feeding operation of sending the cleaning cloth (cleaning tape), the cleaning agent is continuously discharged from both the upper and lower nozzles to the front and back surfaces of the edge to perform cleaning. The tape is impregnated.

JP 2004-33970 A

  By the way, in order to ensure a good cleaning effect in edge cleaning, it is necessary to uniformly supply an appropriate amount of cleaning agent to both the front and back surfaces. However, the cleaning agent supply method described in the above prior art has a problem that it is difficult to avoid variations in the supply amount of the cleaning agent as described below. That is, the cleaning agent is pumped by a pump from a supply tank provided attached to the apparatus main body, and is supplied to the nozzle via the liquid feeding pipe. However, the liquid supply piping from the supply tank to the front and back sides of the edge to be supplied with the cleaning agent has different piping paths on the front and back sides, and the fouling state inside the piping also varies with time. The liquid feeding state is not always maintained. For this reason, when it apply | coats simultaneously on both front and back, the malfunction which the discharge timing and discharge amount of a cleaning agent varied with front and back occurred, and there existed a problem that it was difficult to ensure the front and back uniform and a favorable cleaning effect.

  Therefore, an object of the present invention is to provide a substrate cleaning apparatus and a substrate cleaning method capable of ensuring a good cleaning effect evenly on the front and back sides in edge cleaning for the edge of the substrate.

  The substrate cleaning apparatus of the present invention is a substrate cleaning apparatus for cleaning an edge portion on which a terminal for external connection is formed on a substrate by a cleaning cloth impregnated with a cleaning agent, the holding table for holding the substrate, A table moving mechanism for moving the holding table up and down and horizontally; a pair of first pressing members that press the cleaning cloth against the front and back surfaces of the edge; a second pressing member; and an opening / closing driving means for opening and closing the pair of pressing members. A holding mechanism, a cross feed mechanism that pulls out the cleaning cloth from the cloth supply means, sends the cloth to the cloth collection means via the respective pressing surfaces of the first pressing member and the second pressing member, and is stored in the cleaning agent storage section. The first cleaning agent supply mechanism, the second cleaning agent supply mechanism, and the first cleaning agent for supplying the cleaning agent to the pressing surfaces of the first pressing member and the second pressing member, respectively. A control unit that controls the agent supply mechanism and the second cleaning agent supply mechanism, and the control unit supplies the cleaning agent to the pressing surfaces of the first pressing member and the second pressing member in a predetermined manner. Supply at different timings separated by time lag.

  The substrate cleaning method of the present invention includes a holding table that holds a substrate, a table moving mechanism that moves the holding table up and down and horizontally, a pair of first pressing members that press a cleaning cloth against both front and back surfaces of the edge of the substrate, A clamping mechanism having a second pressing member and an opening / closing driving means for opening and closing the pair of pressing members, and the cleaning cloth is pulled out from the cloth supply means, and passes through the respective pressing surfaces of the first pressing member and the second pressing member. A first feeding agent supply mechanism for feeding the cleaning agent stored in the cleaning agent reservoir to the respective pressing surfaces of the first pressing member and the second pressing member; A substrate cleaning apparatus having a cleaning agent supply mechanism is used to clean the edge portion of the substrate on which external connection terminals are formed with a cleaning cloth impregnated with the cleaning agent. A substrate cleaning method, wherein the cleaning agent is controlled against the pressing surfaces of the first pressing member and the second pressing member by controlling the first cleaning agent supply mechanism and the second cleaning agent supply mechanism. Are supplied at different timings separated in time by a predetermined time lag.

  According to the substrate cleaning apparatus and the substrate cleaning method of the present invention, the first cleaning agent supply mechanism and the second cleaning agent supply mechanism that supply the cleaning agent to the pressing surfaces of the first pressing member and the second pressing member are controlled. In the edge cleaning for the edge of the substrate, the supply tank is used by supplying a coating agent to each pressing surface at different timings separated by a predetermined time lag. Even when the pipe routes of the liquid feed pipes leading to the front and back surfaces of the edge to be supplied with the cleaning agent are different, it is possible to ensure a uniform and good cleaning effect.

The perspective view of the substrate cleaning device of one embodiment of the present invention The fragmentary perspective view of the board | substrate cleaning apparatus of one embodiment of this invention Configuration explanatory diagram of a cleaning agent supply mechanism in a substrate cleaning apparatus according to an embodiment of the present invention Structure explanatory drawing of the head drive mechanism in the cleaning head of the substrate cleaning apparatus of one embodiment of the present invention Operation | movement explanatory drawing of the press member in the cleaning head of the board | substrate cleaning apparatus of one embodiment of this invention The block diagram which shows the structure of the control system of the substrate cleaning apparatus of one embodiment of this invention The flowchart which shows the board | substrate cleaning method of one embodiment of this invention. The time chart which shows the cleaning agent supply timing in the substrate cleaning method of one embodiment of this invention

  Next, embodiments of the present invention will be described with reference to the drawings. First, the configuration of the substrate cleaning apparatus 1 will be described with reference to FIG. The substrate cleaning apparatus 1 has a function of cleaning an edge portion where a terminal for external connection is formed on a glass substrate such as a display panel with a cleaning cloth impregnated with a cleaning agent.

  In FIG. 1, a panel transport mechanism 3, a table moving mechanism 4, and a wiping / cleaning mechanism 5 are disposed on a base 2. The panel transport mechanism 3 is configured to reciprocate the moving plate 12 in the X direction by a linear motion mechanism including a feed screw 11a, a nut member 11b, and a motor 11M that rotationally drives the nut member 11b. The movable plate 12 is provided with two holding arms 12a extending in the Y direction. The substrate 6 that is transferred from the upstream device and placed on the holding arm 12a is a broken line in the figure. As shown in FIG.

  The substrate 6 has a configuration in which a plurality of glass substrates are laminated, and an external connection terminal 6b is formed on the edge 6a where the lower glass substrate is exposed. The terminal 6b is joined with a flexible board for connecting the sub board on which the driver component is mounted. Prior to this joining operation, the board cleaning apparatus 1 wipes and removes the foreign matter attached to the edge 6a. Partial cleaning work is performed.

  The table moving mechanism 4 has a configuration in which a Y-axis table 13Y, an X-axis table 13X, and a ZΘ-axis table 13ZΘ are stacked, and a holding table 14 that holds the substrate 6 by suction is placed on the ZΘ-axis table 13ZΘ. By driving the table moving mechanism 4, the holding table 14 moves up and down (Z direction) and horizontally (each direction of X, Y, and Θ), and the substrate 6 delivered from the moving table 11 is described below. The wiping and cleaning mechanism 5 is positioned. In this positioning, the table moving mechanism 4 is driven based on the recognition result obtained by imaging the terminal 6b with the imaging device 20 (see FIG. 2) and recognizing it.

  The wiping cleaning mechanism 5 has a function of cleaning the edge portion 6a with a tape-shaped cleaning cloth 7, and a base frame 17 standing vertically on the base 2 has a sandwiching head 15 and a head driving mechanism. 16, a cross supply reel 18 and a cross recovery reel 19 are arranged. At the time of edge cleaning, the nipping head 15 is driven by the head driving mechanism 16 to press the cleaning cloth 7 against both the front and back surfaces of the edge 6a.

  In this state, the table moving mechanism 4 is driven to move the substrate 6 horizontally, whereby the front and back surfaces of the edge 6a are wiped and cleaned by the pressed cleaning cloth 7. The cloth supply reel 18 (cross supply means) stores the cleaning cloth 7 formed of a liquid-absorbing sheet material in a tape shape in a wound state. The cleaning cloth 7 pulled out from the cloth supply reel 18 by the cross feed mechanism 8 is fed to the pinching head 15 and used for edge cleaning, and is then wound around a cloth recovery reel 19 (cross recovery means). Collected.

  Next, the structure of the wiping / cleaning mechanism 5 will be described with reference to FIGS. As shown in FIG. 2, the cross supply reel 18 and the cross recovery reel 19 are coaxially arranged on each surface of the base frame 17. The cross feed mechanism 8 includes two feed drive units each combining a drive roller 22 and a pinch roller 22a, and a drive roller 24 and a pinch roller 24a, and is arranged at an inflection part in the feed path of the cleaning cloth 7. The cross feed is guided by a plurality of guide rollers 21 and 23. By driving the driving rollers 22, 24, the cleaning cloth 7 is pulled out from the cloth supply reel 18 and guided to the sandwiching head 15 (arrow a), and the first pressing member 25 disposed on the sandwiching head 15, The guide roller 23 and the second pressing member 26 are sequentially circulated (arrow b) and collected on the cross collection reel 19.

  FIG. 3 shows details of the arrangement of the first pressing member 25 and the second pressing member 26 in the pinching head 15, the movement path of the cleaning cloth 7, and the supply of the cleaning agent. The first pressing member 25 and the second pressing member 26 have a function of pressing the cleaning cloth 7 against the front surface 6c and the back surface 6d (see FIG. 4B) of the edge portion 6a of the substrate 6 where the lower glass substrate is exposed. is doing. The surface 6c has a shape as described below so that the cleaning cloth 7 can be favorably pressed to the vicinity of the corner.

  As shown in FIG. 4A, the first pressing member 25 is provided with a pressing surface 25a for pressing the cleaning cloth 7 against the upper surface side of the edge portion 6a and the cleaning cloth 7 sent from an obliquely upward direction on the pressing surface 25a. A tapered guide surface 25b for guiding is provided. The second pressing member 26 is provided with a pressing surface 26a for pressing the cleaning cloth 7 against the lower surface side of the edge portion 6a and a guide surface 26b for guiding the cleaning cloth 7 folded back through the pressing surface 26a obliquely downward. ing. The apex side 25c between the pressing surface 25a and the guide surface 25b and the apex side 26c between the pressing surface 26a and the guide surface 26b are both set to have a cross-sectional shape with an acute angle, and the cleaning cloth 7 is used as the edge 6a. It can be surely pressed.

  The cleaning cloth 7 fed by the cross feed mechanism 8 is guided by the guide surface 25b (arrow c), goes around the top side 25c, reaches the lower surface side of the first pressing member 25, and horizontally along the pressing surface 25a. Guided (arrow d) used for cleaning. The cleaning cloth 7 is further turned around the guide roller 23 (see FIG. 2), reaches the upper surface side of the second pressing member 26, is guided along the pressing surface 26a (arrow e), and is used for cleaning. . The subsequent cleaning cloth 7 is guided by the guide surface 26b after circling the top side 26c (arrow f), and further fed by the drive roller 24 (see FIG. 2), thereby being collected on the cloth collection reel 19. Is done. That is, the cross feed mechanism 8 has a function of pulling out the cleaning cloth 7 from the cross supply reel 18 and sending it to the cross collection reel 19 via the pressing surfaces 25a and 26a of the first pressing member 25 and the second pressing member 26. Have.

  In FIG. 3, a first nozzle block 27 and a second nozzle block 28 are attached to the first pressing member 25 and the second pressing member 26, respectively. The first nozzle block 27 and the second nozzle block 28 have the same configuration, and the first nozzle 27a, the second nozzle 28a for discharging a cleaning agent such as an organic solvent and alcohol, and a first for detecting the application state of the cleaning agent, respectively. 1 sensor 27b and 2nd sensor 28b are provided. The first nozzle 27a and the second nozzle 28a are connected to the liquid feed pump 31 through the first on-off valve 29 and the second on-off valve 30, respectively. The liquid feed pump 31 is stored in the cleaning agent storage unit 32. Pump the cleaning agent.

  The liquid feed pump 31, the first on-off valve 29, and the second on-off valve 30 are controlled by the control device 34, and the first on-off valve 29 and the second on-off valve 30 are turned ON / OFF while the liquid feed pump 31 is operated. By turning off, the discharge of the cleaning agent from the first nozzle 27a and the second nozzle 28a (arrows g and h) can be turned ON / OFF. The liquid feed pump 31, the first opening / closing valve 29, and the first nozzle 27 a constitute a first cleaning agent supply mechanism that supplies the cleaning agent stored in the cleaning agent storage unit 32 to the first pressing member 25. 31, the second on-off valve 30, and the second nozzle 28 a constitute a second cleaning agent supply mechanism that supplies the cleaning agent stored in the cleaning agent storage unit 32 to the second pressing member 26. And the control apparatus 34 performs discharge operation of a cleaning agent by controlling the 1st cleaning agent supply mechanism of the above-mentioned structure, and the 2nd cleaning agent supply mechanism.

  The first sensor 27b and the second sensor 28b are fiber sensors that transmit an optical signal through a glass fiber, and output a detection signal that optically detects the application state of the cleaning agent discharged to the cleaning cloth 7. have. The first sensor 27b and the second sensor 28b are mounted in positions adjacent to and parallel to the first nozzle 27a and the second nozzle 28a, respectively, with the detection surface facing the cleaning agent discharge direction (arrow g, h direction). ing. The first sensor 27b and the second sensor 28b are respectively connected to the application detection unit 33. Based on the detection signals transmitted from the first sensor 27b and the second sensor 28b, the application detection unit 33 has the pressing surface 25a and the pressing surface. The application state of the cleaning agent in 26a is detected. The first sensor 27 b, the second sensor 28 b, and the application detection unit 33 constitute an application detection device 36. The detection result is transmitted to the control device 34, and the control device 34 performs necessary control processing according to the detection result. That is, if it is detected that the coating amount is less than the prescribed amount, a warning message to that effect is displayed on the display device 38, and if the state continues for a predetermined time or longer, the cleaning operation is performed. Stop.

  In FIG. 4B, the first pressing member 25 and the second pressing member 26 in a state where the cleaning cloth 7 is impregnated with the cleaning agent are driven by the head driving mechanism 16 to sandwich the edge portion 6a. Indicates the state. That is, the first pressing member 25 and the second pressing member 26 are moved in the closing direction in the direction in which they approach each other (arrows k and l), and the pressing surface 25a and the pressing surface 26a are respectively connected to the front surface 6c and the back surface via the cleaning cloth 7. Press against 6d. In this state, the table moving mechanism 4 is driven to horizontally move the substrate 6 in the cleaning operation direction (X direction), whereby the front and back surfaces of the edge portion 6a are cleaned and adhered by the cleaning cloth 7 impregnated with the cleaning agent. Edge cleaning is performed to remove foreign matter.

  Here, the configuration of the head drive mechanism 16 that opens and closes the first pressing member 25 and the second pressing member 26 in the holding head 15 will be described with reference to FIG. The head drive mechanism 16 includes cylinders 41 and 42 disposed on the side surface of the vertical plate 16a erected on one side of the base frame 17 so that the rods 41a and 42a face each other vertically. The rods 41 a and 42 a are coupled via a coupling member 43 to link members 44 and 45 that are inserted through the opening 17 a provided in the base frame 17 and project to the opposite surface side.

  The link members 44, 45 are coupled to elevating blocks 48, 49, and the elevating blocks 48, 49 are disposed so as to be slidable up and down by a slide mechanism including a guide rail 46 and a slider 47. A first pressing member 25 and a second pressing member 26 are coupled to the elevating blocks 48 and 49, respectively. By driving the cylinders 41 and 42, the first pressing member 25 and the second pressing member 26 are mutually connected. Moves up and down in the direction of approaching / separating (arrows m, n). Here, a spring 50 is interposed between the elevating blocks 48 and 49, so that the height position of the substrate 6 to be sandwiched between the first pressing member 25 and the second pressing member 26 varies. However, in the range of the elastic force of the spring 50, a floating operation in which the holding height position between the first pressing member 25 and the second pressing member 26 is made to follow the height of the substrate 6 is realized.

  In the above configuration, the head driving mechanism 16 is an opening / closing driving means for opening and closing the pair of first pressing member 25 and second pressing member 26 that press the cleaning cloth 7 on both the front and back surfaces of the edge 6a. The sandwiching head 15 is a sandwiching mechanism having a first pressing member 25, a second pressing member 26, and an opening / closing driving means.

  Next, the configuration of the control system will be described with reference to FIG. In FIG. 6, the control device 34 controls each part of the panel transport mechanism 3, the table moving mechanism 4, the cross feed mechanism 8, the head drive mechanism 16, the cleaning agent supply mechanism 35, and the display device 38. In this control process, input from the application detection device 36, the imaging device 20, and the input device 37 and data stored in the storage device 39 are referred to. Here, the data stored in the storage device 39 includes data defining the application sequence of the cleaning agent and the application pattern, and the interval time when the two nozzles are applied alternately and alternately.

  The control device 34 controls the panel transport mechanism 3 and the table moving mechanism 4 to perform the delivery of the substrate 6 and the positioning with respect to the wiping cleaning mechanism 5. Based on the position recognition result acquired by the imaging device 20 at this time, The position of the substrate 6 is corrected. Further, the controller 34 controls the cross feed mechanism 8, the head drive mechanism 16, and the cleaning agent supply mechanism 35, whereby the substrate cleaning operation for the edge 6 a by the wiping cleaning mechanism 5 is executed. At this time, the application order input from the input device 37 and the detection result of the application state by the application detection device 36 are referred to.

  Next, the operation of applying the cleaning agent in the substrate cleaning operation will be described with reference to FIGS. In FIG. 7, the application order is first designated (ST1). That is, with respect to the two nozzles of the first nozzle 27a and the second nozzle 28a, the designation of the “front nozzle” that executes the application of the cleaning agent first and the “rear nozzle” that executes the application of the cleaning agent later are input to the input device. This is done by inputting from 37. Thereby, the application | coating order in the application | coating of the cleaning agent which made object the front and back of the following edge part 6a is set. Here, an example is shown in which the first nozzle 27a is designated as the front nozzle and the second nozzle 28a is designated as the rear nozzle.

  When the application operation is started, first, the cleaning agent is discharged from the nozzle at a predetermined time / predetermined number of times by the first nozzle 27a, which is the first nozzle, and applied to the cleaning cloth 7 (ST2). That is, the control device 34 controls the first on-off valve 29 and the second on-off valve 30 to turn on / off the first on-off valve 29 in a predetermined pattern P between timings t1 and t2, as shown in FIG. As a result, a coating operation for discharging the cleaning agent from the first nozzle 27a and applying the cleaning agent to the cleaning cloth 7 is executed. Here, an example of a pattern in which the ON operation for turning on the first opening / closing valve 29 only during the discharge time T1 is executed a plurality of times (here, twice) at the interval time T2 is shown.

  Next, from the timing t2 when the application operation by the first nozzle 27a is finished, the system waits for a preset interval time T3 (ST3), and then at the timing t3 when the waiting for the time is completed, the second nozzle 28a, which is the rear nozzle. The application operation is started (ST4). That is, when the second opening / closing valve 30 is turned on / off by the pattern P described above, a coating operation for discharging the cleaning agent from the second nozzle 28a and applying it to the cleaning cloth 7 is executed. Thereafter, the same coating operation is alternately performed by the first nozzle 27a and the second nozzle 28a. Even in this case, the coating operation by the other nozzle is started at the timing when the waiting for the preset interval time T3 is completed from the timing when the coating operation by one nozzle is completed.

  That is, in the above-described substrate cleaning method, the control device 34 (control unit) determines the predetermined time defined by the interval time T3 with respect to the pressing surfaces 25a and 26a of the first pressing member 25 and the second pressing member 26, respectively. The cleaning agent is supplied at different timings separated by time lag. As a result, it is possible to prevent variations in the supply amount of the cleaning agent that has occurred in the conventional supply of the cleaning agent.

  That is, in the prior art, the discharge timings of the two nozzles that supply the cleaning agent to the front and back surfaces of the edge 6a are set to be the same, so the discharge amount of the cleaning agent discharged from these nozzles is from the pump to the nozzles. It was different depending on the difference in flow path resistance of the piping route to reach. On the other hand, in the substrate cleaning method shown in the present embodiment, the discharge timing of the cleaning agent by each of the first nozzle 27a and the second nozzle 28a is set to different timings separated in time by a predetermined time lag. For this reason, in the case where the cleaning agent is discharged simultaneously from the two nozzles, it is possible to prevent the variation in the discharge amount caused by the difference in the piping characteristics, and to ensure a good cleaning effect with the front and back surfaces being uniform.

  The substrate cleaning apparatus and the substrate cleaning method of the present invention have an effect of ensuring a good cleaning effect on the front and back surfaces in the edge cleaning for the edge of the substrate. This is useful for cleaning an edge portion where a terminal for external connection is formed.

DESCRIPTION OF SYMBOLS 1 Substrate cleaning apparatus 3 Panel transport mechanism 4 Table moving mechanism 5 Wiping cleaning mechanism 6 Substrate 6a Edge 6b Terminal 7 Cleaning cloth 8 Cross feed mechanism 14 Holding table 15 Nipping head 16 Head drive mechanism 18 Cross supply reel 19 Cross recovery reel 25 1st press member 25a, 26a Press surface 27a 1st nozzle 28a 2nd nozzle 29 1st on-off valve 30 2nd on-off valve 31 Liquid feed pump 32 Cleaning agent storage part

Claims (2)

A substrate cleaning apparatus for cleaning an edge portion where a terminal for external connection is formed on a substrate with a cleaning cloth impregnated with a cleaning agent,
A holding table that holds the substrate; a table moving mechanism that moves the holding table up and down and horizontally; a pair of first pressing members that press the cleaning cloth against both front and back surfaces of the edge, a second pressing member, and a pair of these A clamping mechanism having an opening / closing driving means for opening and closing the pressing member;
A cross feed mechanism for pulling out the cleaning cloth from the cloth supply means and sending it to the cloth collection means via the respective pressing surfaces of the first pressing member and the second pressing member;
A first cleaning agent supply mechanism, a second cleaning agent supply mechanism for supplying the cleaning agent stored in the cleaning agent reservoir to the pressing surfaces of the first pressing member and the second pressing member, and the first cleaning. A controller for controlling the agent supply mechanism and the second cleaning agent supply mechanism,
The control unit supplies the cleaning agent to the pressing surfaces of the first pressing member and the second pressing member at different timings separated by a predetermined time lag. Substrate cleaning device. A holding table for holding the substrate; a table moving mechanism for moving the holding table up and down and horizontally; a pair of first pressing members, a second pressing member for pressing the cleaning cloth against both front and back surfaces of the edge of the substrate; A clamping mechanism having an opening / closing drive means for opening and closing the pressing member, and a cross feed that draws the cleaning cloth from the cloth supply means and sends it to the cloth recovery means via the respective pressing surfaces of the first pressing member and the second pressing member. A mechanism, and a first cleaning agent supply mechanism and a second cleaning agent supply mechanism for supplying the cleaning agent stored in the cleaning agent reservoir to the respective pressing surfaces of the first pressing member and the second pressing member. A substrate cleaning method in which the edge portion on which the terminal for external connection is formed on the substrate is cleaned by a cleaning cloth impregnated with the cleaning agent by a substrate cleaning apparatus,
By controlling the first cleaning agent supply mechanism and the second cleaning agent supply mechanism, the cleaning agent is temporally applied to the pressing surfaces of the first pressing member and the second pressing member with a predetermined time lag. A substrate cleaning method, wherein the substrate is supplied at different timings separated by each other.

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