JP2011204944A - Substrate processing apparatus and substrate processing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a substrate processing method that excellently carry out substrate processing using processing liquid and make a processing time shorter.SOLUTION: The substrate processing apparatus 1 includes a processing chamber 10 in which a substrate W is processed using the processing liquid, a container holding portion 4 which holds a substrate container 17, and an indexer robot 6, a shuttle transfer mechanism 7 and a main transfer robot 9 which transfer the substrate W between the container holding portion 4 and processing chamber 10. A lamp house which emits ultraviolet rays of 172 nm in center frequency is provided above a shuttle transfer space 14 where the shuttle transfer mechanism 7 is installed. While the substrate W is transferred by the shuttle transfer mechanism 7, the substrate W being transferred is irradiated with the ultraviolet rays to carry out processing wherein organic matter sticking on the substrate W is decomposed and removed and an oxide film is formed on a surface of the substrate W.

Description

  The present invention relates to a substrate processing apparatus and a substrate processing method for performing processing using a processing liquid on a substrate. Examples of substrates to be processed include semiconductor wafers, liquid crystal display substrates, plasma display substrates, FED (Field Emission Display) substrates, optical disk substrates, magnetic disk substrates, magneto-optical disk substrates, and photomasks. Substrate, solar cell substrate and the like.

  For example, in a manufacturing process of a semiconductor device, processing using a processing liquid is performed on the surface of a semiconductor substrate (hereinafter simply referred to as “substrate”). Various types of processing liquid are used as the processing liquid depending on the content of the processing. For example, hydrofluoric acid used for the etching process of the oxide film on the substrate surface, SPM (mixed solution of sulfuric acid and hydrogen peroxide solution) used for the resist peeling process for removing the resist on the substrate surface, and the oxide film formation on the substrate surface Hydrogen peroxide water and ozone water, APM (a mixture of ammonia and hydrogen peroxide solution) used to remove organic substances on the substrate surface, IPA (isopropyl alcohol) used in the drying process after the substrate is rinsed with pure water, etc. Is mentioned. For example, in a single wafer type substrate processing apparatus, a substrate is processed by supplying these processing liquids to the surface of a substrate that is held horizontally and rotating.

JP 2009-267145 A

  However, in processing using these processing liquids, depending on the type of film formed on the surface of the substrate to be processed, it is necessary to supply the processing liquid to the substrate for a long time in order to perform the desired processing. There has been a problem that the processing time of the substrate becomes long and the consumption of the processing liquid increases. Further, by supplying the treatment liquid to the substrate, impurities contained in the treatment liquid may adhere to the substrate surface, and it has been necessary to remove these impurities from the substrate surface.

  SUMMARY OF THE INVENTION An object of the present invention is to provide a substrate processing apparatus and a substrate processing method that can satisfactorily treat a substrate surface in processing using a processing liquid and that can further reduce the processing time of the substrate. is there.

  The invention described in claim 1 for achieving the above object is a substrate processing apparatus (1) for processing a substrate, wherein the substrate processing section (for processing the substrate with a processing liquid) 10), a container holder (4) for holding a substrate container for storing a substrate, and a substrate transfer means (6, 7) for transferring a substrate between the container holder and the substrate processing unit. 9), and an ultraviolet irradiating means (57, 57) for irradiating the substrate being conveyed by the substrate conveying means with an ultraviolet ray centered at a wavelength of 172 nm, provided in the substrate conveying space where the substrate conveying means is arranged. 58). In addition, the alphanumeric characters in parentheses represent corresponding components in the embodiments described later. The same applies hereinafter.

  According to the present invention, the substrate processing unit can process the substrate with the processing liquid, and the substrate is transferred between the container holding unit and the substrate processing unit by the substrate transfer unit. At that time, the substrate transport space in which the substrate transport means is disposed is provided with ultraviolet irradiation means for generating ultraviolet rays centered on a wavelength of 172 nm (hereinafter simply referred to as “ultraviolet rays”). The substrate being transported is irradiated with ultraviolet rays from the ultraviolet irradiation means. Thus, the substrate transported from the container holding unit to the substrate processing unit is irradiated with ultraviolet rays while being transported by the substrate transporting unit before being processed by the processing liquid in the substrate processing unit. Alternatively, after the substrate processing unit performs processing with the processing liquid, the substrate transported to the container holding unit is irradiated with ultraviolet rays while being transported by the substrate transporting means.

Here, the operation and effect when the substrate surface is irradiated with ultraviolet rays will be described. Ultraviolet rays centered at a wavelength of 172 nm are absorbed by oxygen in the atmosphere to generate excited oxygen atoms. The ultraviolet rays are absorbed by oxygen in the atmosphere to generate ozone. Further, excited oxygen atoms are also generated from the generated ozone. In addition, since the ultraviolet rays have a function of breaking the molecular bonds of the organic matter, the organic matter adhering to the substrate surface is easily decomposed when irradiated with the ultraviolet rays. When the decomposed organic substance reacts with the excited oxygen atom, it becomes a volatile substance such as CO, CO ₂ , H ₂ O, and is volatilized and removed. In this way, by irradiating the substrate surface with ultraviolet rays, the organic matter adhering to the substrate is decomposed and removed. Moreover, the hydrophilicity of the substrate surface is improved by removing the organic matter adhering to the substrate surface. Moreover, there is an effect that an oxide film is formed on the substrate surface by generating ozone.

  Therefore, according to the present invention, organic substances on the substrate surface are removed or an oxide film is formed on the substrate surface by irradiating ultraviolet rays onto the substrate surface being transferred before or after the treatment with the treatment liquid. Processing can be performed. Thereby, the time required for the treatment with the treatment liquid can be shortened. In addition, the consumption of the processing liquid can be reduced. Further, according to the present invention, since the ultraviolet irradiation is performed in parallel with the substrate being transported, the substrate can be subjected to the processing by the ultraviolet irradiation without reducing the throughput of the apparatus. Thereby, the substrate surface can be processed satisfactorily and the processing time of the substrate can be further shortened.

  The invention according to claim 2 further comprises oxygen concentration adjusting means (60, 62, 66, 67, 68, 70, 74, 75) for adjusting the oxygen concentration in the substrate transfer space. 1. The substrate processing apparatus according to 1.

  According to this invention, the oxygen concentration in the substrate transfer space is adjusted by the oxygen concentration adjusting means. Thereby, since the oxygen concentration in the atmosphere when ultraviolet rays are irradiated by the ultraviolet irradiation means is adjusted, it is possible to adjust the amounts of excited oxygen atoms and ozone generated by the ultraviolet irradiation. Accordingly, it is possible to select by the oxygen concentration adjusting means whether the substrate W is subjected to the organic substance removing process on the substrate surface with excited oxygen atoms or the oxide film forming process with ozone.

  The oxygen concentration adjusting means includes inert gas supply means (60, 66, 68, 74) for supplying a gas containing an inert gas into the substrate transfer space, and the inert gas supply means supplies the inert gas. The oxygen concentration in the substrate transfer space may be adjusted by adjusting the supply amount. (Claim 3)

  According to this invention, the gas containing the inert gas is supplied into the substrate transfer space by the inert gas supply means, and the oxygen concentration in the substrate transfer space is adjusted by adjusting the supply amount of the inert gas. Can do. Specifically, the oxygen concentration in the substrate transport space can be lowered by increasing the supply amount of the inert gas, and the oxygen concentration in the substrate transport space can be increased by decreasing the supply amount of the inert gas. can do. By reducing the oxygen concentration in the substrate transfer space, organic substance removal treatment on the substrate surface by excited oxygen atoms generated by ultraviolet irradiation can be performed. On the other hand, by increasing the oxygen concentration in the substrate transfer space, the amount of ozone generated by ultraviolet irradiation increases, so that an oxide film forming process on the substrate surface can be performed.

  The inert gas supply means includes supply direction change means (60, 62, 66, 67, 68, 70, 74, 75) for changing a supply direction of a gas containing an inert gas, and the supply direction change means includes: The supply direction of the gas containing the inert gas may be changed according to the substrate transfer direction by the substrate transfer means. (Claim 4)

  According to this invention, the supply direction of the gas containing the inert gas in the substrate transfer space can be changed by the supply direction changing means. Thereby, the supply direction of the gas containing the inert gas can be changed according to the transport direction of the substrate being transported by the substrate transport means. Specifically, when the substrate transport direction is changed, the supply direction changing unit sets the gas including the inert gas from the downstream side to the upstream side in the substrate transport direction. . Thereby, since the inert gas concentration on the substrate surface can be further increased, the oxygen concentration on the substrate surface can be reduced.

  The ultraviolet irradiating unit may irradiate the substrate being transported to the container holding unit with ultraviolet rays after being processed in the substrate processing unit. (Claim 5)

  According to this invention, it is possible to irradiate the substrate after the processing with the processing liquid in the substrate processing unit by the ultraviolet irradiation means. Thereby, the impurities adhering to the substrate surface can be removed by ultraviolet irradiation by supplying the treatment liquid to the substrate. In addition, an oxide film formation process by ultraviolet irradiation can be performed on the substrate that has been subjected to the process using the process liquid. The oxide film formation process may be performed by supplying a treatment liquid such as hydrogen peroxide water or ozone water to the substrate, but according to the present invention, the oxide film can be formed without using the treatment liquid. it can. Therefore, the consumption of the processing liquid can be suppressed. In addition, since the oxide film forming process can be performed in parallel with the transport of the substrate, the processing time of the substrate can be shortened.

  The ultraviolet irradiation means may irradiate the unprocessed substrate being transferred from the container holding unit to the substrate processing unit with ultraviolet rays. (Claim 6)

  According to this invention, it is possible to irradiate the untreated substrate before being treated with the treatment liquid in the substrate treating unit by the ultraviolet irradiating means. Thereby, the organic matter adhering to the surface of the untreated substrate can be decomposed and removed by irradiation with ultraviolet rays. Therefore, the hydrophilicity of the substrate surface can be improved. Therefore, in the treatment with the treatment liquid performed thereafter, the reactivity of the treatment liquid with respect to the substrate surface is improved, and the treatment with the treatment liquid can be performed more efficiently. Therefore, the processing time by the processing liquid in the substrate processing unit can be shortened, and the consumption of the processing liquid can be suppressed. In addition, an oxide film forming process by ultraviolet irradiation can be performed on an unprocessed substrate before being processed with the processing liquid. The oxide film formation process may be performed by supplying a treatment liquid such as hydrogen peroxide water or ozone water to the substrate, but according to the present invention, the oxide film can be formed without using the treatment liquid. it can. Therefore, the consumption of the processing liquid can be suppressed. In addition, since the oxide film forming process can be performed in parallel with the transfer of the substrate, the processing time of the substrate can be shortened.

  The ultraviolet irradiation means may be an excimer lamp (58) that generates ultraviolet light centered on a wavelength of 172 nm. (Claim 7)

  According to an eighth aspect of the present invention, there is provided a substrate processing step (S4, S5, S6, S14, S15) for processing a substrate with a processing liquid in a substrate processing section, and a container for holding a substrate container for storing the substrate. A substrate transporting step (S1, S2, S3, S7, S8, S9, S11, S12, S13, S17, S18, S19) for transporting the substrate between the holding unit and the substrate processing unit; The substrate processing method is characterized by comprising an ultraviolet irradiation step (S8, S12) that is performed in parallel and that irradiates the substrate being transported with ultraviolet rays centered on a wavelength of 172 nm. According to the present invention, an effect similar to the effect described in relation to claim 1 can be obtained.

  The ultraviolet irradiation process may be performed after the substrate processing process. (Embodiment 9) According to the present invention, an effect similar to that described in relation to claim 5 can be obtained.

  The ultraviolet irradiation step may be performed prior to the substrate processing step. (Claim 10) According to the present invention, the same effect as described in relation to claim 6 can be obtained.

1 is a schematic plan view of a substrate processing apparatus according to first and second embodiments of the present invention. It is a schematic side view of the processing chamber according to the first and second embodiments of the present invention. It is an illustration side view of the shuttle conveyance space concerning the 1st and 2nd embodiment of the present invention. It is a block diagram which shows the electric constitution of the substrate processing apparatus which concerns on 1st, 2nd embodiment of this invention. It is a flowchart which shows the processing operation by the substrate processing apparatus which concerns on 1st Embodiment of this invention. It is a flowchart which shows the processing operation by the substrate processing apparatus which concerns on 2nd Embodiment of this invention.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. FIG. 1 is a schematic plan view of a substrate processing apparatus 1 according to a first embodiment of the present invention. The substrate processing apparatus 1 is a single-wafer type apparatus that is installed in a clean room and processes substrates W such as semiconductor wafers one by one.

  The substrate processing apparatus 1 is disposed side by side on a processing unit 2 that performs processing on a substrate W, an indexer unit 3 coupled to one side of the processing unit 2, and the processing unit 2 on the opposite side of the indexer unit 3. A plurality (three in FIG. 1) of container holders 4 are provided. The container holder 4 is for holding the substrate container 17 and is arranged along a predetermined horizontal direction (Y direction shown in FIG. 1). The substrate container 17 is, for example, a FOUP (Front Opening Unified Pod) that accommodates 25 substrates W in a sealed state. An opening (not shown) for taking out the substrate W is formed on one side surface of the substrate container 17, and the opening is opened and closed by a lid (not shown) on one side surface of the substrate container 17. .

  The indexer section 3 is formed with an indexer transport path 5 having a length in the arrangement direction of the container holders 4. An indexer robot 6 is disposed in the indexer transport path 5. The indexer robot 6 is provided so as to be able to reciprocate along the indexer transport path 5, and can face the substrate container 17 held by each container holding unit 4. The indexer robot 6 includes an arm and a hand (not shown) that is coupled to the tip of the arm and holds the substrate W, and accommodates the substrate while facing the substrate container 17. The hand can be accessed to the container 17 to take out the unprocessed substrate W from the substrate container 17 and store the processed substrate W in the substrate container 17. The indexer robot 6 is of a double arm type having an upper hand and a lower hand. Further, the indexer robot 6 is located in the central portion of the indexer transport path 5 and allows the hand to access the processing unit 2 to deliver an unprocessed substrate W to the shuttle transport mechanism 7 to be described later, The processed substrate W can be received from 7.

  The processing section 2 extends from the center of the indexer transport path 5 of the indexer section 3 in the horizontal direction (X direction shown in FIG. 1) perpendicular to the indexer transport path 5 and can communicate with the internal space of the indexer section 3. A transport path 8 is formed. In the center of the transport path 8, a double arm type main transport robot 9 having an upper hand and a lower hand is disposed. In the processing unit 2, four processing chambers 10 are arranged so as to surround the main transfer robot 9. Each processing chamber 10 is for performing predetermined processing (processing using a processing liquid) on the substrate W. A fluid box 11 is arranged at a position adjacent to each processing chamber 10 in the X direction. The fluid box 11 includes pipes, joints, valves, flow meters, regulators, pumps, temperature regulators, processing liquid storage tanks, etc. for supplying processing liquids to the processing chambers 10 and discarding processing liquids from the processing chambers 10. Contains fluid related equipment.

  The main transfer robot 9 makes the hand access to a shuttle transfer mechanism 7 to be described later, receives an unprocessed substrate W from the shuttle transfer mechanism 7, and delivers a processed substrate W to the shuttle transfer mechanism 7. Can do. Further, the main transfer robot 9 can access the hands to the plurality of processing chambers 10, and can transfer the substrates W to / from each processing chamber 10.

  The transport path 8 is provided with a shuttle transport mechanism 7 that mediates transfer of the substrate W between the indexer robot 6 and the main transport robot 9. The shuttle transport mechanism 7 is provided so as to be movable along the X direction in the transport path 8, and can reciprocate between a position near the indexer robot 6 and a position near the main transport robot 9. In a state where the indexer robot 6 is disposed in the vicinity, the unprocessed substrate W can be received from the indexer robot 6 or the processed substrate W can be transferred to the indexer robot 6. (In FIG. 1, it is indicated by a solid line and is hereinafter referred to as a first delivery position.) In the state of being disposed in the vicinity of the main transfer robot 9, an unprocessed substrate W is transferred to the main transfer robot 9 or a processed substrate W is transferred. It can be received from the main transfer robot 9. (In FIG. 1, it is indicated by a broken line and is hereinafter referred to as a second delivery position.)

  A first partition 12 is provided between the moving area of the shuttle transport mechanism 7 and the indexer transport path 5, and a second partition 13 is provided between the moving area of the shuttle transport mechanism 7 and the main transport robot 9. It has been. Therefore, the shuttle transport mechanism 7 is disposed in the shuttle transport space 14 surrounded by the first partition wall 12, the second partition wall 13, the surrounding processing chamber 10, and the fluid box 11. The shuttle transfer space 14 is atmospherically isolated from the transfer path 8 in which the indexer transfer path 5 and the main transfer robot 9 are provided. Moreover, the 1st partition 12 is provided with the 1st window part 15, and the 1st window part 15 is comprised by the shutter so that opening and closing is possible. When the transfer of the substrate W is performed between the indexer robot 6 and the shuttle transport mechanism 7, the first window is opened and the transfer of the substrate W is performed. On the other hand, the 2nd partition 13 is provided with the 2nd window part 16, and the 2nd window part 16 is also comprised by the shutter so that opening and closing is possible. When the transfer of the substrate W is performed between the main transfer robot 9 and the shuttle transfer mechanism 7, the second window is opened and the transfer of the substrate W is performed. Details of the shuttle transport mechanism 7 and the shuttle transport space 14 will be described later.

  FIG. 2 is a schematic side view of the processing chamber 10. The processing chamber 10 includes a spin chuck 21 that holds the substrate W substantially horizontally, a rinse nozzle 22 that supplies pure water as an example of a rinse liquid to the surface of the substrate W held by the spin chuck 21, and a spin chuck. A chemical nozzle 23 for supplying a chemical solution to the surface of the substrate W held by the substrate 21 and a blocking plate 24 for blocking the atmosphere near the surface of the substrate W held by the spin chuck 21 from its surroundings. Yes.

  The spin chuck 21 has a configuration in which a disc-shaped spin base 26 is mounted substantially horizontally on the upper end of a spin shaft 25 extending substantially vertically. On the upper surface of the spin base 26, a plurality of clamping members 27 are arranged at substantially equal intervals on a circumference centered on the central axis of the spin shaft 5. The plurality of clamping members 27 can hold the substrate W in a substantially horizontal posture by clamping the end face of the substrate W at a plurality of different positions.

  A motor 28 is coupled to the spin shaft 25. The spin shaft 25 can be rotated around its central axis by the rotational force generated by the motor 28. The substrate W can be rotated together with the spin base 26 by rotating the spin shaft 25 while the substrate W is held by the plurality of clamping members 27.

  The rinse nozzle 22 is attached to the tip of an arm 49 provided above the spin chuck 21. The arm 49 is supported by an arm support shaft 29 extending substantially vertically on the side of the spin chuck 21, and extends substantially horizontally from the arm support shaft 29. An arm drive mechanism 30 is coupled to the arm support shaft 29. By inputting a driving force from the arm drive mechanism 30 to the arm support shaft 29 and rotating the arm support shaft 29 within a predetermined angle range, the arm 49 can be swung within the predetermined angle range. ing.

  A rinse liquid supply pipe 31 is connected to the rinse nozzle 22. A rinsing liquid valve 32 is interposed in the middle of the rinsing liquid supply pipe 31. When the rinse liquid valve 32 is opened, pure water is supplied from the rinse liquid supply pipe 31 to the rinse nozzle 22.

  The chemical nozzle 23 is disposed above the spin chuck 21 with the discharge port directed toward the rotation center of the substrate W. A chemical liquid supply pipe 33 is connected to the chemical liquid nozzle 23. A chemical liquid valve 34 is interposed in the middle of the chemical liquid supply pipe 33. When the chemical liquid valve 34 is opened, the chemical liquid is supplied from the chemical liquid supply pipe 34 to the chemical liquid nozzle 33.

  The blocking plate 24 is formed in a disc shape having a diameter substantially the same as or larger than that of the substrate W, and is disposed substantially horizontally above the spin chuck 21. On the upper surface of the blocking plate 24, a rotation shaft 35 centering on a vertical axis common to the spin shaft 25 of the spin chuck 21 is fixed. The rotating shaft 35 is formed hollow. An IPA distribution pipe 36 is inserted into the rotary shaft 35.

  An IPA supply pipe 37 is connected to the IPA distribution pipe 36. Through this IPA supply pipe 37, a normal temperature (about 25 ° C.) IPA (isopropyl alcohol) solution is supplied to the IPA distribution pipe 36. An IPA valve 38 is interposed in the middle of the IPA supply pipe 37. The IPA flow pipe 36 extends to the lower surface of the blocking plate 24, and the tip thereof forms an IPA nozzle 39 for discharging the IPA liquid.

  Further, a nitrogen gas flow passage 40 through which nitrogen gas flows is formed between the inner wall surface of the rotating shaft 35 and the IPA flow pipe 36. A nitrogen gas supply pipe 41 is connected to the nitrogen gas flow passage 40. Through this nitrogen gas supply pipe 41, nitrogen gas from a supply source (not shown) is supplied to the nitrogen gas flow passage 40. A nitrogen gas valve 42 is interposed in the middle of the nitrogen gas supply pipe 41. The nitrogen gas flow passage 40 is annularly opened around the IPA nozzle 39 on the lower surface of the blocking plate 24 to form a nitrogen gas discharge port 43 for discharging nitrogen gas.

  The rotary shaft 35 is attached in a state of hanging from the vicinity of the tip of an arm 44 extending substantially horizontally. The arm 44 is separated from the position where the blocking plate 24 is greatly spaced above the spin chuck 21 (the position indicated by the solid line in FIG. 2) and the surface of the substrate W held by the spin chuck 21 with a small gap. A blocking plate lifting / lowering drive mechanism 45 for moving up and down between adjacent positions (positions indicated by broken lines in FIG. 2) is coupled. Further, in connection with the arm 44, a blocking plate rotation drive mechanism 46 is provided for rotating the blocking plate 24 almost in synchronization with the rotation of the substrate W by the spin chuck 21.

  The spin chuck 21 is accommodated in a cup 47 having a bottomed cylindrical container. A waste liquid line 48 is connected to the bottom of the cup 47. Through this waste liquid line 48, the liquid (chemical solution, rinse solution, IPA solution) collected at the bottom of the cup 47 can be discarded.

  FIG. 3 is a schematic side view of the shuttle transport space 14. A shuttle transport mechanism 7 and a lamp house 57 are arranged in the shuttle transport space 14. The shuttle transport mechanism 7 includes a shuttle main body 51, hands 52 and 53, elevating cylinders 54 and 55, and a transport rail 56. The elevating cylinders 54 and 55 are fixed to the shuttle main body 51. The hand 52 is fixed to the upper end of the elevating cylinder 54, and the hand 53 is fixed to the upper end of the elevating cylinder 55. When the substrate W is transported, the substrate W is held on the upper surface side of the hands 52 and 53. A transport rail 56 is disposed along the X direction at the bottom of the shuttle transport space 14. The shuttle main body 51 is installed on the transport rail 56 and is configured to be capable of reciprocating between the first delivery position and the second delivery position along the transport rail 56.

  The hand 52 and the hand 53 are arranged one above the other. The hands 52 and 53 are switched between an open state separated from each other and a closed state close to each other by the elevating cylinders 54 and 55. Instead of the elevating cylinders 54 and 55 that drive the hands 52 and 53 independently, a mechanism that drives the hands 52 and 53 integrally to switch between the open state and the closed state may be used.

  In the shuttle transport space 14, the presence or absence of the substrate W on the hands 52 and 53 is detected by a sensor (not shown). In order to easily perform the detection, the hand 52 and the hand 53 are arranged so as to be shifted from each other in the horizontal direction. Note that the hand 53 may be disposed immediately above the hand 52 as long as the presence or absence of the substrate W on the hands 52 and 53 can be detected.

  A lamp house 57 is installed above the shuttle conveyance space 14. The lamp house 57 includes a plurality of excimer lamps 58. The excimer lamp 58 generates ultraviolet rays centered at a wavelength of 172 nm. Ultraviolet light emitted from the excimer lamp 58 passes through the quartz glass 59 provided on the lower surface of the lamp house 57 and is irradiated onto the substrate W held by the hands 52 and 53.

  A first air supply / exhaust port 60 is provided above the first partition wall 12. The first air supply / exhaust port 60 is provided so as to extend along the Y direction of the shuttle transport space 14. A first air supply / exhaust pipe 61 is connected to the first air supply / exhaust port 60, and the first air supply / exhaust pipe 61 is connected to an exhaust mechanism (not shown). A first exhaust valve 62 is interposed in the middle of the first supply / exhaust pipe 61. A first gas supply pipe 63 is branchedly connected to the first supply / exhaust pipe 61. The first gas supply pipe 63 is further branched into a first nitrogen gas supply pipe 64 and a first clean air supply pipe 65. A nitrogen gas supply source (not shown) is connected to the first nitrogen gas supply pipe 64, and a clean air supply source (not shown) is connected to the first clean air supply pipe 65. A first nitrogen gas valve 66 is interposed in the first nitrogen gas supply pipe 64, and a first clean air valve 67 is interposed in the first clean air supply pipe 65. As a result, nitrogen gas, clean air, or a mixed gas thereof can be supplied from the first air supply / exhaust port 60 to the shuttle transport space 14, or the interior of the shuttle transport space 14 can be exhausted from the first air supply / exhaust port 60.

  A second air supply / exhaust port 68 is provided above the second partition wall 16. The second air supply / exhaust port 68 is provided so as to extend along the Y direction of the shuttle transport space 14. A second air supply / exhaust pipe 69 is connected to the second air supply / exhaust port 68, and the second air supply / exhaust pipe 69 is connected to an exhaust mechanism (not shown). A second exhaust valve 70 is interposed in the middle of the second supply / exhaust pipe 69. A second gas supply pipe 71 is branched and connected to the second supply / exhaust pipe 69. The second gas supply pipe 71 is further branched into a second nitrogen gas supply pipe 72 and a second clean air supply pipe 73. A nitrogen gas supply source is connected to the second nitrogen gas supply pipe 72, and a clean air supply source is connected to the second clean air supply pipe 73. A second nitrogen gas valve 74 is interposed in the second nitrogen gas supply pipe 72, and a second clean air valve 75 is interposed in the second clean air supply pipe 73. Thereby, nitrogen gas, clean air, or a mixed gas thereof can be supplied from the second air supply / exhaust port 68 to the shuttle transport space 14, or the shuttle transport space 14 can be exhausted from the second air supply / exhaust port 68.

  FIG. 4 is a block diagram showing an electrical configuration of the substrate processing apparatus 1. The substrate processing apparatus 1 is provided with a control device 80 composed of, for example, a microcomputer. The microcomputer includes a CPU, RAM, ROM, and the like. The control device 80 drives the indexer robot 6, shuttle transport mechanism 7, main transport robot 9, motor 28, arm drive mechanism 30, shield plate lifting / lowering drive mechanism 45, and shield plate rotation drive mechanism 46 according to a predetermined program. Control, rinse liquid valve 32, chemical liquid valve 34, IPA valve 38, nitrogen gas valve 42, first exhaust valve 62, first nitrogen gas valve 66, first clean air valve 67, second exhaust valve 70, second nitrogen gas valve 74, The opening and closing of the second clean air valve 75 is controlled. Further, the irradiation operation of the lamp house 57 is controlled.

  Next, the processing operation of the substrate W by the substrate processing apparatus 1 will be described. FIG. 5 is a flowchart of the processing operation of the substrate W by the substrate processing apparatus 1 of the first embodiment. In the processing chamber 10 of the substrate processing apparatus 1, the surface of the substrate W is cleaned with hydrofluoric acid (HF). Further, after the rinsing process, a solvent drying process is performed in which an organic solvent (for example, IPA) is supplied and then dried.

  First, the substrate container 17 in which the unprocessed substrate W is accommodated is transported to one of the container holders 4 by a transport mechanism (not shown) and is held by the container holder 4. The indexer robot 6 moves to a position facing the substrate container 17, moves the hand to the substrate container 17, takes out an unprocessed substrate W from the substrate container 17, and positions it opposite the shuttle transport mechanism 7. It moves to (the center part of the indexer conveyance path 5). The shuttle transport mechanism 7 is located at the first delivery position. When the shutter of the first window portion 15 is opened, the indexer robot 6 causes the hand holding the unprocessed substrate W to access the hand 52 of the shuttle transport mechanism 7 and receives the unprocessed substrate W in the hand 52. (Step S1).

  The shuttle transport mechanism 7 that has received the unprocessed substrate W moves from the first delivery position to the second delivery position. At this time, the lamp house 57 is not irradiated with ultraviolet rays. The shuttle transport mechanism 7 that has moved to the second delivery position is configured such that the hand of the main transport robot 9 accesses below the hand 52 of the shuttle transport mechanism 7 while the shutter of the second window portion 16 is opened. W is transferred to the main transfer robot 9 (step S2).

  The main transfer robot 9 carries the unprocessed substrate W into the processing chamber 10 and delivers it to the spin chuck 21 (step S3). At this time, the blocking plate 24 is retracted to a position far above the spin chuck 21 so as not to hinder the loading of the substrate W. Further, the rinse nozzle 22 (arm 49) is retracted from above the spin chuck 21 so as not to hinder the loading of the substrate W.

  When the substrate W is held on the spin chuck 21, the motor 28 is driven to start the rotation of the substrate W. The rotation speed of the substrate W is, for example, 1000 rpm. Then, the chemical liquid valve 34 is opened, and chemical liquid (hydrofluoric acid) is supplied from the chemical liquid nozzle 23 toward the center of the surface of the rotating substrate W. The chemical solution supplied to the center of the surface of the substrate W spreads to the peripheral edge of the substrate W due to the centrifugal force generated by the rotation of the substrate W, and is supplied to the entire surface of the substrate W. As a result, the entire surface of the substrate W is treated with a chemical solution (cleaned with hydrofluoric acid) (chemical solution treatment; step S4). When the chemical solution is supplied to the surface of the substrate W over a predetermined time, the chemical solution valve 34 is closed, and the chemical treatment is completed. Next, the drive of the arm drive mechanism 30 is controlled, and the rinse nozzle 22 is disposed above the substrate W held by the spin chuck 21.

  Then, the rinse liquid valve 32 is opened, and the substrate W is rotated by the spin chuck 21, and pure water is supplied to the surface of the substrate W from the rinse nozzle 22. Further, when pure water is supplied, the arm 49 is swung within a predetermined angle range. Accordingly, the pure water landing position on the surface of the substrate W moves while drawing an arc-shaped locus within a range from the rotation center of the substrate W to the peripheral edge of the substrate W. As a result, pure water is supplied uniformly over the entire surface of the substrate W, and the chemical solution adhering to the surface of the substrate W is washed away with pure water (rinse treatment; step S5).

  The pure water supplied to the surface of the substrate W is scattered from the periphery of the substrate W to the side by the centrifugal force generated by the rotation of the substrate W. The pure water scattered from the substrate W is collected at the bottom of the cup 47 and discarded via the waste liquid line 48. When supplying pure water, the rinse nozzle 22 does not move from the rotation center of the substrate W to the peripheral edge of the substrate W, and the pure water is supplied to the substrate W while the rinse nozzle 22 is fixed above the substrate W. May be.

  When a predetermined time elapses after the rinse liquid valve 32 is opened, the rinse liquid valve 32 is closed. Then, the drive of the arm drive mechanism 30 is controlled, and the rinse nozzle 22 (arm 49) is retracted from above the spin chuck 21.

  Next, the driving of the shield plate lifting / lowering drive mechanism 45 is controlled, and the shield plate 24 is lowered to a position close to the surface of the substrate W. Then, the driving of the shield plate rotation drive mechanism 46 is controlled, and the shield plate 24 is rotated in the same direction as the substrate W at the same rotational speed. On the other hand, the nitrogen gas valve 42 is opened, and nitrogen gas is supplied between the substrate W (the surface thereof) and the blocking plate 24 from the nitrogen gas discharge port 43. Further, the IPA valve 38 is opened, and the IPA liquid is supplied from the IPA nozzle 39 to the surface of the substrate W. While the IPA liquid is supplied to the surface of the substrate W, the substrate W is rotated at a predetermined rotation speed (for example, 1000 rpm). As a result, the IPA liquid spreads uniformly over the entire surface of the substrate W, and good replacement of the pure water with the IPA liquid is achieved over the entire surface of the substrate W.

  When a predetermined time elapses after the IPA valve 38 is opened, the IPA valve 38 is closed. Then, the drive of the motor 28 is controlled, and the rotation speed of the substrate W is increased to a predetermined rotation speed (for example, 3000 rpm). Thereby, the IPA liquid adhering to the surface of the substrate W is removed by being shaken off by the centrifugal force (drying process; step S6). The IPA liquid removed from the substrate W is collected at the bottom of the cup 47 and discarded via the waste liquid line 48.

  When a predetermined time elapses after the supply of the IPA liquid is stopped, the nitrogen gas valve 42 is closed. Further, the driving of the motor 28 is stopped, and the rotation of the substrate W is stopped. Further, the drive of the shield plate lifting / lowering drive mechanism 45 is controlled, and the shield plate 24 is raised from a position close to the surface of the substrate W to a position far away above the spin chuck 21. Thereby, the chemical solution process, the rinse process, and the drying process for the substrate W are completed. Then, the hand of the main transfer robot 9 enters the processing chamber 10 and unloads the processed substrate W from the processing chamber 10.

  The processed substrate W unloaded from the processing chamber 10 is transferred to the hand 53 of the shuttle transfer mechanism 7 located at the second transfer position by the main transfer robot 9 with the second window portion 16 opened. (Step S7). After the substrate W is delivered to the shuttle transport mechanism 7, the shutter of the second window portion 16 is closed. The shuttle transport mechanism 7 that has received the processed substrate W moves from the second delivery position to the first delivery position.

  At this time, the lamp house 57 irradiates the processed substrate W being transported with ultraviolet rays. In addition, the nitrogen gas is blown out from the first air supply / exhaust port 60 and exhausted from the second air supply / exhaust port 68 at the same time or immediately before the substrate W is delivered to the shuttle transport mechanism 7, thereby causing the interior of the shuttle transport space 14 to be exhausted. Is a nitrogen gas atmosphere. Specifically, the first nitrogen gas valve 66 is opened, and the first clean air valve 67 and the first exhaust valve 62 are closed. On the other hand, the second exhaust valve 70 is opened, and the second nitrogen gas valve 74 and the second clean air valve 75 are closed. Thus, nitrogen gas is ejected from the first supply / exhaust port 60 through the first nitrogen gas supply pipe 64, the first gas supply pipe 63, and the first supply / exhaust pipe 61 from the nitrogen gas supply source, and the second supply Exhaust is performed from the exhaust port 68 toward the exhaust mechanism via the second air supply / exhaust pipe 69.

  Therefore, an air flow of nitrogen gas that flows from the first delivery position to the second delivery position is formed in the shuttle transport space 14. Therefore, a nitrogen gas atmosphere is formed on the surface of the processed substrate W held by the hand 53 of the shuttle transport mechanism 7. Accordingly, the processed substrate W held by the hand 53 of the shuttle transport mechanism 7 is transported from the second delivery position to the first delivery position, and at the same time, irradiated with ultraviolet rays from the lamp house 57 in a nitrogen gas atmosphere. Is done. The shuttle transport mechanism 7 that has moved to the first delivery position delivers the substrate W to the hand of the indexer robot 6 that has accessed under the hand 53 with the shutter of the first window 15 opened (step S8). . The indexer robot 6 stores the received processed substrate W in the substrate container 17 (step S9).

  As described above, in the first embodiment, the substrate W processed in the processing chamber 10 is irradiated with ultraviolet rays having a wavelength of 172 nm as the center until the substrate W is transferred from the processing chamber 10 to the container holder 4. . Specifically, when the shuttle transport mechanism 7 transports from the second delivery position to the first delivery position, ultraviolet light is irradiated from the lamp house 57 installed in the upper part of the shuttle transport space 14. At this time, nitrogen gas is supplied from the first air supply / exhaust port 60 toward the second air supply / exhaust port 68 in the shuttle conveyance space 14. Therefore, the substrate W that has been processed with the processing liquid (chemical solution, rinsing liquid, IPA liquid) in the processing chamber 10 is irradiated with ultraviolet rays while being transported until it is accommodated in the substrate container 17, thereby the substrate. Organic substances adhering to W are decomposed and removed.

  In the first embodiment, the IPA liquid is supplied to the substrate W in the processing chamber 10. The IPA liquid that is an organic solvent may contain organic impurities. By supplying the IPA liquid to the substrate W, these organic impurities adhere to the surface of the substrate W, and after the drying process is completed. It may remain on the substrate W. In addition, organic impurities contained in the IPA liquid may float in the atmosphere in the processing chamber 10, and these organic impurities may be reattached to the substrate W after the drying process. Therefore, such organic impurities can be decomposed and removed by irradiating the substrate W that has been processed with the processing liquid in the processing chamber 10 with ultraviolet rays. Further, in the first embodiment, since the ultraviolet irradiation to the substrate W is performed in parallel with the transport operation by the shuttle transport mechanism 7, the processing by the ultraviolet irradiation is performed on the substrate without reducing the throughput of the apparatus. Can do.

  In the organic substance decomposition / removal process by ultraviolet irradiation, excited oxygen atoms are generated by absorbing ultraviolet rays centered at a wavelength of 172 nm to atmospheric oxygen, and the excited oxygen atoms are decomposed by ultraviolet rays on the substrate W. By reacting with the organic substance, it becomes a volatile substance and is volatilized and removed. On the other hand, the ultraviolet rays are absorbed by oxygen in the atmosphere to generate ozone, which acts on the surface of the substrate W and forms an oxide film on the surface of the substrate W. Therefore, the action on the substrate W differs depending on the oxygen concentration in the air atmosphere when the ultraviolet rays are irradiated. By reducing the oxygen concentration in the atmosphere, organic substances on the surface of the substrate W are more efficiently decomposed and removed. be able to. In the first embodiment, nitrogen gas is supplied from the first air supply / exhaust port 60 onto the surface of the substrate W so as to go backward in the direction in which the substrate W is transported. A gas atmosphere can be obtained. Therefore, the oxygen concentration on the surface of the substrate W can be reduced, and organic substances on the surface of the substrate W can be decomposed and removed more efficiently.

  In the first embodiment, the IPA liquid is used as the organic solvent supplied to the substrate W, but an organic solvent other than the IPA liquid may be used. For example, a liquid containing at least one of HFE (hydrofluoroether), methanol, ethanol, acetone, and Trans-1,2 dichloroethylene may be used. Moreover, it may be a liquid mixed with other components as well as a case of consisting of only a single component. For example, a mixed liquid of IPA liquid and pure water may be used, or a mixed liquid of IPA liquid and HFE may be used.

  Next explained is the second embodiment of the invention. The configuration of the substrate processing apparatus 1 of the second embodiment is the same as that of the first embodiment. The difference from the first embodiment is that when the substrate W before processing in the processing chamber 10 is transported from the first delivery position to the second delivery position by the shuttle transport mechanism 7, the lamp house. 57 is irradiated with ultraviolet rays. Hereinafter, the processing operation of the substrate W by the substrate processing apparatus 1 of the second embodiment will be described.

  FIG. 6 is a flowchart for explaining the processing operation of the substrate W of the second embodiment in the substrate processing apparatus 1. In the second embodiment, the substrate W after the ion implantation process or the dry etching process for implanting impurities into the surface of the substrate W is processed. A resist film that is no longer needed is formed on the surface of the substrate W, and a resist removal process for removing the resist film is performed.

  First, the substrate container 17 in which the unprocessed substrate W is accommodated is transported to one of the container holders 4 by a transport mechanism (not shown) and is held by the container holder 4. The indexer robot 6 moves to a position facing the substrate container 17, moves the hand to the substrate container 17, takes out an unprocessed substrate W from the substrate container 17, and positions it opposite the shuttle transport mechanism 7. It moves to (the center part of the indexer conveyance path 5). The shuttle transport mechanism 7 is located at the first delivery position. When the shutter of the first window portion 15 is opened, the indexer robot 6 causes the hand holding the unprocessed substrate W to access the hand 53 of the shuttle transport mechanism 7 and receives the unprocessed substrate W in the hand 53. (Step S11)

  The shuttle transport mechanism 7 that has received the unprocessed substrate W moves from the first delivery position to the second delivery position. At this time, the lamp house 57 irradiates the unprocessed substrate W being transferred with ultraviolet rays. Further, at the same time as or immediately before the transfer of the substrate W to the shuttle transport mechanism 7, nitrogen gas is ejected from the second air supply / exhaust port 68 and exhausted from the first air supply / exhaust port 60, whereby the shuttle transport space 14. The inside is a nitrogen gas atmosphere.

  Specifically, the second nitrogen gas valve 74 is opened, and the second clean air valve 75 and the second exhaust valve 70 are closed. On the other hand, the first exhaust valve 62 is opened, and the first nitrogen gas valve 66 and the first clean air valve 67 are closed. As a result, nitrogen gas is ejected from the second supply / exhaust port 68 through the second nitrogen gas supply line 72, the second gas supply line 71, and the second supply / exhaust line 69 from the nitrogen gas supply source, and the first supply Exhaust is performed from the exhaust port 60 toward the exhaust mechanism via the first air supply / exhaust pipe 61.

  Accordingly, an air flow of nitrogen gas flowing from the second delivery position toward the first delivery position is formed in the shuttle transport space 14. Therefore, a nitrogen gas atmosphere is formed on the surface of the unprocessed substrate W held by the hand 53 of the shuttle transport mechanism 7. As described above, the unprocessed substrate W held by the hand 53 of the shuttle transport mechanism 7 is transported from the first delivery position to the second delivery position, and at the same time, from the lamp house 57 in the nitrogen gas atmosphere. Is irradiated. The shuttle transport mechanism 7 that has moved to the second delivery position is configured so that the hand of the main transport robot 9 accesses under the hand 53 of the shuttle transport mechanism 7 while the shutter of the second window portion 16 is opened, thereby W is transferred to the main transfer robot 9 (step S12).

  The main transfer robot 9 carries the unprocessed substrate W into the processing chamber 10 and delivers it to the spin chuck 21 (step S13). At this time, the blocking plate 24 is retracted to a position far above the spin chuck 21 so as not to hinder the loading of the substrate W. Further, the rinse nozzle 22 (arm 49) is retracted from above the spin chuck 21 so as not to hinder the loading of the substrate W.

  When the substrate W is held on the spin chuck 21, the motor 28 is driven to start the rotation of the substrate W. The rotation speed of the substrate W is, for example, 1000 rpm. Then, the chemical solution valve 34 is opened, and SPM (mixed solution of sulfuric acid and hydrogen peroxide solution) is supplied as a chemical solution from the chemical solution nozzle 23 toward the center of the surface of the rotating substrate W. The SPM supplied to the center of the surface of the substrate W spreads to the peripheral edge of the substrate W due to the centrifugal force generated by the rotation of the substrate W, and is supplied to the entire surface of the substrate W. As a result, the entire surface of the substrate W is processed by SPM (chemical solution processing; step S14). That is, the strong oxidizing power of SPM supplied to the surface of the substrate W acts on the resist, and the resist is removed from the surface of the substrate W.

  In the chemical processing in which the chemical solution is supplied to the substrate W in this way, the processing proceeds when the chemical solution in contact with the surface of the substrate W reacts with the film material on the surface of the substrate W. In the second embodiment, prior to the chemical treatment, the surface of the substrate W is irradiated with ultraviolet rays, so that the organic matter adhering to the unprocessed substrate W is decomposed and removed. As a result, the hydrophilicity of the surface of the substrate W is improved, so that the chemical solution easily comes into contact with the surface of the substrate W. Accordingly, the reactivity of the chemical solution to the surface of the substrate W is improved, and the processing of the substrate W by the chemical solution is promoted.

  When the SPM is supplied to the surface of the substrate W over a predetermined time, the chemical valve 34 is closed and the chemical processing is finished. Next, the drive of the arm drive mechanism 30 is controlled, and the rinse nozzle 22 is disposed above the substrate W held by the spin chuck 21.

  Then, the rinse liquid valve 32 is opened, and the substrate W is rotated by the spin chuck 21, and pure water is supplied to the surface of the substrate W from the rinse nozzle 22. Further, when pure water is supplied, the arm 49 is swung within a predetermined angle range. Accordingly, the pure water landing position on the surface of the substrate W moves while drawing an arc-shaped locus within a range from the rotation center of the substrate W to the peripheral edge of the substrate W. As a result, pure water is supplied uniformly over the entire surface of the substrate W, and the SPM adhering to the surface of the substrate W is washed away with pure water (rinse treatment; step S15).

  The pure water supplied to the surface of the substrate W is scattered from the periphery of the substrate W to the side by the centrifugal force generated by the rotation of the substrate W. The pure water scattered from the substrate W is collected at the bottom of the cup 47 and discarded via the waste liquid line 48. In addition, when supplying pure water, the rinse nozzle 22 does not move from the rotation center of the substrate W to the peripheral edge of the substrate W, and the rinse nozzle 22 is fixed above the substrate W so that pure water is supplied to the substrate W. You may supply.

  When a predetermined time elapses after the rinse liquid valve 32 is opened, the rinse liquid valve 32 is closed. Then, the drive of the arm drive mechanism 30 is controlled, and the rinse nozzle 22 (arm 49) is retracted from above the spin chuck 21.

  Next, the driving of the shield plate lifting / lowering drive mechanism 45 is controlled, and the shield plate 24 is lowered to a position close to the surface of the substrate W. Then, the driving of the shield plate rotation drive mechanism 46 is controlled, and the shield plate 24 is rotated in the same direction as the substrate W at the same rotational speed. On the other hand, the nitrogen gas valve 42 is opened, and nitrogen gas is supplied between the substrate W (the surface thereof) and the blocking plate 24 from the nitrogen gas discharge port 43. Then, the drive of the motor 28 is controlled, and the rotation speed of the substrate W is increased to a predetermined rotation speed (for example, 3000 rpm). Thereby, the pure water adhering to the surface of the substrate W is shaken off by the centrifugal force to be removed (drying process; step S16). The pure water removed from the substrate W is collected at the bottom of the cup 47 and discarded through the waste liquid line 48.

  When a predetermined time elapses while the substrate W is rotated at a predetermined rotation speed, the nitrogen gas valve 42 is closed. Further, the driving of the motor 28 is stopped, and the rotation of the substrate W is stopped. Further, the drive of the shield plate lifting / lowering drive mechanism 45 is controlled, and the shield plate 24 is raised from a position close to the surface of the substrate W to a position far away above the spin chuck 21. Thereby, the chemical solution process, the rinse process, and the drying process for the substrate W are completed. Then, the hand of the main transfer robot 9 enters the processing chamber 10 and unloads the processed substrate W from the processing chamber 10.

  The processed substrate W unloaded from the processing chamber 10 is moved by the main transfer robot 9 with the shutter 52 of the second window 16 opened, and the hand 52 of the shuttle transfer mechanism 7 positioned at the second delivery position. (Step S17). The shuttle transport mechanism 7 that has received the processed substrate W moves from the second delivery position to the first delivery position. At this time, the lamp house 57 is not irradiated with ultraviolet rays. The shuttle transport mechanism 7 that has moved to the first delivery position delivers the substrate W to the hand of the indexer robot 6 that has accessed under the hand 52 with the shutter of the first window portion 15 opened (step S18). . The indexer robot 6 stores the received processed substrate W in the substrate container 17 (step S19).

  As described above, in the second embodiment, the unprocessed substrate W before being processed in the processing chamber 10 is centered on the wavelength of 172 nm before being transported from the container holder 4 to the processing chamber 10. Ultraviolet rays are irradiated. Specifically, when the shuttle transport mechanism 7 transports from the first delivery position to the second delivery position, ultraviolet light is irradiated from the lamp house 57 installed in the upper part of the shuttle transport space 14. Further, nitrogen gas is supplied from the second air supply / exhaust port 68 toward the first air supply / exhaust port 60 in the shuttle transport space 14 at this time. Therefore, the unprocessed substrate W before being processed in the processing chamber 10 is irradiated with ultraviolet rays before being carried into the processing chamber 10, and organic substances attached to the substrate W are decomposed and removed. Therefore, the hydrophilicity of the surface of the substrate W is improved, and the chemical solution supplied to the substrate W after that is more likely to come into contact with the surface of the substrate W, and the reactivity with the film on the surface of the substrate W is improved. Thereby, the process of the board | substrate W by a chemical | medical solution is accelerated | stimulated. Therefore, the time required for the treatment with the chemical solution can be shortened. Thereby, since the surface of the substrate W can be processed with a small amount of the chemical solution, the consumption amount of the chemical solution can be reduced. Furthermore, in the present embodiment, since the ultraviolet irradiation to the substrate W is performed in parallel with the transport operation by the shuttle transport mechanism 7, the processing by the ultraviolet irradiation can be performed on the substrate without reducing the throughput of the apparatus. .

  Also in the second embodiment, nitrogen gas is supplied from the second air supply / exhaust port 68 onto the surface of the substrate W so as to go backward in the direction in which the substrate W is transported. A nitrogen gas atmosphere can be used. Therefore, the oxygen concentration on the surface of the substrate W can be reduced, and organic substances on the surface of the substrate W can be decomposed and removed more efficiently.

  Although the first and second embodiments of the present invention have been described above, the present invention can also be implemented in other forms. In the first and second embodiments described above, the organic substance on the surface of the substrate W is decomposed and removed by irradiating the substrate W with ultraviolet rays before or after the treatment with the treatment liquid in the treatment chamber 10. An oxide film may be formed on the surface of the substrate W by irradiating the substrate with ultraviolet rays. Hereinafter, this embodiment will be described.

  In the first and second embodiments described above, when the surface of the substrate W is irradiated with ultraviolet rays in the shuttle transport space 14, the substrate W travels backward from the first air supply / exhaust port 60 or the second air supply / exhaust port 68. As described above, nitrogen gas is supplied onto the surface of the substrate W. Thereby, the organic substance adhering to the surface of the substrate W is decomposed and removed by irradiating the substrate W with ultraviolet rays in a state where the surface of the substrate W is more nitrogen gas.

  On the other hand, when the substrate W is irradiated with ultraviolet rays from the lamp house 57, an oxide film is formed on the surface of the substrate W by increasing the oxygen concentration in the atmosphere in the shuttle transport space 14. For example, when an oxide film is formed on the surface of the substrate W before being processed in the processing chamber 10, the second nitrogen is transferred when the substrate W is transferred from the first transfer position to the second transfer position by the shuttle transfer mechanism 7. The gas valve 74 and the second clean air valve 75 are opened, the second exhaust valve 70 is closed, the first exhaust valve 62 is opened, and the first nitrogen gas valve 66 and the first clean air valve 67 are closed. Thereby, nitrogen gas is ejected from the second supply / exhaust port 68 through the second nitrogen gas supply pipe 72, the second gas supply pipe 71, and the second supply / exhaust pipe 69 from the nitrogen gas supply source, and clean air is supplied. Clean air is ejected from the second air supply / exhaust port 68 through the second clean air supply pipe 73, the second gas supply pipe 71 and the second air supply / exhaust pipe 69 from the source. Then, exhaust is performed from the first air supply / exhaust port 60 toward the exhaust mechanism via the first air supply / exhaust pipe 61.

  Therefore, a mixed air flow of nitrogen gas and clean air that flows from the second delivery position toward the first delivery position is formed in the shuttle transport space 14. Accordingly, an atmosphere having a higher oxygen concentration is formed on the surface of the substrate W transported by the shuttle transport mechanism 7 than when only nitrogen gas is ejected. In this state, when the substrate W is irradiated with ultraviolet rays from the lamp house 57, ozone generated by absorbing the ultraviolet rays into the oxygen in the atmosphere acts on the surface of the substrate W, thereby oxidizing the surface of the substrate W. A film is formed.

  As described above, the unprocessed substrate W held by the hand 53 of the shuttle transport mechanism 7 is transported from the first delivery position to the second delivery position, and at the same time, an oxide film is formed on the surface thereof. In addition, an oxide film formed by ozone generated by ultraviolet irradiation can have a lower surface roughness than an oxide film formed by supplying a chemical solution (hydrogen peroxide water or ozone water). In this way, the oxide film is formed by irradiating the surface of the substrate W with ultraviolet rays simultaneously with the transfer of the substrate W, thereby performing an oxide film forming process with a subsequent processing liquid (for example, hydrogen peroxide water or ozone water). Therefore, the processing time of the substrate W can be shortened. In addition, the consumption of the processing liquid can be suppressed. Further, since the ultraviolet irradiation is performed in parallel while the substrate W is being conveyed, the substrate can be subjected to the processing by the ultraviolet irradiation without reducing the throughput of the apparatus. Thereby, the substrate surface can be processed satisfactorily and the processing time of the substrate can be further shortened.

  When an oxide film is formed on the surface of the substrate W after the processing in the processing chamber 10 is performed, when the substrate W is transferred from the second transfer position to the first transfer position by the shuttle transfer mechanism 7. The first nitrogen gas valve 66 and the first clean air valve 67 are opened, the first exhaust valve 62 is closed, the second exhaust valve 70 is opened, and the second nitrogen gas valve 74 and the second clean air valve 75 are closed. As a result, nitrogen gas is ejected from the first supply / exhaust port 60 through the first nitrogen gas supply pipe 64, the first gas supply pipe 63, and the first supply / exhaust pipe 61 from the nitrogen gas supply source, and clean air is supplied. Clean air is jetted from the first air supply / exhaust port 60 through the first clean air supply pipe 65, the first gas supply pipe 63 and the first air supply / exhaust pipe 61 from the source. Then, exhaust is performed from the second air supply / exhaust port 68 toward the exhaust mechanism via the second air supply / exhaust pipe 69.

  Therefore, a mixed air flow of nitrogen gas and clean air that flows from the first delivery position to the second delivery position is formed in the shuttle transport space 14. In this state, an ultraviolet ray is irradiated from the lamp house 57, whereby an oxide film can be formed on the surface of the substrate W. As described above, after the processing with the processing liquid is performed in the processing chamber 10, the substrate W is transferred from the processing chamber 10 to the substrate container 17, and at the same time, an oxide film forming process is performed on the surface of the substrate W. Can do. Therefore, it is possible to omit the oxide film forming process by the processing liquid (for example, hydrogen peroxide water or ozone water) in the processing chamber 10 and to shorten the substrate processing time. In addition, the consumption of the processing liquid can be suppressed. In addition, since the ultraviolet irradiation is performed in parallel with the substrate being transported, the substrate can be subjected to the ultraviolet irradiation without reducing the throughput of the apparatus. Thereby, the substrate surface can be processed satisfactorily and the processing time of the substrate can be further shortened.

  In the first and second embodiments described above, the ultraviolet rays are irradiated only during the transfer process before or after the processing in the processing chamber 10, but both before and after the processing in the processing chamber 10. It is good also as a structure which irradiates with an ultraviolet-ray in this conveyance process. For example, the organic matter adhering to the surface of the substrate W may be removed by irradiating with ultraviolet rays in both the pre-processing and post-processing transport processes of the processing chamber 10, or the surface of the substrate W may be removed. A treatment for forming an oxide film may be performed. Further, either before or after the processing of the processing chamber 10, an organic substance removing process by ultraviolet irradiation may be performed, and an oxide film forming process by ultraviolet irradiation may be performed by the other.

  In the first and second embodiments described above, the lamp house 57 is provided above the shuttle transport space 14 in which the shuttle transport mechanism 7 is disposed, and the substrate W is irradiated with ultraviolet rays simultaneously with the transport by the shuttle transport mechanism 7. Although it is configured, the lamp house 57 may be provided above the indexer transport path 5 where the indexer robot 6 is disposed. Then, the substrate W may be irradiated with ultraviolet rays during transport by the indexer robot 6. Alternatively, a lamp house 57 may be provided above the transfer path 8 where the main transfer robot 9 is arranged so that the substrate W is irradiated with ultraviolet rays when transferred by the main transfer robot 9.

  In the second embodiment described above, when the substrate W is irradiated with ultraviolet rays, the shuttle transport space 14 is supplied with a mixed gas of clean air and nitrogen gas. However, only clean air is supplied. You may do it. Even with such a configuration, an oxide film forming process on the surface of the substrate W can be performed. Alternatively, the oxygen concentration in the shuttle transport space 14 may be adjusted by increasing or decreasing the supply flow rate of nitrogen gas to the shuttle transport space 14 without supplying clean air.

  Further, the process performed in the processing chamber 10 may be a process other than the cleaning process using HF as in the first embodiment and the resist removal process using SPM as in the second embodiment. . For example, a polymer removing process for removing a polymer (resist residue) from the surface of the substrate W by supplying a polymer removing solution such as APM (ammonia-hydrogen peroxide mixture), hydrofluoric acid, sulfuric acid, nitric acid , Hydrochloric acid, phosphoric acid, acetic acid, ammonia, hydrogen peroxide solution, citric acid, oxalic acid, TMAH, aqua regia, and an etching solution containing at least one of oxide film and metal from the surface of the substrate W An etching process for removing a thin film by etching may be used.

  In addition, various design changes can be made within the scope of the matters described in the claims.

DESCRIPTION OF SYMBOLS 1 Substrate processing apparatus 2 Processing part 3 Indexer part 4 Container holding part 5 Indexer transfer path 6 Indexer robot 7 Shuttle transfer mechanism 8 Transfer path 9 Main transfer robot 10 Processing chamber 11 Fluid box 12 First partition 13 Second partition 14 Shuttle transfer Space 15 First window portion 16 Second window portion 17 Substrate container 57 Lamp house 58 Excimer lamp 60 First supply / exhaust port 61 First supply / exhaust piping 62 First exhaust valve 63 First gas supply piping 64 First nitrogen gas supply Piping 65 First clean air supply piping 66 First nitrogen gas valve 67 First clean air valve 68 Second supply / exhaust port 69 Second supply / exhaust piping 70 Second exhaust valve 71 Second gas supply piping 72 Second nitrogen gas supply piping 73 First 2 Clean air supply piping 74 2nd nitrogen gas valve 75 2nd clean air valve 80 control device

Claims (10)

A substrate processing apparatus for processing a substrate,
A substrate processing unit for performing processing with a processing liquid on the substrate;
A container holding unit for holding a substrate container for containing a substrate;
Substrate transport means for transporting a substrate between the container holding unit and the substrate processing unit;
An ultraviolet irradiation unit that is provided in a substrate conveyance space in which the substrate conveyance unit is disposed and that irradiates ultraviolet rays centered on a wavelength of 172 nm on a substrate being conveyed by the substrate conveyance unit; Substrate processing apparatus.   The substrate processing apparatus according to claim 1, further comprising an oxygen concentration adjusting unit that adjusts an oxygen concentration in the substrate transfer space.   The oxygen concentration adjusting means includes an inert gas supply means for supplying an inert gas into the substrate transfer space, and adjusting the amount of inert gas supplied by the inert gas supply means to adjust the oxygen concentration in the substrate transfer space. 3. The substrate processing apparatus according to claim 2, wherein the oxygen concentration is adjusted.   The inert gas supply means includes a supply direction change means for changing the supply direction of the inert gas, and the supply direction change means changes the supply direction of the inert gas according to the substrate transfer direction by the substrate transfer means. The substrate processing apparatus according to claim 3, wherein the substrate processing apparatus is changed.   5. The ultraviolet irradiating unit irradiates the substrate being transferred to the container holding unit with ultraviolet rays after being processed in the substrate processing unit. Substrate processing equipment.   6. The substrate processing apparatus according to claim 1, wherein the ultraviolet irradiation unit irradiates the unprocessed substrate being transferred from the container holding unit to the substrate processing unit with ultraviolet rays.   7. The substrate processing apparatus according to claim 1, wherein the ultraviolet irradiating means is an excimer lamp that generates ultraviolet light centered at a wavelength of 172 nm. A substrate processing step of performing processing with a processing liquid on the substrate in the substrate processing unit;
A substrate transporting step for transporting a substrate between a container holding unit for holding a substrate container for storing a substrate and the substrate processing unit;
A substrate processing method comprising: an ultraviolet ray irradiation step performed in parallel with the substrate transfer step and irradiating the substrate being transferred with an ultraviolet ray centered at a wavelength of 172 nm.   The substrate processing method according to claim 8, wherein the ultraviolet irradiation step is performed after the substrate processing step.   The substrate processing method according to claim 8, wherein the ultraviolet irradiation step is performed prior to the substrate processing step.

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