JP2011179936A - Ｘ線検査装置 - Google Patents

Ｘ線検査装置 Download PDF

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Publication number
JP2011179936A
JP2011179936A JP2010043696A JP2010043696A JP2011179936A JP 2011179936 A JP2011179936 A JP 2011179936A JP 2010043696 A JP2010043696 A JP 2010043696A JP 2010043696 A JP2010043696 A JP 2010043696A JP 2011179936 A JP2011179936 A JP 2011179936A
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Japan
Prior art keywords
ray
inspection
cumulative
rays
dose
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Pending
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JP2010043696A
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Japanese (ja)
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JP2011179936A5 (https=
Inventor
Yoshihiro Tatezawa
嘉浩 立澤
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Shimadzu Corp
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Shimadzu Corp
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Priority to JP2010043696A priority Critical patent/JP2011179936A/ja
Publication of JP2011179936A publication Critical patent/JP2011179936A/ja
Publication of JP2011179936A5 publication Critical patent/JP2011179936A5/ja
Pending legal-status Critical Current

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  • Analysing Materials By The Use Of Radiation (AREA)
  • X-Ray Techniques (AREA)
JP2010043696A 2010-03-01 2010-03-01 Ｘ線検査装置 Pending JP2011179936A (ja)

Priority Applications (1)

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JP2010043696A JP2011179936A (ja) 2010-03-01 2010-03-01 Ｘ線検査装置

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JP2010043696A JP2011179936A (ja) 2010-03-01 2010-03-01 Ｘ線検査装置

Publications (2)

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JP2011179936A true JP2011179936A (ja) 2011-09-15
JP2011179936A5 JP2011179936A5 (https=) 2012-08-02

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140025157A (ko) * 2012-08-21 2014-03-04 세메스 주식회사 기판 처리 장치의 검사 방법
JP2016118422A (ja) * 2014-12-19 2016-06-30 株式会社マーストーケンソリューション Ｘ線検査装置
JP2018063183A (ja) * 2016-10-13 2018-04-19 オムロン株式会社 被曝量管理装置及び被曝量管理方法
EP3372993A1 (en) 2017-03-06 2018-09-12 Shimadzu Corporation X-ray inspection apparatus
CN115427797A (zh) * 2020-04-02 2022-12-02 株式会社先机 检查装置
US20240159918A1 (en) * 2022-11-15 2024-05-16 Honeywell Federal Manufacturing & Technologies, Llc Dosimetry system for monitoring electronics radiation exposure

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002350367A (ja) * 2001-05-29 2002-12-04 Matsushita Electric Ind Co Ltd Ｘ線照射線量値を管理できるｘ線撮像装置
JP2009025207A (ja) * 2007-07-20 2009-02-05 I-Bit Co Ltd 透視検査装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002350367A (ja) * 2001-05-29 2002-12-04 Matsushita Electric Ind Co Ltd Ｘ線照射線量値を管理できるｘ線撮像装置
JP2009025207A (ja) * 2007-07-20 2009-02-05 I-Bit Co Ltd 透視検査装置

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140025157A (ko) * 2012-08-21 2014-03-04 세메스 주식회사 기판 처리 장치의 검사 방법
KR102128722B1 (ko) * 2012-08-21 2020-07-02 세메스 주식회사 기판 처리 장치의 검사 방법
JP2016118422A (ja) * 2014-12-19 2016-06-30 株式会社マーストーケンソリューション Ｘ線検査装置
JP2018063183A (ja) * 2016-10-13 2018-04-19 オムロン株式会社 被曝量管理装置及び被曝量管理方法
EP3372993A1 (en) 2017-03-06 2018-09-12 Shimadzu Corporation X-ray inspection apparatus
CN108535286A (zh) * 2017-03-06 2018-09-14 株式会社岛津制作所 X射线检查装置
JP2018146390A (ja) * 2017-03-06 2018-09-20 株式会社島津製作所 Ｘ線検査装置
US10473596B2 (en) 2017-03-06 2019-11-12 Shimadzu Corporation X-ray inspection apparatus
CN115427797A (zh) * 2020-04-02 2022-12-02 株式会社先机 检查装置
EP4130726A4 (en) * 2020-04-02 2024-04-10 Saki Corporation INSPECTION DEVICE
US12379334B2 (en) 2020-04-02 2025-08-05 Saki Corporation Inspection device
US20240159918A1 (en) * 2022-11-15 2024-05-16 Honeywell Federal Manufacturing & Technologies, Llc Dosimetry system for monitoring electronics radiation exposure

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