JP2011176147A5 - - Google Patents
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- Publication number
- JP2011176147A5 JP2011176147A5 JP2010039386A JP2010039386A JP2011176147A5 JP 2011176147 A5 JP2011176147 A5 JP 2011176147A5 JP 2010039386 A JP2010039386 A JP 2010039386A JP 2010039386 A JP2010039386 A JP 2010039386A JP 2011176147 A5 JP2011176147 A5 JP 2011176147A5
- Authority
- JP
- Japan
- Prior art keywords
- circular waveguide
- plasma processing
- plasma
- electric field
- processing apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005684 electric field Effects 0.000 claims description 6
- 230000000644 propagated effect Effects 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010039386A JP5667368B2 (ja) | 2010-02-24 | 2010-02-24 | プラズマ処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010039386A JP5667368B2 (ja) | 2010-02-24 | 2010-02-24 | プラズマ処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011176147A JP2011176147A (ja) | 2011-09-08 |
| JP2011176147A5 true JP2011176147A5 (https=) | 2013-04-04 |
| JP5667368B2 JP5667368B2 (ja) | 2015-02-12 |
Family
ID=44688746
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010039386A Expired - Fee Related JP5667368B2 (ja) | 2010-02-24 | 2010-02-24 | プラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5667368B2 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7074795B2 (ja) * | 2020-04-21 | 2022-05-24 | 宏碩系統股▲フン▼有限公司 | 合成ダイヤモンドの製造装置及びこれに用いられるマイクロ波発射モジュール |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0567586A (ja) * | 1991-09-09 | 1993-03-19 | Nec Corp | Ecrプラズマエツチング装置 |
| JPH0673567A (ja) * | 1992-08-28 | 1994-03-15 | Hitachi Ltd | マイクロ波プラズマ処理装置 |
| JPH07263187A (ja) * | 1994-03-18 | 1995-10-13 | Hitachi Ltd | プラズマ処理装置 |
-
2010
- 2010-02-24 JP JP2010039386A patent/JP5667368B2/ja not_active Expired - Fee Related
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