JP2011162854A5 - - Google Patents

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Publication number
JP2011162854A5
JP2011162854A5 JP2010028177A JP2010028177A JP2011162854A5 JP 2011162854 A5 JP2011162854 A5 JP 2011162854A5 JP 2010028177 A JP2010028177 A JP 2010028177A JP 2010028177 A JP2010028177 A JP 2010028177A JP 2011162854 A5 JP2011162854 A5 JP 2011162854A5
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JP
Japan
Prior art keywords
plating layer
microstructure
mold
manufacturing
microstructure according
Prior art date
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Application number
JP2010028177A
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English (en)
Japanese (ja)
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JP2011162854A (ja
JP5627247B2 (ja
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Publication date
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Priority to JP2010028177A priority Critical patent/JP5627247B2/ja
Priority claimed from JP2010028177A external-priority patent/JP5627247B2/ja
Priority to US13/023,454 priority patent/US8908274B2/en
Publication of JP2011162854A publication Critical patent/JP2011162854A/ja
Publication of JP2011162854A5 publication Critical patent/JP2011162854A5/ja
Application granted granted Critical
Publication of JP5627247B2 publication Critical patent/JP5627247B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2010028177A 2010-02-10 2010-02-10 マイクロ構造体の製造方法および放射線吸収格子 Expired - Fee Related JP5627247B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2010028177A JP5627247B2 (ja) 2010-02-10 2010-02-10 マイクロ構造体の製造方法および放射線吸収格子
US13/023,454 US8908274B2 (en) 2010-02-10 2011-02-08 Microstructure manufacturing method and microstructure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010028177A JP5627247B2 (ja) 2010-02-10 2010-02-10 マイクロ構造体の製造方法および放射線吸収格子

Publications (3)

Publication Number Publication Date
JP2011162854A JP2011162854A (ja) 2011-08-25
JP2011162854A5 true JP2011162854A5 (OSRAM) 2013-03-28
JP5627247B2 JP5627247B2 (ja) 2014-11-19

Family

ID=44353731

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010028177A Expired - Fee Related JP5627247B2 (ja) 2010-02-10 2010-02-10 マイクロ構造体の製造方法および放射線吸収格子

Country Status (2)

Country Link
US (1) US8908274B2 (OSRAM)
JP (1) JP5627247B2 (OSRAM)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009019595B4 (de) * 2009-04-30 2013-02-28 Forschungszentrum Karlsruhe Gmbh Gitter mit großem Aspektverhältnis, insbesondere zur Verwendung als röntgenoptisches Gitter in einem CT-System, hergestellt durch ein Lithographieverfahren
JP5773624B2 (ja) * 2010-01-08 2015-09-02 キヤノン株式会社 微細構造体の製造方法
WO2012052881A1 (en) * 2010-10-19 2012-04-26 Koninklijke Philips Electronics N.V. Differential phase-contrast imaging
BR112013009253A2 (pt) * 2010-10-19 2019-09-24 Koninl Philips Electronics Nv grade difração para obtenção de imagem por contraste da fase diferencial, disposição de detector de um sistema de raios x para gerar imagens por contraste de fase de um objeto, sistema de obtenção de imagem de clínica por raios x, método para obtenção de umagem de contraste de fase diferencial, elemento de programa de computador e meio legível em computador
JP5804726B2 (ja) * 2011-02-24 2015-11-04 キヤノン株式会社 微細構造体の製造方法
JP2013120126A (ja) * 2011-12-07 2013-06-17 Canon Inc 微細構造体、およびその微細構造体を備えた撮像装置
JP2013122487A (ja) * 2011-12-09 2013-06-20 Konica Minolta Medical & Graphic Inc 金属格子の製造方法、金属格子およびｘ線撮像装置
TWI472813B (zh) * 2012-02-17 2015-02-11 Nat Univ Tsing Hua 反射式偏光片
JP6172433B2 (ja) * 2013-01-29 2017-08-02 国立研究開発法人産業技術総合研究所 Ｘ線反射装置及びその製造方法
US9970119B2 (en) 2013-10-25 2018-05-15 Konica Minolta, Inc. Curved grating structure manufacturing method, curved grating structure, grating unit, and x-ray imaging device
JP6217381B2 (ja) * 2013-12-24 2017-10-25 コニカミノルタ株式会社 格子湾曲方法
JP6667215B2 (ja) * 2014-07-24 2020-03-18 キヤノン株式会社 Ｘ線遮蔽格子、構造体、トールボット干渉計、ｘ線遮蔽格子の製造方法
US9618664B2 (en) * 2015-04-15 2017-04-11 Finisar Corporation Partially etched phase-transforming optical element
JP6914702B2 (ja) 2017-04-05 2021-08-04 浜松ホトニクス株式会社 Ｘ線用金属グリッド、ｘ線撮像装置、及びｘ線用金属グリッドの製造方法
JP6857071B2 (ja) 2017-04-05 2021-04-14 浜松ホトニクス株式会社 Ｘ線用金属グリッド、ｘ線撮像装置、及びｘ線用金属グリッドの製造方法
EP3454051A1 (en) 2017-09-06 2019-03-13 Koninklijke Philips N.V. Diffraction grating for x-ray phase contrast and/or dark-field imaging
EP3498889A1 (en) * 2017-12-12 2019-06-19 Koninklijke Philips N.V. Device and method for anodic oxidation of an anode element for a curved x-ray grating, system for producing a curved x-ray grating and curved x-ray grating
EP3745420A1 (en) * 2019-05-27 2020-12-02 Koninklijke Philips N.V. Stabilized grating structures
EP3786981A1 (en) 2019-08-30 2021-03-03 Koninklijke Philips N.V. Stable top-bridge manufacturing for dax gratings

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5866281A (en) * 1996-11-27 1999-02-02 Wisconsin Alumni Research Foundation Alignment method for multi-level deep x-ray lithography utilizing alignment holes and posts
DE102006037256B4 (de) * 2006-02-01 2017-03-30 Paul Scherer Institut Fokus-Detektor-Anordnung einer Röntgenapparatur zur Erzeugung projektiver oder tomographischer Phasenkontrastaufnahmen sowie Röntgensystem, Röntgen-C-Bogen-System und Röntgen-CT-System
DE102006037281A1 (de) * 2006-02-01 2007-08-09 Siemens Ag Röntgenoptisches Durchstrahlungsgitter einer Fokus-Detektor-Anordnung einer Röntgenapparatur zur Erzeugung projektiver oder tomographischer Phasenkontrastaufnahmen von einem Untersuchungsobjekt
DE102006037282B4 (de) * 2006-02-01 2017-08-17 Siemens Healthcare Gmbh Fokus-Detektor-Anordnung mit röntgenoptischem Gitter zur Phasenkontrastmessung
DE102008049200B4 (de) * 2008-09-26 2010-11-11 Paul Scherrer Institut Verfahren zur Herstellung von röntgenoptischen Gittern, röntgenoptisches Gitter und Röntgen-System
JP5773624B2 (ja) * 2010-01-08 2015-09-02 キヤノン株式会社 微細構造体の製造方法
JP5744407B2 (ja) * 2010-02-23 2015-07-08 キヤノン株式会社 マイクロ構造体の製造方法
JP5435484B2 (ja) * 2010-03-24 2014-03-05 富士フイルム株式会社 金属充填微細構造体の製造方法
JP2013120126A (ja) * 2011-12-07 2013-06-17 Canon Inc 微細構造体、およびその微細構造体を備えた撮像装置

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