JP2011142141A5 - Holder maintenance device and holder maintenance method - Google Patents
Holder maintenance device and holder maintenance method Download PDFInfo
- Publication number
- JP2011142141A5 JP2011142141A5 JP2010000818A JP2010000818A JP2011142141A5 JP 2011142141 A5 JP2011142141 A5 JP 2011142141A5 JP 2010000818 A JP2010000818 A JP 2010000818A JP 2010000818 A JP2010000818 A JP 2010000818A JP 2011142141 A5 JP2011142141 A5 JP 2011142141A5
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- JP
- Japan
- Prior art keywords
- holder
- maintenance
- substrate holder
- cleaning
- dust
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Claims (28)
前記基板ホルダを収容するホルダラックと、A holder rack that accommodates the substrate holder;
前記ホルダラックから前記基板ホルダを搬出する搬送部と、A transport unit for unloading the substrate holder from the holder rack;
前記搬送部により搬送された前記基板ホルダをメンテナンスするメンテナンス部とA maintenance unit for maintaining the substrate holder transported by the transport unit;
を備えるホルダメンテナンス装置。Holder maintenance device provided with
前記調圧部は、前記基板ホルダへの前記塵埃の固着度に応じて圧力を調整する請求項9に記載のホルダメンテナンス装置。10. The holder maintenance device according to claim 9, wherein the pressure adjustment unit adjusts the pressure in accordance with the degree of adhesion of the dust to the substrate holder.
前記流体噴射部は、前記基板ホルダに液体を噴射することにより前記基板ホルダを洗浄し、前記気体噴射部は、前記流体噴射部による洗浄後に前記気体を噴射することにより前記液体を除去する請求項9または10に記載のホルダメンテナンス装置。The fluid ejecting unit cleans the substrate holder by ejecting a liquid to the substrate holder, and the gas ejecting unit removes the liquid by ejecting the gas after cleaning by the fluid ejecting unit. The holder maintenance device according to 9 or 10.
前記洗浄装置は、前記画像処理部により検知された前記位置を洗浄する請求項5に記載のホルダメンテナンス装置。The holder maintenance device according to claim 5, wherein the cleaning device cleans the position detected by the image processing unit.
前記基板ホルダを収容するホルダラックから前記基板ホルダを搬出する搬送段階と、A transfer step of unloading the substrate holder from a holder rack that accommodates the substrate holder;
前記搬送段階で搬送された前記基板ホルダをメンテナンスするメンテナンス段階とA maintenance step of maintaining the substrate holder transferred at the transfer step;
を含むホルダメンテナンス方法。Holder maintenance method including.
前記流体噴射段階は、前記基板ホルダに液体を噴射することにより前記基板ホルダを洗浄し、前記気体噴射段階は、前記流体噴射段階による洗浄後に前記気体を噴射することにより前記液体を除去する請求項22または23に記載のホルダメンテナンス方法。The fluid injection step cleans the substrate holder by injecting a liquid onto the substrate holder, and the gas injection step removes the liquid by injecting the gas after cleaning by the fluid injection step. The holder maintenance method as described in 22 or 23.
前記洗浄段階は、前記塵埃検知段階で検知された前記位置を洗浄する請求項19に記載のホルダメンテナンス方法。The holder maintenance method according to claim 19, wherein the cleaning step cleans the position detected in the dust detection step.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010000818A JP2011142141A (en) | 2010-01-05 | 2010-01-05 | Holder maintenance device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010000818A JP2011142141A (en) | 2010-01-05 | 2010-01-05 | Holder maintenance device |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011142141A JP2011142141A (en) | 2011-07-21 |
JP2011142141A5 true JP2011142141A5 (en) | 2013-03-07 |
Family
ID=44457804
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010000818A Pending JP2011142141A (en) | 2010-01-05 | 2010-01-05 | Holder maintenance device |
Country Status (1)
Country | Link |
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JP (1) | JP2011142141A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013026553A (en) * | 2011-07-25 | 2013-02-04 | Nikon Corp | Substrate holder maintenance device, substrate bonding device, substrate holder maintenance method, and bonded semiconductor device manufacturing method |
JP6723889B2 (en) * | 2016-09-28 | 2020-07-15 | 株式会社荏原製作所 | Plating equipment |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3551423B2 (en) * | 1995-03-14 | 2004-08-04 | 株式会社ニコン | Exposure equipment |
JP4145604B2 (en) * | 2002-08-16 | 2008-09-03 | 大日本スクリーン製造株式会社 | Substrate rotation processing equipment |
JP4523239B2 (en) * | 2003-04-15 | 2010-08-11 | 大日本スクリーン製造株式会社 | Substrate processing apparatus and substrate processing method |
JP2007316551A (en) * | 2006-05-29 | 2007-12-06 | Fujifilm Corp | Foreign matter removing device |
JP2009088304A (en) * | 2007-10-01 | 2009-04-23 | Renesas Technology Corp | Method of manufacturing semiconductor device |
JP5299837B2 (en) * | 2007-12-05 | 2013-09-25 | 株式会社ニコン | SUPPORT DEVICE, HEAT / PRESSURE DEVICE, AND HEAT / PRESSURE METHOD |
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2010
- 2010-01-05 JP JP2010000818A patent/JP2011142141A/en active Pending
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