JP2010045071A5 - Substrate bonding apparatus, substrate bonding method, detection apparatus, transfer apparatus, and substrate holding member - Google Patents
Substrate bonding apparatus, substrate bonding method, detection apparatus, transfer apparatus, and substrate holding member Download PDFInfo
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- JP2010045071A5 JP2010045071A5 JP2008206196A JP2008206196A JP2010045071A5 JP 2010045071 A5 JP2010045071 A5 JP 2010045071A5 JP 2008206196 A JP2008206196 A JP 2008206196A JP 2008206196 A JP2008206196 A JP 2008206196A JP 2010045071 A5 JP2010045071 A5 JP 2010045071A5
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Claims (47)
それぞれが基板を保持する一対の前記基板保持部材に保持された前記各基板を相互に位置合わせする位置合わせ部と、
前記位置合わせ部で位置合わせされた前記各基板を接合する接合部と
を備える基板貼り合わせ装置。 A detection unit for detecting the holding state of the substrate on the holding surface based on the internal pressure of the detection hole having one end opened to the holding surface of the substrate holding member having the holding surface for holding the substrate by electrostatic force;
An alignment unit for mutually aligning the substrates held by a pair of the substrate holding members each holding a substrate;
And a bonding unit for bonding the substrates aligned by the alignment unit.
前記検知部は、前記検知穴が基板により封止されていない場合に、前記検知穴から漏出した気体の組成に対応づけて、前記複数の検知穴のうち当該気体が漏洩した検知穴を特定する請求項10に記載の基板貼り合わせ装置。 A plurality of the detection holes are formed in the substrate holding member,
When the detection hole is not sealed by the substrate, the detection unit identifies the detection hole to which the gas has leaked among the plurality of detection holes in association with the composition of the gas leaked from the detection hole. The substrate bonding apparatus according to claim 10.
前記検知部は、前記検知穴から漏出した気体を検出した時期に対応づけて、前記複数の検知穴のうち当該気体が漏洩した検知穴を特定する請求項10に記載の基板貼り合わせ装置。 A plurality of the detection holes are formed in the substrate holding member,
The substrate bonding apparatus according to claim 10, wherein the detection unit specifies a detection hole in which the gas leaks among the plurality of detection holes in association with a time when the gas leaked from the detection hole is detected.
それぞれが基板を保持する一対の前記基板保持部材に保持された前記各基板を相互に位置合わせする位置合わせ部と、
前記位置合わせ部で位置合わせされた前記各基板を接合する接合部と
を備える基板貼り合わせ装置。 A detection unit which irradiates light to the substrate through the inside of a substrate holding member having a holding surface for holding the substrate by electrostatic force, and detects a holding state of the substrate on the holding surface based on reflected light from the substrate; ,
An alignment unit for mutually aligning the substrates held by a pair of the substrate holding members each holding a substrate;
And a bonding unit for bonding the substrates aligned by the alignment unit.
前記検知部は、前記検知穴の各々について前記基板の前記保持状態を個別に検知する請求項1から18のいずれか一項に記載の基板貼り合わせ装置。 The substrate holding member has a plurality of detection holes each of which opens at one end in the vicinity of the edge of the substrate in a region of the holding surface that holds the substrate,
The substrate bonding apparatus according to any one of claims 1 to 18, wherein the detection unit individually detects the holding state of the substrate for each of the detection holes.
前記検知部は、前記第一ステージおよび前記第二ステージの少なくとも一方に設けられている請求項1から20のいずれか一項に記載の基板貼り合わせ装置。 The alignment unit includes a first stage that holds one of the substrate holding members, and a second stage that holds the other of the substrate holding members.
The substrate bonding apparatus according to any one of claims 1 to 20, wherein the detection unit is provided on at least one of the first stage and the second stage.
それぞれが基板を保持する一対の前記基板保持部材に保持された前記各基板を相互に位置合わせする位置合わせ工程と、
前記位置合わせ工程で位置合わせされた前記各基板を接合する接合工程と
を備える基板貼り合わせ方法。 Detecting the holding state of the substrate on the holding surface based on the internal pressure of the detection hole whose one end is opened to the holding surface of the substrate holding member having the holding surface holding the substrate by electrostatic force;
Aligning the substrates held by a pair of the substrate holding members, each holding a substrate, with each other;
And a bonding step of bonding the substrates aligned in the alignment step.
それぞれが基板を保持する一対の前記基板保持部材に保持された前記各基板を相互に位置合わせする位置合わせ工程と、
前記位置合わせ工程で位置合わせされた前記各基板を接合する接合工程と
を備える基板貼り合わせ方法。 A light is irradiated to the substrate through a substrate holding member having a holding surface for holding the substrate by electrostatic force, and a detection step of detecting a holding state of the substrate on the holding surface based on reflected light from the substrate; ,
Aligning the substrates held by a pair of the substrate holding members, each holding a substrate, with each other;
And a bonding step of bonding the substrates aligned in the alignment step.
前記検知工程では、前記検知穴の各々について前記基板の前記保持状態を個別に検知し、前記検知工程において、前記検知穴のひとつにおいて前記基板が保持されていることを検知し、且つ、前記検知穴の他のひとつにおいては前記基板が保持されていることを検知しなかった場合に、前記基板保持部材を位置合わせ部および接合部とは別の領域に搬送する搬送工程を有する請求項24または25に記載の基板貼り合わせ方法。 The substrate holding member has a plurality of detection holes each of which opens at one end in the vicinity of the edge of the substrate in a region of the holding surface that holds the substrate,
In the detection step, the holding state of the substrate is individually detected for each of the detection holes, and in the detection step, it is detected that the substrate is held in one of the detection holes, and the detection is performed. 25. The method according to claim 24, further comprising a transfer step of transferring the substrate holding member to an area other than the alignment portion and the bonding portion when it is not detected that the substrate is held in the other one of the holes. The board | substrate bonding method as described in 25.
前記基板が保持された前記基板保持部材を移動させる搬送部とを備える搬送装置。 41. A sensing device according to any one of claims 29 to 40,
And a transfer unit configured to move the substrate holding member holding the substrate.
前記搬送部は、前記基板保持部材を負圧により保持する保持領域、および、前記保持領域とは別の領域に開口し、前記検知穴に連通する検知穴延長部を有する請求項41に記載の搬送装置。 The detection unit detects a holding state of the substrate to the holding surface based on an internal pressure of a detection hole having one end opened to the holding surface of the substrate holding member having the holding surface holding the substrate.
42. The carrier according to claim 41, further comprising: a holding area for holding the substrate holding member under negative pressure; and a detection hole extension which is open in an area different from the holding area and which communicates with the detection hole. Transport device.
前記保持面に一端が開口するように形成された検知穴とを備え、
前記検知穴の内部圧力に基づいて前記保持面への前記基板の保持状態が検知部により検知される基板保持部材。 A holding surface for holding the substrate by electrostatic force;
And a detection hole formed to open at one end to the holding surface,
A substrate holding member in which a holding state of the substrate to the holding surface is detected by a detection unit based on an internal pressure of the detection hole.
前記保持面に一端が開口するように前記ホルダ本体に形成された検知穴と
を備え、
検知部からの光が前記検知穴を通して前記基板に照射され、前記基板からの反射光に基づいて前記保持面への前記基板の保持状態が検知部により検知される基板保持部材。 A holder body having a holding surface for holding the substrate by electrostatic force;
And a detection hole formed in the holder body such that one end is open in the holding surface,
A substrate holding member, wherein light from a detection unit is irradiated to the substrate through the detection hole, and a holding state of the substrate on the holding surface is detected by the detection unit based on reflected light from the substrate.
前記保持面に形成された検知穴とを有し、
前記検知穴と前記基板との位置関係に基づいて、前記保持面への前記基板の保持状態が検知部により検知される基板保持部材。 A holding surface for holding the substrate by electrostatic force;
And a detection hole formed in the holding surface,
A substrate holding member in which a holding state of the substrate to the holding surface is detected by a detection unit based on a positional relationship between the detection hole and the substrate.
Priority Applications (1)
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JP2008206196A JP2010045071A (en) | 2008-08-08 | 2008-08-08 | Detecting device, substrate holding member, transfer device, and bonding device |
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JP2008206196A JP2010045071A (en) | 2008-08-08 | 2008-08-08 | Detecting device, substrate holding member, transfer device, and bonding device |
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JP2013124908A Division JP5585689B2 (en) | 2013-06-13 | 2013-06-13 | Substrate holder and bonding apparatus |
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JP2010045071A5 true JP2010045071A5 (en) | 2012-03-29 |
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JP2011181632A (en) * | 2010-02-26 | 2011-09-15 | Tokyo Electron Ltd | Joining method, program, and computer recording medium |
JP5477053B2 (en) * | 2010-03-02 | 2014-04-23 | 株式会社ニコン | Overlay apparatus, wafer holder, position detection method, and device manufacturing method |
JP5798721B2 (en) * | 2010-04-07 | 2015-10-21 | 株式会社ニコン | Substrate alignment apparatus, substrate bonding apparatus, substrate alignment method, and laminated semiconductor manufacturing method |
JP5871453B2 (en) * | 2010-05-20 | 2016-03-01 | 東京エレクトロン株式会社 | Plasma processing apparatus, substrate holding mechanism, and substrate misalignment detection method |
JP5707793B2 (en) * | 2010-09-08 | 2015-04-30 | 株式会社ニコン | Substrate bonding apparatus, substrate bonding method, and laminated semiconductor device manufacturing method |
JP2012253269A (en) * | 2011-06-06 | 2012-12-20 | Nikon Corp | Substrate holder and substrate bonding apparatus |
JP7186646B2 (en) | 2019-03-22 | 2022-12-09 | 東京エレクトロン株式会社 | SUBSTRATE PROCESSING APPARATUS AND METHOD FOR DETECTING PRESENCE OF FOCUS RING ON PLACEMENT |
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JPS6319835A (en) * | 1986-07-14 | 1988-01-27 | Hitachi Ltd | Wafer supporting condition detecting apparatus |
JPH04359539A (en) * | 1991-06-06 | 1992-12-11 | Fujitsu Ltd | Electrostatic attraction apparatus |
JPH05335400A (en) * | 1992-05-28 | 1993-12-17 | Canon Inc | Substrate housing device |
JPH11135393A (en) * | 1997-10-27 | 1999-05-21 | Mitsubishi Materials Corp | Method for alignment in bonding substrates together |
JP2006024837A (en) * | 2004-07-09 | 2006-01-26 | Olympus Corp | Holding mechanism and holding device using same |
JP4364106B2 (en) * | 2004-11-08 | 2009-11-11 | 株式会社東京精密 | Vacuum chuck device and adsorption pressure control method |
JP2006332563A (en) * | 2005-05-30 | 2006-12-07 | Nikon Corp | Wafer conveyor, wafer lamination conveyor and method for manufacturing laminated semiconductor device |
JP4753888B2 (en) * | 2007-01-15 | 2011-08-24 | 東京エレクトロン株式会社 | Substrate holding mechanism and plasma processing apparatus |
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