JP2011089174A - Method for controlling vacuum treatment system, pressure controlling device, and vacuum treatment system - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To prevent gas from back-flowing in a flow passage communicating between a first pressure chamber and a second pressure chamber, and to simplify a configuration of the flow passage. <P>SOLUTION: When a first load lock chamber 8 is switched from vacuum pressure to the atmospheric pressure by using first communicating flow passages 32, 36, 37 and second communicating flow passages 33, 35, 38 communicating between the first load lock chamber 8 and a second load lock chamber 9, the first communicating flow passages 32, 36, 37 are opened while the second communicating flow passages 33, 35, 38 are closed so as to naturally supply the gas in a second pressure chamber to the first load lock chamber 8. When the second load lock chamber 9 is switched from vacuum pressure to the atmospheric pressure, the second communicating flow passages 33, 35, 38 are opened while the first communicating flow passages 32, 36, 37 are closed so as to naturally supply the gas in the first load lock chamber 8 to the second load lock chamber 9. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a control method of a vacuum processing system, a pressure control device, and a vacuum processing in which a first pressure chamber and a second pressure chamber such as a load lock chamber and a vacuum processing chamber are alternately switched between an atmospheric pressure and a vacuum pressure. It is about the system.

  Conventionally, as a pressure control device of this type, there is one communication channel that communicates the first pressure chamber (first load lock chamber) and the second pressure chamber (second load lock chamber) via each connection port. An on-off valve provided in the communication channel, a gas supply mechanism for selectively pressurizing the first pressure chamber and the second pressure chamber by supplying nitrogen gas, and the first pressure chamber and the second pressure chamber using a vacuum pump 2. Description of the Related Art A vacuum suction mechanism that selectively depressurizes two pressure chambers and a control unit that controls an open / close valve of a communication channel, a gas supply mechanism, and a vacuum suction mechanism are known (see Patent Document 1). . This pressure control device switches the first pressure chamber and the second pressure chamber alternately between atmospheric pressure and vacuum pressure, that is, switching from atmospheric pressure to vacuum pressure in one pressure chamber. The switching from the vacuum pressure to the atmospheric pressure in the other pressure chamber is performed simultaneously (hereinafter referred to as mutual switching of the internal pressure). In this pressure control device, when switching the internal pressure, the on-off valve of the connection flow path is opened, both pressure chambers are pressure-equalized (natural supply), the on-off valve is closed, and then the gas is supplied. Each of the pressure chambers is configured to increase or decrease pressure to atmospheric pressure or vacuum pressure by a mechanism and a vacuum suction mechanism. Thereby, it has the structure which suppresses the gas consumption of the gas supply mechanism by the mutual switching of an internal pressure, and the drive electric power of a vacuum suction mechanism.

JP 2002-270663 A

  However, in such a configuration, in the mutual switching of the internal pressure, the first pressure chamber is switched from the atmospheric pressure to the vacuum pressure, and the second pressure chamber is switched from the vacuum pressure to the atmospheric pressure. When the pressure is switched from atmospheric pressure to atmospheric pressure and the second pressure chamber is switched from atmospheric pressure to vacuum pressure, the gas flows forward and backward in the common communication channel. In the gas supply port for performing vacuum break, in order to prevent the particles (dust) from being rolled up due to the vacuum break, it is necessary to provide a diffusion filter and allow the inflowing gas to pass through the diffusion filter to be diffused. Then, since gas flows backward through the diffusion filter provided at the connection port, there is a problem that particles accumulated on the surface of the diffusion filter due to the forward flow are rolled up in the communication channel. As a result, there is a problem that the particles adhere to the work in the pressure chamber and cause a problem. Moreover, since each said connection port is used also as a supply port and an exhaust port in mutual switching, the function as a supply port and the function as an exhaust port are required, and each connection port will be a complicated structure. There is a problem.

  The present invention relates to a control method and a pressure control device for a vacuum processing system in which gas does not flow backward in a flow path communicating with a first pressure chamber and a second pressure chamber, and the flow path can be configured simply. It is an object to provide a vacuum processing system.

  A method for controlling a vacuum processing system according to the present invention is a method for controlling a vacuum processing system in which a first pressure chamber and a second pressure chamber are alternately switched between atmospheric pressure and vacuum pressure. When the first communication channel and the second communication channel communicating with the second pressure chamber are used to switch the first pressure chamber from the vacuum pressure to the atmospheric pressure, the first communication channel is closed and the first communication channel is closed. When the gas in the second pressure chamber is naturally supplied to the first pressure chamber by opening the communication channel and the second pressure chamber is switched from vacuum pressure to atmospheric pressure, the first communication channel is closed, The two communication flow paths are opened, and the gas in the first pressure chamber is naturally supplied to the second pressure chamber.

  A pressure control device for a vacuum processing system according to the present invention is a pressure control device for a vacuum processing system that switches a first pressure chamber and a second pressure chamber alternately between an atmospheric pressure and a vacuum pressure. A first communication channel and a second communication channel communicating the chamber and the second pressure chamber, a first on-off valve interposed in the first communication channel, and a first communication channel interposed in the second communication channel. And a control means for controlling the first on-off valve and the second on-off valve, and the control means closes the second on-off valve when the first pressure chamber is switched from the vacuum pressure to the atmospheric pressure. In this state, the first on-off valve is opened, the gas in the second pressure chamber is naturally supplied to the first pressure chamber, and the first on-off valve is closed when the second pressure chamber is switched from the vacuum pressure to the atmospheric pressure. Thus, the second on-off valve is opened to naturally supply the gas in the first pressure chamber to the second pressure chamber.

  According to these configurations, the dedicated flow path (first communication flow path) for supplying gas from the second pressure chamber at atmospheric pressure to the first pressure chamber at vacuum pressure, and the first pressure chamber at atmospheric pressure By having two flow paths that connect both pressure chambers with a dedicated flow path (second communication flow path) for supplying gas to the vacuum pressure second pressure chamber, there is a pressure difference with respect to each pressure chamber. When performing natural supply using the gas, the gas does not flow backward in the flow path. Therefore, it is possible to prevent problems due to backflow and to make the flow path simple. The pressure chamber is a concept including a load lock chamber (a preliminary vacuum chamber or an air lock chamber) and a vacuum processing chamber.

  In the above vacuum processing system control method, when the first pressure chamber is switched from the vacuum pressure to the atmospheric pressure, the gas in the second pressure chamber is naturally supplied to the first pressure chamber, and then the first communication channel is closed. When the gas is supplied to the first pressure chamber until the atmospheric pressure is reached, the second pressure chamber is evacuated until the vacuum pressure is reached, and the second pressure chamber is switched from the vacuum pressure to the atmospheric pressure, After the gas in the first pressure chamber is naturally supplied to the second pressure chamber, the second communication channel is closed, and the gas is supplied to the second pressure chamber until the atmospheric pressure is reached. It is preferable to perform evacuation until a vacuum pressure is reached.

  In the pressure control device of the vacuum processing system, a first gas supply flow path connected to the first pressure chamber and connected to the gas supply means, and a first gas supply valve interposed in the first gas supply flow path, , A first evacuation passage connected to the first pressure chamber and connected to the vacuum suction means, a first evacuation valve interposed in the first evacuation passage, and a second pressure connected to the gas supply means. A second gas supply channel connected to the chamber, a second gas supply valve interposed in the second gas supply channel, and a second vacuum suction flow connected to the vacuum chamber and connected to the second pressure chamber And a second evacuation valve interposed in the second evacuation passage, and the control means includes a first gas supply valve, a first evacuation valve, a second gas supply valve, and a second vacuum. When the valve is further controlled to switch the first pressure chamber from the vacuum pressure to the atmospheric pressure, the second pressure chamber After the gas is naturally supplied to the second pressure chamber, the first on-off valve is closed, the first gas supply valve is opened, gas is supplied to the first pressure chamber until the atmospheric pressure is reached, and the second vacuum is drawn. When the valve was opened and the second pressure chamber was evacuated until the vacuum pressure was reached, the gas in the first pressure chamber was naturally supplied to the second pressure chamber when the second pressure chamber was switched from vacuum pressure to atmospheric pressure. Thereafter, the second on-off valve is closed, the second gas supply valve is opened, and the gas is supplied until the atmospheric pressure reaches the second pressure chamber, and the first vacuum valve is opened and the first pressure chamber is opened. It is preferable to perform evacuation until a vacuum pressure is reached.

  According to these configurations, after the natural supply using the pressure difference, the on-off valve is closed, and the pressure chambers are evacuated and the gas is supplied. Thereby, the pressure switching of each pressure chamber can be performed efficiently with a simple configuration.

  The pressure control device of another vacuum processing system of the present invention is a pressure control device of a vacuum processing system that switches a first pressure chamber and a second pressure chamber alternately between an atmospheric pressure and a vacuum pressure. A first gas supply channel connected to the first pressure chamber and connected to the first pressure chamber; a first gas supply valve interposed in the first gas supply channel; and a vacuum suction unit and connected to the first pressure chamber. The connected first evacuation channel, the first evacuation valve interposed in the first evacuation channel, and the second gas supply channel connected to the second pressure chamber while being connected to the gas supply channel A second gas supply valve interposed in the second gas supply channel, a second vacuum suction channel connected to the second pressure chamber and connected to the vacuum suction means, and a second vacuum suction channel. A first connection passage that communicates the second evacuation valve provided, the second evacuation passage, and the first gas supply passage; A first opening / closing valve interposed in the first connection flow path, a second connection flow path communicating the first evacuation flow path and the second gas supply flow path, and a second connection flow path. A second on-off valve, and a control means for controlling the first gas supply valve, the first vacuum valve, the second gas supply valve, the second vacuum valve, the first on-off valve and the second on-off valve, When the control unit switches the first pressure chamber from the vacuum pressure to the atmospheric pressure, the control unit opens the first on-off valve with the second on-off valve closed, and causes the gas in the second pressure chamber to enter the first pressure chamber. After the natural supply, the first on-off valve is closed, the first gas supply valve is opened, gas is supplied to the first pressure chamber until the atmospheric pressure is reached, the second vacuum valve is opened, and the second pressure is opened. The chamber is evacuated until the vacuum pressure is reached, and when the second pressure chamber is switched from the vacuum pressure to the atmospheric pressure, the first on-off valve is closed, After the on-off valve is opened and the gas in the first pressure chamber is naturally supplied to the second pressure chamber, the second on-off valve is closed and the second gas supply valve is opened to bring the second pressure chamber to atmospheric pressure. The gas supply is performed until the pressure is reached, and the first evacuation valve is opened, and evacuation is performed until the first pressure chamber reaches a vacuum pressure.

  According to this configuration, when the first on-off valve is opened while the second on-off valve is closed, the first pressure chamber and the first gas supply flow path are connected to the first pressure chamber and the first gas supply flow path. A flow path (first communication flow path) communicating with the two pressure chambers is formed. On the other hand, when the second on-off valve is opened with the first closing valve closed, the first pressure chamber, the second pressure chamber, and the second pressure chamber are formed by the first evacuation passage, the second connection passage, and the second gas supply passage. A flow channel (second communication flow channel) is formed. In this way, a dedicated channel (first communication channel) for supplying gas from the second pressure chamber at atmospheric pressure to the first pressure chamber at vacuum pressure, and the vacuum pressure from the first pressure chamber at atmospheric pressure. By having two flow paths communicating with both pressure chambers with a dedicated flow path (second communication flow path) for supplying gas to the second pressure chamber, a pressure difference is utilized for each pressure chamber. When natural supply is performed, gas does not flow back through the flow path. Therefore, it is possible to prevent problems due to backflow and to make the flow path simple. In addition, each communication channel uses each gas supply channel and each vacuum suction channel, so that the gas supply channel and the exhaust port of the vacuum channel can be supplied with gas when natural supply is performed. Since it can be used as both a supply port and a discharge port for supplying and exhausting, the vacuum processing system can be configured simply.

  The pressure control device of another vacuum processing system of the present invention is a pressure control device of a vacuum processing system that switches a first pressure chamber and a second pressure chamber alternately between an atmospheric pressure and a vacuum pressure. A common gas supply channel connected to the supply means; a common gas supply valve interposed in the common gas supply channel; a first gas supply channel connected to the first pressure chamber and connected to the common gas supply channel; A first gas supply valve interposed in the first gas supply flow path, a second gas supply flow path connected to the second pressure chamber and connected to the common gas supply flow path, and a second gas supply flow path The second gas supply valve provided, the common vacuum suction flow path connected to the vacuum suction means, the common vacuum suction valve provided in the common vacuum suction flow path, and the first vacuum pressure connected to the common vacuum suction flow path A first vacuum passage connected to the chamber, and a first true passage interposed in the first vacuum passage. A second vacuum pulling channel connected to the second pressure chamber and connected to the second vacuum chamber; a second vacuum pulling valve interposed in the second vacuum pulling channel; and a common vacuum pulling flow A connection channel communicating the channel and the common gas supply channel, an on-off valve provided in the connection channel, a common gas supply valve, a first gas supply valve, a second gas supply valve, a common vacuum valve, Control means for controlling the first evacuation valve, the second evacuation valve, and the on-off valve, and the second gas supply valve and the first evacuation valve when the first pressure chamber is switched from the vacuum pressure to the atmospheric pressure. The first gas supply valve, the second evacuation valve, and the on-off valve are opened while the gas is closed, and the gas in the second pressure chamber is naturally supplied to the first pressure chamber. The gas supply valve is opened and gas is supplied to the first pressure chamber until it reaches atmospheric pressure. The second pressure chamber is evacuated to a vacuum pressure, and when the second pressure chamber is switched from the vacuum pressure to the atmospheric pressure, the first gas supply valve and the second evacuation valve are closed. 2 After opening the gas supply valve, the first evacuation valve and the open / close valve, and naturally supplying the gas in the first pressure chamber to the second pressure chamber, the open / close valve is closed and the common gas supply valve is opened. Gas supply is performed until the atmospheric pressure reaches the two pressure chambers, and the common evacuation valve is opened to evacuate the first pressure chamber until the vacuum pressure is reached.

  According to this configuration, when the first gas supply valve, the second vacuum pulling valve, and the open / close valve are opened while the second gas supply valve and the first vacuum pulling valve are closed, the second vacuum pulling flow path, the common vacuum, A flow path (first communication flow path) that connects the first pressure chamber and the second pressure chamber is formed by the pulling flow path, the connection flow path, the common gas supply flow path, and the first gas supply flow path. On the other hand, when the second gas supply valve, the first vacuum pulling valve, and the open / close valve are opened with the first gas supply valve and the second vacuum pulling valve closed, the first vacuum pulling flow path, the common vacuum pulling flow path, A flow path (second communication flow path) that connects the first pressure chamber and the second pressure chamber is formed by the connection flow path, the common gas supply flow path, and the second gas supply flow path. In this way, a dedicated channel (first communication channel) for supplying gas from the second pressure chamber at atmospheric pressure to the first pressure chamber at vacuum pressure, and the vacuum pressure from the first pressure chamber at atmospheric pressure. By having two flow paths communicating with both pressure chambers with a dedicated flow path (second communication flow path) for supplying gas to the second pressure chamber, a pressure difference is utilized for each pressure chamber. When natural supply is performed, gas does not flow back through the flow path. Therefore, it is possible to prevent problems due to backflow and to make the flow path simple. In addition, each communication channel uses each gas supply channel and each vacuum suction channel, so that the gas supply channel and the exhaust port of the vacuum channel can be supplied with gas when natural supply is performed. It can also be used as a supply port for supplying and exhausting and an exhaust port. Furthermore, since each communication channel is configured to also serve as one connection channel, the vacuum processing system can be simplified.

  The vacuum processing system of the present invention has a vacuum processing chamber, a vacuum processing apparatus that processes a workpiece with a vacuum pressure, and a first pressure chamber that functions as a load lock chamber for feeding material that supplies the workpiece to the vacuum processing chamber. The second pressure chamber functioning as a material removal load lock chamber for removing material from the vacuum processing chamber, and the pressure control device described above are provided.

  According to this configuration, by using the pressure control device to control the pressure in the load lock chamber for material supply and the load lock chamber for material removal, in such a vacuum processing system, the amount of gas consumed by mutual switching of the internal pressure In addition, the driving power can be suppressed, and the gas can be prevented from flowing back through the flow path communicating with both the load lock chambers, thereby suppressing the generation of particles.

  Another vacuum processing system of the present invention has a first vacuum processing chamber, and has a first vacuum processing apparatus for processing a first workpiece with a vacuum pressure, a second vacuum processing chamber, and a second workpiece with a vacuum pressure. A first pressure chamber functioning as a load lock chamber for a first supply / discharge material for supplying / discharging a first workpiece to / from the first vacuum processing chamber, and a second vacuum processing chamber. On the other hand, a second pressure chamber functioning as a second load lock chamber for supplying / discharging the second workpiece and the above-described pressure control device are provided.

  According to this configuration, the pressure control device is used for pressure control between the first load / unload material load lock chamber for the first vacuum processing device and the second load / unload material load lock chamber for the second vacuum processing device. By using such a vacuum processing system, it is possible to suppress gas consumption and driving power by mutual switching of internal pressure, and the gas does not flow backward through the flow path communicating both load lock chambers. Generation of particles can be suppressed.

It is the top view which showed the vacuum processing system which concerns on embodiment. It is explanatory drawing shown about the 1st mutual replacement operation | movement. It is explanatory drawing shown about the 2nd mutual replacement operation | movement. It is the top view which showed the vacuum processing system in 2nd Embodiment. It is explanatory drawing shown about the 1st mutual replacement operation | movement in 2nd Embodiment. It is explanatory drawing shown about the 2nd mutual replacement operation | movement in 2nd Embodiment. It is the top view which showed the modification of the vacuum processing system in 2nd Embodiment.

  Hereinafter, a vacuum processing system to which a method for controlling a vacuum processing system of the present invention is applied will be described with reference to the accompanying drawings. This vacuum processing system performs PVD (Physical Vapor Deposition) processing and CVD (Chemical Vapor Deposition) processing on a plurality of workpieces.

  As shown in FIG. 1, a vacuum processing system 1 includes a first vacuum processing unit (vacuum processing apparatus) 3 having a first vacuum processing chamber 2 and a second vacuum processing unit (vacuum processing) having a second vacuum processing chamber 4. Apparatus) 5, a third vacuum processing section (vacuum processing apparatus) 7 having a third vacuum processing chamber 6, a load lock having a first load lock chamber 8 and a second load lock chamber 9, and for supplying and removing materials. Unit 10, a transfer chamber 11 and a transfer unit 12 for transferring a workpiece to each chamber (each vacuum processing chamber 2, 4, 6 and each load lock chamber 8, 9), and a control device (control means) for controlling them (Not shown). That is, the vacuum processing system 1 is a multi-chamber processing system. In the vacuum processing system 1, the vacuum processing units 3, 5, 7 and the load lock unit 10 are arranged radially so as to surround the transport unit 12 with the transport unit 12 as the center. Specifically, the transfer chamber 11 has a substantially pentagonal shape in plan view, and each chamber is arranged facing each side. A gate valve 13 is provided between the transfer chamber 11 and each chamber so that the chambers can be opened and closed in an airtight manner.

  The transfer unit 12 includes a transfer chamber 11 having a substantially pentagonal shape in plan view, and a transfer robot (not shown) configured with an industrial robot. The transfer robot is configured to be able to grip and transfer a workpiece, receive the workpiece from each chamber, deliver the workpiece to each chamber, and transfer the workpiece to each chamber. The transfer robot receives the workpiece before processing from the first load lock chamber 8 and transports the workpiece after processing to the first vacuum processing chamber 2, the second vacuum processing chamber 4, and the third vacuum processing chamber 6 in this order. 2 Hand over to the load lock chamber 9. Thereby, each process in each vacuum processing part 3,5,7 is implemented with respect to each workpiece | work. Note that the gate valve 13 between the transfer chamber 11 and each chamber is appropriately opened during transfer to each chamber.

  Each vacuum processing unit 3, 5, 7 has a vacuum processing chamber (vacuum processing chamber) 2, 4, 6 and a process chamber 16 that controls the internal pressure and atmosphere of each vacuum processing chamber 2, 4, 6. And a work processing mechanism (not shown) disposed in the process chamber 16 for placing and processing the work. In a state where the gate valve 13 is closed, the processing chamber 16 performs the processing of the workpiece by setting the vacuum processing chambers 2, 4, and 6 to a strong vacuum pressure and replacing the internal atmosphere with the processing atmosphere. On the other hand, when the workpiece is transferred, the vacuum processing chambers 2, 4, and 6 are set to a weak vacuum pressure, the internal atmosphere is replaced with a non-processing atmosphere, and then the gate valve 13 is opened to transfer the workpiece. In addition, each process here processes a workpiece | work with a vacuum pressure, PVD process, CVD process, etc. are assumed.

  The load lock unit 10 includes a first load lock chamber for material supply (load lock chamber for material supply: first pressure chamber) 8 and a second load lock chamber for material removal (load lock chamber for material removal: second Pressure chamber) 9 (so-called unload lock chamber) and pressure control for controlling the internal pressure in each of the load lock chambers 8 and 9 and switching the load lock chambers 8 and 9 between atmospheric pressure and vacuum pressure And a system (pressure control device) 21. Each of the load lock chambers 8 and 9 communicates with the transfer chamber 11 in a vacuum state, and communicates with the outside in an atmospheric pressure state. Thereby, in the 1st load lock room 8, a work is handed over to a conveyance robot, and a work is carried in from the outside. On the other hand, in the second load lock chamber 9, the workpiece is received from the transfer robot, and the workpiece is carried out to the outside. By these, the material for feeding and unloading the workpiece is performed.

  When the workpiece is delivered / received, and carried in / out, the pressure control system 21 alternately switches the first load lock chamber 8 and the second load lock chamber 9 between vacuum pressure and atmospheric pressure. That is, in a state where the first load lock chamber 8 is at a vacuum pressure and the second load lock chamber 9 is at an atmospheric pressure, the workpiece is delivered in the first load lock chamber 8 at a vacuum pressure, and the second load lock chamber 9 at an atmospheric pressure is delivered. The work is unloaded at Next, the first load lock chamber 8 is replaced from the vacuum pressure to the atmospheric pressure, and at the same time the second load lock chamber 9 is replaced from the atmospheric pressure to the vacuum pressure, and then the work is carried in the first load lock chamber 8 at the atmospheric pressure. The workpiece is received in the second load lock chamber 9 having a vacuum pressure. Further, the first load lock chamber 8 is replaced from the atmospheric pressure to the vacuum pressure, and at the same time, the second load lock chamber 9 is replaced from the vacuum pressure to the atmospheric pressure to return to the initial state. The workpiece is transferred and the workpiece is unloaded from the second load lock chamber 9. By repeating these, a plurality of workpieces are sequentially fed and unloaded. The operation of replacing the first load lock chamber 8 from vacuum pressure to atmospheric pressure and replacing the second load lock chamber 9 from atmospheric pressure to vacuum pressure is hereinafter referred to as “first mutual replacement operation”. The operation of replacing the first load lock chamber 8 from the atmospheric pressure to the vacuum pressure and replacing the second load lock chamber 9 from the vacuum pressure to the atmospheric pressure is hereinafter referred to as a “second mutual replacement operation”.

  The pressure control system 21 is a so-called gas piping system, and is connected to a gas supply facility (gas supply means) 22 that supplies nitrogen gas and an exhaust facility 23 that exhausts nitrogen gas and the like. Each valve of the control system 21 is connected to and controlled by a control device. The pressure control system 21 includes a common gas supply channel 31 connected to the gas supply facility 22, a first gas supply channel 32 connected to the first loadlock chamber 8 and connected to the common gas supply channel 31, and a common gas. The second gas supply flow path 33 connected to the supply flow path 31 and connected to the second load lock chamber 9, the common evacuation flow path 34 connected to the exhaust equipment 23, and the first evacuation flow path 34 and the first evacuation flow path 34. A first vacuum suction flow path 35 connected to the load lock chamber 8, a second vacuum suction flow path 36 connected to the second load lock chamber 9 and connected to the common vacuum suction flow path 34, and a second vacuum suction flow A first connection channel 37 that communicates the path 36 and the first gas supply channel 32, and a second connection channel 38 that communicates with the first evacuation channel 35 and the second gas supply channel 33. ing.

  In addition, the pressure control system 21 is common to the first gas supply valve 41 provided in the first gas supply flow path 32 and the second gas supply valve 42 provided in the second gas supply flow path 33. A vacuum pump 43 interposed in the vacuum suction flow path 34, a first vacuum suction valve 44 interposed in the first vacuum suction flow path 35, and a second vacuum interposed in the second vacuum suction flow path 36. A pull-off valve 45, a first check valve 46 (check valve) and a first on-off valve 47 provided in the first communication flow path, a second check valve 48 provided in the second communication flow path, and A second on-off valve 49. Each valve except the check valves 46 and 48 is an air operated valve that can open and close each flow path by opening and closing. Further, the vacuum suction means described in the claims is constituted by the exhaust equipment 23 and the vacuum pump 43.

  The first gas supply channel 32 and the first load lock chamber 8 are connected via a first supply port 51, and nitrogen gas flowing into the first load lock chamber 8 is supplied to the first supply port 51. A diffusion filter 52 for diffusing is provided. When the first gas supply valve 41 is opened, the nitrogen gas supplied from the gas supply facility 22 passes through the common gas supply flow path 31, the first gas supply flow path 32 and the first supply port 51, and passes through the diffusion filter 52. It passes through and is supplied into the first load lock chamber 8. As a result, gas supply to the first load lock chamber 8 is performed. On the other hand, the second gas supply flow path 33 and the second load lock chamber 9 are connected via a second supply port 53, and nitrogen flowing into the second load lock chamber 9 is connected to the second supply port 53. A diffusion filter 52 for diffusing gas is provided. When the second gas supply valve 42 is opened, the nitrogen gas supplied from the gas supply facility 22 passes through the common gas supply channel 31, the second gas supply channel 33 and the second supply port 53, and the diffusion filter 52. And is supplied into the second load lock chamber 9. As a result, gas supply to the second load lock chamber 9 is performed. These diffusion filters 52 are composed of sintered filters, and diffuse inflowing gas to prevent the rise of particles (dust) during vacuum break.

  The first evacuation channel 35 and the first load lock chamber 8 are connected via a first exhaust port 54. When the first evacuation valve 44 is opened, the gas in the first load lock chamber 8 flows out of the first exhaust port 54 due to the negative pressure from the vacuum pump 43, and the first evacuation flow path 35 and the common vacuum evacuation flow. The gas is exhausted to the exhaust equipment 23 via the path 34. Thereby, the first load lock chamber 8 is evacuated. On the other hand, the second evacuation channel 36 and the second load lock chamber 9 are connected via a second exhaust port 55. When the second evacuation valve 45 is opened, the gas in the second load lock chamber 9 flows out from the second exhaust port 55 due to the negative pressure from the vacuum pump 43 and is exhausted through the second evacuation passage 36. 23 is exhausted. As a result, the second load lock chamber 9 is evacuated.

  The first connection channel 37 has one end connected between the second vacuum valve 45 and the second exhaust port 55 in the second vacuum channel 36 (upstream side of the second vacuum valve 45) and the other end. Is connected between the first gas supply valve 41 and the first supply port 51 in the first gas supply flow path 32 (on the downstream side of the first gas supply valve 41). A first check valve 46 is interposed in the first connection flow path 37, and allows the flow from the second evacuation flow path 36 side to the first gas supply flow path 32 side while preventing the reverse flow. Blocking.

  The second connection channel 38 has one end connected between the first vacuum valve 44 and the first exhaust port 54 in the first vacuum channel 35 (upstream side of the first vacuum valve 44), and the other end. Is connected between the second gas supply valve 42 and the second supply port 53 in the second gas supply flow path 33 (on the downstream side of the second gas supply valve 42). A second check valve 48 is interposed in the second connection flow path 38, allowing the flow from the first evacuation flow path 35 side to the second gas supply flow path 33 side while preventing the reverse flow. Blocking. Although the details will be described later, the first connection flow path 37 is used when a part of the internal gas is naturally supplied from the second load lock chamber 9 set to the atmospheric pressure to the second load lock chamber 9 set to the vacuum pressure. On the other hand, the second connection flow path 38 is used when a part of the internal gas is naturally supplied from the first load lock chamber 8 at atmospheric pressure to the second load lock chamber 9 at vacuum pressure.

  Here, the first mutual replacement operation and the second mutual replacement operation will be described with reference to FIGS. In these operations, the initial state is that all valves are closed. In the first mutual replacement operation, the first load lock chamber 8 is at a vacuum pressure and the second load lock chamber 9 is at an atmospheric pressure. In the second mutual replacement operation, the initial state is a state in which the first load lock chamber 8 is at atmospheric pressure and the second load lock chamber 9 is at a vacuum pressure (see FIGS. 2A and 3A). ).

  As shown in FIG. 2, in the first mutual replacement operation, the control device first opens the first on-off valve 47 of the first connection flow path 37. As a result, the flow path (the first communication flow) that connects the first load lock chamber 8 and the second load lock chamber 9 by the second evacuation flow path 36, the first connection flow path 37, and the first gas supply flow path 32. Road) is formed. As a result, due to the pressure difference, the gas in the second load lock chamber 9 at atmospheric pressure is naturally supplied to the first load lock chamber 8 at vacuum pressure (see FIG. 2B). When the first load lock chamber 8 and the second load lock chamber 9 have substantially the same pressure due to natural supply, the first on-off valve 47 is closed. Thereafter, the second evacuation valve 45 of the second evacuation flow path 36 is opened, and the second load lock chamber 9 is evacuated to a vacuum pressure, and the first gas supply of the first gas supply flow path 32 is supplied. The valve 41 is opened and gas is supplied until the first load lock chamber 8 reaches atmospheric pressure (see FIG. 2C). Thereafter, the second evacuation valve 45 and the first gas supply valve 41 are closed (see FIG. 2D), and the first mutual replacement operation is completed.

  As shown in FIG. 3, in the second mutual replacement operation, the control device first opens the second on-off valve 49 of the second connection channel 38. As a result, the first evacuation passage 35, the second connection passage 38, and the second gas supply passage 33 communicate the first load lock chamber 8 and the second load lock chamber 9 (second communication flow). Road) is formed. As a result, due to the pressure difference, the gas in the first load lock chamber 8 at atmospheric pressure is naturally supplied to the second load lock chamber 9 at vacuum pressure (see FIG. 3B). When the first load lock chamber 8 and the second load lock chamber 9 have substantially the same pressure due to natural supply, the second on-off valve 49 is closed. Thereafter, the first evacuation valve 44 of the first evacuation passage 35 is opened, and the first load lock chamber 8 is vacuumed until it reaches a vacuum pressure, and the second gas supply passage of the second gas supply passage 33 is provided. The valve 42 is opened and gas is supplied until the second load lock chamber 9 reaches atmospheric pressure (see FIG. 3C). Thereafter, the first evacuation valve 44 and the second gas supply valve 42 are closed (see FIG. 3D), and the second mutual replacement operation is completed.

  According to the configuration of the present embodiment, the first evacuation channel 35 is formed by the second evacuation channel 36, the first connection channel 37, and the first gas supply channel 32. The second connection flow path 38 and the second gas supply flow path 33 form a second communication flow path. Thus, a dedicated flow path (first communication flow path) for supplying gas from the second load lock chamber 9 at atmospheric pressure to the first load lock chamber 8 at vacuum pressure, and the first load lock at atmospheric pressure. A dedicated flow path (second communication flow path) for supplying gas from the chamber 8 to the second load lock chamber 9 having a vacuum pressure, and two flow paths communicating the both load lock chambers 8 and 9. Thus, when the natural supply using the pressure difference is performed for each of the load lock chambers 8 and 9, the gas does not flow backward in the flow path. Therefore, it is possible to prevent problems due to backflow and to make the flow path simple. Further, each communication channel uses the gas supply channels 32 and 33 and the vacuum suction channels 35 and 36 so that the supply ports 51 and 53 of the gas supply channels 32 and 33 and the vacuum suction channel 35 are used. , 36 can be used as a supply port and an exhaust port for supplying and exhausting gas when natural supply is performed, and thus the vacuum processing system 1 can be configured simply.

  In the present embodiment, the present invention is applied to the multi-chamber type vacuum processing system 1 having a plurality of vacuum processing units. However, the first vacuum processing unit and the first vacuum unit are disposed so as to sandwich the vacuum processing unit. The present invention may be applied to the vacuum processing system 1 having the load lock chamber 8 and the second load lock chamber 9.

  Next, only different portions of the vacuum processing system 1 according to the second embodiment will be described with reference to FIG. As shown in FIG. 4, in the vacuum processing system 1 of the second embodiment, a first vacuum processing unit (first vacuum processing apparatus) 3 that has a first vacuum processing chamber 2 and processes a workpiece (first workpiece). A second vacuum processing section (second vacuum processing apparatus) 5 having a second vacuum processing chamber 4 and processing a workpiece (second workpiece), a first load lock chamber 8 and a second load lock chamber 9. And a load lock unit 10 that supplies and removes workpieces to and from the first vacuum processing unit 3 and the second vacuum processing unit 5, and a control device (not shown) that controls them. A first load lock chamber 8 is disposed adjacent to the first vacuum processing chamber 2, and a second load lock chamber 9 is disposed adjacent to the second vacuum processing chamber 4. Between the first vacuum processing chamber 2 and the first load lock chamber 8 and between the second vacuum processing chamber 4 and the second load lock chamber 9, a gate valve 13 is disposed. In a state in which is opened, the work is transferred to the vacuum processing chambers 2 and 4 by a transfer mechanism (not shown).

  The load lock unit 10 includes a first load lock chamber (first load lock chamber for first supply / discharge material: first pressure chamber) 8 for supplying / discharging the workpiece in the first vacuum processing chamber 2, and a second vacuum. A second load lock chamber (second load lock chamber for supply / discharge material: second pressure chamber) 9 for supplying / discharging workpieces to / from the processing chamber 4, a first load lock chamber 8, and a second load lock. A pressure control system 21 that switches the chamber 9 between atmospheric pressure and vacuum pressure. In each of the load lock chambers 8 and 9, the workpiece is transferred to and received from each vacuum processing apparatus in a vacuum pressure state, and the workpiece is loaded and unloaded in an atmospheric pressure state. When the workpiece is delivered / received, and carried in / out, the pressure control system 21 alternately switches the first load lock chamber 8 and the second load lock chamber 9 between vacuum pressure and atmospheric pressure. Therefore, workpiece transfer / reception and workpiece loading / unloading are alternately performed with respect to the first load lock chamber 8 and the second load lock chamber 9. That is, the first mutual replacement operation and the second mutual replacement operation are alternately performed on the first load lock chamber 8 and the second load lock chamber 9.

  The pressure control system 21 is connected to a gas supply facility 22 and an exhaust facility 23, and each valve of the pressure control system 21 is connected to and controlled by a control device. The pressure control system 21 includes the common gas supply flow path 31, the first gas supply flow path 32, the second gas supply flow path 33, the common evacuation flow path 34, and the first described in the first embodiment. A evacuation channel 35 and a second evacuation channel 36 are provided, and a connection channel 61 that communicates the common evacuation channel 34 and the common gas supply channel 31 is provided.

  In addition, the pressure control system 21 includes the first gas supply valve 41, the second gas supply valve 42, the vacuum pump 43, the first vacuum valve 44, and the second vacuum pump described in the first embodiment. A common gas supply valve 62 interposed in the common gas supply flow path 31, a common vacuum pulling valve 63 interposed in the common vacuum pulling flow path 34, and a connection flow path 61. A check valve 64 and an on-off valve 65 are provided.

  The first gas supply channel 32 and the first load lock chamber 8 are connected via a first supply port 51, and a diffusion filter 52 is disposed in the first supply port 51. When the common gas supply valve 62 and the first gas supply valve 41 are opened, the nitrogen gas supplied from the gas supply facility 22 is supplied into the first load lock chamber 8, and gas supply to the first load lock chamber 8 is performed. Is called. On the other hand, the second gas supply channel 33 and the second load lock chamber 9 are connected via a second supply port 53, and a diffusion filter 52 is disposed in the second supply port 53. When the common gas supply valve 62 and the second gas supply valve 42 are opened, the nitrogen gas supplied from the gas supply facility 22 is supplied into the second load lock chamber 9, and the gas supply to the second load lock chamber 9 is performed. Done.

  The first evacuation channel 35 and the first load lock chamber 8 are connected via a first exhaust port 54. When the common vacuum valve 63 and the first vacuum valve 44 are opened, the gas in the first load lock chamber 8 flows out of the first exhaust port 54 due to the negative pressure from the vacuum pump 43 and is exhausted to the exhaust facility 23. The Thereby, the first load lock chamber 8 is evacuated. On the other hand, the second evacuation channel 36 and the second load lock chamber 9 are connected via a second exhaust port 55. When the common vacuum valve 63 and the second vacuum valve 45 are opened, the negative pressure from the vacuum pump 43 causes the gas in the first load lock chamber 8 to flow out from the second exhaust port 55 and be exhausted to the exhaust facility 23. The As a result, the second load lock chamber 9 is evacuated.

  One end of the connection channel 61 is connected to the upstream side (the load lock chambers 8 and 9 side) of the common evacuation valve 63 in the common evacuation channel 34 and the other end is a common gas supply valve in the common gas supply channel 31. It is connected to the downstream side of 62 (load lock chambers 8 and 9 side). A check valve 64 is interposed in the connection flow path 61 to allow the flow from the common evacuation flow path 34 side to the common gas supply flow path 31 side while preventing the reverse flow.

  Next, the first mutual replacement operation and the second mutual replacement operation in the first embodiment will be described with reference to FIGS. 5 and 6. As in the first embodiment, these operations are in an initial state where all the valves are closed. In the first mutual replacement operation, the first load lock chamber 8 is at a vacuum pressure and the second load lock. In the second mutual replacement operation, the chamber 9 is at the atmospheric pressure, and the first load lock chamber 8 is at the atmospheric pressure and the second load lock chamber 9 is at the vacuum pressure as an initial state (FIG. 5A). And FIG. 6 (a)).

  As shown in FIG. 5, in the first mutual replacement operation, the control device first opens the second vacuum valve 45, the on-off valve 65, and the first gas supply valve 41 in this order. Accordingly, the first load lock chamber 8 and the second load lock are formed by the second vacuum suction flow path 36, the common vacuum suction flow path 34, the connection flow path 61, the common gas supply flow path 31, and the first gas supply flow path 32. A flow path (first communication flow path) communicating with the chamber 9 is formed. As a result, due to the pressure difference, the gas in the second load lock chamber 9 at atmospheric pressure is naturally supplied to the first load lock chamber 8 at vacuum pressure (see FIG. 5B). When the first load lock chamber 8 and the second load lock chamber 9 have substantially the same pressure due to natural supply, the on-off valve 65 is closed. Thereafter, the common evacuation valve 63 is opened and the second load lock chamber 9 is evacuated until the vacuum pressure is reached, and the common gas supply valve 62 is opened so that the first load lock chamber 8 is at atmospheric pressure. Until the gas is supplied (see FIG. 5C). Thereafter, the first gas supply valve 41, the second vacuum valve 45, the common gas supply valve 62, and the common vacuum valve 63 are closed (see FIG. 5D), and the first mutual replacement operation is completed.

  As shown in FIG. 6, in the second mutual replacement operation, the control device first opens the first evacuation valve 44, the on-off valve 65, and the second gas supply valve 42 in this order. Thus, the first load lock chamber 8 and the second load lock are formed by the first vacuum suction flow path 35, the common vacuum suction flow path 34, the connection flow path 61, the common gas supply flow path 31, and the second gas supply flow path 33. A flow path (second communication flow path) communicating with the chamber 9 is formed. As a result, due to the pressure difference, the gas in the first load lock chamber 8 at atmospheric pressure is naturally supplied to the second load lock chamber 9 at vacuum pressure (see FIG. 6B). When the first load lock chamber 8 and the second load lock chamber 9 have substantially the same pressure due to natural supply, the on-off valve 65 is closed. Thereafter, the common evacuation valve 63 is opened and the first load lock chamber 8 is evacuated until the vacuum pressure is reached, and the common gas supply valve 62 is opened so that the second load lock chamber 9 is at atmospheric pressure. Until the gas is supplied (see FIG. 6C). Thereafter, the second gas supply valve 42, the first vacuum valve 44, the common gas supply valve 62, and the common vacuum valve 63 are closed (see FIG. 6D), and the second mutual replacement operation is completed.

  According to the configuration of the present embodiment, the first gas supply valve 41, the second vacuum valve 45, and the on-off valve 65 are opened while the second gas supply valve 42 and the first vacuum valve 44 are closed. Thus, the first communication channel is formed by the second evacuation channel 36, the common evacuation channel 34, the connection channel 61, the common gas supply channel 31, and the first gas supply channel 32. With the gas supply valve 41 and the second vacuum valve 45 closed, the second gas supply valve 42, the first vacuum valve 44, and the open / close valve 65 are opened, so that the first vacuum channel 35 and the common vacuum are opened. A second communication channel is formed by the pulling channel 34, the connection channel 61, the common gas supply channel 31, and the second gas supply channel 33. Thus, a dedicated flow path (first communication flow path) for supplying gas from the second load lock chamber 9 at atmospheric pressure to the first load lock chamber 8 at vacuum pressure, and the first load lock at atmospheric pressure. A dedicated flow path (second communication flow path) for supplying gas from the chamber 8 to the second load lock chamber 9 having a vacuum pressure, and having two flow paths communicating the both load lock chambers 8 and 9. Thus, when the natural supply using the pressure difference is performed for each of the load lock chambers 8 and 9, the gas does not flow backward in the flow path. Therefore, it is possible to prevent problems due to backflow and to make the flow path simple. Further, each communication channel uses the gas supply channels 32 and 33 and the vacuum suction channels 35 and 36 so that the supply ports 51 and 53 of the gas supply channels 32 and 33 and the vacuum suction channel 35 are used. , 36 can also be used as a supply port and an exhaust port for supplying and exhausting gas when natural supply is performed. Furthermore, since each communication flow path is configured to share one connection flow path 61, the vacuum processing system 1 can be simplified.

  In the present embodiment, the present invention is applied to the vacuum processing system 1 having two sets of the vacuum processing unit and the load lock chamber. However, the present invention is applied to the vacuum processing system 1 having three or more sets of these sets. The invention may be applied. In such a case, each set includes a gas supply flow path, a gas supply flow path valve, a vacuum flow path, and a vacuum flow path valve (see FIG. 7). A first mutual replacement operation and / or a second mutual replacement operation is performed.

  According to the configuration as in the above embodiment, a dedicated channel (first communication channel) for supplying gas from the second load lock chamber 9 at atmospheric pressure to the first load lock chamber 8 at vacuum pressure, The load lock chambers 8 and 9 are communicated with each other by a dedicated channel (second communication channel) for supplying gas from the first load lock chamber 8 at atmospheric pressure to the second load lock chamber 9 at vacuum pressure. By having two flow paths, when the natural supply using the pressure difference is performed for each of the load lock chambers 8 and 9, gas does not flow backward through the flow paths. Therefore, it is possible to prevent problems due to backflow and to make the flow path simple.

  Further, after the natural supply using the pressure difference, the on-off valves 47 and 49 are closed, and the pressure in the load lock chambers 8 and 9 is evacuated and the gas is supplied to the load lock chambers 8 and 9. Switching can be performed efficiently with a simple configuration.

  In this embodiment, the pair of load lock chambers 8 and 9 are subjected to the mutual replacement operation. However, the pressure control system 21 is provided in the pair of vacuum processing chambers, and the pair of vacuum processing chambers are subjected to the mutual replacement operation. The target configuration may be used.

  Further, in the first embodiment, the pressure control system 21 that forms each communication channel using the first connection channel 37 and the second connection channel 38 is used. In the second embodiment, the connection channel 61 and the pressure control system 21 that forms each communication flow path using the opening and closing of each valve is used. In the twin load lock type vacuum processing system 1 of the first embodiment, the connection flow path 61 and each valve are connected to each other. The pressure control system 21 that forms each communication flow path using opening and closing may be used, or the first connection flow path 37 and the second connection flow are added to the single load lock type vacuum processing system 1 of the second embodiment. You may use the pressure control system 21 which forms each communicating flow path using the path | route 38. FIG.

  Furthermore, in the above embodiment, each communication flow path is formed using the gas supply flow paths 32 and 33 and the evacuation flow paths 35 and 36. However, the first load lock chamber 8 and the second load lock chamber 9 Two communication channels that are directly connected and communicated with each other may be used. In such a case, a first on-off valve and a second on-off valve that open and close the communication channel are provided.

  In the above embodiment, the natural supply is performed until the pressure is substantially the same during the mutual replacement operation. However, the natural supply may be terminated after the pressure is reached or before the pressure is reached. In addition, natural supply may be terminated. Moreover, you may complete | finish natural supply by the preset time and supply amount of natural supply.

  In the above embodiment, the load lock chambers 8 and 9 are alternately switched between the atmospheric pressure and the vacuum pressure. However, if there are two specific pressures having a pressure difference, the atmospheric pressure and It is not limited to vacuum pressure. For example, the structure which switches between 1st pressure and 2nd pressure with a low pressure with respect to 1st pressure may be sufficient.

  In the above embodiment, nitrogen gas is used as the purge gas supplied from the gas supply facility 22, but the present invention is not limited to this, and for example, dry air may be used.

  Furthermore, in the present embodiment, the gas supply and the evacuation after the natural supply are performed at the same time. However, the present invention is not limited to this, and a configuration in which these are performed with a time difference may be used.

  1: vacuum processing system, 2: first vacuum processing chamber, 3: first vacuum processing section, 4: second vacuum processing chamber, 5: second vacuum processing section, 6: third vacuum processing chamber, 7: third Vacuum processing section, 8: first load lock chamber, 9: second load lock chamber, 21: pressure control system, 22: gas supply equipment, 23: exhaust equipment, 31: common gas supply flow path, 32: first gas Supply channel, 33: Second gas supply channel, 34: Common vacuum channel, 35: First vacuum channel, 36: Second vacuum channel, 37: First connection channel, 38: First 2 connection flow paths, 41: first gas supply valve, 42: second gas supply valve, 43: vacuum pump, 44: first vacuum valve, 45: second vacuum valve, 47: first on-off valve, 49 : Second on-off valve, 61: connection flow path, 62: common gas supply valve, 63: common vacuum valve 65: On-off valve

Claims (8)

A control method of a vacuum processing system that switches a first pressure chamber and a second pressure chamber alternately between atmospheric pressure and vacuum pressure,
Using a first communication channel and a second communication channel that connect the first pressure chamber and the second pressure chamber,
When the first pressure chamber is switched from the vacuum pressure to the atmospheric pressure, the first communication channel is opened to close the gas in the second pressure chamber while the second communication channel is closed. Natural supply to one pressure chamber,
When the second pressure chamber is switched from the vacuum pressure to the atmospheric pressure, the second communication channel is opened while the first communication channel is closed, and the gas in the first pressure chamber is changed to the first pressure chamber. 2. A method for controlling a vacuum processing system, wherein the pressure chamber is naturally supplied to a pressure chamber. When the first pressure chamber is switched from the vacuum pressure to the atmospheric pressure, after the gas in the second pressure chamber is naturally supplied to the first pressure chamber, the first communication channel is closed, and the first pressure chamber is closed. While supplying gas until the atmospheric pressure reaches one pressure chamber, evacuating the second pressure chamber until the vacuum pressure is reached,
When the second pressure chamber is switched from the vacuum pressure to the atmospheric pressure, after the gas in the first pressure chamber is naturally supplied to the second pressure chamber, the second communication channel is closed, The control of the vacuum processing system according to claim 1, wherein gas is supplied to the two pressure chambers until the atmospheric pressure is reached, and evacuation is performed to the first pressure chamber until the vacuum pressure is reached. Method. A pressure control device for a vacuum processing system that alternately switches between a first pressure chamber and a second pressure chamber between atmospheric pressure and vacuum pressure,
A first communication channel and a second communication channel communicating the first pressure chamber and the second pressure chamber;
A first on-off valve interposed in the first communication channel;
A second on-off valve interposed in the second communication channel;
Control means for controlling the first on-off valve and the second on-off valve,
The control means includes
When the first pressure chamber is switched from the vacuum pressure to the atmospheric pressure, the first on-off valve is opened while the second on-off valve is closed, and the gas in the second pressure chamber is released to the first pressure. Natural supply to the room,
When the second pressure chamber is switched from the vacuum pressure to the atmospheric pressure, the second on-off valve is opened while the first on-off valve is closed, and the gas in the first pressure chamber is released to the second pressure. A pressure control device for a vacuum processing system, characterized by being naturally supplied to a chamber. A first gas supply channel connected to the first pressure chamber and connected to the gas supply means;
A first gas supply valve interposed in the first gas supply flow path;
A first evacuation passage connected to the first pressure chamber and connected to the vacuum suction means;
A first vacuuming valve interposed in the first vacuuming flow path;
A second gas supply channel that is connected to the gas supply means and connected to the second pressure chamber;
A second gas supply valve interposed in the second gas supply channel;
A second evacuation channel connected to the second pressure chamber and connected to the vacuum suction means;
A second vacuuming valve interposed in the second vacuuming flow path,
The control means includes
Further controlling the first gas supply valve, the first vacuum valve, the second gas supply valve, and the second vacuum valve;
When the first pressure chamber is switched from the vacuum pressure to the atmospheric pressure, after the gas in the second pressure chamber is naturally supplied to the second pressure chamber, the first on-off valve is closed to close the first pressure chamber. The gas supply valve is opened and gas is supplied to the first pressure chamber until the atmospheric pressure is reached, and the second evacuation valve is opened to evacuate the second pressure chamber until the vacuum pressure is reached. Done
When the second pressure chamber is switched from the vacuum pressure to the atmospheric pressure, after the gas in the first pressure chamber is naturally supplied to the second pressure chamber, the second on-off valve is closed, and the second pressure chamber is closed. The gas supply valve is opened and gas is supplied to the second pressure chamber until the atmospheric pressure is reached, and the first vacuum pulling valve is opened and the first pressure chamber is evacuated until the vacuum pressure is reached. The pressure control device for a vacuum processing system according to claim 3, wherein the pressure control device is performed. A pressure control device for a vacuum processing system that alternately switches between a first pressure chamber and a second pressure chamber between atmospheric pressure and vacuum pressure,
A first gas supply channel connected to the first pressure chamber and connected to the gas supply means;
A first gas supply valve interposed in the first gas supply flow path;
A first evacuation passage connected to the first pressure chamber and connected to the vacuum suction means;
A first vacuuming valve interposed in the first vacuuming flow path;
A second gas supply channel connected to the second pressure chamber and connected to the gas supply channel;
A second gas supply valve interposed in the second gas supply channel;
A second evacuation channel connected to the second pressure chamber and connected to the vacuum suction means;
A second vacuuming valve interposed in the second vacuuming flow path;
A first connection channel that communicates the second evacuation channel and the first gas supply channel;
A first on-off valve interposed in the first connection flow path;
A second connection channel that communicates the first evacuation channel and the second gas supply channel;
A second on-off valve interposed in the second connection flow path;
Control means for controlling the first gas supply valve, the first vacuum valve, the second gas supply valve, the second vacuum valve, the first on-off valve and the second on-off valve;
The control means includes
When the first pressure chamber is switched from the vacuum pressure to the atmospheric pressure, the first on-off valve is opened in a state where the second on-off valve is closed, and the gas in the second pressure chamber is changed to the first pressure chamber. After the natural supply to the pressure chamber, the first on-off valve is closed, the first gas supply valve is opened, gas is supplied to the first pressure chamber until the atmospheric pressure is reached, and the second vacuum is supplied. Open the pulling valve and evacuate the second pressure chamber until the vacuum pressure is reached,
When the second pressure chamber is switched from the vacuum pressure to the atmospheric pressure, the second on-off valve is opened while the first on-off valve is closed, and the gas in the first pressure chamber is released to the second pressure chamber. After the natural supply to the pressure chamber, the second on-off valve is closed, the second gas supply valve is opened, gas is supplied to the second pressure chamber until the atmospheric pressure is reached, and the first vacuum is supplied. A pressure control device for a vacuum processing system, wherein a vacuum valve is opened until the vacuum pressure is reached with respect to the first pressure chamber by opening a pull valve. A pressure control device for a vacuum processing system that switches a first pressure chamber and a second pressure chamber alternately between atmospheric pressure and vacuum pressure,
A common gas supply channel connected to the gas supply means;
A common gas supply valve interposed in the common gas supply flow path;
A first gas supply channel connected to the first pressure chamber and connected to the common gas supply channel;
A first gas supply valve interposed in the first gas supply flow path;
A second gas supply channel connected to the second pressure chamber and connected to the common gas supply channel;
A second gas supply valve interposed in the second gas supply channel;
A common evacuation channel connected to the vacuum suction means;
A common evacuation valve interposed in the common evacuation flow path;
A first evacuation channel connected to the first pressure chamber and connected to the common evacuation channel;
A first vacuuming valve interposed in the first vacuuming flow path;
A second vacuum suction flow path connected to the second pressure chamber and connected to the common vacuum suction flow path;
A second vacuuming valve interposed in the second vacuuming flow path;
A connection channel that communicates the common evacuation channel and the common gas supply channel;
An on-off valve interposed in the connection flow path;
Control means for controlling the common gas supply valve, the first gas supply valve, the second gas supply valve, the common vacuum valve, the first vacuum valve, the second vacuum valve, and the on-off valve. ,
When the first pressure chamber is switched from the vacuum pressure to the atmospheric pressure, the first gas supply valve and the second vacuum valve are closed with the second gas supply valve and the first vacuum valve closed. And opening the on-off valve to naturally supply the gas in the second pressure chamber to the first pressure chamber, then closing the on-off valve, opening the common gas supply valve, and opening the common pressure supply chamber to the first pressure chamber. On the other hand, gas is supplied until the atmospheric pressure is reached, the common vacuum valve is opened, and the second pressure chamber is evacuated until the vacuum pressure is reached,
When the second pressure chamber is switched from the vacuum pressure to the atmospheric pressure, the second gas supply valve and the first vacuum valve are closed with the first gas supply valve and the second vacuum valve closed. And opening and closing the on-off valve to naturally supply the gas in the first pressure chamber to the second pressure chamber, then closing the on-off valve, opening the common gas supply valve, and A pressure control device for a vacuum processing system, wherein gas is supplied until the atmospheric pressure is reached, and the common evacuation valve is opened to evacuate the first pressure chamber until the vacuum pressure is reached. . A vacuum processing apparatus having a vacuum processing chamber and processing a workpiece with a vacuum pressure;
The first pressure chamber functioning as a load lock chamber for feeding material for feeding the workpiece to the vacuum processing chamber;
The second pressure chamber functioning as a material removal load lock chamber for removing material from the vacuum processing chamber;
A vacuum processing system comprising: the pressure control device according to claim 3. A first vacuum processing apparatus having a first vacuum processing chamber and processing a first workpiece with a vacuum pressure;
A second vacuum processing apparatus having a second vacuum processing chamber and processing a second workpiece with a vacuum pressure;
The first pressure chamber functioning as a first load / load material chamber for supplying / discharging the first workpiece with respect to the first vacuum processing chamber;
The second pressure chamber functioning as a second load lock chamber for supply / discharge material for supplying / discharging the second workpiece to / from the second vacuum processing chamber;
A vacuum processing system comprising: the pressure control device according to claim 3.

Images