JP2011053584A - Light irradiating device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a light irradiating device capable of accurately controlling the irradiation angle of light, and performing divided alignment processing, while conveying substrates on a sheet-by-sheet basis. <P>SOLUTION: The light irradiating device 1 is configured to have the substrate 100 irradiated, having first areas 104a and second areas 104b different from the first areas 104a disposed thereon, with light. The light irradiating device 1 includes a light source 10 for emitting the light 11; a wire-grid polarizer 20 for separating linear polarized light 11a from the light 11, which has been emitted from the light source 10; and a mirror unit 30 for reflecting the linear polarized light 11a so as to be made incident on the surface of the substrate 100. The mirror unit 30 includes mirrors 32 for partially reflecting the linearly polarized light 11a in a first direction D2 to be made incident on the first areas 104a; and mirrors 34 for reflecting other portions of the linearly polarized light 11a in a second direction D3 to be made incident on the second areas 104b. The first direction D2 and the second direction D3 are made mutually different. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a light irradiation apparatus.

  In a liquid crystal device or the like, a photo-alignment technique is known in which an alignment process is performed on an alignment film by irradiating the alignment film provided on the surface of the substrate with light. In the photo-alignment technique, for example, the size and direction of the pre-tilt angle of the alignment film are controlled by irradiating the alignment film with light obliquely. A light irradiation apparatus for performing such photo-alignment processing has been proposed (see, for example, Patent Document 1 and Patent Document 2).

JP 2000-122302 A JP 2000-155316 A

  In the light irradiation device described in Patent Document 1, the light irradiation angle to the alignment film is controlled by tilting the light irradiation portion, which is a large and heavy portion, among the components of the device and adjusting the tilt angle. It has a configuration. For this reason, it is not easy to control the light irradiation angle with high accuracy, and there is a problem that the entire apparatus is enlarged.

  In the light irradiation apparatus described in Patent Document 2, the light irradiation angle to the alignment film is controlled by adjusting the angle of the mirror that reflects the light from the light source. There is a problem that it cannot be applied to a method of performing photo-alignment processing by transporting a substrate in a single-wafer type because of the structure to be moved.

  In both of the light irradiation devices described in the above two patent documents, when performing a split alignment process in which a plurality of different pretilt angles of different sizes and directions are mixed in one liquid crystal device, light is transmitted through a photomask multiple times. Since it is necessary to change the irradiation angle of light with respect to the alignment film every time light is irradiated, there is a problem that the process becomes complicated and the number of manufacturing steps increases.

  SUMMARY An advantage of some aspects of the invention is to solve at least a part of the problems described above, and the invention can be implemented as the following forms or application examples.

  Application Example 1 A light irradiation apparatus according to this application example is a light irradiation apparatus that irradiates light to a substrate having a first region and a second region different from the first region provided on the surface. A light source that emits light, a polarization separation element that separates polarized light from the light emitted by the light source, and a reflecting unit that reflects the polarized light and enters the surface of the substrate, The reflection means reflects a part of the polarized light in a first direction and enters the first region, and reflects the other part of the polarized light in a second direction to the second direction. And a second reflecting portion that is incident on the first region, wherein the first direction and the second direction are different from each other.

  According to this configuration, the polarized light is separated from the light emitted from the light source, and a part of the polarized light is reflected in the first direction by the first reflecting portion and enters the first region. Further, the other part of the polarized light is reflected by the second reflecting portion in the second direction different from the first direction and enters the second region. Thereby, the photo-alignment process can be performed in different directions in the first region and the second region on the substrate.

  Application Example 2 In the light irradiation apparatus according to the application example described above, the polarization separation element is a wire grid, and a part of the polarized light separated by the wire grid is reflected by the first reflection unit. The other part of the polarized light may be reflected by the second reflecting part.

  According to this configuration, the polarized light is separated from the light emitted from the light source by the wire grid, and a part thereof is reflected in the first direction and the other part is reflected in the second direction.

  Application Example 3 In the light irradiation apparatus according to the application example, the polarization separation element is a beam splitter, and one of the two types of polarized light separated by the beam splitter is converted into the first reflection unit. While reflecting, the other of the two types of polarized light may be reflected by the second reflecting portion.

  According to this configuration, two types of polarized light are separated from the light emitted from the light source by the beam splitter, and one polarized light is reflected in the first direction, and the other polarized light is reflected in the second direction. .

  Application Example 4 In the light irradiation apparatus according to the application example described above, the angle of the first direction and the angle of the second direction with respect to the surface of the substrate may be changeable.

  According to this configuration, the incident angle of the polarized light reflected in the first direction and incident on the first region and the incident angle of the polarized light reflected in the second direction and incident on the second region can be changed. Thereby, the magnitude | size of the pretilt angle of the orientation film in each of the 1st field and the 2nd field can be changed.

  Application Example 5 The light irradiation apparatus according to the application example described above may further include a moving unit that moves the substrate relative to the reflection unit.

  According to this configuration, the optical alignment process can be performed continuously by moving the substrates one by one in a single wafer type.

The perspective view which shows schematic structure of the light irradiation apparatus which concerns on 1st Embodiment. The side view which shows schematic structure of the light irradiation apparatus which concerns on 1st Embodiment. The top view which shows schematic structure of the reflection means which concerns on 1st Embodiment. The perspective view which shows schematic structure of an example of a liquid crystal device. The figure explaining the photo-alignment process by the light irradiation apparatus which concerns on 1st Embodiment, and the orientation state of a liquid crystal device. The side view which shows schematic structure of the light irradiation apparatus which concerns on 2nd Embodiment. The figure explaining the optical orientation process by the light irradiation apparatus which concerns on 2nd Embodiment, and the orientation state of a liquid crystal device.

  The present embodiment will be described below with reference to the drawings. In the drawings to be referred to, the thicknesses, dimensional ratios, angles, and the like of the respective components are appropriately changed in order to easily show the configuration. In each drawing to be referred to, some components may be omitted.

(First embodiment)
<Schematic configuration of light irradiation device>
First, the outline | summary of the light irradiation apparatus which concerns on 1st Embodiment is demonstrated with reference to figures. FIG. 1 is a perspective view illustrating a schematic configuration of the light irradiation apparatus according to the first embodiment. FIG. 2 is a side view showing a schematic configuration of the light irradiation apparatus according to the first embodiment. Specifically, it is a side view seen from the direction of the central axis of the light source. FIG. 3 is a plan view showing a schematic configuration of the reflecting means according to the first embodiment. Specifically, it is a plan view seen from the light source side of the light irradiation device.

  As shown in FIGS. 1 and 2, the light irradiation device 1 according to the first embodiment includes a light source 10, a condenser mirror 12, a lens 14, a wire grid polarizer 20 as a polarization separation element, and a reflection. A mirror unit 30 as means and a transport mechanism 40 are provided. The light irradiation apparatus 1 is a light irradiation apparatus for performing light alignment processing by irradiating light to an alignment film provided on the surface of a substrate 100 used in a liquid crystal device.

  In the light irradiation apparatus 1, the substrate 100 is placed on the transport mechanism 40 and transported in the transport direction D1 indicated by an arrow. A direction along the conveyance direction D1 of the substrate 100 is defined as an X-axis direction. In addition, illustration of the conveyance mechanism 40 is abbreviate | omitted in FIG.

  The light source 10 is long and has a rod shape having a central axis 10a. The direction along the central axis 10a is referred to as the longitudinal direction of the light source 10. The light source 10 is a light source that emits light 11 including ultraviolet rays for performing photo-alignment processing. The light source 10 is composed of, for example, a high-pressure mercury lamp. Here, the direction along the central axis 10a of the light source 10 is defined as the Y-axis direction. The Y-axis direction is substantially orthogonal to the X-axis direction.

  The condensing mirror 12 is arrange | positioned so that the part on the opposite side to the board | substrate 100 (conveyance mechanism 40) of the light source 10 may be covered. The condenser mirror 12 has a long shape whose longitudinal direction is the direction along the Y axis, and has a length (dimension in the longitudinal direction) equivalent to that of the light source 10. The condenser mirror 12 reflects and condenses much of the light 11 emitted from the light source 10 in the direction of the lens 14. The first focal point of the condenser mirror 12 is at a position substantially coincident with the central axis 10 a of the light source 10.

  Here, since the condensing mirror 12 has a long shape, the focal point has a linear shape that is continuous in the longitudinal direction. However, as shown in FIG. Therefore, in the following description, “focus” is used. A direction along a line connecting the central axis 10a of the light source 10 and the second focal point F of the condenser 12 is defined as a Z-axis direction. The Z-axis direction is also a normal direction of a surface constituted by the X-axis and the Y-axis.

  The lens 14 is disposed on the substrate 100 side of the light source 10 so as to be separated from the second focal point F of the condenser mirror 12. The lens 14 has a long shape whose longitudinal direction is the direction along the Y axis, and the cross section in the direction along the X axis is, for example, a plano-convex lens shape. The lens 14 is a so-called collimator lens that condenses the light 11 emitted from the light source 10 and reflected by the condensing mirror 12 to make it substantially parallel. The light 11 from the light source 10 becomes light substantially parallel to the Z-axis by the lens 14, extends in the direction along the Y-axis toward the wire grid polarizer 20, and has a narrow width in the direction along the X-axis. Irradiate the area.

  The wire grid polarizer 20 is disposed on the substrate 100 side of the lens 14. The wire grid polarizer 20 has a long shape whose longitudinal direction is the direction along the Y axis, and has a length (dimension in the longitudinal direction) equivalent to that of the light source 10. The wire grid polarizer 20 includes a substrate 21 and a plurality of wire grids 22 arranged on the substrate 21. The substrate 21 is made of a transparent material, for example, glass or quartz.

  The wire grid 22 is located on the lens 14 side of the substrate 21, that is, on the side irradiated with the light 11 from the light source 10. The wire grids 22 have a linear shape extending in the direction along the Y axis, and are arranged substantially parallel to each other at a predetermined pitch in the direction along the X axis. The arrangement pitch of the wire grids 22 is not more than the wavelength of the irradiated light 11 and is preferably not more than 1/3 of the wavelength of the light 11. The wire grid 22 is made of a metal body (metal thin wire) having a high light reflectivity, and is made of, for example, Al (aluminum), Ag (silver), or the like. The wire grid 22 is formed by patterning a metal film formed on the substrate 21 by, for example, a photolithography method using a photoresist or interference exposure.

  The wire grid polarizer 20 has a property of polarizing and separating light that enters from the wire grid 22 side and travels toward the substrate 21 and converts it into polarized light in a specific direction. Of the light 11 incident on the wire grid polarizer 20, the polarization component parallel to the extending direction of the wire grid 22, that is, the direction along the Y axis is reflected. In addition, in the incident light 11, a polarization component orthogonal to the extending direction of the wire grid 22, that is, a polarization component parallel to the direction along the X axis is transmitted. Therefore, the light 11 passes through the wire grid polarizer 20 to become linearly polarized light 11a that vibrates in the X-axis direction, and is irradiated toward the mirror unit 30 substantially parallel to the Z-axis.

  The mirror unit 30 is disposed on the substrate 100 side of the wire grid polarizer 20. The mirror unit 30 includes a mirror 32 as a first reflection unit, a mirror 34 as a second reflection unit, and a shaft 31. As shown in FIG. 3, the shaft 31 has a rod shape whose longitudinal direction is the direction along the Y axis. The mirrors 32 and 34 have a rectangular shape whose longitudinal direction is the direction along the X axis. The mirrors 32 and 34 are arranged so as to be alternately arranged in the direction along the Y axis.

  In FIGS. 1 and 3, the mirror unit 30 is configured by three pairs of mirrors 32 and 34 for easy understanding, but four or more pairs of mirrors 32 and 34 correspond to the configuration of the substrate 100. The unit 30 may be configured.

  As shown in FIG. 2, the mirrors 32 and 34 are axially arranged at substantially central portions in the longitudinal direction so as to be inclined with respect to the traveling direction of the linearly polarized light 11 a transmitted through the wire grid polarizer 20, that is, the Z-axis direction. 31 is fixed. The mirrors 32 and 34 are configured to be able to change the inclination angles θ3 (see FIG. 5A) and θ5 (see FIG. 5B) with respect to the Z-axis direction by rotating about the axis 31. . The mirrors 32 and 34 are plane mirrors, and have reflecting surfaces 32 a and 34 a on the surface opposite to the side fixed to the shaft 31. The reflecting surfaces 32a and 34a face opposite sides in the direction along the X axis.

  A part of the linearly polarized light 11a that has passed through the wire grid polarizer 20 is reflected by the reflecting surface 32a of the mirror 32 in the first direction D2 indicated by the arrow, and is reduced or enlarged by the lens 15 to be the first of the substrate 100. In the region 104a (see FIG. 1). On the other hand, the other part of the linearly polarized light 11a that has passed through the wire grid polarizer 20 is reflected by the reflecting surface 34a of the mirror 34 in the second direction D3 indicated by the arrow, and is reduced or enlarged by the lens 16 to be reduced. Is incident on the second region 104b (see FIG. 1).

  The first direction D2 and the second direction D3 are different from each other, and the first region 104a and the second region 104b are different regions. Therefore, in the light irradiation apparatus 1, the light 11 emitted from the light source 10 is different from the first region 104a and the second region 104b that are different from each other on the substrate 100. Irradiation can be performed in the direction D3.

  Here, of the linearly polarized light 11a, the light reflected by the reflecting surface 32a in the first direction D2 and the light reflected by the reflecting surface 34a in the second direction D3 are the first region 104a of the substrate 100. The second region 104b may not be irradiated at the same time. In the process in which the substrate 100 is transported in the transport direction D1 by the transport mechanism 40, the first region 104a and the second region 104b may be irradiated.

  Moreover, when the part which is not reflected by the mirrors 32 and 34 arises among the linearly polarized light 11a which permeate | transmits the wire grid polarizer 20, and is irradiated to the board | substrate 100 side, these parts are prevented from entering the board | substrate 100 directly. A light shielding plate for the mirror unit 30 may be provided on the substrate 100 side.

  The lenses 15 and 16 adjust the difference when the sizes of the mirrors 32 and 34 (reflection surfaces 32a and 34a) do not correspond to the first region 104a and the second region 104b of the substrate 100, respectively. Is for. For example, when the first region 104a and the second region 104b are fine and smaller than the size capable of manufacturing the mirrors 32 and 34, the linearly polarized light 11a reflected by the reflecting surfaces 32a and 34a is reduced by the lenses 15 and 16. By irradiating, the size of the first region 104a and the second region 104b can be adjusted. As the lenses 15 and 16, for example, convex lenses or concave lenses are used as appropriate. The light irradiation apparatus 1 may be configured not to include the lenses 15 and 16 (the lenses 15 and 16 are not shown in FIG. 1).

  The transport mechanism 40 has a function of transporting the substrate 100 at an arbitrary speed along the transport direction D1, that is, the X-axis direction, with the surface on which the alignment film 103 (see FIG. 4) is provided on the light source 10 side. Yes. The transport mechanism 40 includes, for example, a transport belt 42 and a roller 44 that rotates the transport belt 42. The surface of the substrate 100 in a state of being placed on the transport mechanism 40 is substantially parallel to a plane constituted by the X axis and the Y axis. Therefore, the normal direction of the surface of the substrate 100 is a direction along the Z axis.

  As described above, each component such as the light source 10 of the light irradiation device 1 has a long shape whose longitudinal direction is the direction along the Y axis. The central axes along the Y-axis direction of the second focal point F of the condenser mirror 12, the lens 14, the wire grid polarizer 20, and the mirror unit 30 are substantially parallel to each other, and the Z-axis direction, that is, the surface of the substrate 100 Are arranged in a row along the normal direction.

<Photo-alignment treatment method>
Next, the photo-alignment processing method by the light irradiation apparatus 1 according to the first embodiment will be described with reference to the drawings. FIG. 4 is a perspective view illustrating a schematic configuration of an example of the liquid crystal device. Specifically, FIG. 4A is a diagram showing a mother substrate of the substrate of the liquid crystal device, and FIG. 4B is a diagram showing an element substrate of the liquid crystal device. 4A and 4B are perspective views seen from the same viewing direction as FIG. FIG. 5 is a diagram for explaining a photo-alignment process by the light irradiation device according to the first embodiment and an alignment state of the liquid crystal device. Specifically, FIG. 5A is a diagram for explaining the incident angle and alignment state of light in the first region of the liquid crystal device, and FIG. 5B is the incident angle of light in the second region of the liquid crystal device. It is a figure explaining an orientation state. 5A and 5B are side views seen from the same viewing direction as FIG.

  A substrate 100 shown in FIG. 4A is a so-called mother substrate used when manufacturing a liquid crystal device, and is an assembly of element substrates 101 (or counter substrates) constituting the liquid crystal device. In the state of the substrate 100 as such a mother substrate, an element substrate and a counter substrate are formed, bonded to each other via a sealant, and then separated into individual liquid crystal devices. Therefore, the photo-alignment process by the light irradiation apparatus 1 according to the first embodiment is performed in the state of the substrate 100 as the mother substrate.

  The planar shape of the substrate 100 is rectangular. In the substrate 100, one of two adjacent sides is parallel to the direction (Y axis) along the central axis 10a of the light source 10, and the other side is a direction (X axis) along the transport direction D1. It is mounted on the transport mechanism 40 so as to be parallel to the.

  The element substrate 101 shown in FIG. 4B is in a state where the substrate 100 is divided and separated into pieces. The element substrate 101 has a substrate 102 that is divided into individual pieces as a base material. On the substrate 102, elements and electrodes (not shown) for driving the liquid crystal are formed, and an alignment film 103 is provided on the surface thereof. Examples of the material of the alignment film 103 include a photo-alignment material that is aligned by a photoduplexing reaction, such as a resin material that contains a cinnamoyl group, a coumarin group, a chalcone group, etc. A photo-alignment material that is aligned by a photoisomerization reaction, such as a resin material, is used. In the case of the counter substrate, a color filter or the like is formed instead of the element for driving the liquid crystal, and the alignment film 103 is similarly provided on the surface thereof.

  The liquid crystal device has a configuration in which liquid crystal is sandwiched between an element substrate 101 and a counter substrate. An alignment treatment is performed on the alignment film 103 provided on the element substrate 101 and the counter substrate. The initial alignment state of the liquid crystal in the liquid crystal device is controlled by the alignment film 103 subjected to the alignment treatment. The alignment film 103 is provided corresponding to the display region 104. The display area 104 is an area that substantially contributes to display in the liquid crystal device.

  The display area 104 includes a first area 104a and a second area 104b. The first area 104a and the second area 104b are obtained by dividing the display area 104 into two substantially by a boundary line parallel to the direction (X axis) along the transport direction D1. Therefore, the alignment film 103 includes the first region 104a and the second region 104b, and different alignment states are set in the respective regions. In the light irradiation device 1, the mirror 32 is disposed so as to correspond to the first region 104a, and the mirror 34 is disposed so as to correspond to the second region 104b.

  Due to the alignment treatment performed on the alignment film 103, the liquid crystal molecules 105 in the liquid crystal device are aligned at a predetermined angle in a predetermined direction with respect to the surface of the element substrate 101 (alignment film 103). In the present embodiment, the liquid crystal molecules 105 are inclined in different directions in the first region 104a and the second region 104b along the X-axis direction. The tilt angles θ1 and θ2 of the liquid crystal molecules 105 are called pretilt angles. The pretilt angle θ1 in the first region 104a and the pretilt angle θ2 in the second region 104b are appropriately set according to the appropriate viewing direction and viewing angle of the liquid crystal device. The magnitudes of the pretilt angles θ1 and θ2 may be the same or different from each other.

  As shown in FIG. 5A, the angle formed by the reflecting surface 32a of the mirror 32 and the normal line (Z axis) of the substrate 100 is defined as θ3. That is, in FIG. 5A, it is assumed that the reflecting surface 32a is inclined by an angle θ3 in the counterclockwise direction with respect to the incident direction of the linearly polarized light 11a. At this time, the incident angle of the linearly polarized light 11a with respect to the reflecting surface 32a is 90 ° −θ3. Further, if the angle formed between the light reflected by the reflecting surface 32a in the first direction D2 and incident on the substrate 100 (alignment film 103) and the surface (X axis) of the substrate 100 is θ4, θ4 = 90 ° −2θ3. Become.

  As shown in FIG. 5B, the angle formed by the reflecting surface 34a of the mirror 34 and the normal line (Z axis) of the substrate 100 is θ5. That is, in FIG. 5B, it is assumed that the reflecting surface 34a is inclined by the angle θ5 in the clockwise direction with respect to the incident direction of the linearly polarized light 11a. At this time, assuming that the angle formed between the light reflected by the reflecting surface 34a in the second direction D3 and incident on the substrate 100 (alignment film 103) and the surface (X axis) of the substrate 100 is θ6, θ6 = 90 ° −2θ5 It becomes. In FIGS. 5A and 5B, illustration of the lenses 15 and 16 is omitted.

  By irradiating the linearly polarized light 11a at such an angle, the alignment film 103 is subjected to a photo-alignment process. As a result, the liquid crystal molecules 105 are arranged at a pretilt angle θ1 along the X-axis direction in the first region 104a shown in FIG. 5A, and the second region 104b shown in FIG. 5B. In FIG. 4, the optical elements are arranged at a pretilt angle θ2 along the X-axis direction. Here, the pretilt angles θ1 and θ2 of the liquid crystal molecules 105 are set depending on θ4 and θ6. That is, as θ4 and θ6 increase, the pretilt angles θ1 and θ2 increase, and as θ4 and θ6 decrease, the pretilt angles θ1 and θ2 decrease.

  Accordingly, the pretilt angles θ1 and θ2 can be set to predetermined angles by appropriately setting the angles θ3 and θ5 formed by the reflecting surfaces 32a and 34a and the Z axis. Further, by rotating the mirrors 32 and 34 around the axis 31 as the rotation center, the angles of the reflecting surfaces 32 a and 34 a with respect to the surface of the substrate 100 can be changed. Accordingly, the pretilt angles θ1 and θ2 can be controlled by changing the angles θ3 and θ5. The conditions for causing the linearly polarized light 11a to enter the substrate 100 (alignment film 103) are θ3 <45 ° and θ5 <45 °.

  As described above, in the light irradiation device 1 according to the first embodiment, the irradiation angle of the linearly polarized light 11a with respect to the alignment film 103 is controlled by adjusting the angles of the mirrors 32 and 34. 12, the lens 14, the wire grid polarizer 20, etc. need not be inclined. For this reason, the irradiation angle of the linearly polarized light 11a can be controlled with high accuracy, and the light irradiation device 1 can be prevented from being enlarged. The transport mechanism 40 can transport the substrate 100 in a single-wafer type and perform optical alignment processing.

  Furthermore, in the light irradiation apparatus 1, the alignment treatment is performed by irradiating the first region 104a and the second region 104b of the substrate 100 (alignment film 103) with the linearly polarized light 11a in different directions by the mirrors 32 and 34. . For this reason, the division | segmentation orientation process which mixes several pretilt angles (theta) 1 and (theta) 2 from which a magnitude | size and direction differ can be performed by the same process, without using a mask. As a result, the production efficiency in the manufacturing process of the liquid crystal device can be improved.

(Second Embodiment)
Next, a light irradiation apparatus according to the second embodiment will be described. The light irradiating device according to the second embodiment is different from the light irradiating device according to the first embodiment in the configurations of the polarization separation element and the reflecting means, but the other configurations are the same.

  FIG. 6 is a side view illustrating a schematic configuration of the light irradiation apparatus according to the second embodiment. Specifically, it is a side view seen from the direction of the central axis of the light source. FIG. 7 is a diagram for explaining a photo-alignment process by the light irradiation device according to the second embodiment and an alignment state of the liquid crystal device. Constituent elements common to the first embodiment are denoted by the same reference numerals and description thereof is omitted. 6 and 7, the transport mechanism 40 is not shown, but the direction perpendicular to the paper surface is a transport direction D1 (see FIG. 2) in which the substrate 100 is transported by the transport mechanism 40.

<Schematic configuration of light irradiation device>
As shown in FIG. 6, the light irradiation device 2 according to the second embodiment includes a light source unit 18, a mask 60, irradiation units 58 (58a, 58b, 58c), a transport mechanism 40 (not shown), It has. The irradiation unit 58 (58a, 58b, 58c) includes a beam splitter 50 as a polarization separation element, a phase difference plate 51, lenses 52 and 54, and a mirror 56 as reflection means. The mirror 56 is a double-sided mirror and has a reflection surface 56a as a first reflection portion and a reflection surface 56b as a second reflection portion.

  The mask 60 is made of a light-shielding material and has openings 61a, 61b, and 61c. The mask 60 is disposed substantially parallel to the substrate 100. Corresponding to each of the openings 61a, 61b, 61c, irradiation units 58a, 58b, 58c (also simply referred to as the irradiation unit 58 when the correspondence with the openings 61a, 61b, 61c is not distinguished) are arranged. . Although details will be described later, among the light 11 irradiated obliquely from the light source unit 18, the light 11 that has passed through the openings 61 a, 61 b, 61 c of the mask 60 is relative to the normal direction (Z axis) of the substrate 100. The light is incident on the beam splitter 50 of the irradiation units 58a, 58b, and 58c obliquely. Therefore, the light 11 from the light source unit 18 is not directly applied to the substrate 100.

  For the sake of clarity, the mask 60 has three openings 61a, 61b, and 61c, and three irradiation portions 58a, 58b, and 58c corresponding to the three openings 61a, 61b, and 61c. Thus, a configuration having four or more openings 61 and irradiation units 58 may be adopted.

  The beam splitter 50 is disposed so that the incident surface on which the light 11 is incident is substantially parallel to a plane formed by the normal direction (Z axis) of the substrate 100 and the transport direction D1 (X axis). Of the incident light 11, the beam splitter 50 transmits P-polarized light 11p having a linearly polarized direction parallel to the incident surface, and reflects S-polarized light 11s having a linearly polarized direction perpendicular to the incident surface. Therefore, the P-polarized light 11p and the S-polarized light 11s are separated from the light 11 by the beam splitter 50.

  The phase difference plate 51 is located on the optical path of the S-polarized light 11 s reflected by the beam splitter 50. The phase difference plate 51 gives a phase difference of ½ wavelength to incident light. Therefore, the S-polarized light 11 s reflected by the beam splitter 50 is converted into P-polarized light 11 p by the phase difference plate 51.

  The lens 52 is disposed on the optical path of the P-polarized light 11p that has passed through the beam splitter 50. The lens 54 is disposed on the optical path of the P-polarized light 11 p obtained by converting the S-polarized light 11 s reflected by the beam splitter 50 by the phase difference plate 51. The lenses 52 and 54 are for adjusting the difference when the size of the mirror 56 (reflection surfaces 56a and 56b) does not correspond to the first region 104a and the second region 104b of the substrate 100. is there.

  In the mirror 56, the reflecting surfaces 56a and 56b are disposed substantially parallel to a surface formed by the normal direction (Z axis) of the substrate 100 and the transport direction D1 (X axis). Further, the mirror 56 is located at the boundary between the irradiation units 58 adjacent to each other, and in one mirror 56, one of the two reflection surfaces 56a and 56b functions as one reflecting means of the adjacent irradiation unit 58. In addition, the other functions as the other reflecting means of the irradiation unit 58 adjacent to the other. The reflecting surface 56 a reflects the P-polarized light 11 p that has passed through the beam splitter 50, and the reflecting surface 56 b reflects the P-polarized light 11 p obtained by converting the S-polarized light 11 s reflected by the beam splitter 50 by the phase difference plate 51.

  FIG. 7 shows the irradiation unit 58a of FIG. 6 in an enlarged manner. As shown in FIG. 7, the light source unit 18 includes a light source 10, a condenser mirror 12, a lens 14, and a mirror 17. The mirror 17 is a plane mirror, and the reflection surface thereof is disposed so as to be inclined by an angle θ7 with respect to the Z-axis direction. The light 11 reflected by the mirror 17 passes through the opening 61 a and enters the beam splitter 50 at an angle of 90 ° −2θ7 with respect to the mask 60. If the incident angle of the light 11 to the beam splitter 50 at this time is θ8, θ8 = 90 ° −2θ7.

  The P-polarized light 11p that has passed through the beam splitter 50 is reduced or enlarged by the lens 52, reflected by the reflecting surface 56a of the mirror 56 in the first direction D4, and reflected on the second region 104b of the substrate 100 (alignment film 103). Incident. On the other hand, the S-polarized light 11s reflected by the beam splitter 50 is converted into P-polarized light 11p by the phase difference plate 51, reflected by the reflecting surface 56b of the mirror 56 in the second direction D5, and the substrate 100 (alignment film 103). The light enters the first region 104a.

  At this time, the incident angle of the P-polarized light 11p incident on the reflecting surfaces 56a and 56b is both θ8. Further, the P-polarized light 11p reflected in the first direction D4 by the reflecting surface 56a and incident on the substrate 100 (alignment film 103), and the substrate 100 (alignment film 103) reflected in the second direction D5 by the reflecting surface 56b. The angle between the P-polarized light 11p incident on the surface of the substrate 100 and the surface of the substrate 100 is both θ8. However, in the first region 104a and the second region 104b of the substrate 100, the P-polarized light 11p is incident in a direction facing each other in the direction along the Y-axis, so the liquid crystal molecules 105 are set depending on θ8. The pretilt angles are oriented in different directions along the Y-axis direction.

  The angle θ7 of the reflecting surface of the mirror 17 with respect to the Z-axis direction is changed, and the positional relationship among the openings 61a, 61b, 61c of the mask 60, the beam splitter 50, the mirror 56, and the like is appropriately adjusted according to the angle θ7. Thus, the angle θ8 formed by the P-polarized light 11p incident on the substrate 100 and the surface of the substrate 100 can be changed. As a result, the pretilt angle of the liquid crystal molecules 105 can be controlled.

  Thus, in the light irradiation apparatus 2 according to the second embodiment, similarly to the light irradiation apparatus 1 according to the first embodiment, the substrate 100 is transported in a single-wafer type by the transport mechanism 40 and the optical alignment process is performed. It can be carried out. In the light irradiation apparatus 2, the mask 60 is used. However, as in the light irradiation apparatus 1, the division alignment process in which a plurality of pretilt angles having different sizes and directions are mixed can be performed in the same process.

  Further, in the first region 104 a and the second region 104 b of the substrate 100, the light irradiation apparatus 1 pretilts the liquid crystal molecules 105 in different directions in the direction (X-axis direction) along the transport direction D <b> 1 of the substrate 100. In contrast, the light irradiation device 2 can pretilt the liquid crystal molecules 105 in different directions in the direction (Y-axis direction) orthogonal to the transport direction D1 of the substrate 100.

  As mentioned above, although embodiment of this invention was described, various deformation | transformation can be added with respect to the said embodiment in the range which does not deviate from the meaning of this invention. As modifications, for example, the following can be considered.

(Modification 1)
In the light irradiation apparatus 1 according to the first embodiment, the reflecting surfaces 32a and 34a of the mirrors 32 and 34 are opposite to each other in the direction along the X axis. However, the present invention is not limited to the above form. . In the light irradiation apparatus 1, the reflection surfaces 32a and 34a may be in the same direction in the direction along the X axis, and the angles θ3 and θ5 with respect to the normal line (Z axis) of each substrate 100 may be different from each other. According to such a configuration, the liquid crystal molecules 105 are aligned at different pretilt angles in the same direction in the direction along the transport direction D1 of the substrate 100 in the first region 104a and the second region 104b of the substrate 100. be able to.

(Modification 2)
In the light irradiation apparatus 1 according to the first embodiment, the pair of mirrors 32 and 34 correspond to the display area 104 (the first area 104a and the second area 104b). Not. The width of the mirror in the Y-axis direction may be made smaller, and three or more mirrors may correspond to the display area 104. According to such a configuration, the display region 104 of the liquid crystal device can be divided into three or more regions, and the liquid crystal molecules 105 can be aligned at different pretilt angles in each of the divided regions.

  DESCRIPTION OF SYMBOLS 1, 2 ... Light irradiation apparatus, 10 ... Light source, 11 ... Light, 11a ... Linearly polarized light, 11p ... P polarized light, 11s ... S polarized light, 20 ... Wire grid polarizer as a polarization separation element, 30 ... Mirror as reflection means Unit: 32... Mirror as first reflecting part 34... Mirror as second reflecting part 40. Transport mechanism as moving means 50. Beam splitter as polarization separating element 56. Mirror as reflecting means , 56a: a reflecting surface as a first reflecting portion, 56b: a reflecting surface as a second reflecting portion, 100 ... a substrate, 104a ... a first region, 104b ... a second region, D2, D4 ... first Direction, D3, D5, second direction.

Claims (5)

A light irradiation device that irradiates light onto a substrate provided on a surface with a first region and a second region different from the first region,
A light source that emits light;
A polarization separation element that separates polarized light from the light emitted by the light source;
Reflecting means for reflecting the polarized light to be incident on the surface of the substrate,
The reflection means reflects a part of the polarized light in a first direction and enters the first region, and reflects the other part of the polarized light in a second direction to the second direction. A second reflecting portion that is incident on the region of
The light irradiation apparatus, wherein the first direction and the second direction are different from each other. The light irradiation device according to claim 1,
The polarization separation element is a wire grid;
A part of the polarized light separated by the wire grid is reflected by the first reflecting part, and the other part of the polarized light is reflected by the second reflecting part. The light irradiation device according to claim 1,
The polarization separation element is a beam splitter;
One of the two types of polarized light separated by the beam splitter is reflected by the first reflecting portion, and the other of the two types of polarized light is reflected by the second reflecting portion. A light irradiation device. It is a light irradiation apparatus as described in any one of Claim 1 to 3, Comprising:
The light irradiation apparatus according to claim 1, wherein an angle of the first direction and an angle of the second direction with respect to the surface of the substrate can be changed. It is a light irradiation apparatus as described in any one of Claim 1 to 4, Comprising:
The light irradiation apparatus according to claim 1, further comprising a moving unit that moves the substrate relative to the reflecting unit.

Images