JP2011052314A5 - - Google Patents

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Publication number
JP2011052314A5
JP2011052314A5 JP2009205162A JP2009205162A JP2011052314A5 JP 2011052314 A5 JP2011052314 A5 JP 2011052314A5 JP 2009205162 A JP2009205162 A JP 2009205162A JP 2009205162 A JP2009205162 A JP 2009205162A JP 2011052314 A5 JP2011052314 A5 JP 2011052314A5
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JP
Japan
Prior art keywords
pressure value
normal
control device
supply system
hereinafter referred
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2009205162A
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English (en)
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JP2011052314A (ja
JP5438439B2 (ja
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Publication date
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Priority claimed from JP2009205162A external-priority patent/JP5438439B2/ja
Priority to JP2009205162A priority Critical patent/JP5438439B2/ja
Priority to US13/393,895 priority patent/US9109288B2/en
Priority to CN201080039189.5A priority patent/CN102597311B/zh
Priority to EP20100813516 priority patent/EP2474644B1/en
Priority to KR20127005251A priority patent/KR20120062733A/ko
Priority to PCT/JP2010/005418 priority patent/WO2011027565A1/ja
Publication of JP2011052314A publication Critical patent/JP2011052314A/ja
Publication of JP2011052314A5 publication Critical patent/JP2011052314A5/ja
Publication of JP5438439B2 publication Critical patent/JP5438439B2/ja
Application granted granted Critical
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Description

供給圧力値Ｐ７がしきい値Ｔ１以下である場合、制御装置９０は、例えば予め記憶された優先順位に基づいて、いずれかの正常供給系１００ａを選択する（ステップＳ７ｂ）。次に、制御装置９０は、選択した正常供給系１００ａの圧力計５ｂの計測値（以下、正常側圧力値Ｐ８と呼ぶ）と選択した正常供給系１００ａの圧力計５ｉの圧力値（以下、バックアップ側圧力値Ｐ９と呼ぶ）とを比較する。そして、制御装置９０は、正常側圧力値Ｐ８がバックアップ側圧力値Ｐ９よりも高いか否かを判定する（ステップＳ８ｂ）。
JP2009205162A 2009-09-04 2009-09-04 気体供給システム Expired - Fee Related JP5438439B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2009205162A JP5438439B2 (ja) 2009-09-04 2009-09-04 気体供給システム
KR20127005251A KR20120062733A (ko) 2009-09-04 2010-09-02 기체 공급 시스템
CN201080039189.5A CN102597311B (zh) 2009-09-04 2010-09-02 气体供给系统
EP20100813516 EP2474644B1 (en) 2009-09-04 2010-09-02 Gas supply system
US13/393,895 US9109288B2 (en) 2009-09-04 2010-09-02 Gas supply system
PCT/JP2010/005418 WO2011027565A1 (ja) 2009-09-04 2010-09-02 気体供給システム

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009205162A JP5438439B2 (ja) 2009-09-04 2009-09-04 気体供給システム

Publications (3)

Publication Number Publication Date
JP2011052314A JP2011052314A (ja) 2011-03-17
JP2011052314A5 true JP2011052314A5 (ja) 2012-05-10
JP5438439B2 JP5438439B2 (ja) 2014-03-12

Family

ID=43649120

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009205162A Expired - Fee Related JP5438439B2 (ja) 2009-09-04 2009-09-04 気体供給システム

Country Status (6)

Country Link
US (1) US9109288B2 (ja)
EP (1) EP2474644B1 (ja)
JP (1) JP5438439B2 (ja)
KR (1) KR20120062733A (ja)
CN (1) CN102597311B (ja)
WO (1) WO2011027565A1 (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120228144A1 (en) * 2009-10-16 2012-09-13 Solvay Fluor Gmbh High-purity fluorine gas, the production and use thereof, and a method for monitoring impurities in a fluorine gas
JP5824372B2 (ja) * 2012-01-25 2015-11-25 東京エレクトロン株式会社 処理装置及びプロセス状態の確認方法
WO2015162868A1 (ja) * 2014-04-24 2015-10-29 東洋炭素株式会社 反応装置
JP2016134569A (ja) * 2015-01-21 2016-07-25 株式会社東芝 半導体製造装置
CN110176414B (zh) * 2019-04-16 2020-10-16 北京北方华创微电子装备有限公司 反应气体供应系统及其控制方法
CN110375197B (zh) * 2019-07-01 2021-04-20 厚普清洁能源股份有限公司 一种lng加注船的双冗余安全监控控制方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100242982B1 (ko) * 1996-10-17 2000-02-01 김영환 반도체 장비의 가스 공급 장치
JP3645495B2 (ja) 2000-04-07 2005-05-11 東洋炭素株式会社 フッ素ガス発生装置
US6818105B2 (en) 2000-04-07 2004-11-16 Toyo Tanso Co., Ltd. Apparatus for generating fluorine gas
US6604555B2 (en) * 2000-08-04 2003-08-12 Arch Specialty Chemicals, Inc. Automatic refill system for ultra pure or contamination sensitive chemicals
JP2003257870A (ja) * 2002-02-28 2003-09-12 Nippon Sanso Corp 半導体装置の製造システム及びガス供給方法
JP2004011001A (ja) 2002-06-10 2004-01-15 Central Glass Co Ltd フッ素電解槽
US6779568B2 (en) * 2002-07-16 2004-08-24 General Hydrogen Corporation Gas distribution system
GB0216828D0 (en) 2002-07-19 2002-08-28 Boc Group Plc Apparatus and method for fluorine production
JP3617835B2 (ja) * 2002-09-20 2005-02-09 東洋炭素株式会社 フッ素ガス発生装置
US6955198B2 (en) * 2003-09-09 2005-10-18 Advanced Technology Materials, Inc. Auto-switching system for switch-over of gas storage and dispensing vessels in a multi-vessel array
JP2005179709A (ja) 2003-12-17 2005-07-07 Toyo Tanso Kk ガス発生装置
JP4818589B2 (ja) 2004-02-26 2011-11-16 東京エレクトロン株式会社 処理装置
JP4018726B2 (ja) * 2006-02-07 2007-12-05 東洋炭素株式会社 半導体製造プラント
US7562672B2 (en) * 2006-03-30 2009-07-21 Applied Materials, Inc. Chemical delivery apparatus for CVD or ALD
US20080173353A1 (en) * 2007-01-22 2008-07-24 United Microelectronics Corp. Gas supply piping system and method for replacing purifier

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