JP2011049302A5 - - Google Patents

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Publication number
JP2011049302A5
JP2011049302A5 JP2009195656A JP2009195656A JP2011049302A5 JP 2011049302 A5 JP2011049302 A5 JP 2011049302A5 JP 2009195656 A JP2009195656 A JP 2009195656A JP 2009195656 A JP2009195656 A JP 2009195656A JP 2011049302 A5 JP2011049302 A5 JP 2011049302A5
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JP
Japan
Prior art keywords
liquid
substrate
pattern
stamp
cells
Prior art date
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Application number
JP2009195656A
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English (en)
Japanese (ja)
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JP2011049302A (ja
JP5281989B2 (ja
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Priority to JP2009195656A priority Critical patent/JP5281989B2/ja
Priority claimed from JP2009195656A external-priority patent/JP5281989B2/ja
Publication of JP2011049302A publication Critical patent/JP2011049302A/ja
Publication of JP2011049302A5 publication Critical patent/JP2011049302A5/ja
Application granted granted Critical
Publication of JP5281989B2 publication Critical patent/JP5281989B2/ja
Expired - Fee Related legal-status Critical Current
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JP2009195656A 2009-08-26 2009-08-26 パターン転写装置及びパターン形成方法 Expired - Fee Related JP5281989B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009195656A JP5281989B2 (ja) 2009-08-26 2009-08-26 パターン転写装置及びパターン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009195656A JP5281989B2 (ja) 2009-08-26 2009-08-26 パターン転写装置及びパターン形成方法

Publications (3)

Publication Number Publication Date
JP2011049302A JP2011049302A (ja) 2011-03-10
JP2011049302A5 true JP2011049302A5 (enExample) 2012-03-08
JP5281989B2 JP5281989B2 (ja) 2013-09-04

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ID=43835369

Family Applications (1)

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JP2009195656A Expired - Fee Related JP5281989B2 (ja) 2009-08-26 2009-08-26 パターン転写装置及びパターン形成方法

Country Status (1)

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JP (1) JP5281989B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5283647B2 (ja) * 2010-03-03 2013-09-04 富士フイルム株式会社 パターン転写方法及びパターン転写装置
JP5460541B2 (ja) 2010-03-30 2014-04-02 富士フイルム株式会社 ナノインプリント方法、液滴配置パターン作成方法および基板の加工方法
JP6300459B2 (ja) * 2013-07-12 2018-03-28 キヤノン株式会社 インプリント装置およびインプリント方法、それを用いた物品の製造方法
KR102731996B1 (ko) * 2021-11-11 2024-11-20 한국기계연구원 각도 조정 및 정렬 기능을 갖는 임프린트 장치 및 임프린트 방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6929762B2 (en) * 2002-11-13 2005-08-16 Molecular Imprints, Inc. Method of reducing pattern distortions during imprint lithography processes
KR20060126967A (ko) * 2003-11-12 2006-12-11 몰레큘러 임프린츠 인코퍼레이티드 고속 충전 및 처리량을 달성하기 위한 분배 구조 및 전도성주형
JP4819577B2 (ja) * 2006-05-31 2011-11-24 キヤノン株式会社 パターン転写方法およびパターン転写装置
CN101583436B (zh) * 2007-01-16 2014-05-07 皇家飞利浦电子股份有限公司 用于挠性板件和基板接触的方法和系统

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