JP2011033473A - Eccentricity measuring device, method of measuring eccentricity, optical element, optical element array and optical element unit - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To achieve an eccentricity measuring device, or the like, that is able to dispense with pelletizing each optical element for composing an optical element array, to collectively measure all optical elements, and can be realized using a simple and compact device configuration. <P>SOLUTION: The eccentricity measuring device 1 includes an element image-forming optical system 5, namely, a double telecentric optical system. The element image-forming optical system 5 forms images of both the sides of a lens 40 by incident transmission light. The eccentricity measuring device 1 is able to measure the amount of eccentricity in the lens 40, based on a contrast of first transmission image 91 obtained by forming an image of a first side 41 of the lens 40 with a second transmission image 92, obtained by forming an image of a second side 42 of the lens 40. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to an eccentricity measuring apparatus and an eccentricity measuring method for measuring the amount of eccentricity of an optical element such as a lens. The present invention also relates to an optical element, an optical element array, and an optical element unit, which are targets for measuring the amount of eccentricity by the eccentricity measuring device.

  First, “eccentricity” in the present invention means a mismatch between an optical axis and a mechanical axis in a single optical element. In particular, in the present invention, “lens eccentricity” refers to a positional deviation of the actual optical axis from the ideal optical axis when no eccentricity occurs between the front and back surfaces of a single lens. means.

  Many aspheric lenses are mass-produced by transfer using a mold. The manufacturing tolerance requirements for these lenses are severe. For eccentricity, which is one of the important factors of manufacturing tolerance, a measuring device that accurately evaluates the amount of eccentricity is required.

  In the conventional eccentricity measuring apparatus and eccentricity measuring method, first, the measurement light emitted from the light source is adjusted by a well-known focus technique, and is placed on the optical axis of the optical element (test object) to be measured. Collect light.

  The light condensed on the optical axis of the optical element is reflected on the surface of the optical element or transmitted through the optical element.

  The reflected or transmitted light is guided to an eccentricity measuring unit (measurement surface), and forms a light spot (also referred to as a condensed spot) on the surface of the eccentricity measuring unit. The light spot means a region that appears in an irradiated portion when thin light is irradiated onto a certain surface and has a higher light intensity than other portions.

  And in the said eccentricity measuring apparatus and eccentricity measuring method, the position of the light spot formed on the surface of the eccentricity measurement part is detected using optical position detection elements, such as a photodetector.

  Thereafter, a positional deviation amount of the detected position of the light spot with respect to a reference position (a position where the optical spot is formed when the optical element is not decentered) is obtained. Based on the positional deviation amount, In the eccentricity measuring apparatus and the eccentricity measuring method, the amount of eccentricity of the optical element is measured.

  The method of decentration measurement in which the light condensed on the optical axis of the optical element is reflected on the surface of the optical element is called reflection decentering measurement. A method of eccentricity measurement in which light collected on the optical axis of the optical element is transmitted through the optical element is called transmission eccentricity measurement. Conventionally, in most of the decentration measurement of a lens which is a typical optical element, reflection decentration measurement or transmission decentration measurement is performed.

  In addition, as a method of measuring eccentricity, Patent Document 1 discloses that the first surface of the lens is observed with an interferometer and the interference fringes are adjusted to one color, while the second surface and / or the plane portion is irradiated with laser light. In addition, there is disclosed a lens eccentricity measuring method and a measuring apparatus for measuring a shake amount of a laser beam reflected by a second surface and / or a plane portion when the lens rotates.

  Patent Document 2 discloses an eccentricity amount that can accurately measure the eccentricity of a lens by measuring the shape of both front and back surfaces of the lens using the measurement result of the three-dimensional position of the reference point. A measurement method is disclosed.

  Patent Document 3 discloses a glass optical element in which a ring-shaped groove or protrusion is press-molded outside the effective diameter of a lens. Patent Document 3 obtains the angle θ1 of the tilt eccentricity of the glass optical element by the following formula (1).

θ1 = cos ⁻¹ b1 / a1 (1)
However, a1 is a radius of a glass optical element, b1 is the length of the short axis of this glass optical element by which the surface shape became ellipse by eccentricity.

JP 2004-279075 A (released on October 7, 2004) International Publication Number WO 2007/018118 A1 (published February 15, 2007) JP-A-4-330403 (published on November 18, 1992)

  By the way, in recent years, a so-called wafer level lens process has attracted attention in a method for manufacturing a module including an optical element (a camera module including a lens).

  In the wafer level lens process, after mounting other members on an optical element array in which a large number of optical elements are integrally formed on a single plate made of resin, each module is separated into individual pieces. This is a manufacturing method for manufacturing a module. In this wafer level lens process, it is possible to manufacture a large number of modules at the same time, so that a significant reduction in module manufacturing time can be expected.

  Here, since each of the eccentricity measuring apparatuses according to the related art described above has a configuration in which measurement light is condensed on a specific region of the optical element, basically, one apparatus is used. Only one optical element can be measured per measurement.

  Therefore, when measuring the amount of eccentricity of each optical element constituting the optical element array using any one of the above-described conventional eccentricity measuring devices, the following (A) or (B ) Measurement will be carried out in the manner described above.

  (A) Each optical element which comprises the said optical element array is separated into pieces, and it measures for every optical element.

  (B) Prepare the same number of eccentricity measuring devices as the number of optical elements constituting the optical element array, or a device corresponding thereto, and separate all the optical elements constituting the optical element array without separating them. Measure optical elements at once.

  When the measurement is performed in the manner of (A), each optical element is separated into pieces before mounting other members on the optical element array. There arises a problem that it becomes difficult to manufacture the modules in a batch. Further, in this case, since each optical element is sequentially measured one by one, there arises a problem that the measurement time becomes long.

  When the measurement is performed in the manner of (B), the more the number of optical elements formed in the optical element array, the more complicated and large-scale the apparatus configuration for measuring the amount of eccentricity becomes. The problem of becoming.

  Each of the above problems is caused by the lens eccentricity measuring apparatus disclosed in Patent Document 1, the apparatus for performing the eccentricity measuring method disclosed in Patent Document 2, and the conventional eccentricity measuring apparatus ( It can be said that this is a problem that can occur in any of the apparatus that performs the reflection eccentricity measurement and the apparatus that performs the transmission eccentricity measurement.

  In each of the eccentricity measuring apparatuses according to the related art described above, the following problems occur even when the number of optical elements to be measured is one.

  The lens eccentricity measuring apparatus disclosed in Patent Document 1 must be at least one aspherical surface in the lens to be measured, and cannot be applied to the eccentricity measurement of a lens whose both surfaces are spherical. The problem occurs.

  In the apparatus that implements the method for measuring the amount of eccentricity disclosed in Patent Document 2, it is necessary to measure the three-dimensional position of the reference point and the shapes of both the front and back surfaces of the lens. The problem is complicated.

  The conventional eccentricity measuring device (the device that performs the reflection eccentricity measurement and the device that performs the transmission eccentricity measurement) is formed when measuring the amount of eccentricity of an optical element having a flat optical axis. Since the light spot is not clear, there is a problem that measurement may be difficult.

  In the first place, Patent Document 3 does not measure the amount of eccentricity by a device for a molded lens.

  The present invention has been made in view of the above problems, and its purpose is to measure all optical elements at once without having to separate each optical element constituting the optical element array. Another object of the present invention is to provide an eccentricity measuring device and an eccentricity measuring method that can be realized with a simple and small-scale device configuration.

  Another object of the present invention is applicable to the decentration measurement of a lens whose both surfaces are spherical, reduces the complexity of the decentration measurement, and further decenters the optical element in which the vicinity of the optical axis is flat. An object of the present invention is to provide an eccentricity measuring device and an eccentricity measuring method capable of reducing the possibility of difficulty in measurement when measuring the amount of the above.

  Still another object of the present invention is to provide an optical element, an optical element array, and an optical element unit that can easily measure the amount of eccentricity by the eccentricity measuring apparatus and the eccentricity measuring method of the present invention. It is in.

  In order to solve the above problem, the eccentricity measuring apparatus of the present invention can measure the amount of eccentricity of the optical element using light transmitted through the optical element. A decentration measuring apparatus comprising an element imaging optical system which is an object side telecentric optical system or a bilateral telecentric optical system, and the element imaging optical system is configured to receive both sides of the optical element by the incident transmitted light. And the amount of eccentricity of the optical element can be measured based on the contrast of the first and second transmitted images formed on both surfaces of the optical element. It is characterized by.

  The object-side telecentric optical system is an optical system that can be considered that the entrance pupil is at infinity. The object-side telecentric optical system has a characteristic that the shape of the image does not change even when the distance to the subject changes because a light beam parallel to the optical axis is taken from anywhere in the subject (optical element to be measured).

  The bilateral telecentric optical system is an optical system in which the entrance pupil and the exit pupil can be regarded as being at infinity. In the double-sided telecentric optical system, in addition to the characteristics of the object-side telecentric optical system described above, since the emitted light is parallel to the optical axis, the principal ray is imaged even if the image plane moves slightly with respect to the optical axis direction. The position of crossing the surface hardly changes, and the shape does not change even if the image is out of focus. Further, the double-sided telecentric optical system has a characteristic that the shape does not change even if the image plane is slightly inclined with respect to the optical axis.

  “Contrast of transmission image” in this application means not only the brightness of the transmission image, but also the distribution of light quantity that changes with the formation of the transmission image, including the shape of the transmission image, the position of the transmission image, and the size of the transmission image. Means general.

  According to the above configuration, the decentration measuring apparatus causes the transmitted light to enter the element imaging optical system, and the element imaging optical system emits the transmitted light, thereby connecting the optical element to be measured. Do the image. In the transmitted light, there are different light beams, a light beam recognized as being emitted from one surface of the optical element and a light beam recognized as being emitted from the other surface of the optical element. For this reason, in the image formation of the optical element, first and second transmission images in which both surfaces of the optical element are formed appear. The first and second transmitted images are images formed by transmitting light through an element imaging optical system that is an object-side telecentric optical system or a bilateral telecentric optical system. The other surface has a shape substantially equal to the shape seen from the upper surface. In addition, the mutual positional relationship between the first and second transmission images with respect to the direction perpendicular to the optical axis of the element imaging optical system is such that the corresponding one surface and the other surface of the optical element are in the same direction. The positional relationship is substantially equal. Therefore, it becomes possible to know the shape and mutual positional relationship between the corresponding one surface and the other surface of the optical element from the contrast of the first and second transmission images, and based on these, both surfaces of the optical element can be obtained. Since the positional deviation between them can be known, similarly, the amount of eccentricity of the optical element can be known.

  According to the above configuration, the decentering measuring apparatus can measure the amount of decentering of the optical element without having to focus the measuring light on a specific area of the optical element. Therefore, it is possible to perform measurement on a plurality of optical elements per measurement using one apparatus. Therefore, it is not necessary to divide each optical element into pieces before mounting other members on the optical element array, and it is possible to measure all the optical elements at once.

  In addition, according to the above configuration, the decentration measuring apparatus has an essential apparatus configuration regardless of the number of optical elements formed in the optical element array when all the optical elements are to be measured at once. The same as the element imaging optical system. Therefore, in particular, when a large number of optical elements are formed in the optical element array, it can be realized with a simple and small-scale apparatus configuration in comparison with the above-described conventional eccentricity measuring apparatuses.

  Further, according to the above configuration, the decentration measuring apparatus can measure the amount of decentration of the optical element from the contrast of the first and second transmission images formed on both surfaces of the optical element. Therefore, the present invention is not limited to a lens having at least one aspherical surface, and can be applied to a lens having both spherical surfaces without any problem.

  Further, according to the above configuration, in this eccentricity measuring apparatus, it is sufficient to measure only the amount of eccentricity of the optical element from the contrast of the first and second transmission images, and the measuring operation is sufficient. Since it becomes simple, the complexity of the eccentricity measurement can be reduced.

  Further, according to the above configuration, the decentration measuring apparatus can measure the amount of decentration of the optical element from the contrast of the first and second transmission images formed on both surfaces of the optical element. However, the first and second transmission images are sharp enough to be measured unless one surface or the other surface of the corresponding optical element is flat, and the vicinity of the optical axis is flat. Even when measuring the amount of eccentricity of the optical element, it is possible to reduce the possibility of difficulty in measurement.

  In addition, the eccentricity measuring apparatus of the present invention includes an eccentricity measuring unit that measures the amount of eccentricity of the optical element based on the contrast of the first and second transmission images.

  According to said structure, this eccentricity measuring apparatus can measure the amount of eccentricity of an optical element.

  In the eccentricity measuring apparatus according to the present invention, the eccentricity measuring unit may measure the center position eccentricity using the distance between the centers of the first and second transmission images as the amount of eccentricity of the optical element. It is characterized by comprising a part.

  According to the above configuration, the eccentricity measuring apparatus measures the amount of eccentricity by using the distance between the centers of the first and second transmission images as the amount of eccentricity of the optical element. Can do.

  In the eccentricity measuring apparatus of the present invention, at least one of the first and second transmission images is a circular transmission image that is circular, and the eccentricity measurement unit generates eccentricity of the optical element. The diameter reduction eccentricity is used to measure the amount of eccentricity of the optical element from the size of the diameter of the circular transmission image actually formed with respect to the diameter of the circular transmission image in the case where the optical element is not formed. It is characterized by including a measuring unit.

  According to the above configuration, the decentration measuring apparatus measures the amount of eccentricity of the optical element from the size of the reduced diameter of the circular transmission image, which changes according to the presence or absence and amount of the optical element. Thus, the amount of the eccentricity can be measured.

  In the eccentricity measuring apparatus of the present invention, a plurality of the first and second transmission images exist, and a first image for measuring a separation distance between the centers of the two first transmission images. At least one of an inter-distance measuring unit and a second inter-image distance measuring unit that measures a separation distance between the centers of the two second transmission images is provided.

  When the first and second transmission images are formed for each of the plurality of optical elements, a plurality of first and second transmission images, which are the same as the number of the optical elements, are formed.

  According to the above configuration, by measuring the distance between the centers of the two first transmission images, the pitch of the two optical elements respectively corresponding to the two first transmission images is measured. Can do. This is the same not only when measuring the separation distance between the centers of the first transmission image, but also when measuring the separation distance between the centers of the second transmission image.

  In the eccentricity measuring apparatus of the present invention, there are a plurality of the first and second transmitted images, and the center position eccentricity measuring unit is provided between the centers of the first and second transmitted images. At least one of the separation distances is defined as the amount of eccentricity of the optical element.

  According to said structure, it becomes possible to measure the amount of eccentricity between several optical elements. Such a configuration is convenient when measuring the amount of decentration between optical elements in a configuration (assembled lens) in which a plurality of optical elements are overlapped.

  In addition, the eccentricity measuring apparatus of the present invention is characterized by including at least one image sensor for displaying the first and second transmission images as images.

  According to said structure, a 1st and 2nd transmission image can be displayed as an image. By displaying the first and second transmission images as images, various measurements of the eccentricity described above can be easily performed on the plurality of first and second transmission images by image processing on the images. Can be implemented in a lump.

  In order to solve the above-described problem, the eccentricity measuring method of the present invention measures the amount of eccentricity of the optical element using light transmitted through the optical element that is incident on the optical element. A method of measuring eccentricity, wherein the transmitted light is incident on an element imaging optical system that is an object-side telecentric optical system or a bilateral telecentric optical system, and both sides of the optical element are respectively applied by the element imaging optical system. A step of forming an image, and a step of measuring the amount of eccentricity of the optical element based on the contrast of the first and second transmitted images formed on both surfaces of the optical element. It is said.

  According to the above method, this eccentricity measuring method measures all optical elements at once without the need to divide each optical element constituting the optical element array as in the case of this eccentricity measuring apparatus. Measurement can be performed with a simple and small-scale apparatus configuration. In addition, this eccentricity measuring method can be applied to the eccentricity measurement of a lens whose both surfaces are spherical, similarly to this eccentricity measuring apparatus, reducing the complexity of the eccentricity measurement, and further the vicinity of the optical axis. When measuring the amount of eccentricity of a flat optical element, it is possible to reduce the possibility of difficulty in measurement.

  Further, the eccentricity measuring method of the present invention uses the optical element array in which a plurality of the optical elements are integrally formed, and forms an image on both surfaces of each optical element constituting the optical element array. And performing the step and the above-described step of measuring the amount of eccentricity.

  According to said structure, this eccentricity measuring method can measure the amount of eccentricity of each optical element which comprises an optical element array. In this decentering measurement method, the element imaging optical system performs measurement in parallel on all optical elements within the range of the position of the subject from which light can be taken from the subject. It is possible.

  Further, the eccentricity measuring method of the present invention is configured such that the two surfaces of the two optical elements that are overlapped are overlapped by the step of superimposing the two optical element arrays and the step of superimposing the two optical element arrays. Based on the step of forming an image, the step of measuring the amount of eccentricity, and the measured amount of eccentricity, the optical axes of the two overlapping optical elements are aligned. And adjusting the relative positional relationship of each optical element array.

  According to the above method, based on the measurement result of the amount of eccentricity, alignment between the two optical elements can be performed (the optical axes of the two optical elements are aligned).

  In addition, the eccentricity measuring method of the present invention includes, in advance, a protrusion that scatters incident light on an outer peripheral portion of one surface of each optical element or each outer peripheral portion of both surfaces with respect to at least one optical element. It includes a step of providing.

  According to the above method, the image formed on the protruding portion that scatters the incident light becomes darker than the other image portions, so that the contours of the first and second transmitted images can be more easily recognized. This makes it easy to measure the amount of eccentricity of the optical element based on the contrast of the first and second transmission images. When the contrast of the first and second transmission images is unclear in the original optical element shape, the above method can be applied to either the front or back surface of the lens (optical element).

  Further, the eccentricity measuring method of the present invention uses two optical elements, and with respect to one of the optical elements, the incident light is incident on one outer peripheral part of each optical element or both outer peripheral parts. The step of providing a projecting portion to be scattered and the step of bonding one and the other optical elements so that the projecting portion is brought into contact with the other optical element are performed.

  According to said method, according to the height of the protrusion part of one optical element, the space | interval of each optical element can be adjusted suitably other than said contact part.

  The optical element of the present invention is an optical element for measuring the amount of eccentricity using transmitted light through which incident light is transmitted in order to solve the above-described problem. The protrusion part which scatters the said incident light was provided in the outer peripheral part of each effective aperture in a part or both surfaces, It is characterized by the above-mentioned.

  According to the above configuration, when at least one effective aperture portion of the optical element is imaged using the transmitted light, the image formed on the protruding portion that scatters the incident light is Since it becomes darker than the image portion, it is possible to more easily recognize the contour of the image formed by imaging the effective aperture portion, and based on the contrast of the image formed by imaging the effective aperture portion. It becomes easy to measure the amount of eccentricity of the element. The effective aperture is an aperture that regulates the range of the light flux on a predetermined surface in the mount of the optical system or its member.

  Therefore, the present optical element can measure the amount of eccentricity of the optical element based on the contrast of the first and second transmission images, and can be measured by the eccentricity measuring apparatus and the eccentricity measuring method of the present invention. Is easy to measure.

  The optical element array of the present invention is an optical element array in which a plurality of optical elements are integrally formed, and at least one of the plurality of optical elements is the above-described optical element. It is said. The present optical element provided in the present optical element array has the same effect as described above.

  An optical element unit of the present invention includes a first optical element and a second optical element that are the above-described optical elements, and the protruding portion of the first optical element is in contact with the second optical element. It is characterized by.

  According to said structure, according to the height of the protrusion part of a 1st optical element, the space | interval of a 1st and 2nd optical element can be suitably adjusted except a contact part with a 2nd optical element.

  As described above, the eccentricity measuring apparatus of the present invention is an eccentricity measuring apparatus capable of measuring the amount of eccentricity of the optical element using light transmitted through the optical element. And an element imaging optical system which is an object side telecentric optical system or a bilateral telecentric optical system, and the element imaging optical system forms images on both sides of the optical element by the incident transmitted light. Therefore, the amount of eccentricity of the optical element can be measured based on the contrast of the first and second transmitted images formed on both surfaces of the optical element.

  An eccentricity measuring method of the present invention is an eccentricity measuring method in which light incident on an optical element is measured by using transmitted light transmitted through the optical element, and the amount of eccentricity of the optical element is measured. A step of causing the transmitted light to enter an element imaging optical system which is a side telecentric optical system or a both-side telecentric optical system, and imaging both surfaces of the optical element by the element imaging optical system, and the optical element Measuring the amount of decentration of the optical element based on the contrast of the first and second transmitted images formed on both surfaces of the optical element.

  Therefore, the decentration measuring apparatus and the decentration measuring method can measure all the optical elements in a lump without having to separate each optical element constituting the optical element array. There is an effect that measurement can be performed with a small-scale device configuration.

  In addition, the eccentricity measuring apparatus and the eccentricity measuring method can be applied to the eccentricity measurement of a lens whose both surfaces are spherical, reducing the complexity of the eccentricity measurement, and further, the vicinity of the optical axis is flat. When measuring the amount of eccentricity of the optical element, there is an effect that it is possible to reduce the possibility of difficulty in measurement.

  The optical element of the present invention is an optical element in which the amount of eccentricity is measured using transmitted light through which incident light is transmitted, and the outer diameter part of the effective aperture on one side or each effective aperture on both sides The protrusion part which scatters the said incident light was provided in the outer peripheral part.

  Therefore, this optical element has an effect that the amount of eccentricity can be easily measured by the present eccentricity measuring apparatus and the present eccentricity measuring method. The optical element provided in the optical element array and the optical element unit of the present invention has the same effects as described above.

It is a top view which shows the structure of the eccentricity measuring apparatus which concerns on embodiment of this invention. It is a figure explaining the point of the eccentricity measurement by the center position eccentricity measurement part when the eccentricity of the optical element has not generate | occur | produced. It is a figure explaining the point of the eccentricity measurement by the center position eccentricity measurement part in case the eccentricity of the optical element has generate | occur | produced. It is a figure explaining the point of the eccentric measurement by a diameter reduction eccentric measurement part. It is a figure explaining the point of the pitch measurement between lenses by the 1st image distance measurement part. It is a figure which shows the relationship between the structure of the optical element which concerns on this invention, and the contrast of the 1st and 2nd transmitted image formed from the same optical element. 7A to 7D are cross-sectional views illustrating a method for manufacturing a module including an optical element. 8A to 8E are cross-sectional views illustrating another method for manufacturing a module including an optical element. It is a figure explaining the method of calculating | requiring the center and radius of a circle by the least square method. It is a figure explaining the point of the eccentricity measurement by the center position eccentricity measurement part when the eccentricity of the lens which bonds two lenses has not generate | occur | produced. It is a figure explaining the point of the eccentricity measurement by the center position eccentricity measurement part in case the eccentricity of the lens which bonds two lenses has generate | occur | produced. It is a figure which shows a mode that the point of the eccentricity measurement which concerns on FIG. 10 and FIG. 11 is applied with respect to each of the array-shaped lens in which each lens is shape | molded. FIGS. 13A to 13C are diagrams showing an outline of the alignment procedure. It is a figure which shows the relationship between the structure of another optical element which concerns on this invention, and the contrast of the 1st and 2nd transmitted image formed from the same optical element. It is a figure explaining the point of the eccentricity measurement by the center position eccentricity measurement part when the eccentricity of another optical element has not generate | occur | produced. It is a figure explaining the point of the eccentricity measurement by the center position eccentricity measurement part in case the eccentricity of another optical element has generate | occur | produced.

BACKGROUND OF THE INVENTION
First, an outline of a method for manufacturing a module (camera module) 136 including an optical element according to a conventional general technique will be described with reference to FIGS.

  The first lens (optical element) L1 and the second lens (optical element) L2 are produced mainly by injection molding using a thermoplastic resin 131. In the injection molding using the thermoplastic resin 131, the thermoplastic resin 131 softened by heating is pushed into the mold 132 while applying a predetermined injection pressure (approximately 10 to 3000 kgf / c), so that the thermoplastic resin 131 is molded into the metal mold. The mold 132 is filled and molded (see FIG. 7A).

  After molding, the thermoplastic resin 131 is removed from the mold 132 and cut for each lens (optical element). Here, an example is shown in which the thermoplastic resin 131 taken out from the mold 132 is cut into a first lens L1 and a second lens L2 (see FIG. 7B).

  The first lens L1 and the second lens L2 are assembled by being fitted (or press-fitted) into a lens barrel (housing) 133 (see FIG. 7C).

  The intermediate product of the module 136 shown in FIG. 7C is fitted into the lens barrel 134 and assembled. Thereafter, the sensor 135 is mounted on the end of the lens barrel 134 on the image plane (not shown) side of the module 136. Thus, the module 136 is completed (see FIG. 7D).

  The weighted deflection temperature of the thermoplastic resin 131 used for the first lens L1 and the second lens L2 that are injection-molded lenses is about 130 degrees Celsius. For this reason, the thermoplastic resin 131 has insufficient resistance to thermal history (maximum temperature is about 260 degrees Celsius) when performing reflow, which is a technique mainly applied in surface mounting, and thus occurs during reflow. I can't stand the heat.

  Therefore, when the module 136 is mounted on the substrate, only the sensor 135 portion is mounted first by reflow. Thereafter, a method of adhering the first lens L1 and the second lens L2 portion with a resin or a mounting method of locally heating the mounting portion of the first lens L1 and the second lens L2 is adopted.

  On the other hand, in recent years, in the field of camera modules for portable devices and the like, an arrayed lens (optical element array) represented by a wafer level lens applied at the time of performing a wafer level lens process has been developed. An array-shaped lens is formed by integrally molding a plurality of lenses, and more specifically, a plurality of lenses are integrally molded on a single plate made of resin.

  A method for manufacturing a module (camera module) 148 including an optical element according to the background of the present invention will be described with reference to FIGS.

  In recent years, a so-called heat-resistant camera module using a thermosetting resin or an ultraviolet curable resin as a material for the first lens L1 and / or the second lens L2 has been developed. The module 148 described here is this heat-resistant camera module. As a material for the first lens L1 and the second lens L2, a thermosetting resin (thermal) is used instead of the thermoplastic resin 131 (see FIG. 7A). Curable resin) 141 is used.

  The reason for using the thermosetting resin 141 as the material of the first lens L1 and / or the second lens L2 is to manufacture a large number of modules 148 in a batch, thereby reducing the manufacturing cost of each module 148. Because. The reason why the thermosetting resin 141 is used as the material of the first lens L1 and the second lens L2 is to enable the module 148 to be reflowed.

  Many techniques for manufacturing the module 148 have been proposed. Among them, typical techniques are the above-described injection molding and wafer level lens process. In particular, the wafer level lens (reflowable lens) process, which is more advantageous in module manufacturing time and other comprehensive knowledge, has recently attracted attention.

  In carrying out the wafer level lens process, it is necessary to suppress the occurrence of plastic deformation in the first lens L1 and the second lens L2 due to heat. Because of this necessity, the first lens L1 and the second lens L2 are wafer levels using a thermosetting resin material or an ultraviolet curable resin material that is not easily deformed even when heat is applied and that has excellent heat resistance. The lens is drawing attention. Specifically, a wafer level using a thermosetting resin material or an ultraviolet curable resin material having heat resistance that does not cause plastic deformation even when heat of 260 to 280 degrees Celsius is applied for 10 seconds or more. The lens is drawing attention. In the wafer level lens process, array-shaped lenses (optical element arrays) 144 and 145 are collectively formed by array-shaped molds 142 and 143, and then bonded together, and an array-shaped sensor 147 is mounted. Thereafter, the module 148 is manufactured by cutting individually.

  From here, the details of the wafer level lens process will be described.

  In the wafer level lens process, first, thermosetting is performed by an array-shaped mold 142 in which a large number of concave portions are formed and an array-shaped mold 143 in which a large number of convex portions corresponding to each of the concave portions are formed. The thermosetting resin 141 is cured by sandwiching the functional resin 141, and an array-shaped lens is produced in which lenses are formed for each combination of concave and convex portions corresponding to each other (see FIG. 8A).

  The array-shaped lens produced in the process shown in FIG. 8A includes an array-shaped lens 144 formed with a large number of first lenses L1 and an array-shaped lens formed with a large number of second lenses L2. A lens 145. Then, with respect to each of the first lens L1 and each second lens L2, an optical axis La (optical axis of the first lens) passing through the first lens L1 is arranged between the arrayed lens 144 and the arrayed lens 145. The optical axis La (the optical axis of the second lens) passing through the corresponding second lens L2 is bonded so as to be positioned on the same straight line (see FIG. 8B). Specifically, the alignment method for aligning the arrayed lenses 144 and 145 includes various methods such as performing adjustment while taking an image in addition to aligning the optical axes La to each other. Is also affected by the pitch finish accuracy of the wafer.

  A large number of optical lenses La and the centers 146c of the corresponding sensors 146 are located on the same straight line at the end of the array lens 145 on the image plane (not shown) side of the module 148. An array-shaped sensor 147 on which the sensor 146 is mounted is mounted (see FIG. 8C).

  Through the process shown in FIG. 8C, a large number of modules 148 in an array are cut into one module 148 (see FIG. 8D), and the module 148 is completed (FIG. 8). (See (e)).

  By manufacturing a large number of modules 148 in a lump by the wafer level lens process shown in FIGS. 8A to 8E, the manufacturing cost of the modules 148 can be reduced. Furthermore, when the completed module 148 is mounted on a substrate (not shown), the first lens L1 and the first lens L1 and the As the second lens L2, it is more preferable to use a thermosetting resin or an ultraviolet curable resin having a resistance of 10 seconds or more to heat of 260 to 280 degrees Celsius. The module 148 can be reflowed by using a thermosetting resin or an ultraviolet curable resin having heat resistance for the first lens L1 and the second lens L2. . Further, by applying a resin material having heat resistance to the wafer level lens process, it is possible to manufacture a module including an optical element that can cope with reflow at low cost.

  By the way, from the viewpoint of improving the degree of freedom in development and production management, in the case of an array-shaped lens, each lens constituting the array-shaped lens is not separated into individual pieces, and the eccentricity of each lens is reduced. It is preferred to measure the amount. For array-type lenses such as wafer level lenses, it may be necessary to fabricate a large number of lenses at a time and measure all the lenses that are integrally molded in the same resin. An eccentricity measuring apparatus capable of measuring the amount of eccentricity in a large amount and at high speed is desired.

  The main object of the present invention is that it is possible to measure all the lenses in a lump without easily separating each lens (optical element) constituting the arrayed lens (optical element array). An eccentricity measuring apparatus and an eccentricity measuring method that can be realized with a small-scale apparatus configuration, and the amount of eccentricity can be easily measured by the eccentricity measuring apparatus and the eccentricity measuring method. Providing a shaped lens.

Embodiment
The eccentricity measuring apparatus 1 shown in FIG. 1 is an apparatus that measures the amount of eccentricity of each lens (optical element) 40 constituting the arrayed lens (optical element array) 4.

  The eccentricity measuring apparatus 1 includes a light source 2, an element imaging optical system 5, an image sensor (imaging element) 6, a display unit 7, and an eccentricity measuring unit 80.

  The element imaging optical system 5 includes an entrance side lens 50, an aperture stop 51, and an exit side lens 52.

  The eccentricity measuring unit 80 includes a center position eccentricity measuring unit 81, a diameter reduction eccentricity measuring unit 82, a first inter-image distance measuring unit 83, and a second inter-image distance measuring unit 84.

  The light source 2 is a light source that irradiates the array-shaped lens 4 with the light 3. As the light 3, laser light, white light, or the like can be applied. Therefore, as the light source 2, a known laser oscillation device or a device that emits white light is applicable. Further, the light source 2 is not necessarily provided in the eccentricity measuring device 1, and may be configured to exist separately from the eccentricity measuring device 1. When the light 3 is a laser beam, the resolution in the eccentricity measuring device 1 can be improved.

  The light 3 emitted from the light source 2 is applied to the entire surface of the arrayed lens 4 farther from the element imaging optical system 5. A second surface 42 which is a spherical surface of each lens 40 is formed on the surface of the arrayed lens 4 farther from the element imaging optical system 5.

  Thereafter, the light 3 passes through the arrayed lens 4 and is emitted as transmitted light according to the present invention. The transmitted light is emitted from the entire surface of the arrayed lens 4 closer to the element imaging optical system 5, and on this surface, a first surface 41 that is a spherical surface of each lens 40 is formed. Molded.

  That is, the transmitted light can be interpreted as the light 3 incident on each lens 40 constituting the arrayed lens 4 being transmitted through each lens 40. More specifically, the transmitted light is incident on the arrayed lens 4 from the second surface 42 side of each lens 40 in the arrayed lens 4, and the arrayed lens including each lens 40. 4 can be interpreted as being emitted from the first surface 41 side of each lens 40 in the arrayed lens 4.

  The transmitted light is incident on the incident side lens 50 of the element imaging optical system 5. Since the incident side lens 50 is a general convex lens (focusing lens), the incident transmitted light is focused at the focal point on the rear (image sensor 6) side.

  The light focused by the incident side lens 50 enters the aperture stop 51. The aperture stop 51 emits incident light by limiting the diameter of the beam bundle in the optical axis direction of the element imaging optical system 5.

  Here, the aperture stop 51 is disposed at the focal point on the rear side of the incident side lens 50. As a result, the element imaging optical system 5 takes in the transmitted light as a light beam parallel to the optical axis from anywhere in the array-shaped lens 4. In this case, even if the distance from each lens 40 constituting the arrayed lens 4 to the element imaging optical system 5 (specifically, the incident side lens 50) is changed, it is formed from each corresponding lens 40. The shape of the images (first transmission image 91 and second transmission image 92 described later) does not change.

  The light that has passed through the aperture stop 51 enters the exit side lens 52. The exit side lens 52 is a general convex lens (focusing lens).

  Here, the aperture stop 51 is further arranged at the focal point on the front (light source 2) side of the emission side lens 52. In this case, the light that has passed through the aperture stop 51 is incident on the emission side lens 52 so as to be emitted from the emission side lens 52 as a light beam parallel to the optical axis of the element imaging optical system 5. In other words, when the light that has passed through the aperture stop 51 is incident, the exit side lens 52 converges the light to emit light that becomes a light flux parallel to the optical axis of the element imaging optical system 5. .

  In the present embodiment, the element imaging optical system 5 has the same focal point in which the positions of the rear focal point of the incident side lens 50 and the front focal point of the emission side lens 52 are equal to each other. In this configuration, the aperture stop 51 is disposed at the position. In the case of this configuration, the element imaging optical system 5 is a double-sided telecentric optical system.

  When the image sensor 6 is composed of a CCD (Charge Coupled Device) or a CMOS (Complementary Metal Oxide Semiconductor), the element imaging optical system 5 is a bilateral telecentric optical system. Preferably there is. This is because, when a microlens (not shown) is attached to each pixel of the image sensor 6 composed of a CCD or a CMOS, the light receiving efficiency of the image sensor 6 decreases when the light beam is obliquely incident. This is because it is effective to make the light emitted from the element imaging optical system 5 parallel to the optical axis in order to suppress it.

  However, in order to achieve the minimum function of the present invention, there is no problem even if the element imaging optical system 5 is an object side telecentric optical system. In order to realize the object side telecentric optical system, a configuration in which the exit side lens 52 is omitted from the configuration of the element imaging optical system 5 shown in FIG. If the specification for the incident angle of the image sensor 6 can be satisfied, the element imaging optical system 5 may be a double-sided telecentric optical system or an object-side telecentric optical system, but has telecentric characteristics at least on the object side. Need to be. That is, the element imaging optical system 5 is an object-side telecentric optical system and an optical system that forms an object image on the image sensor 6 is a minimum necessary component. Further, it is preferable that each lens of the element imaging optical system 5 uses a large-diameter lens and has an observation field range as wide as possible.

  Since the specific value of the aperture defined by the “large aperture” depends on the configuration change of each lens constituting the element imaging optical system 5, it is difficult to describe it numerically. For example, when measuring one lens 40, the visual field range that can be observed by the element imaging optical system 5 needs to be about φ10 mm. When measuring a plurality of lenses 40, it is preferable that the visual field range observable by the element imaging optical system 5 is about φ20 to 100 mm. The observable visual field range is preferably as large as possible because a large number of lenses 40 can be measured in a lump. Further, in the element imaging optical system 5, it is the incident side lens 50 that is required to have a large aperture in order to widen the observable visual field range. In some cases, the incident side lens 50 is constituted by a plurality of lenses. From the above, the specific example of the aperture defined by the above “large aperture” is, in other words, realized an observable visual field range of about φ20 to 100 mm by each lens constituting the element imaging optical system 5. It is a caliber that can be done.

  The light 3 emitted from the light source 2 is incident on a flat portion (that is, a surface on the second surface 42 side excluding the second surface 42 of each lens 40) in the array-shaped lens 4 that is substantially perpendicular to the light beam. Then, except for a certain amount of reflection, it goes straight without being influenced by the surface of the arrayed lens 4 and is observed as a bright image on the image plane (not shown) of the element imaging optical system 5. On the other hand, the first surface 41 and the second surface 42 of each lens 40 in the array-shaped lens 4 having an inclination with respect to the surface perpendicular to the light rays refract and scatter the irradiated light 3. On the image plane of the element imaging optical system 5, the image is observed as a darker image than the bright image.

  Further, the irradiated light 3 exhibits different refraction and scattering on the first surface 41 and the second surface 42 of the same lens 40. Therefore, strictly speaking, in the transmitted light, with respect to each lens 40, the light beam recognized as being emitted from the first surface 41 of the lens 40 in the array-shaped lens 4 and the lens in the array-shaped lens 4. There are different light beams, one that is recognized as being emitted from the second surface 42 of 40. Therefore, when the element imaging optical system 5 forms an image of the lens 40 with the incident transmitted light, the first surface 41 is formed as an image formed from the lens 40. A transmission image 91 (see FIG. 2) and a second transmission image 92 (see FIG. 2) on which the second surface 42 is formed appear.

  The first transmission image 91 and the second transmission image 92 are images in which the transmitted light is formed through the element imaging optical system 5 that is a double-sided telecentric optical system. The two surfaces 42 have a shape substantially equal to the shape viewed from above. In addition, the positional relationship between the first transmission image 91 and the second transmission image 92 with respect to the direction perpendicular to the optical axis of the element imaging optical system 5 is the corresponding first surface 41 and second surface with respect to the same direction. 42 is substantially equal to the mutual positional relationship with 42. Further, each of the first transmission images 91 and each of the second transmission images 92 and the bright images formed by the transmission light transmitted through the flat portion are arranged in an array on the image plane of the element imaging optical system 5. In the lens 4, a contrast difference is generated that changes in accordance with each inclination of the first surface 41 and the second surface 42 of each corresponding lens 40.

  As used herein, “image contrast” generally refers to the distribution of light intensity that changes with image formation, including not only the brightness of the image but also the shape of the image, the position of the image, and the size of the image. Suppose you are.

  The light emitted from the emission side lens 52 is incident on the image sensor 6. The image sensor 6 is an image sensor configured by a solid-state image sensor such as a CCD or a CMOS, converts incident light into an electric signal, and supplies the electric signal to the display unit 7 and the eccentricity measuring unit 80. .

  Here, the image sensor 6 is disposed at a position corresponding to the image plane of the element imaging optical system 5. Therefore, the image sensor 6 has an array-like lens 4 that shows the first transmission image 91 and the second transmission image 92 and the bright image formed by the transmitted light that has passed through the flat portion. All of the transmitted light from is incident.

  The display unit 7 displays the first transmission image 91 and the second transmission image 92 relating to each lens 40 formed by the light incident on the image sensor 6 based on the electrical signal supplied from the image sensor 6. Display as an image. As the display unit 7, various known display devices such as a liquid crystal display device, a plasma display, a CRT (Cathode Ray Tube), and an organic EL (ElectroLuminescence) display device can be used. .

  The eccentricity measuring unit 80 is, for example, a predetermined input signal from a CPU (Central Processing Unit) (not shown) indicating that the operation is started or the input of the electric signal as a trigger. Thus, the amount of eccentricity of each lens 40 is measured. The eccentricity measuring unit 80 may display the result of measuring the amount of eccentricity of each lens 40 on the display unit 7 as shown in FIG. 1, or other storage medium (recording) such as a memory (recording). Medium).

  FIG. 2 is a diagram for explaining the point of the eccentricity measurement by the center position eccentricity measuring unit 81 when the lens 40 is not eccentric. FIG. 3 is a diagram for explaining the point of the eccentricity measurement by the center position eccentricity measuring unit 81 when the lens 40 is eccentric.

  The first transmission image 91 and the second transmission image 92, which are formed on both surfaces of the same lens 40, are approximately equal to the shapes of the corresponding first surface 41 and second surface 42 viewed from the top, respectively, and The relative positional relationship between the first transmission image 91 and the second transmission image 92 relates to a direction perpendicular to the optical axis when the lens 40 is not decentered (hereinafter referred to as “ideal”). The relative positional relationship between the corresponding first surface 41 and second surface 42 is approximately equal (see FIGS. 2 and 3).

  The center position eccentricity measuring unit 81 uses the electrical signal supplied from the image sensor 6 (see FIG. 1) to shape each of the first transmission image 91 and the second transmission image 92, and further, the first transmission image 91 and the first transmission image 91. Information indicating the relative positional relationship with the two transmission images 92 is obtained.

  The center position eccentricity measuring unit 81 calculates the center 93 of the first transmission image 91 from the obtained information indicating the shape of the first transmission image 91 and the information indicating the shape of the second transmission image 92. From this, the center 94 of the second transmission image 92 is calculated.

  As a method for calculating the centers 93 and 94, the center 93 is calculated based on the above information indicating the shape of the first transmission image 91 by, for example, the least square method, and the shape of the second transmission image 92 is indicated. A method of calculating the center 94 based on the above information can be considered. This is because the shapes of the first surface 41 and the second surface 42, which are spherical surfaces, are clearly circular as viewed from the top, and the shapes of the first transmission image 91 and the second transmission image 92 are also the same. Since it is clearly circular (circular transmission image), it is an applicable method.

In order to calculate the center 93 based on the information indicating the shape of the first transmission image 91 by the least square method, first, the center 93xy of the circle is set inside the first transmission image 91, and this is assumed to be virtual. The center point. Next, the first transmission image 91 is divided so that the first transmission image 91 is evenly spaced from the center 93xy, that is, for example, the angle a, the angle b,. At this time, the coordinates (x _i , y _i ) of the point i that is one of the intersections (point 1, point 2,...) Of each line to be divided and the circumference of the first transmission image 91 are respectively The following mathematical formulas (3) and (4) are obtained. At this time, the center coordinates (α, β) of the first transmission image 91 and the radius R of the first transmission image 91 can be obtained by the following mathematical formulas (5) to (7). When the center 94 is calculated based on the information indicating the shape of the second transmission image 92, the calculation may be performed in the same manner (see FIG. 9).

  The technique for calculating the center of the circle (the first transmission image 91 and the second transmission image 92) by the least square method can be easily realized by a well-known and commonly used technique. It is.

  The center 93 is the center of the first surface 41 of the lens 40, the center 94 is the center of the second surface 42 of the lens 40, and the corresponding first transmission image 91 and second transmission image are obtained as described above. 92.

  Thereafter, the center position eccentricity measuring unit 81 obtains a separation distance between the center 93 and the center 94 (a separation distance between the centers of the first and second transmission images) from the calculated centers 93 and 94, respectively.

  Here, in FIG. 2, the positions of the center 93 and the center 94 coincide with each other. In this case, with respect to the direction perpendicular to the ideal optical axis, the center of the first surface 41 of the lens 40 and the center of the second surface 42 of the lens 40 are at the same position. Therefore, the optical axis 41a passing through the center of the first surface 41 of the lens 40 and the optical axis 42a passing through the center of the second surface 42 of the lens 40 coincide with each other. It can be assumed that no wick has occurred.

  On the other hand, in FIG. 3, the positions of the center 93 and the center 94 are different from each other, and the distance between them is d. In this case, with respect to the direction perpendicular to the ideal optical axis, the center of the first surface 41 of the lens 40 and the center of the second surface 42 of the lens 40 are separated from each other by a distance d. Therefore, the optical axis 41a passing through the center of the first surface 41 of the lens 40 and the optical axis 42a passing through the center of the second surface 42 of the lens 40 are mutually in the direction perpendicular to the ideal optical axis. In this case, it can be assumed that the lens 40 having an amount d is decentered.

  The element imaging optical system 5 takes in a light beam parallel to the optical axis from each of both surfaces of the lens 40 due to the above-described characteristics of the both-side telecentric optical system. For this reason, when the centers of both surfaces of the lens 40 are aligned in the direction of the ideal optical axis, these centers are shown on the corresponding first transmission image 91 and second transmission image 92, respectively. The center 93 of the first transmission image 91 and the center 94 of the second transmission image 92 are at the same position. On the other hand, when the centers of both surfaces of the lens 40 are not aligned in the direction of the ideal optical axis and exhibit a positional shift in the direction perpendicular to the optical axis, corresponding to the positional shift, The center 93 of the first transmission image 91 and the center 94 of the second transmission image 92 are separated from each other. Therefore, the center position eccentricity measuring unit 81 measures the amount of eccentricity (so-called parallel eccentricity) of the lens 40 by regarding the distance as the amount of positional deviation at each center of both surfaces of the lens 40. be able to.

  FIG. 4 is a diagram for explaining the point of eccentricity measurement by the diameter reduction eccentricity measuring unit 82.

  In the following detailed description of the diameter reduction eccentricity measuring unit 82, the diameter reduction eccentricity measuring unit 82 is information indicating the shape of the first transmission image 91 as an example of the procedure for measuring the eccentricity of the lens 40. Only the case of measuring the amount of eccentricity θ on the first surface 41 of the lens 40 will be described. However, when the diameter reduction eccentricity measuring unit 82 measures the amount of eccentricity on the second surface 42 of the lens 40 based on the information indicating the shape of the second transmission image 92, both of them are used. Even in the case of measurement, the basic principle (point) of the eccentricity measurement is the same, and those skilled in the art will understand from the following detailed description that the first surface 41 and / or the second surface of the lens 40. Measuring the amount of 42 eccentricity would be easily feasible.

  The diameter reduction eccentricity measuring unit 82 obtains information indicating the shape of the first transmission image 91 from the electric signal supplied from the image sensor 6 (see FIG. 1).

  The diameter reduction eccentricity measuring unit 82 calculates the diameter a of the first transmission image 91 from the obtained information indicating the shape of the first transmission image 91 obtained.

  As a method for calculating the diameter a, for example, a method using the least square method described above is conceivable. This is an applicable technique because the first transmission image 91 has a circular shape (a circular transmission image).

  The method for calculating the diameter a based on the above-described information indicating the shape of the first transmission image 91 by the least square method has already been described in the description of the method for calculating the center 93 by the least square method (that is, the above formula). Since the solution of (5) × 2), detailed description is omitted here (see FIG. 9).

  The technique for calculating the diameter of the circle (first transmission image 91) by the least square method is easy because it can be sufficiently realized by a well-known and commonly used technique.

  The diameter a obtained as described above indicates the diameter of the first surface 41 of the lens 40 on the first transmission image 91.

  Here, on the first surface 41 of the lens 40 (see FIG. 1) shown in FIG. 4, the diameter of the first transmission image 91 obtained by the diameter reduction eccentricity measuring unit 82 is a as described above. When the diameter is a, it can be assumed that no eccentricity occurs on the first surface 41.

  On the other hand, the first surface 41t of the lens 40 (see FIG. 1) shown in FIG. 4 is decentered upward (so-called tilt eccentricity) with respect to the first surface 41 by an angle θ. Shows the case. In FIG. 4, the first transmission image obtained by forming the image on the first surface 41 t in the same manner as the image formation on the first surface 41 is shown as a first transmission image 91 t. The diameter of the first transmission image 91t obtained by the diameter reduction eccentricity measuring unit 82 is b shorter than the above a.

  Then, the diameter reduction eccentricity measuring unit 82 uses the above-described diameter a and diameter b to obtain the angle θ at which the eccentricity is generated by the following mathematical formula (2). As a result, it is possible to measure the amount of eccentricity θ.

θ = arccos (b / a) (2)
The diameter-reducing eccentricity measuring unit 82 is similar to the above formula (2) even if the first surface 41 of the lens 40 (see FIG. 1) shown in FIG. ) To measure the angle (amount of eccentricity) θ.

  When the first surface 41t is not circular but elliptical, the elliptical short axis may be used instead of the diameter b.

  FIG. 5 is a diagram for explaining a procedure for measuring the pitch between the lenses 40 by the first inter-image distance measuring unit 83.

  Lenses 401 to 403 indicate three lenses 40. However, the number of the lenses 40 to which the procedure for measuring the pitch between the lenses 40 by the first inter-image distance measuring unit 83 is applicable is not particularly limited as long as it is two or more.

  Each lens 401 to 403 is provided with a corresponding first surface 411 to 413 (first surface 41) and second surface 421 to 423 (second surface 42).

  The first transmission images 911 to 913 (first transmission image 91) are formed by imaging the corresponding first surfaces 411 to 413 by the element imaging optical system 5 (see FIG. 1). The second transmission images 921 to 923 (second transmission image 92) are obtained by imaging the corresponding second surfaces 421 to 423 by the element imaging optical system 5 (see FIG. 1).

  The first inter-image distance measuring unit 83 calculates the centers 931 to 933 of the first transmission images 911 to 913 from the electric signal supplied from the image sensor 6 (see FIG. 1).

  The processing until the first inter-image distance measuring unit 83 calculates the centers 931 to 933 is the processing until the center position eccentricity measuring unit 81 calculates the center 93 (see FIGS. 2 and 3). Is sufficient for each lens 401-403.

  Then, the first inter-image distance measuring unit 83 measures the pitch of each of the corresponding two lenses 401 to 403 from the calculated distance between the two centers in each of the centers 931 to 933.

  For example, the first inter-image distance measuring unit 83 sets the distance between the center 931 and the center 932 as the pitch between the lenses 401 and 402, and sets the distance between the center 931 and the center 933 as the pitch between the lenses 401 and 403. .

  Furthermore, instead of the first inter-image distance measuring unit 83, the second inter-image distance measuring unit 84 may measure the pitch between the lenses 40.

  When the pitch measurement between the lenses 40 is performed by the second inter-image distance measuring unit 84, the second inter-image distance measuring unit 84 first determines the first inter-image distance from the electric signal supplied from the image sensor 6 (see FIG. 1). The centers 941 to 943 of the two transmitted images 921 to 923 are calculated.

  The processing until the second inter-image distance measuring unit 84 calculates the centers 941 to 943 is the processing until the center position eccentricity measuring unit 81 calculates the center 94 (see FIGS. 2 and 3). Is sufficient for each lens 401-403.

  Although not shown, the second inter-image distance measuring unit 84 selects one of the two corresponding lenses 401 to 403 from the calculated separation distance between the centers 941 to 943. Measure the pitch.

  For example, the second inter-image distance measuring unit 84 sets the distance between the center 941 and the center 942 as the pitch between the lenses 401 and 402, and sets the distance between the center 941 and the center 943 as the pitch between the lenses 401 and 403. .

  The first image distance measuring unit 83 and the second image distance measuring unit 84 can be measured with respect to the pitch between the lenses 40 even if only one of them is provided. .

  The positions of the first transmission images 911 to 913 on which the first surfaces 411 to 413 are separately imaged are the positions of the first surfaces 411 to 413 in the direction perpendicular to the optical axis of the element imaging optical system 5. The relationship will be reflected. Therefore, if the lenses 401 to 403 are arranged so as to be dispersed in the direction, the processing until the respective centers 931 to 933 are calculated is simply the processing until the center 93 is calculated. It can be implemented without any problem just by carrying out with respect to .about.403. Further, even if the lenses 401 to 403 are provided so as to overlap each other in the direction, if the first transmission images 911 to 913 can be clearly distinguished to some extent due to the change in contrast accompanying the overlapping, the above processing is performed. In doing so, it does not cause much trouble.

  Similarly, the positions of the second transmission images 921 to 923 on which the second surfaces 421 to 423 are separately imaged are the positions of the second surfaces 421 to 421 in the direction perpendicular to the optical axis of the element imaging optical system 5. The positional relationship of 423 is reflected. Therefore, if the lenses 401 to 403 are arranged so as to be dispersed in the direction, the processes until the centers 941 to 943 are calculated are simply the processes until the centers 94 are calculated. It can be implemented without any problem just by carrying out with respect to .about.403. Further, even if the lenses 401 to 403 are provided so as to overlap in the direction, if the second transmission images 921 to 923 can be clearly distinguished to some extent by the change in contrast accompanying the overlap, the above processing is performed. In doing so, it does not cause much trouble.

  Further, in FIG. 5, the center position eccentricity measuring unit 81 (see FIGS. 2 and 3) is further combined to measure the amount of eccentricity of each of the lenses 401 to 403. In order to measure the amount of eccentricity of each of the lenses 401 to 403 by the center position eccentricity measuring unit 81, the above-described series of procedures for measuring the eccentricity of the lens 40 having the amount d (FIG. 2). And FIG. 3) is sufficient for each lens 401-403.

  Further, although not shown, in order to measure the amount of eccentricity of each of the lenses 401 to 403 by the diameter reduction eccentricity measuring unit 82, the amount of the deviation of the first surface 41 of the lens 40 whose amount is θ. It is sufficient to perform the above-described series of procedures (see FIG. 4) with the core measured on the first surfaces 411 to 413 (which may be the second surfaces 421 to 423) of the lenses 401 to 403. It is.

  Thus, the center position eccentricity measuring unit 81, the diameter reduction eccentricity measuring unit 82, the first inter-image distance measuring unit 83, and the second inter-image distance measuring unit 84 can be arbitrarily combined. Furthermore, the center position eccentricity measuring unit 81 and the diameter reduction eccentricity measuring unit 82 can measure the amount of eccentricity for each of the plurality of lenses 40. Further, the first inter-image distance measuring unit 83 and the second inter-image distance measuring unit 84 can measure the pitch between any two lenses 40 for each of the plurality of lenses 40. .

  When the amount of eccentricity of the lens 40 is very large, for example, a screen (not shown) placed on the image plane of the element imaging optical system 5 does not need to be measured by the eccentricity measuring unit 80. ) The first transmission image 91 and the second transmission image 92 projected onto the first transmission image 91 are visually observed by the user, and the amount of eccentricity of the lens 40 is estimated from the contrast of the first transmission image 91 and the second transmission image 92. A method is also conceivable. Thereby, as a measurement, it is also possible to implement a rough measurement. In this case, the eccentricity measuring unit 80 can be omitted.

  Since the eccentricity measuring apparatus 1 is capable of measuring the amount of eccentricity of the lens 40 without condensing the measuring light 3 on a specific area of the lens 40, it is a single device. The measurement can be performed on a plurality of lenses 40 per measurement using. Therefore, for example, before mounting a member such as the array sensor 147 shown in FIG. 8C on the array lens 4, each lens 40 constituting the array lens 4 is singulated. There is no need, and it is possible to measure all of the lenses 40 at once.

  When it is desired to collectively measure the amount of eccentricity of each lens 40, various measurement procedures in the above-described center position eccentricity measuring unit 81 and diameter reduction eccentricity measuring unit 82 are performed from one lens 40. What is necessary is just to implement collectively with respect to each formed 1st transmission image 91 and 2nd transmission image 92. FIG. If the first transmission image 91 and the second transmission image 92 formed from each lens 40 can be distinguished for each of the lenses 40 formed from one lens 40, the center position eccentricity measuring unit 81 and It is possible to simply and easily realize the simultaneous measurement of the amount of eccentricity of each lens 40 by simply performing various measurement procedures in the diameter-reducing eccentricity measuring unit 82 at the same time. In particular, the first transmission image 91 and the second transmission image 92 formed from all the lenses 40 constituting the arrayed lens 4 are collectively imaged using the image sensor 6, and each of the first images captured is captured. The center position eccentricity measuring unit 81 and the diameter-reducing eccentricity measuring unit 82 perform various measurement procedures by image processing on the transmission image 91 and the second transmission image 92, thereby measuring the amount of eccentricity for each lens 40. Can be implemented in a batch.

  When the eccentricity measuring apparatus 1 wants to measure all of the lenses 40 at once, the minimum essential apparatus configuration is the same as that of the element imaging optical system 5 regardless of the number of lenses 40. Therefore, in particular, when a large number of lenses 40 are formed on the arrayed lens 4, it can be realized with a simple and small-scale device configuration in comparison with each of the eccentricity measuring devices according to the related art described above. Become.

  Since the eccentricity measuring apparatus 1 is a simple principle that makes it possible to measure the amount of eccentricity of the lens 40 from the contrast of the first transmission image 91 and the second transmission image 92, at least one surface is non-existent. The present invention is not limited to a spherical lens, and can be applied to a lens having both spherical surfaces without any problem.

  Further, in the eccentricity measuring apparatus 1, as for the measurement work, it is sufficient to measure the amount of eccentricity of the lens 40 from the contrast of the first transmission image 91 and the second transmission image 92, and the measurement work becomes simple. Therefore, the complexity of the eccentricity measurement can be reduced.

  Further, the first transmission image 91 and the second transmission image 92 are sharp enough to be measured unless the first surface 41 or the second surface 42 of the corresponding lens 40 is flat, so that the vicinity of the optical axis is flat. Even when the amount of eccentricity of the lens 40 is measured, it is possible to reduce the possibility of difficulty in measurement.

  The accuracy of the eccentricity measurement by the eccentricity measuring device 1 can be increased according to the resolution of the observation system including the element imaging optical system 5. In the element imaging optical system 5, the details of the method for improving the resolution of the first transmission image 91 and the second transmission image 92 are omitted, but the resolution is determined by the detection system as the first transmission image 91 and the second transmission image 92. When each dimension of the image 92 is measured, the absolute accuracy is preferably 1 μm or less. In this case, each dimensional accuracy of the first transmission image 91 and the second transmission image 92 can be measured with a value close to absolute accuracy. As a result, the results of measuring the eccentricity and the inter-lens pitch from the relative distances between the centers of the first transmission image 91 and the second transmission image 92, which are circular, are also measured with the same accuracy as the absolute accuracy. Is possible. In addition, even when the spherical or aspherical shape is rotationally asymmetric due to the molding process capability or has an error with respect to the design value, even the transferability of the portion used as the observation image can be improved. Measurement is possible. On the other hand, in the prior art, it is essential that the surface shape is a target and the shape error amount is small.

  FIG. 6 is a diagram illustrating the relationship between the configuration of a lens 40 ′, which is a modification of the lens 40, and the contrast of the first transmission image 91 and the second transmission image 92 formed from the lens 40 ′.

  In the lens 40 ′ shown in FIG. 6, with respect to the configuration of the lens 40, the outer peripheral portion of the effective aperture on the surface opposite to the surface on which the light 3 is incident, that is, the outer peripheral portion of the first surface 41 Different points are provided. This outer peripheral portion is a so-called lens edge. In addition, the protrusion may be provided on the outer peripheral portion (edge) of the second surface 42 or may be provided on both outer peripheral portions (edges) of the first surface 41 and the second surface 42. Good.

  The projecting portion includes a projecting region 45 projecting vertically upward around the first surface 41 and / or the second surface 42, and a step region 46 forming a step with respect to the projecting region 45 around the projecting region 45. have. In FIG. 6, since the protruding portion is provided on the first surface 41 side, the protruding region 45 protrudes vertically upward around the first surface 41.

  Depending on the shape of the lens to be measured, it may not be easy to distinguish the first and second transmission images.

  For the process of forming a lens by transfer, for example, the protrusion is provided on the edge, and an image obtained by forming an image of the protrusion is further used to facilitate measurement.

  In other words, the protrusion region 45 of the protrusion causes the incident light 3 (see FIG. 1) to travel straight without being scattered. Thereby, the image part which imaged the protrusion area | region 45 becomes bright compared with the other image (1st transmission image 91 and 2nd transmission image 92) part (refer the code | symbol 95 of FIG. 6).

  On the other hand, the step region 46 of the protrusion scatters the incident light 3 (see FIG. 1). Thereby, the image part which imaged the level | step difference area | region 46 becomes dark compared with another image part (refer the code | symbol 96 of FIG. 6).

  As a result, the first transmission image 91 and the second transmission image 92 can easily recognize the contours due to the bright region 95 and the dark region 96, and therefore based on the contrast of the first transmission image 91 and the second transmission image 92. It becomes easy to measure the amount of eccentricity of the lens 40 '.

  As shown in FIG. 6, when the protrusion is provided on the first surface 41 side, in the outer peripheral portion of the effective aperture on the surface on which the light 3 is incident, that is, the outer peripheral portion of the second surface 42 in the lens 40 ′. Is preferably a flat surface in order to reduce the influence of bending and scattering of the light beam by the shape of the surface opposite to the surface for obtaining the center of the surface for obtaining the center.

  The lens 40 ′ may be one of the lenses 40 constituting the arrayed lens 4 (see FIG. 1).

  FIG. 10 is a diagram for explaining the point of the eccentricity measurement by the center position eccentricity measuring unit 81 when the eccentricity of the lens 40r formed by bonding the two lenses 40p and 40q is not generated. FIG. 11 is a diagram for explaining the point of the eccentricity measurement by the center position eccentricity measuring unit 81 when the lens 40r is eccentric.

  Bonding of the two lenses 40p and 40q in the lens 40r shown in FIGS. 10 and 11 is not essential, and the lenses 40p and 40q may overlap each other in a direction substantially along the ideal optical axis of the lens 40r. That's fine.

  The lens 40p has a first surface 41p and a second surface 42p. The lens 40q has a first surface 41q and a second surface 42q.

  The center position eccentricity measuring unit 81 can measure the amount of eccentricity dd generated between the lens 40p and the lens 40q in the same manner as described with reference to FIGS.

  Images formed by the element imaging optical system 5 on the first surface 41p, the second surface 42p, the first surface 41q, and the second surface 42q are respectively a first transmission image 91p, a second transmission image 92p, A first transmission image 91q and a second transmission image 92q are obtained.

  The center position eccentricity measuring unit 81 has, for example, the center 93p, which is the center of each of the first transmission image 91p, the second transmission image 92p, the first transmission image 91q, and the second transmission image 92q by the least square method described above. A center 94p, a center 93q, and a center 94q are respectively calculated.

  Then, the center position eccentricity measuring unit 81 obtains all possible distances between the centers from the calculated center 93p, center 94p, center 93q, and center 94q.

  When all of the center 93p, the center 94p, the center 93q, and the center 94q are at the same position, eccentricity occurs between the lenses 40p, between the lenses 40q, and between all of the lenses 40p and 40q. (See FIG. 10).

  When the centers 93p and 94p and the centers 93q and 94q are separated from each other by the distance dd, the eccentricity of the lens 40r having the amount dd occurs between the lens 40p and the lens 40q (FIG. 11).

  The optical axis 41pa, the optical axis 42pa, the optical axis 41qa, and the optical axis 42qa are respectively an optical axis that passes through the center of the first surface 41p, an optical axis that passes through the center of the second surface 42p, and the first surface 41q. Corresponds to the optical axis passing through the center of the second surface 42q.

  In the case of FIG. 10, the optical axis 41pa, the optical axis 42pa, the optical axis 41qa, and the optical axis 42qa coincide with each other. In this case, the center position eccentricity measuring unit 81 is assumed that the lens 40r is not eccentric. can do.

  On the other hand, in the case of FIG. 11, the optical axes 41pa and 42pa and the optical axes 41qa and 42qa are separated from each other by a distance dd with respect to the direction perpendicular to the ideal optical axis of the lens 40r. The eccentricity measuring unit 81 can assume that the eccentricity of the lens 40r whose amount is dd, specifically, the eccentricity between the lens 40p and the lens 40q has occurred.

  The eccentricity d between the lenses 40p and between the lenses 40q may be implemented in the same manner as shown in FIGS. 2 and 3 (how to obtain the eccentricity d) (FIG. 15 and FIG. 15). (See FIG. 16). That is, the reference numerals “40p, 41p, 42p”, “91p, 92p, 93p, 94p” and “41pa, 42pa” in FIGS. 15 and 16 are the reference signs “40, 41, 42”, “91,” in FIGS. 92, 93, 94 "and" 41a, 42a ". Here, for the sake of convenience, only the case of measuring the amount of eccentricity d between the lenses 40p is shown, but the same applies to the case of measuring the amount of eccentricity d between the lenses 40q.

  The center position eccentricity measuring unit 81 measures the eccentricity dd between the lens 40p and the lens 40q shown in FIG. 11 in addition to the eccentricity between the lenses 40p and 40q. The amount of eccentricity of the lens 40r can be measured.

  10 and 11, the eccentricity measurement procedure is as follows: an array-shaped lens 4p in which a plurality of lenses 40p are integrally formed on a single plate made of resin, and a single plate made of resin. The present invention can be similarly applied to an arrayed lens 4q in which a plurality of lenses 40q are integrally formed (see FIG. 12).

  Furthermore, by performing the eccentricity measurement according to FIGS. 10 and 11 and adjusting the relative positional relationship between the lenses 40p and 40q simultaneously or alternately, the alignment of the lens 40r (two It is possible to make each optical axis of the lens straight). This alignment can be similarly performed for one lens 40r and a plurality of lenses 40r.

  Further, the above alignment can be performed by adjusting the relative positional relationship between the arrayed lenses 4p and 4q shown in FIG. 12 instead of adjusting the relative positional relationship between the lenses 40p and 40q. It is.

  FIGS. 13A to 13C show an outline of the above-described alignment procedure. Specifically, FIGS. 13A to 13C show cases where the relative positional relationship between the arrayed lenses 4p and 4q shown in FIG. 12 is adjusted.

  First, the arrayed lens 4p and the arrayed lens 4q are simply overlapped without bonding, and in this state, the amount of eccentricity dd between each lens 40p and the corresponding lens 40q is calculated. 10 and FIG. 11 (see FIG. 13A).

  After the eccentricity measurement according to FIG. 13 (a), the arrayed lenses 4p or 4q are perpendicular to the ideal optical axis of the lens 40r (see FIG. 10) and perpendicular to each other in the X direction and It is moved in the Y direction as necessary to achieve alignment (see FIG. 13B).

  Further, after the eccentricity measurement according to FIG. 13A, the arrayed lenses 4p or 4q are rotated as necessary in a direction perpendicular to the ideal optical axis of the lens 40r (see angle γ). To achieve alignment (see FIG. 13C).

  In addition, the order which implements each alignment which concerns on FIG.13 (b) and (c) is not specifically limited, Either alignment may be implemented first. Further, after each alignment according to FIGS. 13B and 13C, it is preferable that the eccentricity measurement according to FIG. 13A is performed again as necessary. Furthermore, the alignments according to FIGS. 13B and 13C may be performed while the eccentricity measurement according to FIG. 13A is continuously performed.

  In the case where the projection 40 (see FIG. 6) having the projection region 45 and the stepped region 46 is provided in the lens 40r (see FIG. 10 and the like), the lens further depends on the height of the projection. It is possible to adjust the interval between 40p and the lens 40q (see FIG. 14).

  A lens 40r ′ shown in FIG. 14 is a modification of the lens 40r. In the lens 40r ′, each of the lenses 40p and 40q protrudes from the outer peripheral portion of the effective aperture on the surface close to the element imaging optical system 5 (lower side of the sectional view in FIG. 14) at the time of decentering measurement. (Projecting region 45 and step region 46) are provided, and these lenses are referred to as lenses 40p 'and 40q' (first and second optical elements), respectively.

  Here, the lens 40p ′ and the lens 40q ′ are bonded so that the protruding portion of the lens 40p ′ is in contact with the lens 40q ′. As a result, the lens 40p ′ and the lens 40q ′ are separated from each other at a constant interval in a portion that is not in contact. The fixed interval can be changed according to the height of the protruding portion of the lens 40p ′. Therefore, the distance between the lens 40p ′ and the lens 40q ′ can be adjusted by the protruding portion of the lens 40p ′.

  In the eccentricity measuring apparatus 1, each surface of the lens to be measured is imaged by the element imaging optical system 5 having a characteristic that the shape of the image does not change even if the distance to the subject changes, and an image ( First and second transmission images) are formed, and the eccentricity of the lens is measured based on the contrast of these images. Therefore, in the eccentricity measuring device 1, regardless of which surface of the lens to be measured is closer to the element imaging optical system 5 (or closer to the light source 2), It is possible to measure the eccentricity of the lens in the same manner as described above. In the present embodiment, for convenience, both the case where the first surface is a surface close to the element imaging optical system 5 and the case where the second surface is a surface close to the element imaging optical system 5 are both used. However, even if these surfaces are close to the light source 2, the contrast of the obtained image hardly changes, so that the measurement is not performed. It will not be a hindrance.

  In addition, as an optical element which concerns on this invention, all the transparent optical elements in which the concept of eccentricity exists other than a lens are mentioned. In addition, as a lens as an optical element, there are an imaging lens, a condenser lens, an illumination lens, and the like.

  The present invention is not limited to the above-described embodiments, and various modifications can be made within the scope shown in the claims. That is, embodiments obtained by combining technical means appropriately modified within the scope of the claims are also included in the technical scope of the present invention.

  The present invention can be applied to an eccentricity measuring apparatus and an eccentricity measuring method for measuring the amount of eccentricity of an optical element such as a lens. Further, the present invention can be applied to an optical element, an optical element array, and an optical element unit, which are targets for measuring the amount of eccentricity by the eccentricity measuring apparatus.

1 Eccentricity measuring device 3 Light (light incident on optical element)
4, 4p, 4q array lens (optical element array)
5 Element imaging optical system 6 Image sensor (imaging device)
40, 40 ', 40r, 40r', 40p, 40q, 40p ', 40q'
Lens (optical element)
45 Protrusion area (protrusion)
46 Step area (protrusion)
80 Eccentricity measuring unit 81 Center position eccentricity measuring unit 82 Diameter reduction eccentricity measuring unit 83 First inter-image distance measuring unit 84 Second inter-image distance measuring unit 91, 91p, 91q, 91t First transmission images 92, 92p, 92q, 92t Second transmission image 93, 93p, 93q Center of first transmission image 94, 94p, 94q Center of second transmission image 144, 145 Array lens (optical element array)
401-403 lens (optical element)
911 to 913 First transmission image 921 to 923 Second transmission image 931 to 933 Center of first transmission image 941 to 943 Center of a transmission image a, b Diameter d, dd Distance (separation distance)

Claims (15)

An eccentricity measuring device capable of measuring the amount of eccentricity of the optical element using light transmitted through the optical element, which is incident on the optical element,
An element imaging optical system which is an object side telecentric optical system or a both side telecentric optical system,
The element imaging optical system is to image both surfaces of the optical element by the incident transmitted light,
An eccentricity measuring apparatus capable of measuring the amount of eccentricity of the optical element based on the contrast of the first and second transmitted images formed on both surfaces of the optical element.   The eccentricity measuring apparatus according to claim 1, further comprising an eccentricity measuring unit that measures an eccentricity amount of the optical element based on a contrast between the first and second transmission images. The eccentricity measuring unit is
The eccentric measurement apparatus according to claim 2, further comprising a center position eccentricity measurement unit that sets a distance between the centers of the first and second transmission images as an amount of eccentricity of the optical element. . At least one of the first and second transmission images is a circular transmission image that is circular,
The eccentricity measuring unit is
Since the diameter of the circular transmission image actually formed is reduced with respect to the diameter of the circular transmission image when the optical element is not decentered, the eccentricity of the optical element is reduced. The eccentricity measuring apparatus according to claim 2, further comprising a diameter-reducing eccentricity measuring unit that measures the amount. There are a plurality of the first and second transmission images, respectively.
A first inter-image distance measuring unit that measures the separation distance between the centers of the two first transmission images, and a second inter-image distance that measures the separation distance between the centers of the two second transmission images. 5. The eccentricity measuring apparatus according to claim 1, comprising at least one of the measuring unit. There are a plurality of the first and second transmission images, respectively.
The center position eccentricity measuring unit uses at least one of the distances between the centers of the first and second transmission images as the amount of eccentricity of the optical element. The eccentricity measuring apparatus as described.   The eccentricity measuring apparatus according to any one of claims 1 to 6, further comprising an imaging device for displaying at least one of the first and second transmission images as an image. An eccentricity measuring method for measuring the amount of eccentricity of the optical element using light transmitted through the optical element, which is incident on the optical element,
Making the transmitted light incident on an element imaging optical system that is an object-side telecentric optical system or a both-side telecentric optical system, and imaging both surfaces of the optical element by the element imaging optical system;
Measuring the amount of eccentricity of the optical element based on the contrast of the first and second transmitted images formed on both surfaces of the optical element, respectively. . Using an optical element array in which a plurality of the optical elements are integrally molded,
9. The eccentricity measuring method according to claim 8, wherein the step of forming images on both surfaces of each optical element constituting the optical element array and the step of measuring the amount of eccentricity are performed. . Superimposing the two optical element arrays;
The step of superimposing two optical element arrays, the step of forming images on both surfaces of the two overlapping optical elements, and the step of measuring the amount of eccentricity;
Adjusting the relative positional relationship of each optical element array based on the measured amount of each eccentricity so that the optical axes of the two overlapping optical elements are aligned with each other. The eccentricity measuring method according to claim 9, comprising:   The method includes a step of previously providing at least one optical element with a projecting portion that scatters incident light on an outer peripheral portion on one side of the optical element or on each outer peripheral portion on both sides of the optical element. The eccentricity measuring method according to any one of 8 to 10. Using two of the above optical elements,
For one of the optical elements, a step of providing a projecting portion that scatters incident light on the outer peripheral part of one side of the optical element or each outer peripheral part of both sides;
The eccentric measurement method according to claim 8, wherein the one and the other optical elements are bonded to each other so that the protruding portion is in contact with the other optical element. An optical element in which transmitted light through which incident light is transmitted is used to measure the amount of eccentricity,
An optical element characterized in that a protrusion for scattering the incident light is provided on an outer peripheral portion of an effective aperture on one side or on an outer peripheral portion of each effective aperture on both sides. An optical element array in which a plurality of optical elements are integrally molded,
The optical element array according to claim 13, wherein at least one of the plurality of optical elements is the optical element according to claim 13. A first optical element which is the optical element according to claim 13;
A second optical element,
The protruding portion of the first optical element is in contact with the second optical element.

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