JP2011009309A5 - - Google Patents

Download PDF

Info

Publication number
JP2011009309A5
JP2011009309A5 JP2009149175A JP2009149175A JP2011009309A5 JP 2011009309 A5 JP2011009309 A5 JP 2011009309A5 JP 2009149175 A JP2009149175 A JP 2009149175A JP 2009149175 A JP2009149175 A JP 2009149175A JP 2011009309 A5 JP2011009309 A5 JP 2011009309A5
Authority
JP
Japan
Prior art keywords
exposure
substrate
detection
mark
detection condition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2009149175A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011009309A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2009149175A priority Critical patent/JP2011009309A/ja
Priority claimed from JP2009149175A external-priority patent/JP2011009309A/ja
Priority to US12/818,477 priority patent/US20100321655A1/en
Publication of JP2011009309A publication Critical patent/JP2011009309A/ja
Publication of JP2011009309A5 publication Critical patent/JP2011009309A5/ja
Withdrawn legal-status Critical Current

Links

JP2009149175A 2009-06-23 2009-06-23 露光システム、露光装置の制御装置およびデバイス製造方法 Withdrawn JP2011009309A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009149175A JP2011009309A (ja) 2009-06-23 2009-06-23 露光システム、露光装置の制御装置およびデバイス製造方法
US12/818,477 US20100321655A1 (en) 2009-06-23 2010-06-18 Exposure system, control apparatus of exposure apparatus, and method of manufacturing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009149175A JP2011009309A (ja) 2009-06-23 2009-06-23 露光システム、露光装置の制御装置およびデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2011009309A JP2011009309A (ja) 2011-01-13
JP2011009309A5 true JP2011009309A5 (https=) 2012-08-09

Family

ID=43354051

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009149175A Withdrawn JP2011009309A (ja) 2009-06-23 2009-06-23 露光システム、露光装置の制御装置およびデバイス製造方法

Country Status (2)

Country Link
US (1) US20100321655A1 (https=)
JP (1) JP2011009309A (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7336201B2 (ja) * 2019-02-18 2023-08-31 キヤノン株式会社 形成方法、パターン形成システム、および物品の製造方法
CN111442906B (zh) * 2020-04-14 2021-08-24 深圳市华星光电半导体显示技术有限公司 显示面板检测方法及装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2753930B2 (ja) * 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
JP4353498B2 (ja) * 2002-04-30 2009-10-28 キヤノン株式会社 管理装置及び方法、デバイス製造方法、並びにコンピュータプログラム
JP4235459B2 (ja) * 2003-01-22 2009-03-11 キヤノン株式会社 アライメント方法及び装置並びに露光装置
JP4715749B2 (ja) * 2004-08-19 2011-07-06 株式会社ニコン アライメント情報表示方法とそのプログラム、アライメント方法、露光方法、デバイス製造方法、表示システム、表示装置

Similar Documents

Publication Publication Date Title
JP2017504001A5 (https=)
JP2010225940A5 (ja) 位置検出装置、露光装置、位置検出方法、露光方法及びデバイス製造方法
SG157348A1 (en) Lithographic apparatus and device manufacturing method
JP2009182253A5 (https=)
JP2006024939A5 (https=)
JP2013187206A5 (https=)
TW200629464A (en) Coating and developing apparatus and coating and developing method
TW200734828A (en) Exposure apparatus, exposure method and device manufacturing method
JP2014131082A5 (ja) リソグラフィ投影装置、オフセットを決定するための方法、露光方法、並びにデバイス製造方法
WO2012048108A3 (en) Radiation patternable cvd film
JP2014085123A5 (https=)
EP1986471A4 (en) ILLUMINATING ELEMENT, METHOD FOR PRODUCING AN ILLUMINATING ELEMENT AND SUBSTRATE PROCESSING DEVICE
TW200745769A (en) Photo apparatus and method
JP2013214723A5 (https=)
JP2013174801A5 (https=)
JP2011003809A5 (https=)
JP2011009309A5 (https=)
JP2012089575A5 (ja) リソグラフィ装置及びデバイスの製造方法
JP2012084574A5 (https=)
JP2011203343A5 (https=)
JP2016058452A5 (https=)
EP2264441A3 (en) Circuit pattern defect detection apparatus, circuit pattern defect detection method, and program therefor
JP5298236B2 (ja) 局所露光装置及び局所露光方法
TW200704146A (en) Plotting method, plotting device, plotting system and correction method
CN104391427B (zh) 掩模板检测装置及方法、掩模板清洗装置