JP2011009309A - 露光システム、露光装置の制御装置およびデバイス製造方法 - Google Patents

露光システム、露光装置の制御装置およびデバイス製造方法 Download PDF

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Publication number
JP2011009309A
JP2011009309A JP2009149175A JP2009149175A JP2011009309A JP 2011009309 A JP2011009309 A JP 2011009309A JP 2009149175 A JP2009149175 A JP 2009149175A JP 2009149175 A JP2009149175 A JP 2009149175A JP 2011009309 A JP2011009309 A JP 2011009309A
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JP
Japan
Prior art keywords
exposure
substrate
mark
detection
detection condition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2009149175A
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English (en)
Japanese (ja)
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JP2011009309A5 (https=
Inventor
Hiroshi Tanaka
浩 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2009149175A priority Critical patent/JP2011009309A/ja
Priority to US12/818,477 priority patent/US20100321655A1/en
Publication of JP2011009309A publication Critical patent/JP2011009309A/ja
Publication of JP2011009309A5 publication Critical patent/JP2011009309A5/ja
Withdrawn legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2009149175A 2009-06-23 2009-06-23 露光システム、露光装置の制御装置およびデバイス製造方法 Withdrawn JP2011009309A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009149175A JP2011009309A (ja) 2009-06-23 2009-06-23 露光システム、露光装置の制御装置およびデバイス製造方法
US12/818,477 US20100321655A1 (en) 2009-06-23 2010-06-18 Exposure system, control apparatus of exposure apparatus, and method of manufacturing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009149175A JP2011009309A (ja) 2009-06-23 2009-06-23 露光システム、露光装置の制御装置およびデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2011009309A true JP2011009309A (ja) 2011-01-13
JP2011009309A5 JP2011009309A5 (https=) 2012-08-09

Family

ID=43354051

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009149175A Withdrawn JP2011009309A (ja) 2009-06-23 2009-06-23 露光システム、露光装置の制御装置およびデバイス製造方法

Country Status (2)

Country Link
US (1) US20100321655A1 (https=)
JP (1) JP2011009309A (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020170631A1 (ja) * 2019-02-18 2020-08-27 キヤノン株式会社 形成方法、形成装置、および物品の製造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111442906B (zh) * 2020-04-14 2021-08-24 深圳市华星光电半导体显示技术有限公司 显示面板检测方法及装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2753930B2 (ja) * 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
JP4353498B2 (ja) * 2002-04-30 2009-10-28 キヤノン株式会社 管理装置及び方法、デバイス製造方法、並びにコンピュータプログラム
JP4235459B2 (ja) * 2003-01-22 2009-03-11 キヤノン株式会社 アライメント方法及び装置並びに露光装置
JP4715749B2 (ja) * 2004-08-19 2011-07-06 株式会社ニコン アライメント情報表示方法とそのプログラム、アライメント方法、露光方法、デバイス製造方法、表示システム、表示装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020170631A1 (ja) * 2019-02-18 2020-08-27 キヤノン株式会社 形成方法、形成装置、および物品の製造方法
JP2020134649A (ja) * 2019-02-18 2020-08-31 キヤノン株式会社 形成方法、形成装置、および物品の製造方法
JP7336201B2 (ja) 2019-02-18 2023-08-31 キヤノン株式会社 形成方法、パターン形成システム、および物品の製造方法

Also Published As

Publication number Publication date
US20100321655A1 (en) 2010-12-23

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