JP2011002390A5 - - Google Patents
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- Publication number
- JP2011002390A5 JP2011002390A5 JP2009147061A JP2009147061A JP2011002390A5 JP 2011002390 A5 JP2011002390 A5 JP 2011002390A5 JP 2009147061 A JP2009147061 A JP 2009147061A JP 2009147061 A JP2009147061 A JP 2009147061A JP 2011002390 A5 JP2011002390 A5 JP 2011002390A5
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- diameter hole
- screw member
- probe card
- head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 235000012431 wafers Nutrition 0.000 description 13
- 239000000523 sample Substances 0.000 description 5
- 230000000875 corresponding Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
Description
従来の検査装置は、例えば図3に示すように、互いに隣接するローダ室1及びプローバ室2を備えている。ローダ室1は、複数枚のウエハWをカセット単位で収納するカセット収納部と、カセットからウエハWを一枚ずつ搬出入するウエハ搬送機構と、ウエハ搬送機構によってウエハWを搬送する間にウエハWをプリアライメントするプリアライメント機構と、を備えている。プローバ室2は、図3に示すように、ウエハWを保持しX、Y、Z及びθ方向で移動可能に構成されたウエハチャック3と、このウエハチャック3上のウエハWに形成された複数の電極パッドに接触する複数のプローブ4Aを有するプローブカード4と、このプローブカード4をカードホルダ(図示せず)によって固定する固定機構5と、プローブカード4とテストヘッドTとを電気的に接続する接続リング6と、を備え、制御装置の制御下でウエハWに形成された各デバイスの電気的特性検査を行なうように構成されている。尚、図3において、7はウエハチャック3と協働してウエハWとプローブカード4との位置合わせを行うアライメント機構で、7Aは上カメラ、7Bは下カメラであり、8はプローブカード4の固定機構5が装着されたヘッドプレートである。 A conventional inspection apparatus includes a loader chamber 1 and a prober chamber 2 adjacent to each other as shown in FIG. The loader chamber 1 includes a cassette storage unit that stores a plurality of wafers W in units of cassettes, a wafer transfer mechanism that loads and unloads wafers W from the cassette one by one, and a wafer W while the wafers W are transferred by the wafer transfer mechanism. And a pre-alignment mechanism for pre-aligning. As shown in FIG. 3, the prober chamber 2 has a wafer chuck 3 configured to hold the wafer W and move in the X, Y, Z, and θ directions, and a plurality of wafer chucks 3 formed on the wafer chuck 3. The probe card 4 having a plurality of probes 4A that come into contact with the electrode pads, a fixing mechanism 5 that fixes the probe card 4 with a card holder (not shown), and the probe card 4 and the test head T are electrically connected. And a connection ring 6 configured to inspect electrical characteristics of each device formed on the wafer W under the control of the control device. In FIG. 3, 7 is an alignment mechanism for aligning the wafer W and the probe card 4 in cooperation with the wafer chuck 3, 7A is the upper camera, 7B is the lower camera, and 8 is the probe card 4 . It is a head plate to which the fixing mechanism 5 is attached.
また、第2の貫通孔13Bは、図2の(a)、(b)に示すように、第1のネジ部材15の雄ネジが貫通する小径孔13B1と、小径孔13B1から拡径し、第1のネジ部材15の頭部が収納される大径孔13B2と、からなり、小径孔13B1と大径孔13B2の境界に第1のネジ部材15の頭部が係止される段部が形成されている。そして、小径孔13B1は、第1のネジ部材15の雄ネジが螺合するようにチャックトップ21に形成された雌ネジに対応して形成されている。第1のネジ部材15の頭部が収められた第2の貫通孔13Bの大径孔13B2の残余の空間には耐熱、耐寒性、耐衝撃性等に優れた樹脂、例えばRTV(Room Temperature Vulcanizing Rubber)ゴムが充填されている。また、RTVゴムは、固定用ブロック13の表面にコーティングされていると共に固定用ブロック13とチャックトップ21を接着している。 The second through-hole 13B, as shown in FIGS. 2 (a), (b) , the small-diameter hole 13B 1 of the male thread of the first screw member 15 passes, expanded from the small diameter hole 13B 1 and a large diameter hole 13B 2 the head of the first screw member 15 is accommodated, made, the head of the first screw member 15 is engaged with the border of the small diameter hole 13B 1 and the large-diameter hole 13B 2 A stepped portion is formed. The small-diameter hole 13B 1 is a male thread of the first screw member 15 is formed corresponding to the female thread formed in the chuck top 21 as screwed. The remaining space of the large-diameter hole 13B 2 of the second through-hole 13B in which the head of the first screw member 15 is housed heat, cold resistance, a resin having excellent impact resistance, for example, RTV (Room Temperature Vulcanizing Rubber) is filled with rubber. The RTV rubber is coated on the surface of the fixing block 13 and bonds the fixing block 13 and the chuck top 21 together.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009147061A JP5197505B2 (en) | 2009-06-19 | 2009-06-19 | Temperature sensor for wafer chuck |
KR1020100053856A KR101267670B1 (en) | 2009-06-19 | 2010-06-08 | Temperature sensor for wafer chuck |
TW99119932A TWI471538B (en) | 2009-06-19 | 2010-06-18 | Temperature sensor for wafer cups |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009147061A JP5197505B2 (en) | 2009-06-19 | 2009-06-19 | Temperature sensor for wafer chuck |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2011002390A JP2011002390A (en) | 2011-01-06 |
JP2011002390A5 true JP2011002390A5 (en) | 2012-06-07 |
JP5197505B2 JP5197505B2 (en) | 2013-05-15 |
Family
ID=43510815
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009147061A Active JP5197505B2 (en) | 2009-06-19 | 2009-06-19 | Temperature sensor for wafer chuck |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5197505B2 (en) |
KR (1) | KR101267670B1 (en) |
TW (1) | TWI471538B (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103277651B (en) * | 2013-06-13 | 2016-04-06 | 新乡学院 | A kind of base of ceramic for high-temperature thermal detection |
JP2016161356A (en) * | 2015-02-27 | 2016-09-05 | セイコーエプソン株式会社 | Electronic component conveyance device and electronic component inspection device |
WO2017169032A1 (en) * | 2016-03-28 | 2017-10-05 | 株式会社日立国際電気 | Substrate-processing device, temperature-measuring unit, and method for manufacturing semiconductor device |
CN110739657B (en) * | 2018-07-20 | 2021-09-21 | 施耐德电器工业公司 | Cable head for ring main unit and ring main unit |
TWI797484B (en) * | 2020-10-06 | 2023-04-01 | 致茂電子股份有限公司 | Wafer chuck inspection system |
JP7474678B2 (en) | 2020-10-28 | 2024-04-25 | 東京エレクトロン株式会社 | Mounting table, inspection device, and inspection method |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6090638U (en) * | 1983-11-26 | 1985-06-21 | 株式会社三共合金鋳造所 | temperature measurement jig |
JPS6124628U (en) * | 1984-07-11 | 1986-02-14 | 三菱重工業株式会社 | Thermocouple mounting jig |
US5220171A (en) * | 1990-11-01 | 1993-06-15 | Canon Kabushiki Kaisha | Wafer holding device in an exposure apparatus |
JPH0945752A (en) * | 1995-07-27 | 1997-02-14 | Dainippon Screen Mfg Co Ltd | Substrate treatment device |
JP3814359B2 (en) * | 1996-03-12 | 2006-08-30 | キヤノン株式会社 | X-ray projection exposure apparatus and device manufacturing method |
JP2000286207A (en) * | 1999-03-30 | 2000-10-13 | Tokyo Electron Ltd | Apparatus and method for heat treatment |
JP4659328B2 (en) * | 2002-10-21 | 2011-03-30 | 東京エレクトロン株式会社 | Probe device for controlling the temperature of an object to be inspected |
JP4307130B2 (en) * | 2003-04-08 | 2009-08-05 | キヤノン株式会社 | Exposure equipment |
CN101065616A (en) * | 2004-10-14 | 2007-10-31 | 迅捷公司 | Method and system for wafer temperature control |
JP4905290B2 (en) | 2007-08-09 | 2012-03-28 | 住友電気工業株式会社 | Temperature measuring device for semiconductor manufacturing apparatus and semiconductor manufacturing apparatus equipped with the same |
-
2009
- 2009-06-19 JP JP2009147061A patent/JP5197505B2/en active Active
-
2010
- 2010-06-08 KR KR1020100053856A patent/KR101267670B1/en active IP Right Grant
- 2010-06-18 TW TW99119932A patent/TWI471538B/en active
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