JP2010541022A5 - - Google Patents

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Publication number
JP2010541022A5
JP2010541022A5 JP2010528154A JP2010528154A JP2010541022A5 JP 2010541022 A5 JP2010541022 A5 JP 2010541022A5 JP 2010528154 A JP2010528154 A JP 2010528154A JP 2010528154 A JP2010528154 A JP 2010528154A JP 2010541022 A5 JP2010541022 A5 JP 2010541022A5
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JP
Japan
Prior art keywords
optical element
plasma
coherent light
light beam
enclosure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2010528154A
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English (en)
Japanese (ja)
Other versions
JP2010541022A (ja
Filing date
Publication date
Priority claimed from US11/868,933 external-priority patent/US7795816B2/en
Application filed filed Critical
Publication of JP2010541022A publication Critical patent/JP2010541022A/ja
Publication of JP2010541022A5 publication Critical patent/JP2010541022A5/ja
Pending legal-status Critical Current

Links

JP2010528154A 2007-10-08 2008-10-03 プラズマを使用したコヒーレントなビームの高速位相スクランブル化 Pending JP2010541022A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/868,933 US7795816B2 (en) 2007-10-08 2007-10-08 High speed phase scrambling of a coherent beam using plasma
PCT/US2008/078704 WO2009048804A1 (en) 2007-10-08 2008-10-03 High speed phase scrambling of a coherent beam using plasma

Publications (2)

Publication Number Publication Date
JP2010541022A JP2010541022A (ja) 2010-12-24
JP2010541022A5 true JP2010541022A5 (enExample) 2011-11-24

Family

ID=40523008

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010528154A Pending JP2010541022A (ja) 2007-10-08 2008-10-03 プラズマを使用したコヒーレントなビームの高速位相スクランブル化

Country Status (4)

Country Link
US (1) US7795816B2 (enExample)
JP (1) JP2010541022A (enExample)
KR (1) KR101577196B1 (enExample)
WO (1) WO2009048804A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8329557B2 (en) * 2009-05-13 2012-12-11 Silicon Genesis Corporation Techniques for forming thin films by implantation with reduced channeling
EP2534672B1 (en) 2010-02-09 2016-06-01 Energetiq Technology Inc. Laser-driven light source
TWI543264B (zh) * 2010-03-31 2016-07-21 應用材料股份有限公司 雷射光束定位系統
TWI575630B (zh) * 2011-06-10 2017-03-21 應用材料股份有限公司 脈衝循環器
KR101432158B1 (ko) 2012-05-24 2014-08-20 에이피시스템 주식회사 기판 처리 장치 및 그 동작 방법
JP6121748B2 (ja) * 2013-02-22 2017-04-26 株式会社東芝 イオン加速装置及び医療用装置
US9826621B1 (en) * 2016-11-10 2017-11-21 Northrop Grumman Systems Corporation Electromagnetic wave refraction via controlled plasma
US11587781B2 (en) 2021-05-24 2023-02-21 Hamamatsu Photonics K.K. Laser-driven light source with electrodeless ignition
US12165856B2 (en) 2022-02-21 2024-12-10 Hamamatsu Photonics K.K. Inductively coupled plasma light source
US12144072B2 (en) 2022-03-29 2024-11-12 Hamamatsu Photonics K.K. All-optical laser-driven light source with electrodeless ignition
US12156322B2 (en) 2022-12-08 2024-11-26 Hamamatsu Photonics K.K. Inductively coupled plasma light source with switched power supply

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4007430A (en) 1969-10-14 1977-02-08 Nasa Continuous plasma laser
US4116542A (en) 1976-05-19 1978-09-26 Kms Fusion, Inc. Method and apparatus for reducing coherence of high-power laser beams
US5048163A (en) 1987-12-07 1991-09-17 Asmus John F System for processing semiconductor materials
JPH04158331A (ja) * 1990-10-23 1992-06-01 Toshiba Corp 光シャッター及びこの光シャッターを用いたレーザ装置
JP2863135B2 (ja) * 1996-07-23 1999-03-03 日本原子力研究所 高効率プラズマ閉じ込め方法とレーザー発振方法並びにレーザー発振器
JPH11195397A (ja) * 1998-01-05 1999-07-21 Masanobu Nunogaki 低エネルギー重イオン立体照射法
JP2000182956A (ja) * 1998-12-15 2000-06-30 Sony Corp 半導体薄膜の結晶化方法及びレーザ結晶化装置
JP2000277453A (ja) * 1999-03-26 2000-10-06 Seiko Epson Corp 半導体製造装置
JP2002082239A (ja) * 2000-09-11 2002-03-22 Nec Corp フォトニック結晶およびこれを用いた光パルス制御装置
US7087914B2 (en) * 2004-03-17 2006-08-08 Cymer, Inc High repetition rate laser produced plasma EUV light source
US7396431B2 (en) * 2004-09-30 2008-07-08 Tokyo Electron Limited Plasma processing system for treating a substrate
JP4391537B2 (ja) * 2007-02-28 2009-12-24 株式会社半導体エネルギー研究所 半導体装置

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