JP2010538272A - 試料を二つの別個のチャンネルで同時に検査するためのシステムおよび方法 - Google Patents

試料を二つの別個のチャンネルで同時に検査するためのシステムおよび方法 Download PDF

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JP2010538272A
JP2010538272A JP2010523110A JP2010523110A JP2010538272A JP 2010538272 A JP2010538272 A JP 2010538272A JP 2010523110 A JP2010523110 A JP 2010523110A JP 2010523110 A JP2010523110 A JP 2010523110A JP 2010538272 A JP2010538272 A JP 2010538272A
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Prior art keywords
illumination
light
sample
light source
dark field
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Pending
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JP2010523110A
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Japanese (ja)
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JP2010538272A5 (cg-RX-API-DMAC7.html
Inventor
メハニアン・コウロシュ
ハンセン・ハンス・ジェイ．
ワン・インジアン
ベン−ドブ・ユバル
リー・ツェン−ウー
ヒル・アンドリュー・ブイ．
バエズ−イラバニ・メヘディ
シメルマン・カート
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KLA Corp
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KLA Tencor Corp
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Publication of JP2010538272A publication Critical patent/JP2010538272A/ja
Publication of JP2010538272A5 publication Critical patent/JP2010538272A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/18—Arrangements with more than one light path, e.g. for comparing two specimens
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
    • G02B21/365—Control or image processing arrangements for digital or video microscopes
    • G02B21/367—Control or image processing arrangements for digital or video microscopes providing an output produced by processing a plurality of individual source images, e.g. image tiling, montage, composite images, depth sectioning, image comparison
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8822—Dark field detection
    • G01N2021/8825—Separate detection of dark field and bright field

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  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Immunology (AREA)
  • Engineering & Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • Optics & Photonics (AREA)
  • Biochemistry (AREA)
  • Multimedia (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Microscoopes, Condenser (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2010523110A 2007-08-31 2008-08-27 試料を二つの別個のチャンネルで同時に検査するためのシステムおよび方法 Pending JP2010538272A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/848,516 US7782452B2 (en) 2007-08-31 2007-08-31 Systems and method for simultaneously inspecting a specimen with two distinct channels
PCT/US2008/074435 WO2009032681A1 (en) 2007-08-31 2008-08-27 Systems and method for simultaneously inspecting a specimen with two distinct channels

Related Child Applications (1)

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JP2015093842A Division JP2015215349A (ja) 2007-08-31 2015-05-01 試料を二つの別個のチャンネルで同時に検査するためのシステムおよび方法

Publications (2)

Publication Number Publication Date
JP2010538272A true JP2010538272A (ja) 2010-12-09
JP2010538272A5 JP2010538272A5 (cg-RX-API-DMAC7.html) 2011-09-22

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JP2010523110A Pending JP2010538272A (ja) 2007-08-31 2008-08-27 試料を二つの別個のチャンネルで同時に検査するためのシステムおよび方法
JP2015093842A Pending JP2015215349A (ja) 2007-08-31 2015-05-01 試料を二つの別個のチャンネルで同時に検査するためのシステムおよび方法
JP2017083313A Active JP6430578B2 (ja) 2007-08-31 2017-04-20 試料を二つの別個のチャンネルで同時に検査するためのシステム
JP2018204573A Active JP6580771B2 (ja) 2007-08-31 2018-10-31 試料を二つの別個のチャンネルで同時に検査するためのシステム

Family Applications After (3)

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JP2015093842A Pending JP2015215349A (ja) 2007-08-31 2015-05-01 試料を二つの別個のチャンネルで同時に検査するためのシステムおよび方法
JP2017083313A Active JP6430578B2 (ja) 2007-08-31 2017-04-20 試料を二つの別個のチャンネルで同時に検査するためのシステム
JP2018204573A Active JP6580771B2 (ja) 2007-08-31 2018-10-31 試料を二つの別個のチャンネルで同時に検査するためのシステム

Country Status (3)

Country Link
US (1) US7782452B2 (cg-RX-API-DMAC7.html)
JP (4) JP2010538272A (cg-RX-API-DMAC7.html)
WO (1) WO2009032681A1 (cg-RX-API-DMAC7.html)

Cited By (5)

* Cited by examiner, † Cited by third party
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JP2015513111A (ja) * 2012-04-12 2015-04-30 ケーエルエー−テンカー コーポレイション サンプル検査とレビューのためのシステム及び方法
JP2020519957A (ja) * 2017-05-12 2020-07-02 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ フレキシブルモード走査光学顕微鏡法、及び検査システム
WO2020189865A1 (ko) * 2019-03-18 2020-09-24 주식회사 유니온커뮤니티 청색 또는 보라색 광을 차단하는 차단 성능을 검사하는 검사장치 및 그 검사방법
JP2022119894A (ja) * 2014-02-12 2022-08-17 ケーエルエー コーポレイション 半導体試料内の瑕疵を検出又は精査するシステム
JP2025096335A (ja) * 2011-10-11 2025-06-26 ケーエルエー コーポレイション 変調光源を備える光学計測ツール

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CN102016554B (zh) * 2008-04-04 2013-01-30 南达技术公司 光学检验系统及方法
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US11087449B2 (en) 2019-10-24 2021-08-10 KLA Corp. Deep learning networks for nuisance filtering
RU2727527C1 (ru) * 2020-03-10 2020-07-22 Вячеслав Михайлович Смелков Телевизионная система для наблюдения за перемещением горячего проката
US11631169B2 (en) 2020-08-02 2023-04-18 KLA Corp. Inspection of noisy patterned features
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IL307265A (en) * 2023-09-26 2025-04-01 Applied Materials Israel Ltd Optical systems and methods for coupling a mirror to an optical system
KR102738978B1 (ko) * 2023-12-27 2024-12-05 율촌화학 주식회사 Led와 레이저를 활용한 검사 장치 및 그 제어 방법
CN119438221A (zh) * 2024-12-12 2025-02-14 上海中科飞测半导体科技有限公司 一种半导体检测设备
CN119985504A (zh) * 2025-03-11 2025-05-13 复旦大学 一种基于双通道光学成像的晶圆缺陷检测系统
CN120314303B (zh) * 2025-03-13 2025-12-23 飞测思凯浦(上海)半导体科技有限公司 一种成像调节装置和光学检测设备
CN119880900A (zh) * 2025-03-31 2025-04-25 深圳中科飞测科技股份有限公司 一种半导体检测装置及其控制方法
CN119901756A (zh) * 2025-03-31 2025-04-29 深圳中科飞测科技股份有限公司 一种晶圆缺陷检测装置及控制方法
CN119901683B (zh) * 2025-03-31 2025-08-05 深圳中科飞测科技股份有限公司 一种晶圆明暗场缺陷检测装置
CN119901684B (zh) * 2025-04-01 2025-07-15 上海中科飞测半导体科技有限公司 一种明暗场检测装置及方法

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JP2025096335A (ja) * 2011-10-11 2025-06-26 ケーエルエー コーポレイション 変調光源を備える光学計測ツール
JP2015513111A (ja) * 2012-04-12 2015-04-30 ケーエルエー−テンカー コーポレイション サンプル検査とレビューのためのシステム及び方法
JP2022119894A (ja) * 2014-02-12 2022-08-17 ケーエルエー コーポレイション 半導体試料内の瑕疵を検出又は精査するシステム
JP7561793B2 (ja) 2014-02-12 2024-10-04 ケーエルエー コーポレイション 半導体試料内の瑕疵を検出又は精査するシステム
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Publication number Publication date
US20090059215A1 (en) 2009-03-05
JP2015215349A (ja) 2015-12-03
JP2017167152A (ja) 2017-09-21
WO2009032681A1 (en) 2009-03-12
JP6580771B2 (ja) 2019-09-25
JP6430578B2 (ja) 2018-11-28
JP2019015742A (ja) 2019-01-31
US7782452B2 (en) 2010-08-24

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