JP2010532429A - 基材のパターニング方法 - Google Patents
基材のパターニング方法 Download PDFInfo
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Abstract
Description
Exton、PAのSartomer Company、Inc.からSR444として市販されている40重量部のペンタエリスリトールジアクリレート;SartomerからSR238として市販されている、40重量部の1、6ヘキサンジオールジアクリレート;およびSartomerからCN2404として市販されている20重量部の金属アクリル酸塩オリゴマーを混合することによって、イオン化可能置換基を有する有機組成物を調製した。この組成物に、Florham Park、NJのBASFからTPO−Lとして市販されている1〜2重量%のエチル2、4、6−トリメチルベンゾイルフェニルホスフィネート光開始剤を加えた。
20G SR−444、20gのSR−238、15gのCN−2404、および2gのTPO−Lで組成物を製造した以外は例1のように組成物を調製した。組成物の20重量%のコーティング溶液を、80wt%の70:30(重量比)トルエン:イソプロピルアルコール溶液を加えることによって製造した。顕微鏡スライドガラスを、約1μmの乾燥被膜厚を残す0.5フィート/分の速度で引き上げて、ディップコートした。
5.0グラムのDGMEA、4.0グラムのSR−444(Sartomer、Exton PA)、4.0グラムのSR−238(Sartomer、Exton PA)、1.8グラムのCN−2404(Sartomer、Exton PA)、および0.2グラムの Lucerin・TPO−L(BASF、Charlotte NC)を含む組成物を調製した。この混合物は、約15センチポイズの粘度および31mN/m近辺の表面張力を有することが見いだされた。この組成物を、Dimatix DMP 2831(Dimatix、Santa Clara CA)インクジェット印刷ユニット上に印刷して、異なる幅のラインのパターンを作った。基材は、Q65(DuPont Teijin、Hopewell VA)としてDuPont Teijinから入手可能である5mil厚のポリ[エチレンナフタレート](PEN)であった。印刷プラテンを60℃に設定して、いくらかの溶媒を蒸発させた。
4.0グラムのSR−444(Sartomer、Exton PA)、4.0グラムのSR−238(Sartomer、Exton PA)、1.8グラムのCN−2404(Sartomer、Exton PA)、および0.2グラムのLucerin・TPO−L(BASF、Charlotte NC)(組成物は、それぞれの成分の重量比で20:20:10:1を有した)を含む組成物を調製した。この混合物は、約15センチポイズの粘度および31mN/m近辺の表面張力を有することが見いだされた。この組成物を、Dimatix DMP 2831(Dimatix、Santa Clara CA)インクジェット印刷ユニット上に印刷して、異なる幅のラインパターンを作った。基材は、Q65(DuPont Teijin、 Hopewell VA)としてDuPont Teijinから入手可能である5mil厚のポリ[エチレンナフタレート](PEN)であった。印刷プラテンは室温であり、プリンターヘッドを70℃に設定して、一貫したインクジェット印刷のために溶液の粘度を下げた。
親水性で、素早く固まる材料である(2組成物エポキシである)3M ESPE Express(商標)・ビニルポリシロキサン印象材から、鋳型を製造した。印象材を基材上に置き、そして(図9に示す)スタンプをエポキシの上に置いた。材料を固めた後で、鋳型をスタンプから除去した。図9bに、この工程を使用して形成した鋳型を示す。
きれいにペイントした缶の蓋中に、図10aに示すような約1インチ間隔で格子パターンに千枚通しを通し、そして、穴を開けることによって、フォトマスクを形作った。このマスクを、20:20:10:1重量比でSR444 (Sartomer、Exton PA)、SR238(Sartomer、Exton PA)、CN2404(Sartomer、Exton PA)、およびTPO−L(BASF、Charlotte NC)を有する組成物で被覆した3M Scotchpar(商標)P56 2mil厚PETフィルムの一部の上に置いた。約6μm厚の被膜を形成するであろう2.5milのMayer棒を使用して手で組成物を適用した。
Claims (48)
- イオン化可能置換基を有する有機組成物を所定のパターンで基材上に適用する工程、および前記イオン化可能置換基とイオン性種との間のイオン交換を行う工程を含んで成る、基材のパターニング方法。
- 前記有機組成物が、液体であり、そして前記方法が、前記有機組成物を前記基材に接着させるために、前記有機組成物を固化させる工程をさらに含む、請求項1に記載の方法。
- 前記有機組成物が、溶媒を含み、そして前記固化が、前記溶媒を蒸発させる工程を含む、請求項2に記載の方法。
- 前記有機組成物が、有機モノマー、有機オリゴマーまたはそれらの混合物を含み、そして前記固化が、前記有機組成物の重合を開始する工程を含む、請求項2に記載の方法。
- 前記重合が、放射線により開始される、請求項4に記載の方法。
- 前記イオン交換を行う工程の前に、前記パターン化された基材をすすぐ工程をさらに含む、請求項1に記載の方法。
- 前記イオン交換を行う前に、前記パターン化された基材をすすぐ工程が、脱イオン水中で行われる、請求項6に記載の方法。
- 前記脱イオン水が、55℃超の温度である、請求項6に記載の方法。
- 前記イオン交換を行う工程の前の、前記パターン化された基材をすすぐ工程が、塩基性水溶液中で行われて、次に脱イオン水中ですすぐ工程である、請求項6に記載の方法。
- 前記塩基性水溶液が、水酸化アンモニウムの溶液である、請求項9に記載の方法。
- 前記塩基性水溶液が、水酸化ナトリウムの溶液である、請求項に9記載の方法。
- 前記イオン交換を行った後で、前記パターン化された基材をすすぐ工程をさらに含む、請求項1に記載の方法。
- 前記イオン交換された基材上で、無電解めっきを行う工程をさらに含む、請求項1に記載の方法。
- 前記イオン交換された金属イオンを還元する工程をさらに含む、請求項13に記載の方法。
- 前記イオン交換された金属イオンを還元する工程が、光還元、化学的還元、熱還元、および電子ビーム還元からなる群から選択される、請求項14に記載の方法。
- 前記無電解めっきが、銅、銀、ニッケル、金、白金、およびパラジウムからなる群から選択された層を堆積させる、請求項13に記載の方法。
- 前記金属塩が、銅、銀、ニッケル、金、白金、およびパラジウムからなる群から選択される、請求項1に記載の方法。
- 前記金属塩が、銀である、請求項1に記載の方法。
- 前記有機組成物が、アクリレートモノマーおよびオリゴマーからなる群から選択される化合物を含む、請求項1に記載の方法。
- 前記有機組成物が、ジアクリル酸亜鉛を含む、請求項19に記載の方法。
- 前記所定のパターンでイオン化可能置換基を有する有機組成物を適用する工程が、スタンピング、ジェット印刷、スクライビング、フォトパターニング、成形、熱転写、スクリーン印刷、および接着からなる群から選択される方法によって達成される、請求項1に記載の方法。
- ジアクリル酸亜鉛を含む有機組成物を所定のパターンで基材上に適用する工程、
前記有機組成物をUV放射で重合させる工程、
前記重合した有機組成物を、塩基性水溶液ですすぎ、次に少なくとも55℃の温度において脱イオン水中ですすぐ工程、
前記重合した有機組成物と、銀塩を含む浴との間でイオン交換を行う工程、
脱イオン水中で前記イオン交換された重合した有機組成物をすすぐ工程、および、
前記イオン交換された重合した有機組成物に無電解銅メッキを行う工程、
を含んで成る、基材上に金属パターンを形成する方法。 - イオン化可能置換基を有する有機組成物を所定のパターンで基材上に適用する工程、
前記パターン化された基材をすすぐ工程、
前記イオン化可能置換基とイオン性種との間でイオン交換を行う工程。
前記イオン交換された基材をすすぐ工程、
前記イオン交換された基材上で無電解析出法を行う工程、および、
前記基材をすすぐ工程、
を含んで成る、基材のパターニング方法。 - 基材に放射線硬化性組成物を適用する工程、
前記有機組成物少なくとも一部分を硬化させる工程、
前記未硬化部分を除いて、硬化した有機組成物のパターンを形成する工程、および、
前記イオン化可能置換基をイオン性種で置き換えるために、イオン交換を行う工程、
を含んで成る、基材のパターニング方法。 - 前記有機組成物が、液体であり、そして前記方法が前記有機組成物を前記基材に接着させるために、前記有機組成物を固化させる工程をさらに含む、請求項24に記載の方法。
- 前記有機組成物が、溶媒を含み、そして前記固化が、前記溶媒を蒸発させる工程を含む、請求項25に記載の方法。
- 前記有機組成物が、有機モノマー、有機オリゴマーまたはそれらの混合物を含み、そして前記固化が、前記有機組成物の重合を開始する工程を含む、請求項25に記載の方法。
- 前記重合が、放射線を用いて開始される、請求項27に記載の方法。
- 前記イオン交換を行う前に、前記パターン化された基材をすすぐ工程をさらに含む、請求項24に記載の方法。
- イオン交換を行う前に、前記パターン化された基材をすすぐ工程が、55℃超の温度において脱イオン水中で行われる、請求項29に記載の方法。
- 前記イオン交換を行う前の、前記パターン化された基材をすすぐ工程が、塩基性水溶液中で行われて、次に脱イオン水ですすぐ工程である、請求項29に記載の方法。
- 前記塩基性水溶液が、水酸化アンモニウムの溶液である、請求項31に記載の方法。
- 前記塩基性水溶液が、水酸化ナトリウムの溶液である、請求項31に記載の方法。
- 前記イオン交換を行った後で、前記パターン化された基材をすすぐ工程をさらに含む、請求項24に記載の方法。
- 前記イオン交換された基材に、無電解めっきを行う工程をさらに含む、請求項24に記載の方法。
- 前記イオン交換された金属イオンを還元する工程をさらに含む、請求項35に記載の方法。
- 前記イオン交換された金属イオンの還元が、光還元、化学的還元、熱還元、および電子ビーム還元からなる群から選択される、請求項36に記載の方法。
- 前記無電解めっきが、銅、銀、ニッケル、金、白金、およびパラジウムからなる群から選択される層を堆積させる、請求項35に記載の方法。
- 前記金属塩が、銅、銀、ニッケル、金、白金、およびパラジウムからなる群から選択される、請求項21に記載の方法。
- 前記金属塩が、銀である、請求項24に記載の方法。
- 前記有機組成物が、アクリレートモノマーおよびオリゴマーからなる群から選択された化合物を含む、請求項24に記載の方法。
- 前記有機組成物が、ジアクリル酸亜鉛を含む、請求項41に記載の方法。
- 前記所定のパターンでイオン化可能置換基を有する有機組成物を適用する工程が、スタンピング、ジェット印刷、スクライビング、フォトパターニング、成形、熱転写、スクリーン印刷、および接着からなる群から選択される方法によって達成される、請求項24に記載の方法。
- 基材、
パターン化された有機組成物、および、
パターン化された金属性被膜、
を含んで成る、物品、
前記パターン化された有機組成物は、前記パターン化された金属性被膜で覆われて、全体形状を形成し、そして前記全体形状は、幅で少なくとも約1μmおよび高さで少なくとも20nmである幅を有する。 - 前記パターン化された金属性被膜が、約1Å以上の厚さを有する、請求項44に記載の物品。
- 前記基材が、ポリマーを含む、請求項44に記載の物品。
- 前記ポリマーが、ポリオレフィン、ポリアクリレート、ポリアミド、ポリカーボネート、ポリスルホン、ポリエーテルスルホン、およびポリエステルを含み、熱可塑性ポリマーのさらなる例が、ポリエチレン、ポリプロピレン、ポリスチレン、ポリメチルメタクリレート、ビスフェノール Aのポリカーボネート、ポリビニルクロライド、ポリエチレンテレフタレート(PET)、ポリエチレンナフタレート(PEN)、ポリビニリデンフルオライド、またはそれらの組み合わせを含む、請求項44に記載の物品。
- 前記基材が、ガラスを含む、請求項44に記載の物品。
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US94752707P | 2007-07-02 | 2007-07-02 | |
PCT/US2008/067179 WO2009006010A2 (en) | 2007-07-02 | 2008-06-17 | Method of patterning a substrate |
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JP (1) | JP2010532429A (ja) |
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CN (1) | CN101687218A (ja) |
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EP2162237A4 (en) | 2011-01-12 |
CN101687218A (zh) | 2010-03-31 |
BRPI0813652A2 (pt) | 2014-12-30 |
KR20100036260A (ko) | 2010-04-07 |
WO2009006010A3 (en) | 2009-02-26 |
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