JP2010261839A - Light irradiating device - Google Patents

Light irradiating device Download PDF

Info

Publication number
JP2010261839A
JP2010261839A JP2009113490A JP2009113490A JP2010261839A JP 2010261839 A JP2010261839 A JP 2010261839A JP 2009113490 A JP2009113490 A JP 2009113490A JP 2009113490 A JP2009113490 A JP 2009113490A JP 2010261839 A JP2010261839 A JP 2010261839A
Authority
JP
Japan
Prior art keywords
light
workpiece
light source
observation hole
observation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2009113490A
Other languages
Japanese (ja)
Other versions
JP5097912B2 (en
Inventor
Shigeki Masumura
茂樹 増村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CCS Inc
Original Assignee
CCS Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CCS Inc filed Critical CCS Inc
Priority to JP2009113490A priority Critical patent/JP5097912B2/en
Publication of JP2010261839A publication Critical patent/JP2010261839A/en
Application granted granted Critical
Publication of JP5097912B2 publication Critical patent/JP5097912B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Abstract

<P>PROBLEM TO BE SOLVED: To provide a light irradiating device, having a simple structure reducing a region not having a light source section, when an observation hole is viewed from a workpiece and executing appropriately shadowless illumination, or the like. <P>SOLUTION: The device includes: the observation hole provided between the workpiece of a product, or the like, which is a light irradiation object and an external observation point, on an observation axis connecting them; a first light source section provided around the observation hole, for irradiating the workpiece with light; a half-mirror section provided obliquely with respect to the observation axis on a position facing to the observation hole on the external observation point side; a second light source section provided at a position where the light emitted therefrom is reflected by the half-mirror section and irradiated to the workpiece through the observation hole; and a transparent member for covering the observation hole. The inner surface of the workpiece side of the transparent member is set so as to be a light-reflecting surface that reflects it toward the second light source section, the light transmitted through the transparent member, reflected by the half-mirror section, and advanced toward the inner surface, in the reflected light from the workpiece. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

本発明は、製品の表面検査やマーク検出等に好適に用いられる光照射装置に関するものである。   The present invention relates to a light irradiation apparatus that is suitably used for product surface inspection, mark detection, and the like.

同軸照明が可能な光照射装置としては、例えば、特許文献1に記載されているような無影照明装置が知られている。この種の無影照明装置は、製品等を表面検査等の目的から無影で照明するとき等に用いられるものである。このような光照射装置のうち面発光装置を用いたものとしては、例えば、図10に示すようなものが挙げられる。   As a light irradiation device capable of coaxial illumination, for example, a shadowless illumination device as described in Patent Document 1 is known. This type of shadowless illumination device is used when a product or the like is illuminated with no shadow for the purpose of surface inspection or the like. An example of such a light irradiation device using a surface light emitting device is shown in FIG.

すなわち、当該光照射装置100は、例えば製品等のワークWを覆うように配置される平面状の発光面(第1光源部)101を備えており、その中央部分にワークWを外部から視認するための観察孔101aが設けられている。そして、この観察孔101aからもワークWに光が照射されるようにするため、同軸照明機構を設けている。この同軸照明機構は、観察孔101aのほぼ直上に45°の傾斜姿勢でハーフミラー103を配置するとともに、そのハーフミラー103の側方に平面状の発光面(第2光源部)102を配置し、当該第2光源部102から射出された光が、ハーフミラー103で反射し観察孔101aを通って、ワークWに照射されるように構成したものである。   That is, the light irradiation apparatus 100 includes a planar light emitting surface (first light source unit) 101 disposed so as to cover a workpiece W such as a product, and visually recognizes the workpiece W from the outside at a central portion thereof. An observation hole 101a is provided. A coaxial illumination mechanism is provided in order to irradiate the work W with light also from the observation hole 101a. In this coaxial illumination mechanism, the half mirror 103 is arranged at an inclination of 45 ° almost directly above the observation hole 101a, and a planar light emitting surface (second light source unit) 102 is arranged on the side of the half mirror 103. The light emitted from the second light source unit 102 is reflected by the half mirror 103, passes through the observation hole 101a, and is irradiated onto the workpiece W.

特開2001−215115号公報JP 2001-215115 A

当該光照射装置100のようにハーフミラー103を備えていて、ハーフミラー103で反射した光をワークW表面に照射して、ワークW表面で反射した光を捕捉して撮像を行う場合、ワークW表面の一部に暗いムラ部分ができることがあり、精密な表面検査等では当該ムラ部分が問題になる。   When the half mirror 103 is provided like the light irradiation apparatus 100 and the light reflected by the half mirror 103 is irradiated on the surface of the work W, and the light reflected by the surface of the work W is captured and imaged, the work W A dark uneven portion may be formed on a part of the surface, and the uneven portion becomes a problem in precise surface inspection or the like.

このムラ部分が生じる要因の1つとして、ハーフミラー103にワークW側の像が映り込むことによる。すなわち、図11に示すように、ワークWの周縁部のうち第2光源部102の下方から観察孔101aを介してハーフミラー103を見ると、第2光源部102が映らずにワークW側の像が映っている領域が生じていることがわかる。   One of the factors that cause this uneven portion is that an image on the workpiece W side is reflected on the half mirror 103. That is, as shown in FIG. 11, when the half mirror 103 is viewed from below the second light source unit 102 through the observation hole 101 a in the peripheral part of the workpiece W, the second light source unit 102 is not reflected and the workpiece W side is not reflected. It can be seen that there is a region where an image is shown.

一方、ワークWの中央部から観察孔101aを介してハーフミラー103を見ると、図12に示すように、全視野において第2光源部102が映っているのが見える。   On the other hand, when the half mirror 103 is viewed from the center of the workpiece W through the observation hole 101a, it can be seen that the second light source 102 is reflected in the entire field of view as shown in FIG.

これは、ワークWの中央部から見たときに比べて、ワークWの周縁部のうち第2光源部102の下方から見たときの方が、第2光源部102の輝度にムラがあるように見えることを意味する。これが、ワークW表面をその正反射光を捕捉して明視野で観察する場合に、ワークW表面の一部に暗いムラ部分が生じる一因である。これは、明視野でワークW表面を観察する場合は、ワークW表面の明るさは光源の輝度で決まるので、ワークW側から光源を見たときに均一な輝度で光源が見えないと、その輝度のムラがそのままワークW表面の濃淡として観察されてしまうことによる。この濃淡が最も問題になるのは表面に凹凸がある反射率の高いワークWを明視野で観察する場合である。   This is because the luminance of the second light source unit 102 is more uneven when viewed from below the second light source unit 102 in the peripheral portion of the workpiece W than when viewed from the center of the workpiece W. Means it looks like This is one reason why dark uneven portions are generated on a part of the surface of the workpiece W when the surface of the workpiece W is captured in the bright field by capturing the regular reflection light. This is because when the surface of the work W is observed in a bright field, the brightness of the surface of the work W is determined by the luminance of the light source. This is because the unevenness in luminance is observed as the shade of the surface of the workpiece W as it is. This shading is the most problematic when observing in a bright field a work W having a high reflectivity with irregularities on the surface.

これを解消するには、ワークW側に更に第3の光源部を設置すればよいが、このようにすると、装置が肥大化するうえに、光量ロスが大きくなって効率が悪くなる。   In order to solve this problem, a third light source unit may be further installed on the workpiece W side. However, if this is done, the apparatus will be enlarged, and the loss of light quantity will increase and the efficiency will deteriorate.

本発明はかかる問題点に鑑みなされたものであって、簡単な構成でありながら、ワークから観察孔を見たときの光源部のない領域を減少させ、無影照明等をより好適に行うことができる光照射装置を提供することをその主たる所期課題としたものである。   The present invention has been made in view of such problems, and has a simple configuration, but reduces an area without a light source portion when viewing an observation hole from a work, and more suitably performs shadowless illumination or the like. It is a main intended problem to provide a light irradiation device capable of performing the above.

すなわち本発明に係る光照射装置は、光の照射対象である製品等のワークと外部観察点との間であってそれらを結ぶ観察軸線上に設けられた観察孔と、前記観察孔の周囲に設けられ前記ワークに光を照射する第1光源部と、前記外部観察点側であって前記観察孔に臨む位置に、前記観察軸線に対して斜めに設けられたハーフミラー部と、射出された光が前記ハーフミラー部で反射し、前記観察孔を通って前記ワークに照射される位置に設けた第2光源部と、前記観察孔を覆う透明部材と、を備え、前記透明部材における前記ワーク側の内面が、前記ワークからの反射光のうち、前記透明部材を透過して前記ハーフミラー部で反射し前記内面に向かった光を、前記第2光源部に向けて反射する光反射面であることを特徴とする。   That is, the light irradiation apparatus according to the present invention includes an observation hole provided on an observation axis between a workpiece such as a product to be irradiated with light and an external observation point and connecting them, and around the observation hole. A first light source unit that emits light to the workpiece, a half mirror unit that is provided at an angle with respect to the observation axis at a position facing the observation hole on the external observation point side, and emitted A second light source part provided at a position where light is reflected by the half mirror part and irradiated to the work through the observation hole, and a transparent member covering the observation hole, and the work in the transparent member A light reflecting surface on which the inner surface of the light is reflected by the half mirror part of the reflected light from the workpiece, reflected by the half mirror part, and reflected toward the second light source part. It is characterized by being.

このようなものであれば、第2光源部からの光の一部は前記透明部材のワーク側で反射して進行方向を変えるので、第2光源部からの光をワークの周縁部のうち第2光源部の下方にも良好に導くことができる。このため、新たに第3の光源部を設けたり複雑な構造を採用したりせずに、ワークから観察孔を見たときの光源部のない領域を減少させることができ、より輝度ムラの少ない照明機構を構築できる。   In such a case, a part of the light from the second light source part is reflected on the work side of the transparent member to change the traveling direction, so that the light from the second light source part is changed to the first of the peripheral parts of the work. It can guide well below the two light source sections. For this reason, without providing a new third light source part or adopting a complicated structure, it is possible to reduce the area without the light source part when viewing the observation hole from the work, and less uneven brightness. An illumination mechanism can be constructed.

また、輝度ムラが生じる他の原因としては、第2光源部(そのハーフミラーに映った鏡像)が観察孔を完全には覆っておらず、周囲に隙間が生じていることも挙げられる。すなわち、ハーフミラーを介在させた場合と等価な直接光学系を考えると、図13、図14に示すように、仮想第2光源部102’は、ハーフミラー103を対称軸として実際の第2光源部102とは対称な位置に存在することになる。   Another cause of uneven brightness is that the second light source part (the mirror image reflected on the half mirror) does not completely cover the observation hole, and a gap is formed around it. That is, when considering a direct optical system equivalent to the case where a half mirror is interposed, as shown in FIGS. 13 and 14, the virtual second light source unit 102 ′ has an actual second light source with the half mirror 103 as the axis of symmetry. It exists in the position symmetrical with the part 102. FIG.

そこで、ワークWの周縁部から観察孔101aを見ると、図13に示すように、光源部の存在しない領域H1が生じていることがわかる。一方、ワークWの中央部から観察孔101aを見ると、図14の斜線領域H2に示すように、観察孔101aは、第2光源部102(仮想第2光源部102’)に完全に覆われて見える。   Therefore, when the observation hole 101a is viewed from the peripheral edge of the workpiece W, it can be seen that a region H1 where no light source portion exists is generated as shown in FIG. On the other hand, when viewing the observation hole 101a from the center of the workpiece W, the observation hole 101a is completely covered by the second light source unit 102 (virtual second light source unit 102 ′) as shown by the hatched area H2 in FIG. Looks.

このため、観察軸C上に位置するワークWの中央部では観察孔101aの全天方向から光が照射されるのに対して、ワークWの周縁部では観察孔101aの全天方向から光が照射されておらず、ワークWの周縁部ではワークWの中央部に比べて暗いという現象が生じる。これがワークW表面の一部に暗いムラ部分ができる他の原因である。   For this reason, light is irradiated from the whole sky direction of the observation hole 101a in the central part of the work W located on the observation axis C, whereas light is emitted from the whole sky direction of the observation hole 101a in the peripheral part of the work W. It is not irradiated, and the phenomenon that the periphery of the workpiece W is darker than the central portion of the workpiece W occurs. This is another cause of dark uneven portions on a part of the surface of the workpiece W.

当該ムラを低減して、前記ワーク表面が一様な明るさで照明されるようにするためには、前記第2光源部から前記ハーフミラーまでの光路及び前記ハーフミラーから前記観察孔までの光路を覆う光路内面を備え、前記光路内面の少なくとも一部が光反射面であることが好ましい。なお、前記第2光源部が拡散板等で覆われていて、当該拡散板等の光導出面が前記光路内面を構成していてもよい。また、ワーク側から当該光路内面が見えなくてもよい。   In order to reduce the unevenness and illuminate the work surface with uniform brightness, the optical path from the second light source unit to the half mirror and the optical path from the half mirror to the observation hole It is preferable that at least a part of the inner surface of the optical path is a light reflecting surface. Note that the second light source unit may be covered with a diffusion plate or the like, and a light extraction surface of the diffusion plate or the like may constitute the inner surface of the optical path. Further, the inner surface of the optical path may not be visible from the work side.

このようなものであれば、前記光反射面によって第2光源部の面積が大きくなったと同様の効果を得られるため、前記第2光源部を大型化したりせずに、ワークから観察孔を見たときの光源部のない領域を更に減少させることができ、より輝度ムラのない少ない照明機構を構築できる。   In such a case, the same effect as when the area of the second light source unit is increased by the light reflecting surface can be obtained. Therefore, the observation hole can be viewed from the workpiece without increasing the size of the second light source unit. In this case, it is possible to further reduce the area without the light source portion, and to construct an illumination mechanism with less luminance unevenness.

また、前記透明部材が、前記ハーフミラー部が内包された直方体状の中実透明体であれば、前記ハーフミラー部と前記透明部材との間に空気が介在しないので、光の取り出し効率に優れたものを構成することができる。   Further, if the transparent member is a rectangular solid solid body including the half mirror part, air is not interposed between the half mirror part and the transparent member, so that the light extraction efficiency is excellent. Can be configured.

更に、前記中実透明体の内面のうち前記ワーク側の内面を除く内面の少なくとも一部が、前記光路内面として機能するように構成してあれば、その内面において、第2光源部から射出された光が全反射するので、その表面に別途鏡面処理を施す必要がない。   Further, if at least a part of the inner surface of the solid transparent body excluding the inner surface on the workpiece side is configured to function as the inner surface of the optical path, the inner surface is emitted from the second light source unit. Since the reflected light is totally reflected, it is not necessary to perform a specular treatment on the surface.

このような構成の本発明によれば、簡単な構成によりワークから観察孔を見たときの光源部のない領域を効果的に減少させることができる。   According to the present invention having such a configuration, it is possible to effectively reduce the area without the light source portion when the observation hole is viewed from the workpiece with a simple configuration.

本発明の一実施形態に係る光照射装置の中央縦断面図である。It is a center longitudinal cross-sectional view of the light irradiation apparatus which concerns on one Embodiment of this invention. 同実施形態における光照射装置の平面図である。It is a top view of the light irradiation apparatus in the embodiment. 同実施形態における光学部材の部分縦断面図である。It is a fragmentary longitudinal cross-sectional view of the optical member in the embodiment. 同実施形態に係る光照射装置の光路を説明する光路説明図である。It is an optical path explanatory drawing explaining the optical path of the light irradiation apparatus concerning the embodiment. 他の実施形態に係る光照射装置の中央縦断面図である。It is a center longitudinal cross-sectional view of the light irradiation apparatus which concerns on other embodiment. 他の実施形態に係る光照射装置の光路を説明する光路説明図である。It is optical path explanatory drawing explaining the optical path of the light irradiation apparatus which concerns on other embodiment. 他の実施形態に係る光照射装置の中央縦断面図である。It is a center longitudinal cross-sectional view of the light irradiation apparatus which concerns on other embodiment. 他の実施形態に係る光照射装置の中央縦断面図である。It is a center longitudinal cross-sectional view of the light irradiation apparatus which concerns on other embodiment. 他の実施形態に係る光照射装置の中央縦断面図である。It is a center longitudinal cross-sectional view of the light irradiation apparatus which concerns on other embodiment. 従来の光照射装置を示す模式的構造図である。It is a typical structure figure showing the conventional light irradiation device. 従来の光照射装置の光路を説明する光路説明図である。It is an optical path explanatory drawing explaining the optical path of the conventional light irradiation apparatus. 従来の光照射装置の光路を説明する光路説明図である。It is an optical path explanatory drawing explaining the optical path of the conventional light irradiation apparatus. 従来の光照射装置の光路を説明する光路説明図である。It is an optical path explanatory drawing explaining the optical path of the conventional light irradiation apparatus. 従来の光照射装置の光路を説明する光路説明図である。It is an optical path explanatory drawing explaining the optical path of the conventional light irradiation apparatus.

以下に本発明の一実施形態について図面を参照して説明する。   An embodiment of the present invention will be described below with reference to the drawings.

本実施形態に係る光照射装置1は、例えば、工場等において製品等の対象物(ワーク)に光を照射し、その表面の傷やマーク等を自動検査する際に用いるためのもので、図1及び図2に示すように、第1光照射部2と第2光照射部6とを備えている。   The light irradiation apparatus 1 according to the present embodiment is for use in, for example, irradiating light on an object (workpiece) such as a product in a factory or the like and automatically inspecting scratches or marks on the surface thereof. As shown in FIG. 1 and FIG. 2, the first light irradiation unit 2 and the second light irradiation unit 6 are provided.

第1光照射部2は、矩形板状をなす光学部材3と、その光学部材3の側周囲から光を照射する第1光源部5と、光学部材3及び第1光源部5を保持する枠体4とを備えている。   The first light irradiation unit 2 includes a rectangular plate-shaped optical member 3, a first light source unit 5 that emits light from the periphery of the optical member 3, and a frame that holds the optical member 3 and the first light source unit 5. And a body 4.

光学部材3は、一方の面をワーク対向面31aとして、光の照射対象であるワークWに向けて設置される透明板31と、透明板31における他方の面(反ワーク対向面)31bに並べ設けた多数の反射部32とからなる。   The optical member 3 has one surface as a workpiece facing surface 31a and is arranged on a transparent plate 31 installed toward the workpiece W that is a light irradiation target, and the other surface (anti-work facing surface) 31b of the transparent plate 31. It is composed of a large number of reflection portions 32 provided.

透明板31は、等厚で平面視正方形状の板状をなす無色透明のもので、撮像装置MとワークWとを結ぶ観察軸線C上に観察孔311が形成してあり、例えばアクリルやガラス等からなるものである。   The transparent plate 31 is a colorless and transparent plate having a square shape in plan view with a uniform thickness, and an observation hole 311 is formed on an observation axis C connecting the imaging device M and the workpiece W. For example, acrylic or glass is used. Etc.

反射部32は、その一つ一つは、例えば平面視円形状をなし、径が数十〜数百μm、厚みがミクロンオーダーの極めて小さく薄いものである。そして、図3に示すように、当該反射部32を、互いの間に微細な隙間Sが形成されるように、透明板31における反ワーク対向面31bの、側周縁部を除く略全面に亘って、等ピッチ(例えば約0.4mmピッチ)で縦横に多数並べ設けてある。反射部32は、例えば、光拡散部材である粒子状の反射フィラを含有した白色の顔料から形成したもので、その表面である光反射面において、主として光を反射するとともに、内部に侵入した光の一部を、前記反射フィラで拡散させて反射する。   Each of the reflecting portions 32 has, for example, a circular shape in plan view, and is extremely small and thin with a diameter of several tens to several hundreds μm and a thickness of the order of microns. And as shown in FIG. 3, the said reflection part 32 is covered over the substantially whole surface except the side peripheral part of the anti-work opposing surface 31b in the transparent plate 31 so that the fine clearance S may be formed between each other. A large number of them are arranged in the vertical and horizontal directions at an equal pitch (for example, about 0.4 mm pitch). The reflecting portion 32 is formed from, for example, a white pigment containing a particulate reflecting filler that is a light diffusing member. The reflecting portion 32 mainly reflects light on the light reflecting surface, which is the surface of the reflecting portion 32, and enters the inside. A part of the light is diffused and reflected by the reflection filler.

第1光源部5は、図2に示すように、透明板31の4つの側周端面31cにそれぞれ対応する4つのユニットからなる。各ユニットは、帯状をなす1つの配線基板52とその配線基板52に等間隔1列で搭載した複数のLED51からなり、それらLED51が、透明板31の側周端面31cに臨むように配置され、当該側周端面31cから透明板31の内部に向かって光を照射する。   As shown in FIG. 2, the first light source unit 5 includes four units respectively corresponding to the four side peripheral end surfaces 31 c of the transparent plate 31. Each unit is composed of a single wiring board 52 in the form of a strip and a plurality of LEDs 51 mounted on the wiring board 52 in a line at equal intervals, and these LEDs 51 are arranged so as to face the side peripheral end face 31c of the transparent plate 31, Light is irradiated from the side peripheral end face 31 c toward the inside of the transparent plate 31.

枠体4は、正方形環状をなし、例えば内周面に開口する周回溝を有した金属製のもので、その周回溝の中に第1光源部5を保持収容する。またその溝の開口縁部で、透明板31の側周縁部を厚み方向から挟み込んで保持する。   The frame body 4 has a square ring shape, and is made of metal having a circumferential groove that opens to the inner circumferential surface, for example, and holds and accommodates the first light source unit 5 in the circumferential groove. Further, the side peripheral edge of the transparent plate 31 is sandwiched from the thickness direction and held by the opening edge of the groove.

第2光照射部6は、キューブ型ビームスプリッター7と、キューブ型ビームスプリッター7の側端面7aから光を照射する第2光源部8と、キューブ型ビームスプリッター7及び第2光源部8を保持する枠体9とを備えている。   The second light irradiation unit 6 holds the cube beam splitter 7, the second light source unit 8 that emits light from the side end surface 7 a of the cube beam splitter 7, the cube beam splitter 7, and the second light source unit 8. And a frame body 9.

キューブ型ビームスプリッター7は、ハーフミラーが内包された直方体状の中実透明体であり、具体的には、直角プリズムを二つ貼り合わせ、その接合面71に誘電体多層膜や金属薄膜等のコーティングを施してあるものである。本実施形態で用いるキューブ型ビームスプリッター7は、全面が透明なものであり、その内面で光が全反射可能なものである。   The cube-type beam splitter 7 is a cuboid solid transparent body including a half mirror. Specifically, two rectangular prisms are bonded together, and a dielectric multilayer film, a metal thin film, or the like is bonded to the joint surface 71 thereof. It has been coated. The cube-type beam splitter 7 used in the present embodiment is transparent on the entire surface, and light can be totally reflected on the inner surface.

キューブ型ビームスプリッター7は、透明板31に設けられた観察孔311を覆うように、透明板31上に取り付けられて、その接合面71が観察孔311と撮像装置Mとの間の観察軸線C上に、観察軸線Cに対して斜め45度の角度となるように配置してある。   The cube-type beam splitter 7 is mounted on the transparent plate 31 so as to cover the observation hole 311 provided in the transparent plate 31, and its joint surface 71 is an observation axis C between the observation hole 311 and the imaging device M. Above, it is arranged so as to be at an angle of 45 degrees with respect to the observation axis C.

第2光源部8は、矩形状をなす基板81と当該基板81上に並べ設けた複数(多数)のLED82からなり、基板81は観察軸線Cと平行に設置してあり、LED82はキューブ型ビームスプリッター7の側端面7aに臨むように配置され、当該側端面7aから接合面71に向かって光を照射する。   The second light source unit 8 includes a rectangular substrate 81 and a plurality (a large number) of LEDs 82 arranged on the substrate 81. The substrate 81 is installed in parallel with the observation axis C, and the LED 82 is a cube beam. It arrange | positions so that the side end surface 7a of the splitter 7 may be faced, and it irradiates light toward the joint surface 71 from the said side end surface 7a.

枠体9は、側面視矩形状をなし、例えば側端面に開口する凹部を有した金属製のものであり、凹部の内側面に形成された溝の中に第2光源部8を保持し、当該凹部の開口縁部でキューブ型ビームスプリッター7の側端部を挟みこんで保持する。   The frame body 9 has a rectangular shape in a side view, and is made of a metal having, for example, a recess opening in a side end surface, and holds the second light source unit 8 in a groove formed on the inner surface of the recess. The side edge of the cube beam splitter 7 is sandwiched and held by the opening edge of the recess.

次に、このように構成した光照射装置1の作用を以下に説明する。   Next, the operation of the light irradiation device 1 configured as described above will be described below.

まず、図1に示すように、ワークWと撮像装置Mとを対向させて設置し、その間に、光照射装置1を、そのワーク対向面31aがワークWに向くようにして、観察軸線C上に設置する。   First, as shown in FIG. 1, the workpiece W and the imaging device M are installed facing each other, and the light irradiation device 1 is placed on the observation axis C so that the workpiece facing surface 31 a faces the workpiece W therebetween. Install in.

この状態で、第2光源部8から光が照射されると、その光はキューブ型ビームスプリッター7の側端面7aから内部に進入し、接合面71に向かってキューブ型ビームスプリッター7の内面で全反射しながら進行する。そして、接合面71に到達した光は、そこで反射して観察孔311に向かってキューブ型ビームスプリッター7の内面で全反射しながら進行する。   In this state, when light is emitted from the second light source unit 8, the light enters the inside from the side end surface 7 a of the cube beam splitter 7, and is entirely reflected on the inner surface of the cube beam splitter 7 toward the bonding surface 71. Progress while reflecting. Then, the light reaching the joining surface 71 is reflected there and travels toward the observation hole 311 while being totally reflected by the inner surface of the cube beam splitter 7.

具体的には、第2光源部8から発した光は、キューブ型ビームスプリッター7の側端面7aの内面のうち頂辺から接合面71の頂辺に至るまでの頂部光路内面A2、底面7bの内面である底部光路内面A1、側端面7aの各側辺から接合面71の各側辺に至るまでの対向する側部光路内面A3(図示しない。)において、全反射しながら進行する。そして、均一化された拡散光として底面7bから出て、観察孔311を通り、ワークWに向かって照射される。   Specifically, the light emitted from the second light source unit 8 is transmitted from the inner surface of the side end surface 7a of the cube-type beam splitter 7 to the inner surface A2 of the top optical path from the top side to the top side of the joint surface 71 and the bottom surface 7b. The light travels while being totally reflected on the inner surface A1 (not shown) of the opposite side optical path from the respective sides of the bottom optical path inner surface A1 and the side end surface 7a to the respective sides of the joint surface 71. Then, it is emitted from the bottom surface 7 b as uniformed diffused light, passes through the observation hole 311, and is irradiated toward the workpiece W.

一方、第1光源部5から発した光は、透明板31の側周端面31cから内部に進入し、図3に示すように、中央部に向かって、ワーク対向面31aの内面と反ワーク対向面31bの内面との間で全反射しながら進行する。その過程で、反ワーク対向面31bに貼り付けられた反射部32に到達した光は、そこで乱反射し、均一化された拡散光としてワーク対向面31aから出て、ワークWに向かって照射される。   On the other hand, the light emitted from the first light source unit 5 enters the inside from the side peripheral end surface 31c of the transparent plate 31, and, as shown in FIG. 3, faces the inner surface of the workpiece facing surface 31a and the opposite workpiece toward the center portion. It proceeds while being totally reflected between the inner surface of the surface 31b. In that process, the light that has reached the reflecting portion 32 attached to the anti-work facing surface 31b is diffusely reflected there, exits from the work facing surface 31a as uniformed diffused light, and is irradiated toward the work W. .

そして、撮像装置Mは、ワークWで反射し、観察孔311を通過した光を捕捉することにより、ワークWを撮像し、当該ワークWの表面検査や記号読取を行う。   The imaging device M captures the light reflected by the work W and passed through the observation hole 311 to pick up an image of the work W, and performs surface inspection and symbol reading of the work W.

この際、図4に示すように、ワークWからの反射光のうち、キューブ型ビームスプリッター7の底面7bを通過して接合面71で反射し底面7bの内面に向かった光は、当該内面で全反射して第2光源部8に向かうので、ワークWの周縁部のうち第2光源部8の下方から観察孔311を介して接合面71を見ると、全視野において第2光源部8が映っているのが見える。このため、ワークWから観察孔311を見たときの光源部のない領域を減少させることができる。   At this time, as shown in FIG. 4, among the reflected light from the workpiece W, the light that passes through the bottom surface 7 b of the cube beam splitter 7, is reflected by the joint surface 71, and travels toward the inner surface of the bottom surface 7 b. Since the light is totally reflected and travels toward the second light source unit 8, when the joint surface 71 is viewed through the observation hole 311 from below the second light source unit 8 in the peripheral portion of the work W, the second light source unit 8 is viewed in the entire field of view. I can see it. For this reason, when the observation hole 311 is viewed from the workpiece W, it is possible to reduce the area without the light source unit.

このような実施形態に係る光照射装置1であれば、キューブ型ビームスプリッター7を用いることにより、第2光源部8からの光の一部はキューブ型ビームスプリッター7の底面7bの内面で反射して進行方向を変えるので、第2光源部8からの光をワークWの周縁部のうち第2光源部8の下方にも良好に導くことができる。このため、ワークW表面の明るさのムラを低減することができる。   In the light irradiation device 1 according to such an embodiment, by using the cube beam splitter 7, a part of the light from the second light source unit 8 is reflected by the inner surface of the bottom surface 7 b of the cube beam splitter 7. Therefore, the light from the second light source unit 8 can be guided well below the second light source unit 8 in the peripheral portion of the work W. For this reason, the unevenness of the brightness of the surface of the workpiece W can be reduced.

また、キューブ型ビームスプリッター7を用いることにより、第2光源部8から接合面71までの光路及び接合面71から観察孔311までの光路において、第2光源部8から発した光がキューブ型ビームスプリッター7内面において全反射するので、ワークWの周縁部にも観察孔311の全天方向から光が照射され、そのためワークWの周縁部で生じていた明るさのムラを大きく軽減でき、ワークW表面全体に亘ってより均一な光を照射することができるようになる。   Further, by using the cube-type beam splitter 7, light emitted from the second light source unit 8 can be converted into a cube-shaped beam in the optical path from the second light source unit 8 to the joint surface 71 and the optical path from the joint surface 71 to the observation hole 311. Since the light is totally reflected on the inner surface of the splitter 7, the peripheral edge of the work W is also irradiated with light from all directions of the observation hole 311, so that the unevenness of brightness generated at the peripheral edge of the work W can be greatly reduced. It becomes possible to irradiate more uniform light over the entire surface.

また、キューブ型ビームスプリッター7は内面で全反射するので、別途表面に鏡面処理を施す必要がなく、構成が極めて簡単である。   In addition, since the cube-type beam splitter 7 totally reflects on the inner surface, it is not necessary to perform a mirror surface treatment on the surface separately, and the configuration is very simple.

更に、透明板31には観察孔311が設けてあるので、撮像装置Mは、ワークWで反射し、観察孔311を通過した光を捕捉することにより、ワークWを撮像することができ、ワーク対向面で反射した光は撮像装置に捕捉されないので、撮像画面にモアレが生じない。   Furthermore, since the observation hole 311 is provided in the transparent plate 31, the imaging device M can capture the light reflected by the work W and capture the light that has passed through the observation hole 311. Since the light reflected by the facing surface is not captured by the imaging device, moire does not occur on the imaging screen.

なお、本発明は前記実施形態に限られるものではない。   The present invention is not limited to the above embodiment.

例えば、第2光照射部6は、図5に示すように、筐体11と、その筐体11に取り付けられたハーフミラー71、観察孔31を覆う透明板7、第2光源部8及び拡散板10からなるものであってもよい。   For example, as illustrated in FIG. 5, the second light irradiation unit 6 includes a housing 11, a half mirror 71 attached to the housing 11, a transparent plate 7 covering the observation hole 31, a second light source unit 8, and a diffusion. The plate 10 may be used.

筐体11は、透明板31に設けられた観察孔311を覆うように、透明板31上に取り付けられる平面視矩形状のものであり、ハーフミラー7は、観察孔311と撮像装置Mとの間の観察軸線C上に、当該観測軸線Cに対して斜め45度の角度で配置してある。   The housing 11 has a rectangular shape in a plan view attached to the transparent plate 31 so as to cover the observation hole 311 provided in the transparent plate 31, and the half mirror 7 is formed between the observation hole 311 and the imaging device M. On the observation axis C in the meantime, it is arranged at an angle of 45 degrees with respect to the observation axis C.

拡散板10は、第2光源部8とハーフミラー7との間に介在させた矩形薄板であり、第2光源部8の発光面と平行に配置してある。この拡散板10は、透光性と光拡散性を有したくもりガラスのようなものであり、一方の面10aから入射した第2光源部8からの光をより均一化して他方の面10bからハーフミラー7に向かって射出する。そしてこの他方の面10bから出た光がハーフミラー7で反射して観察孔311を通り、ワークWに照射される。   The diffusion plate 10 is a rectangular thin plate interposed between the second light source unit 8 and the half mirror 7, and is disposed in parallel with the light emitting surface of the second light source unit 8. This diffusing plate 10 is like a cloudy glass having translucency and light diffusibility, and makes the light from the second light source unit 8 incident from one surface 10a more uniform, and half from the other surface 10b. The light is emitted toward the mirror 7. Then, the light emitted from the other surface 10 b is reflected by the half mirror 7, passes through the observation hole 311, and is irradiated onto the work W.

透明板7は、観察孔31を塞ぐように設けられた、等厚な円盤状のものである。   The transparent plate 7 is a disc having a uniform thickness provided so as to close the observation hole 31.

そして、この実施形態では、この筐体11の内面のうち、第2光源部8からハーフミラー7までの光路及びハーフミラー7から観察孔311までの光路を覆う光路壁内面A1、A2、A3、A4を鏡面にしている。   In this embodiment, among the inner surface of the housing 11, the optical path wall inner surfaces A1, A2, A3, which cover the optical path from the second light source unit 8 to the half mirror 7 and the optical path from the half mirror 7 to the observation hole 311, A4 is a mirror surface.

具体的には、他方の面10bの頂辺からハーフミラー7の頂辺に至るまでの頂部光路壁内面A2、他方の面10bの底辺から観察孔311に至るまでの底部光路壁内面A1、他方の面10bの各側辺からハーフミラー7の各側辺に至るまでの対向する側部光路壁内面A3(図示しない。)及びハーフミラー7の底辺から観察孔311に至るまでの底部光路壁内面A4に電解研磨等を施して非常に面精度のよい鏡面としている。   Specifically, the top optical path wall inner surface A2 from the top of the other surface 10b to the top of the half mirror 7, the bottom optical path wall inner surface A1 from the bottom of the other surface 10b to the observation hole 311, the other Opposing side optical path wall inner surface A3 (not shown) from each side of the surface 10b to each side of the half mirror 7 and bottom optical path wall inner surface from the bottom of the half mirror 7 to the observation hole 311 A4 is subjected to electrolytic polishing or the like to obtain a mirror surface with very good surface accuracy.

なお、光路壁内面A1、A2、A3、A4の全てが鏡面でなくともよく、そのいずれか1つ以上が鏡面であってもよい。   All of the optical path wall inner surfaces A1, A2, A3, and A4 may not be mirror surfaces, and any one or more of them may be mirror surfaces.

本実施形態においては、図6に示すように、ワークWからの反射光のうち、透明板7の底面7bを通過して接合面71で反射し底面7bの内面に向かった光は、当該内面で反射して第2光源部8に向かうので、ワークWの周縁部のうち第2光源部8の下方から観察孔311を介して接合面71を見ると、全視野において第2光源部8が映っているのが見える。このため、ワークWから観察孔311を見たときの光源部のない領域を減少させることができる。   In the present embodiment, as shown in FIG. 6, among the reflected light from the workpiece W, the light that passes through the bottom surface 7 b of the transparent plate 7, is reflected by the bonding surface 71, and travels toward the inner surface of the bottom surface 7 b. The second light source unit 8 is reflected in the second light source unit 8 and viewed from the lower side of the second light source unit 8 through the observation hole 311 in the peripheral portion of the work W. I can see it. For this reason, when the observation hole 311 is viewed from the workpiece W, it is possible to reduce the area without the light source unit.

更に、図7に示すように、観察孔311が、透明板31における反ワーク対向面31bに向けて拡開する切頭円錐形状や、切頭角錐形状であってもよい。第1光源部5から発して透明板31内を進行する光は、観察孔311の側周面の内面で全反射するため、観察孔311の側周面は暗く見え、これもワークW表面に明るさのムラができる原因となるが、観察孔311の側周面が上方を向くテーパ面であれば、従来側周面が位置していた方向からも第2光源部8から発した光が照射され、上述の明るさのムラを低減することができる。また、図1に示す実施形態において、観察孔311の側周面にアルミ蒸着等による鏡面処理が施されていても、観察孔311を通る光が全反射されるので、同様な効果が期待できる。更に、図示しないが、観察孔311から第2光源部8に到る光路内面の少なくとも一部又は全体が、光の進行方向に向けて先細な切頭円錐形状又は切頭角錐形状であってもよい。   Furthermore, as shown in FIG. 7, the observation hole 311 may have a truncated cone shape or a truncated pyramid shape that expands toward the anti-work facing surface 31 b in the transparent plate 31. The light emitted from the first light source unit 5 and traveling through the transparent plate 31 is totally reflected by the inner surface of the side peripheral surface of the observation hole 311, so that the side peripheral surface of the observation hole 311 looks dark and this also appears on the surface of the workpiece W. If the side peripheral surface of the observation hole 311 is a taper surface facing upward, the light emitted from the second light source unit 8 from the direction in which the conventional side peripheral surface is located can be a cause of uneven brightness. Irradiation can reduce the above-described unevenness in brightness. Further, in the embodiment shown in FIG. 1, even if the side peripheral surface of the observation hole 311 is subjected to a mirror treatment such as aluminum vapor deposition, the light passing through the observation hole 311 is totally reflected, so that the same effect can be expected. . Furthermore, although not shown, even if at least a part or the entire inner surface of the optical path from the observation hole 311 to the second light source unit 8 has a truncated cone shape or truncated pyramid shape that tapers in the light traveling direction. Good.

また、第1光照射部2は、図8に示すように、ドーム型照明であってもよく、図9に示すように、リング型照明であってもよい。   Moreover, the 1st light irradiation part 2 may be dome shape illumination as shown in FIG. 8, and may be ring type illumination as shown in FIG.

また、キューブ型ビームスプリッター7の表面からの光の漏出をより確実に防止するためには、その表面にアルミ蒸着等による鏡面処理が施されていてもよい。   Further, in order to prevent light leakage from the surface of the cube-type beam splitter 7 more reliably, the surface may be subjected to a mirror treatment by aluminum vapor deposition or the like.

その他、本発明は上記の各実施形態に限られず、本発明の趣旨を逸脱しない限り、前述した種々の構成の一部又は全部を適宜組み合わせて構成してもよい。   In addition, the present invention is not limited to the above-described embodiments, and may be configured by appropriately combining some or all of the various configurations described above without departing from the spirit of the present invention.

1・・・光照射装置
311・・・観察孔
5・・・第1光源部
7・・・キューブ型ビームスプリッター、透明板(透明部材)
71・・・接合面(ハーフミラー部)
7b・・・底面(ワーク側の面)
8・・・第2光源部
DESCRIPTION OF SYMBOLS 1 ... Light irradiation apparatus 311 ... Observation hole 5 ... 1st light source part 7 ... Cube-type beam splitter, transparent plate (transparent member)
71 ... Joint surface (half mirror part)
7b ... Bottom (surface on the workpiece side)
8 ... 2nd light source part

Claims (4)

光の照射対象である製品等のワークと外部観察点との間であってそれらを結ぶ観察軸線上に設けられた観察孔と、
前記観察孔の周囲に設けられ前記ワークに光を照射する第1光源部と、
前記外部観察点側であって前記観察孔に臨む位置に、前記観察軸線に対して斜めに設けられたハーフミラー部と、
射出された光が前記ハーフミラー部で反射し、前記観察孔を通って前記ワークに照射される位置に設けた第2光源部と、
前記観察孔を覆う透明部材と、を備え、
前記透明部材における前記ワーク側の内面が、前記ワークからの反射光のうち、前記透明部材を透過して前記ハーフミラー部で反射し前記内面に向かった光を、前記第2光源部に向けて反射する光反射面であることを特徴とする光照射装置。
An observation hole provided on an observation axis between a workpiece such as a product to be irradiated with light and an external observation point and connecting them;
A first light source provided around the observation hole and irradiating the work with light;
A half mirror provided obliquely with respect to the observation axis at a position facing the observation hole on the external observation point side;
A second light source unit provided at a position where the emitted light is reflected by the half mirror unit and irradiated to the workpiece through the observation hole;
A transparent member covering the observation hole,
The inner surface on the workpiece side of the transparent member transmits light that has passed through the transparent member, reflected by the half mirror portion, and directed toward the inner surface from the reflected light from the workpiece toward the second light source portion. A light irradiation device, which is a light reflecting surface for reflection.
前記第2光源部から前記ハーフミラー部までの光路及び前記ハーフミラー部から前記観察孔までの光路を覆う光路内面を備え、
前記光路内面の少なくとも一部が光反射面である請求項1記載の光照射装置。
An optical path inner surface covering an optical path from the second light source part to the half mirror part and an optical path from the half mirror part to the observation hole;
The light irradiation apparatus according to claim 1, wherein at least a part of the inner surface of the optical path is a light reflecting surface.
前記透明部材が、前記ハーフミラー部が内包された直方体状の中実透明体である請求項1又は2記載の光照射装置。   The light irradiation apparatus according to claim 1, wherein the transparent member is a rectangular solid solid transparent body including the half mirror portion. 前記中実透明体における前記ワーク側の内面を除く内面の少なくとも一部が、前記光路内面である請求項3記載の光照射装置。   The light irradiation apparatus according to claim 3, wherein at least a part of an inner surface of the solid transparent body excluding an inner surface on the workpiece side is the inner surface of the optical path.
JP2009113490A 2009-05-08 2009-05-08 Light irradiation device Active JP5097912B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009113490A JP5097912B2 (en) 2009-05-08 2009-05-08 Light irradiation device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009113490A JP5097912B2 (en) 2009-05-08 2009-05-08 Light irradiation device

Publications (2)

Publication Number Publication Date
JP2010261839A true JP2010261839A (en) 2010-11-18
JP5097912B2 JP5097912B2 (en) 2012-12-12

Family

ID=43360033

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009113490A Active JP5097912B2 (en) 2009-05-08 2009-05-08 Light irradiation device

Country Status (1)

Country Link
JP (1) JP5097912B2 (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012225690A (en) * 2011-04-15 2012-11-15 Ccs Inc Light irradiation device
US9494422B2 (en) 2011-12-06 2016-11-15 Ccs Inc. Lighting device for inspection and lighting method for inspection
KR20160148641A (en) 2015-03-23 2016-12-26 머신 비전 라이팅 가부시키가이샤 Illuminating device for inspection, and inspection system
US9638641B2 (en) 2012-12-03 2017-05-02 Ccs Inc. Inspection system and inspection illumination device
JP2018017555A (en) * 2016-07-26 2018-02-01 シーシーエス株式会社 Lighting system
JP2018017564A (en) * 2016-07-27 2018-02-01 シーシーエス株式会社 Illumination device
JP2019060703A (en) * 2017-09-26 2019-04-18 シーシーエス株式会社 Light irradiation device
CN110501343A (en) * 2019-08-23 2019-11-26 大族激光科技产业集团股份有限公司 Light supply apparatus, detection method of surface flaw and device
JP7071794B2 (en) 2016-04-01 2022-05-19 シーシーエス株式会社 Coaxial lighting equipment

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11248417A (en) * 1998-03-06 1999-09-17 Nikon Corp Observing device
JP2005091049A (en) * 2003-09-12 2005-04-07 Ccs Inc Light irradiator for image processing and light irradiation method for image processing
JP2007234342A (en) * 2006-02-28 2007-09-13 Ccs Inc Light irradiation apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11248417A (en) * 1998-03-06 1999-09-17 Nikon Corp Observing device
JP2005091049A (en) * 2003-09-12 2005-04-07 Ccs Inc Light irradiator for image processing and light irradiation method for image processing
JP2007234342A (en) * 2006-02-28 2007-09-13 Ccs Inc Light irradiation apparatus

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012225690A (en) * 2011-04-15 2012-11-15 Ccs Inc Light irradiation device
US9494422B2 (en) 2011-12-06 2016-11-15 Ccs Inc. Lighting device for inspection and lighting method for inspection
US9638641B2 (en) 2012-12-03 2017-05-02 Ccs Inc. Inspection system and inspection illumination device
KR20160148641A (en) 2015-03-23 2016-12-26 머신 비전 라이팅 가부시키가이샤 Illuminating device for inspection, and inspection system
US9891176B2 (en) 2015-03-23 2018-02-13 Machine Vision Lighting Inc. Lighting device for inspection and inspection system
JP7071794B2 (en) 2016-04-01 2022-05-19 シーシーエス株式会社 Coaxial lighting equipment
JP2018017555A (en) * 2016-07-26 2018-02-01 シーシーエス株式会社 Lighting system
JP2018017564A (en) * 2016-07-27 2018-02-01 シーシーエス株式会社 Illumination device
JP2019060703A (en) * 2017-09-26 2019-04-18 シーシーエス株式会社 Light irradiation device
JP7015132B2 (en) 2017-09-26 2022-02-02 シーシーエス株式会社 Light irradiation device
CN110501343A (en) * 2019-08-23 2019-11-26 大族激光科技产业集团股份有限公司 Light supply apparatus, detection method of surface flaw and device
CN110501343B (en) * 2019-08-23 2022-04-29 大族激光科技产业集团股份有限公司 Light source device, surface defect detection method and device

Also Published As

Publication number Publication date
JP5097912B2 (en) 2012-12-12

Similar Documents

Publication Publication Date Title
JP5097912B2 (en) Light irradiation device
JP6042402B2 (en) Illumination module and visual inspection system using the same
US6783257B2 (en) Lighting apparatus for inspection of an object
US8363214B2 (en) Surface inspection apparatus
JP5615604B2 (en) Chip LED inspection device
TWI442016B (en) A light source for illumination and a pattern inspection device using it
WO2011052018A1 (en) Illumination optical system of image capturing device
JPWO2007023894A1 (en) Light irradiation apparatus and optical member
JP2007171149A (en) Surface defect inspection device
KR101120226B1 (en) Surface inspecting apparatus
JP2013532838A (en) Lighting system
US20070024846A1 (en) Device for Dark Field Illumination and Method for Optically Scanning of Object
JP4579171B2 (en) Light irradiation device
US8110804B2 (en) Through substrate optical imaging device and method
KR101001113B1 (en) Apparatus for Detecting Wafer Crack and Method for Detecting Wafer Defect
JP2004319466A (en) Light radiation device
JP5556733B2 (en) Light irradiation device
KR101124567B1 (en) Wafer inspecting apparatus having hybrid illumination
JP2017102078A (en) Visual inspection device and visual inspection method
JP2011106912A (en) Imaging illumination means and pattern inspection device
KR20110125906A (en) Reticle inspection method and the apparatus
JP7248244B2 (en) Lens barrel with built-in annular light source
JP2015102364A (en) Visual inspection device
CN114264658B (en) LED chip detection device and equipment
JP2001249083A (en) Lighting installation for visual examination device and visual examination device

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20110331

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20120521

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120605

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120710

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120807

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120809

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20151005

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Ref document number: 5097912

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250