JP2010251144A5 - - Google Patents

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Publication number
JP2010251144A5
JP2010251144A5 JP2009099803A JP2009099803A JP2010251144A5 JP 2010251144 A5 JP2010251144 A5 JP 2010251144A5 JP 2009099803 A JP2009099803 A JP 2009099803A JP 2009099803 A JP2009099803 A JP 2009099803A JP 2010251144 A5 JP2010251144 A5 JP 2010251144A5
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JP
Japan
Prior art keywords
region
substrate
film formation
deposition
film
Prior art date
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Application number
JP2009099803A
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English (en)
Japanese (ja)
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JP2010251144A (ja
JP5111427B2 (ja
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Priority to JP2009099803A priority Critical patent/JP5111427B2/ja
Priority claimed from JP2009099803A external-priority patent/JP5111427B2/ja
Publication of JP2010251144A publication Critical patent/JP2010251144A/ja
Publication of JP2010251144A5 publication Critical patent/JP2010251144A5/ja
Application granted granted Critical
Publication of JP5111427B2 publication Critical patent/JP5111427B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2009099803A 2009-04-16 2009-04-16 成膜用基板および成膜方法 Expired - Fee Related JP5111427B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009099803A JP5111427B2 (ja) 2009-04-16 2009-04-16 成膜用基板および成膜方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009099803A JP5111427B2 (ja) 2009-04-16 2009-04-16 成膜用基板および成膜方法

Publications (3)

Publication Number Publication Date
JP2010251144A JP2010251144A (ja) 2010-11-04
JP2010251144A5 true JP2010251144A5 (cg-RX-API-DMAC7.html) 2012-04-19
JP5111427B2 JP5111427B2 (ja) 2013-01-09

Family

ID=43313254

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009099803A Expired - Fee Related JP5111427B2 (ja) 2009-04-16 2009-04-16 成膜用基板および成膜方法

Country Status (1)

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JP (1) JP5111427B2 (cg-RX-API-DMAC7.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5323784B2 (ja) * 2009-09-15 2013-10-23 フオン・アルデンネ・アンラーゲンテヒニク・ゲゼルシヤフト・ミト・ベシユレンクテル・ハフツング 微細構造を製造するための方法及び装置
US20130306951A1 (en) * 2011-03-22 2013-11-21 Ocean's King Lighting Science & Technology Co Ltd. Organic electroluminescent device and conductive substrate thereof
JP5913974B2 (ja) * 2011-12-28 2016-05-11 株式会社アルバック 有機ｅｌデバイスの製造装置、及び有機ｅｌデバイスの製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5278576A (en) * 1990-10-31 1994-01-11 Eastman Kodak Company Intermediate receiver opaque support
US5851709A (en) * 1997-10-31 1998-12-22 Eastman Kodak Company Method for selective transfer of a color organic layer
JP4138282B2 (ja) * 2001-09-14 2008-08-27 シャープ株式会社 有機エレクトロルミネッセンス素子の製造方法
JP4071970B2 (ja) * 2002-01-25 2008-04-02 富士フイルム株式会社 パターン部材の製造方法
JP2006309995A (ja) * 2005-04-27 2006-11-09 Sony Corp 転写用基板および表示装置の製造方法ならびに表示装置
JP5013048B2 (ja) * 2006-04-06 2012-08-29 ソニー株式会社 赤色有機発光素子およびこれを備えた表示装置
JP4797889B2 (ja) * 2006-09-01 2011-10-19 ソニー株式会社 転写方法

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