JP2010248435A5 - - Google Patents

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Publication number
JP2010248435A5
JP2010248435A5 JP2009101850A JP2009101850A JP2010248435A5 JP 2010248435 A5 JP2010248435 A5 JP 2010248435A5 JP 2009101850 A JP2009101850 A JP 2009101850A JP 2009101850 A JP2009101850 A JP 2009101850A JP 2010248435 A5 JP2010248435 A5 JP 2010248435A5
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JP
Japan
Prior art keywords
producing
novolak resin
hydroxynaphthalene
mass
parts
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Application number
JP2009101850A
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English (en)
Japanese (ja)
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JP5549107B2 (ja
JP2010248435A (ja
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Priority to JP2009101850A priority Critical patent/JP5549107B2/ja
Priority claimed from JP2009101850A external-priority patent/JP5549107B2/ja
Publication of JP2010248435A publication Critical patent/JP2010248435A/ja
Publication of JP2010248435A5 publication Critical patent/JP2010248435A5/ja
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Publication of JP5549107B2 publication Critical patent/JP5549107B2/ja
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JP2009101850A 2009-04-20 2009-04-20 ノボラック樹脂の製造方法 Active JP5549107B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009101850A JP5549107B2 (ja) 2009-04-20 2009-04-20 ノボラック樹脂の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009101850A JP5549107B2 (ja) 2009-04-20 2009-04-20 ノボラック樹脂の製造方法

Publications (3)

Publication Number Publication Date
JP2010248435A JP2010248435A (ja) 2010-11-04
JP2010248435A5 true JP2010248435A5 (https=) 2012-05-24
JP5549107B2 JP5549107B2 (ja) 2014-07-16

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ID=43311127

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JP2009101850A Active JP5549107B2 (ja) 2009-04-20 2009-04-20 ノボラック樹脂の製造方法

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JP (1) JP5549107B2 (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9828457B2 (en) 2013-07-19 2017-11-28 Dic Corporation Compound containing phenolic hydroxy group, photosensitive composition, composition for resists, resist coating film, curable composition, composition for resist underlayer films, and resist underlayer film
KR102210073B1 (ko) * 2013-09-18 2021-02-01 디아이씨 가부시끼가이샤 변성 히드록시나프탈렌노볼락 수지, 변성 히드록시나프탈렌노볼락 수지의 제조 방법, 감광성 조성물, 레지스트 재료 및 도막
CN106133018B (zh) 2013-10-17 2020-07-14 Si集团有限公司 原位烷基苯酚-醛树脂
US9932436B2 (en) 2013-10-17 2018-04-03 Si Group, Inc. Modified alkylphenol-aldehyde resins stabilized by a salicylic acid
US9975830B2 (en) 2014-05-15 2018-05-22 Dic Corporation Compound containing modified phenolic hydroxy group, method for producing compound containing modified phenolic hydroxy group, photosensitive composition, resist material, and resist coating film
CN106462063A (zh) * 2014-06-12 2017-02-22 Dic株式会社 永久膜用感光性组合物、抗蚀材料及涂膜
TWI675051B (zh) 2014-10-10 2019-10-21 日商迪愛生股份有限公司 萘酚型杯芳烴化合物及其製造方法、感光性組成物、光阻材料、及塗膜
CN107108418B (zh) * 2015-01-16 2021-04-27 Dic株式会社 含酚性羟基化合物、包含其的组合物及其固化膜
TWI772327B (zh) 2016-10-05 2022-08-01 日商迪愛生股份有限公司 含酚性羥基之樹脂及抗蝕劑材料

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0597972A (ja) * 1991-10-09 1993-04-20 Yuka Shell Epoxy Kk エポキシ樹脂組成物
JP2001042525A (ja) * 1999-07-30 2001-02-16 Dainippon Ink & Chem Inc アルカリ現像型感光性樹脂組成物
JP3929307B2 (ja) * 2001-12-28 2007-06-13 株式会社ルネサステクノロジ 水性アルカリ可溶性樹脂および感光性樹脂組成物
JP2005095933A (ja) * 2003-09-25 2005-04-14 Sumitomo Bakelite Co Ltd シェルモールド用ノボラック型フェノール樹脂
JP2007031527A (ja) * 2005-07-26 2007-02-08 Asahi Organic Chem Ind Co Ltd ナフトール樹脂及びその製造方法

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