JP2010209443A - Vapor-deposition apparatus and vapor-deposition method - Google Patents
Vapor-deposition apparatus and vapor-deposition method Download PDFInfo
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本発明は、蒸着室内でホルダーにより保持された試料を回転させながら、試料表面の全面に蒸着源からの蒸気による蒸着膜を形成する蒸着装置と、この蒸着装置を用いた蒸着方法に関する。 The present invention relates to a vapor deposition apparatus that forms a vapor deposition film by vapor from a vapor deposition source on the entire surface of a sample while rotating a sample held by a holder in the vapor deposition chamber, and a vapor deposition method using the vapor deposition apparatus.
従来、微小なボールベアリングや円柱状ベアリング（ローラベアリング）に対して、摩擦係数の低減や摩耗量の抑制などを図るために、各種の表面コーティングを蒸着により施している。そのための装置として、下記特許文献１−５に記載されたものが知られている。 Conventionally, various surface coatings have been applied to minute ball bearings and cylindrical bearings (roller bearings) by vapor deposition in order to reduce the friction coefficient and reduce the amount of wear. As an apparatus for that purpose, those described in Patent Documents 1 to 5 below are known.
特許文献１−５に記載された蒸着装置は、いずれも台上またはそれに類する試料支え部材に球状または円柱状の試料を載置し、試料を回転させながら蒸着するものである。 In any of the vapor deposition apparatuses described in Patent Documents 1-5, a spherical or columnar sample is placed on a table or similar sample support member, and vapor deposition is performed while rotating the sample.
それ故に、台に遮られる箇所があり、蒸着源の位置が制限されるため、試料の下方からの蒸着は困難とされている。一方、特許文献３に記載された蒸着装置は、そのような問題の解決を覗わせるが、球状の試料が台に設けられた貫通孔に嵌り込むことによるものであるが故に、下方の蒸着源からの蒸気は試料に集中せざるを得ない。その結果、試料静止時に行われた膜形成部分と非膜形成部分との間に段差が生じるという新たな問題が発生するおそれがある。 Therefore, there are places where the stage is blocked, and the position of the vapor deposition source is limited, so that vapor deposition from below the sample is difficult. On the other hand, although the vapor deposition apparatus described in Patent Document 3 looks into the solution of such a problem, since the spherical sample is fitted into the through hole provided in the table, the lower vapor deposition is performed. The vapor from the source must be concentrated on the sample. As a result, there is a possibility that a new problem that a step is generated between the film forming portion and the non-film forming portion performed when the sample is stationary may occur.
本発明は、以上の実情に鑑み、蒸着源からの蒸気を遮ることなく、試料のほぼ外周全域にわたって存在させながら、試料の外周表面の全面に蒸着膜を形成することができる蒸着装置を提供し、また、この蒸着装置を用いた蒸着方法を提供することを課題としている。 In view of the above circumstances, the present invention provides a vapor deposition apparatus capable of forming a vapor deposition film on the entire outer peripheral surface of a sample while blocking the vapor from the vapor deposition source over almost the entire outer periphery of the sample. Another object of the present invention is to provide a vapor deposition method using this vapor deposition apparatus.
本発明は、上記の課題を解決するために、以下の特徴を有している。 The present invention has the following features in order to solve the above problems.
第１の発明は、蒸着室内に試料を保持するホルダーが設けられ、前記ホルダーにより試料を保持して回転させながら試料の外周面全面に、蒸着源からの蒸気による蒸着膜を形成させる蒸着装置であって、前記ホルダーが、その中心軸を水平方向に向けたコイルバネ状の形状を有し、前記試料を前記ホルダーの内側に保持した状態においてホルダーをその中心軸の周りに回転させる回転手段を備えていることを特徴としている。 A first invention is a vapor deposition apparatus in which a holder for holding a sample is provided in a vapor deposition chamber, and a vapor deposition film is formed by vapor from a vapor deposition source on the entire outer peripheral surface of the sample while the sample is held and rotated by the holder. The holder has a coil spring-like shape with its central axis oriented horizontally, and includes rotating means for rotating the holder around its central axis in a state where the sample is held inside the holder. It is characterized by having.
第２の発明は、上記第１の発明の特徴を有する蒸着装置を用いた蒸着方法であって、前記試料は、球状または円柱状の形状を有し、前記回転手段によって前記ホルダーをその中心軸周りに回転させることにより、前記試料をホルダーに対して回転させ、以って前記蒸着源に対する前記試料の向きと姿勢を変更し、向きと姿勢を変更させながら前記試料の外周表面全面に前記蒸着源からの蒸気による蒸着膜を形成させることを特徴としている。 A second invention is a vapor deposition method using the vapor deposition apparatus having the characteristics of the first invention, wherein the sample has a spherical or cylindrical shape, and the rotating means moves the holder to its central axis. The sample is rotated with respect to the holder, thereby changing the orientation and orientation of the sample with respect to the deposition source, and changing the orientation and orientation on the entire outer peripheral surface of the sample. It is characterized by forming a deposited film by vapor from a source.
本発明によれば、蒸着源からの蒸気を遮る台状の部材を一切用いることなく、蒸着室内に試料を宙づり状に保持することができる。それ故に、蒸気は、コイルバネ状のホルダーと接触している僅かな箇所以外の試料のほぼ外周全域に存在することとなり、また、ホルダーを回転させることによって、試料は螺旋状に転動し、ホルダーとの接触箇所を確実にずらすことができる。したがって、段差のない、試料の外周表面の全面にわたって均一な蒸着膜を容易に蒸着することができる。 According to the present invention, the sample can be held in a suspended state in the vapor deposition chamber without using any table-like member that blocks the vapor from the vapor deposition source. Therefore, the vapor exists in almost the entire outer periphery of the sample except for a few points that are in contact with the coil spring-shaped holder, and by rotating the holder, the sample rolls spirally, The position of contact with the can be reliably shifted. Accordingly, it is possible to easily deposit a uniform deposited film over the entire outer peripheral surface of the sample without a step.
また、蒸着源と試料との位置関係にも制約を受けないので、試料の下方に蒸着源を配置した場合と側方または上方に位置させた場合とで、蒸着膜の均一性が著しく異なるようなことはなく、蒸着の目的や蒸着物質、あるいは蒸着条件に合わせた適切な配置を選択することができる。 In addition, since the positional relationship between the vapor deposition source and the sample is not limited, the uniformity of the vapor deposition film may be significantly different between the case where the vapor deposition source is arranged below the sample and the case where the vapor deposition source is located on the side or above. However, it is possible to select an appropriate arrangement according to the purpose of vapor deposition, the vapor deposition material, or the vapor deposition conditions.
そして、上記効果によって、球状または円柱状の試料表面に蒸着コーティングを行うことにより、段差のない均一な厚さの蒸着膜が容易に得られる。 And by the said effect, the vapor deposition film of the uniform thickness without a level | step difference is easily obtained by performing vapor deposition coating on the spherical or cylindrical sample surface.
本発明の蒸着装置は、図１−８に示したように、ホルダー２をコイルバネ状の形状とする点に主な特徴を有するものである。ホルダー２を形成する線材の断面は、円形に限らず、四角形、六角形などの角形断面とすることができ、いずれの断面形状でも同様な効果が奏される。 As shown in FIGS. 1-8, the vapor deposition apparatus of the present invention is mainly characterized in that the holder 2 has a coil spring shape. The cross-section of the wire forming the holder 2 is not limited to a circle, but may be a square cross-section such as a quadrangle or a hexagon, and the same effect can be achieved with any cross-sectional shape.
ここで、ホルダー２の形状であるコイルバネ状とは、形態の類似性から称したものであり、必ずしも弾性などのバネ機能を有することを前提としてはいない。したがって、線材の材質は、バネ鋼に限られず、ターゲットの蒸着条件において変形や蒸発などが生じないものであれば、他の金属、たとえば電熱線材や合成樹脂などにより構成することもできる。電熱線材からホルダー２を形成する場合は、試料の加熱洗浄などを合わせて行うことができる。 Here, the coil spring shape which is the shape of the holder 2 is referred to from the similarity of the form, and does not necessarily have a spring function such as elasticity. Therefore, the material of the wire is not limited to spring steel, and may be made of another metal, such as a heating wire or a synthetic resin, as long as deformation or evaporation does not occur under the target vapor deposition conditions. When the holder 2 is formed from a heating wire, heating and washing of the sample can be performed together.
このようなホルダー２を回転させる方式は、手動をはじめとし、ステップモータなどを付設して電動により回転駆動させることができる。 Such a method for rotating the holder 2 can be manually driven, and can be rotationally driven electrically by attaching a step motor or the like.
図１−８において試料１は円柱状ものを例示したが、試料１の形状は円柱状に限られず、平板状、棒状、角棒状、キュービック状などの各種形状のものとすることができる。いずれの場合にも、本発明の蒸着装置は、試料１の全周に蒸着することができる。 In FIG. 1-8, the sample 1 is exemplified as a cylindrical shape, but the shape of the sample 1 is not limited to a cylindrical shape, and may be various shapes such as a flat plate shape, a rod shape, a square bar shape, and a cubic shape. In any case, the vapor deposition apparatus of the present invention can vapor deposit all around the sample 1.
なお、ホルダー２におけるコイルバネ状のピッチ方向の間隙Ｐおよび内径Ｄと、試料１の直径または内接円の直径ｄおよび長さｐとの関係は、試料１が、ホルダー２の回転につれてホルダー２に対して回転することのできる大きさであり、かつ、ホルダー２の上記ピッチ方向の間隔Ｐから脱落しないような関係が好ましい。 The relationship between the pitch P and the inner diameter D of the coil spring shape in the holder 2 and the diameter d or length p of the sample 1 or the inscribed circle is such that the sample 1 moves to the holder 2 as the holder 2 rotates. It is preferable that the size of the holder 2 is such that the holder 2 can be rotated and the holder 2 does not fall off from the pitch P in the pitch direction.
以下、本発明の蒸着装置と蒸着方法の実施例について詳述する。 Hereinafter, the Example of the vapor deposition apparatus and vapor deposition method of this invention is explained in full detail.
図１に示したホルダー２では、コイルバネ状の形状において、巻線間の開口長を部分的に変えたものであり、長さ１１ｃｍ、外径６ｍｍ、内径４．２ｍｍ、線径０．９ｍｍとしている。ホルダー２内に試料１を３個挿入し、図６に示した回転導入機７のホルダー取り付けネジ３を用いてホルダー取付けロッド４に接続した。回転導入機７を回転させ、回転導入繋ぎ手５を介してホルダー２を回転させた。そのときの試料１の動きを調べた。なお、試料１には、円柱状（外径３ｍｍ、長さ３．６ｍｍ）のベアリングを用いた。 In the holder 2 shown in FIG. 1, the opening length between the windings is partially changed in the coil spring shape, and the length is 11 cm, the outer diameter is 6 mm, the inner diameter is 4.2 mm, and the wire diameter is 0.9 mm. Yes. Three samples 1 were inserted into the holder 2 and connected to the holder mounting rod 4 using the holder mounting screw 3 of the rotation introducing machine 7 shown in FIG. The rotation introducing machine 7 was rotated, and the holder 2 was rotated via the rotation introducing joint 5. The movement of Sample 1 at that time was examined. The sample 1 was a cylindrical bearing (outer diameter 3 mm, length 3.6 mm).
回転導入機７は、フランジ６によって高周波マグネトロンスパッタ装置の内部と外部とを遮断することができるとともに、外部からの回転力は、回転軸繋ぎ５から回転軸４およびネジ３を介してホルダー２に伝達され、試料１を転動させることができる。 The rotation introducing machine 7 can shut off the inside and the outside of the high-frequency magnetron sputtering apparatus by the flange 6, and the rotational force from the outside is applied to the holder 2 from the rotating shaft joint 5 through the rotating shaft 4 and the screw 3. The sample 1 can be rolled by being transmitted.
図１に示したホルダー２の場合、時計回りに回転させると、巻線間の開口長が１．４ｍｍ以下のときは、試料１は重力に対して水平方向に整列し、時計回りに自転しながら前進する。ホルダー２を反時計回りに回転すると、試料１は、反時計回りに自転しながら、後退する。一方、巻線の間開口長を２ｍｍ以上３ｍｍ以下にすると、試料１は、巻線間に約４５°の傾きで保持されるとともに、試料１が１個ずつ整列して配置した。また、巻線間の開口長が３ｍｍ以上のときは、開口から試料１が落下してしまった。また、巻線の内径が７ｍｍ以上のときには、試料１が横向きとなり、自転することができなくなった。 In the case of the holder 2 shown in FIG. 1, when rotating clockwise, when the opening length between the windings is 1.4 mm or less, the sample 1 is aligned horizontally with respect to gravity and rotates clockwise. While moving forward. When the holder 2 is rotated counterclockwise, the sample 1 moves backward while rotating counterclockwise. On the other hand, when the opening length between the windings was 2 mm or more and 3 mm or less, the sample 1 was held at an inclination of about 45 ° between the windings, and the samples 1 were arranged one by one. When the opening length between the windings was 3 mm or more, the sample 1 dropped from the opening. In addition, when the inner diameter of the winding was 7 mm or more, the sample 1 turned sideways and could not rotate.
そして、ホルダー２中に試料１を出し入れする際には、ホルダー２の先端部を引っ張ることによって、巻線間の開口を伸長させたり、湾曲させたりすることができ、試料１の出し入れは容易であった。 When the sample 1 is taken in and out of the holder 2, the opening between the windings can be extended or curved by pulling the tip of the holder 2, and the sample 1 can be taken in and out easily. there were.
なお、図２に示したメッシュ状のホルダー２や図３に示したネット状のホルダー２についても、試料１が落下しない最大の開口を形成し、コイルバネ状に構成することによって、同様の効果を奏する。 Note that the mesh-shaped holder 2 shown in FIG. 2 and the net-like holder 2 shown in FIG. 3 also have the same effect by forming the maximum opening from which the sample 1 does not drop and configuring it in a coil spring shape. Play.
図４には、ホルダー２の巻線の開口長を容易に変えることのできる治具を示した。 FIG. 4 shows a jig that can easily change the opening length of the winding of the holder 2.
治具は、図４に示したように、寸法の異なる各種の試料に対して、一つのホルダーによって最適な巻線の開口長を簡便に調整するために、巻線両端に設けた巻線押さえ板の間隔をボルト・ナット構造を下部に備え、このボルト・ナット構造によって調整することができる。 As shown in FIG. 4, the jig is a winding presser provided at both ends of the winding to easily adjust the optimum winding opening length with a single holder for various types of samples. The distance between the plates can be adjusted by a bolt / nut structure provided at the bottom.
スパッタ源（ターゲット）が下方に位置する高周波マグネトロンスパッタ装置を用い、図５に示した、外径６ｍｍ、内径４．２ｍｍ、線径０．９ｍｍ、開口長２．８ｍｍ、長さ８ｃｍのコイルバネ状のホルダー２を作製し、図６に示したホルダー取付けネジ３によりホルダー２を回転導入機７に取り付けた。 Using a high-frequency magnetron sputtering apparatus in which the sputtering source (target) is positioned below, a coil spring shape having an outer diameter of 6 mm, an inner diameter of 4.2 mm, a wire diameter of 0.9 mm, an opening length of 2.8 mm, and a length of 8 cm shown in FIG. The holder 2 was prepared, and the holder 2 was attached to the rotation introducing machine 7 with the holder attaching screw 3 shown in FIG.
そして、回転導入機７を上記高周波マグネトロンスパッタ装置の側面に回転導入機チャンバー取付けフランジ６によって取り付け、図７に示したように、試料１とターゲットとの間を距離３０ｍｍ、ＭｏＳ２材をターゲットとして、出力１００Ｗ、プレスパッタ時間５分、スパッタ時間２０分の条件でスパッタ被覆処理すると同時に、回転導入機７を時計回りに１ｒｐｍの速度で５回転、反時計回りに１０回転、再度時計回りに５回転させ、試料１である円柱状のベアリングの表面にコーティングを行った。 Then, the rotary introducer 7 is attached to the side surface of the high-frequency magnetron sputtering apparatus by the rotary introducer chamber mounting flange 6. As shown in FIG. 7, the distance between the sample 1 and the target is 30 mm and the MoS 2 material is the target. At the same time, the sputter coating process was performed under the conditions of an output of 100 W, a pre-sputtering time of 5 minutes, and a sputtering time of 20 minutes. The surface of the cylindrical bearing which is Sample 1 was rotated and coated.
図８に示したように、試料１の外周表面および端面の全面に良好なコーティング膜が形成されていた。 As shown in FIG. 8, a good coating film was formed on the entire outer peripheral surface and end face of Sample 1.
１ 試料
２ ホルダー
７ 回転導入機
１０ 蒸着室
1 Sample 2 Holder 7 Rotating Introducer 10 Deposition Chamber
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017126150A1 (en) * | 2016-01-19 | 2017-07-27 | 国立研究開発法人物質・材料研究機構 | ROLLING BODY ZnO-COATING METHOD, ROLLING BODY WITH ZnO-COATING, AND BEARING INCORPORATING SAME |
| CN108359956A (en) * | 2018-05-21 | 2018-08-03 | 哈尔滨理工大学 | A kind of sample rotating device and its film plating process that vacuum coating equipment uses |
| CN109306463A (en) * | 2018-12-19 | 2019-02-05 | 浙江工业大学 | A kind of self-action pole sample plated film clamping device suitable for magnetic control sputtering device |
| CN111041445A (en) * | 2019-12-26 | 2020-04-21 | 北京大学深圳研究院 | Multidirectional rotating device for physical vapor deposition of coatings on surfaces of threaded parts |
| JP7123433B1 (en) * | 2021-02-26 | 2022-08-23 | 豊実精工株式会社 | FILM FORMING DEVICE AND ROLLING ELEMENT MANUFACTURING METHOD |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5881971A (en) * | 1981-11-11 | 1983-05-17 | Matsushita Electric Ind Co Ltd | Apparatus for depositing film |
| JPS61246360A (en) * | 1985-04-22 | 1986-11-01 | Matsushita Electric Ind Co Ltd | Vacuum deposition device |
| JPH06240444A (en) * | 1993-02-15 | 1994-08-30 | Kobe Steel Ltd | Barrel type arc ion plating device |
| JPH06248437A (en) * | 1993-02-26 | 1994-09-06 | Ntn Corp | Formation of solid lubricating film and its device |
-
2009
- 2009-03-12 JP JP2009059154A patent/JP5401130B2/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5881971A (en) * | 1981-11-11 | 1983-05-17 | Matsushita Electric Ind Co Ltd | Apparatus for depositing film |
| JPS61246360A (en) * | 1985-04-22 | 1986-11-01 | Matsushita Electric Ind Co Ltd | Vacuum deposition device |
| JPH06240444A (en) * | 1993-02-15 | 1994-08-30 | Kobe Steel Ltd | Barrel type arc ion plating device |
| JPH06248437A (en) * | 1993-02-26 | 1994-09-06 | Ntn Corp | Formation of solid lubricating film and its device |
Non-Patent Citations (1)
| Title |
|---|
| JPN6013018767; （財）日本規格協会編: ＪＩＳ工業用語大辞典 第１版第５刷, 19860701, ｐ．３４７，ｐ．１３２１-１３２２, （財）日本規格協会 * |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017126150A1 (en) * | 2016-01-19 | 2017-07-27 | 国立研究開発法人物質・材料研究機構 | ROLLING BODY ZnO-COATING METHOD, ROLLING BODY WITH ZnO-COATING, AND BEARING INCORPORATING SAME |
| JPWO2017126150A1 (en) * | 2016-01-19 | 2018-11-15 | 国立研究開発法人物質・材料研究機構 | Method of ZnO coating on rotator and rotator having ZnO coating and bearing incorporating the same |
| US20190017549A1 (en) * | 2016-01-19 | 2019-01-17 | National Institute For Materials Science | ZnO COATING METHOD FOR ROLLING BODY, ROLLING BODY WITH ZnO COATING, AND BEARING INCORPORATING SAME |
| US10495146B2 (en) | 2016-01-19 | 2019-12-03 | National Institute For Materials Science | ZnO coating method for rolling body, rolling body with ZnO coating, and bearing incorporating same |
| CN108359956A (en) * | 2018-05-21 | 2018-08-03 | 哈尔滨理工大学 | A kind of sample rotating device and its film plating process that vacuum coating equipment uses |
| CN109306463A (en) * | 2018-12-19 | 2019-02-05 | 浙江工业大学 | A kind of self-action pole sample plated film clamping device suitable for magnetic control sputtering device |
| CN111041445A (en) * | 2019-12-26 | 2020-04-21 | 北京大学深圳研究院 | Multidirectional rotating device for physical vapor deposition of coatings on surfaces of threaded parts |
| JP7123433B1 (en) * | 2021-02-26 | 2022-08-23 | 豊実精工株式会社 | FILM FORMING DEVICE AND ROLLING ELEMENT MANUFACTURING METHOD |
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