JP2010202466A - 非晶質状炭素膜の表面改質方法 - Google Patents
非晶質状炭素膜の表面改質方法 Download PDFInfo
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- JP2010202466A JP2010202466A JP2009050836A JP2009050836A JP2010202466A JP 2010202466 A JP2010202466 A JP 2010202466A JP 2009050836 A JP2009050836 A JP 2009050836A JP 2009050836 A JP2009050836 A JP 2009050836A JP 2010202466 A JP2010202466 A JP 2010202466A
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- carbon film
- amorphous carbon
- sample
- coupling agent
- silane coupling
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/05—Preparation or purification of carbon not covered by groups C01B32/15, C01B32/20, C01B32/25, C01B32/30
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
Abstract
【解決手段】不活性ガスを用いて非晶質状炭素膜2の表面21をエッチング処理するステップと、エッチング処理された非晶質状炭素膜2の表面21を、シランカップリング剤を用いて表面処理するステップとを含む。
【選択図】図1
Description
(条件B)非晶質状炭素膜2の表面21を、不活性ガスを用いたエッチング処理をせずにシランカップリング剤で表面処理する:
(条件C)非晶質状炭素膜2の表面21を、不活性ガスを用いてエッチング処理をした後にシランカップリング剤で表面処理する。
上記のように、本発明は実施形態によって記載したが、この開示の一部をなす論述及び図面はこの発明を限定するものであると理解すべきではない。この開示から当業者には様々な代替実施形態、実施例及び運用技術が明らかとなろう。
2…非晶質状炭素膜
11…基板表面
21…表面
30…チャンバー
31…カソード電極
32…アノード電極
33…ガス導入口
34…マッチングボックス
35…交流電源
40…混合溶液
Claims (5)
- 不活性ガスを用いて非晶質状炭素膜の表面をエッチング処理するステップと、
前記エッチング処理された前記非晶質状炭素膜の表面を、シランカップリング剤を用いて表面処理するステップと
を含むことを特徴とする非晶質状炭素膜の表面改質方法。 - 前記エッチング処理がプラズマエッチング処理であることを特徴とする請求項1に記載の非晶質状炭素膜の表面改質方法。
- 前記不活性ガスがアルゴンガスであることを特徴とする請求項1又は2に記載の非晶質状炭素膜の表面改質方法。
- 前記エッチング処理によって前記非晶質状炭素膜の表面に未結合手を生成することを特徴とする請求項1乃至3のいずれか1項に記載の非晶質状炭素膜の表面改質方法。
- 前記非晶質状炭素膜がダイヤモンド状炭素膜であることを特徴とする請求項1乃至4のいずれか1項に記載の非晶質状炭素膜の表面改質方法。
Priority Applications (2)
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---|---|---|---|
JP2009050836A JP5467452B2 (ja) | 2009-03-04 | 2009-03-04 | 非晶質状炭素膜の表面改質方法 |
PCT/JP2009/071430 WO2010100806A1 (ja) | 2009-03-04 | 2009-12-24 | 非晶質状炭素膜の表面改質方法 |
Applications Claiming Priority (1)
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JP2009050836A JP5467452B2 (ja) | 2009-03-04 | 2009-03-04 | 非晶質状炭素膜の表面改質方法 |
Publications (2)
Publication Number | Publication Date |
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JP2010202466A true JP2010202466A (ja) | 2010-09-16 |
JP5467452B2 JP5467452B2 (ja) | 2014-04-09 |
Family
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JP2009050836A Expired - Fee Related JP5467452B2 (ja) | 2009-03-04 | 2009-03-04 | 非晶質状炭素膜の表面改質方法 |
Country Status (2)
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JP (1) | JP5467452B2 (ja) |
WO (1) | WO2010100806A1 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011148718A1 (ja) * | 2010-05-28 | 2011-12-01 | 太陽化学工業株式会社 | 非晶質炭素膜を有するスクリーン印刷用孔版及びその製造方法 |
WO2012169540A1 (ja) * | 2011-06-06 | 2012-12-13 | 太陽化学工業株式会社 | 非晶質炭素膜層への撥水撥油層を固定する方法及び該方法により形成された積層体 |
WO2015115399A1 (ja) * | 2014-01-28 | 2015-08-06 | 太陽化学工業株式会社 | 炭素膜を備える構造体及び炭素膜を形成する方法 |
JP2019030260A (ja) * | 2017-08-08 | 2019-02-28 | 学校法人慶應義塾 | 細胞生産方法及び細胞生産装置 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2023048067A1 (ja) * | 2021-09-27 | 2023-03-30 | 凸版印刷株式会社 | 蓄電装置用外装材及びこれを用いた蓄電装置 |
Citations (4)
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JPH04157157A (ja) * | 1990-10-22 | 1992-05-29 | Nippon Seiko Kk | 人工ダイヤモンド被覆材の製造方法 |
JPH04336258A (ja) * | 1991-05-14 | 1992-11-24 | Citizen Watch Co Ltd | 撥液性硬質膜の被覆方法 |
JP2001195729A (ja) * | 2000-01-17 | 2001-07-19 | Fujitsu Ltd | 記録媒体の製造方法及び記録媒体 |
JP2004323973A (ja) * | 2003-04-08 | 2004-11-18 | Kurita Seisakusho:Kk | Dlc膜の成膜方法およびdlc成膜物 |
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2009
- 2009-03-04 JP JP2009050836A patent/JP5467452B2/ja not_active Expired - Fee Related
- 2009-12-24 WO PCT/JP2009/071430 patent/WO2010100806A1/ja active Application Filing
Patent Citations (4)
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JPH04157157A (ja) * | 1990-10-22 | 1992-05-29 | Nippon Seiko Kk | 人工ダイヤモンド被覆材の製造方法 |
JPH04336258A (ja) * | 1991-05-14 | 1992-11-24 | Citizen Watch Co Ltd | 撥液性硬質膜の被覆方法 |
JP2001195729A (ja) * | 2000-01-17 | 2001-07-19 | Fujitsu Ltd | 記録媒体の製造方法及び記録媒体 |
JP2004323973A (ja) * | 2003-04-08 | 2004-11-18 | Kurita Seisakusho:Kk | Dlc膜の成膜方法およびdlc成膜物 |
Non-Patent Citations (4)
Title |
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JPN6013064823; 桜井健一 他: 'ダイヤモンドライクカーボン膜上の自己組織化単分子膜形成および熱安定化' 日本トライボロジー学会トライボロジー会議予稿集 Vol. 2008-9, 20080901, pp. 403-404, 社団法人日本トライボロジー学会 * |
JPN6013064824; 齋藤永宏 他: 'ダイヤモンド表面の有機修飾による機能化と集積化' New Diamond Vol. 22, No. 4, 20061025, pp. 5-10, 一般社団法人ニューダイヤモンドフォーラム * |
JPN7013004865; H. Notsu et al.: 'Hydroxyl groups on boron-doped diamond electrodes and their modification with a silane coupling agen' Electrochem. Solid-State Lett. Vol. 4, No. 3, 200103, pp. H1-H3, The Electrochemical Society * |
JPN7013004866; T. Tsubota et al.: 'Surface reforming of the oxidized diamond surface with silane coupling reagents' J. Ceram. Soc. Jpn. Vol. 110, No. 1286, 20011001, pp. 904-910, The Ceramic Society of Japan * |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011148718A1 (ja) * | 2010-05-28 | 2011-12-01 | 太陽化学工業株式会社 | 非晶質炭素膜を有するスクリーン印刷用孔版及びその製造方法 |
CN102947103A (zh) * | 2010-05-28 | 2013-02-27 | 太阳化学工业株式会社 | 具有非晶质炭膜的网版印刷用孔版及其制造方法 |
US9186879B2 (en) | 2010-05-28 | 2015-11-17 | Taiyo Yuden Chemical Technology Co., Ltd. | Screen-printing stencil having amorphous carbon films and manufacturing method therefor |
WO2012169540A1 (ja) * | 2011-06-06 | 2012-12-13 | 太陽化学工業株式会社 | 非晶質炭素膜層への撥水撥油層を固定する方法及び該方法により形成された積層体 |
CN103635313A (zh) * | 2011-06-06 | 2014-03-12 | 太阳化学工业株式会社 | 在非晶形碳膜层上固定防水防油层的方法及由所述方法形成的层叠体 |
KR101468666B1 (ko) * | 2011-06-06 | 2014-12-04 | 다이요 가가쿠 고교 가부시키가이샤 | 비정질 탄소막층에의 발수 발유층을 고정시키는 방법 및 해당 방법에 의해 형성된 적층체 |
JPWO2012169540A1 (ja) * | 2011-06-06 | 2015-02-23 | 太陽化学工業株式会社 | 非晶質炭素膜層への撥水撥油層を固定する方法及び該方法により形成された積層体 |
TWI511801B (zh) * | 2011-06-06 | 2015-12-11 | Taiyo Yuden Chemical Technology Co Ltd | 將撥水撥油層固定於非晶質碳膜層之方法及以該方法形成之積層體 |
US9238350B2 (en) | 2011-06-06 | 2016-01-19 | Taiyo Yuden Chemical Technology Co., Ltd. | Method for affixing water-and-oil-repellent layer to amorphous carbon film layer, and laminated body formed by said method |
WO2015115399A1 (ja) * | 2014-01-28 | 2015-08-06 | 太陽化学工業株式会社 | 炭素膜を備える構造体及び炭素膜を形成する方法 |
JPWO2015115399A1 (ja) * | 2014-01-28 | 2017-03-23 | 太陽誘電ケミカルテクノロジー株式会社 | 炭素膜を備える構造体及び炭素膜を形成する方法 |
JP2019030260A (ja) * | 2017-08-08 | 2019-02-28 | 学校法人慶應義塾 | 細胞生産方法及び細胞生産装置 |
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WO2010100806A1 (ja) | 2010-09-10 |
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