JP2010191144A - Antireflection film - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an antireflection film having an extremely high transparency, excellent mechanical properties, good post-processability and high value-added performance even if a PET film is used as a base material. <P>SOLUTION: The antireflection film is obtained by layering, at the least, a hard coat layer and an antireflection layer successively on one side of a transparent base material film. The antireflection layer includes a laminate which is obtained by alternately layering a thin film of a high refractive index material layer and another thin film of a low refractive index layer and has four or more layers. The thin film of the outermost layer of the laminate is the thin film of the low refractive index layer. (1) The transparent base material film is the PET (polyethylene terephthalate) film having ≤0.5% haze, (2) the hard coat layer contains a photocurable resin and has 1.5-4 μm thickness, (3) the antireflection layer has 100-300 nm total thickness, and (4) the antireflection film has ≤0.3% haze, exhibits ≥92% transmittance to all of light beams and has ≤0.9% luminous reflectance. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to an antireflection film having good post-processability and high transparency.

  In an optical display device such as an LCD, CRT, or plasma display panel, an antireflection film that prevents reflection of external light such as sunlight or a fluorescent lamp is often used. In particular, for outdoor use where the reflection of outside light is large, there is a demand for an antireflection film having a reflectance close to zero, that is, an AR (Anti-Reflection) film (hereinafter referred to as an AR film).

  In general, the AR film is produced by a dry coating technique capable of forming a thin film having a thickness of several nanometers. Among them, the sputtering method has higher film thickness uniformity and fewer defects such as pinholes than other dry coating methods such as vapor deposition, ion plating, and CVD (chemical phase growth method). A thin film with excellent visibility can be formed. In addition, since a dense film can be formed, it is possible to form a thin film with extremely excellent mechanical properties.

  Antireflection films are often used in liquid crystal display (LCD) applications, and an antireflection layer structure in which the antireflection film is laminated on a protective film of a polarizing plate is common. A triacetyl cellulose (TAC) film is used as a protective film for this polarizing plate, that is, a base material for an antireflection film, because of its good hygroscopicity and high transparency and no birefringence. However, when this TAC film is used for purposes other than LCD applications, although it has a great advantage of high transparency, appearance defects such as discoloration and corrosion due to hydrolysis, etc. depending on the material components are likely to occur. There is a problem with poor environmental durability. The TAC film is prepared by casting a solvent dope on a mirror-like endless belt, peeling it off after drying, and winding it. For this reason, there are thick film portions by knurl processing for preventing blocking at both side ends of the film, and there is a problem that workability in a subsequent process is poor. Furthermore, since it is produced by the above-described method, there is a problem that productivity is low as compared with a film substrate produced by extrusion molding or the like, and supply for purposes other than LCD applications is difficult. Therefore, in the case of use in LCD applications, development of an antireflection film having transparency and good post-processability using a substrate other than TAC is desired.

  An antireflection film using a substrate other than TAC, particularly polyethylene terephthalate (PET) has been proposed. For example, Patent Document 1 discloses a film in which an antireflection film is formed on one surface of a PET film substrate and an easy adhesion layer is formed on the other surface, and Patent Document 2 discloses Patent Document A film is proposed in which a peelable protective film is provided on the easy-adhesion layer of one film. However, even when a PET film is used, it is necessary to use a sputtering method in order to impart excellent antireflection performance. As described above, in the sputtering method, since the uniformity of the film thickness is high, it is possible to make an antireflection film having extremely low reflectivity based on a dense optical design by stacking a plurality of layers. The price is that the process cost is high. For this reason, the price is higher but higher than the anti-reflection film prepared by the wet method. Therefore, even if a PET film or the like that is inferior in optical performance as compared with TAC or the like is used as a base material, there is no demand at present.

Japanese Patent No. 3141129 JP-A-9-193328

  The present invention has been made in view of the above circumstances, and even when a polyethylene terephthalate film is used as a base material, it has extremely high transparency, excellent mechanical properties, and high post-processability and high added value performance. An object of the present invention is to provide an antireflection film.

The invention according to claim 1 of the present invention is the antireflective film in which at least a hard coat layer and an antireflective layer are sequentially laminated on one surface of the transparent substrate film, wherein the antireflective layer has a high refractive index. It consists of a laminate of four or more layers in which a thin film of a material layer and a thin film of a low refractive index layer are alternately laminated, and the thin film of the outermost layer of the laminate is a thin film of a low refractive index layer. To (4) all of the conditions are satisfied.
(1) The transparent substrate film is a polyethylene terephthalate film having a haze of 0.5% or less. (2) The hard coat layer contains a photocurable resin, and the thickness thereof is 1.5 μm or more and 4 μm or less. (3) The total thickness of the antireflection layer is 100 to 300 nm. (4) The haze as an antireflection film is 0.3% or less, the total light transmittance is 92% or more, and the luminous reflectance is 0.9% or less.

  In the invention according to claim 2 of the present invention, in the antireflection layer, the thin film of the low refractive index layer is silicon oxide, and the thin film of the high refractive index layer is niobium oxide. The antireflection film according to claim 1, wherein the antireflection film is laminated by a dry coating method.

  In the invention according to claim 3 of the present invention, the thin film of the antireflection layer formed by the sputtering method is a thin film laminated at a pressure of 0.1 to 0.6 Pa. It is an antireflection film described in.

  Further, the invention according to claim 4 of the present invention is the invention consisting of a single metal, an alloy composed of two or more metals, a metal compound, or a mixture thereof between the hard coat layer and the antireflection layer. The antireflection film according to any one of claims 1 to 3, wherein a primer layer of at least one layer is provided.

  In the invention according to claim 5 of the present invention, an antifouling layer is provided on the antireflection layer, and the antireflection film according to any one of claims 1 to 4 It is.

  The invention according to claim 6 of the present invention is the antireflection film according to claim 5, wherein the antifouling layer is a fluorine compound formed by a vacuum deposition method.

  In the invention according to claim 7 of the present invention, the antifouling layer surface provided on the antireflection layer has a contact angle with respect to pure water of 100 ° or more, and the haze as an antireflection film is 0.00. It is 3% or less, It is an antireflection film of Claim 5 or 6 characterized by the above-mentioned.

In the invention according to claim 8 of the present invention, the antifouling layer provided on the antireflection layer uses steel wool # 0000 on the antifouling layer surface, and a load of 1.0 kg / cm ² , temperature 25 ° C., humidity 55% R.C. H. The antireflection film according to any one of claims 5 to 7, wherein the film is not damaged even if it is rubbed 10 times in the environment of

  Further, the invention according to claim 9 of the present invention is such that the hard coat layer is not damaged by two or more scratches when a pencil hardness test is performed 5 times with a 2H pencil at a load of 500 g. The antireflection film according to any one of claims 1 to 8, wherein

  In addition, the invention according to claim 10 of the present invention is visually confirmed when the antireflection film is wound around a round bar having a diameter of 12 mm without applying a load with the antireflection layer surface outside. The antireflection film according to any one of claims 1 to 9, wherein no cracks of the hard coat layer that can be formed are generated.

  Since the antireflection film of the present invention has the above-described configuration, even if a polyethylene terephthalate film is used as the base material, it has extremely high transparency and is excellent in mechanical properties such as a scratch resistance test and a pencil hardness test. In the subsequent process such as cutting, it is possible to produce an antireflection film that is less prone to cracking and has excellent post-workability.

It is a schematic diagram which shows the structure of one Embodiment of the antireflection film of this invention in a cross section.

  The antireflection film of the present invention will be described below based on one embodiment.

FIG. 1 is a schematic view showing the structure of one embodiment of the antireflection film of the present invention in cross section. In FIG. 1, in the antireflection film 100 of the present invention, a hard coat layer 20, a primer layer 30, and an antireflection layer 40 are sequentially laminated on a transparent substrate film 10. Further, an antifouling layer 50 is laminated on the antireflection layer 40.

  As the transparent substrate film 10, a polyethylene terephthalate (PET) film is used. The thickness of the transparent substrate film 10 may be appropriately selected according to the intended use, but usually a film having a thickness of 70 μm or more and 200 μm or less is used.

  In addition, the PET film that is the transparent substrate film 10 may contain additives such as a plasticizer, an ultraviolet absorber, and an anti-degradation agent. However, since it is necessary to select a highly transparent film, Shaped additives and the like are not so preferable because they reduce light transmission and light straightness and lower transparency. As far as possible, particulate additives inside should be avoided. In terms of handling, an easy-adhesion layer or the like is necessary, but it is necessary to coat the PET outside with as little surface roughness as possible. Further, the transparency of the film can be determined by the values of haze and light transmittance. In the antireflection film of the present invention, a PET film having a haze of 0.5% or less and a total light transmittance of 88% or more is used.

A hard coat layer 20 is provided on the transparent substrate film 10 to sufficiently exhibit the mechanical strength of the antireflection layer 40. The hard coat layer 20 is made of ionizing radiation or UV curable resin, and UV curable acrylic resins such as acrylic acid esters, acrylamides, methacrylic acid esters, and methacrylamides, organosilicon resins, and polyresins. Siloxane resins are optimal. A polymerization initiator may be added to these materials in order to improve curability. When an easy-adhesion layer is provided on one side of the PET film, it is preferable to apply a hard coat resin to the easy-adhesion side. It has the effect of lowering the haze and further increasing the adhesion between the hard coat resin and the PET film. The thickness of the hard coat layer 20 is a physical film thickness of 1.5 μm.
The thickness is preferably 4 μm or less. When the thickness of the hard coat layer 20 is 1.5 μm or less, it is difficult to obtain mechanical strength performance. When the thickness is 4 μm or more, the hard coat layer is easily cracked due to bending or pulling of the film. Workability deteriorates.

  In the antireflection film of the present invention, since the antireflection layer is an extremely thin thin film laminate, the hardness of the entire antireflection film is easily affected by the hardness of the hard coat layer as the base layer. Therefore, it is necessary to select a hard coat layer having as high mechanical strength as possible. In the pencil hardness test, use a hard coat layer that is not damaged by two or more scratches when the test is performed 5 times with 2H and 500 g excess weight.

  A surface treatment may be applied to the surface of the hard coat layer 20 opposite to the surface in contact with the transparent substrate film 10. At this time, examples of the surface treatment method include corona discharge treatment, electron beam treatment, flame treatment, glow discharge treatment, and atmospheric pressure plasma treatment. The antireflection film of the present invention is particularly preferably subjected to a low temperature plasma surface treatment. By performing the low temperature plasma treatment, the hydrophilicity can be improved, and the surface can be appropriately roughened to improve the adhesion with a thin film to be subsequently laminated.

  Thereafter, the primer layer 30 may be provided on the hard coat layer 20. The material of the primer layer 30 is made of, for example, a single metal such as silicon, nickel, chromium, tin, gold, silver, platinum, zinc, titanium, tungsten, aluminum, zirconium, palladium, or two or more of these metals. Alloys, or oxides, fluorides, sulfides, nitrides, and the like of these alloys may be mentioned, which may be a mixture. Further, the primer layer 30 may have two or more layers.

  The primer layer 30 is used for improving adhesion. The thickness should just be a grade which does not impair the transparency of the transparent base film 1, Preferably, it is a physical film thickness and is about 1 nm or more and 10 nm or less. These primer layers are preferably formed by a dry coating method such as a sputtering method, a reactive sputtering method, a vapor deposition method, an ion plating method, or a chemical vapor deposition (CVD) method. In particular, a sputtering method is preferable.

  The antireflection layer 40 includes a single layer of a low refractive index transparent thin film layer having a light refractive index of less than 1.6 at a wavelength of 550 nm and a light extinction coefficient of 0.5 or less at a wavelength of 550 nm, or a wavelength of 550 nm. High refractive index transparent thin film layer having a light refractive index of 1.9 or higher, low refractive index transparent thin film layer having a light refractive index of less than 1.6, medium refractive index of light having a refractive index of about 1.6 to 1.9 Examples thereof include a plurality of layers in which optical thin films having different refractive indexes such as a transparent thin film layer are laminated. An antireflection layer comprising a plurality of layers is particularly preferred because of its extremely low reflectance and high antireflection performance. As the antireflection layer 40 composed of a plurality of layers, a structure in which a high refractive index transparent thin film layer, a low refractive index transparent thin film layer, a high refractive index transparent thin film layer, and a low refractive index transparent thin film layer are laminated in order from the substrate side. The outermost layer of the laminate is a low refractive index transparent thin film.

  The antireflection layer 40 made of these optical thin film layers can be formed by a dry coating method such as a sputtering method, a reactive sputtering method, a vapor deposition method, an ion plating method, or a chemical vapor deposition (CVD) method. It is preferable to use a sputtering method that has high film thickness uniformity and few defects such as pinholes, and that is excellent in visibility, dense, and capable of forming a thin film with excellent mechanical properties such as scratch resistance. Among them, the dual magnetron sputtering (DMS) method, in which film formation is performed by applying a voltage in the middle frequency region, is optimal because higher productivity can be obtained by higher film formation speed and higher discharge stability.

As the material for the high refractive index transparent thin film layer, indium, tin, titanium, silicon, zinc, zirconium, niobium, magnesium, bismuth, cerium, tantalum, aluminum, germanium, potassium, antimony, neodymium, lanthanum, thorium, hafnium, etc. Examples thereof include metals or alloys composed of two or more of these metals, oxides thereof, fluorides, sulfides, and nitrides. Specific examples include titanium oxide, niobium oxide, zirconium oxide, tantalum oxide, zinc oxide, indium oxide, and cerium oxide, but are not limited thereto. In addition, when a plurality of layers are stacked, it is not always necessary to select the same material, and the material may be appropriately selected according to the purpose. In particular, when sputtering is used, niobium oxide is suitable because of the small number of pinholes in the thin film produced.

  Examples of the material for the low refractive index transparent thin film layer include, but are not limited to, materials such as silicon oxide, titanium nitride, magnesium fluoride, barium fluoride, calcium fluoride, hafnium fluoride, and lanthanum fluoride. In addition, when a plurality of layers are stacked, it is not always necessary to select the same material, and it may be appropriately selected according to the purpose. In particular, silicon oxide is an optimal material in terms of optical characteristics, mechanical strength, cost, film formation appropriateness, and the like.

  If necessary, an antifouling layer 50 may be provided on the outermost surface layer on the antireflection layer 40. The antifouling layer 50 is a layer obtained from a fluorine-containing silicon compound having two or more silicon atoms bonded to a reactive functional group. Here, the reactive functional group means a group that can react with and bond to the uppermost layer of the antireflection layer 40. The antifouling layer 50 is a layer formed by reacting reactive functional groups of a fluorine-containing silicon compound. Thereby, it is hard to get dirt on the surface, and even if it gets dirty, the wiping performance can be improved. Here, the film formation method of the antifouling layer is not particularly limited, but a film formation method by a vacuum evaporation method is suitable. According to this method, when the film is continuously formed, it is possible to form the film with a uniform film thickness.

  At this time, in order to have sufficient antifouling performance, at least a contact angle with pure water needs to be 100 degrees or more. Thereby, the wiping property of the dirt on the surface is improved. Further, since the friction coefficient is lowered, the scratch resistance can be further improved.

  Specific examples and comparative examples of the present invention will be described below. In addition, this invention is not limited to the following Example.

<Example 1>
As a transparent substrate film, a PET film having a haze of 0.34%, a total light transmittance of 93.4%, and a thickness of 100 μm is used. A UV curable acrylic resin is applied, dried and UV cured, and a hard 2 μm thickness. A coat layer was provided. The pencil hardness of the hard coat layer was 5/5 at 2H and 500 g excess weight. Next, the surface of the hard coat layer was subjected to glow plasma treatment, and an SiO layer was formed as a primer layer with a film thickness of 3 nm by sputtering. Thereafter, an antireflection layer was formed by sputtering under a film forming pressure condition of 0.3 Pa. The layers were formed from Nb ₂ O ₅ / SiO ₂ / Nb ₂ O ₅ / SiO ₂ from the hard coat layer side, and the film thickness of each layer was 15 nm / 25 nm / 105 nm / 85 nm, respectively.

<Example 2>
As a transparent substrate film, a PET film having a haze of 0.27%, a total light transmittance of 90.4%, and a thickness of 100 μm is applied, an ultraviolet curable acrylic resin is applied, dried and UV cured, and a hard film having a thickness of 3 μm. A coat layer was provided. The pencil hardness of the hard coat layer was 4/5 at 2H and 500 g excess weight. Next, the surface of the hard coat layer was subjected to glow plasma treatment, and an SiO layer was formed as a primer layer with a film thickness of 3 nm by sputtering. Thereafter, an antireflection layer was formed by sputtering under a film forming pressure condition of 0.3 Pa. The layer configuration and the film thickness of each layer were the same as in Example 1.

<Example 3>
As a transparent substrate film, a PET film having a haze of 0.34%, a total light transmittance of 93.4%, and a thickness of 100 μm is used. A UV curable acrylic resin is applied, dried and UV cured, and a hard 2 μm thickness. A coat layer was provided. The pencil hardness of the hard coat layer was 5/5 at 2H and 500 g excess weight. Next, the surface of the hard coat layer was subjected to glow plasma treatment, and an SiO layer was formed as a primer layer with a film thickness of 3 nm by sputtering. Thereafter, an antireflection layer was formed by a sputtering method under a film forming pressure condition of 1.0 Pa. The layer configuration and the film thickness of each layer were the same as in Example 1.

<Comparative Example 1>
As a transparent substrate film, a PET film having a haze of 1.0%, a total light transmittance of 89%, and a thickness of 100 μm is used. A hard coat layer having a thickness of 5 μm is applied by applying an ultraviolet curable acrylic resin, drying and ultraviolet curing. Was provided. The pencil hardness of the hard coat layer was 5/5 at 2H and 500 g excess weight. Next, the surface of the hard coat layer was subjected to glow plasma treatment, and an SiO layer was formed as a primer layer with a film thickness of 3 nm by sputtering. Thereafter, an antireflection layer was formed by sputtering under a film forming pressure condition of 0.3 Pa. The layer configuration and the film thickness of each layer were the same as in Example 1.

<Comparative example 2>
As a transparent substrate film, a PET film having a haze of 0.34%, a total light transmittance of 93.4%, and a thickness of 100 μm is used. A UV curable acrylic resin is applied, dried and UV cured, and a hard film having a thickness of 6 μm. A coat layer was provided. The pencil hardness of the hard coat layer was 5/5 at 2H and 500 g excess weight. Next, the surface of the hard coat layer was subjected to glow plasma treatment, and an SiO layer was formed as a primer layer with a film thickness of 3 nm by sputtering. Thereafter, an antireflection layer was formed by sputtering under a film forming pressure condition of 0.3 Pa. The layer configuration and the film thickness of each layer were the same as in Example 1.

<Comparative Example 3>
As a transparent substrate film, a PET film having a haze of 0.27%, a total light transmittance of 90.4%, and a thickness of 100 μm is applied, and an ultraviolet curable acrylic resin is applied, dried and UV cured, and hardened with a thickness of 1 μm. A coat layer was provided. The pencil hardness of the hard coat layer was 2/5 at 2H and 500 g excess weight. Next, the surface of the hard coat layer was subjected to glow plasma treatment, and an SiO layer was formed as a primer layer with a film thickness of 3 nm by sputtering. Thereafter, an antireflection layer was formed by sputtering under a film forming pressure condition of 0.3 Pa. The layer configuration and the film thickness of each layer were the same as in Example 1.

  Thereafter, fluoroalkoxysilane was formed by reactive vapor deposition on the antireflection layers of Examples 1 to 3 and Comparative Examples 1 to 3 to form an antifouling layer. The contact angle with respect to the pure water of the antifouling layer surface of the obtained antireflection films of Examples 1 to 3 and Comparative Examples 1 to 3 was 108 °.

The samples obtained in Examples 1 to 3 and Comparative Examples 1 to 3 described above were evaluated by the following methods. The results are shown in Table 1.

[Measurement of luminous reflectance]
Measurement was carried out using a U4000 spectrophotometer manufactured by Hitachi. The back side of the sample was subjected to a treatment for cutting off reflection from the back side with a matte black paint spray, and a specular reflection 5 ° unit was used for the measurement.

(2) Haze and total light transmittance measurement Total light transmittance measurement was performed using a haze meter. At this time, incident light was incident from the antifouling layer (antireflection layer) side. Haze measurement was performed according to JIS-K7105.
Here, haze (%) = _Td / _Tt * 100 ( _Tt : total light transmittance, _Td : diffuse transmittance)

[Abrasion resistance test]
Steel wool # 0000 was fixed to an abrasion tester, and a load of 4.9 N and 9.8 N was applied to perform 10 reciprocal abrasion tests on the antireflection layer of each sample. Was visually observed. Judgment criteria are shown below.
◎: No scratch ○: Less than 10 scratches ×: 10 or more scratches

[Pencil hardness test]
The pencil was 2H, a load of 4.9 N was applied to each pencil, the film was traced five times, and the abrasion state (number of scratches) of the sample was visually observed. If 5 lines are drawn and there are no flaws, 5/5 is indicated. If there are 5 flaws, 0/5 is indicated. Judgment criteria are shown below.
A: 5/5, 4/5
○: 3/5
Δ: 2/5
X: 1/5, 0/5

[Bending test]
A round bar having a diameter of 12 mm is wound with the antireflection layer surface facing outward without applying a load to the sample. After removing the sample from the bar, the occurrence of cracks was visually confirmed. Repeat 5 times per sample. Judgment criteria are shown below.
◎: No cracks occurred 5 times out of 5 times ○: No cracks occurred 3-4 times out of 5 times △: Cracks occurred 3 times or more out of 5 times, but the number of cracks is less than 10 ×: 5 Unlimited number of 5 cracks

<Comparison result>
As shown in Table 1, when the antireflection film prepared in Examples 1 and 2 was used, good results could be obtained in all properties such as optical properties, mechanical properties, bending properties. On the other hand, for the antireflection films prepared in Comparative Examples 1 to 3, the luminous reflectance is 0.9% or less for film formation by sputtering, and sufficient antireflection performance can be obtained. However, the results were inferior in some evaluation items. When the hard coat layer is thick (5 μm in Comparative Example 1 and 6 μm in Comparative Example 2), cracks occur in the hard coat layer in the bending test, and when the hard coat layer is thin (1 μm in Comparative Example 3), scratch resistance In the property test and the pencil hardness test, the surface was damaged. In Comparative Example 1 using a PET film having a haze of 1% as the base film, the haze as the antireflection film could not be reduced to 0.3% or less. Further, in Example 3 in which the antireflection layer was formed under a slightly high film forming pressure condition of 1.0 Pa, the results of the scratch resistance test were slightly inferior to those in Examples 1 and 2. . From the above, it was confirmed that the antireflection film of the present invention has an excellent antireflection function, excellent mechanical properties, excellent environmental durability, and excellent processing properties.

DESCRIPTION OF SYMBOLS 10 ... Transparent base film 20 ... Hard-coat layer 30 ... Primer layer 40 ... Antireflection layer 50 ... Antifouling layer 100 ... Antireflection film of this invention

Claims (10)

In the antireflection film formed by sequentially laminating at least a hard coat layer and an antireflection layer on one surface of the transparent substrate film,
The antireflection layer comprises a laminate of four or more layers in which a thin film of a high refractive material layer and a thin film of a low refractive index layer are alternately laminated, and the thin film of the outermost layer of the laminated body is a thin film of a low refractive index layer An antireflection film characterized by satisfying all the following conditions (1) to (4):
(1) The transparent substrate film is a polyethylene terephthalate film having a haze of 0.5% or less.
(2) The hard coat layer contains a photocurable resin, and the thickness thereof is 1.5 μm or more and 4 μm or less.
(3) The total thickness of the antireflection layer is 100 to 300 nm.
(4) The haze as an antireflection film is 0.3% or less, the total light transmittance is 92% or more, and the luminous reflectance is 0.9% or less.   The thin film of the low refractive index layer of the antireflection layer is silicon oxide, and the thin film of the high refractive index layer is niobium oxide, which are laminated by a dry coating method using a sputtering method, respectively. The antireflection film according to claim 1.   The antireflection film according to claim 2, wherein the thin film of the antireflection layer formed by the sputtering method is a thin film laminated at a pressure of 0.1 to 0.6 Pa.   Between the hard coat layer and the antireflection layer, one or more primer layers made of a single metal, an alloy made of two or more metals, a metal compound, or a mixture thereof are provided. The antireflection film according to any one of claims 1 to 3.   The antireflection film according to any one of claims 1 to 4, wherein an antifouling layer is provided on the antireflection layer.   6. The antireflection film according to claim 5, wherein the antifouling layer is a fluorine compound formed by a vacuum deposition method.   6. The contact angle with respect to pure water of the antifouling layer surface provided on the antireflection layer is 100 ° or more, and the haze as an antireflection film is 0.3% or less. Or the antireflection film of 6. The antifouling layer provided on the antireflection layer uses steel wool # 0000 on the antifouling layer surface, a load of 1.0 kg / cm ² , a temperature of 25 ° C., and a humidity of 55% R.D. H. The antireflection film according to any one of claims 5 to 7, wherein the film is not scratched even if it is rubbed 10 times under the above environment.   9. The hard coat layer according to any one of claims 1 to 8, wherein when the test is performed five times with a pencil of 2H in a pencil hardness test under a load of 500 g and at a load of 500 g, two or more are not damaged. The antireflection film described in the item.   When the anti-reflection film is wound around a round bar having a diameter of 12 mm with the anti-reflection layer surface outside and without applying a load, cracks in the hard coat layer that can be visually confirmed do not occur. The antireflection film according to any one of claims 1 to 9.

Images