JP2010165948A - Chamber device, substrate processing apparatus, exposure apparatus, device manufacturing method, and maintenance method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a chamber device which allows a worker, or the like, to smoothly enter in an inner space thereof. <P>SOLUTION: The chamber device is capable of closing first openings of the chamber body, and includes first door members that form a substantially closed inner space, inside the chamber body by closing first openings, and exhaust mechanisms for exhausting at least part of the inner space gas, to interlock with the opening operation of the first openings. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a chamber apparatus, a substrate processing apparatus, an exposure apparatus, a device manufacturing method, and a maintenance method.

  In the manufacturing process of micro devices such as semiconductor devices and electronic devices, a substrate is processed using a substrate processing apparatus such as an exposure apparatus. The substrate processing apparatus includes a chamber apparatus that forms an internal space, and processes the substrate in the internal space. The following patent document discloses an example of a technique related to a chamber apparatus that can control the environment of the internal space.

US Pat. No. 6,762,820 US Patent Application Publication No. 2003/0058426

  For example, when maintaining the substrate processing apparatus, if the pressure difference between the internal space and the external space of the chamber apparatus is large, the maintenance work may not be performed smoothly. As a result, there is a possibility that the operation rate of the substrate processing apparatus is lowered or the productivity of the device is lowered.

  An object of an aspect of the present invention is to provide a chamber device that allows an operator or the like to smoothly enter an internal space. Another object of the present invention is to provide a substrate processing apparatus and an exposure apparatus that can suppress a reduction in operating rate. Moreover, the aspect of this invention aims at providing the device manufacturing method which can suppress the fall of productivity. Moreover, the aspect of this invention aims at providing the maintenance method which can suppress the fall of workability | operativity.

  According to the first aspect of the present invention, the first opening of the chamber body can be closed, and the first opening forms a substantially closed internal space inside the chamber body by closing the first opening. A chamber apparatus is provided that includes an opening / closing member and an exhaust mechanism that exhausts at least part of the gas in the internal space in conjunction with an operation of opening the first opening.

  According to the second aspect of the present invention, the first opening of the chamber body can be closed, and by closing the first opening, an opening / closing member that forms a substantially closed internal space inside the chamber body And a damping mechanism that attenuates a force that moves the opening / closing member away from the first opening when the first opening is opened.

  According to a third aspect of the present invention, there is provided a substrate processing apparatus including the chamber apparatus according to the first and second aspects, and processing a substrate in an internal space when the first opening is closed.

  According to a fourth aspect of the present invention, there is provided an exposure apparatus for exposing a substrate with exposure light, comprising the chamber apparatus according to the first and second aspects, and exposing the exposure light in the internal space when the first opening is closed. An exposure apparatus for irradiating is provided.

  According to a fifth aspect of the present invention, there is provided a device manufacturing method including exposing a substrate using the exposure apparatus according to the fourth aspect and developing the exposed substrate.

  According to a sixth aspect of the present invention, there is provided an exposure apparatus maintenance method including opening a first opening of a chamber apparatus provided in the exposure apparatus of the fourth aspect.

  According to an aspect of the present invention, a chamber apparatus that can perform maintenance work smoothly is provided. Moreover, according to the aspect of this invention, the substrate processing apparatus and exposure apparatus which can suppress the fall of an operation rate are provided. Moreover, according to the aspect of this invention, the device manufacturing method which can suppress the fall of productivity is provided. Moreover, according to the aspect of this invention, the maintenance method which can suppress the fall of workability | operativity is provided.

It is a schematic block diagram which shows an example of the exposure apparatus which concerns on 1st Embodiment. It is a perspective view which shows the external appearance of the chamber apparatus which concerns on 1st Embodiment. It is a figure which shows an example of the exhaust mechanism which concerns on 1st Embodiment. It is a figure which shows an example of the exhaust mechanism which concerns on 1st Embodiment. It is a figure which shows an example of the exhaust mechanism which concerns on 1st Embodiment. It is a figure which shows an example of the exhaust mechanism which concerns on 1st Embodiment. It is a figure which shows an example of the exhaust mechanism which concerns on 2nd Embodiment. It is a figure which shows an example of the exhaust mechanism which concerns on 2nd Embodiment. It is a figure which shows an example of the exhaust mechanism which concerns on 3rd Embodiment. It is a figure which shows an example of the exhaust mechanism which concerns on 3rd Embodiment. It is a figure which shows an example of the exhaust mechanism which concerns on 3rd Embodiment. It is a figure which shows an example of the exhaust mechanism which concerns on 3rd Embodiment. It is a figure which shows an example of the exhaust mechanism which concerns on 4th Embodiment. It is a figure which shows an example of the exhaust mechanism which concerns on 4th Embodiment. It is a figure which shows an example of the exhaust mechanism which concerns on 5th Embodiment. It is a figure which shows an example of the exhaust mechanism which concerns on 5th Embodiment. It is a figure which shows an example of the exhaust mechanism which concerns on 5th Embodiment. It is a figure which shows an example of the chamber apparatus which concerns on 6th Embodiment. It is a figure which shows an example of the chamber apparatus which concerns on 7th Embodiment. It is a flowchart for demonstrating an example of the manufacturing process of a microdevice.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. In the following description, an XYZ orthogonal coordinate system is set, and the positional relationship of each part will be described with reference to this XYZ orthogonal coordinate system. A predetermined direction in the horizontal plane is defined as an X-axis direction, a direction orthogonal to the X-axis direction in the horizontal plane is defined as a Y-axis direction, and a direction orthogonal to each of the X-axis direction and the Y-axis direction (that is, a vertical direction) is defined as a Z-axis direction. In addition, the rotation (inclination) directions around the X axis, the Y axis, and the Z axis are the θX, θY, and θZ directions, respectively.

<First Embodiment>
A first embodiment will be described. FIG. 1 is a schematic block diagram that shows an example of an exposure apparatus EX according to the first embodiment. The exposure apparatus EX of the present embodiment is an immersion exposure apparatus that exposes a substrate P with exposure light EL through a liquid LQ. In the present embodiment, water (pure water) is used as the liquid LQ.

  In FIG. 1, an exposure apparatus EX includes a mask stage 1 that can move while holding a mask M, a substrate stage 2 that can move while holding a substrate P, a drive system 10 for moving the mask stage 1, A driving system 20 for moving the substrate stage 2, an illumination system IL for illuminating the mask M with the exposure light EL, and a projection optical system PL for projecting an image of the pattern of the mask M illuminated with the exposure light EL onto the substrate P A liquid immersion member 5 capable of forming an immersion space so that at least a part of the optical path of the exposure light EL is filled with the liquid LQ, a chamber device 6 that forms the internal space 3 in which the exposure light EL travels, and exposure And a control device 7 that controls the operation of the entire device EX.

  Further, the exposure apparatus EX includes a body 8 including, for example, a first column 9 provided on a support surface FL in a clean room and a second column 10 provided on the first column 9. The first column 9 includes a first support member 14 and a first surface plate 16 supported by the first support member 14 via a vibration isolator 15. The second column 10 includes a second support member 17 disposed on the first surface plate 16 and a second surface plate 19 supported on the second support member 17 via a vibration isolator 18. In the present embodiment, the mask stage 1, the substrate stage 2, the illumination system IL, the projection optical system PL, the body 8, and the like are disposed in the internal space 3 formed by the chamber device 6.

  The chamber device 6 includes a chamber body 4, a first opening / closing member 31 capable of closing the first opening 30 formed in the chamber body 4, and the environment (temperature, temperature) of the internal space 3 formed inside the chamber body 4. Exhaust gas that exhausts at least a part of the gas in the internal space 3 in conjunction with the air conditioners 21, 22, and 23 that control the humidity, pressure, and cleanliness) and the operation of opening the first opening 30. Mechanism 40. When the first opening / closing member 31 closes the first opening 30, an internal space 3 that is substantially closed is formed inside the chamber body 4. In the present embodiment, the internal space 3 includes a first space 11 formed between the first column 9 and the support surface FL, and a second space formed between the second column 10 and the first surface plate 16. A space 12 and a third space 13 formed between the chamber body 4 and the second surface plate 19 are included.

The illumination system IL illuminates a predetermined illumination area IR with exposure light EL having a uniform illuminance distribution. The illumination system IL illuminates at least a part of the mask M arranged in the illumination region IR with the exposure light EL having a uniform illuminance distribution. As the exposure light EL emitted from the illumination system IL, for example, far ultraviolet light (DUV light) such as bright lines (g-line, h-line, i-line) and KrF excimer laser light (wavelength 248 nm) emitted from a mercury lamp, ArF Excimer laser light (wavelength 193 nm), vacuum ultraviolet light (VUV light) such as F ₂ laser light (wavelength 157 nm), or the like is used. In the present embodiment, ArF excimer laser light is used as the exposure light EL.

  The mask stage 1 is movable in the third space 13 while holding the mask M. The mask stage 1 has a mask holding unit 1H that holds the mask M in a releasable manner. In the present embodiment, the mask holding unit 1H holds the mask M so that the surface (pattern formation surface) of the mask M and the XY plane are substantially parallel.

  The mask stage 1 is movable on the guide surface 19G of the second surface plate 19. The guide surface 19G is disposed in the third space 13. The mask stage 1 is movable on the guide surface 19G to the illumination region IR (a position where the exposure light EL from the illumination system IL can be irradiated). The guide surface 19G is substantially parallel to the XY plane. The mask stage 1 is movable on the guide surface 19G in the third space 13 by the operation of the drive system 10. In the present embodiment, the drive system 10 includes a planar motor for moving the mask stage 1 on the guide surface 19G. A planar motor for moving the mask stage 1 includes, for example, a movable element 1M disposed on the mask stage 1 and a fixed surface disposed on the second surface plate 19 as disclosed in US Pat. No. 6,452,292. And a child 19C. The mask stage 1 can be moved in six directions including the X axis, Y axis, Z axis, θX, θY, and θZ directions by the operation of the drive system 10 including a planar motor.

  The projection optical system PL irradiates the predetermined projection region PR with the exposure light EL. The projection optical system PL projects an image of the pattern of the mask M at a predetermined projection magnification onto at least a part of the substrate P arranged in the projection region PR. A plurality of optical elements of the projection optical system PL are held by the lens barrel 24. The lens barrel 24 has a flange 24F. The projection optical system PL is supported by the first surface plate 16 via the flange 24F. A vibration isolator can be provided between the first surface plate 16 and the lens barrel 24.

  The projection optical system PL of the present embodiment is a reduction system whose projection magnification is, for example, 1/4, 1/5, or 1/8. Note that the projection optical system PL may be either an equal magnification system or an enlargement system. In the present embodiment, the optical axis of the projection optical system PL is parallel to the Z axis. The projection optical system PL may be any of a refractive system that does not include a reflective optical element, a reflective system that does not include a refractive optical element, and a catadioptric system that includes a reflective optical element and a refractive optical element. Further, the projection optical system PL may form either an inverted image or an erect image.

  Of the plurality of optical elements of the projection optical system PL, the terminal optical element 25 closest to the image plane of the projection optical system PL has an exit surface 26 that emits the exposure light EL toward the image plane of the projection optical system PL. The projection region PR includes a position where the exposure light EL emitted from the emission surface 26 of the projection optical system PL (terminal optical element 25) can be irradiated.

  In the present embodiment, among the plurality of optical elements of the projection optical system PL, at least the terminal optical element 25 is disposed in the first space 11. In the present embodiment, the optical path of the exposure light EL emitted from the exit surface 26 of the last optical element 25 is disposed in the first space 11. That is, in the present embodiment, the first space 11 includes an optical path on the image plane side of the projection optical system PL, and includes at least a part of the optical path of the exposure light EL incident on the substrate P.

  The substrate stage 2 is movable in the first space 11 while holding the substrate P. The substrate stage 2 has a substrate holding part 2H that holds the substrate P in a releasable manner. In the present embodiment, the substrate P is held on the upper side (+ Z side) of the substrate holding part 2H. In the present embodiment, the substrate holding unit 2H holds the substrate P so that the surface (exposure surface) of the substrate P and the XY plane are substantially parallel.

  The substrate stage 2 is movable on the guide surface 27G of the third surface plate 27. The guide surface 27G (third surface plate 27) is arranged in the first space 11. The substrate stage 2 is movable to the projection region PR (a position where the exposure light EL from the projection optical system PL can be irradiated) on the guide surface 27G. The guide surface 27G is substantially parallel to the XY plane. The third surface plate 27 is supported on the support surface FL via the vibration isolator 28.

  The substrate stage 2 is movable on the guide surface 27G in the first space 11 by the operation of the drive system 20. In the present embodiment, the drive system 20 includes a planar motor for moving the substrate stage 2 on the guide surface 27G. The planar motor for moving the substrate stage 2 includes, for example, a movable element 2M disposed on the substrate stage 2 and a fixed surface disposed on the third surface plate 27 as disclosed in US Pat. No. 6,452,292. And a child 27C. In the present embodiment, the mover 2M includes a coil array, and the stator 27C includes a magnet array. The substrate stage 2 can be moved in six directions including the X axis, the Y axis, the Z axis, the θX, the θY, and the θZ directions by the operation of the drive system 20 including the planar motor.

  The liquid immersion member 5 is disposed in the vicinity of the last optical element 25. The liquid immersion member 5 forms an immersion space so that the optical path of the exposure light EL between the terminal optical element 25 and the substrate P (substrate stage 2) disposed in the projection region PR is filled with the liquid LQ. The immersion space is a portion (space, region) filled with the liquid LQ. The liquid immersion member 5 has a lower surface 29 that can face an object. An immersion space is formed by the liquid LQ held between the lower surface 29 and the object. An example of the liquid immersion member 5 is disclosed in, for example, US Patent Application Publication No. 2007/0132976.

  The positions of the mask stage 1 and the substrate stage 2 are measured by an interferometer system (not shown). The position of the surface of the substrate P held on the substrate stage 2 is detected by a focus / leveling detection system (not shown). When executing the exposure process of the substrate P or when executing a predetermined measurement process, the control device 7 drives the drive systems 10 and 20 based on the measurement result of the interferometer system and the detection result of the focus / leveling detection system. The position control of the mask stage 1 (mask M) and the substrate stage 2 (substrate P) is executed.

  The first opening 30 is formed at each of a plurality of predetermined positions of the chamber body 4. The first opening 30 has a predetermined size. For example, when performing maintenance of the exposure apparatus EX, an operator or the like enters the internal space 3 through the first opening 30. The first opening 30 has a size that allows an operator or the like to move. In addition, maintenance equipment for maintaining the exposure apparatus EX, a maintenance tool, and the like can enter the internal space 3 through the first opening 30. In the following description, the first opening 30 is appropriately referred to as an entrance / exit 30.

  At least during exposure light EL irradiation, the entrance / exit 30 is closed by the first opening / closing member 31. By closing the doorway 30, the internal space 3 including the first, second, and third spaces 11, 12, and 13 is substantially closed. In the present embodiment, at least a part of the air conditioner 21 is disposed in the first space 11, at least a part of the air conditioner 22 is disposed in the second space 12, and at least a part of the air conditioner 23 is the third. It is arranged in the space 13. Each of the air conditioners 21, 22, and 23 includes a temperature adjustment device that can adjust the temperature of the gas, a filter unit that can remove foreign matters in the gas, and the like. Each of the air conditioners 21, 22, 23 is clean in the first, second, third space 11, 12, 13 in order to control the environment of the first, second, third space 11, 12, 13. A temperature-controlled gas is supplied.

  In the present embodiment, the control device 7 controls the air conditioners 21, 22, and 23 when the entrance 30 is closed by the first opening / closing member 31 and the internal space 3 is substantially closed, The pressure in the space 3 is set to be, for example, about 10 Pa higher than the pressure in the external space 100. The external space 100 is a space outside the chamber body 4 and is, for example, a part of the space in the clean room. In the present embodiment, the pressure in the external space 100 is approximately atmospheric pressure. Note that the pressure in the external space 100 may be higher or lower than the atmospheric pressure. Since the pressure in the internal space 3 is higher than the pressure in the external space 100, the pressure difference prevents the gas in the external space 100 from flowing into the internal space 3. In addition, foreign matter in the external space 100 is prevented from entering the internal space 3.

  In the present embodiment, the control device 7 controls the air conditioners 21, 22, and 23, and the cleanliness of the first space 11 among the first, second, and third spaces 11, 12, and 13 is the highest. In addition, the environment of the first, second, and third spaces 11, 12, and 13 is controlled so that the cleanness of the third space 13 is higher than the cleanness of the second space 12.

  In the present embodiment, the control device 7 controls the air conditioners 21, 22, and 23 so that the pressure in the first space 11 is the highest among the first, second, and third spaces 11, 12, and 13. The environment of the first, second, and third spaces 11, 12, and 13 is adjusted so that the pressure in the third space 13 is higher than the pressure in the second space 12.

  Among the first, second, and third spaces 11, 12, and 13, the first, second, and second spaces have the highest degree of cleanliness in the first space 11 and the highest pressure in the first space 11. By controlling the environment of the three spaces 11, 12, and 13, the gas in the second and third spaces 12 and 13 flows into the first space 11, and the gas in the external space 100 flows into the first space 11. Is suppressed. Further, foreign matter such as the external space 100 is prevented from entering the first space 11.

  In the present embodiment, the terminal optical element 25 that emits the exposure light EL and the substrate P can be held and moved to a position where the exposure light EL emitted from the terminal optical element 25 can be irradiated in the first space 11. A substrate stage 2 is arranged. Therefore, it is possible to irradiate the substrate P with the exposure light EL while suppressing the entry of foreign matter into the first space 11.

  FIG. 2 is a perspective view showing the appearance of the chamber device 6. As shown in FIG.1 and FIG.2, in this embodiment, the 1st opening / closing member 31 which can close the entrance / exit 30 is a door member. In the following description, the first opening / closing member 31 is appropriately referred to as a door member 31.

  A plurality of doorways 30 are provided. The chamber body 4 has an entrance / exit 30 facing the first space 11, an entrance / exit 30 facing the second space 12, and an entrance / exit 30 facing the third space 13. The door member 31 is provided at each of the plurality of entrances 30. Each door member 31 is provided with a handle (knob) 32 that is operated when the doorway 30 is opened. Moreover, the chamber apparatus 6 is provided in the chamber main body 4, and is provided with the hinge mechanism 70 which supports the door member 31 rotatably. When the handle 32 is pulled, the door member 31 rotates and the doorway 30 is opened.

  Next, the exhaust mechanism 40 will be described. The exhaust mechanism 40 discharges at least a part of the gas in the internal space 3 to the external space 100 in conjunction with the operation of opening the entrance 30.

  In the present embodiment, the exhaust mechanism 40 includes a handle 32 that is provided on the door member 31 and is operated when the doorway 30 is opened. In a state where the door member 31 closes the entrance / exit 30, the handle 32 is disposed on the external space 100 side. In conjunction with the operation of the handle 32 for opening the doorway 30, at least a part of the gas in the internal space 3 is discharged.

  FIG. 3 is a side sectional view showing the state of the door member 31 and the handle 32 when the doorway 30 is closed, and FIG. 4 is a front view. 5 is a side sectional view showing a state in which at least a part of the gas in the internal space 3 is discharged by operating the handle 32, and FIG. 6 is a front view.

  3, 4, 5, and 6, the exhaust mechanism 40 includes an opening (through hole) 41 provided in the door member 31 and a second opening / closing member 42 that can close the opening 41. The opening 41 is sufficiently smaller than the entrance / exit 30. The exhaust mechanism 40 opens the opening 41 and discharges at least part of the gas in the internal space 3 from the opening 41 to the external space 100.

  In the present embodiment, the second opening / closing member 42 is a plate member connected to the handle 32. In the present embodiment, the second opening / closing member 42 includes a first plate member 42 </ b> A facing the inner surface 31 </ b> A of the door member 31 facing the inner space 3, and a first plate member 42 </ b> A facing the outer surface 31 </ b> B of the door member 31 facing the outer space 100. 2 plate member 42B. The first and second plate members 42 </ b> A and 42 </ b> B are connected to the handle 32. The handle 32 is rotatably supported by a support mechanism 33 provided on the door member 31. As the handle 32 rotates, the first and second plate members 42 </ b> A and 42 </ b> B also rotate with the handle 32. Moreover, in this embodiment, the door member 31 is provided with the cover member 34 arrange | positioned in the position facing the 2nd plate member 42B. The cover member 34 is disposed so as not to prevent the rotation of the handle 32 and the first and second plate members 42A and 42B.

  Each of the first and second plate members 42A and 42B has openings 43A and 43B at predetermined positions. In the present embodiment, the openings 43A and 43B are approximately the same size as the opening 41. The cover member 34 has an opening 44 at a predetermined position.

  As shown in FIGS. 3 and 4, when the doorway 30 is closed by the door member 31 and the handle 32 is disposed at a predetermined position, the first and second plate members 42 </ b> A and 42 </ b> B close the opening 41. Be placed. Thereby, the internal space 3 is substantially closed, and the gas in the internal space 3 is suppressed from being discharged to the external space 100 through the entrance 30 and the opening 41. In a state where the doorway 30 is closed by the door member 31 and the opening 41 is closed by the first and second plate members 42A and 42B, the control device 7 controls the air conditioners 21, 22, and 23 to 3 is made higher than the pressure in the external space 100.

  In the present embodiment, the opening 41 is opened by operating the handle 32. As shown in FIGS. 5 and 6, in order to open the doorway 30, for example, an operator operates the handle 32 to rotate. When the handle 32 rotates, the first and second plate members 42A and 42B rotate together with the handle 32. As the first and second plate members 42A and 42B rotate, the position of the opening 41 formed in the door member 31 and the openings 43A and 43B formed in the first and second plate members 42A and 42B. The position matches. Further, the positions of the openings 41, 43A, 43B and the position of the opening 44 of the cover member 34 coincide with each other. Thereby, at least a part of the gas in the internal space 3 is discharged to the external space 100 through the openings 43A, 41, 43B, and 44. Thereby, the pressure difference between the internal space 3 and the external space 100 becomes small.

  Thus, in the present embodiment, at least a part of the gas in the internal space 3 is discharged in conjunction with the operation of the handle 32 for opening the entrance 30. Thereby, before the door member 31 leaves | separates from the entrance / exit 30 (before the entrance / exit 30 is open | released), the pressure difference of the internal space 3 and the external space 100 can be made small. Therefore, the operator can smoothly separate the door member 31 from the doorway 30 by pulling the handle 32 after the pressure difference between the internal space 3 and the external space 100 becomes small.

  Next, an example of the operation of the exposure apparatus EX will be described.

  In order to execute exposure of the substrate P, the substrate P before exposure is loaded onto the substrate stage 2 arranged at the substrate replacement position. In addition, when the substrate P after exposure is held on the substrate stage 2, the operation of unloading the substrate P after the exposure is performed, and then the operation of loading the substrate P before the exposure is performed. Thereafter, the exposure processing of the substrate P is started. When executing the exposure processing of the substrate P, the control device 7 makes the terminal optical element 25 and the liquid immersion member 5 and the substrate stage 2 face each other, and the optical path between the terminal optical element 25 and the substrate P is filled with the liquid LQ. An immersion space is formed as described above. The control device 7 irradiates the substrate P with the exposure light EL from the mask M illuminated with the exposure light EL by the illumination system IL via the projection optical system PL and the liquid LQ. Thereby, the substrate P is exposed with the exposure light EL, and an image of the pattern of the mask M is projected onto the substrate P.

  At least during the exposure of the substrate P, the entrance / exit 30 is closed by the door member 31 and the internal space 3 is substantially closed. At least during the exposure of the substrate P, the control device 7 controls the air conditioners 21, 22, and 23 to make the pressure in the internal space 3 higher than the pressure in the external space 100. The control device 7 irradiates the exposure light EL in the internal space 3 when the doorway 30 is closed.

  The exposure apparatus EX of the present embodiment is a scanning exposure apparatus (so-called scanning stepper) that projects an image of the pattern of the mask M onto the substrate P while synchronously moving the mask M and the substrate P in a predetermined scanning direction. is there. In the present embodiment, the scanning direction (synchronous movement direction) of the substrate P is the Y-axis direction, and the scanning direction (synchronous movement direction) of the mask M is also the Y-axis direction. The control device 7 moves the substrate P in the Y-axis direction with respect to the projection region PR of the projection optical system PL, and in the illumination region IR of the illumination system IL in synchronization with the movement of the substrate P in the Y-axis direction. On the other hand, the substrate P is irradiated with the exposure light EL through the projection optical system PL and the liquid LQ in the immersion space on the substrate P while moving the mask M in the Y-axis direction.

  After the exposure of the substrate P is completed, the control device 7 moves the substrate stage 2 holding the exposed substrate P to the substrate exchange position and executes an operation of unloading the substrate P from the substrate stage 2. Thereafter, the same processing as described above is repeated.

  Maintenance of the exposure apparatus EX is executed at a predetermined timing. In order to maintain the exposure apparatus EX, the operator performs an operation for entering the internal space 3. That is, the worker starts an operation of opening the doorway 30.

  As maintenance, for example, when exchanging the last optical element 25, an operation of opening the entrance 30 facing the first space 11 is performed. The maintenance is not limited to the replacement of the last optical element 25. As maintenance, for example, cleaning of the last optical element 25, replacement of the liquid immersion member 5, and cleaning of the liquid immersion member 5 can be performed.

  In order to enter the first space 11, the operator operates to rotate the handle 32 of the door member 31 that closes the doorway 30 facing the first space 11. By the rotation of the handle 32, the positions of the openings 43A and 43B of the first and second plate members 42A and 42B coincide with the position of the opening 41 of the door member 31, and the opening 41 is opened. By opening the opening 41, at least a part of the gas in the internal space 3 is discharged to the external space 100 through the openings 43A, 41, 43B, and 44. Thereby, before the door member 31 leaves | separates from the entrance / exit 30, the pressure difference of the internal space 3 and the external space 100 becomes small.

  The operator rotates the handle 32 to reduce the pressure difference between the internal space 3 and the external space 100, and then pulls the handle 32 to release the door member 31 from the doorway 30. Since the door member 31 is moved after the pressure difference between the internal space 3 and the external space 100 becomes small, the operator can smoothly perform the opening operation of the doorway 30.

  After the entrance / exit 30 is opened, the operator can smoothly enter the internal space 3 through the entrance / exit 30. An operator enters the internal space 3 and performs maintenance of the exposure apparatus EX. Note that maintenance equipment, maintenance tools, and the like may enter the internal space 3 from the entrance 30.

  After the maintenance is completed, the doorway 30 is closed by the door member 31. Further, the opening 41 is closed by the first and second plate members 42A and 42B. After the doorway 30 and the opening 41 are closed, the environment of the internal space 3 is controlled by the air conditioners 21, 22, and 23. Thereafter, an exposure process for the substrate P is executed.

  As described above, according to the present embodiment, the exhaust mechanism 40 that discharges at least a part of the gas in the internal space 3 is provided in conjunction with the operation of opening the entrance / exit 30, and therefore enters the internal space 3. Can be smoothly executed. Therefore, maintenance can be performed satisfactorily. In addition, since a decrease in maintenance workability is suppressed, a decrease in operating rate of the exposure apparatus EX can be suppressed. Therefore, a decrease in device productivity can be suppressed.

  For example, when the entrance / exit 30 is to be opened in a state where the pressure difference between the internal space 3 and the external space 100 is large, the movement (position) of the door member 31 is caused by the pressure difference between the internal space 3 and the external space 100. ) May not be well controlled. Further, due to the pressure difference between the internal space 3 and the external space 100, it may be difficult to move the door member 31 smoothly. Further, due to the pressure difference between the internal space 3 and the external space 100, the door member 31 may move vigorously in the direction away from the doorway 30. Thus, there is a possibility that the opening / closing operation of the doorway 30 cannot be executed smoothly. As a result, there is a possibility that malfunctions may occur, such as workability being lowered or impact being applied to the exposure apparatus EX.

  According to the present embodiment, the pressure difference between the internal space 3 and the external space 100 is reduced by the exhaust mechanism 40 before the door member 31 moves away from the doorway 30 (before the doorway 30 is opened). The opening / closing operation of the entrance / exit 30 can be performed smoothly.

  In the present embodiment, since the pressure in the first space 11 in which the terminal optical element 25 and the substrate stage 2 are arranged is high, when the doorway 30 facing the first space 11 is opened, the doorway 30 is opened. It is effective to discharge at least part of the gas in the first space 11 in conjunction with the opening operation.

<Second Embodiment>
Next, a second embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  7 and 8 are diagrams illustrating an example of the exhaust mechanism 401 according to the second embodiment. An exhaust mechanism 401 according to the second embodiment is a modification of the exhaust mechanism 40 according to the first embodiment described above. The exhaust mechanism 40 according to the first embodiment discharges at least part of the gas in the internal space 3 to the external space 100 in conjunction with the operation of the handle 32. The exhaust mechanism 401 according to the second embodiment is provided on the door member 31 and has a keyhole 52 into which a key 53 is inserted. When opening the doorway 30, the key 53 is inserted into the keyhole 52, and the key 53 is operated. In conjunction with the operation of the key 53 for opening the doorway 30, at least part of the gas in the internal space 3 is discharged to the external space 100.

  FIG. 7 is a front view showing the state of the door member 31 and the key 53 when the doorway 30 is closed, and FIG. 8 shows that at least part of the gas in the internal space 3 is discharged by operating the key 53. It is a front view which shows the state which exists. In the present embodiment, the exhaust mechanism 401 includes an opening (through hole) 41 provided in the door member 31 and the first and second plates that can close the opening 41, as in the exhaust mechanism 40 described in the first embodiment. Members 42A and 42B. Each of the first and second plate members 42A and 42B has openings 43A and 43B at predetermined positions. Further, the door member 31 includes a cover member 34 disposed at a position facing the second plate member 42B. The cover member 34 has an opening 44 at a predetermined position.

  As shown in FIG. 7, when the doorway 30 is closed by the door member 31 and the key 53 is disposed at a predetermined position, the first and second plate members 42 </ b> A and 42 </ b> B are disposed so as to close the opening 41. . Thereby, the internal space 3 is substantially closed, and the gas in the internal space 3 is suppressed from being discharged to the external space 100 through the entrance 30 and the opening 41. In a state where the doorway 30 is closed by the door member 31 and the opening 41 is closed by the first and second plate members 42A and 42B, the control device 7 controls the air conditioners 21, 22, and 23 to 3 is made higher than the pressure in the external space 100.

  In the present embodiment, the opening 41 is opened by operating the key 53 inserted into the keyhole 52. In the present embodiment, when the key 53 inserted into the keyhole 52 is operated so as to rotate, the first and second plate members 42 </ b> A and 42 </ b> B also rotate together with the key 53.

  As shown in FIG. 8, in order to open the entrance / exit 30, for example, an operator operates the key 53 inserted into the keyhole 52 to rotate. When the key 53 rotates, the first and second plate members 42 </ b> A and 42 </ b> B rotate with the key 53. As the first and second plate members 42A and 42B rotate, the position of the opening 41 formed in the door member 31 and the openings 43A and 43B formed in the first and second plate members 42A and 42B. The position matches. Further, the positions of the openings 41, 43A, 43B and the position of the opening 44 of the cover member 34 coincide with each other. Thereby, at least a part of the gas in the internal space 3 is discharged to the external space 100 through the openings 43A, 41, 43B, and 44.

  Thus, in the present embodiment, at least a part of the gas in the internal space 3 is discharged in conjunction with the operation of the key 53 for opening the entrance 30. In addition, the pressure difference between the internal space 3 and the external space 100 is reduced before the door member 31 leaves the entrance 30. Therefore, the operator can smoothly separate the door member 31 from the doorway 30 by pulling the handle 32 after the pressure difference between the internal space 3 and the external space 100 becomes small.

  As described above, also in the present embodiment, the exhaust mechanism 401 that exhausts at least a part of the gas in the internal space 3 is provided in conjunction with the operation of opening the entrance / exit 30, and therefore enters the internal space 3. Can be smoothly executed.

<Third Embodiment>
Next, a third embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 9 is a perspective view showing an example of the exhaust mechanism 402 according to the third embodiment. In FIG. 9, the chamber device 6 includes a handle 32 that is provided on the door member 31 and is operated when the doorway 30 is opened, a lock mechanism 60 that restricts the movement of the handle 32 when the doorway 30 is closed, and a lock mechanism 60. And a button 62 that is operated when the restriction of the handle 32 is released. In a state where the door member 31 closes the entrance / exit 30, the handle 32 is disposed on the outer space 100 side, and the button 62 is disposed on the outer space 100 (outer surface 31 </ b> B side). The lock mechanism 60 includes a convex member 61 disposed at a position in contact with the handle 32. The convex member 61 is movably supported by the door member 31. The door member 31 has a concave portion 31U, and at least a part of the convex member 61 can be disposed in the concave portion 31U. The convex member 61 moves so as to protrude from the outer surface 31B of the door member 31 and is disposed at a position where it can come into contact with the handle 32, and moves to the inside of the concave portion 31U of the door member 31, It is possible to change from one of the states in which the contact is impossible to the other. The movement of the convex member 61 is interlocked with the operation of the button 62. When the button 62 is pressed, the convex member 61 moves to a position where it cannot contact the handle 32.

  When the doorway 30 is opened, the button 62 is pushed by an operator, for example. When the button 62 is pressed, the restriction of the movement of the handle 32 by the lock mechanism 60 is released. After the restriction of the movement of the handle 32 is released and the handle 32 is operated to rotate, the handle 32 is pulled so that the door member 31 moves away from the doorway 30, whereby the door member 31 moves away from the doorway 30. 30 is opened.

  In the present embodiment, the exhaust mechanism 402 includes a button 62. By opening the button 62, the opening 41 provided in the door member 31 is opened.

  FIG. 10 is a side sectional view showing the state of the door member 31 and the button 62 when the doorway 30 is closed. FIG. 11 shows that at least a part of the gas in the internal space 3 is discharged by operating the button 62. It is a sectional side view which shows the state.

  10 and 11, the exhaust mechanism 402 is connected to the plate member 42 </ b> C via an opening (through hole) 41 provided in the door member 31, a plate member 42 </ b> C capable of closing the opening 41, and a rod member 63. Button 62. The plate member 42 </ b> C is disposed so as to face the inner surface 31 </ b> A of the door member 31 facing the internal space 3. The opening 41 is sufficiently smaller than the entrance / exit 30. The exhaust mechanism 402 opens the opening 41 and discharges at least a part of the gas in the internal space 3 from the opening 41 to the external space 100. The handle 32 is rotatably supported by a support mechanism 33 provided on the door member 31.

  The button 62 has a flange 62F. The handle 32 has a flange 32F. A spring member 64 is disposed between the flange 62F and the flange 32F. The spring member 64 applies a force to the button 62 so that the button 62 is separated from the door member 31 (outer surface 31B). The door member 31 is provided with a stopper member 65 that restricts the button 62 from being excessively separated from the door member 31. When the spring member 64 applies force to the button 62, the plate member 42C connected to the button 62 via the rod member 63 comes into contact with the inner surface 31A. That is, in the present embodiment, the spring member 64 applies force to the plate member 42C so that the plate member 42C contacts the inner surface 31A.

  As shown in FIG. 10, when the doorway 30 is closed by the door member 31 and the button 62 is not pressed, the plate member 42 </ b> C contacts the inner surface 31 </ b> A and closes the opening 41. Thereby, the internal space 3 is substantially closed, and the gas in the internal space 3 is suppressed from being discharged to the external space 100 through the entrance 30 and the opening 41. In a state where the doorway 30 is closed by the door member 31 and the opening 41 is closed by the plate member 42C, the control device 7 controls the air conditioners 21, 22, and 23 to control the pressure in the internal space 3 to the external space 100. Higher than the pressure.

  In the present embodiment, the opening 41 is opened by operating the button 62. As shown in FIG. 11, in order to open the entrance 30, for example, an operator operates the button 62 to be pressed. When the button 62 is pressed, the convex member 61 moves to the inside of the concave portion 31U together with the button 62 to release the restriction on the movement of the handle 32, the plate member 42C is separated from the inner surface 31A, and the opening 41 is opened.

  In the present embodiment, the button 62 and the convex member 61 are connected via a link mechanism (not shown), and the convex member 61 moves when the button 62 moves. The plate member 42C and the convex member 61 may be connected via a link mechanism. Further, the convex member 61 is provided with an actuator capable of moving the convex member 61, the button 62 and the actuator are electrically connected using wiring, and the actuator is driven according to the operation of the button 62, The convex member 61 may be moved.

  When the plate member 42 </ b> C is separated from the inner surface 31 </ b> A and the opening 41 is opened, at least a part of the gas in the internal space 3 is discharged to the external space 100 through the opening 41. Thereby, before the doorway 30 is opened, that is, before the door member 31 moves away from the doorway 30, the pressure difference between the internal space 3 and the external space 100 becomes small.

  Thus, in this embodiment, at least a part of the gas in the internal space 3 is discharged in conjunction with the operation of the button 62 for opening the entrance 30. In addition, the pressure difference between the internal space 3 and the external space 100 is reduced before the door member 31 leaves the entrance 30. Therefore, the operator can pull the handle 32 and release the door member 31 from the entrance / exit 30 after the pressure difference between the internal space 3 and the external space 100 becomes small.

  As described above, also in the present embodiment, the exhaust mechanism 402 that exhausts at least a part of the gas in the internal space 3 is provided in conjunction with the operation of opening the entrance 30. The operation for entering the vehicle can be smoothly executed.

  For example, as illustrated in FIG. 12, a button 620 may be disposed on a lever member 320 provided on the door member 31. At least a part of the lever member 320 is provided so as to be movable with respect to the door member 31. By pressing the button 620, the restriction on the movement of the lever member 320 is released. Further, by pressing the button 620, at least a part of the gas in the internal space 3 is discharged to the external space 100. Then, the entrance / exit 30 can be opened by pulling the lever member 320 between the hands.

<Fourth embodiment>
Next, a fourth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  13 and 14 are diagrams illustrating an example of the exhaust mechanism 403 according to the fourth embodiment. The exhaust mechanism 403 has an opening 41 </ b> D for exhausting at least part of the gas in the internal space 3 to the external space 100. In the present embodiment, the opening 41 </ b> D is provided in the chamber body 4. In the present embodiment, the exhaust mechanism 403 includes an opening 41D provided in the chamber body 4 and a plate member 42D that can close the opening 41D. The plate member 42D is rotatably supported by the support portion 66. The plate member 42D has an opening 43D at a predetermined position. The plate member 42D is covered with a cover member 34D. The cover member 34D has an opening 44D at a predetermined position.

  The chamber device 6 includes a door member 31 that can close the doorway 30. The door member 31 includes a handle 32 that is operated when the doorway 30 is opened. In the present embodiment, the handle 32 is connected to the plate member 42 </ b> D via the link mechanism 67. By operating the handle 32, the plate member 42 </ b> D rotates through the link mechanism 67.

  13 is a view showing a state in which the opening 41D is closed, and FIG. 14 is a view showing a state in which the opening 41D is opened and at least a part of the gas in the internal space 3 is discharged to the external space 100. is there.

  As shown in FIG. 13, when the doorway 30 is closed by the door member 31 and the handle 32 is disposed at a predetermined position, the plate member 42D is disposed so as to close the opening 41D. Thereby, the internal space 3 is substantially closed, and the gas in the internal space 3 is suppressed from being discharged to the external space 100 through the opening 41D.

  As illustrated in FIG. 14, the plate member 42 </ b> D is made to coincide with the opening 41 </ b> D and the opening 43 </ b> D via the link mechanism 67 by operating the handle 32 to rotate in order to open the doorway 30. Rotate. At this time, the openings 41D and 43D coincide with the opening 44D. Thereby, the opening 41D is opened, and at least a part of the gas in the internal space 3 is discharged to the external space 100 through the openings 43D, 41D, and 44D. Thereby, before the doorway 30 is opened, that is, before the door member 31 moves away from the doorway 30, the pressure difference between the internal space 3 and the external space 100 becomes small.

  Thus, in the present embodiment, the opening 41D arranged in the chamber body 4 is opened via the link mechanism 67 in conjunction with the operation of the handle 32 for opening the doorway 30. Accordingly, at least a part of the gas in the internal space 3 is discharged, and the pressure difference between the internal space 3 and the external space 100 is reduced before the door member 31 is separated from the entrance / exit 30. Therefore, the operator can pull the handle 32 and release the door member 31 from the entrance / exit 30 after the pressure difference between the internal space 3 and the external space 100 becomes small.

  As described above, also in the present embodiment, the exhaust mechanism 403 that exhausts at least a part of the gas in the internal space 3 is provided in conjunction with the operation of opening the entrance 30. The operation for entering the vehicle can be smoothly executed.

  In the present embodiment, the handle 32 and the plate member 42D are connected via the link mechanism 67, and the plate member 42D is moved via the ring mechanism 67 in accordance with the operation of the handle 32, as an example. As described above, for example, an actuator capable of rotating the plate member 42D is provided on the plate member 42D, the handle 32 and the actuator are electrically connected using wiring, and the actuator is driven according to the operation of the handle 32. Then, the plate member 42D may be rotated.

<Fifth Embodiment>
Next, a fifth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 15 is a front view showing an example of the exhaust mechanism 404 according to the fifth embodiment. In FIG. 15, the chamber device 6 includes an entrance / exit 30 provided in the chamber body 4, a first opening / closing member 310 that can close the entrance / exit 30, and a chamber body 4 that can move the first opening / closing member 310. And a support mechanism 80 for supporting.

  In the present embodiment, the first opening / closing member 310 is a plate-like member, and can be closed at the entrance / exit 30 by being disposed at a position facing the entrance / exit 30. In the following description, the first opening / closing member 310 is appropriately referred to as a shutter member 310.

  The support mechanism 80 is provided in the chamber body 4, and a guide mechanism 81 that guides the shutter member 310 from a first position where the shutter member 310 is disposed when the doorway 30 is closed to a second position different from the first position; A rotation support mechanism 82 is provided in the chamber body 4 and rotatably supports the shutter member 310. In the example shown in FIG. 15, the surface (outer surface) of the shutter member 310 disposed at the first position is substantially parallel to the YZ plane. The guide mechanism 81 guides the shutter member 310 in the Z-axis direction in the YZ plane. That is, the second position is a position different from the first position in the Z-axis direction. In the present embodiment, the second position is a position on the + Z side of the first position.

  The guide mechanisms 81 are disposed on the + Y side and the −Y side of the entrance / exit 30, respectively. The shutter member 310 has plate-like convex portions 311 at the + X side end and the −X side end. The guide mechanism 81 guides the movement of the convex portion 311 in the Z-axis direction. The guide mechanism 81 guides the shutter member 310 so that the shutter member 310 is not separated from the entrance / exit 30 by a predetermined distance or more. In the present embodiment, the guide mechanism 81 guides the shutter member 310 so that the shutter member 310 is not substantially separated from the entrance / exit 30 in the X-axis direction. The sizes of the convex portion 311 and the guide mechanism 81 in the Z-axis direction are smaller than the distance between the first position and the second position.

  The rotation support mechanism 82 is disposed on the + Z side of the guide mechanism 81. The shutter member 310 has a rod portion 312 at the upper end of the + Y side end and the upper end of the −Y side end. The rotation support mechanism 82 has an opening through which the rod portion 312 can enter and a support portion that supports the rod portion 312 in a rotatable manner. When the shutter member 310 moves from the first position to the second position, the rod portion 312 enters the support portion through the opening and is supported by the support portion. The rotation support mechanism 82 supports the upper end of the shutter member 310 disposed at the second position so as to be rotatable in the θX direction.

  16 and 17 are diagrams illustrating an example of an operation when opening the entrance 30. When the doorway 30 is opened, the shutter member 310 disposed at the first position is moved (lifted) in the + Z direction. Thus, a gap 41G is formed between the lower end of the shutter member 310 moved in the + Z direction from the first position and the edge 4G of the chamber body 4 that defines the entrance / exit 30. At least a part of the gas in the internal space 3 is discharged to the external space 100 from the gap 41G. Thereby, the pressure difference between the internal space 3 and the external space 100 becomes small. Thus, in this embodiment, the exhaust mechanism 404 includes the guide mechanism 81 that guides the shutter member 310 from the first position to the second position, and the gap 41G formed between the shutter member 310 and the edge 4G. To discharge at least part of the gas in the internal space 3.

  In the present embodiment, the gap 41 </ b> G is formed in a state where the convex portion 311 is supported by the guide mechanism 81 at least in a part until the shutter member 310 moves from the first position to the second position. In the present embodiment, at least immediately after the gap 41G is formed, the movement of the shutter member 310 in the X-axis direction (in the direction away from the entrance / exit 30) is restricted by the guide mechanism 81. As described above, the exhaust mechanism 404 including the guide mechanism 81 forms the gap 41G between the shutter member 310 and the edge 4G while suppressing the shutter member 310 from being separated from the entrance / exit 30 in the X-axis direction. At least a part of the gas in the space 3 can be discharged to the external space 100.

  Then, by arranging the shutter member 310 at the second position, the rod portion 312 is supported by the rotation support mechanism 82 as shown in FIG. Further, as shown in FIG. 16, the convex portion 311 is detached from the guide mechanism 81. That is, when the shutter member 310 is disposed at the second position, the restriction on the movement of the shutter member 310 by the guide mechanism 81 in the X-axis direction is released.

  Then, with the rod member 312 supported by the rotation support mechanism 82, for example, the operator lifts the lower end of the shutter member 310. As a result, the shutter member 310 (rod portion 312) rotates in the θX direction, and the doorway 30 is opened as shown in FIG. An operator or the like can enter the internal space 3 through the doorway 30.

  As described above, also in the present embodiment, the gap 41G is formed in conjunction with the operation of opening the entrance 30 and at least a part of the gas in the internal space 3 is discharged. Can be smoothly executed. In the present embodiment, the shutter member 310 is moved in the direction away from the entrance / exit 30 (X-axis direction) by the guide mechanism 81 until the gap 41G is formed and at least part of the gas in the internal space 3 is discharged. To be regulated. Therefore, when the doorway 30 is opened, the shutter member 310 is prevented from moving vigorously in the direction away from the doorway 30.

<Sixth Embodiment>
Next, a sixth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 18 is a perspective view showing a part of the chamber apparatus 6 according to the sixth embodiment. In FIG. 18, the chamber device 6 can close the entrance / exit 30 of the chamber body 4, and the door member 31 that forms the substantially closed internal space 3 inside the chamber body 4 by closing the entrance / exit 30. And a damping mechanism 90 that attenuates the force that moves the door member 31 away from the entrance 30 when the entrance 30 is opened.

  In the present embodiment, the damping mechanism 90 is a shock absorber, and includes an outer cylinder 91 and a piston rod 92 connected to a piston that moves inside the outer cylinder 91. A part of the outer cylinder is connected to the chamber body 4 via the first connecting mechanism 93, and a part of the piston rod 92 is connected to the door member 31 via the second connecting mechanism 94. The door member 31 is rotatably supported by a hinge mechanism 70 provided in the chamber body 4.

  Also in the present embodiment, the opening / closing operation of the entrance / exit 30 for entering the internal space 3 can be executed smoothly. For example, when the entrance / exit 30 is to be opened in a state where the pressure difference between the internal space 3 and the external space 100 is large, the door member 31 moves away from the entrance / exit 30 due to the pressure difference between the internal space 3 and the external space 100. The power to move away increases. Further, due to the pressure difference between the internal space 3 and the external space 100, the door member 31 may move vigorously in the direction away from the doorway 30. In that case, there is a possibility that the opening / closing operation of the entrance / exit 30 cannot be executed smoothly. In the present embodiment, since the damping mechanism 90 is provided, the force that moves the door member 31 away from the doorway 30 can be attenuated. Thereby, the opening operation | movement of the entrance / exit 30 can be performed smoothly.

<Seventh embodiment>
Next, a seventh embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 19 is a perspective view showing an example of the chamber device 6 according to the seventh embodiment. In FIG. 19, the chamber apparatus 6 can close the entrance / exit 30 of the chamber body 4, and the shutter member 350 that forms the substantially closed internal space 3 inside the chamber body 4 by closing the entrance / exit 30. And a damping mechanism 90 that attenuates the force that moves the shutter member 350 away from the entrance 30 when the entrance 30 is opened. In the present embodiment, the shutter member 350 includes a first portion 351 and a second portion 352 connected to the first portion 351 via the hinge mechanism 72. The damping mechanism 90 is provided in the first portion 351. Further, the first portion 351 is rotatably supported by the chamber body 4 via a hinge mechanism 701.

  The chamber device 6 includes a guide mechanism 800 that is provided in the chamber body 4 and guides the second portion 352. The guide mechanism 800 guides the end of the second portion 352 in the Y-axis direction.

  Also in the present embodiment, the opening / closing operation of the entrance / exit 30 for entering the internal space 3 can be executed smoothly. Also in this embodiment, since the damping mechanism 90 is provided, it is possible to attenuate the force that moves the shutter member 350 away from the entrance / exit 30. Further, the guide mechanism 800 and the hinge mechanism 72 prevent the shutter member 350 from being separated from the entrance / exit 30 by a predetermined distance or more. For example, even if the end of the second portion 352 moves to the + Y side end of the entrance / exit 30, the distance from the entrance / exit 30 to the hinge mechanism 72 is set to the width H1 (H2) of the first portion 351 (second portion 352). The following can be suppressed.

  In the first to seventh embodiments described above, the case where the pressure in the internal space 3 is higher than the pressure in the external space 100 when the doorway 30 is closed has been described as an example. The pressure may be lower than the pressure in the space 100. In that case, at least a part of the gas in the external space 100 can be caused to flow into the internal space 3 by the exhaust mechanism in conjunction with the operation of opening the entrance 30. For example, in the case where the exposure apparatus EX is an EUV exposure apparatus that irradiates the exposure light EL in the internal space 3 adjusted to a vacuum state, after the gas is caused to flow into the internal space 3 by the exhaust mechanism during maintenance of the exposure apparatus EX By performing the operation for opening the entrance / exit 30, the operation for opening the entrance / exit 30 can be executed smoothly.

  In the above-described embodiment, the optical path on the exit side (image plane side) of the terminal optical element 25 of the projection optical system PL is filled with the liquid LQ. However, this is disclosed in, for example, International Publication No. 2004/019128. As described above, the projection optical system PL in which the optical path on the incident side (object plane side) of the terminal optical element 25 is also filled with the liquid LQ can be employed.

  In each embodiment described above, water is used as the liquid LQ, but a liquid other than water may be used. The liquid LQ is a film such as a photosensitive material (photoresist) that is transmissive to the exposure light EL, has a high refractive index with respect to the exposure light EL, and forms the surface of the projection optical system PL or the substrate P. Stable ones are preferable. For example, hydrofluoroether (HFE), perfluorinated polyether (PFPE), fomblin oil, or the like can be used as the liquid LQ. In addition, various fluids such as a supercritical fluid can be used as the liquid LQ.

  As the substrate P in each of the above embodiments, not only a semiconductor wafer for manufacturing a semiconductor device, but also a glass substrate for a display device, a ceramic wafer for a thin film magnetic head, or an original mask or reticle used in an exposure apparatus. (Synthetic quartz, silicon wafer) or the like is applied.

  As the exposure apparatus EX, in addition to the step-and-scan type scanning exposure apparatus (scanning stepper) that scans and exposes the pattern of the mask M by moving the mask M and the substrate P synchronously, the mask M and the substrate P Can be applied to a step-and-repeat type projection exposure apparatus (stepper) in which the pattern of the mask M is collectively exposed while the substrate P is stationary and the substrate P is sequentially moved stepwise.

  Furthermore, in the step-and-repeat exposure, after the reduced image of the first pattern is transferred onto the substrate P using the projection optical system while the first pattern and the substrate P are substantially stationary, the second pattern With the projection optical system, the reduced image of the second pattern may be partially overlapped with the first pattern and collectively exposed on the substrate P (stitch type batch exposure apparatus). ). Further, the stitch type exposure apparatus can be applied to a step-and-stitch type exposure apparatus in which at least two patterns are partially transferred on the substrate P, and the substrate P is sequentially moved.

  Further, as disclosed in, for example, US Pat. No. 6,611,316, two mask patterns are synthesized on a substrate via a projection optical system, and one shot area on the substrate is obtained by one scanning exposure. The present invention can also be applied to an exposure apparatus that performs double exposure almost simultaneously. The present invention can also be applied to proximity type exposure apparatuses, mirror projection aligners, and the like.

  The present invention also relates to a twin-stage type exposure having a plurality of substrate stages as disclosed in US Pat. No. 6,341,007, US Pat. No. 6,208,407, US Pat. No. 6,262,796, and the like. It can also be applied to devices.

  Further, for example, as disclosed in US Pat. No. 6,897,963, US Patent Application Publication No. 2007/0127006, etc., a reference stage on which a reference mark is formed, and / or a substrate stage for holding a substrate, and / or The present invention can also be applied to an exposure apparatus that includes various photoelectric sensors and a measurement stage that does not hold a substrate to be exposed. The present invention can also be applied to an exposure apparatus that includes a plurality of substrate stages and measurement stages.

  The type of the exposure apparatus EX is not limited to an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern on the substrate P, but an exposure apparatus for manufacturing a liquid crystal display element or a display, a thin film magnetic head, an image sensor (CCD). ), An exposure apparatus for manufacturing a micromachine, a MEMS, a DNA chip, a reticle, a mask, or the like.

  In the above-described embodiment, a light-transmitting mask in which a predetermined light-shielding pattern (or phase pattern / dimming pattern) is formed on a light-transmitting substrate is used. As disclosed in US Pat. No. 6,778,257, a variable shaped mask (also called an electronic mask, an active mask, or an image generator) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed. ) May be used. Further, a pattern forming apparatus including a self-luminous image display element may be provided instead of the variable molding mask including the non-luminous image display element.

  In each of the above embodiments, the exposure apparatus provided with the projection optical system PL has been described as an example. However, the present invention can be applied to an exposure apparatus and an exposure method that do not use the projection optical system PL. Even when the projection optical system PL is not used, the exposure light is irradiated onto the substrate via an optical member such as a lens, and an immersion space is formed in a predetermined space between the optical member and the substrate. .

  Further, as disclosed in, for example, International Publication No. 2001/035168, an exposure apparatus (lithography system) that exposes a line and space pattern on the substrate P by forming interference fringes on the substrate P. The present invention can also be applied to.

  The exposure apparatus EX of the above-described embodiment is manufactured by assembling various subsystems including the respective constituent elements recited in the claims of the present application so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. Is done. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. When the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  As shown in FIG. 20, a microdevice such as a semiconductor device includes a step 201 for designing a function / performance of the microdevice, a step 202 for producing a mask (reticle) based on the design step, and a substrate as a base material of the device. Substrate processing step 204 including substrate processing (exposure processing) including exposing the substrate with exposure light using a mask pattern and developing the exposed substrate according to the above-described embodiment. The device is manufactured through a device assembly step (including processing processes such as a dicing process, a bonding process, and a packaging process) 205, an inspection step 206, and the like.

  In each of the above-described embodiments, the case where the chamber apparatus 6 is applied to the exposure apparatus EX has been described as an example. However, in each of the above-described embodiments, various substrate processing apparatuses for manufacturing a micro device are used. The chamber apparatus 6 described can be applied. For example, the chamber apparatus 6 described in each of the above-described embodiments is applied to an inkjet apparatus that forms a device pattern on a substrate by supplying ink droplets to the substrate from an ejection port of an inkjet head as a substrate processing apparatus. Can do. The operation of supplying ink to the substrate is performed in the internal space of the chamber apparatus when the doorway is closed. When maintaining the inkjet apparatus, at least a part of the gas in the internal space is discharged in conjunction with the operation of opening the doorway.

  Further, the substrate processing apparatus may be a CVD apparatus that forms a predetermined film on a substrate, for example. In that case, the operation of forming a film on the substrate is performed in the interior space when the doorway is closed. Further, the substrate processing apparatus may be at least one of a coating apparatus that applies a photosensitive material to an exposed substrate and a developing apparatus that develops the exposed substrate.

  Note that the requirements of the above-described embodiments can be combined as appropriate. Some components may not be used. In addition, as long as permitted by law, the disclosure of all published publications and US patents related to the exposure apparatus and the like cited in the above-described embodiments and modifications are incorporated herein by reference.

  DESCRIPTION OF SYMBOLS 2 ... Substrate stage, 3 ... Internal space, 4 ... Chamber main body, 6 ... Chamber apparatus, 21, 22, 23 ... Air conditioner, 30 ... Doorway, 31 ... Door member, 32 ... Handle, 40 ... Exhaust mechanism, 41 ... Opening , 60 ... Lock mechanism, 62 ... Button, 70 ... Hinge mechanism, 72 ... Hinge mechanism, 80 ... Support mechanism, 81 ... Guide mechanism, 82 ... Rotation support mechanism, 90 ... Damping mechanism, 100 ... External space, 310 ... Shutter member , P ... substrate, EL ... exposure light, EX ... exposure apparatus

Claims (17)

A first opening / closing member capable of closing a first opening of the chamber body, and forming an internal space substantially closed inside the chamber body by closing the first opening;
A chamber apparatus comprising: an exhaust mechanism that exhausts at least part of the gas in the internal space in conjunction with an operation of opening the first opening.   The chamber apparatus of Claim 1 provided with the air conditioner which makes the pressure of the said interior space higher than the pressure of an exterior space when the said 1st opening is closed.   The exhaust mechanism exhausts at least a part of the gas in the internal space so that a pressure difference between the internal space and the external space is reduced before the first opening / closing member is separated from the first opening. Item 3. The chamber apparatus according to Item 2.   The exhaust mechanism includes a second opening smaller than the first opening and a second opening / closing member capable of closing the second opening, which is provided in at least one of the chamber main body and the first opening / closing member. The chamber apparatus as described in any one of Claims 1-3 which open | release a 2nd opening and discharge | emit at least one part of the gas of the said interior space from the said 2nd opening. The exhaust mechanism includes a handle provided on the first opening / closing member and operated when the first opening is opened,
The chamber apparatus according to claim 4, wherein the second opening is opened by operating the handle. A handle provided on the first opening and closing member and operated when the first opening is opened;
A locking mechanism for restricting the movement of the handle when the first opening is closed,
The exhaust mechanism includes a button operated when the restriction is released by the lock mechanism,
The chamber apparatus according to claim 4, wherein the second opening is opened by operating the button.   The exhaust mechanism is provided in the chamber body, and is substantially the same as a surface of the first opening / closing member disposed at the first position from a first position at which the first opening / closing member is disposed when the first opening is closed. The chamber that includes a guide mechanism that guides at least a part of the first opening / closing member to a second position in a predetermined parallel direction, and that defines the first opening and the first opening / closing member moved from the first position. The chamber apparatus as described in any one of Claims 1-3 which discharge | emits at least one part of the gas of the said interior space from the clearance gap with the edge of a main body.   The chamber device according to claim 7, wherein the guide mechanism guides the first opening / closing member so that the first opening / closing member is not separated from the first opening by a predetermined distance or more.   The chamber apparatus as described in any one of Claims 1-8 which has a support mechanism provided in the said chamber main body, and supporting at least one part of a said 1st opening / closing member rotatably.   The chamber apparatus as described in any one of Claims 1-9 provided with the attenuation | damping mechanism in which the force which moves the said 1st opening / closing member away from the said 1st opening is attenuated. An opening / closing member capable of closing the first opening of the chamber body and forming an internal space substantially closed inside the chamber body by closing the first opening;
A chamber device comprising: a damping mechanism that attenuates a force that moves the opening / closing member away from the first opening when the first opening is opened. An air conditioner for making the pressure in the internal space higher than the pressure in the external space when the first opening is closed;
The chamber apparatus according to claim 11, wherein at least a part of the moving force is based on a pressure difference between the internal space and the external space. A chamber apparatus according to any one of claims 1 to 12, comprising:
A substrate processing apparatus for processing a substrate in the internal space when the first opening is closed. An exposure apparatus that exposes a substrate with exposure light,
A chamber apparatus according to any one of claims 1 to 12,
An exposure apparatus that irradiates the exposure light in the internal space when the first opening is closed. An optical member for emitting the exposure light;
A substrate stage that is movable while holding the substrate at a position where the exposure light emitted from the optical member can be irradiated;
The exposure apparatus according to claim 14, wherein the optical member and the substrate stage are arranged in the internal space. Exposing the substrate using the exposure apparatus according to claim 14 or 15,
Developing the exposed substrate; and a device manufacturing method.   16. A maintenance method for an exposure apparatus, comprising: opening the first opening of the chamber apparatus provided in the exposure apparatus according to claim 14.

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