JP2010147041A - Substrate manufacture transfer facility - Google Patents

Substrate manufacture transfer facility Download PDF

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JP2010147041A
JP2010147041A JP2008319101A JP2008319101A JP2010147041A JP 2010147041 A JP2010147041 A JP 2010147041A JP 2008319101 A JP2008319101 A JP 2008319101A JP 2008319101 A JP2008319101 A JP 2008319101A JP 2010147041 A JP2010147041 A JP 2010147041A
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carry
transfer
substrate
speed
transfer speed
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JP5264458B2 (en
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Kazuma Ishikawa
一真 石川
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Fuji Corp
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Fuji Machine Manufacturing Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate manufacture transfer facility that can carry a substrate into/out of the facility with no shocks applied to the substrate and can increase the transfer speed in the facility to reduce the time for substrate transfer. <P>SOLUTION: The substrate manufacture transfer facility 1 has a carry-in end P1, a process performance position P5 and a carry-out end P8 and includes a process performing device, a process transfer device 4 and a control device. The control device gradually increases a process transfer speed V of the process transfer device 4 to a higher speed than a carry-out transfer speed VM of a carry-out transfer device 8 on the carry-out end P1 side to transfer a processed substrate from the process performance position P5, gradually decreases the speed V to the carry-out transfer speed VM before the processed substrate reaches the carry-out end P8 to match the speed V with the carry-out transfer speed VM to carry the processed substrate out of the facility, then matches the speed V with a carry-in transfer speed VL of a carry-in transfer device 7 on the carry-in end P1 side to carry a substrate into the facility, gradually increases the speed V to a higher speed than the carry-in transfer speed VL after the substrate has passed the carry-in end P1 and then gradually decreases the speed V to stop the substrate at the process performance position P5. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は基板製造移送設備に関し、より詳細には、基板を搬入、移送、および搬出する移送装置とその移送速度を制御する制御装置に関する。   The present invention relates to a substrate manufacturing transfer facility, and more particularly to a transfer device for carrying in, transferring and unloading a substrate and a control device for controlling the transfer speed.

多数の電子部品が実装された基板を製造するため、所定の製造工程を施す基板製造移送設備を列設して基板製造ラインを構築することが一般的になっている。基板製造移送設備の間は中間移送装置で連結される構成が多いが、設備同士が直結される構成もある。基板製造移送設備には、基板にクリーム状のはんだを塗布するスクリーン印刷機や、基板上に電子部品を載置する部品実装機、はんだを固着させるリフロー機、電子部品の実装状態を検査する検査機などがある。各基板製造移送設備は、製造工程を実施する主たる工程実施装置に加えて、基板を搬入端から工程実施位置を経て搬出端に移送する工程移送装置を備えるのが一般的である。この工程移送装置では、基板を工程実施位置に正確に停止させることが重要であり、本願出願人は特許文献1に基板停止位置制御方法および装置の例を開示している。特許文献1では、基板をその大きさに応じた固有移動距離だけ移送して目標位置に停止させるとともに、基板カメラで位置ズレ量を求めている。   In order to manufacture a substrate on which a large number of electronic components are mounted, it has become common to construct a substrate manufacturing line by arranging substrate manufacturing transfer equipment for performing a predetermined manufacturing process. There are many configurations in which the substrate manufacturing and transfer facilities are connected by an intermediate transfer device, but there are also configurations in which the facilities are directly connected. For board manufacturing and transfer equipment, screen printing machines that apply cream-like solder to boards, component mounting machines that place electronic components on boards, reflow machines that fix solder, inspections that check the mounting status of electronic components There are machines. In general, each substrate manufacturing / transferring facility includes a process transfer device that transfers a substrate from the carry-in end to the carry-out end through the process execution position, in addition to the main process execution device that performs the manufacturing process. In this process transfer apparatus, it is important to accurately stop the substrate at the process execution position, and the applicant of the present application discloses an example of a substrate stop position control method and apparatus in Patent Document 1. In Patent Document 1, the substrate is transported by a specific movement distance corresponding to its size and stopped at a target position, and a positional deviation amount is obtained by a substrate camera.

特許文献1に限らず基板製造移送設備内の工程移送装置では、停止位置を正確に制御しかつ工程所要時間を短縮するために移送速度は可変とされ、さらに、基板の位置に応じて移送速度を制御する制御装置が付属されるのが一般的である。一方、基板製造移送設備の間を連結する中間移送装置には、一定の移送速度での移送と停止のみの切り替えが可能な簡易装置が多用されている。これら設備内外の移送装置には、基板を載置して輪転するコンベア装置が一般的に用いられる。可変速の設備内移送装置と一定速の中間移送装置とが混在する製造ラインにおいては従来、前者の移送速度を後者のそれに一致させ、搬入および搬出に際して基板が乗り移るとき速度差が生じないようにしている。また、中間移送装置を介さない直結構成を含む製造ラインにおいては、最も低速の工程移送装置にあわせて他の工程移送装置を制御している。仮に速度差があると、移送装置間を乗り移る基板にショックが加わり、基板上に載置された電子部品に瞬間的な荷重が加わって位置ずれが生じたりするおそれがあるからである。
特開2004−228326号公報
In the process transfer apparatus in the substrate manufacturing transfer facility as well as Patent Document 1, the transfer speed is variable in order to accurately control the stop position and shorten the time required for the process, and further, the transfer speed according to the position of the substrate. In general, a control device for controlling the control is attached. On the other hand, as an intermediate transfer device that connects between substrate manufacturing transfer facilities, a simple device that can be switched between a transfer at a constant transfer speed and a stop is frequently used. A conveyor device that places a substrate and rotates is generally used as a transfer device inside or outside the facility. In a production line in which variable speed in-equipment transfer equipment and constant speed intermediate transfer equipment are mixed, the former transfer speed is made to match that of the latter so that there is no difference in speed when substrates are transferred during loading and unloading. ing. In addition, in a production line including a direct connection configuration without an intermediate transfer device, other process transfer devices are controlled in accordance with the slowest process transfer device. This is because if there is a speed difference, a shock may be applied to the board that moves between the transfer devices, and an instantaneous load may be applied to the electronic components placed on the board, resulting in a positional shift.
JP 2004-228326 A

ところで、上記の従来の技術では、可変速の設備内移送装置の移送速度は、上流側および下流側の中間移送装置の移送速度に制約されて、低く設定されていた。また、中間移送装置を介さない直結構成においては、最も低速の工程移送装置によって製造ラインの移送速度が制約されていた。したがって、高速の移送速度の機能を有する工程移送装置では、その機能が活かされずに、設備内での基板の移送に多くの所要時間を費やしていた。   By the way, in the above-described conventional technology, the transfer speed of the variable speed in-facility transfer device is set to be low, constrained by the transfer speed of the upstream and downstream intermediate transfer devices. Moreover, in the direct connection configuration without the intermediate transfer device, the transfer speed of the production line is restricted by the slowest process transfer device. Therefore, in the process transfer apparatus having the function of the high transfer speed, the function is not utilized, and much time is required for transferring the substrate in the facility.

本発明は、上記課題に鑑みてなされたもので、基板を設備内へ搬入および搬出するときに基板にショックが加わることなく、さらに設備内の移送速度を高速として基板の移送に要する時間を短縮した基板製造移送設備を提供することを解決すべき課題とする。   The present invention has been made in view of the above problems, and when a substrate is carried into and out of the facility, the substrate is not shocked, and the transfer speed in the facility is increased to shorten the time required for substrate transfer. An object to be solved is to provide a substrate manufacturing and transporting facility.

上記課題を解決する請求項1に係る基板製造搬送設備の発明は、基板を搬入する搬入端と、前記搬入端から移送し停止させた基板に所定の製造工程を施す工程実施位置と、前記製造工程を施した基板を前記工程実施位置から移送し搬出する搬出端とを有し、かつ、前記工程実施位置で前記基板に所定の前記製造工程を施す工程実施装置と、前記基板を前記搬入端から前記工程実施位置を経て前記搬出端に可変な工程移送速度で移送可能な工程移送装置と、前記工程移送装置の工程移送速度を制御する制御装置とを備える基板製造搬送設備であって、前記制御装置は、前記搬入端の上流側に直列に配置されて前記基板を移送可能な搬入移送装置の一定の搬入移送速度に前記工程移送装置の工程移送速度を一致させて前記基板を前記搬入移送装置から前記搬入端に搬入させ、前記基板の後端が前記搬入端を通過すると工程移送速度を前記搬入移送速度より高速の高速移送速度に漸増し、その後に工程移送速度を漸減して前記基板を前記工程実施位置に停止させることを特徴とする。   The invention of the substrate manufacturing and transporting facility according to claim 1 for solving the above-mentioned problems includes a loading end for loading a substrate, a process execution position for applying a predetermined manufacturing process to the substrate transferred from the loading end and stopped, and the manufacturing A process execution apparatus for carrying out a predetermined manufacturing process on the substrate at the process execution position; and a carry-out end for transferring and unloading the substrate subjected to the process from the process execution position. A substrate transfer apparatus including a process transfer device that can be transferred to the unloading end through the process execution position at a variable process transfer speed, and a control device that controls the process transfer speed of the process transfer device, The control device is arranged in series upstream of the carry-in end, and makes the process transfer speed of the process transfer apparatus coincide with a constant carry-in transfer speed of the carry-in transfer apparatus capable of transferring the substrate, and carries the substrate into the carry-in transfer apparatus When the rear end of the substrate passes through the carry-in end, the process transfer speed is gradually increased to a high-speed transfer speed higher than the carry-in transfer speed, and then the process transfer speed is gradually reduced to remove the substrate. The process is stopped at the process execution position.

請求項2に係る発明は、基板を搬入する搬入端と、前記搬入端から移送し停止させた基板に所定の製造工程を施す工程実施位置と、前記製造工程を施した基板を前記工程実施位置から移送し搬出する搬出端とを有し、かつ、前記工程実施位置で前記基板に所定の前記製造工程を施す工程実施装置と、前記基板を前記搬入端から前記工程実施位置を経て前記搬出端に可変な工程移送速度で移送可能な工程移送装置と、前記工程移送装置の工程移送速度を制御する制御装置とを備える基板製造搬送設備であって、前記制御装置は、前記搬出端の下流側に直列に配置されて前記製造工程が施された加工済基板を移送可能な搬出移送装置の一定の搬出移送速度より高速の高速移送速度に前記工程移送装置の工程移送速度を漸増して前記工程実施位置から前記加工済基板を移送させ、その後に前記加工済基板の前端が前記搬出端に到達する前に工程移送速度を前記搬出移送速度に漸減し、工程移送速度を前記搬出移送速度に一致させて前記加工済基板を前記搬出端から前記搬出移送装置に搬出させることを特徴とする。   According to a second aspect of the present invention, there is provided a carry-in end for carrying a substrate, a process execution position for applying a predetermined manufacturing process to the substrate transferred and stopped from the carry-in end, and the substrate subjected to the production process as the process execution position. An unloading end for transferring and unloading the substrate, and a process execution apparatus for applying the predetermined manufacturing process to the substrate at the process execution position; and the unloading end of the substrate from the carry-in end through the process execution position. A substrate manufacturing and transport facility comprising a process transfer device that can be transferred at a variable process transfer speed and a control device that controls the process transfer speed of the process transfer device, wherein the control device is downstream of the carry-out end. The process transfer speed of the process transfer device is gradually increased to a high transfer speed higher than a constant transfer speed of a carry-out transfer apparatus capable of transferring processed substrates that are arranged in series and subjected to the manufacturing process. Implementation location The processed substrate is transferred, and then the process transfer speed is gradually reduced to the unloading transfer speed before the front end of the processed substrate reaches the unloading end, and the process transfer speed is made to coincide with the unloading transfer speed. The processed substrate is carried out from the carry-out end to the carry-out transfer device.

請求項3に係る発明は、基板を搬入する搬入端と、前記搬入端から移送し停止させた基板に所定の製造工程を施す工程実施位置と、前記製造工程を施した基板を前記工程実施位置から移送し搬出する搬出端とを有し、かつ、前記工程実施位置で前記基板に所定の前記製造工程を施す工程実施装置と、前記基板を前記搬入端から前記工程実施位置を経て前記搬出端に可変な工程移送速度で移送可能な工程移送装置と、前記工程移送装置の工程移送速度を制御する制御装置とを備える基板製造移送設備であって、前記制御装置は、前記搬出端の下流側に直列に配置されて前記製造工程が施された加工済基板を移送可能な搬出移送装置の一定の搬出移送速度より高速の高速移送速度に前記工程移送装置の工程移送速度を漸増して前記工程実施位置から前記加工済基板を移送させ、その後に前記加工済基板の前端が前記搬出端に到達する前に工程移送速度を前記搬出移送速度に漸減し、工程移送速度を前記搬出移送速度に一致させて前記加工済基板を前記搬出端から前記搬出移送装置に搬出させてから、前記搬入端の上流側に直列に配置されて前記基板を移送可能な搬入移送装置の一定の搬入移送速度に前記工程移送装置の工程移送速度を一致させて前記基板を前記搬入移送装置から前記搬入端に搬入させ、前記基板の後端が前記搬入端を通過すると工程移送速度を前記搬入移送速度より高速の高速移送速度に漸増し、その後に工程移送速度を漸減して前記基板を前記工程実施位置に停止させることを特徴とする。   According to a third aspect of the present invention, there is provided a carry-in end for carrying a substrate, a process execution position for applying a predetermined manufacturing process to the substrate transferred and stopped from the carry-in end, and the substrate subjected to the production process as the process execution position. An unloading end for transferring and unloading the substrate, and a process execution apparatus for applying the predetermined manufacturing process to the substrate at the process execution position; and the unloading end of the substrate from the carry-in end through the process execution position. A substrate manufacturing transfer facility comprising: a process transfer device capable of transferring at a variable process transfer speed; and a control device for controlling the process transfer speed of the process transfer device, wherein the control device is downstream of the carry-out end. The process transfer speed of the process transfer device is gradually increased to a high transfer speed higher than a constant transfer speed of a carry-out transfer apparatus capable of transferring processed substrates that are arranged in series and subjected to the manufacturing process. Implementation location The processed substrate is transferred, and then the process transfer speed is gradually reduced to the unloading transfer speed before the front end of the processed substrate reaches the unloading end, and the process transfer speed is made to coincide with the unloading transfer speed. After the processed substrate is carried out from the carry-out end to the carry-out transfer device, the process transfer device is arranged at a constant carry-in transfer speed of the carry-in transfer device arranged in series upstream of the carry-in end and capable of transferring the substrate. When the substrate transfer is carried into the carry-in end from the carry-in transfer device, and the rear end of the substrate passes through the carry-in end, the process transfer speed is made higher than the carry-in transfer speed. The substrate is gradually increased and thereafter the process transfer speed is gradually decreased to stop the substrate at the process execution position.

請求項4に係る発明は、請求項1において、前記制御装置は、前記工程移送装置の工程移送速度を前記搬入移送速度に一致させて前記基板を前記搬入移送装置から前記搬入端に搬入させるのに並行して、前記製造工程が施された加工済基板を前記搬出端からその下流側に直列に配置されて前記加工済基板を前記搬入移送速度と同じ搬出移送速度で移送可能な搬出移送装置に搬出させ、前記基板の後端が前記搬入端を通過しかつ前記加工済基板の後端が前記搬出端を通過すると工程移送速度を前記高速移送速度に漸増する、ことを特徴とする。   According to a fourth aspect of the present invention, in the first aspect, the control device causes the process transfer speed of the process transfer device to coincide with the carry-in transfer speed so that the substrate is carried into the carry-in end from the carry-in transfer apparatus. In parallel, the processed substrate subjected to the manufacturing process is arranged in series downstream from the carry-out end so that the processed substrate can be transferred at the same carry-out transfer speed as the carry-in transfer speed. When the rear end of the substrate passes through the carry-in end and the rear end of the processed substrate passes through the carry-out end, the process transfer speed is gradually increased to the high-speed transfer speed.

請求項5に係る発明は、請求項1において、前記制御装置は、前記搬出端の下流側に直列に配置されて前記製造工程が施された加工済基板を移送可能な可変速搬出移送装置の可変な搬出移送速度を前記工程移送装置の工程移送速度に一致させ、あるいは、請求項2において、前記制御装置は、前記搬入端の上流側に直列に配置されて前記基板を移送可能な可変速搬入移送装置の可変な搬入移送速度を前記工程移送装置の工程移送速度に一致させることを特徴とする。   According to a fifth aspect of the present invention, in the first aspect, the control device is a variable-speed unloading and transporting device capable of transporting the processed substrate that is arranged in series downstream of the unloading end and subjected to the manufacturing process. The variable carry-out transfer speed is made to coincide with the process transfer speed of the process transfer device, or the control device according to claim 2, wherein the control device is arranged in series upstream of the carry-in end and can transfer the substrate. The variable carry-in transfer speed of the carry-in transfer apparatus is made to coincide with the process transfer speed of the process transfer apparatus.

請求項1に係る発明によると、工程移送装置の工程移送速度が搬入移送速度に一致した状態で、基板を搬入移送装置から搬入端に搬入することができる。したがって、基板が搬入移送装置から設備内の工程移送装置に乗り移るときの速度差がなく、基板にショックが加わることがない。   According to the first aspect of the present invention, the substrate can be carried from the carry-in transfer device to the carry-in end in a state where the process transfer speed of the process transfer device coincides with the carry-in transfer speed. Therefore, there is no difference in speed when the substrate is transferred from the carry-in transfer device to the process transfer device in the facility, and no shock is applied to the substrate.

また、基板の後端が搬入端を通過すると工程移送速度を搬入移送速度より高速の高速移送速度に漸増し、その後に工程移送速度を漸減して前記基板を前記工程実施位置に停止させることができる。したがって、基板が工程移送装置に完全に乗り移ったのちに工程移送速度は高速となり、設備内の移送の所要時間を短縮することができる。さらに、工程移送速度を漸増および漸減させるので、移送時のショックの発生はごくわずかである。   Further, when the rear end of the substrate passes the carry-in end, the process transfer speed is gradually increased to a high-speed transfer speed higher than the carry-in transfer speed, and then the process transfer speed is gradually reduced to stop the substrate at the process execution position. it can. Therefore, after the substrate is completely transferred to the process transfer device, the process transfer speed becomes high, and the time required for transfer in the facility can be shortened. Furthermore, since the process transfer rate is gradually increased and decreased, the occurrence of shock during transfer is negligible.

請求項2に係る発明によると、工程移送装置の工程移送速度を高速移送速度に漸増して工程実施位置から加工済基板を移送させ、その後に加工済基板の前端が搬出端に到達する前に工程移送速度を搬出移送速度に漸減することができる。したがって、加工済基板が搬出端に到達するまでの工程移送速度を高速として設備内の移送の所要時間を短縮することができる。さらに、工程移送速度を漸増および漸減させるので、移送時のショックの発生はごくわずかである。   According to the second aspect of the invention, the process transfer speed of the process transfer device is gradually increased to a high speed transfer speed to transfer the processed substrate from the process execution position, and then the front end of the processed substrate reaches the unloading end. The process transfer rate can be gradually reduced to the unloading transfer rate. Therefore, it is possible to shorten the time required for transfer in the facility by increasing the process transfer speed until the processed substrate reaches the carry-out end. Furthermore, since the process transfer rate is gradually increased and decreased, the occurrence of shock during transfer is negligible.

また、工程移送装置の工程移送速度が搬出移送速度に一致した状態で、加工済基板を搬出端から搬出移送装置に搬出することができる。したがって、加工済基板が設備内の工程移送装置から搬出移送装置に乗り移るときの速度差がなく、基板にショックが加わることがない。   Further, the processed substrate can be carried out from the carry-out end to the carry-out transfer device in a state where the process transfer speed of the process transfer device coincides with the carry-out transfer speed. Therefore, there is no speed difference when the processed substrate is transferred from the process transfer device in the facility to the carry-out transfer device, and no shock is applied to the substrate.

請求項3による発明では、請求項1および請求項2の両方の効果が得られる。すなわち、工程移送装置の工程移送速度が搬出移送速度に一致した状態で加工済基板を搬出端から搬出移送装置に搬出することができ、その後に工程移送速度が搬入移送速度に一致した状態で基板を搬入移送装置から搬入端に搬入することができる。したがって、搬入および搬出ともに速度差がない状態で基板を乗り移らせることができ、基板にショックが加わることがない。また、設備内での工程移送速度を高速とすることにより移送の所要時間を短縮し、工程移送速度を漸増および漸減させることにより移送時のショックの発生をごくわずかにできる。   In the invention according to claim 3, the effects of both claim 1 and claim 2 can be obtained. That is, the processed substrate can be carried out from the carry-out end to the carry-out transfer device in a state where the process transfer speed of the process transfer device matches the carry-out transfer speed, and then the substrate in a state where the process transfer speed matches the carry-in transfer speed. Can be carried into the carry-in end from the carry-in transfer device. Therefore, the substrate can be transferred in a state where there is no difference in speed in both carrying-in and carrying-out, and no shock is applied to the substrate. Further, the time required for transfer can be shortened by increasing the process transfer speed in the facility, and the occurrence of shock during transfer can be minimized by gradually increasing and decreasing the process transfer speed.

請求項4に係る発明によると、上流側の搬入移送装置の搬入移送速度と下流側の搬出移送装置の搬出移送速度とを一致させ、加工済基板の搬出と次の基板の搬入とを並行して行うことができ、工程の所要時間をさらに短縮することができる。また、次の基板が工程移送装置に完全に乗り移り、かつ加工済基板が搬出移送装置に完全に乗り移ったのちに工程移送速度を高速として、設備内の移送の所要時間を短縮することができる。   According to the invention of claim 4, the carry-in transfer speed of the upstream carry-in transfer apparatus and the carry-out transfer speed of the downstream carry-out transfer apparatus are matched to carry out the removal of the processed substrate and the carry-in of the next substrate in parallel. The time required for the process can be further shortened. In addition, after the next substrate is completely transferred to the process transfer device and the processed substrate is completely transferred to the carry-out transfer device, the process transfer speed can be increased to shorten the time required for transfer in the facility.

請求項5に係る発明では、搬入移送装置の搬入移送速度および搬出移送装置の搬出移送速度の一方は一定速度で、他方は可変速度となる。この他方の可変な移送速度を工程移送装置の工程移送速度に常に一致させて同期運転することができる。したがって、請求項1あるいは請求項2に係る発明と同様に搬入および搬出移送装置の一方と工程移送装置を移送速度差がない状態とし、他方と工程移送装置とを同期運転することによって移送速度差がない状態として基板を乗り移らせることができ、基板にショックが加わることがない。   In the invention according to claim 5, one of the carry-in transfer speed of the carry-in transfer apparatus and the carry-out transfer speed of the carry-out transfer apparatus is a constant speed, and the other is a variable speed. The other variable transfer speed can be synchronized with the process transfer speed of the process transfer apparatus. Accordingly, as in the invention according to claim 1 or 2, the transfer speed difference is obtained by setting one of the carry-in and carry-out transfer apparatuses and the process transfer apparatus to be in a state where there is no transfer speed difference, and synchronously operating the other and the process transfer apparatus. The substrate can be transferred in a state where there is no shock, and no shock is applied to the substrate.

本発明を実施するための最良の実施形態を、図1〜図5を参考にして説明する。図1は、一般的な基板製造ラインを模式的に説明する図である。基板製造ライン9は、上流側から順にストッカー91、スクリーン印刷機92、部品実装機1、リフロー機93、検査機94が基板製造移送設備として列設され、それぞれが中間移送装置95〜99で連結されて構成されている。   The best mode for carrying out the present invention will be described with reference to FIGS. FIG. 1 is a diagram schematically illustrating a general substrate production line. In the board production line 9, a stocker 91, a screen printing machine 92, a component mounting machine 1, a reflow machine 93, and an inspection machine 94 are arranged in order from the upstream side as board production transfer equipment, and are connected by intermediate transfer devices 95 to 99. Has been configured.

ストッカー91は、回路パターンが形成された基板を一時的に貯留するとともに順次供給位置913へ供給するストック装置911と、基板をストック装置911下方の供給位置913から図中右側の搬出端915に移送する工程移送装置916とを備えている。スクリーン印刷機92は、基板にクリーム状のはんだを塗布する印刷装置921と、図中左側の搬入端922から印刷装置921下方の印刷位置923を経て図中右側の搬出端925に移送する工程移送装置926とを備えている。部品実装機1は、基板に電子部品を載置する部品実装装置3と、図中左側の搬入端21から部品実装装置2下方の実装位置22を経て図中右側の搬出端23に移送する工程移送装置4とを備えている。リフロー機93は、はんだを固着させるリフロー装置931と、図中左側の搬入端932からリフロー装置931下方のリフロー位置933を経て図中右側の搬出端935に移送する工程移送装置936とを備えている。検査機94は、電子部品の実装状態を検査する検査装置941と、図中左側の搬入端942から検査装置941下方の検査位置943を経て図中右側の搬出端945に移送する工程移送装置946とを備えている。   The stocker 91 temporarily stores a substrate on which a circuit pattern is formed and sequentially supplies the substrate to the supply position 913, and transfers the substrate from the supply position 913 below the stock device 911 to the unloading end 915 on the right side in the figure. And a process transfer device 916. The screen printing machine 92 has a printing device 921 for applying cream-like solder to the substrate, and a process transfer for transferring from the carry-in end 922 on the left side in the drawing to the carry-out end 925 on the right side in the drawing through the printing position 923 below the printing device 921. Device 926. The component mounting machine 1 includes a component mounting device 3 for placing an electronic component on a board, and a process of transferring from a carry-in end 21 on the left side in the drawing to a carry-out end 23 on the right side in the drawing through a mounting position 22 below the component mounting device 2. And a transfer device 4. The reflow machine 93 includes a reflow device 931 for fixing the solder, and a process transfer device 936 for transferring from the left carry-in end 932 to the right carry-out end 935 in the drawing through the reflow position 933 below the reflow device 931. Yes. The inspection device 94 inspects the mounting state of the electronic component, and a process transfer device 946 for transferring from the carry-in end 942 on the left side in the drawing to the carry-out end 945 on the right side in the drawing through the inspection position 943 below the inspection device 941. And.

各設備91、92、1、93、94内の工程移送装置916、926、4、936、946は、基板を移送する工程移送速度が可変とされ、工程移送速度を制御する図略の制御装置がそれぞれ設けられている。一方、各中間移送装置95〜99は、基板を移送する移送速度が一定とされ、定速移送と停止の切り替えを制御する図略の制御装置がそれぞれ設けられている。   The process transfer devices 916, 926, 4, 936, and 946 in each of the facilities 91, 92, 1, 93, and 94 have variable process transfer speeds for transferring substrates, and control apparatuses (not shown) that control the process transfer speeds. Are provided. On the other hand, each of the intermediate transfer devices 95 to 99 has a constant transfer speed for transferring the substrate, and is provided with a control device (not shown) that controls switching between constant speed transfer and stop.

本発明は、上述のいずれの設備91、92、1、93、94にも適用することができ、第1実施形態として部品実装機1を例にして以降で詳細に説明する。図2は、第1実施形態の部品実装機1を模式的に説明する図である。図示されるように、部品実装機1は、基台2、部品実装装置3、工程移送装置4、制御装置5、3つのセンサ61〜63、を主要部材として構成されている。基台2は、各部位を配設するための構造材である。基台2の略中央には部品実装装置3が配設されており、その下方が工程実施位置すなわち実装位置22となっている。また、基台2の実装位置22と同じ高さの図中左端および右端は、基板を搬入および搬出する搬入端21および搬出端23となっている。   The present invention can be applied to any of the above-mentioned facilities 91, 92, 1, 93, 94, and will be described in detail below by taking the component mounter 1 as an example as the first embodiment. FIG. 2 is a diagram schematically illustrating the component mounter 1 according to the first embodiment. As shown in the figure, the component mounting machine 1 includes a base 2, a component mounting device 3, a process transfer device 4, a control device 5, and three sensors 61 to 63 as main members. The base 2 is a structural material for arranging each part. A component mounting apparatus 3 is disposed substantially at the center of the base 2, and below that is a process execution position, that is, a mounting position 22. Further, the left end and the right end in the figure at the same height as the mounting position 22 of the base 2 are a carry-in end 21 and a carry-out end 23 for carrying in and out the substrate.

部品実装装置3は、実装位置22に停止された基板Kに電子部品を載置する装置であり、図略の実装ヘッドなどを有する周知の装置が用いられている。また、部品実装装置3に電子部品を供給する図略の部品供給装置なども設けられている。   The component mounting apparatus 3 is an apparatus for placing an electronic component on the board K stopped at the mounting position 22, and a known apparatus having a mounting head (not shown) and the like is used. A component supply device (not shown) for supplying electronic components to the component mounting apparatus 3 is also provided.

工程移送装置4は、基板Kを搬入端21から実装位置22を経て搬出端23に移送する装置である。工程移送装置4は、搬入端21から搬出端23まで架け渡されて輪転する無端環状のコンベアベルト41と、コンベアベルト41を駆動するサーボモータ42とを備えている。サーボモータ42は回転数可変であり、コンベアベルト41の輪転速度すなわち工程移送速度Vは可変になっている。図2において、コンベアベルト41は通常時計回りに輪転し、載置された基板Kを搬入端21から図中右方の搬出端23に向けて移送する。   The process transfer device 4 is a device that transfers the substrate K from the carry-in end 21 to the carry-out end 23 via the mounting position 22. The process transfer device 4 includes an endless annular conveyor belt 41 that runs from the carry-in end 21 to the carry-out end 23 and rotates, and a servo motor 42 that drives the conveyor belt 41. The servo motor 42 is variable in rotation speed, and the rotation speed of the conveyor belt 41, that is, the process transfer speed V is variable. In FIG. 2, the conveyor belt 41 normally rotates in the clockwise direction and transfers the placed substrate K from the carry-in end 21 toward the right carry-out end 23 in the drawing.

3つのセンサ61〜63は、コンベアベルト41上における基板Kの有無を検出し、検出信号S1〜S3を出力するものである。検出信号S1〜S3は、基板Kが有るときにオンとなり、無いときにオフとなる。搬入端21の近くに配設された搬入端センサ61では、検出信号S1のオフ状態の継続により基板Kが到着していないことを検出できる。また、検出信号S1のオンからオフへの立下りにより、基板Kの後端KRの通過すなわち搬入完了を検出できる。搬出端23の手前に配設された搬出手前センサ62では、検出信号S2のオフからオンへの立ち上がりにより、基板Kの先端KFの到達を検出できる。搬出端23の近くに配設された搬出端センサ63では、検出信号S3のオンからオフへの立下りにより、基板Kの後端KRの通過すなわち搬出完了を検出できる。   The three sensors 61 to 63 detect the presence or absence of the substrate K on the conveyor belt 41 and output detection signals S1 to S3. The detection signals S1 to S3 are turned on when the substrate K is present, and are turned off when the substrate K is absent. The carry-in end sensor 61 disposed near the carry-in end 21 can detect that the substrate K has not arrived due to the continued OFF state of the detection signal S1. Further, the passage of the rear end KR of the substrate K, that is, the completion of loading can be detected by the fall of the detection signal S1 from on to off. The pre-unloading sensor 62 disposed in front of the unloading end 23 can detect the arrival of the front end KF of the substrate K when the detection signal S2 rises from off to on. The unloading end sensor 63 disposed near the unloading end 23 can detect the passage of the rear end KR of the substrate K, that is, unloading completion, by the fall of the detection signal S3 from ON to OFF.

制御装置5は、3つのセンサ61〜63の検出信号S1〜S3を参照しながら、サーボモータ42に駆動制御信号D1を出力して、工程移送速度Vを可変に制御するものである。制御装置5は、CPUや記憶部、入出力部などを有してソフトウェアで動作する電子制御装置を用いて構成することができる。   The control device 5 outputs the drive control signal D1 to the servo motor 42 while referring to the detection signals S1 to S3 of the three sensors 61 to 63 to variably control the process transfer speed V. The control device 5 can be configured using an electronic control device that has a CPU, a storage unit, an input / output unit, and the like and operates by software.

図1に示されるように、部品実装機1の上流側(図中左側)および下流側(図中右側)には、それぞれ中間移送装置96、97が連結配置されている。説明を明瞭化するため以降では、上流側の中間移送装置96を搬入移送装置7と呼び、下流側の中間移送装置97を搬出移送装置8と呼ぶ。搬入移送装置7は、図2に示されるように、時計回りに輪転する無端環状の搬入ベルト71と、搬入ベルト71を駆動する搬入モータ72と、搬入モータ72を制御する搬入制御装置73と、で構成されている。搬入ベルト71の図中右端は、搬入端21で工程移送装置4のコンベアベルト41の図中左端の直近に配置されており、載置された基板がスムーズに乗り移って搬入されるようになっている。搬入モータ72は回転数一定であり、搬入ベルト71の輪転速度すなわち搬入移送速度VLは一定になっている。搬入制御装置73は、基板実装機1の制御装置5と制御情報C2を交換しながら、搬入モータ72に駆動制御信号D2を出力して、定速移送と停止とを切り替えるようになっている。   As shown in FIG. 1, intermediate transfer devices 96 and 97 are connected and arranged on the upstream side (left side in the drawing) and the downstream side (right side in the drawing) of the component mounting machine 1, respectively. Hereinafter, for the sake of clarity, the intermediate transfer device 96 on the upstream side is referred to as the carry-in transfer device 7, and the intermediate transfer device 97 on the downstream side is referred to as the carry-out transfer device 8. As shown in FIG. 2, the carry-in transfer device 7 includes an endless annular carry-in belt 71 that rotates in a clockwise direction, a carry-in motor 72 that drives the carry-in belt 71, a carry-in control device 73 that controls the carry-in motor 72, It consists of The right end of the carry-in belt 71 in the drawing is arranged at the carry-in end 21 and in the immediate vicinity of the left end of the conveyor belt 41 of the process transfer device 4 in the drawing, so that the placed substrate can be smoothly transferred and loaded. Yes. The carry-in motor 72 has a constant rotation speed, and the rotation speed of the carry-in belt 71, that is, the carry-in transfer speed VL is constant. The carry-in control device 73 outputs a drive control signal D2 to the carry-in motor 72 while exchanging the control information C2 with the control device 5 of the substrate mounting machine 1, and switches between constant speed transfer and stop.

同様に、搬出移送装置8は、時計回りに輪転する無端環状の搬出ベルト81と、搬出ベルト81を駆動する搬出モータ82と、搬出モータ82を制御する搬出制御装置83と、で構成されている。搬出ベルト81の図中左端は、搬出端23で工程移送装置4のコンベアベルト41の図中右端の直近に配置されており、載置された基板がスムーズに乗り移って搬出されるようになっている。搬出モータ82は回転数一定であり、搬出ベルト81の輪転速度すなわち搬出移送速度VMは一定になっている。搬出制御装置83は、基板実装機1の制御装置5と制御情報C3を交換しながら、搬出モータ82に駆動制御信号D3を出力して、定速移送と停止とを切り替えるようになっている。   Similarly, the carry-out transfer device 8 includes an endless annular carry-out belt 81 that rotates clockwise, a carry-out motor 82 that drives the carry-out belt 81, and a carry-out control device 83 that controls the carry-out motor 82. . The left end of the carry-out belt 81 in the drawing is arranged at the carry-out end 23 and in the immediate vicinity of the right end in the drawing of the conveyor belt 41 of the process transfer device 4 so that the placed substrate can be smoothly transferred and carried out. Yes. The carry-out motor 82 has a constant rotation speed, and the rotation speed of the carry-out belt 81, that is, the carry-out transfer speed VM is constant. The carry-out control device 83 outputs a drive control signal D3 to the carry-out motor 82 while exchanging the control information C3 with the control device 5 of the substrate mounting machine 1, and switches between constant speed transfer and stop.

次に、上述のように構成された第1実施形態の部品実装機1の動作、作用について、図3〜図5を参考にして説明する。なお、搬入移送速度VLが搬出移送速度VMよりも小さい場合について説明するが、大小関係が逆になっていても本発明は適用できる。   Next, the operation and action of the component mounter 1 of the first embodiment configured as described above will be described with reference to FIGS. Although the case where the carry-in transfer speed VL is smaller than the carry-out transfer speed VM will be described, the present invention can be applied even if the magnitude relationship is reversed.

図3は、部品実装機1における基板Kの移送速度特性図であり、横軸は移送方向における基板Kの先端位置、縦軸は工程移送速度Vを示している。図中で、P1は搬入端21に相当する搬入端位置、P5は実装位置22、P8は搬出端23に相当する搬出端位置を示している。また、P2は工程移送装置4上で搬入端位置P1から基板長さLだけ実装位置22に近付いた位置、すなわち、基板Kの後端KRが搬入端位置P1を通過する搬入完了位置であり、この搬入完了位置P2は搬入端センサ61の検出信号S1の立下りにより検出される。P7は工程移送装置上4で搬出端位置P8の手前の位置であり、この位置P7は基板Kの先端KFが搬出手前センサ62に到来して検出信号S2が立ち上がることにより検出される。P9は搬出移送装置8上で搬出端位置P8から基板長さLだけ離れた位置、すなわち、基板Kの後端KRが搬出端位置P8を通過する搬出完了位置であり、この搬出完了位置P9は搬出端センサ63の検出信号S3の立下りにより検出される。   FIG. 3 is a transfer speed characteristic diagram of the substrate K in the component mounting machine 1, the horizontal axis indicates the tip position of the substrate K in the transfer direction, and the vertical axis indicates the process transfer speed V. In the drawing, P1 represents a carry-in end position corresponding to the carry-in end 21, P5 represents a mounting position 22, and P8 represents a carry-out end position corresponding to the carry-out end 23. P2 is a position on the process transfer device 4 that is close to the mounting position 22 from the loading end position P1 by the substrate length L, that is, a loading completion position where the rear end KR of the substrate K passes the loading end position P1, This carry-in completion position P2 is detected by the fall of the detection signal S1 of the carry-in end sensor 61. P7 is a position before the unloading end position P8 on the process transfer device 4 and this position P7 is detected when the leading edge KF of the substrate K arrives at the unloading front sensor 62 and the detection signal S2 rises. P9 is a position on the unloading / transferring device 8 that is separated from the unloading end position P8 by the substrate length L, that is, the unloading completion position where the rear end KR of the substrate K passes the unloading end position P8. It is detected by the fall of the detection signal S3 of the carry-out end sensor 63.

図示されるように、基板Kは、搬入移送装置7から搬入端位置P1を経て搬入完了位置P2に至るまで搬入移送速度VL(工程移送速度V=VL)で移送される。次に基板Kは、搬入完了位置P2から工程移送速度Vが漸増されて位置P3から位置P4までの間は高速移送速度VH(工程移送速度V=VH)で移送され、その後に位置P4から工程移送速度Vが漸減されて実装位置P5に停止される。実装位置P5で電子部品が実装された基板Kは、工程移送速度Vが漸増されて実装位置P5から移送され、位置P6から位置P7までの間は高速移送速度VH(工程移送速度V=VH)で移送される。次に基板Kは、位置P7から工程移送速度Vが漸減されて搬出端位置P8に到達する前に搬出移送速度VM(工程移送速度V=VM)となり、搬出移送速度VMで搬出端位置P8から搬出完了位置P9に搬出される。   As shown in the drawing, the substrate K is transferred from the carry-in transfer device 7 through the carry-in end position P1 to the carry-in completion position P2 at the carry-in transfer speed VL (process transfer speed V = VL). Next, the substrate K is transferred at a high speed transfer speed VH (process transfer speed V = VH) from the position P3 to the position P4 after the process transfer speed V is gradually increased from the carry-in completion position P2, and then the process is started from the position P4. The transfer speed V is gradually reduced and stopped at the mounting position P5. The substrate K on which electronic components are mounted at the mounting position P5 is transferred from the mounting position P5 with the process transfer speed V gradually increased, and a high-speed transfer speed VH (process transfer speed V = VH) from the position P6 to the position P7. It is transported by. Next, the substrate K reaches the unloading transfer speed VM (process transfer speed V = VM) before reaching the unloading end position P8 by gradually decreasing the process transfer speed V from the position P7, and from the unloading end position P8 at the unloading transfer speed VM. It is unloaded to the unloading completion position P9.

図3の移送速度特性を実行するために、図4および図5に示される移送速度制御が行われる。図4は、電子部品が実装される前の実装前基板K1を搬入移送装置7から工程移送装置4の実装位置P5まで搬入、移送するときの移送速度制御方法を説明する図である。また、図5は、電子部品が実装された後の実装済基板K10を工程移送装置4の実装位置P5から搬出移送装置8まで移送、搬出するときの移送速度制御方法を説明する図である。   In order to implement the transfer speed characteristics of FIG. 3, the transfer speed control shown in FIGS. 4 and 5 is performed. FIG. 4 is a view for explaining a transfer speed control method for carrying in and transferring the pre-mounting substrate K1 before the electronic component is mounted from the carry-in transfer device 7 to the mounting position P5 of the process transfer device 4. FIG. 5 is a diagram for explaining a transfer speed control method for transferring and carrying the mounted substrate K10 after the electronic components are mounted from the mounting position P5 of the process transfer device 4 to the carry-out transfer device 8.

図4に示されるように、工程移送装置4上に基板がなくかつ搬入移送装置7上に実装前基板K1が載置されて搬入準備が整うと、工程移送装置4および搬入移送装置7は搬入移送速度VLで駆動される(1)。実装前基板K1は、搬入移送装置7上を移送されその先端KFが搬入端位置P1を越えて工程移送装置4に乗り移り、両移送装置4、7に速度差なしでまたがって載置された状態となる(2)。実装前基板K1の後端FRが搬入端位置P1に到達する(先端KFは搬入完了位置P2に到達)と、工程移送装置4の工程移送速度Vが徐々に加速されて漸増される(3)。この時点で、実装前基板K1は工程移送装置4に完全に乗り移るため、この後搬入移送装置7は続けて動作してもよく、停止してもよい。実装前基板K1は、所定の位置P3と位置P4との間の区間では高速移送速度VHで移送される(4)。この区間は、制御装置5内にあらかじめ制御特性として設定することができ、さらには実際の工程移送速度Vの履歴から算出することもできる。実装前基板K1が所定の位置P4に到達すると、工程移送速度Vは徐々に減速されて高速移送速度VHから漸減される(5)。そして、実装前基板K1の先端KFが実装位置P5に到達して停止される(6)。なお、正確な停止位置は、部品実装装置3に設けられた図略の基板カメラなどで確認される。   As shown in FIG. 4, when there is no substrate on the process transfer device 4 and the pre-mounting substrate K1 is placed on the carry-in transfer device 7 and preparation for loading is completed, the process transfer device 4 and the carry-in transfer device 7 are loaded. It is driven at a transfer speed VL (1). The substrate K1 before mounting is transferred on the carry-in transfer device 7 and its tip KF is transferred to the process transfer device 4 beyond the carry-in end position P1, and is placed across the transfer devices 4 and 7 without any speed difference. (2) When the rear end FR of the substrate K1 before mounting reaches the carry-in end position P1 (the tip KF reaches the carry-in completion position P2), the process transfer speed V of the process transfer device 4 is gradually accelerated and gradually increased (3). . At this time, since the pre-mounting substrate K1 is completely transferred to the process transfer device 4, the carry-in transfer device 7 may subsequently operate or may be stopped. The substrate K1 before mounting is transferred at a high transfer speed VH in a section between the predetermined position P3 and the position P4 (4). This section can be set in advance in the control device 5 as a control characteristic, and can also be calculated from the history of the actual process transfer speed V. When the pre-mounting substrate K1 reaches the predetermined position P4, the process transfer speed V is gradually reduced and gradually decreased from the high-speed transfer speed VH (5). And the front-end | tip KF of the board | substrate K1 before mounting arrives at the mounting position P5, and is stopped (6). The accurate stop position is confirmed by a not-shown board camera provided in the component mounting apparatus 3.

実装位置P5で実装前基板K1に所定の実装工程が施されて実装済基板K10ができ上がると、図5に示されるように、工程移送装置4の工程移送速度Vが漸増される(1)。実装済基板K10は、所定の位置P6と位置P7との間の区間では高速移送速度VHで移送される(2)。この区間も前述のように、制御特性として設定、あるいは実際の工程移送速度Vの履歴から算出することができる。実装済基板K10が所定の位置P7に到達すると、工程移送速度Vは高速移送速度VHから搬出移送速度VMに漸減される(3)。実装済基板K10の先端KFが搬出端位置P8に到達した時点で、工程移送装置4の工程移送速度Vは既に搬出移送速度VMになっており、一方搬出移送装置8も始動されて搬出移送速度VMになっている(4)。この時点から、実装済基板K10の先端KFが搬出端位置P8を越えて搬出移送装置8に乗り移り、両移送装置4、8に速度差なしでまたがって載置された状態となる(5)。実装済基板K10の後端FRが搬出端位置P8に到達する(先端KFは搬出完了位置P9に到達)と、実装済基板K10は搬出移送装置8に完全に乗り移り、下流のリフロー機93へと移送される。一方、工程移送装置4の工程移送速度Vは搬入移送速度VLに漸減されて、次の実装前基板K2の搬入を待ち受ける。   When a predetermined mounting process is performed on the pre-mounting board K1 at the mounting position P5 and the mounted board K10 is completed, the process transfer speed V of the process transfer device 4 is gradually increased as shown in FIG. 5 (1). The mounted substrate K10 is transferred at a high transfer speed VH in a section between the predetermined position P6 and the position P7 (2). As described above, this section can also be set as a control characteristic or calculated from the history of the actual process transfer speed V. When the mounted substrate K10 reaches the predetermined position P7, the process transfer speed V is gradually reduced from the high-speed transfer speed VH to the carry-out transfer speed VM (3). When the tip KF of the mounted substrate K10 reaches the unloading end position P8, the process transfer speed V of the process transfer device 4 has already reached the unloading transfer speed VM, while the unloading transfer device 8 is also started and unloaded. It is a VM (4). From this point, the tip KF of the mounted substrate K10 passes over the carry-out end position P8 and is transferred to the carry-out transfer device 8 and is placed across the transfer devices 4 and 8 without any speed difference (5). When the rear end FR of the mounted substrate K10 reaches the carry-out end position P8 (the front end KF reaches the carry-out completion position P9), the mounted substrate K10 is completely transferred to the carry-out transfer device 8 and moves to the downstream reflow machine 93. Be transported. On the other hand, the process transfer speed V of the process transfer device 4 is gradually reduced to the carry-in transfer speed VL and waits for the next pre-mounting board K2 to be loaded.

次に、第1実施形態の部品実装機1の効果を、図6の従来構成における基板の移送速度特性図と比較して説明する。従来構成においては、搬入端位置P1で基板Kが移送装置7、4間を乗り移る際の速度差をなくすため、工程移送装置4の工程移送速度Vを搬入移送速度VLに固定して、搬入端位置P1から実装位置P5まで基板Kを移送していた。同様に、工程移送速度Vを搬出移送速度VMに固定して、実装位置P5から搬出端位置P8まで基板Kを移送していた。したがって、高速移送速度VHの機能を有するにもかかわらず、その機能を活かしていなかった。   Next, the effect of the component mounting machine 1 of the first embodiment will be described in comparison with the board transfer speed characteristic diagram in the conventional configuration of FIG. In the conventional configuration, the process transfer speed V of the process transfer device 4 is fixed to the carry-in transfer speed VL in order to eliminate the speed difference when the substrate K moves between the transfer devices 7 and 4 at the carry-in end position P1. The substrate K was transferred from the position P1 to the mounting position P5. Similarly, the process transfer speed V is fixed to the unloading transfer speed VM, and the substrate K is transferred from the mounting position P5 to the unloading end position P8. Therefore, despite having the function of the high speed transfer speed VH, the function was not utilized.

これに対し、第1実施形態の部品実装機1では、搬入端位置P1および搬出端位置P8での速度差をなくして基板K1、K10を乗り移らせ、かつ部品実装機1内での基板K1、K10の移送を高速移送速度VHで行うようにしている。したがって、基板K1、K10の移送に要する時間を短縮して、工程の所要時間を削減できる。また、工程移送速度Vの変化は、ギヤなどを用いた急峻な加減速操作ではなく、徐々に変化させる漸増および漸減で行うので、移送時のショックの発生はごくわずかである。   On the other hand, in the component mounter 1 of the first embodiment, the boards K1 and K10 are transferred with no speed difference between the carry-in end position P1 and the carry-out end position P8, and the board K1 in the component mounter 1 is transferred. , K10 is transferred at a high transfer speed VH. Therefore, the time required for transferring the substrates K1 and K10 can be shortened, and the time required for the process can be reduced. Further, since the change in the process transfer speed V is not a steep acceleration / deceleration operation using a gear or the like, but is gradually increased and decreased gradually, the occurrence of a shock during transfer is very small.

なお、搬出手前センサ62および搬出端センサ63は省略することもできる。この場合、制御装置5は、あらかじめ設定した制御特性あるいは実際の工程移送速度Vの履歴から、基板Kの先端KFが搬出端位置P8およびその手前の位置P7に到達するタイミングを推定する。   It should be noted that the unloading front sensor 62 and the unloading end sensor 63 can be omitted. In this case, the control device 5 estimates the timing at which the tip KF of the substrate K reaches the unloading end position P8 and the position P7 in front of it from the history of preset control characteristics or actual process transfer speed V.

次に、搬入移送速度VLと搬出移送速度VMとが同じである第2実施形態について説明する。第2実施形態の基板実装機10の構成は、搬出移送速度VMが搬入移送速度VLに等しい搬出移送装置80が下流側に連結配置されることを除き、第1実施形態と同一である。この基板実装機10は、図7に示される移送速度制御方法にしたがって、制御装置5が工程移送装置4の工程移送速度Vを制御する。   Next, a second embodiment in which the carry-in transfer speed VL and the carry-out transfer speed VM are the same will be described. The configuration of the substrate mounting machine 10 of the second embodiment is the same as that of the first embodiment, except that a carry-out transfer device 80 having a carry-out transfer speed VM equal to the carry-in transfer speed VL is connected to the downstream side. In this substrate mounting machine 10, the control device 5 controls the process transfer speed V of the process transfer device 4 in accordance with the transfer speed control method shown in FIG. 7.

第2実施形態において、工程移送装置4上に基板がない場合、実装前基板は第1実施形態の図4と同様の移送速度制御方法によって、実装位置P5まで搬入、移送される。実装位置P5で実装前基板に所定の実装工程が施されて実装済基板K30ができ上がると、図7に示されるように、工程移送装置4の工程移送速度Vが漸増される(1)。実装済基板K30は、所定の位置P6と位置P7との間の区間では高速移送速度VHで移送される(2)。実装済基板K30が所定の位置P7に到達すると、工程移送速度Vは高速移送速度VHから搬入移送速度VLに漸減される(3)。実装済基板K30の先端KFが搬出端位置P8に到達した時点で、工程移送装置4の工程移送速度Vは既に搬入移送速度VLになっており、一方搬出移送装置80も始動されて搬入移送速度VLになっている。さらに、搬入移送装置7も始動されて搬入移送速度VLで実装前基板K4を搬入端位置P1へと移送する(4)。この時点から、実装済基板K30の先端KFが搬出端位置P8を越えて搬出移送装置80に乗り移り、両移送装置4、80に速度差なしでまたがって載置された状態となる。並行して、実装前基板K4の先端KFが搬入端位置P1を越えて工程移送装置4に乗り移り、両移送装置4、7に速度差なしでまたがって載置された状態となる(5)。実装済基板K30の後端FRが搬出端位置P8に到達すると、実装済基板K30は搬出移送装置8に完全に乗り移る。一方、実装前基板K4は未だ両移送装置4、7にまたがって載置されている(6)。実装前基板K4の後端FRが搬入端位置P1に到達すると、工程移送装置4の工程移送速度Vが漸増される(7)。以降は図3と同様の移送速度制御方法によって、実装前基板K4が実装位置P5まで移送される。   In the second embodiment, when there is no substrate on the process transfer device 4, the substrate before mounting is carried in and transferred to the mounting position P5 by the same transfer speed control method as in FIG. 4 of the first embodiment. When a predetermined mounting process is performed on the substrate before mounting at the mounting position P5 and the mounted substrate K30 is completed, the process transfer speed V of the process transfer device 4 is gradually increased as shown in FIG. 7 (1). The mounted substrate K30 is transferred at a high transfer speed VH in a section between the predetermined position P6 and the position P7 (2). When the mounted substrate K30 reaches the predetermined position P7, the process transfer speed V is gradually reduced from the high-speed transfer speed VH to the carry-in transfer speed VL (3). When the front end KF of the mounted substrate K30 reaches the unloading end position P8, the process transfer speed V of the process transfer device 4 has already reached the carry-in transfer speed VL, while the carry-out transfer device 80 is also started and the transfer-in transfer speed is reached. It is VL. Furthermore, the carry-in transfer device 7 is also started to transfer the pre-mounting substrate K4 to the carry-in end position P1 at the carry-in transfer speed VL (4). From this point, the tip KF of the mounted substrate K30 passes over the carry-out end position P8 and is transferred to the carry-out transfer device 80, and is placed across the transfer devices 4 and 80 without any speed difference. In parallel, the tip KF of the pre-mounting board K4 passes over the loading end position P1 and is transferred to the process transfer device 4 and is placed across the transfer devices 4 and 7 without any speed difference (5). When the rear end FR of the mounted substrate K30 reaches the carry-out end position P8, the mounted substrate K30 is completely transferred to the carry-out transfer device 8. On the other hand, the pre-mounting board K4 is still placed across the transfer devices 4 and 7 (6). When the rear end FR of the pre-mounting board K4 reaches the carry-in end position P1, the process transfer speed V of the process transfer device 4 is gradually increased (7). Thereafter, the pre-mounting board K4 is transferred to the mounting position P5 by the same transfer speed control method as in FIG.

第2実施形態の基板実装機10では、実装済基板K30の搬出と実装前基板K4の搬入とを時間的に並行して行うようになっている。したがって、実装済基板K10を搬出した後に実装前基板K2を搬入する第1実施形態と比較して、より一層工程時間を削減できる。なお、上述の説明では、実装済基板K30の搬出が実装前基板K4の搬入よりも先に完了しているが、搬入が先で搬出が後になってもよい。   In the substrate mounting machine 10 according to the second embodiment, carrying out of the mounted substrate K30 and loading of the pre-mounting substrate K4 are performed in parallel in time. Therefore, the process time can be further reduced as compared with the first embodiment in which the unmounted substrate K2 is loaded after the mounted substrate K10 is unloaded. In the above description, carrying out of the mounted substrate K30 is completed before carrying in the pre-mounting substrate K4. However, carrying in may be carried out earlier and carried out later.

また、本発明は、搬入移送速度VLと搬出移送速度VMの一方が一定速度で、他方が可変速度とされている構成にも適用できる。この場合、一方側で前述のように工程移送速度Vを一定速度に一致させ、他方側で可変速度を工程移送装置の工程移送速度Vに常に一致させて同期運転することができる。これにより、搬入端位置P1および搬出端位置P8で速度差がない状態として基板を乗り移らせることができる。   The present invention can also be applied to a configuration in which one of the carry-in transfer speed VL and the carry-out transfer speed VM is a constant speed and the other is a variable speed. In this case, as described above, the process transfer speed V can be made to coincide with a constant speed on the one side, and the variable speed can be made to always coincide with the process transfer speed V of the process transfer apparatus on the other side. Thereby, a board | substrate can be transferred as a state with no speed difference in the carrying-in end position P1 and the carrying-out end position P8.

この一例として、搬入移送速度VLが一定で搬出移送速度VVが可変である第3実施形態について、図8および図9を参考にして、第1実施形態と異なる部分を主に説明する。図8は、搬出移送速度VVが可変である第3実施形態の部品実装機11を模式的に説明する図である。第3実施形態の基板実装機11では、可変速搬出移送装置800の搬出ベルト81を駆動する搬出モータ820に速度可変のサーボモータが用いられ、搬出制御装置830は搬出移送速度VVを可変に制御するようになっている。そして、第3実施形態の基板実装機11は、図9に示される移送速度制御方法にしたがって、制御装置5が工程移送装置4の工程移送速度Vを制御し、これに連携して搬出制御装置830が搬出移送装置800の搬出移送速度VVを制御する。   As an example of this, with respect to the third embodiment in which the carry-in transfer speed VL is constant and the carry-out transfer speed VV is variable, the differences from the first embodiment will be mainly described with reference to FIGS. 8 and 9. FIG. 8 is a diagram schematically illustrating the component mounting machine 11 according to the third embodiment in which the carry-out transfer speed VV is variable. In the substrate mounter 11 of the third embodiment, a variable speed servomotor is used as the carry-out motor 820 that drives the carry-out belt 81 of the variable-speed carry-out transfer device 800, and the carry-out control device 830 variably controls the carry-out transfer speed VV. It is supposed to be. In the substrate mounter 11 of the third embodiment, the control device 5 controls the process transfer speed V of the process transfer device 4 according to the transfer speed control method shown in FIG. 830 controls the carry-out transfer speed VV of the carry-out transfer device 800.

図9に示されるように、工程移送装置4上の実装位置P5で実装済基板K50ができ上がりかつ搬入移送装置7上に実装前基板K6が載置されて搬入準備が整うと、搬入移送装置7は搬入移送速度VLで駆動され、工程移送装置4の工程位相速度Vは同じ搬入移送速度VLに漸増される(1)。つまり、実装済基板K50の移送および搬出と、実装前基板K6の搬入および移送とが並行して開始される。実装前基板K6は、搬入移送装置7上を移送されその先端KFが搬入端位置P1を越え、両移送装置4、7に速度差なしでまたがって載置された状態となる。並行して、実装済基板K50は搬出端位置P8に向けて移送される(2)。実装前基板K6の後端FRが搬入端位置P1に到達すると、工程移送装置4の工程移送速度Vが徐々に加速されて漸増される。この時点で、実装済基板K50は搬出端位置P8に近付き、可変速搬出移送装置800の可変な搬出移送速度VVは工程移送速度Vと等速に制御されて、同期運転される(3)。実装前基板K6は、所定の位置P3と位置P4との間の区間では高速移送速度VHで移送される。並行して、実装済基板K50は搬出端位置P8を越え、両移送装置4、800にまたがって載置された状態となる。つまり、高速移送速度VH同士の速度差なしの状態で搬出が行われる(4)。実装前基板K6が所定の位置P4に到達すると、工程移送速度Vは徐々に減速されて高速移送速度VHから漸減される。この間も搬出移送速度VVは工程移送速度Vと等速に制御されて、実装済基板K50の搬出が完了する(5)。そして、実装前基板K6の先端KFが実装位置P5に到達して停止されると、搬出移送速度VVが漸増されて実装済基板K50は下流のリフロー機93へと移送される。(6)。   As shown in FIG. 9, when the mounted substrate K50 is completed at the mounting position P5 on the process transfer device 4 and the pre-mounting substrate K6 is placed on the carry-in transfer device 7 and ready for loading, the carry-in transfer device 7 is ready. Is driven at the carry-in transfer speed VL, and the process phase speed V of the process transfer device 4 is gradually increased to the same carry-in transfer speed VL (1). That is, the transfer and carry-out of the mounted substrate K50 and the carry-in and transfer of the pre-mounting substrate K6 are started in parallel. The pre-mounting substrate K6 is transferred on the carry-in transfer device 7 and its tip KF exceeds the carry-in end position P1, and is placed on both transfer devices 4 and 7 without any speed difference. In parallel, the mounted substrate K50 is transferred toward the carry-out end position P8 (2). When the rear end FR of the substrate K6 before mounting reaches the carry-in end position P1, the process transfer speed V of the process transfer device 4 is gradually accelerated and gradually increased. At this time, the mounted substrate K50 approaches the unloading end position P8, and the variable unloading / transferring speed VV of the variable-speed unloading / transferring apparatus 800 is controlled to be equal to the process transfer speed V and is operated synchronously (3). The pre-mounting board K6 is transferred at a high transfer speed VH in a section between a predetermined position P3 and a position P4. In parallel, the mounted substrate K50 goes over the carry-out end position P8 and is placed across both the transfer devices 4 and 800. That is, unloading is performed in a state where there is no speed difference between the high-speed transfer speeds VH (4). When the substrate K6 before mounting reaches the predetermined position P4, the process transfer speed V is gradually decelerated and gradually decreased from the high-speed transfer speed VH. During this time, the carry-out transfer speed VV is controlled to be equal to the process transfer speed V, and the carry-out of the mounted substrate K50 is completed (5). When the front end KF of the board K6 before mounting reaches the mounting position P5 and stops, the carry-out transfer speed VV is gradually increased and the mounted board K50 is transferred to the downstream reflow machine 93. (6).

第3実施形態においては、実装済基板K50が搬出端位置P8に近付いたときに、可変速搬出移送装置800の搬出移送速度VVを工程移送装置4の工程移送速度Vに一致させて同期運転することができる。したがって、搬入端位置P1側の制約から工程移送速度Vが変化しても、搬出端位置P8側での速度差なしの条件が満たされ、実装済基板K50にショックが加わることがない。   In the third embodiment, when the mounted substrate K50 approaches the carry-out end position P8, the carry-out transfer speed VV of the variable speed carry-out transfer apparatus 800 is made to coincide with the process transfer speed V of the process transfer apparatus 4, and the synchronous operation is performed. be able to. Therefore, even if the process transfer speed V changes due to restrictions on the carry-in end position P1 side, the condition of no speed difference on the carry-out end position P8 side is satisfied, and no shock is applied to the mounted substrate K50.

なお、実装済基板K50の搬出は、搬出端位置P8側での速度差なしの条件が満たされている図9の(3)〜(5)の間であればいつであってもよい。また、図9は一例であり、搬入端位置P1と実装位置P5と搬出端位置P8の距離関係や、移送装置4、800の移送速度V、VVの可変範囲などにより、さまざまなバリエーションの移送速度制御方法を用いることができる。   Note that the mounted board K50 may be carried out at any time as long as it is between (3) and (5) in FIG. 9 where the condition of no speed difference on the carry-out end position P8 side is satisfied. Also, FIG. 9 is an example, and there are various variations of transfer speeds depending on the distance relationship between the carry-in end position P1, the mounting position P5, and the carry-out end position P8 and the variable ranges of the transfer speeds V and VV of the transfer devices 4 and 800. A control method can be used.

次に、工程移送装置が複数からなる第4実施形態について、図10を参考にして、第1実施形態と異なる部分を主に説明する。図10は、部品実装装置3前後における基板Kの混雑状況を調整可能な第4実施形態の部品実装機12を模式的に説明する図である。図示されるように、部品実装機12は、基台2、部品実装装置3、工程移送装置40を構成する前置移送装置45と実装移送装置46と後置移送装置47、制御装置50、を主要部材として構成されている。3つの移送装置45〜47は基台2内に直列に配設されており、それぞれがコンベアベルトとサーボモータとを備え、それぞれの工程移送速度V5〜V7は独立して可変になっている。前置移送装置45の図中左端は搬入端21に配置され、実装移送装置46は部品実装装置3の下方の実装位置22を含んで配置され、後置移送装置47の図中右端は搬出端23に配置されている。制御装置50は、駆動制御信号D5〜D7を出力して、各移送装置45〜47の工程移送速度V5〜V7を制御できるようになっている。   Next, with respect to the fourth embodiment having a plurality of process transfer devices, the differences from the first embodiment will be mainly described with reference to FIG. FIG. 10 is a diagram schematically illustrating the component mounter 12 according to the fourth embodiment that can adjust the congestion state of the substrate K before and after the component mounting apparatus 3. As illustrated, the component mounting machine 12 includes a base 2, a component mounting device 3, a front transfer device 45, a mounting transfer device 46, a rear transfer device 47, and a control device 50 that constitute the process transfer device 40. It is comprised as a main member. The three transfer devices 45 to 47 are arranged in series in the base 2, each having a conveyor belt and a servo motor, and the respective process transfer speeds V5 to V7 are independently variable. The left end of the front transfer device 45 in the drawing is arranged at the carry-in end 21, the mounting transfer device 46 is arranged including the mounting position 22 below the component mounting device 3, and the right end of the rear transfer device 47 in the drawing is the carry-out end. 23. The control device 50 outputs drive control signals D5 to D7 so that the process transfer speeds V5 to V7 of the transfer devices 45 to 47 can be controlled.

第4実施形態において、制御装置50は、前置移送装置45上および後置移送装置47上に一時的に基板Kを留め置く移送速度制御を行うことができる。この制御の中で、前置移送装置45の工程移送速度V5を搬入移送装置7の搬入移送速度VLに一致させて基板Kを搬入端21に搬入し、搬入が完了した時点で工程移送速度V5を漸増することができる。また、後置移送装置47の工程移送速度V7を搬出移送装置8の搬出移送速度VMに一致させて基板Kを搬出端23から搬出することができる。さらに、3つの移送装置45〜47を適宜同期運転して基板Kが装置45〜47間を乗り移るときの速度差をなくすことができる。一方、基板Kが留め置かれていない場合、前置移送装置45と実装移送装置46とを同期運転して基板Kを搬入端21から実装位置22まで直に取り込み、実装移送装置46と後置移送装置47とを同期運転して基板Kを実装位置22から搬出端23まで直に排出することができる。これらの移送速度制御により、第1実施形態と同様の効果が生じる。   In the fourth embodiment, the control device 50 can perform transfer speed control for temporarily holding the substrate K on the pre-transfer device 45 and the post-transfer device 47. In this control, the process transfer speed V5 of the pre-transfer device 45 is made to coincide with the carry-in transfer speed VL of the carry-in transfer device 7, and the substrate K is carried into the carry-in end 21. Can be gradually increased. In addition, the substrate K can be unloaded from the unloading end 23 by making the process transfer speed V7 of the post transfer device 47 coincide with the unloading transfer speed VM of the unloading transfer device 8. Furthermore, it is possible to eliminate the speed difference when the substrate K transfers between the devices 45 to 47 by appropriately operating the three transfer devices 45 to 47 in synchronization. On the other hand, when the substrate K is not retained, the front transfer device 45 and the mounting transfer device 46 are operated synchronously to directly take the substrate K from the carry-in end 21 to the mounting position 22, and The substrate K can be discharged directly from the mounting position 22 to the carry-out end 23 by operating the transfer device 47 synchronously. These transfer speed controls produce the same effects as in the first embodiment.

なお、本発明は図1に示された5種類の基板製造移送設備91、92、1、93、94に限定されるものではなく、例えば基板に接着剤を塗布する接着剤塗布機やその他の設備にも適用できる。また、搬入移送装置7および搬出移送装置8、80、800は中間移送装置96、97に限定されるものではなく、直結された他の基板製造移送設備の工程移送装置であっても、本発明を適用できる。   Note that the present invention is not limited to the five types of substrate manufacturing and transfer facilities 91, 92, 1, 93, and 94 shown in FIG. 1, for example, an adhesive applicator that applies an adhesive to the substrate, and other devices. It can also be applied to equipment. Further, the carry-in transfer device 7 and the carry-out transfer devices 8, 80, and 800 are not limited to the intermediate transfer devices 96 and 97, and the present invention may be applied to process transfer devices of other directly connected substrate manufacturing and transfer facilities. Can be applied.

一般的な基板製造ラインを模式的に説明する図である。It is a figure which illustrates a general substrate manufacturing line typically. 第1実施形態の部品実装機を模式的に説明する図である。It is a figure which illustrates the component mounting machine of a 1st embodiment typically. 図2の部品実装機における移送速度特性図である。It is a transfer speed characteristic figure in the component mounting machine of FIG. 図3の移送速度特性図で、実装前基板を搬入移送装置から工程移送装置の実装位置まで搬入、移送するときの移送速度制御方法を説明する図である。FIG. 4 is a transfer speed characteristic diagram of FIG. 3 for explaining a transfer speed control method when a pre-mounting substrate is transferred from the transfer-in transfer apparatus to the mounting position of the process transfer apparatus. 図3の移送速度特性図で、実装済基板を工程移送装置の実装位置から搬出移送装置まで移送、搬出するときの移送速度制御方法を説明する図である。FIG. 4 is a diagram illustrating a transfer speed control method for transferring and unloading a mounted substrate from the mounting position of the process transfer apparatus to the carry-out transfer apparatus in the transfer speed characteristic diagram of FIG. 3. 従来構成における移送速度特性図である。It is a transfer speed characteristic figure in the conventional composition. 第2実施形態の部品実装機における移送速度制御方法を説明する図である。It is a figure explaining the transfer speed control method in the component mounting machine of 2nd Embodiment. 第3実施形態の部品実装機を模式的に説明する図である。It is a figure which illustrates typically the component mounting machine of 3rd Embodiment. 図8の部品実装機で、移送速度制御方法を説明する図である。It is a figure explaining the transfer speed control method with the component mounting machine of FIG. 第4実施形態の部品実装機を模式的に説明する図である。It is a figure which illustrates the component mounting machine of 4th Embodiment typically.

符号の説明Explanation of symbols

1、10、11、12:部品実装機(基板製造移送設備)
2:基台 21:搬入端 22:実装位置(工程実施位置) 23:搬出端
3:部品実装装置(工程実施装置)
4、40:工程移送装置
41:コンベアベルト 42:サーボモータ
45:前置移送装置 46:実装移送装置 47:後置移送装置
5、50:制御装置
61:搬入端センサ 62:搬出手前センサ 63:搬出端センサ
7:搬入移送装置 71:搬入ベルト 72:搬入モータ 73:搬入制御装置
8:搬出移送装置 81:搬出ベルト 82:搬出モータ 83:搬出制御装置
80:搬出移送装置(第2実施形態)
800:可変速搬出移送装置(第3実施形態)
9:基板製造ライン
91:ストッカー 92:スクリーン印刷機 93:リフロー機
94:検査機 95〜99:中間移送装置
K:基板 K1、K2、K4、K6:実装前基板
K10、K30、K50:実装済基板
L:基板長さ KF:基板の先端 KR:基板の後端
P1:搬入端位置 P2:搬入完了位置 P5:実装位置
P8:搬出端位置 P9:搬出完了位置
V、V5〜V7:工程移送装置の可変な工程移送速度
VL:搬入移送速度(一定速度) VM:搬出移送速度(一定速度)
VV:可変な搬出移送速度 VH:高速移送速度
1, 10, 11, 12: component mounting machine (board manufacturing and transfer equipment)
2: Base 21: Carry-in end 22: Mounting position (process execution position) 23: Carry-out end 3: Component mounting apparatus (process execution apparatus)
4, 40: Process transfer device
41: Conveyor belt 42: Servo motor
45: front transfer device 46: mounting transfer device 47: rear transfer device 5, 50: control device 61: carry-in end sensor 62: carry-out front sensor 63: carry-out end sensor 7: carry-in transfer device 71: carry-in belt 72: carry-in Motor 73: carry-in control device 8: carry-out transfer device 81: carry-out belt 82: carry-out motor 83: carry-out control device 80: carry-out transfer device (second embodiment)
800: Variable-speed carry-out transfer device (third embodiment)
9: Board production line
91: Stocker 92: Screen printer 93: Reflow machine
94: Inspection machine 95-99: Intermediate transfer device K: Substrate K1, K2, K4, K6: Substrate before mounting
K10, K30, K50: mounted substrate
L: Board length KF: Board front edge KR: Board rear edge P1: Carry-in end position P2: Carry-in completion position P5: Mounting position P8: Carry-out end position P9: Carry-out completion position V, V5 to V7: Process transfer device Variable process transfer speed VL: Incoming transfer speed (constant speed) VM: Unloading speed (constant speed)
VV: Variable transfer speed VH: High speed transfer speed

Claims (5)

基板を搬入する搬入端と、前記搬入端から移送し停止させた基板に所定の製造工程を施す工程実施位置と、前記製造工程を施した基板を前記工程実施位置から移送し搬出する搬出端とを有し、かつ、前記工程実施位置で前記基板に所定の前記製造工程を施す工程実施装置と、前記基板を前記搬入端から前記工程実施位置を経て前記搬出端に可変な工程移送速度で移送可能な工程移送装置と、前記工程移送装置の工程移送速度を制御する制御装置とを備える基板製造移送設備であって、
前記制御装置は、前記搬入端の上流側に直列に配置されて前記基板を移送可能な搬入移送装置の一定の搬入移送速度に前記工程移送装置の工程移送速度を一致させて前記基板を前記搬入移送装置から前記搬入端に搬入させ、前記基板の後端が前記搬入端を通過すると工程移送速度を前記搬入移送速度より高速の高速移送速度に漸増し、その後に工程移送速度を漸減して前記基板を前記工程実施位置に停止させることを特徴とする基板製造移送設備。
A carry-in end for carrying in the substrate, a process execution position for applying a predetermined manufacturing process to the substrate transferred and stopped from the carry-in end, and a carry-out end for transferring and carrying out the substrate subjected to the production process from the process execution position; And a process execution apparatus for performing the predetermined manufacturing process on the substrate at the process execution position, and transferring the substrate from the carry-in end to the carry-out end through the process execution position at a variable process transfer speed. A substrate manufacturing transfer facility comprising a possible process transfer device and a control device for controlling a process transfer speed of the process transfer device,
The control device is arranged in series on the upstream side of the carry-in end so that the process transfer speed of the process transfer device coincides with a constant carry-in transfer speed of a carry-in transfer apparatus capable of transferring the substrate, and the substrate is loaded. When the rear end of the substrate passes through the carry-in end from the transfer device, the process transfer speed is gradually increased to a high-speed transfer speed higher than the carry-in transfer speed, and then the process transfer speed is gradually reduced to increase the process transfer speed. A substrate manufacturing / transferring facility, wherein the substrate is stopped at the process execution position.
基板を搬入する搬入端と、前記搬入端から移送し停止させた基板に所定の製造工程を施す工程実施位置と、前記製造工程を施した基板を前記工程実施位置から移送し搬出する搬出端とを有し、かつ、前記工程実施位置で前記基板に所定の前記製造工程を施す工程実施装置と、前記基板を前記搬入端から前記工程実施位置を経て前記搬出端に可変な工程移送速度で移送可能な工程移送装置と、前記工程移送装置の工程移送速度を制御する制御装置とを備える基板製造移送設備であって、
前記制御装置は、前記搬出端の下流側に直列に配置されて前記製造工程が施された加工済基板を移送可能な搬出移送装置の一定の搬出移送速度より高速の高速移送速度に前記工程移送装置の工程移送速度を漸増して前記工程実施位置から前記加工済基板を移送させ、その後に前記加工済基板の前端が前記搬出端に到達する前に工程移送速度を前記搬出移送速度に漸減し、工程移送速度を前記搬出移送速度に一致させて前記加工済基板を前記搬出端から前記搬出移送装置に搬出させることを特徴とする基板製造移送設備。
A carry-in end for carrying in the substrate, a process execution position for applying a predetermined manufacturing process to the substrate transferred and stopped from the carry-in end, and a carry-out end for transferring and carrying out the substrate subjected to the production process from the process execution position; And a process execution apparatus for performing the predetermined manufacturing process on the substrate at the process execution position, and transferring the substrate from the carry-in end to the carry-out end through the process execution position at a variable process transfer speed. A substrate manufacturing transfer facility comprising a possible process transfer device and a control device for controlling a process transfer speed of the process transfer device,
The control device transfers the process to a high speed transfer speed higher than a constant carry-out transfer speed of a carry-out transfer apparatus that is arranged in series downstream of the carry-out end and can transfer the processed substrate subjected to the manufacturing process. The process transfer speed of the apparatus is gradually increased to transfer the processed substrate from the process execution position, and then the process transfer speed is gradually decreased to the unloading transfer speed before the front end of the processed substrate reaches the unloading end. A substrate manufacturing and transporting facility, wherein the processed substrate is unloaded from the unloading end to the unloading / transferring device with a process transfer rate matched with the unloading / transferring rate.
基板を搬入する搬入端と、前記搬入端から移送し停止させた基板に所定の製造工程を施す工程実施位置と、前記製造工程を施した基板を前記工程実施位置から移送し搬出する搬出端とを有し、かつ、前記工程実施位置で前記基板に所定の前記製造工程を施す工程実施装置と、前記基板を前記搬入端から前記工程実施位置を経て前記搬出端に可変な工程移送速度で移送可能な工程移送装置と、前記工程移送装置の工程移送速度を制御する制御装置とを備える基板製造移送設備であって、
前記制御装置は、前記搬出端の下流側に直列に配置されて前記製造工程が施された加工済基板を移送可能な搬出移送装置の一定の搬出移送速度より高速の高速移送速度に前記工程移送装置の工程移送速度を漸増して前記工程実施位置から前記加工済基板を移送させ、その後に前記加工済基板の前端が前記搬出端に到達する前に工程移送速度を前記搬出移送速度に漸減し、工程移送速度を前記搬出移送速度に一致させて前記加工済基板を前記搬出端から前記搬出移送装置に搬出させてから、前記搬入端の上流側に直列に配置されて前記基板を移送可能な搬入移送装置の一定の搬入移送速度に前記工程移送装置の工程移送速度を一致させて前記基板を前記搬入移送装置から前記搬入端に搬入させ、前記基板の後端が前記搬入端を通過すると工程移送速度を前記搬入移送速度より高速の高速移送速度に漸増し、その後に工程移送速度を漸減して前記基板を前記工程実施位置に停止させることを特徴とする基板製造移送設備。
A carry-in end for carrying in the substrate, a process execution position for applying a predetermined manufacturing process to the substrate transferred and stopped from the carry-in end, and a carry-out end for transferring and carrying out the substrate subjected to the production process from the process execution position; And a process execution apparatus for performing the predetermined manufacturing process on the substrate at the process execution position, and transferring the substrate from the carry-in end to the carry-out end through the process execution position at a variable process transfer speed. A substrate manufacturing transfer facility comprising a possible process transfer device and a control device for controlling a process transfer speed of the process transfer device,
The control device transfers the process to a high speed transfer speed higher than a constant carry-out transfer speed of a carry-out transfer apparatus that is arranged in series downstream of the carry-out end and can transfer the processed substrate subjected to the manufacturing process. The process transfer speed of the apparatus is gradually increased to transfer the processed substrate from the process execution position, and then the process transfer speed is gradually decreased to the unloading transfer speed before the front end of the processed substrate reaches the unloading end. The process transfer speed is made to coincide with the carry-out transfer speed, the processed substrate is carried out from the carry-out end to the carry-out transfer device, and then the substrate can be transferred in series on the upstream side of the carry-in end. A step of bringing the substrate into the carry-in end from the carry-in transfer device by causing the process transfer speed of the process transfer device to coincide with a constant carry-in transfer speed of the carry-in transfer device, and passing the rear end of the substrate through the carry-in end Transfer Gradually increasing the speed to high-speed transfer rate faster than the carry transfer rate, then the substrate manufacturing transfer facility by decreasing the process transport speed, wherein the stopping the substrate to the process carried out position.
請求項1において、
前記制御装置は、前記工程移送装置の工程移送速度を前記搬入移送速度に一致させて前記基板を前記搬入移送装置から前記搬入端に搬入させるのに並行して、前記製造工程が施された加工済基板を前記搬出端からその下流側に直列に配置されて前記加工済基板を前記搬入移送速度と同じ搬出移送速度で移送可能な搬出移送装置に搬出させ、前記基板の後端が前記搬入端を通過しかつ前記加工済基板の後端が前記搬出端を通過すると工程移送速度を前記高速移送速度に漸増することを特徴とする基板製造移送設備。
In claim 1,
The control device is a process in which the manufacturing process is performed in parallel with bringing the substrate from the carry-in transfer device into the carry-in end by making the process transfer speed of the process transfer device coincide with the carry-in transfer speed. The finished substrate is arranged in series downstream from the carry-out end, and the processed substrate is carried out to a carry-out transfer device that can be transferred at the same carry-out transfer speed as the carry-in transfer speed, and the rear end of the substrate is the carry-in end And the rear end of the processed substrate passes the unloading end, the process transfer speed is gradually increased to the high speed transfer speed.
請求項1において、前記制御装置は、前記搬出端の下流側に直列に配置されて前記製造工程が施された加工済基板を移送可能な可変速搬出移送装置の可変な搬出移送速度を前記工程移送装置の工程移送速度に一致させ、
あるいは、請求項2において、前記制御装置は、前記搬入端の上流側に直列に配置されて前記基板を移送可能な可変速搬入移送装置の可変な搬入移送速度を前記工程移送装置の工程移送速度に一致させることを特徴とする基板製造移送設備。
2. The control device according to claim 1, wherein the control device sets a variable carry-out transfer speed of a variable-speed carry-out transfer device that is arranged in series on the downstream side of the carry-out end and that can transfer a processed substrate subjected to the manufacturing process. Match the process transfer speed of the transfer device,
Alternatively, the control device according to claim 2, wherein the control device is arranged in series upstream of the carry-in end, and the variable carry-in transfer speed of the variable-speed carry-in transfer device capable of transferring the substrate is set to the process transfer speed of the process transfer device. A substrate manufacturing and transporting facility characterized by conforming to
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