JP2010129981A5 - - Google Patents

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Publication number
JP2010129981A5
JP2010129981A5 JP2008306678A JP2008306678A JP2010129981A5 JP 2010129981 A5 JP2010129981 A5 JP 2010129981A5 JP 2008306678 A JP2008306678 A JP 2008306678A JP 2008306678 A JP2008306678 A JP 2008306678A JP 2010129981 A5 JP2010129981 A5 JP 2010129981A5
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JP
Japan
Prior art keywords
epitaxial wafer
substrate
wafer manufacturing
phase growth
vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2008306678A
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English (en)
Japanese (ja)
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JP2010129981A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2008306678A priority Critical patent/JP2010129981A/ja
Priority claimed from JP2008306678A external-priority patent/JP2010129981A/ja
Publication of JP2010129981A publication Critical patent/JP2010129981A/ja
Publication of JP2010129981A5 publication Critical patent/JP2010129981A5/ja
Withdrawn legal-status Critical Current

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JP2008306678A 2008-12-01 2008-12-01 エピタキシャルウェーハ製造方法 Withdrawn JP2010129981A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008306678A JP2010129981A (ja) 2008-12-01 2008-12-01 エピタキシャルウェーハ製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008306678A JP2010129981A (ja) 2008-12-01 2008-12-01 エピタキシャルウェーハ製造方法

Publications (2)

Publication Number Publication Date
JP2010129981A JP2010129981A (ja) 2010-06-10
JP2010129981A5 true JP2010129981A5 (enExample) 2012-01-19

Family

ID=42330133

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008306678A Withdrawn JP2010129981A (ja) 2008-12-01 2008-12-01 エピタキシャルウェーハ製造方法

Country Status (1)

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JP (1) JP2010129981A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6992736B2 (ja) * 2018-11-30 2022-01-13 株式会社Sumco エピタキシャルウェーハの製造方法および装置
CN115896936A (zh) * 2022-12-22 2023-04-04 西安奕斯伟材料科技有限公司 气体供应的处理方法、气体供应装置和外延生长设备

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