JP2010117161A5 - - Google Patents

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Publication number
JP2010117161A5
JP2010117161A5 JP2008288794A JP2008288794A JP2010117161A5 JP 2010117161 A5 JP2010117161 A5 JP 2010117161A5 JP 2008288794 A JP2008288794 A JP 2008288794A JP 2008288794 A JP2008288794 A JP 2008288794A JP 2010117161 A5 JP2010117161 A5 JP 2010117161A5
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JP
Japan
Prior art keywords
film thickness
thickness distribution
inspection apparatus
unit
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008288794A
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English (en)
Japanese (ja)
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JP2010117161A (ja
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Publication date
Application filed filed Critical
Priority to JP2008288794A priority Critical patent/JP2010117161A/ja
Priority claimed from JP2008288794A external-priority patent/JP2010117161A/ja
Publication of JP2010117161A publication Critical patent/JP2010117161A/ja
Publication of JP2010117161A5 publication Critical patent/JP2010117161A5/ja
Pending legal-status Critical Current

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JP2008288794A 2008-11-11 2008-11-11 検査装置 Pending JP2010117161A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008288794A JP2010117161A (ja) 2008-11-11 2008-11-11 検査装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008288794A JP2010117161A (ja) 2008-11-11 2008-11-11 検査装置

Publications (2)

Publication Number Publication Date
JP2010117161A JP2010117161A (ja) 2010-05-27
JP2010117161A5 true JP2010117161A5 (cg-RX-API-DMAC7.html) 2012-07-12

Family

ID=42304938

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008288794A Pending JP2010117161A (ja) 2008-11-11 2008-11-11 検査装置

Country Status (1)

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JP (1) JP2010117161A (cg-RX-API-DMAC7.html)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101919901B1 (ko) 2012-05-10 2018-11-19 삼성전자 주식회사 웨이퍼 검사 방법
TWI848121B (zh) * 2019-06-10 2024-07-11 日商東京威力科創股份有限公司 基板處理裝置、基板檢查方法及記錄媒體
CN114659451B (zh) * 2020-12-22 2025-01-28 松山湖材料实验室 膜厚测量方法及测量装置
CN117355724A (zh) * 2021-05-21 2024-01-05 浜松光子学株式会社 膜厚测定装置及膜厚测定方法
DE102023106815B3 (de) * 2023-03-17 2024-05-23 Confovis Gmbh Verfahren zum Erstellen eines Schichtdickenvariationsprofils einer Oberflächenschicht eines Substrates

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61182507A (ja) * 1985-02-08 1986-08-15 Nec Kansai Ltd 膜厚測定装置
JP2574807B2 (ja) * 1987-08-28 1997-01-22 株式会社日立製作所 膜厚分布測定方法及びその装置
JPH1047926A (ja) * 1996-08-07 1998-02-20 Dainippon Screen Mfg Co Ltd 膜厚測定装置および膜厚測定方法
JP2001091222A (ja) * 1999-09-17 2001-04-06 Dainippon Screen Mfg Co Ltd 膜厚測定装置の校正方法および膜厚測定装置および校正用部材
JP2002039718A (ja) * 2000-07-19 2002-02-06 Olympus Optical Co Ltd 薄膜の合否判定方法および装置
JP2005221401A (ja) * 2004-02-06 2005-08-18 Dainippon Printing Co Ltd 膜厚測定方法および装置
JP2008139065A (ja) * 2006-11-30 2008-06-19 Nikon Corp 膜評価装置及び膜評価方法

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