JP2010109220A5 - - Google Patents

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Publication number
JP2010109220A5
JP2010109220A5 JP2008280941A JP2008280941A JP2010109220A5 JP 2010109220 A5 JP2010109220 A5 JP 2010109220A5 JP 2008280941 A JP2008280941 A JP 2008280941A JP 2008280941 A JP2008280941 A JP 2008280941A JP 2010109220 A5 JP2010109220 A5 JP 2010109220A5
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JP
Japan
Prior art keywords
maskless exposure
optical system
substrate
projection pattern
projection
Prior art date
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Pending
Application number
JP2008280941A
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English (en)
Japanese (ja)
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JP2010109220A (ja
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Publication date
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Priority to JP2008280941A priority Critical patent/JP2010109220A/ja
Priority claimed from JP2008280941A external-priority patent/JP2010109220A/ja
Publication of JP2010109220A publication Critical patent/JP2010109220A/ja
Publication of JP2010109220A5 publication Critical patent/JP2010109220A5/ja
Pending legal-status Critical Current

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JP2008280941A 2008-10-31 2008-10-31 マスクレス露光装置およびマスクレス露光方法 Pending JP2010109220A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008280941A JP2010109220A (ja) 2008-10-31 2008-10-31 マスクレス露光装置およびマスクレス露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008280941A JP2010109220A (ja) 2008-10-31 2008-10-31 マスクレス露光装置およびマスクレス露光方法

Publications (2)

Publication Number Publication Date
JP2010109220A JP2010109220A (ja) 2010-05-13
JP2010109220A5 true JP2010109220A5 (enrdf_load_stackoverflow) 2012-06-28

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ID=42298352

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008280941A Pending JP2010109220A (ja) 2008-10-31 2008-10-31 マスクレス露光装置およびマスクレス露光方法

Country Status (1)

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JP (1) JP2010109220A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102193339A (zh) * 2011-06-13 2011-09-21 中国科学院光电技术研究所 一种无掩模光刻对准系统
CN102566340B (zh) * 2012-02-07 2014-05-28 中国科学院光电技术研究所 一种基于相移莫尔条纹的数字无掩模光刻对准装置
KR101584900B1 (ko) 2014-07-02 2016-01-14 인하대학교 산학협력단 듀얼헤드 노광시스템 및 이를 이용한 노광방법
CN112859537B (zh) * 2021-01-13 2023-02-10 合肥芯碁微电子装备股份有限公司 一种用于曝光机的曝光光头标定方法及标定装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2629709B2 (ja) * 1987-05-28 1997-07-16 株式会社ニコン 位置合わせ方法及び装置
JPH09232202A (ja) * 1996-02-20 1997-09-05 Mitsubishi Electric Corp 投影露光装置におけるアライメント方法
JPH1064808A (ja) * 1996-08-22 1998-03-06 Nikon Corp マスクの位置合わせ方法及び投影露光方法
JPH10321498A (ja) * 1997-05-15 1998-12-04 Nikon Corp 投影露光装置及び該装置を使用した露光方法
US6271957B1 (en) * 1998-05-29 2001-08-07 Affymetrix, Inc. Methods involving direct write optical lithography
JP2001093812A (ja) * 1999-09-22 2001-04-06 Canon Inc 半導体露光装置、位置合わせ装置およびデバイス製造方法
JP2003092248A (ja) * 2001-09-17 2003-03-28 Canon Inc 位置検出装置、位置決め装置及びそれらの方法並びに露光装置及びデバイスの製造方法
US7349068B2 (en) * 2004-12-17 2008-03-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2006234768A (ja) * 2005-02-28 2006-09-07 Nikon Corp 位置検出方法および位置測定装置
JP2006310446A (ja) * 2005-04-27 2006-11-09 Canon Inc 半導体装置の製造方法、および露光装置
JP2007025394A (ja) * 2005-07-19 2007-02-01 Fujifilm Holdings Corp パターン形成方法

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