JP2010084194A5 - - Google Patents
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- JP2010084194A5 JP2010084194A5 JP2008254563A JP2008254563A JP2010084194A5 JP 2010084194 A5 JP2010084194 A5 JP 2010084194A5 JP 2008254563 A JP2008254563 A JP 2008254563A JP 2008254563 A JP2008254563 A JP 2008254563A JP 2010084194 A5 JP2010084194 A5 JP 2010084194A5
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- JP
- Japan
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008254563A JP5197277B2 (ja) | 2008-09-30 | 2008-09-30 | 蒸着装置及び蒸着方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008254563A JP5197277B2 (ja) | 2008-09-30 | 2008-09-30 | 蒸着装置及び蒸着方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010084194A JP2010084194A (ja) | 2010-04-15 |
| JP2010084194A5 true JP2010084194A5 (ja) | 2011-11-04 |
| JP5197277B2 JP5197277B2 (ja) | 2013-05-15 |
Family
ID=42248442
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008254563A Expired - Fee Related JP5197277B2 (ja) | 2008-09-30 | 2008-09-30 | 蒸着装置及び蒸着方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5197277B2 (ja) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101313877B1 (ko) * | 2012-07-06 | 2013-10-01 | 주식회사 유니텍스 | 소스 컨테이너 및 기상 증착용 반응로 |
| CN113930738B (zh) * | 2020-06-29 | 2023-09-12 | 宝山钢铁股份有限公司 | 一种真空镀膜用的金属蒸汽调制装置及其调制方法 |
| KR102572354B1 (ko) * | 2021-02-25 | 2023-08-29 | (주)데포랩 | 증착공정용 모니터링 시스템 및 그 방법 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01270314A (ja) * | 1988-04-22 | 1989-10-27 | Seiko Epson Corp | 気相成長装置 |
| JPH11236673A (ja) * | 1998-02-20 | 1999-08-31 | Mitsubishi Electric Corp | 化学気相成長装置 |
| JP4220232B2 (ja) * | 2002-12-26 | 2009-02-04 | Ｈｏｙａ株式会社 | 反射防止膜を有する光学部材 |
| JP5305328B2 (ja) * | 2007-06-07 | 2013-10-02 | 株式会社日立国際電気 | 基板処理装置 |
| JP2009235496A (ja) * | 2008-03-27 | 2009-10-15 | Tokyo Electron Ltd | 原料ガスの供給システム及び成膜装置 |
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2008
- 2008-09-30 JP JP2008254563A patent/JP5197277B2/ja not_active Expired - Fee Related