JP2010078981A5 - - Google Patents

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Publication number
JP2010078981A5
JP2010078981A5 JP2008247904A JP2008247904A JP2010078981A5 JP 2010078981 A5 JP2010078981 A5 JP 2010078981A5 JP 2008247904 A JP2008247904 A JP 2008247904A JP 2008247904 A JP2008247904 A JP 2008247904A JP 2010078981 A5 JP2010078981 A5 JP 2010078981A5
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JP
Japan
Prior art keywords
acid
group
forming
resist film
resist pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008247904A
Other languages
English (en)
Japanese (ja)
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JP2010078981A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2008247904A priority Critical patent/JP2010078981A/ja
Priority claimed from JP2008247904A external-priority patent/JP2010078981A/ja
Publication of JP2010078981A publication Critical patent/JP2010078981A/ja
Publication of JP2010078981A5 publication Critical patent/JP2010078981A5/ja
Pending legal-status Critical Current

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JP2008247904A 2008-09-26 2008-09-26 リソグラフィープロセスに適用されるリンス液及び当該リンス液を用いたレジストパターンの形成方法 Pending JP2010078981A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008247904A JP2010078981A (ja) 2008-09-26 2008-09-26 リソグラフィープロセスに適用されるリンス液及び当該リンス液を用いたレジストパターンの形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008247904A JP2010078981A (ja) 2008-09-26 2008-09-26 リソグラフィープロセスに適用されるリンス液及び当該リンス液を用いたレジストパターンの形成方法

Publications (2)

Publication Number Publication Date
JP2010078981A JP2010078981A (ja) 2010-04-08
JP2010078981A5 true JP2010078981A5 (cg-RX-API-DMAC7.html) 2011-10-06

Family

ID=42209496

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008247904A Pending JP2010078981A (ja) 2008-09-26 2008-09-26 リソグラフィープロセスに適用されるリンス液及び当該リンス液を用いたレジストパターンの形成方法

Country Status (1)

Country Link
JP (1) JP2010078981A (cg-RX-API-DMAC7.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5848869B2 (ja) * 2010-08-25 2016-01-27 富士フイルム株式会社 パターン形成方法
US11009795B2 (en) * 2016-03-30 2021-05-18 Nissan Chemical Corporation Aqueous solution for resist pattern coating and pattern forming methods using the same
US20230103242A1 (en) * 2019-12-04 2023-03-30 Nissan Chemical Corporation Method for producing polymer

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11249323A (ja) * 1998-03-05 1999-09-17 Kao Corp レジスト現像方法
JP2006011054A (ja) * 2004-06-25 2006-01-12 Shin Etsu Chem Co Ltd リンス液及びこれを用いたレジストパターン形成方法
WO2008070060A2 (en) * 2006-12-06 2008-06-12 Fujifilm Electronic Materials U.S.A., Inc. Device manufacturing process utilizing a double pattering process

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