JP2010044993A - 熱陰極およびそれを備えるイオン源 - Google Patents
熱陰極およびそれを備えるイオン源 Download PDFInfo
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- JP2010044993A JP2010044993A JP2008209814A JP2008209814A JP2010044993A JP 2010044993 A JP2010044993 A JP 2010044993A JP 2008209814 A JP2008209814 A JP 2008209814A JP 2008209814 A JP2008209814 A JP 2008209814A JP 2010044993 A JP2010044993 A JP 2010044993A
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- conductor
- hot cathode
- inner conductor
- outer conductor
- heating current
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- 239000004020 conductor Substances 0.000 claims abstract description 219
- 238000010438 heat treatment Methods 0.000 claims abstract description 30
- 230000008018 melting Effects 0.000 claims description 18
- 238000002844 melting Methods 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 12
- 150000002500 ions Chemical class 0.000 description 31
- 238000000605 extraction Methods 0.000 description 9
- 239000007787 solid Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 238000010884 ion-beam technique Methods 0.000 description 6
- 230000004043 responsiveness Effects 0.000 description 6
- 238000003466 welding Methods 0.000 description 6
- 230000005855 radiation Effects 0.000 description 5
- 238000010894 electron beam technology Methods 0.000 description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 4
- 229910052721 tungsten Inorganic materials 0.000 description 4
- 239000010937 tungsten Substances 0.000 description 4
- 239000000615 nonconductor Substances 0.000 description 3
- 238000010891 electric arc Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/13—Solid thermionic cathodes
- H01J1/15—Cathodes heated directly by an electric current
- H01J1/16—Cathodes heated directly by an electric current characterised by the shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
- H01J3/027—Construction of the gun or parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/04—Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/065—Construction of guns or parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/063—Electron sources
- H01J2237/06308—Thermionic sources
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
- Solid Thermionic Cathode (AREA)
Abstract
【解決手段】 この熱陰極10は、中空の外部導体2と、その内側に同軸状に配置されている中空の内部導体1と、両導体1、2の先端部を電気的に接続する接続導体3とを備えている。加熱電流IH は、接続導体3を通して折り返されて、外部導体2と内部導体1とで互いに逆向きに流される。
【選択図】 図2
Description
2 外部導体
3 接続導体
4 接続部
10 熱陰極
20 イオン源
26 加熱電源
IH 加熱電流
Claims (4)
- 加熱電流が流されて熱電子を放出する熱陰極であって、
中空の外部導体と、
前記外部導体の内側に同軸状に配置されている中空の内部導体と、
前記外部導体の先端部と前記内部導体の先端部とを電気的に接続する接続導体とを備えており、
かつ前記加熱電流は、前記接続導体を通して折り返されて、前記外部導体と前記内部導体とで互いに逆向きに流されることを特徴とする熱陰極。 - 加熱電流が流されて熱電子を放出する熱陰極であって、
中空の外部導体と、
前記外部導体の内側に同軸状に配置されている中空の内部導体とを備えており、
前記外部導体の先端部と前記内部導体の先端部とを電気的に直接接続しており、
かつ前記加熱電流は、前記外部導体と内部導体との接続部で折り返されて、前記外部導体と前記内部導体とで互いに逆向きに流されることを特徴とする熱陰極。 - 前記内部導体は、前記外部導体よりも融点の高い材料で形成されている請求項1または2記載の熱陰極。
- 請求項1、2または3記載の熱陰極を、プラズマ生成用の陰極として備えているイオン源。
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008209814A JP5119396B2 (ja) | 2008-08-18 | 2008-08-18 | 熱陰極およびそれを備えるイオン源 |
| US12/511,660 US8188645B2 (en) | 2008-08-18 | 2009-07-29 | Hot cathode and ion source including the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008209814A JP5119396B2 (ja) | 2008-08-18 | 2008-08-18 | 熱陰極およびそれを備えるイオン源 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010044993A true JP2010044993A (ja) | 2010-02-25 |
| JP5119396B2 JP5119396B2 (ja) | 2013-01-16 |
Family
ID=41680651
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008209814A Expired - Fee Related JP5119396B2 (ja) | 2008-08-18 | 2008-08-18 | 熱陰極およびそれを備えるイオン源 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US8188645B2 (ja) |
| JP (1) | JP5119396B2 (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI667680B (zh) * | 2014-05-26 | 2019-08-01 | 日商住友重機械離子技術有限公司 | Ion generating device and hot electron emitting unit |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5040723B2 (ja) * | 2008-02-26 | 2012-10-03 | 日新イオン機器株式会社 | イオン源 |
| JP4428467B1 (ja) * | 2008-08-27 | 2010-03-10 | 日新イオン機器株式会社 | イオン源 |
| WO2015063077A1 (en) * | 2013-10-29 | 2015-05-07 | Osram Opto Semiconductors Gmbh | Wavelength conversion element, method of making, and light-emitting semiconductor component having same |
| WO2019058511A1 (ja) * | 2017-09-22 | 2019-03-28 | 住友重機械工業株式会社 | イオン源装置 |
| US11145496B2 (en) * | 2018-05-29 | 2021-10-12 | Varian Semiconductor Equipment Associates, Inc. | System for using O-rings to apply holding forces |
| US10748738B1 (en) * | 2019-03-18 | 2020-08-18 | Applied Materials, Inc. | Ion source with tubular cathode |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5334099A (en) * | 1976-09-09 | 1978-03-30 | Toshiba Corp | Ion generator device |
| JPS5457859A (en) * | 1977-10-17 | 1979-05-10 | Hitachi Ltd | Ion source |
| JPH01176633A (ja) * | 1987-12-30 | 1989-07-13 | Tokyo Electron Ltd | 電子ビーム励起イオン源 |
| JP2006054108A (ja) * | 2004-08-11 | 2006-02-23 | Doshisha | アーク放電用陰極及びイオン源 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2201819A (en) * | 1925-03-05 | 1940-05-21 | Raytheon Mfg Co | Electronic device |
| DE3014151C2 (de) * | 1980-04-12 | 1982-11-18 | Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe | Generator für gepulste Elektronenstrahlen |
| WO1989010003A1 (fr) * | 1988-04-08 | 1989-10-19 | Siemens Aktiengesellschaft | Tube a rayons x plasmique, en particulier pour la preionisation par rayons x de lasers a gaz, et usage en tant que canon electronique |
| TW430840B (en) * | 1995-03-24 | 2001-04-21 | Hitachi Ltd | Cathode ray tube having an improved cathode structure and a method of making the same |
-
2008
- 2008-08-18 JP JP2008209814A patent/JP5119396B2/ja not_active Expired - Fee Related
-
2009
- 2009-07-29 US US12/511,660 patent/US8188645B2/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5334099A (en) * | 1976-09-09 | 1978-03-30 | Toshiba Corp | Ion generator device |
| JPS5457859A (en) * | 1977-10-17 | 1979-05-10 | Hitachi Ltd | Ion source |
| JPH01176633A (ja) * | 1987-12-30 | 1989-07-13 | Tokyo Electron Ltd | 電子ビーム励起イオン源 |
| JP2006054108A (ja) * | 2004-08-11 | 2006-02-23 | Doshisha | アーク放電用陰極及びイオン源 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI667680B (zh) * | 2014-05-26 | 2019-08-01 | 日商住友重機械離子技術有限公司 | Ion generating device and hot electron emitting unit |
Also Published As
| Publication number | Publication date |
|---|---|
| US8188645B2 (en) | 2012-05-29 |
| JP5119396B2 (ja) | 2013-01-16 |
| US20100038556A1 (en) | 2010-02-18 |
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