JP2010040548A - Substrate treating method, substrate treating device, and liquid drop holding tool - Google Patents

Substrate treating method, substrate treating device, and liquid drop holding tool Download PDF

Info

Publication number
JP2010040548A
JP2010040548A JP2008198150A JP2008198150A JP2010040548A JP 2010040548 A JP2010040548 A JP 2010040548A JP 2008198150 A JP2008198150 A JP 2008198150A JP 2008198150 A JP2008198150 A JP 2008198150A JP 2010040548 A JP2010040548 A JP 2010040548A
Authority
JP
Japan
Prior art keywords
substrate
opening
jig
droplet
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008198150A
Other languages
Japanese (ja)
Other versions
JP2010040548A5 (en
JP5281331B2 (en
Inventor
Yoshio Sakurai
良夫 櫻井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NAS GIKEN KK
NAS Giken Inc
Original Assignee
NAS GIKEN KK
NAS Giken Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NAS GIKEN KK, NAS Giken Inc filed Critical NAS GIKEN KK
Priority to JP2008198150A priority Critical patent/JP5281331B2/en
Publication of JP2010040548A publication Critical patent/JP2010040548A/en
Publication of JP2010040548A5 publication Critical patent/JP2010040548A5/ja
Application granted granted Critical
Publication of JP5281331B2 publication Critical patent/JP5281331B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate treating method, a substrate treating device and a liquid drop holding tool, treating a surface of a substrate with liquid drops by a simple structure. <P>SOLUTION: The substrate treating method includes a preparing step of preparing a tool formed with an annular opening to blow off a gas through the opening, an adhering step of adhering the liquid drops to the surface of the substrate and a scanning step of holding the tool such that the opening surrounds the liquid drops adhered to the substrate surface viewing the substrate orthogonal to the substrate surface and relatively moving the tool along the substrate surface while spraying the gas to the substrate surface through the opening, in place of a conventional substrate treating method of treating the substrate with the liquid drops. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、基板を処理するための基板を処理する基板処理方法と基板処理装置と基板の表面に付着した液滴を保持する液滴保持治具とに係る。特に、基板の表面を液滴で処理する方法と構成とに特徴のある基板処理方法と基板処理装置と液滴保持治具とに関する。   The present invention relates to a substrate processing method for processing a substrate, a substrate processing apparatus, and a droplet holding jig for holding droplets attached to the surface of the substrate. In particular, the present invention relates to a substrate processing method, a substrate processing apparatus, and a droplet holding jig characterized by a method and configuration for processing the surface of a substrate with droplets.

基板の表面を液滴で処理をするのに基板処理方法を実施する。
基板の表面を液滴で処理するのに基板処理装置を使用する。
基板を処理する際に基板の表面に付着した液滴を保持するのに液滴保持治具を用いる。
基板の表面が液滴に対して疎水性である場合に、基板の表面に付着した液滴を既存の液滴保持治具により保持する。
基板の表面が親水性である場合には、液滴が基板の表面に沿って拡がろうとするので、基板の表面に付着した液滴を一つのまとまりにして保持するのが難しい。
基板の表面がエッチング処理等により粗れている場合には、液滴が基板の表面の微細な凹凸にひっかかるので、基板の表面に付着した液滴を一つのまとまりにして保持するのが難しく、液滴を基板の表面に沿って移動させるのが難しい。
例えば、半導体や液晶の製造設備や検査設備において、基板処理装置が使用される。
基板処理装置は、基板を処理する装置である。例えば、基板は、半導体ウエハー、サファイヤウエハ、液晶基板等の基板である。半導体ウエハーは、シリコン、ガリウム、炭化ケイ素等のウエハーである。
基板処理装置が、半導体ウエハー等の表面に含まれる、ナトリウム、カリウム、鉄等の不純物の量を正確に測定する際に用いられる。
A substrate processing method is implemented to process the surface of a substrate with droplets.
A substrate processing apparatus is used to process the surface of the substrate with droplets.
A droplet holding jig is used to hold droplets attached to the surface of the substrate when the substrate is processed.
When the surface of the substrate is hydrophobic to the droplet, the droplet attached to the surface of the substrate is held by an existing droplet holding jig.
When the surface of the substrate is hydrophilic, the droplets try to spread along the surface of the substrate, so that it is difficult to hold the droplets adhering to the surface of the substrate as one unit.
When the surface of the substrate is rough due to an etching process or the like, the droplets are caught by fine irregularities on the surface of the substrate, so it is difficult to hold the droplets adhering to the surface of the substrate as one unit, It is difficult to move the droplet along the surface of the substrate.
For example, a substrate processing apparatus is used in a semiconductor or liquid crystal manufacturing facility or inspection facility.
The substrate processing apparatus is an apparatus that processes a substrate. For example, the substrate is a substrate such as a semiconductor wafer, a sapphire wafer, or a liquid crystal substrate. The semiconductor wafer is a wafer of silicon, gallium, silicon carbide or the like.
A substrate processing apparatus is used when accurately measuring the amount of impurities such as sodium, potassium, and iron contained in the surface of a semiconductor wafer or the like.

例えば、半導体ウエハーの表面の不純物を正確に測定する目的とその方法を簡単に説明する。
半導体ウエハーの表面に形成された酸化膜や窒化膜等の薄膜中に、不純物が含まれていいると、その不純物の量が微量であっても、半導体素子の電気的特性に大きな影響を与える。
従って、半導体素子の製造設備において、ウエハー表面から不純物の混入をできる限り抑制することが要請されている。
そのために、半導体ウエハーの表面に存在する不純物の量を正確に測定することが行われている。
For example, the purpose and method for accurately measuring impurities on the surface of a semiconductor wafer will be briefly described.
If an impurity is contained in a thin film such as an oxide film or a nitride film formed on the surface of a semiconductor wafer, even if the amount of the impurity is very small, the electrical characteristics of the semiconductor element are greatly affected.
Accordingly, there is a demand for suppressing the contamination of impurities from the wafer surface as much as possible in a semiconductor device manufacturing facility.
For this purpose, the amount of impurities present on the surface of the semiconductor wafer is accurately measured.

最近、ウエハー表面に存在する不純物の量を測定するのに用いられていた二次イオン質量分析法やオージェ分光分析法や中性子放射化分析法に代わって、ふっ化物溶液を持ちいて、不純物の量を測定する。例えば、ふっ化物溶液はHF(ふっ化水素)水溶液である。
シリコンウエハーの表面の酸化膜をHF(ふっ化水素)水溶液で溶解した後で、そのHF(ふっ化水素)水溶液を捕集して、HF(ふっ化水素)水溶液中の不純物を分析することが行われる。捕集したHF(ふっ化水素)水溶液の量が少なくすると、不純物の濃度が高くなり、測定精度が向上するという特徴を有する。
例えば、HF(ふっ化水素)水溶液の蒸気に基板を曝し、基板の酸化層を溶解した後で、基板の表面にHF(ふっ化水素)水溶液の液滴を滴下し、その液滴を基板の表面に付着したまま移動する。液滴に酸化膜の中の不純物が捕集される。その液滴中の不純物の量を計測することにより、基板表面の不純物の量を検査する。
例えば、ICPマス分析計によりふっ化物溶液の液滴中の不純物の量を計測する。
Instead of secondary ion mass spectrometry, Auger spectroscopy, or neutron activation analysis, which has recently been used to measure the amount of impurities present on the wafer surface, it has a fluoride solution, and the amount of impurities Measure. For example, the fluoride solution is an aqueous HF (hydrogen fluoride) solution.
After the oxide film on the surface of the silicon wafer is dissolved in an HF (hydrogen fluoride) aqueous solution, the HF (hydrogen fluoride) aqueous solution is collected and the impurities in the HF (hydrogen fluoride) aqueous solution are analyzed. Done. When the amount of the collected HF (hydrogen fluoride) aqueous solution is small, the impurity concentration increases, and the measurement accuracy is improved.
For example, after exposing the substrate to the vapor of HF (hydrogen fluoride) aqueous solution and dissolving the oxide layer of the substrate, a droplet of HF (hydrogen fluoride) aqueous solution is dropped on the surface of the substrate, and the droplet is applied to the substrate. Move while attached to the surface. Impurities in the oxide film are collected in the droplets. The amount of impurities on the substrate surface is inspected by measuring the amount of impurities in the droplet.
For example, the amount of impurities in a fluoride solution droplet is measured by an ICP mass analyzer.

上記の場合、基板処理装置をもちい、基板の表面に液滴を滴下し、治具等をもちいて液滴を基板の表面に走査して、走査した領域の表面の酸化層を溶解する。
シリコンウエハーとHF(ふっ化水素)水溶液は疎水性の関係にあるので、HF(ふっ化水素)水溶液の液滴はシリコンウエハーの表面で球状になる。その球状の液滴を治具で保持して動かすと、極めて容易に液滴を基板の表面で所定の軌跡に沿って動かすことができる。
In the above case, the substrate processing apparatus is used to drop droplets on the surface of the substrate, and a jig or the like is used to scan the droplets on the surface of the substrate, thereby dissolving the oxide layer on the surface of the scanned region.
Since the silicon wafer and the HF (hydrogen fluoride) aqueous solution have a hydrophobic relationship, droplets of the HF (hydrogen fluoride) aqueous solution become spherical on the surface of the silicon wafer. When the spherical droplet is held and moved by a jig, the droplet can be moved along a predetermined locus on the surface of the substrate very easily.

しかし、シリコンウエウハーの表面がエッチング処理後であると表面に微細な凹凸があるので、基板の表面で液滴を保持して移動させることが難しくなる。
また、基板と液滴とが親水性の関係にある場合には、液滴を基板の表面で保持して移動させることはさらに困難になる。
例えば、サファイアウエハーの表面は親水性である。
発明者は、上記の事情を考慮して、基板に付着した液滴を疎水性、親水性の差や基板の表面の粗度の差に影響されずに、基板の表面に付着した液滴を保持できる方法と構造とを案出しようとし、また基板の表面に沿って液滴を相対移動させることをできる方法と構造とを案出しようとした。
However, if the surface of the silicon wafer is after the etching process, there are fine irregularities on the surface, making it difficult to hold and move the droplets on the surface of the substrate.
In addition, when the substrate and the droplet are in a hydrophilic relationship, it becomes more difficult to move the droplet while holding the droplet on the surface of the substrate.
For example, the surface of a sapphire wafer is hydrophilic.
In consideration of the above circumstances, the inventor applied droplets adhering to the surface of the substrate without being affected by differences in hydrophobicity and hydrophilicity and differences in surface roughness of the substrate. An attempt was made to devise a method and structure capable of holding, and an attempt to devise a method and structure capable of relatively moving droplets along the surface of the substrate.

特開平02−272359号JP 02-272359 A 特開平02−028533号JP 02-028533 特開平08−233709号JP 08-233709 A 特開平02−229428号Japanese Patent Laid-Open No. 02-229428

本発明は以上に述べた問題点に鑑み案出されたもので、簡易な構成で、基板の表面を液滴で処理する基板処理方法と基板処理装置と液滴保持治具とを提供しようとする。   The present invention has been devised in view of the above-described problems, and is intended to provide a substrate processing method, a substrate processing apparatus, and a droplet holding jig for processing the surface of a substrate with droplets with a simple configuration. To do.

上記目的を達成するため、本発明に係る基板を液滴で処理する基板処理方法を、環状の開口を形成され前記開口から気体を噴き出し可能になった治具を準備する準備工程と、基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に前記治具を保持して前記開口から噴き出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させる走査工程と、を備えるものとした。   In order to achieve the above object, a substrate processing method for processing a substrate according to the present invention with droplets includes a preparation step of preparing a jig in which an annular opening is formed and gas can be ejected from the opening, The jig is held on the surface of the substrate while blowing the gas blown out from the opening while holding the jig so that the opening surrounds the droplet attached to the surface of the substrate when viewed from the direction orthogonal to the surface. And a scanning step of relatively moving along the surface.

上記本発明の構成により、前記治具が、環状の開口を形成され前記開口から気体を噴き出し可能になったものである。走査工程で、基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に前記治具を保持して前記開口から噴き出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させる。
その結果、基板の表面に付着した液滴が基板の表面に沿って相対移動する。
According to the configuration of the present invention, the jig is formed with an annular opening so that gas can be ejected from the opening. In the scanning process, while holding the jig so as to surround a droplet attached to the surface of the substrate when viewed from the direction orthogonal to the surface of the substrate with the opening, the gas blown from the opening is blown to the surface of the substrate The jig is relatively moved along the surface of the substrate.
As a result, the droplets adhering to the surface of the substrate move relatively along the surface of the substrate.

上記目的を達成するため、本発明に係る基板を液滴で処理する基板処理方法を、端面を形成する端面部を有し前記端面の周囲を囲う環状の開口を形成され前記開口から気体を噴き出し可能になった治具を準備する準備工程と、前記端面を基板の表面に付着した液滴に接触させて基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に前記治具を保持して前記開口から噴き出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させる走査工程と、を備えるものとした。   In order to achieve the above object, a substrate processing method according to the present invention for processing a substrate with droplets is formed by forming an annular opening having an end face portion forming an end face and surrounding the end face, and ejecting a gas from the opening. A preparatory step for preparing a jig that has been made possible, and the opening of the droplets attached to the substrate surface when the substrate is viewed from a direction orthogonal to the substrate surface by bringing the end face into contact with the droplets attached to the substrate surface. And a scanning step of relatively moving the jig along the surface of the substrate while blowing the gas blown from the opening and blowing the gas blown from the opening.

上記本発明の構成により、前記治具が、端面を形成する端面部を有し、前記端面の周囲を囲う環状の開口を形成され、前記開口から気体を噴き出し可能になったものである。走査工程で、前記端面を基板の表面に付着した液滴に接触させて基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に前記治具を保持して前記開口から噴き出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させる。
その結果、基板の表面に付着し端面に接触した液滴が基板の表面に沿って相対移動する。
According to the configuration of the present invention, the jig has an end surface portion that forms an end surface, an annular opening surrounding the end surface is formed, and gas can be ejected from the opening. In the scanning process, the end surface is brought into contact with a droplet attached to the surface of the substrate, the substrate is viewed from a direction orthogonal to the surface of the substrate, and the jig is held so that the droplet attached to the surface of the substrate is surrounded by the opening. Then, the jig is relatively moved along the surface of the substrate while the gas blown from the opening is blown onto the surface of the substrate.
As a result, the droplet that adheres to the surface of the substrate and contacts the end surface relatively moves along the surface of the substrate.

上記目的を達成するため、本発明に係る基板を液滴で処理する基板処理方法を、C字状の開口を形成され前記開口から気体を噴き出し可能になった治具を準備する準備工程と、
基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に前記治具を保持して前記開口から噴き出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させつつ前記開口を前記治具の相対移動する軌跡の後方に位置させる走査工程と、を備えるものとした。
In order to achieve the above object, a substrate processing method for processing a substrate according to the present invention with droplets, a preparation step of preparing a jig formed with a C-shaped opening and capable of ejecting gas from the opening,
The jig is held while blowing the gas blown from the opening onto the surface of the substrate while holding the jig so as to surround the opening with droplets attached to the surface of the substrate when viewed from the direction orthogonal to the surface of the substrate. A scanning step in which the opening is positioned behind the locus of relative movement of the jig while relatively moving along the surface of the substrate.

上記本発明の構成により、前記治具が、C字状の開口を形成され、前記開口から気体を噴き出し可能になったものである。走査工程で、基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に前記治具を保持して前記開口から噴き出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させつつ前記開口を前記治具の相対移動する軌跡の後方に位置させる。
その結果、基板の表面に付着した液滴が基板の表面に沿って相対移動する。
According to the configuration of the present invention, the jig is formed with a C-shaped opening, and gas can be ejected from the opening. In the scanning process, while holding the jig so as to surround a droplet attached to the surface of the substrate when viewed from the direction orthogonal to the surface of the substrate with the opening, the gas blown from the opening is blown to the surface of the substrate The opening is positioned behind the locus of relative movement of the jig while relatively moving the jig along the surface of the substrate.
As a result, the droplets adhering to the surface of the substrate move relatively along the surface of the substrate.

上記目的を達成するため、本発明に係る基板を液滴で処理する基板処理方法を、円形の仮想線に沿って並んだ複数の開口を形成され複数の前記開口から気体を噴き出し可能になった治具を準備する準備工程と、基板の表面の直交方向から基板を見て基板の表面に付着した液滴を複数の前記開口で囲う様に前記治具を保持して複数の前記開口から噴き出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させる走査工程と、を備えるものとした。   In order to achieve the above object, a substrate processing method for processing a substrate according to the present invention with droplets is formed with a plurality of openings arranged along a circular imaginary line, and a gas can be ejected from the plurality of openings. A preparatory step for preparing a jig, and the liquid droplet adhering to the surface of the substrate viewed from the direction orthogonal to the surface of the substrate is held by the plurality of openings, and the jig is held out and ejected from the plurality of openings. And a scanning step of relatively moving the jig along the surface of the substrate while blowing the gas on the surface of the substrate.

上記本発明の構成により、前記治具が、円形の仮想線に沿って並んだ複数の開口を形成され複数の前記開口から気体を噴き出し可能になったものである。走査工程で、基板の表面の直交方向から基板を見て基板の表面に付着した液滴を複数の前記開口で囲う様に前記治具を保持して複数の前記開口から噴き出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させる。
その結果、基板の表面に付着した液滴が基板の表面に沿って相対移動する。
With the configuration of the present invention described above, the jig is formed with a plurality of openings arranged along a circular imaginary line, and gas can be ejected from the plurality of openings. In the scanning step, the substrate is viewed from a direction orthogonal to the surface of the substrate and the jig is held so as to surround the droplets adhering to the surface of the substrate surrounded by the plurality of openings. The jig is relatively moved along the surface of the substrate while spraying on the surface.
As a result, the droplets adhering to the surface of the substrate move relatively along the surface of the substrate.

以下に、本発明の実施形態に係る複数の基板処理方法を説明する。本発明は、以下に記載した実施形態のいずれか、またはそれらの中の二つ以上が組み合わされた態様を含む。   Hereinafter, a plurality of substrate processing methods according to embodiments of the present invention will be described. The present invention includes any of the embodiments described below, or a combination of two or more of them.

さらに、本発明の実施形態に係る基板処理方法は、基板の表面に液滴を付着させる付着工程と、を備え、前記治具が前記開口に囲われた内側に貫通穴を形成され、前記付着工程が前記開口を基板の表面に向けて前記治具を保持し前記開口から噴き出した気体を基板の表面に吹き付けている際に液滴を前記貫通穴を通過して基板の表面に付着させる。
上記実施形態の構成により、前記開口を基板の表面に向けて前記治具を保持し前記開口から噴き出した気体を基板の表面に吹き付けている際に、液滴を前記貫通穴を通過して基板の表面に付着させる。
その結果、基板の表面に付着された液滴が開口から噴き出す気体に周囲を囲われて位置が安定する。
Furthermore, the substrate processing method according to an embodiment of the present invention comprises an attaching step of attaching droplets to the surface of the substrate, wherein the jig is formed with a through hole on the inner side surrounded by the opening, and the attaching In the process, when the opening is directed to the surface of the substrate and the jig is held and the gas ejected from the opening is sprayed on the surface of the substrate, droplets pass through the through holes and adhere to the surface of the substrate.
With the configuration of the above embodiment, when the opening is directed to the surface of the substrate and the jig is held and the gas blown out from the opening is sprayed on the surface of the substrate, the droplets pass through the through-hole and pass through the substrate. Adhere to the surface.
As a result, the droplets attached to the surface of the substrate are surrounded by the gas ejected from the opening and the position is stabilized.

さらに、本発明の実施形態に係る基板処理方法は、基板に付着した液滴を回収する回収工程と、を備え、前記治具が前記開口に囲われた内側に貫通穴を形成され、前記回収工程が前記開口を基板の表面に向けて前記治具を保持し前記開口から噴き出した気体を基板の表面に吹き付けている際に基板の表面に付着している液滴を前記貫通穴を通過して回収する。
上記実施形態の構成により、前記開口を基板の表面に向けて前記治具を保持し前記開口から噴き出した気体を基板の表面に吹き付けている際に基板の表面に付着している液滴を前記貫通穴を通過して回収する。
その結果、基板の表面に付着された液滴が開口から噴き出す気体に周囲を囲われて位置が安定した状態で回収される。
Furthermore, the substrate processing method according to an embodiment of the present invention includes a recovery step of recovering droplets attached to the substrate, wherein the jig is formed with a through hole inside the opening, and the recovery is performed. When the step holds the jig with the opening facing the surface of the substrate and the gas blown from the opening is sprayed on the surface of the substrate, the droplets adhering to the surface of the substrate pass through the through hole. And collect.
With the configuration of the above embodiment, when the opening is directed toward the surface of the substrate, the jig is held, and when the gas ejected from the opening is sprayed on the surface of the substrate, the droplets attached to the surface of the substrate are Collect through the through hole.
As a result, the droplets attached to the surface of the substrate are recovered in a state where the periphery is surrounded by the gas ejected from the opening and the position is stable.

さらに、本発明の実施形態に係る基板処理方法は、前記治具が前記開口の外周を形成する外周部と前記開口の内周を形成する内周部とを有し、前記走査工程において、前記開口を基板の表面に向けたとき基板の表面と前記内周部の端部との距離が基板の表面と前記外周部の端部との距離より短い。
上記実施形態の構成により、基板の表面と内周部の前記端部との距離が基板の表面と前記外周部の前記端部との距離よりも短いので開口から基板の表面に噴き出す気体が基板の表面に付着した液滴に直接に吹きつけるのを抑制できる。
その結果、基板の表面に付着した液滴が安定する。
Furthermore, in the substrate processing method according to the embodiment of the present invention, the jig includes an outer peripheral portion that forms an outer periphery of the opening and an inner peripheral portion that forms an inner periphery of the opening. When the opening is directed to the surface of the substrate, the distance between the surface of the substrate and the end of the inner peripheral portion is shorter than the distance between the surface of the substrate and the end of the outer peripheral portion.
With the configuration of the above embodiment, since the distance between the surface of the substrate and the end portion of the inner peripheral portion is shorter than the distance between the surface of the substrate and the end portion of the outer peripheral portion, the gas ejected from the opening to the surface of the substrate is Direct spraying on the droplets adhering to the surface can be suppressed.
As a result, the droplets attached to the surface of the substrate are stabilized.

さらに、本発明の実施形態に係る基板処理方法は、前記治具が前記開口の外周を形成する外周部を有し、前記端面部が前記開口の内周を形成し、前記走査工程において、前記開口を基板の表面に向けたとき基板の表面と前記端面との距離が基板の表面と前記外周部の端部との距離よりも短い。
上記実施形態の構成により、基板の表面と前記端面との距離が基板の表面と前記外周部の前記端部との距離よりも短いので開口から基板の表面に噴き出す気体が基板の表面に付着した液滴に直接に吹きつけるのを抑制できる。
その結果、基板の表面に付着した液滴が安定する。
Furthermore, in the substrate processing method according to the embodiment of the present invention, the jig has an outer peripheral portion that forms an outer periphery of the opening, and the end surface portion forms an inner periphery of the opening. When the opening is directed to the surface of the substrate, the distance between the surface of the substrate and the end surface is shorter than the distance between the surface of the substrate and the end portion of the outer peripheral portion.
With the configuration of the above embodiment, since the distance between the surface of the substrate and the end surface is shorter than the distance between the surface of the substrate and the end portion of the outer peripheral portion, gas ejected from the opening to the surface of the substrate adheres to the surface of the substrate. Direct spraying on the droplets can be suppressed.
As a result, the droplets attached to the surface of the substrate are stabilized.

さらに、本発明の実施形態に係る基板処理方法は、前記開口を基板の表面を向けた状態で前記端面を基板の表面に接近させて前記端面を基板の表面に付着した液滴に接触させる初期工程と、を備える。
上記実施形態の構成により、前記開口を基板の表面を向けた状態で前記端面を基板の表面に接近させて前記端面を基板の表面に付着した液滴に接触させる。
その結果、液滴が基板の表面と端面とに挟まれる。
Further, in the substrate processing method according to the embodiment of the present invention, the end face is brought close to the surface of the substrate in a state where the opening faces the surface of the substrate, and the end face is brought into contact with the droplet attached to the surface of the substrate. A process.
With the configuration of the above-described embodiment, the end surface is brought close to the surface of the substrate with the opening facing the surface of the substrate, and the end surface is brought into contact with a droplet attached to the surface of the substrate.
As a result, the droplet is sandwiched between the surface and the end surface of the substrate.

さらに、本発明の実施形態に係る基板処理方法は、前記端面が外周から中心部に近づくにつれ僅かに凹んでいる凹形状を持ち、前記凹形状の輪郭が液滴を基板の表面に付着させた際の液滴の自由表面の膨らみ具合である凸形状の輪郭と略一致する。
上記実施形態の構成により、前記端面が外周から中心部に近づくにつれ僅かに凹んでいる凹形状を持つ。前記凹形状の輪郭が液滴を基板の表面に付着させた際の液滴の自由表面の膨らみ具合である凸形状の輪郭と略一致する。
その結果、液滴が基板の表面と端面との間に安定して挟まれる。
Furthermore, in the substrate processing method according to the embodiment of the present invention, the end surface has a concave shape that is slightly recessed as it approaches the center portion from the outer periphery, and the contour of the concave shape causes droplets to adhere to the surface of the substrate. This substantially coincides with the contour of the convex shape, which is the degree of swelling of the free surface of the droplet.
According to the configuration of the above embodiment, the end surface has a concave shape that is slightly recessed as it approaches the center from the outer periphery. The concave contour substantially coincides with the convex contour which is the degree of swelling of the free surface of the droplet when the droplet is attached to the surface of the substrate.
As a result, the droplet is stably sandwiched between the surface and the end surface of the substrate.

さらに、本発明の実施形態に係る基板処理方法は、前記端面部が端面に端面の大きさに比較して十分に小さな複数の凹凸形状を設けられる。
上記実施形態の構成により、端面の大きさに比較して十分に小さな複数の凹凸形状が端面部の端面にある。
その結果、端面と液体の接触面積が増えて、液滴が基板の表面と端面とに挟まれ安定する。
Furthermore, in the substrate processing method according to the embodiment of the present invention, the end surface portion is provided with a plurality of concave and convex shapes that are sufficiently smaller than the size of the end surface.
With the configuration of the above-described embodiment, a plurality of uneven shapes that are sufficiently smaller than the size of the end surface are present on the end surface of the end surface portion.
As a result, the contact area between the end surface and the liquid increases, and the droplet is sandwiched between the surface and the end surface of the substrate and stabilized.

上記目的を達成するため、本発明に係る基板を液滴で処理する基板検査装置を、環状の開口を形成され前記開口から気体を噴き出し可能な治具と、基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に前記治具を保持して前記開口から噴き出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させる走査機器と、を備えるものとした。   In order to achieve the above object, a substrate inspection apparatus for processing a substrate according to the present invention with droplets includes a jig formed with an annular opening and capable of ejecting gas from the opening, and a substrate from a direction orthogonal to the surface of the substrate. The jig is relatively moved along the surface of the substrate while holding the jig so as to surround the droplets adhering to the surface of the substrate by the opening and blowing the gas blown from the opening onto the surface of the substrate. A scanning device.

上記本発明の構成により、前記治具が、環状の開口を形成され前記開口から気体を噴き出し可能なものである。走査機器が、基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に前記治具を保持して前記開口から噴き出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させる。
その結果、基板の表面に付着した液滴が基板の表面に沿って相対移動する。
According to the configuration of the present invention, the jig is formed with an annular opening and can eject gas from the opening. While the scanning device sees the substrate from a direction orthogonal to the surface of the substrate and holds the jig so as to surround the droplet attached to the surface of the substrate with the opening, while blowing the gas blown from the opening to the surface of the substrate The jig is relatively moved along the surface of the substrate.
As a result, the droplets adhering to the surface of the substrate move relatively along the surface of the substrate.

上記目的を達成するため、本発明に係る基板を液滴で処理する基板検査装置を、端面を形成する端面部を有し前記端面の周囲を囲う環状の開口を形成され前記開口から気体を噴き出し可能な治具と、前記端面を基板の表面に付着した液滴に接触させて基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に前記治具を保持して前記開口から噴き出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させる走査機器と、を備えるものとした。   In order to achieve the above object, a substrate inspection apparatus for processing a substrate according to the present invention with droplets has an end surface part that forms an end surface and an annular opening surrounding the end surface is formed, and gas is ejected from the opening. A jig capable of contacting the liquid droplets attached to the surface of the substrate with the end face contacting the liquid droplets adhering to the surface of the substrate when viewed from the direction orthogonal to the surface of the substrate. And a scanning device that relatively moves the jig along the surface of the substrate while blowing the gas ejected from the opening onto the surface of the substrate.

上記本発明の構成により、前記治具が、端面を形成する端面部を有し前記端面の周囲を囲う環状の開口を形成され前記開口から気体を噴き出し可能なものである。走査機器が、前記端面を基板の表面に付着した液滴に接触させて基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に前記治具を保持して前記開口から噴き出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させる。
その結果、基板の表面に付着し端面に接触した液滴が基板の表面に沿って相対移動する。
According to the configuration of the present invention, the jig has an end surface portion that forms an end surface, and an annular opening surrounding the end surface is formed, and gas can be ejected from the opening. The scanning device holds the jig so that the end surface is brought into contact with the droplet attached to the surface of the substrate and the droplet attached to the surface of the substrate is surrounded by the opening when viewed from the direction orthogonal to the surface of the substrate. Then, the jig is relatively moved along the surface of the substrate while the gas blown from the opening is blown onto the surface of the substrate.
As a result, the droplet that adheres to the surface of the substrate and contacts the end surface relatively moves along the surface of the substrate.

上記目的を達成するため、本発明に係る基板を液滴で処理する基板検査装置を、C字状の開口を形成され前記開口から気体を噴き出し可能な治具と、基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に前記治具を保持して前記開口から噴き出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させつつ前記開口を前記治具の相対移動する軌跡の後方に位置させる走査機器と、を備えるものとした。   In order to achieve the above object, a substrate inspection apparatus for processing a substrate with droplets according to the present invention comprises a jig formed with a C-shaped opening and capable of ejecting gas from the opening, and a direction orthogonal to the surface of the substrate. The jig is held along the surface of the substrate while holding the jig so as to surround droplets attached to the surface of the substrate when viewed from the substrate and blowing the gas blown from the opening onto the surface of the substrate. And a scanning device that moves the opening behind the path of relative movement of the jig.

上記本発明の構成により、前記治具が、C字状の開口を形成され前記開口から気体を噴き出し可能である。走査機器が、基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に前記治具を保持して前記開口から噴き出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させつつ前記開口を前記治具の相対移動する軌跡の後方に位置させる。
その結果、基板の表面に付着した液滴が基板の表面に沿って相対移動する。
With the configuration of the present invention described above, the jig is formed with a C-shaped opening, and gas can be ejected from the opening. While the scanning device sees the substrate from a direction orthogonal to the surface of the substrate and holds the jig so as to surround the droplet attached to the surface of the substrate with the opening, while blowing the gas blown from the opening to the surface of the substrate The opening is positioned behind the locus of relative movement of the jig while relatively moving the jig along the surface of the substrate.
As a result, the droplets adhering to the surface of the substrate move relatively along the surface of the substrate.

上記目的を達成するため、本発明に係る基板を液滴で処理する基板検査装置を、円形の仮想線に沿って並んだ複数の開口を形成され複数の前記開口から気体を噴き出し可能な治具と、基板の表面の直交方向から基板を見て基板の表面に付着した液滴を複数の前記開口で囲う様に前記治具を保持して複数の前記開口から噴き出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させる走査機器と、を備えるものとした。   In order to achieve the above object, a substrate inspection apparatus for processing a substrate according to the present invention with droplets is a jig that is formed with a plurality of openings arranged along a circular imaginary line and from which a plurality of openings can eject gas. And holding the jig so as to surround the droplets adhering to the surface of the substrate when viewed from the direction orthogonal to the surface of the substrate with the plurality of openings, and the gas ejected from the plurality of openings on the surface of the substrate And a scanning device that relatively moves the jig along the surface of the substrate while spraying.

上記本発明の構成により、前記治具が、円形の仮想線に沿って並んだ複数の開口を形成され複数の前記開口から気体を噴き出し可能なものである。走査機器が、基板の表面の直交方向から基板を見て基板の表面に付着した液滴を複数の前記開口で囲う様に前記治具を保持して複数の前記開口から噴き出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させる。
その結果、基板の表面に付着した液滴が基板の表面に沿って相対移動する。
According to the configuration of the present invention, the jig is formed with a plurality of openings arranged along a circular imaginary line, and gas can be ejected from the plurality of openings. The scanning device holds the jig so as to surround the droplets attached to the surface of the substrate when viewed from the direction orthogonal to the surface of the substrate with the plurality of openings, and the gas ejected from the plurality of openings The jig is relatively moved along the surface of the substrate while spraying on the surface.
As a result, the droplets adhering to the surface of the substrate move relatively along the surface of the substrate.

以下に、本発明の実施形態に係る複数の基板処理装置を説明する。本発明は、以下に記載した実施形態のいずれか、またはそれらの中の二つ以上が組み合わされた態様を含む。   A plurality of substrate processing apparatuses according to embodiments of the present invention will be described below. The present invention includes any of the embodiments described below, or a combination of two or more of them.

さらに、本発明の実施形態に係る基板処理装置は、前記治具が前記開口に囲われた内側に貫通穴を形成され、前記開口を基板の表面に向けて前記治具を保持し前記開口から噴き出した気体を基板の表面に吹き付けている際に液滴を前記貫通穴を通過して基板の表面に付着させることをできる。
上記実施形態の構成により、前記開口を基板の表面に向けて前記治具を保持し前記開口から噴き出した気体を基板の表面に吹き付けている際に、液滴を前記貫通穴を通過して基板の表面に付着させることをできる。
その結果、基板の表面に付着された液滴が開口から噴き出す気体に周囲を囲われて位置が安定する。
Furthermore, in the substrate processing apparatus according to the embodiment of the present invention, a through hole is formed inside the jig surrounded by the opening, the jig is held from the opening with the opening facing the surface of the substrate. When the jetted gas is sprayed on the surface of the substrate, the droplet can pass through the through hole and adhere to the surface of the substrate.
With the configuration of the above embodiment, when the opening is directed to the surface of the substrate and the jig is held and the gas blown out from the opening is sprayed on the surface of the substrate, the droplets pass through the through-hole and pass through the substrate. Can be attached to the surface of
As a result, the droplets attached to the surface of the substrate are surrounded by the gas ejected from the opening and the position is stabilized.

さらに、本発明の実施形態に係る基板処理装置は、前記治具が前記開口に囲われた内側に貫通穴を形成され、前記開口を基板の表面に向けて前記治具を保持し前記開口から噴き出した気体を基板の表面に吹き付けている際に基板の表面に付着している液滴を前記貫通穴を通過して回収することをできる。
上記実施形態の構成により、前記開口を基板の表面に向けて前記治具を保持し前記開口から噴き出した気体を基板の表面に吹き付けている際に基板の表面に付着している液滴を前記貫通穴を通過して回収することをできる。
その結果、基板の表面に付着された液滴が開口から噴き出す気体に周囲を囲われて位置が安定した状態で回収される。
Furthermore, in the substrate processing apparatus according to the embodiment of the present invention, a through hole is formed inside the jig surrounded by the opening, the jig is held from the opening with the opening facing the surface of the substrate. When the jetted gas is sprayed on the surface of the substrate, the droplets adhering to the surface of the substrate can be collected through the through hole.
With the configuration of the above embodiment, when the opening is directed toward the surface of the substrate, the jig is held, and when the gas ejected from the opening is sprayed on the surface of the substrate, the droplets attached to the surface of the substrate are It can be recovered through the through hole.
As a result, the droplets attached to the surface of the substrate are recovered in a state where the periphery is surrounded by the gas ejected from the opening and the position is stable.

さらに、本発明の実施形態に係る基板処理装置は、前記治具が前記開口の外周を形成する外周部と前記開口の内周を形成する内周部とを有し、前記開口を基板の表面に向けたとき基板の表面と前記内周部の端部との距離が基板の表面と前記外周部の端部との距離より短い。
上記実施形態の構成により、基板の表面と内周部の前記端部との距離が基板の表面と前記外周部の前記端部との距離よりも短いので開口から基板の表面に噴き出す気体が基板の表面に付着した液滴に直接に吹きつけるのを抑制できる。
その結果、基板の表面に付着した液滴が安定する。
Furthermore, in the substrate processing apparatus according to the embodiment of the present invention, the jig has an outer peripheral portion that forms an outer periphery of the opening and an inner peripheral portion that forms an inner periphery of the opening, and the opening is formed on the surface of the substrate. The distance between the surface of the substrate and the end of the inner periphery is shorter than the distance between the surface of the substrate and the end of the outer periphery.
With the configuration of the above embodiment, since the distance between the surface of the substrate and the end portion of the inner peripheral portion is shorter than the distance between the surface of the substrate and the end portion of the outer peripheral portion, the gas ejected from the opening to the surface of the substrate is Direct spraying on the droplets adhering to the surface can be suppressed.
As a result, the droplets attached to the surface of the substrate are stabilized.

さらに、本発明の実施形態に係る基板処理装置は、前記治具が前記開口の外周を形成する外周部を有し、前記端面部が前記開口の内周を形成し、前記開口を基板の表面に向けたとき基板の表面と前記端面との距離が基板の表面と前記外周部の端部との距離よりも短い。
上記実施形態の構成により、基板の表面と前記端面との距離が基板の表面と前記外周部の前記端部との距離よりも短いので開口から基板の表面に噴き出す気体が基板の表面に付着した液滴に直接に吹きつけるのを抑制できる。
その結果、基板の表面に付着した液滴が安定する。
Furthermore, in the substrate processing apparatus according to the embodiment of the present invention, the jig has an outer peripheral portion that forms an outer periphery of the opening, the end surface portion forms an inner periphery of the opening, and the opening is formed on the surface of the substrate. The distance between the surface of the substrate and the end surface is shorter than the distance between the surface of the substrate and the end of the outer peripheral portion.
With the configuration of the above embodiment, since the distance between the surface of the substrate and the end surface is shorter than the distance between the surface of the substrate and the end portion of the outer peripheral portion, gas ejected from the opening to the surface of the substrate adheres to the surface of the substrate. Direct spraying on the droplets can be suppressed.
As a result, the droplets attached to the surface of the substrate are stabilized.

さらに、本発明の実施形態に係る基板処理装置は、前記走査機器が前記開口を基板の表面を向けた状態で前記端面を基板の表面に接近させて前記端面を基板の表面に付着した液滴に接触させることをできる。
上記実施形態の構成により、前記開口を基板の表面を向けた状態で前記端面を基板の表面に接近させて前記端面を基板の表面に付着した液滴に接触させる。
その結果、液滴が基板の表面と端面とに挟まれる。
Furthermore, in the substrate processing apparatus according to the embodiment of the present invention, the scanning device causes the end surface to approach the surface of the substrate in a state where the opening faces the surface of the substrate, and the droplet is attached to the surface of the substrate. Can be contacted.
With the configuration of the above-described embodiment, the end surface is brought close to the surface of the substrate with the opening facing the surface of the substrate, and the end surface is brought into contact with a droplet attached to the surface of the substrate.
As a result, the droplet is sandwiched between the surface and the end surface of the substrate.

さらに、本発明の実施形態に係る基板処理装置は、前記端面が外周から中心部に近づくにつれ僅かに凹んでいる凹形状を持ち、前記凹形状の輪郭が液滴を基板の表面に付着させた際の液滴の自由表面の膨らみ具合である凸形状の輪郭と略一致する。
上記実施形態の構成により、前記端面が外周から中心部に近づくにつれ僅かに凹んでいる凹形状を持つ。前記凹形状の輪郭が液滴を基板の表面に付着させた際の液滴の自由表面の膨らみ具合である凸形状の輪郭と略一致する。
その結果、液滴が基板の表面と端面との間に安定して挟まれる。
Furthermore, the substrate processing apparatus according to the embodiment of the present invention has a concave shape in which the end surface is slightly recessed as it approaches the center from the outer periphery, and the contour of the concave shape causes the droplet to adhere to the surface of the substrate. This substantially coincides with the contour of the convex shape, which is the degree of swelling of the free surface of the droplet.
According to the configuration of the above embodiment, the end surface has a concave shape that is slightly recessed as it approaches the center from the outer periphery. The concave contour substantially coincides with the convex contour which is the degree of swelling of the free surface of the droplet when the droplet is attached to the surface of the substrate.
As a result, the droplet is stably sandwiched between the surface and the end surface of the substrate.

さらに、本発明の実施形態に係る基板処理装置は、前記端面部が端面に端面の大きさに比較して十分に小さな複数の凹凸形状を設けられる。
上記実施形態の構成により、端面の大きさに比較して十分に小さな複数の凹凸形状が端面部の端面にある。
その結果、端面と液体の接触面積が増えて、液滴が基板の表面と端面とに挟まれ安定する。
Furthermore, in the substrate processing apparatus according to the embodiment of the present invention, the end surface portion is provided with a plurality of concave and convex shapes that are sufficiently smaller than the size of the end surface.
With the configuration of the above-described embodiment, a plurality of uneven shapes that are sufficiently smaller than the size of the end surface are present on the end surface of the end surface portion.
As a result, the contact area between the end surface and the liquid increases, and the droplet is sandwiched between the surface and the end surface of the substrate and stabilized.

上記目的を達成するため、本発明に係る基板に付着した液滴を保持するための液滴保持治具を、環状の開口を形成され前記開口から気体を噴き出し可能であり、基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に保持された状態で前記開口から噴き出した気体を基板の表面に吹き付けできる様になったものとした。   In order to achieve the above object, a droplet holding jig for holding droplets attached to a substrate according to the present invention is formed with an annular opening, and a gas can be ejected from the opening, and the substrate surface is orthogonal The gas ejected from the opening can be sprayed onto the surface of the substrate while the droplet attached to the surface of the substrate is held so as to be surrounded by the opening when viewed from the direction.

上記本発明の構成により、環状の開口を形成され、前記開口から気体を噴き出し可能である。基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に保持された状態で前記開口から噴き出した気体を基板の表面に吹き付けできる。
その結果、基板の表面に付着した液滴が基板の表面に沿って相対移動できる。
With the configuration of the present invention, an annular opening is formed, and gas can be ejected from the opening. The gas ejected from the opening can be blown onto the surface of the substrate in a state where droplets attached to the surface of the substrate are held so as to be surrounded by the opening when viewed from the direction orthogonal to the surface of the substrate.
As a result, the droplets adhering to the surface of the substrate can be relatively moved along the surface of the substrate.

上記目的を達成するため、本発明に係る基板に付着した液滴を保持するための液滴保持治具を、基板を液滴で処理するための液滴保持治具であって、端面を形成する部分である端面部を、備え、前記端面の周囲を囲う環状の開口を形成され前記開口から気体を噴き出し可能であり、前記端面を基板の表面に付着した液滴に接触させて基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に保持された状態で前記開口から噴き出した気体を基板の表面に吹き付けできる様になったものとした。   In order to achieve the above object, a droplet holding jig for holding droplets attached to a substrate according to the present invention is a droplet holding jig for processing a substrate with droplets, and forms an end face. An end surface portion that is a portion to be formed, an annular opening surrounding the periphery of the end surface is formed, and gas can be ejected from the opening, and the end surface is brought into contact with a droplet attached to the surface of the substrate to thereby contact the surface of the substrate The gas ejected from the opening can be sprayed onto the surface of the substrate while the droplet attached to the surface of the substrate is held so as to be surrounded by the opening when viewed from the orthogonal direction.

上記本発明の構成により、端面部が端面を形成し、前記端面の周囲を囲う環状の開口を形成され前記開口から気体を噴き出し可能である。前記端面を基板の表面に付着した液滴に接触させて基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に保持された状態で前記開口から噴き出した気体を基板の表面に吹き付けできる。
その結果、基板の表面に付着し端面に接触した液滴が基板の表面に沿って相対移動できる。
With the configuration of the present invention, the end surface portion forms an end surface, an annular opening surrounding the end surface is formed, and gas can be ejected from the opening. The end surface is brought into contact with a droplet attached to the surface of the substrate, and the droplet attached to the surface of the substrate is blown out from the opening in a state where the substrate is viewed from a direction orthogonal to the surface of the substrate and surrounded by the opening. Gas can be sprayed onto the surface of the substrate.
As a result, the droplet that adheres to the surface of the substrate and contacts the end surface can move relative to the surface of the substrate.

上記目的を達成するため、本発明に係る基板に付着した液滴を保持するための液滴保持治具を、C字状の開口を形成され、前記開口から気体を噴き出し可能であり、基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に保持された状態で前記開口から噴き出した気体を基板の表面に吹き付ける様になった、ものとした。   In order to achieve the above object, a droplet holding jig for holding droplets attached to a substrate according to the present invention is formed with a C-shaped opening, and gas can be ejected from the opening. The gas blown out from the opening was blown onto the surface of the substrate in a state where droplets attached to the surface of the substrate were held so as to be surrounded by the opening when viewed from the direction orthogonal to the surface.

C字状の開口を形成され、前記開口から気体を噴き出し可能である。基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に保持された状態で前記開口から噴き出した気体を基板の表面に吹き付けできる。
その結果、基板の表面に付着した液滴が基板の表面に沿って相対移動する。
A C-shaped opening is formed, and gas can be ejected from the opening. The gas ejected from the opening can be blown onto the surface of the substrate in a state where droplets attached to the surface of the substrate are held so as to be surrounded by the opening when viewed from the direction orthogonal to the surface of the substrate.
As a result, the droplets adhering to the surface of the substrate move relatively along the surface of the substrate.

上記目的を達成するため、本発明に係る基板に付着した液滴を保持するための液滴保持治具を、円形の仮想線に沿って並んだ複数の開口を形成され複数の前記開口から気体を噴き出し可能であり、基板の表面の直交方向から基板を見て基板の表面に付着した液滴を複数の前記開口で囲う様に保持された状態で複数の前記開口から噴き出した気体を基板の表面に吹き付けできる様になったものとした。   In order to achieve the above object, a droplet holding jig for holding droplets attached to a substrate according to the present invention is formed with a plurality of openings arranged along a circular imaginary line, and gas is emitted from the plurality of openings. Gas that is ejected from the plurality of openings in a state where droplets attached to the surface of the substrate are held so as to be surrounded by the plurality of openings when viewed from the direction orthogonal to the surface of the substrate. It was supposed to be able to spray on the surface.

円形の仮想線に沿って並んだ複数の開口を形成され、複数の前記開口から気体を噴き出し可能である。基板の表面の直交方向から基板を見て基板の表面に付着した液滴を複数の前記開口で囲う様に保持された状態で複数の前記開口から噴出した気体を基板の表面に吹き付けできる。
その結果、基板の表面に付着した液滴が基板の表面に沿って相対移動する。
A plurality of openings arranged along a circular imaginary line are formed, and gas can be ejected from the plurality of openings. Gases ejected from the plurality of openings can be blown onto the surface of the substrate in a state where droplets attached to the surface of the substrate are held so as to be surrounded by the plurality of openings when viewed from the direction orthogonal to the surface of the substrate.
As a result, the droplets adhering to the surface of the substrate move relatively along the surface of the substrate.

以下に、本発明の実施形態に係る複数の液滴保持治具を説明する。本発明は、以下に記載した実施形態のいずれか、またはそれらの中の二つ以上が組み合わされた態様を含む。   A plurality of droplet holding jigs according to the embodiment of the present invention will be described below. The present invention includes any of the embodiments described below, or a combination of two or more of them.

さらに、本発明の実施形態に係る液滴保持治具は、前記開口に囲われた内側に貫通穴を形成され、前記開口を基板の表面に向けて保持された状態で前記開口から噴き出した気体を基板の表面に吹き付けている際に液滴を前記貫通穴を通過して基板の表面に付着させることをできる様になっている。
上記実施形態の構成により、前記開口に囲われた内側に貫通穴を形成される。前記開口を基板の表面に向けて保持された状態で前記開口から噴き出した気体を基板の表面に吹き付けている際に液滴を前記貫通穴を通過して基板の表面に付着させることをできる。
その結果、基板の表面に付着された液滴が開口から噴き出す気体に周囲を囲われて位置が安定する。
Furthermore, in the droplet holding jig according to the embodiment of the present invention, the gas ejected from the opening in a state where a through hole is formed inside the opening and the opening is held toward the surface of the substrate. Is sprayed on the surface of the substrate, the droplets can pass through the through hole and adhere to the surface of the substrate.
With the configuration of the above embodiment, a through hole is formed on the inner side surrounded by the opening. When the gas blown from the opening is sprayed on the surface of the substrate while the opening is held toward the surface of the substrate, the droplets can be attached to the surface of the substrate through the through holes.
As a result, the droplets attached to the surface of the substrate are surrounded by the gas ejected from the opening and the position is stabilized.

さらに、本発明の実施形態に係る液滴保持治具は、前記開口に囲われた内側に貫通穴を形成され、前記開口を基板の表面に向けて保持された状態で前記開口から噴き出した気体を基板の表面に吹き付けている際に基板の表面に付着した液滴を前記貫通穴を通過して回収できる様になっている。
上記実施形態の構成により、前記開口に囲われた内側に貫通穴を形成される。前記開口を基板の表面に向けて保持された状態で前記開口から噴き出した気体を基板の表面に吹き付けている際に基板の表面に付着した液滴を前記貫通穴を通過して回収できる様になっている。
その結果、基板の表面に付着された液滴が開口から噴き出す気体に周囲を囲われて位置が安定した状態で回収される。
Furthermore, in the droplet holding jig according to the embodiment of the present invention, the gas ejected from the opening in a state where a through hole is formed inside the opening and the opening is held toward the surface of the substrate. When the liquid is sprayed on the surface of the substrate, the droplets adhering to the surface of the substrate can be collected through the through hole.
With the configuration of the above embodiment, a through hole is formed on the inner side surrounded by the opening. When the gas blown out from the opening is blown onto the surface of the substrate while the opening is held toward the surface of the substrate, droplets attached to the surface of the substrate can be collected through the through hole. It has become.
As a result, the droplets attached to the surface of the substrate are recovered in a state where the periphery is surrounded by the gas ejected from the opening and the position is stable.

さらに、本発明の実施形態に係る液滴保持治具は、前記開口の外周を形成する外周部と前記開口の内周を形成する内周部とを有し、前記開口を基板の表面に向けたとき基板の表面と前記内周部の端部との距離が基板の表面と前記外周部の端部との距離より短い。
上記実施形態の構成により、基板の表面と内周部の前記端部との距離が基板の表面と前記外周部の前記端部との距離よりも短いので、開口から基板の表面に噴き出す気体が基板の表面に付着した液滴に直接に吹きつけるのを抑制できる。
その結果、基板の表面に付着した液滴が安定する。
Furthermore, the droplet holding jig according to the embodiment of the present invention has an outer peripheral portion that forms the outer periphery of the opening and an inner peripheral portion that forms the inner periphery of the opening, and the opening faces the surface of the substrate. The distance between the surface of the substrate and the end portion of the inner peripheral portion is shorter than the distance between the surface of the substrate and the end portion of the outer peripheral portion.
With the configuration of the above embodiment, since the distance between the surface of the substrate and the end portion of the inner peripheral portion is shorter than the distance between the surface of the substrate and the end portion of the outer peripheral portion, the gas ejected from the opening to the surface of the substrate Direct spraying on the droplets adhering to the surface of the substrate can be suppressed.
As a result, the droplets attached to the surface of the substrate are stabilized.

さらに、本発明の実施形態に係る液滴保持治具は、前記開口の外周を形成する外周部を有し、前記端面部が前記開口の内周を形成し、前記開口を基板の表面に向けたとき基板の表面と前記端面との距離が基板の表面と前記外周部の端部との距離よりも短い。
上記実施形態の構成により、基板の表面と前記端面との距離が基板の表面と前記外周部の前記端部との距離よりも短いので、開口から基板の表面に噴き出す気体が基板の表面に付着した液滴に直接に吹き付けるのを抑制できる。
その結果、基板の表面に付着した液滴が安定する。
Furthermore, the droplet holding jig according to the embodiment of the present invention has an outer peripheral portion that forms an outer periphery of the opening, the end surface portion forms an inner periphery of the opening, and the opening faces the surface of the substrate. The distance between the surface of the substrate and the end surface is shorter than the distance between the surface of the substrate and the end of the outer peripheral portion.
With the configuration of the above embodiment, since the distance between the surface of the substrate and the end surface is shorter than the distance between the surface of the substrate and the end portion of the outer peripheral portion, the gas ejected from the opening to the surface of the substrate adheres to the surface of the substrate. It is possible to suppress spraying directly on the liquid droplets.
As a result, the droplets attached to the surface of the substrate are stabilized.

さらに、本発明の実施形態に係る液滴保持治具は、前記端面が外周から中心部に近づくにつれ僅かに凹んでいる凹形状を持ち、前記凹形状の輪郭が液滴を基板の表面に付着させた際の液滴の自由表面の膨らみ具合である凸形状の輪郭と略一致する。
上記実施形態の構成により、前記端面が外周から中心部に近づくにつれ僅かに凹んでいる凹形状を持つ。前記凹形状の輪郭が液滴を基板の表面に付着させた際の液滴の自由表面の膨らみ具合である凸形状の輪郭と略一致する。
その結果、液滴が基板の表面と端面との間に安定して挟まれる。
Furthermore, the droplet holding jig according to the embodiment of the present invention has a concave shape in which the end surface is slightly recessed as it approaches the center from the outer periphery, and the contour of the concave shape attaches the droplet to the surface of the substrate. This substantially coincides with the contour of the convex shape, which is the degree of swelling of the free surface of the droplet when it is made to flow.
According to the configuration of the above embodiment, the end surface has a concave shape that is slightly recessed as it approaches the center from the outer periphery. The concave contour substantially coincides with the convex contour which is the degree of swelling of the free surface of the droplet when the droplet is attached to the surface of the substrate.
As a result, the droplet is stably sandwiched between the surface and the end surface of the substrate.

さらに、本発明の実施形態に係る液滴保持治具は、前記端面部が端面に端面の大きさに比較して十分に小さな複数の凹凸形状を設けられる。
上記実施形態の構成により、端面の大きさに比較して十分に小さな複数の凹凸形状が端面部の端面にある。
その結果、端面と液体の接触面積が増えて、液滴が基板の表面と端面とに挟まれ安定する。
Furthermore, in the droplet holding jig according to the embodiment of the present invention, the end surface portion is provided with a plurality of concave and convex shapes that are sufficiently smaller than the size of the end surface on the end surface.
With the configuration of the above-described embodiment, a plurality of uneven shapes that are sufficiently smaller than the size of the end surface are present on the end surface of the end surface portion.
As a result, the contact area between the end surface and the liquid increases, and the droplet is sandwiched between the surface and the end surface of the substrate and stabilized.

以上説明したように本発明に係る基板処理方法と基板処理装置と液滴保持治具とは、その構成により、以下の効果を有する。
基板の表面に付着した液滴を環状の開口で囲う様に前記治具を保持して、前記開口から噴出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させるので、基板の表面に付着した液滴が基板の表面に沿って相対移動する。
基板の表面に付着した液滴に端面を接触させて液滴を環状の開口で囲う様に前記治具を保持して、前記開口から噴出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させるので、基板の表面に付着した液滴が基板の表面に沿って相対移動する。
基板の表面に付着した液滴をC字状の前記開口で囲う様に治具を保持して前記開口から噴出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させつつ前記開口を前記治具の相対移動する軌跡の後方に位置させるので、基板の表面に付着した液滴が基板の表面に沿って相対移動する。
基板の表面に付着した液滴を円形の仮想線に沿って並んだ複数の開口で囲う様に前記治具を保持して、複数の前記開口から噴き出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させるので、基板の表面に付着した液滴が基板の表面に沿って相対移動する。
また、開口から基板の表面に気体を吹き付けている際に液滴が前記貫通穴を通過して基板の表面に付着させるので、基板の表面に付着された液滴が開口から基板の表面に向けて噴き出す気体に周囲を押されて位置が安定する。
また、開口から基板の表面に気体を吹き付けている際に基板の表面に付着した液滴を前記貫通穴を通過して回収するので、基板の表面に付着された液滴が開口から噴き出す気体に周囲を囲われて位置を安定された状態で回収される。
また、基板の表面に付着した液滴を開口で囲う様にして前記治具を保持すると、開口の内周を形成する内周部の端部が開口の外周を形成する外周部の端部より基板の表面に近くなるので、基板の表面に付着した液滴が安定する。
また、基板の表面に付着した液滴を開口で囲う様にして前記治具を保持すると、開口の内周を形成する端面部の端面が開口の外周を形成する外周部の端部より基板の表面に近くなるので、基板の表面に付着した液滴が安定する。
また、前記開口を基板の表面を向けた状態で前記端面を基板の表面に接近させて前記端面を基板の表面に付着した液滴に接触させるので、液滴が基板の表面と端面とに挟まれる。
また、前記端面の凹んでいる凹形状の輪郭が液滴を基板の表面に付着させた際の液滴の自由表面の膨らみ具合である凸形状の輪郭と略一致するので、液滴が基板の表面と端面との間に安定して挟まれる。
また、端面の大きさに比較して十分に小さな複数の凹凸形状が端面部の端面にあるので、端面と液体との接触面積が増えて、液滴が基板の表面と端面とに挟まれ安定する。
従って、簡易な構成で、基板の表面を液滴で処理する基板処理方法と基板処理装置と液滴保持治具とを提供できる。
As described above, the substrate processing method, the substrate processing apparatus, and the droplet holding jig according to the present invention have the following effects due to their configurations.
The jig is held so as to enclose the droplet adhering to the surface of the substrate with an annular opening, and the jig is relatively moved along the surface of the substrate while blowing the gas ejected from the opening onto the surface of the substrate. Therefore, the droplets adhering to the surface of the substrate move relatively along the surface of the substrate.
An end face is brought into contact with a droplet attached to the surface of the substrate, the jig is held so as to surround the droplet with an annular opening, and the jig is placed on the substrate while blowing the gas ejected from the opening onto the surface of the substrate. Therefore, the droplets attached to the surface of the substrate relatively move along the surface of the substrate.
The jig is relatively moved along the surface of the substrate while holding the jig so that the droplet attached to the surface of the substrate is surrounded by the C-shaped opening and blowing the gas ejected from the opening onto the surface of the substrate. Since the opening is positioned behind the relative movement path of the jig, the droplets adhering to the surface of the substrate relatively move along the surface of the substrate.
The jig is held so that the droplets adhering to the surface of the substrate are surrounded by a plurality of openings arranged along a circular imaginary line, and the treatment is performed while blowing the gas ejected from the plurality of openings to the surface of the substrate. Since the tool is relatively moved along the surface of the substrate, the droplets adhering to the surface of the substrate are relatively moved along the surface of the substrate.
In addition, when the gas is blown from the opening to the surface of the substrate, the droplet passes through the through hole and adheres to the surface of the substrate, so that the droplet attached to the surface of the substrate is directed from the opening to the surface of the substrate. The position is stabilized by being pushed around by the gas to be blown out.
In addition, when the gas is blown from the opening to the surface of the substrate, the liquid droplets adhering to the surface of the substrate are collected through the through hole, so that the liquid droplets adhering to the surface of the substrate are ejected from the opening. It is recovered in a stable state surrounded by the surroundings.
In addition, when the jig is held so as to surround the droplet attached to the surface of the substrate with the opening, the end of the inner peripheral part forming the inner periphery of the opening is more than the end of the outer peripheral part forming the outer periphery of the opening. Since it is close to the surface of the substrate, the droplets adhering to the surface of the substrate are stabilized.
Further, when the jig is held so that the droplets adhering to the surface of the substrate are surrounded by the opening, the end surface of the end surface forming the inner periphery of the opening is more than the end of the outer periphery forming the outer periphery of the opening. Since it is close to the surface, the droplets adhering to the surface of the substrate are stabilized.
Further, the end face is brought close to the surface of the substrate with the opening facing the surface of the substrate, and the end face is brought into contact with the droplet attached to the surface of the substrate, so that the droplet is sandwiched between the surface and the end surface of the substrate. It is.
Further, the concave contour of the end face is substantially the same as the convex contour, which is the degree of swelling of the free surface of the droplet when the droplet is attached to the surface of the substrate. It is stably sandwiched between the surface and the end face.
In addition, since there are multiple concave and convex shapes on the end face of the end face that are sufficiently small compared to the size of the end face, the contact area between the end face and the liquid increases, and the liquid droplet is sandwiched between the surface and the end face of the substrate and stable To do.
Therefore, it is possible to provide a substrate processing method, a substrate processing apparatus, and a droplet holding jig for processing the surface of the substrate with droplets with a simple configuration.

以下、本発明を実施するための最良の形態を、図面を参照して説明する。   The best mode for carrying out the present invention will be described below with reference to the drawings.

最初に、本発明の実施形態にかかる基板処理装置を、図を基に、説明する。
図1は、本発明の実施形態に係る基板処理装置の平面図である。図2は、本発明の実施形態に係る基板処理装置の正面図である。図3は、本発明の実施形態に係る基板処理装置の側面図である。
First, a substrate processing apparatus according to an embodiment of the present invention will be described with reference to the drawings.
FIG. 1 is a plan view of a substrate processing apparatus according to an embodiment of the present invention. FIG. 2 is a front view of the substrate processing apparatus according to the embodiment of the present invention. FIG. 3 is a side view of the substrate processing apparatus according to the embodiment of the present invention.

基板処理装置は、基板を液滴で処理する装置であって、液滴保持治具10と液体供給機器20と走査機器30と液体回収機器(図示せず)とで構成される。   The substrate processing apparatus is an apparatus that processes a substrate with droplets, and includes a droplet holding jig 10, a liquid supply device 20, a scanning device 30, and a liquid recovery device (not shown).

液滴保持治具10は、基板に付着した液滴を保持するための治具である。
液滴保持治具10は、環状の開口Oを形成され、開口Oから気体を噴き出し可能になったものであってもよい。液滴保持治具10は、基板5の表面の直交方向から基板5を見て基板の表面に付着した液滴Pを開口Oで囲う様に保持された状態で開口Oから噴き出した気体を基板の表面に吹き付けできる様になっている。
例えば、外周部が開口Оの外周を形成し、内周部が開口の内周を形成する。
The droplet holding jig 10 is a jig for holding droplets attached to the substrate.
The droplet holding jig 10 may be one in which an annular opening O is formed and gas can be ejected from the opening O. The droplet holding jig 10 is a gas that is ejected from the opening O in a state in which the droplet P adhering to the surface of the substrate 5 is held so as to be surrounded by the opening O when viewed from the direction orthogonal to the surface of the substrate 5. It can be sprayed on the surface of.
For example, the outer peripheral portion forms the outer periphery of the opening O, and the inner peripheral portion forms the inner periphery of the opening.

液滴保持治具10は、端面Sを形成する端面部を有し、端面の周囲を囲う環状の開口Oを形成され、開口Oから気体を噴き出し可能になったものであってもよい。液滴保持治具10は、端面を基板5の表面に付着した液滴Pに接触させて基板5の表面の直交方向から基板を見て基板5の表面に付着した液滴Pを開口Oで囲う様に保持された状態で開口Oから噴き出た気体を基板の表面に吹き付けできる様になっている。
例えば、外周部が開口Оの外周を形成し、端面部が開口の内周を形成する。
例えば、外周部が開口Оの外周を形成し、内周部が開口の内周を形成し、端面が内周部の内側に位置する。
The droplet holding jig 10 may have an end surface portion that forms the end surface S, an annular opening O that surrounds the periphery of the end surface, and a gas that can be ejected from the opening O. The droplet holding jig 10 contacts the droplets P attached to the surface of the substrate 5 at the end face, and the droplets P attached to the surface of the substrate 5 when viewed from the direction orthogonal to the surface of the substrate 5 through the opening O. The gas blown out from the opening O while being held so as to be enclosed can be blown onto the surface of the substrate.
For example, the outer peripheral portion forms the outer periphery of the opening O, and the end surface portion forms the inner periphery of the opening.
For example, the outer peripheral portion forms the outer periphery of the opening O, the inner peripheral portion forms the inner periphery of the opening, and the end surface is located inside the inner peripheral portion.

液滴保持治具10は、C字状の開口Oを形成され、開口Oから気体を噴き出し可能になったものであってもよい。液滴保持治具10は、板の表面の直交方向から基板を見て基板の表面に付着した液滴を開口で囲う様に保持された状態で開口から噴き出た気体を基板の表面に吹き付け可能になっている。液滴保持治具10は、基板の表面に沿って相対移動されたときに、C字状の開口Oを治具の相対移動する軌跡の後方に位置決めできる様になっている。
液滴保持治具10は、端面を形成する端面部を有し、端面の周囲を囲うC字状の開口Oを形成され、開口Oから気体を噴き出し可能なものであってもよい。
The droplet holding jig 10 may be one in which a C-shaped opening O is formed and gas can be ejected from the opening O. The droplet holding jig 10 blows a gas blown from the opening onto the surface of the substrate while holding the droplet attached to the surface of the substrate as viewed from the direction orthogonal to the surface of the plate. It is possible. When the droplet holding jig 10 is relatively moved along the surface of the substrate, the C-shaped opening O can be positioned behind the locus of relative movement of the jig.
The droplet holding jig 10 may have an end surface portion that forms an end surface, a C-shaped opening O that surrounds the periphery of the end surface, and a gas that can be ejected from the opening O.

液滴保持治具10は、円形の仮想線に沿って並んだ複数の開口を形成され複数の開口から気体を噴き出し可能なものであってもよい。液滴保持治具10は、基板の表面の直交方向から基板を見て基板の表面に付着した液滴を複数の開口で囲う様に保持された状態で複数の開口から噴き出た気体を基板の表面に吹き付け可能になっている。
液滴保持治具10は、端面を形成する端面部を有し、端面の周囲を囲う円形の仮想線に沿って並んだ複数の開口を形成され複数の開口から気体を噴き出し可能なものであってもよい。
The droplet holding jig 10 may be formed with a plurality of openings arranged along a circular imaginary line and capable of ejecting gas from the plurality of openings. The liquid droplet holding jig 10 is configured to remove the gas ejected from the plurality of openings while holding the liquid droplets adhering to the surface of the substrate as surrounded by the plurality of openings when viewed from the direction orthogonal to the surface of the substrate. It is possible to spray on the surface of.
The droplet holding jig 10 has an end surface portion that forms an end surface, is formed with a plurality of openings arranged along a circular imaginary line surrounding the end surface, and can eject gas from the plurality of openings. May be.

液滴保持治具10は、開口Oに囲われた内側に貫通穴Hを形成され、開口Oを基板の表面に向けて保持された状態で開口Oから噴き出した気体を基板の表面に吹き付けている際に貫通穴を通過して基板の表面に液滴を付着できる様になっていてもよい。
例えば、液滴保持治具10は、開口Oに囲われた内側に貫通穴Hを形成され、開口Oを基板の表面に向けて治具を保持し開口Oから噴き出した気体を基板の表面に吹き付けている際に貫通穴を通過して基板の表面に液滴を滴下して付着できる様になっていてもよい。
例えば、貫通穴Hが端面の真ん中を貫通しており、ノズル状の部材の先端を貫通穴Hを通過して基板の表面に接近させて、ノズル状の部材の先端から基板の表面に液体を滴下し、基板の表面に液滴を付着させる。
The droplet holding jig 10 has a through hole H formed inside the opening O, and blows a gas blown from the opening O onto the surface of the substrate while the opening O is held toward the surface of the substrate. The liquid droplets may be attached to the surface of the substrate through the through-holes.
For example, the droplet holding jig 10 has a through hole H formed inside surrounded by the opening O, holds the jig with the opening O facing the surface of the substrate, and the gas ejected from the opening O on the surface of the substrate. When spraying, it may be configured such that droplets can be dropped and adhered to the surface of the substrate through the through hole.
For example, the through hole H passes through the middle of the end surface, and the tip of the nozzle-like member passes through the through-hole H to approach the surface of the substrate, so that liquid is applied from the tip of the nozzle-like member to the surface of the substrate. The droplet is dropped and attached to the surface of the substrate.

液滴保持治具10は、開口に囲われた内側に貫通穴Hを形成され、開口を基板の表面に向けて治具を保持された状態で開口から噴き出した気体を基板の表面に吹き付けている際に基板の表面に付着する液滴を貫通穴を通過して回収できる様になっていてもよい。
例えば、液滴保持治具10は、開口に囲われた内側に貫通穴を形成され、開口を基板の表面に向けて保持された状態で開口から噴き出した気体を基板の表面に吹き付けている際に基板の表面に付着する液滴を貫通穴を通過してノズルにより吸い出して回収できる様になっていてもよい。
例えば、貫通穴Hが端面の真ん中を貫通しており、ノズル状の部材の先端を貫通穴Hを通過して基板の表面に接近させて、ノズル状の部材の先端を基板の表面に付着した液滴に接触させ、基板の表面に付着した液滴を吸引する。
The droplet holding jig 10 has a through hole H formed on the inner side surrounded by the opening, and blows a gas blown from the opening to the surface of the substrate while the jig is held with the opening facing the surface of the substrate. In addition, the liquid droplets adhering to the surface of the substrate may be collected through the through hole.
For example, when the droplet holding jig 10 has a through hole formed on the inner side surrounded by the opening and is blowing the gas blown from the opening to the surface of the substrate while the opening is held toward the surface of the substrate. Alternatively, the droplets adhering to the surface of the substrate may pass through the through hole and be sucked out by the nozzle and collected.
For example, the through hole H passes through the middle of the end surface, the tip of the nozzle-like member passes through the through-hole H and approaches the surface of the substrate, and the tip of the nozzle-like member adheres to the surface of the substrate. The liquid droplets are brought into contact with the liquid droplets, and the liquid droplets attached to the surface of the substrate are sucked.

液滴保持治具10は、開口Oの外周を形成する外周部と開口Oの内周を形成する内周部とを有し、開口を基板の表面に向けたとき基板の表面と内周部の端部との距離が基板の表面と外周部の端部との距離より短くてもよい。
液滴保持治具10は、開口Oの外周を形成する外周部を有し、開口を基板の表面に向けたとき基板の表面と端面との距離が基板の表面と外周部の端部との距離よりも短くてもよい。
液滴保持治具10は、開口Oの外周を形成する外周部を有し、端面部が開口Oの内周を形成し、開口を基板の表面に向けたとき基板の表面と端面との距離が基板の表面と外周部の端部との距離よりも短くてもよい。
The droplet holding jig 10 has an outer peripheral portion that forms the outer periphery of the opening O and an inner peripheral portion that forms the inner periphery of the opening O, and the surface and inner peripheral portion of the substrate when the opening is directed to the surface of the substrate. The distance to the end of the substrate may be shorter than the distance between the surface of the substrate and the end of the outer periphery.
The droplet holding jig 10 has an outer peripheral portion that forms the outer periphery of the opening O, and when the opening is directed to the surface of the substrate, the distance between the surface of the substrate and the end surface is the distance between the surface of the substrate and the end of the outer peripheral portion. It may be shorter than the distance.
The droplet holding jig 10 has an outer peripheral portion that forms the outer periphery of the opening O, the end surface portion forms the inner periphery of the opening O, and the distance between the surface of the substrate and the end surface when the opening faces the surface of the substrate. May be shorter than the distance between the surface of the substrate and the end of the outer periphery.

端面が外周から中心部に近づくにつれ僅かに凹んでいる凹形状を持ち、凹形状の輪郭が液滴を基板の表面に付着させた際の液滴の自由表面の膨らみ具合である凸形状の輪郭と略一致してもよい。
端面部が端面に端面の大きさに比較して十分に小さな複数の凹凸形状を設けられてもよい。
例えば、端面に微細な凹凸が設けられる。
例えば、端面に複数の溝が設けられる。
例えば、端面に同心円状の複数の溝が設けられる。
例えば、端面に細かな凹凸が設けられる。
Convex shape that has a concave shape that is slightly recessed as the end surface approaches the center from the outer periphery, and the concave shape is the degree of swelling of the free surface of the droplet when the droplet adheres to the surface of the substrate May be substantially the same.
The end surface portion may be provided with a plurality of concave and convex shapes that are sufficiently smaller than the size of the end surface on the end surface.
For example, fine irregularities are provided on the end face.
For example, a plurality of grooves are provided on the end surface.
For example, a plurality of concentric grooves are provided on the end surface.
For example, fine irregularities are provided on the end face.

液体供給機器20は、基板の表面に液滴を付着させる機器である。
液体供給機器20は、基板の表面に液滴を滴下して付着させるノズル状の部材を備えていてもよい。
液滴保持治具10が貫通穴Hを形成される場合に、液体供給機器20は、前記開口を基板の表面に向けて前記治具を保持し前記開口から噴き出した気体を基板の表面に吹き付けている際にノズル状の部材を貫通穴Hの中に通過させ、液滴を基板の表面に付着させてもよい。
この様にすると液滴が開口から噴き出し基板の表面に吹き付けられる気体の輪状のカーテンのなかに安定して置かれる。
また、液滴保持治具10を基板の上から退避させて、液体供給機器が液滴を基板の表面に付着させてもよい。
The liquid supply device 20 is a device that attaches droplets to the surface of the substrate.
The liquid supply device 20 may include a nozzle-like member that drops and attaches droplets to the surface of the substrate.
When the droplet holding jig 10 is formed with the through hole H, the liquid supply device 20 holds the jig with the opening facing the surface of the substrate and blows the gas ejected from the opening onto the surface of the substrate. In this case, a nozzle-like member may be passed through the through hole H to cause the droplets to adhere to the surface of the substrate.
If it does in this way, a droplet will be stably put in the ring-shaped curtain of gas which ejects from an opening and is sprayed on the surface of a board | substrate.
Alternatively, the droplet holding jig 10 may be retracted from the substrate, and the liquid supply device may cause the droplet to adhere to the surface of the substrate.

走査機器30は、液滴保持治具10を保持して移動させる機器である。
走査機器30は、基板の表面の直交方向から基板を見て基板の表面に付着した液滴を開口Oで囲う様に治具を保持して開口Oから基板の表面に気体を吹き付けながら治具を基板の表面に沿って相対移動させる機器であってもよい。
液滴回収治具10が開口に囲まれる端面を持つときに、走査機器30は、端面を基板の表面に付着した液滴に接触させて基板の表面の直交方向から基板を見て基板の表面に付着した液滴を開口Oで囲う様に治具を保持して開口Oから基板の表面に気体を吹き付けながら治具を基板の表面に沿って相対移動させる機器であってもよい。
液滴回収治具10が開口がC字状の形状をもつときに、走査機器30は、基板の表面の直交方向から基板を見て基板の表面に付着した液滴を開口Oで囲う様に治具を保持して開口Oから基板の表面に気体を吹き付けながら治具を基板の表面に沿って相対移動させつつ開口Oを治具の相対移動する軌跡の後方に位置決めできる機器であってもよい。
円形の仮想線に沿って並んだ複数の開口Oを持つときに、走査機器30は、基板の表面の直交方向から基板を見て基板の表面に付着した液滴を複数の開口Oで囲う様に液滴保持治具10を保持して、複数の開口Oから噴き出した気体を基板の表面に吹き付けながら、液滴保持治具を基板の表面に沿って相対移動させる機器であってもよい。
The scanning device 30 is a device that holds and moves the droplet holding jig 10.
The scanning device 30 holds the jig so that the droplets attached to the surface of the substrate are surrounded by the opening O when viewed from the direction orthogonal to the surface of the substrate, and blows the gas from the opening O onto the surface of the substrate. May be a device that relatively moves the substrate along the surface of the substrate.
When the droplet recovery jig 10 has an end surface surrounded by the opening, the scanning device 30 makes the end surface come into contact with the droplet attached to the surface of the substrate, and the substrate surface is viewed from the direction orthogonal to the surface of the substrate. A device may be used that holds the jig so that the droplets adhering to the substrate are surrounded by the opening O, and relatively moves the jig along the surface of the substrate while blowing gas from the opening O to the surface of the substrate.
When the droplet recovery jig 10 has a C-shaped opening, the scanning device 30 looks at the substrate from the direction orthogonal to the surface of the substrate so that the droplet attached to the surface of the substrate is surrounded by the opening O. Even if the jig is held and the gas is blown from the opening O to the surface of the substrate while the jig is relatively moved along the surface of the substrate, the opening O can be positioned behind the relative movement path of the jig. Good.
When the scanning device 30 has a plurality of openings O arranged along a circular imaginary line, the scanning device 30 looks at the substrate from a direction orthogonal to the surface of the substrate and surrounds the droplets adhering to the surface of the substrate with the plurality of openings O. Alternatively, the apparatus may be a device that holds the droplet holding jig 10 and relatively moves the droplet holding jig along the surface of the substrate while blowing the gas ejected from the plurality of openings O onto the surface of the substrate.

走査機器30は、ベース31と回転機器32と心だし機器33と揺動機器34と昇降機器35とで構成される。
ベース31は、回転機器32と心だし機器33と揺動機器34と昇降機器35とを載せ、内部に制御機器(図示せず)等を内蔵する機器である。
回転機器32は、基板を基板の表面に直交する仮想の回転軸の周りに回転させる機器である。
例えば、基板がシリコンウエハー、サファイアウエハー等のウエハーである場合、回転機器32は、ウエハーの縁の円弧中心に一致する回転軸の周りに回転させる。
The scanning device 30 includes a base 31, a rotating device 32, a centering device 33, a swing device 34, and a lifting device 35.
The base 31 is a device on which a rotating device 32, a centering device 33, a swinging device 34, and a lifting device 35 are mounted, and a control device (not shown) or the like is built therein.
The rotating device 32 is a device that rotates the substrate around a virtual rotation axis orthogonal to the surface of the substrate.
For example, when the substrate is a wafer such as a silicon wafer or a sapphire wafer, the rotating device 32 rotates around a rotation axis that coincides with the arc center of the edge of the wafer.

心だし機器33は、基板を回転させる仮想の回転軸を回転機器32の回転軸に一致させる機器である。   The centering device 33 is a device that makes a virtual rotation axis for rotating the substrate coincide with the rotation axis of the rotation device 32.

揺動機器34は、液滴保持治具10を基板の半径方向に沿って移動させる機器である。
例えば、揺動機器34は、液滴保持治具10を揺動アームの先端に保持して揺動アームの根本を垂直軸の周りに揺動させる。
揺動機器34が、液滴保持治具10を保持した揺動アームを揺動させると、液滴保持治具10が、基板の表面の上を基板の半径方向に沿って円弧の軌跡をえがいて移動する。
したがって、回転機器32が基板を回転中心の周りに回転させ、揺動機器34が液滴保持治具10を基板の半径方向に移動させると、液滴保持治具10が基板5の表面に沿って相対移動させることをできる。
The swinging device 34 is a device that moves the droplet holding jig 10 along the radial direction of the substrate.
For example, the swing device 34 holds the droplet holding jig 10 at the tip of the swing arm and swings the base of the swing arm about the vertical axis.
When the swinging device 34 swings the swing arm that holds the droplet holding jig 10, the droplet holding jig 10 traces an arc trajectory along the radial direction of the substrate on the surface of the substrate. Move.
Therefore, when the rotating device 32 rotates the substrate around the rotation center and the swing device 34 moves the droplet holding jig 10 in the radial direction of the substrate, the droplet holding jig 10 moves along the surface of the substrate 5. Can be moved relative to each other.

昇降機器35は、揺動機器34の揺動アームを上下方向に昇降させる機器である。
昇降機器35が、液滴保持治具10を保持した揺動アームを昇降させると、液滴保持治具10と基板の表面との離間距離が変化する。
The lifting device 35 is a device that moves the swing arm of the swing device 34 up and down.
When the lifting / lowering device 35 raises / lowers the swing arm holding the droplet holding jig 10, the distance between the droplet holding jig 10 and the surface of the substrate changes.

液体回収機器(図示せず)は、基板の表面に付着してた液滴を回収する機器である。
液体回収機器の主要構造は液体供給機器20の主要構造と同じである。
液体回収機器は、走査機器30が基板の表面に付着した液滴を保持している際に、液滴保持治具10に設けられた貫通穴Hを通過して液滴を回収してもよい。
例えば、液体回収機器は、液滴保持治具10が貫通穴Hを形成されていると、ノズル状の部材の先端を貫通穴Hを通過して基板の表面に付着した液滴を吸引し回収する。
また例えば、液体回収機器は、走査機器30を退避された後で、基板の表面に付着する液滴にノズル状の部材の先端を接近させて、液滴を吸引し回収してもよい。
A liquid recovery device (not shown) is a device that recovers droplets attached to the surface of the substrate.
The main structure of the liquid recovery device is the same as the main structure of the liquid supply device 20.
The liquid recovery device may recover the droplets through the through hole H provided in the droplet holding jig 10 when the scanning device 30 holds the droplets attached to the surface of the substrate. .
For example, in the liquid recovery device, when the droplet holding jig 10 has the through hole H, the tip of the nozzle-like member passes through the through hole H and sucks and recovers the droplet attached to the surface of the substrate. To do.
Further, for example, after the scanning device 30 is retracted, the liquid recovery device may draw the droplets by sucking and recovering the droplets adhering to the surface of the substrate by bringing the tip of the nozzle-like member closer to the droplets.

以下に、本発明の実施形態にかかる液滴保持治具10を詳述する。
基板の表面には、上面、下面、及び側面がある。
説明の便宜のための、仮に、基板の上面を上方に向くように固定し、液滴保持治具を上面の上方に配置し、下向きに向けた開口Oから気体を噴きだすことを前提として説明する。
本発明の実施形態にかかる液滴保持治具10には、基板に付着した液滴に接触するタイプの治具と基板に付着した液滴に接触しないタイプの治具とがある。
Below, the droplet holding jig 10 concerning embodiment of this invention is explained in full detail.
The surface of the substrate has an upper surface, a lower surface, and side surfaces.
For convenience of explanation, it is assumed that the upper surface of the substrate is fixed upward, the droplet holding jig is arranged above the upper surface, and the gas is ejected from the downward opening O. To do.
The droplet holding jig 10 according to the embodiment of the present invention includes a jig that contacts the droplets attached to the substrate and a jig that does not contact the droplets attached to the substrate.

本発明の第一の実施形態にかかる液滴保持治具10を、図を基に、詳述する。
図4は、本発明の第一の実施形態に係る治具の側面図である。図5は、本発明の第一の実施形態に係る治具の底面図である。
第一の実施形態にかかる液滴保持治具10は、基板に付着した液滴に接触するタイプの治具である。
The droplet holding jig 10 according to the first embodiment of the present invention will be described in detail with reference to the drawings.
FIG. 4 is a side view of the jig according to the first embodiment of the present invention. FIG. 5 is a bottom view of the jig according to the first embodiment of the present invention.
The droplet holding jig 10 according to the first embodiment is a jig of a type that comes into contact with droplets attached to a substrate.

第一の実施形態にかかる液滴保持治具10は、端面Sを形成する部分である端面部13aを設けられ、端面Sの外周を囲う環状の開口Oを形成され、開口Oから気体を噴き出し可能になっており、端面Sを基板の表面に付着した液滴Pに接触させて基板の表面の直交方向から基板を見て基板の表面に付着した液滴Pを開口Oで囲う様に保持された状態で開口Oから噴き出た気体を基板の表面に吹き付けできる様になった治具である。
液滴保持治具10は、端面部13aの開口Oに囲われた内側に貫通穴Hを形成される。
例えば、貫通穴Hは、端面Sの中心部を貫通して形成される。
例えば、端面Sが円形であり、貫通穴Hの断面形状が円形であり、端面Sと貫通穴Hとが同心円状に形成される。
液滴保持治具10は、開口Oの外周を形成する外周部12aを有し、端面部13aが開口Oの内周を形成する。外周部12aの端部Mを含む仮想面の向きと端面Sの向きとが略一致する。例えば、外周部12aの端部Mを含む仮想面と端面Sとが平行である。
開口を基板の表面に向けたとき基板5の表面と端面Sとの距離D1が基板5の表面と外周部12aの端部Mとの距離D2よりも短い。
The droplet holding jig 10 according to the first embodiment is provided with an end surface portion 13a that is a portion that forms the end surface S, an annular opening O that surrounds the outer periphery of the end surface S is formed, and gas is ejected from the opening O. The end face S is brought into contact with the droplet P adhering to the surface of the substrate, and the droplet P adhering to the surface of the substrate is held by the opening O when viewed from the direction orthogonal to the surface of the substrate. In this state, it is a jig that can blow the gas blown from the opening O onto the surface of the substrate.
In the droplet holding jig 10, a through hole H is formed inside the end surface portion 13a surrounded by the opening O.
For example, the through hole H is formed through the center portion of the end surface S.
For example, the end surface S is circular, the cross-sectional shape of the through hole H is circular, and the end surface S and the through hole H are formed concentrically.
The droplet holding jig 10 has an outer peripheral portion 12 a that forms the outer periphery of the opening O, and the end surface portion 13 a forms the inner periphery of the opening O. The direction of the virtual surface including the end M of the outer peripheral portion 12a and the direction of the end surface S substantially coincide. For example, the virtual surface including the end portion M of the outer peripheral portion 12a and the end surface S are parallel.
When the opening is directed to the surface of the substrate, the distance D1 between the surface of the substrate 5 and the end surface S is shorter than the distance D2 between the surface of the substrate 5 and the end M of the outer peripheral portion 12a.

第一の実施形態にかかる液滴保持治具10は、治具本体11と治具外周部材12と治具内周部材13と気体供給機器14とで構成される。
治具本体11は、揺動機器34に支持されるブロック状の部材である。
治具本体11は、治具外周嵌合穴11aと第一気体通路Eとを形成される。
治具外周嵌合穴11aは、治具外周部材12の嵌り込む穴である。
第一気体通路Eは、治具外周嵌合穴11aの周囲に設けられる気体の通路である。
The droplet holding jig 10 according to the first embodiment includes a jig main body 11, a jig outer peripheral member 12, a jig inner peripheral member 13, and a gas supply device 14.
The jig body 11 is a block-like member supported by the swing device 34.
The jig body 11 is formed with a jig outer periphery fitting hole 11a and a first gas passage E.
The jig outer periphery fitting hole 11 a is a hole into which the jig outer peripheral member 12 is fitted.
The first gas passage E is a gas passage provided around the jig outer periphery fitting hole 11a.

治具外周部材12は、治具外周嵌合穴11aに嵌り込む部材である。治具外周部材12の下部が治具外周嵌合穴11aの下部から露出する。
治具外周部材12の露出する箇所が、外周部12aに相当する。
治具外周部材12は、治具内周嵌合穴12bと第二気体通路Fとを形成される。
治具内周嵌合穴12bは、治具内周部材13の嵌り込む穴である。
第二気体通路Fは、第一気体通路Eと治具内周嵌合穴12bとを連通する気体の通路である。
The jig outer peripheral member 12 is a member that fits into the jig outer peripheral fitting hole 11a. The lower part of the jig outer peripheral member 12 is exposed from the lower part of the jig outer peripheral fitting hole 11a.
The exposed portion of the jig outer peripheral member 12 corresponds to the outer peripheral portion 12a.
The jig outer peripheral member 12 is formed with a jig inner peripheral fitting hole 12b and a second gas passage F.
The jig inner peripheral fitting hole 12 b is a hole into which the jig inner peripheral member 13 is fitted.
The second gas passage F is a gas passage communicating the first gas passage E and the jig inner circumferential fitting hole 12b.

治具内周部材13は、治具内周嵌合穴12bに嵌り込む部材である。治具内周部材13の下部が治具内周嵌合穴12bの下部から露出する。
治具内周部材13の露出した箇所が端面部13aに相当する。
端面部13aの下に向いた面が端面Sに相当する。
治具内周部材13は第三気体通路Gと貫通穴Hとを形成される。
第三気体通路Gは、第二気体通路Fと開口Oとを連通する気体の通路である。
貫通穴Hは、治具内周部材13の上部と端面Sの中央部とを貫通する穴である。
The jig inner peripheral member 13 is a member that fits into the jig inner peripheral fitting hole 12b. The lower part of the jig inner peripheral member 13 is exposed from the lower part of the jig inner peripheral fitting hole 12b.
The exposed portion of the jig inner peripheral member 13 corresponds to the end surface portion 13a.
The surface facing below the end surface portion 13a corresponds to the end surface S.
The jig inner peripheral member 13 is formed with a third gas passage G and a through hole H.
The third gas passage G is a gas passage communicating the second gas passage F and the opening O.
The through hole H is a hole that penetrates the upper part of the jig inner peripheral member 13 and the central part of the end surface S.

開口Oは円形の内周と円形の外周とで囲われた環状の形状をしている。
開口Oの内周は、端面部13aにより形成される。
開口Oの外周は、外周部12aの端部Mにより形成される。
例えば、開口Oは、端面部13aの外周と外周部12aの端部Mとで囲まれる。
The opening O has an annular shape surrounded by a circular inner periphery and a circular outer periphery.
The inner periphery of the opening O is formed by the end surface portion 13a.
The outer periphery of the opening O is formed by the end M of the outer peripheral portion 12a.
For example, the opening O is surrounded by the outer periphery of the end surface portion 13a and the end portion M of the outer peripheral portion 12a.

端面Sを基板の表面に対向させたときに、基板5の表面と端面Sとの距離D1は基板55の表面と外周部12aの端部Mとの距離D2よりも僅かに短い。
この様にすると、開口Oから気体が噴き出し、気体が基板の表面に吹き付けられ、気体が基板の表面に沿って周囲に流れる。開口Oに囲われた液滴は気体に押されて位置決めされる。
When the end surface S is opposed to the surface of the substrate, the distance D1 between the surface of the substrate 5 and the end surface S is slightly shorter than the distance D2 between the surface of the substrate 55 and the end M of the outer peripheral portion 12a.
If it does in this way, gas will eject from the opening O, gas will be sprayed on the surface of a board | substrate, and gas will flow to circumference | surroundings along the surface of a board | substrate. The droplet surrounded by the opening O is pushed and positioned by the gas.

気体供給機器14は、液滴保持治具10に気体を供給して開口Oから気体を噴きだすための機器である。
気体供給機器14の配管が治具本体11の第一気体通路Eに連通する。
気体供給機器14が気体を板処理用治具に供給すると、気体は、第一気体通路Eと第二気体通路Fと第三気体通路Gとを順に経由して、開口Oから噴き出す。
The gas supply device 14 is a device for supplying a gas to the droplet holding jig 10 and ejecting the gas from the opening O.
The piping of the gas supply device 14 communicates with the first gas passage E of the jig body 11.
When the gas supply device 14 supplies gas to the plate processing jig, the gas is ejected from the opening O through the first gas passage E, the second gas passage F, and the third gas passage G in order.

以下に、第一の実施形態にかかる液滴保持治具の作用を、図を基に、説明する。
開口Oを基板5の表面に向けて、基板5の表面と端面Sとの距離D1を所定の距離になるように治具を保持し、開口Oから気体を噴き出し、噴き出した気体を基板の表面に吹き付ける。
液体供給機器20を用いて、開口から基板の表面に気体を吹き付けている際に液滴を貫通穴Hを通過して基板の表面に滴下する。
端面Sが基板5の表面に付着する液滴に接触する。
基板5の表面と端面Sとの距離D1を所定の距離になるように治具を保持した状態で、基板5の表面に沿って液滴保持治具10を相対移動させると、液滴が治具の動きに伴って基板5の表面を移動する。
液滴が基板5の表面を処理する液体であれば、基板5の表面を処理できる。
Below, the effect | action of the droplet holding jig concerning 1st embodiment is demonstrated based on figures.
The opening O is directed toward the surface of the substrate 5, a jig is held so that the distance D1 between the surface of the substrate 5 and the end surface S is a predetermined distance, gas is ejected from the opening O, and the ejected gas is ejected from the surface of the substrate. Spray on.
When the gas is blown from the opening to the surface of the substrate using the liquid supply device 20, the droplet passes through the through hole H and drops onto the surface of the substrate.
The end surface S comes into contact with the droplets adhering to the surface of the substrate 5.
When the droplet holding jig 10 is relatively moved along the surface of the substrate 5 while holding the jig so that the distance D1 between the surface of the substrate 5 and the end surface S is a predetermined distance, the droplets are cured. The surface of the substrate 5 is moved with the movement of the tool.
If the droplet is a liquid that treats the surface of the substrate 5, the surface of the substrate 5 can be treated.

次に、第二の実施形態にかかる液滴保持治具10を、図を基に説明する。
図6は、本発明の第二の実施形態に係る治具の側面図である。
第二の実施形態にかかる液滴保持治具10は、基板に付着した液滴に接触するタイプの治具である。
Next, the droplet holding jig 10 according to the second embodiment will be described with reference to the drawings.
FIG. 6 is a side view of the jig according to the second embodiment of the present invention.
The droplet holding jig 10 according to the second embodiment is a jig of a type that comes into contact with droplets attached to a substrate.

第二の実施形態にかかる液滴保持治具10は、端面Sを形成する部分である端面部13aを設けられ、端面Sの外周を囲う環状の開口Oを形成され、開口Oから気体を噴き出し可能であり、端面Sを基板の表面に付着した液滴Pに接触させた状態で基板の表面の直交方向から基板を見て基板の表面に付着した液滴Pを開口Oで囲う様に保持された状態で開口Oから噴き出した気体を基板の表面に吹き付けるできる様になった治具である。
液滴保持治具10は、端面部13aの開口Oに囲われた内側に貫通穴Hを形成されなくてもよい。
液滴保持治具10は、開口Oの外周を形成する外周部12aを有し、端面部13aが開口Oの内周を形成する。端面Sの向きと外周部12aの端部Mを含む仮想面の向きとが略一致する。例えば、端面Sと外周部12aの端部Mを含む仮想面とが平行である。
開口を基板の表面に向けたとき基板5の表面と端面Sとの距離D1が基板5の表面と外周部12aの端部Mとの距離D2よりも短い。
この様にすると、開口Oから気体が噴き出し、気体が基板の表面に吹き付けられ、気体が基板の表面に沿って周囲に流れる。開口Oに囲われた液滴は気体に押されて位置決めされる。
The droplet holding jig 10 according to the second embodiment is provided with an end surface portion 13a that is a portion for forming the end surface S, an annular opening O that surrounds the outer periphery of the end surface S is formed, and gas is ejected from the opening O. It is possible to hold the droplet P adhering to the surface of the substrate as surrounded by the opening O when viewed from the direction orthogonal to the surface of the substrate with the end surface S in contact with the droplet P adhering to the surface of the substrate. In this state, it is a jig that can blow the gas blown from the opening O onto the surface of the substrate.
The droplet holding jig 10 may not have the through hole H formed on the inner side surrounded by the opening O of the end surface portion 13a.
The droplet holding jig 10 has an outer peripheral portion 12 a that forms the outer periphery of the opening O, and the end surface portion 13 a forms the inner periphery of the opening O. The direction of the end surface S substantially coincides with the direction of the virtual surface including the end M of the outer peripheral portion 12a. For example, the end surface S and the virtual surface including the end M of the outer peripheral portion 12a are parallel.
When the opening is directed to the surface of the substrate, the distance D1 between the surface of the substrate 5 and the end surface S is shorter than the distance D2 between the surface of the substrate 5 and the end M of the outer peripheral portion 12a.
If it does in this way, gas will eject from the opening O, gas will be sprayed on the surface of a board | substrate, and gas will flow to circumference | surroundings along the surface of a board | substrate. The droplet surrounded by the opening O is pushed and positioned by the gas.

第二の実施形態にかかる液滴保持治具10は、治具本体11と治具外周部材12と治具内周部材13と気体供給機器14とで構成される。
治具本体11は、揺動機器34に固定されるブロック状の部材である。
治具本体11は、治具外周嵌合穴11aと第一気体通路Eを形成される。
治具外周嵌合穴11aは、治具外周部材12の嵌り込む嵌合穴である。
第一気体通路Eは、治具外周嵌合穴11aの周囲に設けられる気体の通路である。
The droplet holding jig 10 according to the second embodiment includes a jig main body 11, a jig outer peripheral member 12, a jig inner peripheral member 13, and a gas supply device 14.
The jig body 11 is a block-like member that is fixed to the swing device 34.
The jig body 11 is formed with a jig outer periphery fitting hole 11a and a first gas passage E.
The jig outer periphery fitting hole 11 a is a fitting hole into which the jig outer peripheral member 12 is fitted.
The first gas passage E is a gas passage provided around the jig outer periphery fitting hole 11a.

治具外周部材12は、治具外周嵌合穴11aに嵌り込む部材である。治具外周部材12の下部が治具外周嵌合穴11aの下部から露出する。
治具外周部材12の露出した箇所が、外周部12aに相当する。
治具外周部材12は、治具内周嵌合穴12bと第二気体通路Fとを形成される。
治具内周嵌合穴12bは、治具内周部材13の嵌り込む穴である。
第二気体通路Fは、第一気体通路Eと治具内周嵌合穴12bとを連通する気体の通路である。
The jig outer peripheral member 12 is a member that fits into the jig outer peripheral fitting hole 11a. The lower part of the jig outer peripheral member 12 is exposed from the lower part of the jig outer peripheral fitting hole 11a.
The exposed portion of the jig outer peripheral member 12 corresponds to the outer peripheral portion 12a.
The jig outer peripheral member 12 is formed with a jig inner peripheral fitting hole 12b and a second gas passage F.
The jig inner peripheral fitting hole 12 b is a hole into which the jig inner peripheral member 13 is fitted.
The second gas passage F is a gas passage communicating the first gas passage E and the jig inner circumferential fitting hole 12b.

治具内周部材13は、治具内周嵌合穴12bに嵌り込む部材である。治具内周部材13の下部が治具内周嵌合穴12bの下部から露出する。
治具内周部材13の露出した箇所が端面部13aに相当する。
端面部13aの下に向いた面が端面Sに相当する。
治具内周部材13は第三気体通路Gとを形成される。
第三気体通路Gは、第二気体通路Fと開口Oとを連通する気体に通路である。
The jig inner peripheral member 13 is a member that fits into the jig inner peripheral fitting hole 12b. The lower part of the jig inner peripheral member 13 is exposed from the lower part of the jig inner peripheral fitting hole 12b.
The exposed portion of the jig inner peripheral member 13 corresponds to the end surface portion 13a.
The surface facing below the end surface portion 13a corresponds to the end surface S.
The jig inner peripheral member 13 is formed with a third gas passage G.
The third gas passage G is a passage for the gas communicating with the second gas passage F and the opening O.

開口Oは円形の内周と円形の外周とで囲われた環状の形状をしている。
開口Oの内周は、端面部13aにより形成される。
開口Oの外周は、外周部12aの端部Mにより形成される。
例えば、開口Oは端面部13aの外周と外周部の端部Mの内周に囲われる空間である。
The opening O has an annular shape surrounded by a circular inner periphery and a circular outer periphery.
The inner periphery of the opening O is formed by the end surface portion 13a.
The outer periphery of the opening O is formed by the end M of the outer peripheral portion 12a.
For example, the opening O is a space surrounded by the outer periphery of the end surface portion 13a and the inner periphery of the end portion M of the outer peripheral portion.

開口Оを基板の表面に対向させたときに、基板5の表面と端面Sとの距離D1は基板55の表面と外周部12aの端部Mとの距離D2よりも僅かに短い。   When the opening O is opposed to the surface of the substrate, the distance D1 between the surface of the substrate 5 and the end surface S is slightly shorter than the distance D2 between the surface of the substrate 55 and the end M of the outer peripheral portion 12a.

気体供給機器14は、液滴保持治具10に気体を供給して開口Oから気体を噴きだすための機器である。
気体供給機器14の配管が治具本体11の第一気体通路Eに連通する。
気体供給機器14が気体を板処理用治具に供給すると、気体は、第一気体通路Eと第二気体通路Fと第三気体通路Gとを順に経由して、開口Oから噴き出す。
The gas supply device 14 is a device for supplying a gas to the droplet holding jig 10 and ejecting the gas from the opening O.
The piping of the gas supply device 14 communicates with the first gas passage E of the jig body 11.
When the gas supply device 14 supplies gas to the plate processing jig, the gas is ejected from the opening O through the first gas passage E, the second gas passage F, and the third gas passage G in order.

以下に、第二の実施形態にかかる液滴保持治具の作用を、図を基に、説明する。
開口Oを基板5の表面に向けて、基板5の表面と端面Sとの距離D1を所定の距離になるように治具を保持し、開口Oから気体を噴き出し、噴き出した気体を基板の表面に吹き付ける。
液体供給機器20を用いて、基板の表面に液滴を滴下する。
開口Oを基板5の表面に向けて、端面Sが基板5の表面に付着した液滴の上に位置する用に液滴保持治具10を保持する。
治具を基板の表面に接近させて、端面Sを基板5の表面に付着する液滴に接触させる。
基板5の表面と端面Sとの距離D1を所定の距離になるように治具を保持する。
開口Oから気体を噴き出す。気体が基板の表面に吹き付けられる。
基板5の表面と端面Sとの距離D1を所定の距離になるように治具を保持した状態で、開口から基板の表面に気体を吹き付けながら基板5の表面に沿って液滴保持治具10を相対移動させると、液滴が治具の動きに伴って基板5の表面を移動する。
液滴が基板5の表面を処理する液体であれば、基板5の表面を処理できる。
Below, the effect | action of the droplet holding jig concerning 2nd embodiment is demonstrated based on figures.
The opening O is directed toward the surface of the substrate 5, a jig is held so that the distance D1 between the surface of the substrate 5 and the end surface S is a predetermined distance, gas is ejected from the opening O, and the ejected gas is ejected from the surface of the substrate. Spray on.
Using the liquid supply device 20, droplets are dropped on the surface of the substrate.
The droplet holding jig 10 is held so that the opening O faces the surface of the substrate 5 and the end surface S is positioned on the droplet attached to the surface of the substrate 5.
The jig is brought close to the surface of the substrate, and the end surface S is brought into contact with the droplet adhering to the surface of the substrate 5.
The jig is held so that the distance D1 between the surface of the substrate 5 and the end surface S is a predetermined distance.
Gas is ejected from the opening O. Gas is blown onto the surface of the substrate.
In a state where the jig is held such that the distance D1 between the surface of the substrate 5 and the end surface S is a predetermined distance, the droplet holding jig 10 is formed along the surface of the substrate 5 while blowing gas from the opening to the surface of the substrate. Are moved relative to each other, the droplets move on the surface of the substrate 5 as the jig moves.
If the droplet is a liquid that treats the surface of the substrate 5, the surface of the substrate 5 can be treated.

次に、第三の実施形態にかかる液滴保持治具10を、図を基に、説明する。
図7は、本発明の第三の実施形態に係る治具の側面図である。
第三の実施形態にかかる液滴保持治具10は、基板に付着した液滴に接触するタイプの治具である。
Next, the droplet holding jig 10 according to the third embodiment will be described with reference to the drawings.
FIG. 7 is a side view of a jig according to the third embodiment of the present invention.
The droplet holding jig 10 according to the third embodiment is a jig of a type that comes into contact with droplets attached to a substrate.

第三の実施形態にかかる液滴保持治具10は、端面Sを形成する部分である端面部13aを設けられ、端面Sの外周を囲う環状の開口Oを形成され、開口Oから気体を噴き出し可能であり、端面Sを基板の表面に付着した液滴Pに接触させた状態で基板の表面の直交方向から基板を見て基板の表面に付着した液滴Pを開口Oで囲う様に保持された状態で開口Oから噴き出した気体を基板の表面に吹き付けるできる様になった治具である。
液滴保持治具10は、端面部13aの開口Oに囲われた内側に貫通穴Hを形成されてもよい。
液滴保持治具10は、開口Oの外周を形成する外周部12aを有し、端面部13aが開口Oの内周を形成する。
端面Sの向きと外周部12aの端部Mを含む仮想面の向きとが略一致する。例えば、端面Sと外周部12aの端部Mを含む仮想面とが平行である。
開口を基板の表面に向けたとき基板5の表面と端面Sとの距離D1が基板5の表面と外周部12aの端部Mとの距離D2よりも短い。
端面Sが外周から中心部に近づくにつれ僅かに凹んでいる凹形状を持ち、凹形状の輪郭が液滴を基板5の表面に付着させた際の液滴Pの自由表面の膨らみ具合である凸形状の輪郭と略一致する。
The droplet holding jig 10 according to the third embodiment is provided with an end surface portion 13a that is a portion for forming the end surface S, an annular opening O that surrounds the outer periphery of the end surface S is formed, and gas is ejected from the opening O. It is possible to hold the droplet P adhering to the surface of the substrate as surrounded by the opening O when viewed from the direction orthogonal to the surface of the substrate with the end surface S in contact with the droplet P adhering to the surface of the substrate. In this state, it is a jig that can blow the gas blown from the opening O onto the surface of the substrate.
The droplet holding jig 10 may be formed with a through hole H inside the end surface portion 13a surrounded by the opening O.
The droplet holding jig 10 has an outer peripheral portion 12 a that forms the outer periphery of the opening O, and the end surface portion 13 a forms the inner periphery of the opening O.
The direction of the end surface S substantially coincides with the direction of the virtual surface including the end M of the outer peripheral portion 12a. For example, the end surface S and the virtual surface including the end M of the outer peripheral portion 12a are parallel.
When the opening is directed to the surface of the substrate, the distance D1 between the surface of the substrate 5 and the end surface S is shorter than the distance D2 between the surface of the substrate 5 and the end M of the outer peripheral portion 12a.
The end surface S has a concave shape that is slightly concave as it approaches the center from the outer periphery, and the concave contour is a convexity that is the degree of swelling of the free surface of the droplet P when the droplet adheres to the surface of the substrate 5. It almost matches the outline of the shape.

第三の実施形態にかかる液滴保持治具10の主要構造は第一の実施形態にかかる液滴保持治具とおなじなので、異なる点のみを説明する。
第三の実施形態にかかる液滴保持治具10は、治具本体11と治具外周部材12と治具内周部材13と気体供給機器14とで構成される。
治具内周部材13の端面Sが外周から中心部に近づくにつれ僅かに凹んでいる凹形状を持つ。
凹形状の輪郭が液滴を基板5の表面に付着させた際の液滴Pの自由表面の膨らみ具合である凸形状の輪郭と略一致する。
Since the main structure of the droplet holding jig 10 according to the third embodiment is the same as that of the droplet holding jig according to the first embodiment, only different points will be described.
A droplet holding jig 10 according to the third embodiment includes a jig main body 11, a jig outer peripheral member 12, a jig inner peripheral member 13, and a gas supply device 14.
The end surface S of the jig inner peripheral member 13 has a concave shape that is slightly recessed as it approaches the center from the outer periphery.
The concave contour substantially matches the convex contour, which is the degree of swelling of the free surface of the droplet P when the droplet is attached to the surface of the substrate 5.

以下に、第三の実施形態にかかる液滴保持治具の作用は、第一の実施形態にかかる液滴保持治具または第二の実施形態にかかる液滴保持治具10の作用のうちの一方であるので、説明を省略する。   Hereinafter, the action of the droplet holding jig according to the third embodiment is the same as the action of the droplet holding jig according to the first embodiment or the liquid drop holding jig 10 according to the second embodiment. Since it is one side, description is abbreviate | omitted.

以下に、第四の実施形態にかかる液滴保持治具10を、図を基に、説明する。
図8は、第四の実施形態にかかる液滴保持治具10の側面図である。
第四の実施形態にかかる液滴保持治具10は、基板に付着した液滴に接触しないタイプの治具である。
Hereinafter, the droplet holding jig 10 according to the fourth embodiment will be described with reference to the drawings.
FIG. 8 is a side view of the droplet holding jig 10 according to the fourth embodiment.
The droplet holding jig 10 according to the fourth embodiment is a type that does not contact the droplets attached to the substrate.

第四の実施形態にかかる液滴保持治具10は、環状の開口Oを形成され、開口から気体を噴き出し可能であり、基板の表面の直交方向から基板を見て基板の表面に付着した液滴Pを開口Oで囲う様に保持された状態で開口Oから噴き出した気体を基板の表面に吹き付けできる様になった治具である。
液滴保持治具10は、端面部13aの開口Oに囲われた内側に貫通穴Hを形成される。
液滴保持治具10は、開口Oの外周を形成する外周部12aと開口Oの内周を形成する内周部13bとを有する。外周部12aの端部Mを含む仮想面の向きと内周部13bの端部Nを含む仮想面の向きとが略一致する。例えば、外周部12aの端部Mを含む仮想面の向きと内周部13bの端部Nを含む仮想面の向きとが平行である。
開口を基板の表面に向けたときに基板5の表面と内周部13bの端部Nとの距離D1が基板5の表面と外周部12aの端部Mとの距離D2よりも短い。
The droplet holding jig 10 according to the fourth embodiment is formed with an annular opening O, can eject gas from the opening, and is attached to the surface of the substrate when viewed from the direction orthogonal to the surface of the substrate. This is a jig that can blow the gas blown from the opening O onto the surface of the substrate while the droplet P is held so as to be surrounded by the opening O.
In the droplet holding jig 10, a through hole H is formed inside the end surface portion 13a surrounded by the opening O.
The droplet holding jig 10 has an outer peripheral portion 12a that forms the outer periphery of the opening O and an inner peripheral portion 13b that forms the inner periphery of the opening O. The direction of the virtual surface including the end M of the outer peripheral portion 12a and the direction of the virtual surface including the end N of the inner peripheral portion 13b substantially coincide. For example, the orientation of the virtual surface including the end portion M of the outer peripheral portion 12a and the orientation of the virtual surface including the end portion N of the inner peripheral portion 13b are parallel.
When the opening is directed to the surface of the substrate, the distance D1 between the surface of the substrate 5 and the end N of the inner peripheral portion 13b is shorter than the distance D2 between the surface of the substrate 5 and the end M of the outer peripheral portion 12a.

第四の実施形態にかかる液滴保持治具10は、治具本体11と治具外周部材12と治具内周部材13と気体供給機器14とで構成される。
第四の実施形態にかかる液滴保持治具10は、基板に付着した液滴に接触しないタイプの治具である。
治具本体11は、揺動機器34に固定されるブロック状の部材である。
治具本体11は、治具外周嵌合穴11aと第一気体通路Eを形成される。
第一気体通路Eは、治具外周嵌合穴11aの周囲に設けられる気体の通路である。
治具外周嵌合穴11aは、治具外周部材12の嵌り込む嵌合穴である。
A droplet holding jig 10 according to the fourth embodiment includes a jig main body 11, a jig outer peripheral member 12, a jig inner peripheral member 13, and a gas supply device 14.
The droplet holding jig 10 according to the fourth embodiment is a type that does not contact the droplets attached to the substrate.
The jig body 11 is a block-like member that is fixed to the swing device 34.
The jig body 11 is formed with a jig outer periphery fitting hole 11a and a first gas passage E.
The first gas passage E is a gas passage provided around the jig outer periphery fitting hole 11a.
The jig outer periphery fitting hole 11 a is a fitting hole into which the jig outer peripheral member 12 is fitted.

治具外周部材12は、治具外周嵌合穴11aに嵌り込む部材である。治具外周部材12の下部が治具外周嵌合穴11aの下部から露出する。
治具外周部材12の露出した箇所は、外周部12aに相当する。
治具外周部材12は、治具内周嵌合穴12bと第二気体通路Fを形成される。
治具内周嵌合穴12bは、治具内周部材13の嵌り込む嵌合穴である。
第二気体通路Fは、第一気体通路Eと第三気体通路Gとを連通する気体の通路である。
The jig outer peripheral member 12 is a member that fits into the jig outer peripheral fitting hole 11a. The lower part of the jig outer peripheral member 12 is exposed from the lower part of the jig outer peripheral fitting hole 11a.
The exposed portion of the jig outer peripheral member 12 corresponds to the outer peripheral portion 12a.
The jig outer peripheral member 12 is formed with a jig inner peripheral fitting hole 12b and a second gas passage F.
The jig inner circumferential fitting hole 12b is a fitting hole into which the jig inner circumferential member 13 is fitted.
The second gas passage F is a gas passage communicating the first gas passage E and the third gas passage G.

治具内周部材13は、治具内周嵌合穴12bに嵌り込む部材である。治具内周部材13の下部が治具内周嵌合穴12bの下部から露出する。
治具内周部材13の露出した箇所が内周部13bに相当する。
治具内周部材13は第三気体通路Gと貫通穴Hとを形成される。
第三気体通路Gは、第二気体通路Fと開口Oとを連通する気体に通路である。
治具内周部材13は貫通穴Hを形成されてもよい。
貫通穴Hは、治具内周部材13の上部と端面Sの中央部とを貫通する。
The jig inner peripheral member 13 is a member that fits into the jig inner peripheral fitting hole 12b. The lower part of the jig inner peripheral member 13 is exposed from the lower part of the jig inner peripheral fitting hole 12b.
The exposed portion of the jig inner peripheral member 13 corresponds to the inner peripheral portion 13b.
The jig inner peripheral member 13 is formed with a third gas passage G and a through hole H.
The third gas passage G is a passage for the gas communicating with the second gas passage F and the opening O.
The jig inner peripheral member 13 may be formed with a through hole H.
The through hole H penetrates the upper part of the jig inner peripheral member 13 and the central part of the end surface S.

開口Oは円形の内周と円形の外周とで囲われた環状の形状をしている。
開口Oの内周は、内周部13bの端部Nにより形成される。
開口Oの外周は、外周部12aの端部Mにより形成される。
The opening O has an annular shape surrounded by a circular inner periphery and a circular outer periphery.
The inner periphery of the opening O is formed by the end N of the inner periphery 13b.
The outer periphery of the opening O is formed by the end M of the outer peripheral portion 12a.

開口Оを基板の表面に対向させたときに、基板5の表面と内周部13bの端部Nとの距離D1は基板55の表面と外周部12aの端部Mとの距離D2よりも僅かに短い。   When the opening O is opposed to the surface of the substrate, the distance D1 between the surface of the substrate 5 and the end N of the inner peripheral portion 13b is slightly smaller than the distance D2 between the surface of the substrate 55 and the end M of the outer peripheral portion 12a. Short.

気体供給機器14は、液滴保持治具10に気体を供給して開口Oから気体を噴きだすための機器である。
気体供給機器14の配管が治具本体11の第一気体通路Eに連通する。
気体供給機器14が気体を板処理用治具に供給すると、気体は、第一気体通路Eと第二気体通路Fと第三気体通路Gとを順に経由して、開口Oから噴き出す。
The gas supply device 14 is a device for supplying a gas to the droplet holding jig 10 and ejecting the gas from the opening O.
The piping of the gas supply device 14 communicates with the first gas passage E of the jig body 11.
When the gas supply device 14 supplies gas to the plate processing jig, the gas is ejected from the opening O through the first gas passage E, the second gas passage F, and the third gas passage G in order.

以下に、第四の実施形態にかかる液滴保持治具の作用を、図を基に説明する。
開口Oを基板5の表面に向けて、基板5の表面と内周部13bの端部Nとの距離D1を所定の距離になるように治具を保持し、開口Oから気体を噴きだす。噴き出した気体が基板の表面に吹き付けられる。
液体供給機器20を用いて、開口から基板の表面に気体を吹き付けている際に液滴を貫通穴を通過して基板の表面に滴下する。
端面Sが基板5の表面に付着する液滴に接触しない。
基板5の表面と端面Sとの距離D1を所定の距離になるように治具を保持した状態で、基板5の表面に沿って液滴保持治具10を相対移動させると、液滴が治具の動きに伴って基板5の表面を移動する。
液滴が基板5の表面を処理する液体であれば、基板5の表面を処理できる。
The operation of the droplet holding jig according to the fourth embodiment will be described below with reference to the drawings.
The opening O is directed toward the surface of the substrate 5, the jig is held so that the distance D1 between the surface of the substrate 5 and the end N of the inner peripheral portion 13b is a predetermined distance, and gas is ejected from the opening O. The jetted gas is blown onto the surface of the substrate.
When the gas is blown from the opening to the surface of the substrate using the liquid supply device 20, the droplet passes through the through hole and drops onto the surface of the substrate.
The end surface S does not come into contact with the droplets adhering to the surface of the substrate 5.
When the droplet holding jig 10 is relatively moved along the surface of the substrate 5 while holding the jig so that the distance D1 between the surface of the substrate 5 and the end surface S is a predetermined distance, the droplets are cured. The surface of the substrate 5 is moved with the movement of the tool.
If the droplet is a liquid that treats the surface of the substrate 5, the surface of the substrate 5 can be treated.

次に、本発明の第五の実施形態にかかる液滴保持治具10を、図を基に、説明する。
図9は、本発明の第五の実施形態にかかる液滴保持治具10の側面図である。 図10は、本発明の第五の実施形態にかかる液滴保持治具10の底面図である。
第五の実施形態にかかる液滴保持治具10は、基板に付着した液滴に接触するタイプの治具である。
Next, a droplet holding jig 10 according to a fifth embodiment of the present invention will be described with reference to the drawings.
FIG. 9 is a side view of the droplet holding jig 10 according to the fifth embodiment of the present invention. FIG. 10 is a bottom view of the droplet holding jig 10 according to the fifth embodiment of the present invention.
The droplet holding jig 10 according to the fifth embodiment is a jig of a type that comes into contact with droplets attached to a substrate.

第五の実施形態にかかる液滴保持治具10は、端面Sを形成する部分である端面部13aを設けられ、端面Sの外周を囲うC状の開口Oを形成され、開口から気体を噴き出し可能であり、端面Sを基板の表面に付着した液滴Pに接触させた状態で基板の表面の直交方向から基板を見て基板の表面に付着した液滴Pを開口Oで囲う様に保持された状態で開口Oから噴き出した気体を基板の表面に吹き付けるできる様になった治具である。
第五の実施形態にかかる液滴保持治具10は、治具を基板の表面に沿って相対移動させるときに、開口を治具の相対移動する軌跡の後方に位置決めできる様になっている。
液滴保持治具10は、端面部13aの開口Oに囲われた内側に貫通穴Hを形成される。
開口Oの外周を形成する外周部12aを有し、端面部13aが開口Oの内周を形成する。
端面Sの向きと外周部12aの端部Mを含む仮想面の向きとが略一致する。例えば、端面Sと外周部12aの端部Mを含む仮想面とが平行である。
開口を基板の表面に向けたとき基板5の表面と端面Sとの距離が基板5の表面と外周部12aの端部Mとの距離よりも短い。
The droplet holding jig 10 according to the fifth embodiment is provided with an end surface portion 13a that is a portion for forming the end surface S, a C-shaped opening O that surrounds the outer periphery of the end surface S is formed, and gas is ejected from the opening. It is possible to hold the droplet P adhering to the surface of the substrate as surrounded by the opening O when viewed from the direction orthogonal to the surface of the substrate with the end surface S in contact with the droplet P adhering to the surface of the substrate. In this state, it is a jig that can blow the gas blown from the opening O onto the surface of the substrate.
In the droplet holding jig 10 according to the fifth embodiment, when the jig is relatively moved along the surface of the substrate, the opening can be positioned behind the locus of relative movement of the jig.
In the droplet holding jig 10, a through hole H is formed inside the end surface portion 13a surrounded by the opening O.
The outer peripheral part 12a which forms the outer periphery of the opening O is provided, and the end surface part 13a forms the inner periphery of the opening O.
The direction of the end surface S substantially coincides with the direction of the virtual surface including the end M of the outer peripheral portion 12a. For example, the end surface S and the virtual surface including the end M of the outer peripheral portion 12a are parallel.
When the opening is directed to the surface of the substrate, the distance between the surface of the substrate 5 and the end surface S is shorter than the distance between the surface of the substrate 5 and the end M of the outer peripheral portion 12a.

第五の実施形態にかかる液滴保持治具10は、治具本体11と治具外周部材12と治具内周部材13と気体供給機器14と治具回転機器15とで構成される。
第五の実施形態にかかる液滴保持治具10は、基板に付着した液滴に接触するタイプの治具である。
治具本体11は、揺動機器34に固定されるブロック状の部材である。
治具本体11は、治具外周嵌合穴11aと第一気体通路Eを形成される。
治具外周嵌合穴11aは、治具外周部材12の嵌り込む嵌合穴である。
第一気体通路Eは、治具外周嵌合穴11aの周囲に形成される気体の通路である。
The droplet holding jig 10 according to the fifth embodiment includes a jig body 11, a jig outer peripheral member 12, a jig inner peripheral member 13, a gas supply device 14, and a jig rotating device 15.
The droplet holding jig 10 according to the fifth embodiment is a jig of a type that comes into contact with droplets attached to a substrate.
The jig body 11 is a block-like member that is fixed to the swing device 34.
The jig body 11 is formed with a jig outer periphery fitting hole 11a and a first gas passage E.
The jig outer periphery fitting hole 11 a is a fitting hole into which the jig outer peripheral member 12 is fitted.
The first gas passage E is a gas passage formed around the jig outer periphery fitting hole 11a.

治具外周部材12は、治具外周嵌合穴11aに嵌り込む部材である。治具外周部材12の下部が治具外周嵌合穴11aの下部から露出する。
治具外周部材12の露出する箇所が、外周部12aに相当する。
治具外周部材12は、治具内周嵌合穴12bと第二気体通路Fとを形成される。
治具内周嵌合穴12bは、治具内周部材13が嵌り込む嵌合穴である。
第二気体通路Fは、治具内周嵌合穴12bと第一気体通路Eとを連通する気体の通路である。
治具内周嵌合穴12bは、治具内周部材13の嵌り込む嵌合穴である。
The jig outer peripheral member 12 is a member that fits into the jig outer peripheral fitting hole 11a. The lower part of the jig outer peripheral member 12 is exposed from the lower part of the jig outer peripheral fitting hole 11a.
The exposed portion of the jig outer peripheral member 12 corresponds to the outer peripheral portion 12a.
The jig outer peripheral member 12 is formed with a jig inner peripheral fitting hole 12b and a second gas passage F.
The jig inner circumferential fitting hole 12b is a fitting hole into which the jig inner circumferential member 13 is fitted.
The second gas passage F is a gas passage communicating the jig inner periphery fitting hole 12b and the first gas passage E.
The jig inner circumferential fitting hole 12b is a fitting hole into which the jig inner circumferential member 13 is fitted.

治具内周部材13は、治具内周嵌合穴12bに嵌り込む部材である。治具内周部材13の下部が治具内周嵌合穴12bの下部から露出する。
治具内周部材13の露出した箇所が端面部13aに相当する。
治具内周部材13の露出した面が端面Sに相当する。
治具内周部材13は第三気体通路Gと貫通穴Hとを形成される。
第三気体通路Gは、第二気体通路Fと開口Oとを連通する気体の通路である。
貫通穴Hは、治具内周部材13の上部と端面Sの中央部とを貫通する。
The jig inner peripheral member 13 is a member that fits into the jig inner peripheral fitting hole 12b. The lower part of the jig inner peripheral member 13 is exposed from the lower part of the jig inner peripheral fitting hole 12b.
The exposed portion of the jig inner peripheral member 13 corresponds to the end surface portion 13a.
The exposed surface of the jig inner peripheral member 13 corresponds to the end surface S.
The jig inner peripheral member 13 is formed with a third gas passage G and a through hole H.
The third gas passage G is a gas passage communicating the second gas passage F and the opening O.
The through hole H penetrates the upper part of the jig inner peripheral member 13 and the central part of the end surface S.

開口Oは内側の円弧と外側の円弧とで囲われたC字状の形状をしている。
開口Oの内側の円弧は、端面部13aにより形成される。
開口Oの外側の円弧は、外周部12aの端部Mにより形成される。
The opening O has a C-shape surrounded by an inner arc and an outer arc.
An arc inside the opening O is formed by the end face portion 13a.
An arc outside the opening O is formed by the end M of the outer peripheral portion 12a.

端面Sを基板の表面に対向させたときに、基板5の表面と端面Sとの距離D1は基板55の表面と外周部12aの端部Mとの距離D2よりも僅かに短い。   When the end surface S is opposed to the surface of the substrate, the distance D1 between the surface of the substrate 5 and the end surface S is slightly shorter than the distance D2 between the surface of the substrate 55 and the end M of the outer peripheral portion 12a.

気体供給機器14は、液滴保持治具10に気体を供給して開口Oから気体を噴きだすための機器である。
気体供給機器14の配管が治具本体11の第一気体通路Eに連通する。
気体供給機器14が気体を板処理用治具に供給すると、気体は、第一気体通路Eと第二気体通路Fと第三気体通路Gとを順に経由して、開口Oから噴き出す。
The gas supply device 14 is a device for supplying a gas to the droplet holding jig 10 and ejecting the gas from the opening O.
The piping of the gas supply device 14 communicates with the first gas passage E of the jig body 11.
When the gas supply device 14 supplies gas to the plate processing jig, the gas is ejected from the opening O through the first gas passage E, the second gas passage F, and the third gas passage G in order.

治具回転機器15は、治具本体11と治具外周部材12との間に設けられる軸受と回転駆動機器とで構成される。
軸受は治具本体11と治具外周部材12とは相対的に回転自在に案内する。
回転駆動機器(図示せず)は、治具外周部材12を回転させる。
The jig rotating device 15 includes a bearing provided between the jig main body 11 and the jig outer peripheral member 12 and a rotation driving device.
The bearing guides the jig body 11 and the jig outer peripheral member 12 so as to be relatively rotatable.
A rotation drive device (not shown) rotates the jig outer peripheral member 12.

以下に、第五の実施形態にかかる液滴保持治具10の作用を、以下に説明する。
開口Oを基板5の表面に向けて、基板5の表面と端面Sとの距離D1を所定の距離になるように治具を保持し、開口Oから気体を噴きだす。気体が基板の表面に吹き付けられる。
液体供給機器20を用いて、開口から基板の表面に気体を吹き付けている際に液滴を貫通穴を通過して基板の表面に滴下する。
端面Sが基板5の表面に付着する液滴に接触する。
基板5の表面と端面Sとの距離D1を所定の距離になるように治具を保持した状態で、基板5の表面に沿って液滴保持治具10を相対移動させつつ開口を治具の相対移動する軌跡の後方に位置させる。
液滴が基板5の表面を処理する液体であれば、基板5の表面を処理できる。
The operation of the droplet holding jig 10 according to the fifth embodiment will be described below.
The opening O is directed toward the surface of the substrate 5, the jig is held so that the distance D1 between the surface of the substrate 5 and the end surface S is a predetermined distance, and gas is ejected from the opening O. Gas is blown onto the surface of the substrate.
When the gas is blown from the opening to the surface of the substrate using the liquid supply device 20, the droplet passes through the through hole and drops onto the surface of the substrate.
The end surface S comes into contact with the droplets adhering to the surface of the substrate 5.
With the jig held so that the distance D1 between the surface of the substrate 5 and the end surface S is a predetermined distance, the droplet holding jig 10 is relatively moved along the surface of the substrate 5 while opening the jig. Position behind the relative trajectory.
If the droplet is a liquid that treats the surface of the substrate 5, the surface of the substrate 5 can be treated.

次に、本発明の第六の実施形態にかかる液滴保持治具10を、図を基に、説明する。
図11は、本発明の第六の実施形態にかかる液滴保持治具10の側面図である。
第六の実施形態にかかる液滴保持治具10は、基板に付着した液滴に接触しないタイプの治具である。
Next, a droplet holding jig 10 according to a sixth embodiment of the present invention will be described with reference to the drawings.
FIG. 11 is a side view of the droplet holding jig 10 according to the sixth embodiment of the present invention.
The droplet holding jig 10 according to the sixth embodiment is a type of jig that does not come into contact with the droplets attached to the substrate.

第六の実施形態にかかる液滴保持治具10は、端面Sの外周を囲うC状の開口Oを形成され、開口から気体を噴き出し可能であり、基板の表面の直交方向から基板を見て基板の表面に付着した液滴Pを開口Oで囲う様に保持された状態で開口Oから噴き出した気体を基板の表面に吹き付ける様になった治具である。
液滴保持治具10は、端面部13aの開口Oに囲われた内側に貫通穴Hを形成される。
開口Oの外周を形成する外周部12aと開口Oの内周を形成する内周部13bとを有する。
内周部13bの端部Nの向きと外周部12aの端部Mを含む仮想面の向きとが略一致する。例えば、内周部13bの端部Nを含む仮想面と外周部12aの端部Mを含む仮想面とが平行である。
開口を基板の表面に向けたとき基板5の表面と端面Sとの距離が基板5の表面と外周部12aの端部Mとの距離よりも短い。
The droplet holding jig 10 according to the sixth embodiment is formed with a C-shaped opening O that surrounds the outer periphery of the end surface S, can eject gas from the opening, and looks at the substrate from a direction orthogonal to the surface of the substrate. The jig is configured to blow a gas blown from the opening O onto the surface of the substrate while the droplet P attached to the surface of the substrate is held so as to be surrounded by the opening O.
In the droplet holding jig 10, a through hole H is formed inside the end surface portion 13a surrounded by the opening O.
It has the outer peripheral part 12a which forms the outer periphery of the opening O, and the inner peripheral part 13b which forms the inner periphery of the opening O.
The direction of the end portion N of the inner peripheral portion 13b and the direction of the virtual surface including the end portion M of the outer peripheral portion 12a substantially coincide. For example, the virtual surface including the end N of the inner peripheral portion 13b and the virtual surface including the end M of the outer peripheral portion 12a are parallel.
When the opening is directed to the surface of the substrate, the distance between the surface of the substrate 5 and the end surface S is shorter than the distance between the surface of the substrate 5 and the end M of the outer peripheral portion 12a.

第六の実施形態にかかる液滴保持治具10は、治具本体11と治具外周部材12と治具内周部材13と気体供給機器14と治具回転機器15とで構成される。
治具本体11は、揺動機器34に固定されるブロック状の部材である。
治具本体11は、治具外周嵌合穴11aと第一気体通路Eを形成される。
治具外周嵌合穴11aは、治具外周部材12の嵌り込む嵌合穴である。
第一気体通路Eは、治具外周嵌合穴11aの周囲に形成される気体の通路である。
The droplet holding jig 10 according to the sixth embodiment includes a jig body 11, a jig outer peripheral member 12, a jig inner peripheral member 13, a gas supply device 14, and a jig rotating device 15.
The jig body 11 is a block-like member that is fixed to the swing device 34.
The jig body 11 is formed with a jig outer periphery fitting hole 11a and a first gas passage E.
The jig outer periphery fitting hole 11 a is a fitting hole into which the jig outer peripheral member 12 is fitted.
The first gas passage E is a gas passage formed around the jig outer periphery fitting hole 11a.

治具外周部材12は、治具外周嵌合穴11aに嵌り込む部材である。治具外周部材12の下部が治具外周嵌合穴11aの下部から露出する。
治具外周部材12の露出する箇所が、外周部12aに相当する。
治具外周部材12は、治具内周嵌合穴12bと第二気体通路Fとを形成される。
治具内周嵌合穴12bは、治具内周部材13の嵌り込む嵌合穴である。
第二気体通路Fは、治具内周嵌合穴12bと第一気体通路Eとを連通する気体の通路である。
The jig outer peripheral member 12 is a member that fits into the jig outer peripheral fitting hole 11a. The lower part of the jig outer peripheral member 12 is exposed from the lower part of the jig outer peripheral fitting hole 11a.
The exposed portion of the jig outer peripheral member 12 corresponds to the outer peripheral portion 12a.
The jig outer peripheral member 12 is formed with a jig inner peripheral fitting hole 12b and a second gas passage F.
The jig inner circumferential fitting hole 12b is a fitting hole into which the jig inner circumferential member 13 is fitted.
The second gas passage F is a gas passage communicating the jig inner periphery fitting hole 12b and the first gas passage E.

治具内周部材13は、治具内周嵌合穴12bに嵌り込む部材である。治具内周部材13の下部が治具内周嵌合穴12bの下部から露出する。
治具内周部材13の露出した箇所が内周部13bに相当する。
治具内周部材13は第三気体通路Gと貫通穴Hとを形成される。
第三気体通路Gは、第二気体通路Fと開口Oとを連通する気体の通路である。
貫通穴Hは、治具内周部材13の上部と端面Sの中央部とを貫通する。
The jig inner peripheral member 13 is a member that fits into the jig inner peripheral fitting hole 12b. The lower part of the jig inner peripheral member 13 is exposed from the lower part of the jig inner peripheral fitting hole 12b.
The exposed portion of the jig inner peripheral member 13 corresponds to the inner peripheral portion 13b.
The jig inner peripheral member 13 is formed with a third gas passage G and a through hole H.
The third gas passage G is a gas passage communicating the second gas passage F and the opening O.
The through hole H penetrates the upper part of the jig inner peripheral member 13 and the central part of the end surface S.

開口Oは内側の円弧と外側の円弧とで挟まれたC字形の形状をしている。
開口Oの内側の円弧は、端面部13aにより形成される。
開口Oの外側の円弧は、外周部12aの端部Mにより形成される。
The opening O has a C-shape sandwiched between an inner arc and an outer arc.
An arc inside the opening O is formed by the end face portion 13a.
An arc outside the opening O is formed by the end M of the outer peripheral portion 12a.

端面Sを基板の表面に対向させたときに、基板5の表面と端面Sとの距離D1は基板55の表面と外周部12aの端部Mとの距離D2よりも僅かに短い。   When the end surface S is opposed to the surface of the substrate, the distance D1 between the surface of the substrate 5 and the end surface S is slightly shorter than the distance D2 between the surface of the substrate 55 and the end M of the outer peripheral portion 12a.

気体供給機器14は、液滴保持治具10に気体を供給して開口Oから気体を噴きだすための機器である。
気体供給機器14の配管が治具本体11の第一気体通路Eに連通する。
気体供給機器14が気体を板処理用治具に供給すると、気体は、第一気体通路Eと第二気体通路Fと第三気体通路Gとを順に経由して、開口Oから噴き出す。
The gas supply device 14 is a device for supplying a gas to the droplet holding jig 10 and ejecting the gas from the opening O.
The piping of the gas supply device 14 communicates with the first gas passage E of the jig body 11.
When the gas supply device 14 supplies gas to the plate processing jig, the gas is ejected from the opening O through the first gas passage E, the second gas passage F, and the third gas passage G in order.

治具回転機器15は、治具本体11と治具外周部材12との間に設けられる軸受と回転駆動機器とで構成される。
軸受は治具本体11と治具外周部材12とは相対的に回転自在に案内する。
回転駆動機器(図示せず)は、治具外周部材12を回転させる。
The jig rotating device 15 includes a bearing provided between the jig main body 11 and the jig outer peripheral member 12 and a rotation driving device.
The bearing guides the jig body 11 and the jig outer peripheral member 12 so as to be relatively rotatable.
A rotation drive device (not shown) rotates the jig outer peripheral member 12.

以下に、第六の実施形態にかかる液滴保持治具10の作用を、以下に説明する。
開口Oを基板5の表面に向けて、基板5の表面と端面Sとの距離D1を所定の距離になるように治具を保持し、開口Oから気体を噴きだす。
液体供給機器20を用いて、開口から基板の表面に気体を吹き付けている際に液滴を貫通穴を通過して基板の表面に滴下する。
端面Sが基板5の表面に付着する液滴に接触させない。
基板5の表面と端面Sとの距離D1を所定の距離になるように治具を保持した状態で、基板5の表面に沿って液滴保持治具10を相対移動させつつ開口を治具の相対移動する軌跡の後方に位置させる。
液滴が基板5の表面を処理する液体であれば、基板5の表面を処理できる。
The operation of the droplet holding jig 10 according to the sixth embodiment will be described below.
The opening O is directed toward the surface of the substrate 5, the jig is held so that the distance D1 between the surface of the substrate 5 and the end surface S is a predetermined distance, and gas is ejected from the opening O.
When the gas is blown from the opening to the surface of the substrate using the liquid supply device 20, the droplet passes through the through hole and drops onto the surface of the substrate.
The end surface S is not brought into contact with the droplets adhering to the surface of the substrate 5.
With the jig held so that the distance D1 between the surface of the substrate 5 and the end surface S is a predetermined distance, the droplet holding jig 10 is relatively moved along the surface of the substrate 5 while opening the jig. Position behind the relative trajectory.
If the droplet is a liquid that treats the surface of the substrate 5, the surface of the substrate 5 can be treated.

次に、本発明の第七の実施形態にかかる液滴保持治具10を、図を基に、説明する。
図12は、本発明の第七の実施形態にかかる液滴保持治具その1の底面図である。図13は、本発明の第七の実施形態にかかる液滴保持治具その2の底面図である。
第七の実施形態にかかる液滴保持治具10は、基板に付着した液滴に接触するタイプまたは接触しないタイプの2つの形式に対応した治具である。
Next, a droplet holding jig 10 according to a seventh embodiment of the present invention will be described with reference to the drawings.
FIG. 12 is a bottom view of the droplet holding jig 1 according to the seventh embodiment of the present invention. FIG. 13 is a bottom view of the droplet holding jig 2 according to the seventh embodiment of the present invention.
The droplet holding jig 10 according to the seventh embodiment is a jig corresponding to two types of a type that contacts or does not contact a droplet attached to a substrate.

第七の実施形態にかかる液滴保持治具10は、円形の仮想線に沿って並んだ複数の開口Oを形成され、複数の開口Oから気体を噴き出し可能であり、基板の表面の直交方向から基板を見て基板の表面に付着した液滴を複数の開口で囲う様に保持された状態で複数の開口から噴き出した気体を基板の表面に吹き付けできる様になった治具である。
第七の実施形態にかかる液滴保持治具10は、開口の形状が異なる以外は、前述した液滴保持治具と同様の構造をしているので、同一の部分については説明を省略する。
The droplet holding jig 10 according to the seventh embodiment is formed with a plurality of openings O arranged along a circular imaginary line, and can eject gas from the plurality of openings O, and is orthogonal to the surface of the substrate. The jig is configured to be able to blow the gas ejected from the plurality of openings onto the surface of the substrate in a state where droplets attached to the surface of the substrate are held so as to be surrounded by the plurality of openings when viewed from the substrate.
Since the droplet holding jig 10 according to the seventh embodiment has the same structure as the above-described droplet holding jig except that the shape of the opening is different, the description of the same portion is omitted.

図12、図13は、開口の構造を除いて第一の実施形態にかかる液滴保持治具の同様の構造をもった治具を示している。
図12は、複数の扇状の開口が円形の仮想線に沿って並んで形成される液滴保持治具10を示している。複数の扇状の開口から気体を噴き出し可能になっており、基板の表面の直交方向から基板を見て基板の表面に付着した液滴を複数の開口で囲う様に保持された状態で複数の開口から噴き出した気体を基板の表面に吹き付けできる様になっている。
図13は、小さな円形の開口が円形の仮想線に沿って並んで形成される液滴保持治具10を示している。複数の円形の開口から気体を噴き出し可能になっており、基板の表面の直交方向から基板を見て基板の表面に付着した液滴を複数の開口で囲う様に保持された状態で複数の開口から噴き出した気体を基板の表面に吹き付けできる様になっている。
12 and 13 show a jig having the same structure as the droplet holding jig according to the first embodiment except for the structure of the opening.
FIG. 12 shows a droplet holding jig 10 in which a plurality of fan-shaped openings are formed side by side along a circular virtual line. Gas can be blown out from a plurality of fan-shaped openings, and the plurality of openings are held in such a manner that droplets attached to the surface of the substrate are surrounded by the plurality of openings when viewed from the direction orthogonal to the surface of the substrate. The gas blown out from the substrate can be blown onto the surface of the substrate.
FIG. 13 shows a droplet holding jig 10 in which small circular openings are formed side by side along a circular imaginary line. Gas can be ejected from a plurality of circular openings, and the plurality of openings are held in such a manner that droplets adhering to the surface of the substrate are surrounded by the plurality of openings when viewed from the direction orthogonal to the surface of the substrate. The gas blown out from the substrate can be blown onto the surface of the substrate.

本発明の第七の実施形態にかかる液滴保持治具10の作用は、前述した第一〜第六の実施形態にかかる液滴保持治具10の作用と同じなので、説明を省略する。   Since the action of the droplet holding jig 10 according to the seventh embodiment of the present invention is the same as the action of the droplet holding jig 10 according to the first to sixth embodiments described above, description thereof is omitted.

次に、本発明の第一の実施形態にかかる基板処理方法を、図を基に、説明する。
図14は、本発明の第一の実施形態に係る基板処理方法の手順図である。
Next, the substrate processing method concerning 1st embodiment of this invention is demonstrated based on figures.
FIG. 14 is a flowchart of the substrate processing method according to the first embodiment of the present invention.

第一の実施形態に係る基板処理方法は、準備工程S10と付着工程S20と走査工程S40と回収工程S50と測定工程S60とで構成される。   The substrate processing method according to the first embodiment includes a preparation step S10, an adhesion step S20, a scanning step S40, a recovery step S50, and a measurement step S60.

準備工程S10は、液滴保持治具10と液体供給機器20と走査機器30とを準備する工程である。   The preparation step S10 is a step of preparing the droplet holding jig 10, the liquid supply device 20, and the scanning device 30.

付着工程S20は、基板の表面に液滴を付着させる工程である。
例えば、開口Oを基板5の表面に向けて基板回収用治具を保持した状態で、開口Oから基板5の表面に向けて気体を噴き出している際に貫通穴Hを通過して基板の表面に液滴を滴下する。
液滴Pが基板5の表面に付着する。
液滴Pを作る液体の量を開口Oで囲まれた空間からはみ出ない量とする。
液滴Pを作る液体の適当な量は、基板の表面の状態、液体の粘度、または基板の表面と液体との濡れ性等とにより影響される。
例えば、第一の実施形態にかかる液滴保持治具を用いれば、液滴が端面部の端面Sに付着する。
例えば、第四の実施形態にかかる基板検査治具を用いれば、液滴保持治具は液滴に接触しない。
The attaching step S20 is a step of attaching droplets to the surface of the substrate.
For example, in the state where the opening O is directed toward the surface of the substrate 5 and the substrate recovery jig is held, when the gas is ejected from the opening O toward the surface of the substrate 5, the surface of the substrate passes through the through hole H. Drop droplets on
The droplet P adheres to the surface of the substrate 5.
The amount of the liquid that forms the droplet P is an amount that does not protrude from the space surrounded by the opening O.
An appropriate amount of the liquid that forms the droplet P is affected by the state of the surface of the substrate, the viscosity of the liquid, or the wettability between the surface of the substrate and the liquid.
For example, when the droplet holding jig according to the first embodiment is used, the droplet adheres to the end surface S of the end surface portion.
For example, when the substrate inspection jig according to the fourth embodiment is used, the droplet holding jig does not contact the droplet.

走査工程S40は、基板の表面の直交方向から基板を見て基板の表面に付着した液滴を開口で囲う様に治具を保持して開口から基板の表面に気体を吹き付けながら治具を基板の表面に沿って相対移動させる工程である。
第五乃至第六の実施形態にかかる液滴保持治具10を用いるばあいは、さらに、治具を基板5の表面に沿って相対移動させつつC字状の開口Oを治具の相対移動する軌跡の後方に位置させる。
所定の手順に従って、回転機器32が基板を回転させ、揺動機器34が液滴保持治具10を基板の半径方向に移動させる。
液滴Pが、基板5の表面に沿って移動する。
液滴が基板を処理する液体であれば、基板5の表面が処理される。
The scanning step S40 holds the jig so that the droplets attached to the surface of the substrate are surrounded by the opening when viewed from the direction orthogonal to the surface of the substrate, and the jig is mounted on the substrate while blowing gas from the opening to the surface of the substrate. It is the process of making it move relatively along the surface.
When the droplet holding jig 10 according to the fifth to sixth embodiments is used, the jig is further moved along the surface of the substrate 5 while the C-shaped opening O is moved relative to the jig. Position it behind the trajectory.
According to a predetermined procedure, the rotating device 32 rotates the substrate, and the swing device 34 moves the droplet holding jig 10 in the radial direction of the substrate.
The droplet P moves along the surface of the substrate 5.
If the droplet is a liquid that treats the substrate, the surface of the substrate 5 is treated.

回収工程S50は、基板5の表面に付着する液滴を回収する。
例えば、スポイト状の機器を用いて基板5の表面に付着する液滴を吸い上げる。
例えば、開口Oを基板5の表面に向けて基板回収用治具を保持した状態で、開口Oから基板5の表面に向けて気体を噴き出している際に貫通穴Hを通過して基板の表面に付着した液滴を回収する。
また例えば、液滴保持治具10を基板の表面から退避させて、スポイト状の機器を用いて基板5の表面に付着する液滴を吸い上げる。
In the collecting step S50, the droplets adhering to the surface of the substrate 5 are collected.
For example, droplets adhering to the surface of the substrate 5 are sucked up using a dropper-like device.
For example, in the state where the opening O is directed toward the surface of the substrate 5 and the substrate recovery jig is held, when the gas is ejected from the opening O toward the surface of the substrate 5, the surface of the substrate passes through the through hole H. Collect droplets adhering to.
Further, for example, the droplet holding jig 10 is retracted from the surface of the substrate, and the droplets adhering to the surface of the substrate 5 are sucked up using a dropper-like device.

測定工程S60は、液滴を測定する工程である。
例えば、液滴に含まれる金属原子の量を測定する
The measurement step S60 is a step of measuring a droplet.
For example, measure the amount of metal atoms contained in a droplet

次に、本発明の第二の実施形態にかかる基板処理方法を、図を基に、説明する。
図15は、本発明の第二の実施形態に係る基板処理方法の手順図である。
Next, the substrate processing method concerning 2nd embodiment of this invention is demonstrated based on figures.
FIG. 15 is a flowchart of the substrate processing method according to the second embodiment of the present invention.

第二の実施形態に係る基板処理方法は、準備工程S10と付着工程S20と初期工程S30と走査工程S40と回収工程S50と測定工程S60とで構成される。   The substrate processing method according to the second embodiment includes a preparation step S10, an adhesion step S20, an initial step S30, a scanning step S40, a recovery step S50, and a measurement step S60.

準備工程S10は、液滴保持治具10と液体供給機器20と走査機器30とを準備する工程である。   The preparation step S10 is a step of preparing the droplet holding jig 10, the liquid supply device 20, and the scanning device 30.

付着工程S20は、基板の表面に液滴を付着させる工程である。
例えば、開口Oを基板5の表面に向けて基板回収用治具を保持し、開口Oから基板5の表面に向けて気体を噴き出している際に貫通穴Hを通過して基板の表面に液滴を滴下する。
また例えば、液滴保持治具10を基板の表面から退避させて、基板の表面の所望の位置に液滴を滴下する。
液滴Pが基板5の表面に付着する。
The attaching step S20 is a step of attaching droplets to the surface of the substrate.
For example, the substrate recovery jig is held with the opening O facing the surface of the substrate 5, and when the gas is blown out from the opening O toward the surface of the substrate 5, the liquid passes through the through hole H and reaches the surface of the substrate. Add drops.
Further, for example, the droplet holding jig 10 is retracted from the surface of the substrate, and the droplet is dropped at a desired position on the surface of the substrate.
The droplet P adheres to the surface of the substrate 5.

初期工程S30は、開口Oを基板5の表面を向けた状態で端面Sを基板5の表面に接近させて端面Sを基板の表面に付着した液滴に接触させる。   In the initial step S30, the end surface S is brought close to the surface of the substrate 5 with the opening O facing the surface of the substrate 5, and the end surface S is brought into contact with the droplet attached to the surface of the substrate.

走査工程S40は、基板の表面の直交方向から基板を見て基板の表面に付着した液滴を開口で囲う様に治具を保持して開口から基板の表面に気体を吹き付けながら治具を基板の表面に沿って相対移動させる工程である。
所定の手順に従って、回転機器32が基板を回転させ、揺動機器34が液滴保持治具10を基板の半径方向に移動させる。
液滴Pが、基板5の表面に沿って移動する。
液滴が基板を処理する液体であれば、基板5の表面が処理される。
The scanning step S40 holds the jig so that the droplets attached to the surface of the substrate are surrounded by the opening when viewed from the direction orthogonal to the surface of the substrate, and the jig is mounted on the substrate while blowing gas from the opening to the surface of the substrate. It is the process of making it move relatively along the surface.
According to a predetermined procedure, the rotating device 32 rotates the substrate, and the swing device 34 moves the droplet holding jig 10 in the radial direction of the substrate.
The droplet P moves along the surface of the substrate 5.
If the droplet is a liquid that treats the substrate, the surface of the substrate 5 is treated.

回収工程S50は、基板5の表面に付着する液滴を回収する。
例えば、スポイト状の機器を用いて基板5の表面に付着する液滴を吸い上げる。
例えば、開口を基板の表面に向けて液滴保持治具10を保持し、開口から噴き出した気体を基板の表面に吹き付けている際に、基板の表面に付着している液滴を貫通穴Hを通過して回収する、
また、例えば、液滴保持治具10を基板の表面から退避させて、基板の表面の液滴を回収する。
In the collecting step S50, the droplets adhering to the surface of the substrate 5 are collected.
For example, droplets adhering to the surface of the substrate 5 are sucked up using a dropper-like device.
For example, when the droplet holding jig 10 is held with the opening directed toward the surface of the substrate and the gas ejected from the opening is sprayed onto the surface of the substrate, the droplets adhering to the surface of the substrate are removed from the through hole H. Pass through and collect,
Further, for example, the droplet holding jig 10 is retracted from the surface of the substrate, and the droplets on the surface of the substrate are collected.

測定工程S60は、液滴を測定する工程である。
例えば、液滴に含まれる金属原子の量を測定する
The measurement step S60 is a step of measuring a droplet.
For example, measure the amount of metal atoms contained in a droplet

上述の実施形態に係る基板処理装置と基板処理方法と液滴保持治具10とを用いれば、以下の効果を発揮する。
基板5の表面に付着した液滴Pを環状の開口で囲う様に治具を保持して、開口Oから基板の表面に気体を吹き付けながら治具を基板の表面に沿って相対移動させるので、基板5の表面に付着した液滴Pが基板5の表面に沿って相対移動する。そのため、液滴が基板を処理する液体であれば、基板の表面の液滴を相対移動させた領域を処理できる。
基板5の表面に付着した液滴Pに端面Sを接触させて液滴Pを環状の開口で囲う様に治具を保持して、開口Oから基板5の表面に気体を吹き付けながら治具を基板5の表面に沿って相対移動させるので、基板の表面に付着した液滴Pが基板の表面に沿って相対移動する。その結果、液滴が基板を処理する液体であれば、基板の表面の液滴を相対移動させた領域を処理できる。
基板5の表面に付着した液滴をC字状の開口Oで囲う様に治具を保持して開口Oから基板の表面に気体を吹き付けながら治具を基板の表面に沿って相対移動させつつ開口Oを治具の相対移動する軌跡の後方に位置させるので、基板の表面に付着した液滴が基板の表面に沿って相対移動する。その結果、液滴が基板を処理する液体であれば、基板の表面の液滴を相対移動させた領域を処理できる。
基板5の表面に付着した液滴に端面Sを接触させて液滴をC字状の開口Oで囲う様に治具を保持して開口Oから基板の表面に気体を吹き付けながら治具を基板の表面に沿って相対移動させつつ開口Oを治具の相対移動する軌跡の後方に位置させるので、基板の表面に付着した液滴が基板の表面に沿って相対移動する。その結果、液滴が基板を処理する液体であれば、基板の表面の液滴を相対移動させた領域を処理できる。
基板の表面に付着した液滴を円形の仮想線に沿って並んだ複数の開口で囲う様に治具を保持して、複数の開口から噴き出した気体を基板の表面に吹き付けながら治具を基板の表面に沿って相対移動させるので、基板の表面に付着した液滴が基板の表面に沿って相対移動できる。
また、開口Oから基板5の表面に気体を吹き付けている際に液滴pが貫通穴Hを通過して基板の表面に滴下するので、液滴Pが開口Oに囲われた内側を通過して基板の表面に付着され開口から基板の表面に向けて噴き出す気体に周囲を押されて位置が安定する。
また、開口Oから基板5の表面に気体を吹き付けている際に液滴pが貫通穴Hを通過して基板の表面に付着した液滴を回収するので、開口から基板の表面に向けて噴き出す気体に周囲を押されて位置が安定している液滴を回収でき、液滴の飛散を抑制できる。
また、基板5の表面に付着した液滴Pを開口で囲う様にして治具を保持すると、開口Oの内周を形成する内周部13bの端部Nが開口の外周を形成する外周部の端部より基板の表面に近くなるので、基板の表面に付着した液滴が安定する。
また、基板5の表面に付着した液滴を開口で囲う様にして治具を保持すると、開口の内周を形成する端面部13aの端面Sが開口の外周を形成する外周部の端部より基板の表面に近くなるので、基板の表面に付着した液滴が安定する。
また、開口Oを基板の表面を向けた状態で端面Sを基板の表面に接近させて端面を基板の表面に付着した液滴に接触させるので、液滴が基板の表面と端面とに挟まれる。
また、端面Sの凹んでいる凹形状の輪郭がが液滴Pを基板5の表面に付着させた際の液滴Pの自由表面の膨らみ具合である凸形状の輪郭と略一致するので、液滴Pが基板5の表面と端面との間に安定して挟まれる。
また、端面Sの大きさに比較して十分に小さな複数の凹凸形状が端面部13aの端面Sにあるので、液滴Pが基板5の表面と端面Sとに挟まれると、凹凸形状がない場合に比べて端面と液体の接触面積が増える。
また、基板の表面が荒れている場合でも、液滴を基板の表面に付着した液滴を移動させることができ、液滴で基板の表面を処理できる。
また、基板の表面と液滴とが親水性の関係にある場合でも、液滴を基板の表面に付着した液滴を移動させることができ、液滴で基板の表面を処理できる。
また、液滴を端面に付着した状態であると、液滴の蒸発を抑制できる。
If the substrate processing apparatus, the substrate processing method, and the droplet holding jig 10 according to the above-described embodiment are used, the following effects are exhibited.
Since the jig is held so that the droplet P adhering to the surface of the substrate 5 is surrounded by the annular opening, and the gas is blown from the opening O to the surface of the substrate, the jig is relatively moved along the surface of the substrate. The droplet P attached to the surface of the substrate 5 moves relative to the surface of the substrate 5. Therefore, if the droplet is a liquid for processing the substrate, the region where the droplet on the surface of the substrate is relatively moved can be processed.
An end face S is brought into contact with the droplet P adhering to the surface of the substrate 5 and the jig is held so as to surround the droplet P with an annular opening, and the jig is applied while blowing gas from the opening O onto the surface of the substrate 5. Since the relative movement is performed along the surface of the substrate 5, the droplet P attached to the surface of the substrate relatively moves along the surface of the substrate. As a result, if the droplet is a liquid for processing the substrate, the region where the droplet on the surface of the substrate is relatively moved can be processed.
While holding the jig so that the droplets adhering to the surface of the substrate 5 are surrounded by the C-shaped opening O and blowing the gas from the opening O to the surface of the substrate, the jig is moved relatively along the surface of the substrate. Since the opening O is positioned behind the relative movement path of the jig, the droplets adhering to the surface of the substrate relatively move along the surface of the substrate. As a result, if the droplet is a liquid for processing the substrate, the region where the droplet on the surface of the substrate is relatively moved can be processed.
The end surface S is brought into contact with the droplet attached to the surface of the substrate 5, the jig is held so that the droplet is surrounded by the C-shaped opening O, and the jig is mounted while blowing gas from the opening O onto the surface of the substrate. Since the opening O is positioned behind the locus of relative movement of the jig while relatively moving along the surface of the substrate, the droplets adhering to the surface of the substrate relatively move along the surface of the substrate. As a result, if the droplet is a liquid for processing the substrate, the region where the droplet on the surface of the substrate is relatively moved can be processed.
Holding the jig so that the droplets adhering to the surface of the substrate are surrounded by a plurality of openings arranged along a circular imaginary line, and blowing the gas ejected from the plurality of openings onto the surface of the substrate Therefore, the droplets attached to the surface of the substrate can be relatively moved along the surface of the substrate.
Further, when the gas is blown from the opening O to the surface of the substrate 5, the droplet p passes through the through hole H and drops onto the surface of the substrate, so that the droplet P passes through the inside surrounded by the opening O. The position is stabilized by being pushed by the gas attached to the surface of the substrate and ejected from the opening toward the surface of the substrate.
Further, when the gas is blown from the opening O to the surface of the substrate 5, the droplet p passes through the through hole H and collects the droplet attached to the surface of the substrate, so that it is ejected from the opening toward the surface of the substrate. It is possible to collect a droplet whose position is stabilized by being pushed by the gas, and to suppress the scattering of the droplet.
Further, when the jig is held so as to surround the droplet P adhering to the surface of the substrate 5 with the opening, the outer peripheral portion where the end N of the inner peripheral portion 13b forming the inner periphery of the opening O forms the outer periphery of the opening Since the edge of the substrate is closer to the surface of the substrate, the droplets adhering to the surface of the substrate are stabilized.
Further, when the jig is held so that the droplets adhering to the surface of the substrate 5 are surrounded by the opening, the end surface S of the end surface portion 13a that forms the inner periphery of the opening is more than the end portion of the outer peripheral portion that forms the outer periphery of the opening. Since it is close to the surface of the substrate, the droplets attached to the surface of the substrate are stabilized.
In addition, since the end surface S is brought close to the surface of the substrate with the opening O facing the surface of the substrate and the end surface is brought into contact with the droplet attached to the surface of the substrate, the droplet is sandwiched between the surface and the end surface of the substrate. .
Further, since the concave contour in which the end surface S is concave substantially coincides with the convex contour that is the degree of swelling of the free surface of the droplet P when the droplet P is attached to the surface of the substrate 5, The droplet P is stably sandwiched between the surface and the end surface of the substrate 5.
In addition, since a plurality of concave and convex shapes that are sufficiently smaller than the size of the end surface S are present on the end surface S of the end surface portion 13a, there is no uneven shape when the droplet P is sandwiched between the surface of the substrate 5 and the end surface S. Compared to the case, the contact area between the end face and the liquid increases.
Further, even when the surface of the substrate is rough, it is possible to move the droplet with the droplet attached to the surface of the substrate, and to treat the surface of the substrate with the droplet.
Further, even when the surface of the substrate and the droplet are in a hydrophilic relationship, the droplet with the droplet attached to the surface of the substrate can be moved, and the surface of the substrate can be treated with the droplet.
Further, when the liquid droplet is attached to the end face, the evaporation of the liquid droplet can be suppressed.

本発明は以上に述べた実施形態に限られるものではなく、発明の要旨を逸脱しない範囲で各種の変更が可能である。
第一実施形態にかかる液滴保持治具10では、端面部が開口Oの内周を形成するとして説明したが、これに限定されず、例えば、端面部の外周から離れた箇所に内周部を設けられ、内周部が開口Oの内周を形成してもよい。
また、回転機器と揺動機器とを用いて液滴保持治具を基板に対して相対移動するのを説明したが、これに限定されず、例えば、X−Y移動機器を用いて液滴保持治具を走査してもよい。
また、液滴保持治具は基板を処理する基板処理方法に用いるとして説明したが、これに限定されず、他の目的のために基板に付着した液滴を保持するのに用いることができる。
The present invention is not limited to the embodiments described above, and various modifications can be made without departing from the scope of the invention.
In the droplet holding jig 10 according to the first embodiment, the end surface portion has been described as forming the inner periphery of the opening O. However, the present invention is not limited to this. For example, the inner periphery portion is located away from the outer periphery of the end surface portion. And the inner periphery may form the inner periphery of the opening O.
In addition, although the description has been given of the relative movement of the droplet holding jig with respect to the substrate using the rotating device and the swinging device, the present invention is not limited to this, for example, the droplet holding device using the XY moving device. The jig may be scanned.
Further, although the liquid droplet holding jig has been described as being used in a substrate processing method for processing a substrate, the present invention is not limited to this, and can be used to hold liquid droplets attached to the substrate for other purposes.

本発明の実施形態に係る基板処理装置の平面図である。It is a top view of the substrate processing apparatus concerning the embodiment of the present invention. 本発明の実施形態に係る基板処理装置の正面図である。1 is a front view of a substrate processing apparatus according to an embodiment of the present invention. 本発明の実施形態に係る基板処理装置の側面図である。1 is a side view of a substrate processing apparatus according to an embodiment of the present invention. 本発明の第一の実施形態に係る治具の側面図である。It is a side view of the jig concerning a first embodiment of the present invention. 本発明の第一の実施形態に係る治具の底面図である。It is a bottom view of the jig concerning a first embodiment of the present invention. 本発明の第二の実施形態に係る治具の側面図である。It is a side view of the jig | tool which concerns on 2nd embodiment of this invention. 本発明の第三の実施形態に係る治具の側面図である。It is a side view of the jig | tool which concerns on 3rd embodiment of this invention. 本発明の第四の実施形態に係る治具の側面図である。It is a side view of the jig | tool which concerns on 4th embodiment of this invention. 本発明の第五の実施形態に係る治具の側面図である。It is a side view of the jig | tool which concerns on 5th embodiment of this invention. 本発明の第五の実施形態に係る治具の底面図である。It is a bottom view of the jig | tool which concerns on 5th embodiment of this invention. 本発明の第六の実施形態に係る治具の側面図である。It is a side view of the jig concerning a 6th embodiment of the present invention. 本発明の第七の実施形態にかかる液滴保持治具その1の底面図である。It is a bottom view of the droplet holding jig | tool 1 concerning the 7th embodiment of this invention. 本発明の第七の実施形態にかかる液滴保持治具その2の底面図である。It is a bottom view of the droplet holding jig 2 concerning a 7th embodiment of the present invention. 本発明の第一の実施形態に係る基板処理方法の手順図である。It is a procedure figure of the substrate processing method concerning a first embodiment of the present invention. 本発明の第二の実施形態に係る基板処理方法の手順図である。It is a procedure figure of the substrate processing method concerning a second embodiment of the present invention.

符号の説明Explanation of symbols

E 第一気体通路
F 第二気体通路
G 第三気体通路
S 端面
O 開口
M 外周部の端部
N 内周部の端部
H 貫通穴
10 液滴保持治具
11 治具本体
11a 治具外周嵌合穴
12 治具外周部材
12a 外周部
12b 治具内周嵌合穴
13 治具内周部材
13a 端面部
13b 内周部
14 気体供給機器
15 治具回転機器
20 液体供給機器
30 走査機器
31 ベース
32 回転機器
33 心出し機器
34 揺動機器
35 昇降機器
S10 準備工程
S20 付着工程
S30 初期工程
S40 走査工程
S50 回収工程
S60 測定工程
E 1st gas passage F 2nd gas passage G 3rd gas passage S End face O Opening M End part of outer peripheral part N End part of inner peripheral part H Through hole 10 Droplet holding jig 11 Jig body 11a Jig outer periphery fitting Joint hole 12 Jig outer peripheral member 12a Outer peripheral portion 12b Jig inner peripheral fitting hole 13 Jig inner peripheral member 13a End surface portion 13b Inner peripheral portion 14 Gas supply device 15 Jig rotating device 20 Liquid supply device 30 Scanning device 31 Base 32 Rotating device 33 Centering device 34 Oscillating device 35 Lifting device S10 Preparatory process S20 Adhesion process S30 Initial process S40 Scanning process S50 Recovery process S60 Measurement process

Claims (28)

基板を液滴で処理する基板処理方法であって、
環状の開口を形成され前記開口から気体を噴き出し可能になった治具を準備する準備工程と、
基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に前記治具を保持して前記開口から噴き出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させる走査工程と、
を備えることを特徴とする基板処理方法。
A substrate processing method for processing a substrate with droplets,
A preparation step of preparing a jig formed with an annular opening and capable of ejecting gas from the opening;
The jig is held while blowing the gas blown from the opening onto the surface of the substrate while holding the jig so as to surround the opening with droplets attached to the surface of the substrate when viewed from the direction orthogonal to the surface of the substrate. A scanning process for relative movement along the surface of the substrate;
A substrate processing method comprising:
基板を液滴で処理する基板処理方法であって、
端面を形成する端面部を有し前記端面の周囲を囲う環状の開口を形成され前記開口から気体を噴き出し可能になった治具を準備する準備工程と、
前記端面を基板の表面に付着した液滴に接触させて基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に前記治具を保持して前記開口から噴き出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させる走査工程と、
を備えることを特徴とする基板処理方法。
A substrate processing method for processing a substrate with droplets,
A preparation step of preparing a jig that has an end surface portion that forms an end surface and has an annular opening surrounding the periphery of the end surface and is capable of ejecting gas from the opening;
The opening is held by holding the jig so that the end surface is brought into contact with a droplet attached to the surface of the substrate and the droplet attached to the surface of the substrate is surrounded by the opening when viewed from the direction orthogonal to the surface of the substrate. A scanning step of relatively moving the jig along the surface of the substrate while blowing the gas blown from the surface of the substrate;
A substrate processing method comprising:
基板を液滴で処理する基板処理方法であって、
C字状の開口を形成され前記開口から気体を噴き出し可能になった治具を準備する準備工程と、
基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に前記治具を保持して前記開口から噴き出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させつつ前記開口を前記治具の相対移動する軌跡の後方に位置決めする走査工程と、
を備えることを特徴とする基板処理方法。
A substrate processing method for processing a substrate with droplets,
Preparing a jig formed with a C-shaped opening and capable of ejecting gas from the opening;
The jig is held while blowing the gas blown from the opening onto the surface of the substrate while holding the jig so as to surround the opening with droplets attached to the surface of the substrate when viewed from the direction orthogonal to the surface of the substrate. A scanning step of positioning the opening behind the relative movement path of the jig while relatively moving along the surface of the substrate;
A substrate processing method comprising:
基板を液滴で処理する基板処理方法であって、
円形の仮想線に沿って並んだ複数の開口を形成され複数の前記開口から気体を噴き出し可能になった治具を準備する準備工程と、
基板の表面の直交方向から基板を見て基板の表面に付着した液滴を複数の前記開口で囲う様に前記治具を保持して複数の前記開口から噴き出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させる走査工程と、
を備えることを特徴とする基板処理方法。
A substrate processing method for processing a substrate with droplets,
A preparation step of preparing a jig formed with a plurality of openings arranged along a circular imaginary line and capable of ejecting gas from the plurality of openings;
While holding the jig so as to surround droplets attached to the surface of the substrate when viewed from the direction orthogonal to the surface of the substrate with the plurality of openings, while blowing the gas ejected from the plurality of openings to the surface of the substrate A scanning step of relatively moving the jig along the surface of the substrate;
A substrate processing method comprising:
基板の表面に液滴を付着させる付着工程と、
を備え、
前記治具が前記開口に囲われた内側に貫通穴を形成され、
前記付着工程が前記開口を基板の表面に向けて前記治具を保持し前記開口から噴き出した気体を基板の表面に吹き付けている際に液滴を前記貫通穴を通過して基板の表面に付着させる、
ことを特徴とする請求項1乃至請求項4のうちの一つに記載の基板処理方法。
An attachment process for attaching droplets to the surface of the substrate;
With
A through hole is formed inside the jig surrounded by the opening;
When the attaching step holds the jig with the opening directed toward the surface of the substrate and the gas blown from the opening is sprayed onto the surface of the substrate, the droplet passes through the through hole and adheres to the surface of the substrate. Let
5. The substrate processing method according to claim 1, wherein:
基板に付着した液滴を回収する回収工程と、
を備え、
前記治具が前記開口に囲われた内側に貫通穴を形成され、
前記回収工程が前記開口を基板の表面に向けて前記治具を保持し前記開口から噴き出した気体を基板の表面に吹き付けている際に基板の表面に付着している液滴を前記貫通穴を通過して回収する、
ことを特徴とする請求項1乃至請求項4のうちの一つに記載の基板処理方法。
A recovery process for recovering droplets adhering to the substrate;
With
A through hole is formed inside the jig surrounded by the opening;
When the recovery step holds the jig with the opening facing the surface of the substrate and the gas blown from the opening is sprayed on the surface of the substrate, the droplets attached to the surface of the substrate are removed from the through holes. Pass through and collect,
5. The substrate processing method according to claim 1, wherein:
前記治具が前記開口の外周を形成する外周部と前記開口の内周を形成する内周部とを有し、
前記走査工程において、前記開口を基板の表面に向けたとき基板の表面と前記内周部の端部との距離が基板の表面と前記外周部の端部との距離より短い、
ことを特徴とする請求項1乃至請求項4のうちのひとつに記載の基板処理方法。
The jig has an outer peripheral part forming the outer periphery of the opening and an inner peripheral part forming the inner periphery of the opening,
In the scanning step, when the opening is directed to the surface of the substrate, the distance between the surface of the substrate and the end of the inner peripheral portion is shorter than the distance between the surface of the substrate and the end of the outer peripheral portion,
The substrate processing method according to claim 1, wherein the substrate processing method is a substrate processing method.
前記治具が前記開口の外周を形成する外周部を有し、
前記端面部が前記開口の内周を形成し、
前記走査工程において、前記開口を基板の表面に向けたとき基板の表面と前記端面との距離が基板の表面と前記外周部の端部との距離よりも短い、
ことを特徴とする請求項2に記載の基板処理方法。
The jig has an outer periphery that forms an outer periphery of the opening;
The end face portion forms the inner periphery of the opening;
In the scanning step, when the opening is directed to the surface of the substrate, the distance between the surface of the substrate and the end surface is shorter than the distance between the surface of the substrate and the end of the outer peripheral portion.
The substrate processing method according to claim 2.
前記開口を基板の表面を向けた状態で前記端面を基板の表面に接近させて前記端面を基板の表面に付着した液滴に接触させる初期工程と、
を備えることを特徴とする請求項2に記載の基板処理方法。
An initial step of bringing the end face close to the surface of the substrate with the opening facing the surface of the substrate and contacting the end face with a droplet attached to the surface of the substrate;
The substrate processing method according to claim 2, further comprising:
基板を液滴で処理する基板検査装置であって、
環状の開口を形成され前記開口から気体を噴き出し可能な治具と、
基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に前記治具を保持して前記開口から噴き出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させる走査機器と、
を備えることを特徴とする基板処理装置。
A substrate inspection apparatus for processing a substrate with droplets,
A jig formed with an annular opening and capable of ejecting gas from the opening;
The jig is held while blowing the gas blown from the opening onto the surface of the substrate while holding the jig so as to surround the opening with droplets attached to the surface of the substrate when viewed from the direction orthogonal to the surface of the substrate. A scanning device for relative movement along the surface of the substrate;
A substrate processing apparatus comprising:
基板を液滴で処理する基板処理装置であって、
端面を形成する端面部を有し前記端面の周囲を囲う環状の開口を形成され前記開口から気体を噴き出し可能な治具と、
前記端面を基板の表面に付着した液滴に接触させて基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に前記治具を保持して前記開口から噴き出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させる走査機器と、
を備えることを特徴とする基板処理装置。
A substrate processing apparatus for processing a substrate with droplets,
A jig that has an end surface portion that forms an end surface and that has an annular opening surrounding the end surface and is capable of ejecting gas from the opening;
The opening is held by holding the jig so that the end surface is brought into contact with a droplet attached to the surface of the substrate and the droplet attached to the surface of the substrate is surrounded by the opening when viewed from the direction orthogonal to the surface of the substrate. A scanning device that relatively moves the jig along the surface of the substrate while blowing the gas blown from the surface of the substrate;
A substrate processing apparatus comprising:
基板を液滴で処理する基板処理装置であって、
C字状の開口を形成され前記開口から気体を噴き出し可能な治具と、
基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に前記治具を保持して前記開口から噴き出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させつつ前記開口を前記治具の相対移動する軌跡の後方に位置決めできる走査機器と、
を備えることを特徴とする基板処理装置。
A substrate processing apparatus for processing a substrate with droplets,
A jig formed with a C-shaped opening and capable of ejecting gas from the opening;
The jig is held while blowing the gas blown from the opening onto the surface of the substrate while holding the jig so as to surround the opening with droplets attached to the surface of the substrate when viewed from the direction orthogonal to the surface of the substrate. A scanning device capable of positioning the opening behind the relative movement path of the jig while relatively moving along the surface of the substrate;
A substrate processing apparatus comprising:
基板を液滴で処理する基板検査装置であって、
円形の仮想線に沿って並んだ複数の開口を形成され複数の前記開口から気体を噴き出し可能な治具と、
基板の表面の直交方向から基板を見て基板の表面に付着した液滴を複数の前記開口で囲う様に前記治具を保持して複数の前記開口から噴き出した気体を基板の表面に吹き付けながら前記治具を基板の表面に沿って相対移動させる走査機器と、
を備えることを特徴とする基板処理装置。
A substrate inspection apparatus for processing a substrate with droplets,
A jig formed with a plurality of openings arranged along a circular imaginary line and capable of ejecting gas from the plurality of openings;
While holding the jig so as to surround droplets attached to the surface of the substrate when viewed from the direction orthogonal to the surface of the substrate with the plurality of openings, while blowing the gas ejected from the plurality of openings to the surface of the substrate A scanning device for relatively moving the jig along the surface of the substrate;
A substrate processing apparatus comprising:
前記治具が前記開口に囲われた内側に貫通穴を形成され、
前記開口を基板の表面に向けて前記治具を保持し前記開口から噴き出した気体を基板の表面に吹き付けている際に液滴を前記貫通穴を通過して基板の表面に付着させることをできる、
ことを特徴とする請求項10乃至請求項13のうちのひとつに記載の基板処理装置。
A through hole is formed inside the jig surrounded by the opening;
When holding the jig with the opening directed toward the surface of the substrate and blowing the gas ejected from the opening onto the surface of the substrate, droplets can pass through the through holes and adhere to the surface of the substrate. ,
14. The substrate processing apparatus according to claim 10, wherein the substrate processing apparatus is one of the following.
前記治具が前記開口に囲われた内側に貫通穴を形成され、
前記開口を基板の表面に向けて前記治具を保持し前記開口から噴き出した気体を基板の表面に吹き付けている際に基板の表面に付着している液滴を前記貫通穴を通過して回収することをできる、
ことを特徴とする請求項10乃至請求項13のうちのひとつに記載の基板処理装置。
A through hole is formed inside the jig surrounded by the opening;
While holding the jig with the opening facing the surface of the substrate and blowing the gas blown from the opening onto the surface of the substrate, the liquid droplets adhering to the surface of the substrate pass through the through hole and are collected. Can do,
14. The substrate processing apparatus according to claim 10, wherein the substrate processing apparatus is one of the following.
前記治具が前記開口の外周を形成する外周部と前記開口の内周を形成する内周部とを有し、
前記開口を基板の表面に向けたとき基板の表面と前記内周部の端部との距離が基板の表面と前記外周部の端部との距離より短い、
ことを特徴とする請求項10乃至請求項13のうちのひとつに記載の基板処理装置。
The jig has an outer peripheral part forming the outer periphery of the opening and an inner peripheral part forming the inner periphery of the opening,
When the opening is directed to the surface of the substrate, the distance between the surface of the substrate and the end of the inner periphery is shorter than the distance between the surface of the substrate and the end of the outer periphery,
14. The substrate processing apparatus according to claim 10, wherein the substrate processing apparatus is one of the following.
前記治具が前記開口の外周を形成する外周部を有し、
前記端面部が前記開口の内周を形成し、
前記開口を基板の表面に向けたとき基板の表面と前記端面との距離が基板の表面と前記外周部の端部との距離よりも短い、
ことを特徴とする請求項11に記載の基板処理装置。
The jig has an outer periphery that forms an outer periphery of the opening;
The end face portion forms the inner periphery of the opening;
When the opening is directed to the surface of the substrate, the distance between the surface of the substrate and the end surface is shorter than the distance between the surface of the substrate and the end of the outer peripheral portion,
The substrate processing apparatus according to claim 11.
前記走査機器が前記開口を基板の表面を向けた状態で前記端面を基板の表面に接近させて前記端面を基板の表面に付着した液滴に接触させることをできる、
を備えることを特徴とする請求項11に記載の基板処理装置。
The scanning device can bring the end face close to the surface of the substrate with the opening facing the surface of the substrate to bring the end face into contact with a droplet attached to the surface of the substrate.
The substrate processing apparatus according to claim 11, comprising:
基板に付着した液滴を保持するための液滴保持治具であって、
環状の開口を形成され前記開口から気体を噴き出し可能であり、
基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に保持された状態で前記開口から噴き出した気体を基板の表面に吹き付けできる様になった、
ことを特徴とする液滴保持治具。
A droplet holding jig for holding droplets attached to a substrate,
An annular opening is formed and gas can be ejected from the opening;
The gas ejected from the opening can be sprayed on the surface of the substrate while being held so as to surround the droplets attached to the surface of the substrate when viewed from the direction orthogonal to the surface of the substrate.
A droplet holding jig characterized by that.
基板に付着した液滴を保持するための液滴保持治具であって、
端面を形成する部分である端面部を、
備え、
前記端面の周囲を囲う環状の開口を形成され前記開口から気体を噴き出し可能であり、
前記端面を基板の表面に付着した液滴に接触させて基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に保持された状態で前記開口から噴き出した気体を基板の表面に吹き付けできる様になった、
ことを特徴とする液滴保持治具。
A droplet holding jig for holding droplets attached to a substrate,
The end face part that is the part forming the end face is
Prepared,
An annular opening surrounding the periphery of the end face is formed and gas can be ejected from the opening,
The end surface is brought into contact with a droplet attached to the surface of the substrate, and the droplet attached to the surface of the substrate is blown out from the opening in a state where the substrate is viewed from a direction orthogonal to the surface of the substrate and surrounded by the opening. Can be sprayed on the surface of the substrate,
A droplet holding jig characterized by that.
基板に付着した液滴を保持するための液滴保持治具であって、
C字状の開口を形成され前記開口から気体を噴き出し可能であり、
基板の表面の直交方向から基板を見て基板の表面に付着した液滴を前記開口で囲う様に保持された状態で前記開口から噴き出した気体を基板の表面に吹き付けできる様になった、
ことを特徴とする液滴保持治具。
A droplet holding jig for holding droplets attached to a substrate,
A C-shaped opening is formed and gas can be ejected from the opening;
The gas ejected from the opening can be sprayed on the surface of the substrate while being held so as to surround the droplets attached to the surface of the substrate when viewed from the direction orthogonal to the surface of the substrate.
A droplet holding jig characterized by that.
基板に付着した液滴を保持するための液滴保持治具であって、
円形の仮想線に沿って並んだ複数の開口を形成され複数の前記開口から気体を噴き出し可能であり、
基板の表面の直交方向から基板を見て基板の表面に付着した液滴を複数の前記開口で囲う様に保持された状態で複数の前記開口から噴き出した気体を基板の表面に吹き付けできる様になった、
ことを特徴とする液滴保持治具。
A droplet holding jig for holding droplets attached to a substrate,
A plurality of openings arranged along a circular imaginary line are formed, and gas can be ejected from the plurality of openings.
The gas blown out from the plurality of openings can be blown onto the surface of the substrate while the droplets attached to the surface of the substrate are held so as to be surrounded by the plurality of openings when viewed from the direction orthogonal to the surface of the substrate. became,
A droplet holding jig characterized by that.
前記開口に囲われた内側に貫通穴を形成され、
前記開口を基板の表面に向けて保持された状態で前記開口から噴き出した気体を基板の表面に吹き付けている際に液滴を前記貫通穴を通過して基板の表面に付着させることをできる様になっている、
ことを特徴とする請求項19乃至請求項22のうちのひとつに記載の液滴保持治具。
A through hole is formed on the inner side surrounded by the opening,
When the gas blown from the opening is sprayed on the surface of the substrate while the opening is held toward the surface of the substrate, the droplets can pass through the through holes and adhere to the surface of the substrate. It has become,
The droplet holding jig according to any one of claims 19 to 22, wherein the jig is a droplet holding jig.
前記開口に囲われた内側に貫通穴を形成され、
前記開口を基板の表面に向けて保持された状態で前記開口から噴き出した気体を基板の表面に吹き付けている際に基板の表面に付着する液滴を前記貫通穴を通過して回収できる様になっている、
ことを特徴とする請求項19乃至請求項22のうちのひとつに記載の液滴保持治具。
A through hole is formed on the inner side surrounded by the opening,
When the gas blown from the opening is sprayed onto the surface of the substrate while the opening is held toward the surface of the substrate, the droplets adhering to the surface of the substrate can be collected through the through hole. Has become,
The droplet holding jig according to any one of claims 19 to 22, wherein the jig is a droplet holding jig.
前記開口の外周を形成する外周部と前記開口の内周を形成する内周部とを有し、
前記開口を基板の表面に向けたとき基板の表面と前記内周部の端部との距離が基板の表面と前記外周部の端部との距離より短い、
ことを特徴とする請求項19乃至請求項22のうちのひとつに記載の液滴保持治具。
An outer peripheral part forming the outer periphery of the opening and an inner peripheral part forming the inner periphery of the opening;
When the opening is directed to the surface of the substrate, the distance between the surface of the substrate and the end of the inner periphery is shorter than the distance between the surface of the substrate and the end of the outer periphery,
The droplet holding jig according to any one of claims 19 to 22, wherein the jig is a droplet holding jig.
前記開口の外周を形成する外周部を有し、
前記端面部が前記開口の内周を形成し、
前記開口を基板の表面に向けたとき基板の表面と前記端面との距離が基板の表面と前記外周部の端部との距離よりも短い、
ことを特徴とする請求項20に記載の液滴保持治具。
Having an outer periphery forming an outer periphery of the opening;
The end face portion forms the inner periphery of the opening;
When the opening is directed to the surface of the substrate, the distance between the surface of the substrate and the end surface is shorter than the distance between the surface of the substrate and the end of the outer peripheral portion,
The droplet holding jig according to claim 20.
前記端面が外周から中心部に近づくにつれ僅かに凹んでいる凹形状を持ち、
前記凹形状の輪郭が液滴を基板の表面に付着させた際の液滴の自由表面の膨らみ具合である凸形状の輪郭と略一致する、
ことを特徴とする請求項20に記載の液滴保持治具。
The end face has a concave shape that is slightly recessed as it approaches the center from the outer periphery,
The concave contour substantially coincides with the convex contour which is the degree of swelling of the free surface of the droplet when the droplet is attached to the surface of the substrate.
The droplet holding jig according to claim 20.
前記端面部が端面に端面の大きさに比較して十分に小さな複数の凹凸形状を設けられる、
ことを特徴とする請求項20に記載の液滴保持治具。
The end surface portion is provided with a plurality of concave and convex shapes that are sufficiently small compared to the size of the end surface on the end surface,
The droplet holding jig according to claim 20.
JP2008198150A 2008-07-31 2008-07-31 Substrate processing method, substrate processing apparatus, and droplet holding jig Active JP5281331B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008198150A JP5281331B2 (en) 2008-07-31 2008-07-31 Substrate processing method, substrate processing apparatus, and droplet holding jig

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008198150A JP5281331B2 (en) 2008-07-31 2008-07-31 Substrate processing method, substrate processing apparatus, and droplet holding jig

Publications (3)

Publication Number Publication Date
JP2010040548A true JP2010040548A (en) 2010-02-18
JP2010040548A5 JP2010040548A5 (en) 2011-09-15
JP5281331B2 JP5281331B2 (en) 2013-09-04

Family

ID=42012824

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008198150A Active JP5281331B2 (en) 2008-07-31 2008-07-31 Substrate processing method, substrate processing apparatus, and droplet holding jig

Country Status (1)

Country Link
JP (1) JP5281331B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012009475A (en) * 2010-06-22 2012-01-12 Nas Giken:Kk Substrate treatment method and substrate treatment apparatus

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05256749A (en) * 1992-03-12 1993-10-05 Piyuaretsukusu:Kk Analysis pretreating instrument and pretreating method using instrument thereof
JPH05283498A (en) * 1991-11-12 1993-10-29 Matsushita Electric Ind Co Ltd Recovery device for impurity on surface of semiconductor substrate and usage thereof
JPH06224275A (en) * 1993-01-26 1994-08-12 Toshiba Corp Apparatus for preparation of analytical sample and its operating method
JP2007109739A (en) * 2005-10-11 2007-04-26 Canon Inc Exposure device and its control method
JP2008147577A (en) * 2006-12-13 2008-06-26 Canon Inc Exposure apparatus, and method of manufacturing device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05283498A (en) * 1991-11-12 1993-10-29 Matsushita Electric Ind Co Ltd Recovery device for impurity on surface of semiconductor substrate and usage thereof
JPH05256749A (en) * 1992-03-12 1993-10-05 Piyuaretsukusu:Kk Analysis pretreating instrument and pretreating method using instrument thereof
JPH06224275A (en) * 1993-01-26 1994-08-12 Toshiba Corp Apparatus for preparation of analytical sample and its operating method
JP2007109739A (en) * 2005-10-11 2007-04-26 Canon Inc Exposure device and its control method
JP2008147577A (en) * 2006-12-13 2008-06-26 Canon Inc Exposure apparatus, and method of manufacturing device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012009475A (en) * 2010-06-22 2012-01-12 Nas Giken:Kk Substrate treatment method and substrate treatment apparatus

Also Published As

Publication number Publication date
JP5281331B2 (en) 2013-09-04

Similar Documents

Publication Publication Date Title
JP5568201B2 (en) Substrate processing method and substrate processing apparatus
KR102336955B1 (en) Wafer processing method
TWI619190B (en) Liquid processing method, memory medium and liquid processing device
JP4486476B2 (en) Laser processing apparatus and laser processing method
US20080308727A1 (en) Sample Preparation for Micro-Analysis
KR20030038377A (en) Substrate Cleaning Apparatus and Substrate Cleaning Method
US8710464B2 (en) Specimen preparation device, and control method in specimen preparation device
JP5881166B2 (en) Substrate analysis nozzle
JP5420222B2 (en) Substrate processing equipment
JP5281331B2 (en) Substrate processing method, substrate processing apparatus, and droplet holding jig
JP4091060B2 (en) Wafer inspection processing apparatus and wafer inspection processing method
JP2010093190A (en) Substrate processing device
US11090691B2 (en) Cleaning method for cleaning frame unit
JP6964315B1 (en) Board processing equipment
JPH11330186A (en) Wafer inspecting equipment
JP2012030249A (en) Dust collector, laser beam machining device using the same and method of manufacturing solar panel
JP2004347543A (en) Evaluation method of semiconductor wafer and its evaluation device
JP6285156B2 (en) Recovery jig and board inspection device
JP4303276B2 (en) Electron beam and ion beam irradiation apparatus and sample preparation method
TW201813726A (en) Substrate processing apparatus
US20170098538A1 (en) Substrate processing apparatus
JP5865153B2 (en) Substrate processing apparatus and substrate processing method
KR101053145B1 (en) Substrate processing apparatus having a support member and the support member
JP2008021920A (en) Apparatus and method for etching semiconductor substrate
JP4365886B2 (en) Ion beam equipment

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110801

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20110801

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20121128

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20121211

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130208

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20130514

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20130524

R150 Certificate of patent or registration of utility model

Ref document number: 5281331

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250