JP2010027578A - Method of manufacturing back plate for plasma display panel - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a back plate for a PDP, capable of forming a step rib small in dispersion in a step height. <P>SOLUTION: For solving the problem, this invention provides the manufacturing method of the back plate for the plasma display panel comprising a process of preparing a back plate forming member of laminating a substrate, a pattern-shaped address electrode and a dielectric layer in this order, a process of forming a first rib material layer on the dielectric layer of the back plate forming member, a process of forming a curing material layer of using a curing material on the first rib material layer, a process of forming a stop layer for restraining grinding by blast processing by hardening the curing material layer, a process of forming a second rib material layer on the stop layer, and a process of forming the step rib by performing the blast processing by forming a blast resistant pattern on the second rib material layer. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a method of manufacturing a back plate for a plasma display panel (hereinafter, sometimes referred to as “PDP back plate”) having step ribs having different heights of vertical ribs and horizontal ribs.

  A back plate used for a plasma display panel (hereinafter sometimes referred to as “PDP”) is usually a substrate 21, a patterned address electrode 22 formed on the substrate 21, as shown in FIG. It has a dielectric layer 23 formed on the address electrode 22, a rib 24 formed on the dielectric layer 23, and a phosphor layer 25 (25R, 25G, 25B) formed between the ribs 24. . In addition, the conventional PDP back plate has a mainstream having striped ribs 24 as shown in FIG. 22A. However, in recent years, as shown in FIG. In addition, a PDP back plate having a matrix rib 26 having vertical ribs 26x and horizontal ribs 26y has been proposed.

  The PDP back plate having matrix ribs can increase the amount of phosphor per unit area as compared with the PDP back plate having striped ribs, so that the luminance can be improved. On the other hand, it has the disadvantage that the ribs formed vertically and horizontally are obstructed and difficult to exhaust. In order to solve such drawbacks, a technique related to a PDP back plate having ribs (step ribs) having different heights is known.

  For example, in Patent Document 1, a glass paste is applied to a glass substrate on which an address electrode and a dielectric layer are formed to form a first glass paste layer, and then the surface of the first glass paste layer is sandblast resistant. A pattern matching the shape of the barrier portion (lateral rib) is formed by a photo method or a screen printing method using the paste, and then a glass paste is applied to form a second glass paste layer. A method of manufacturing a PDP is disclosed in which a dry film resist is used on the surface of the glass paste layer to form a pattern that matches the shape of the main partition wall (vertical rib), and finally, sand blasting is performed.

  According to this method, the step rib can be formed by a single blasting process by providing a layer having sandblast resistance in a stripe shape inside the rib material layer. However, for example, when a layer having sandblast resistance is formed using a screen printing method, it is difficult to accurately form a sandblast resistant paste at a position corresponding to the horizontal rib, and the line width of the horizontal rib is reduced. There was a problem that it was difficult to make it uniform.

JP 2001-202876 A

  In order to solve such a problem, the present inventor has not conventionally used a layer having a sandblast resistance layer formed in a stripe shape, but a layer having a sandblast resistance layer (stop layer) formed in a solid film shape. ) Has been developed using a method of blasting, and the uniformity of the lateral rib line width has been improved. However, the step ribs obtained by such a method sometimes have large variations in the amount of steps (mainly variations in the height of the lateral ribs). As a result, there is a problem that good exhaust efficiency and luminous efficiency cannot be obtained.

  The present invention has been made in view of the above problems, and a main object of the present invention is to provide a method for manufacturing a PDP back plate capable of forming step ribs with small variations in the amount of steps.

  As a result of intensive studies by the present inventors to solve the above-mentioned problems, the cause of the large variation in the step amount is that the blast suppression material contained in the stop layer forming material penetrates into the upper and lower rib material layers, and the rib This is because a part of the material layer is difficult to be ground, and it has been found that by suppressing this penetration, the variation in the step amount can be reduced. The present invention has been made based on such knowledge.

  That is, in the present invention, a substrate, a patterned address electrode formed on the substrate, a dielectric layer formed so as to cover the address electrode, and a vertical rib formed on the dielectric layer. And a step rib having a lateral rib lower than the vertical rib, wherein the substrate, the patterned address electrode, and the dielectric layer are laminated in this order. A back plate forming member preparing step for preparing a back plate forming member, a first rib material layer forming step for forming a first rib material layer on the dielectric layer of the back plate forming member, and the first A curable material layer forming process for forming a curable material layer using a curable material on the rib material layer, and a stop layer for curing the curable material layer and suppressing grinding by blasting are formed. A stop layer forming step, a second rib material layer forming step for forming a second rib material layer on the stop layer, a blast-resistant pattern is formed on the second rib material layer, and a blast treatment is performed. And a step rib forming step for forming the step rib, thereby providing a method of manufacturing a back plate for a plasma display panel. In addition, by forming the stop layer in a solid film form without patterning, the problem that it is difficult to form the patterned stop layer does not occur, and exposure for forming the patterned stop layer A process such as development is also unnecessary.

  According to the present invention, a curable material layer is formed, and usually the curable material is cured immediately. Thereby, it can prevent that a sclerosing | hardenable material penetrate | infiltrates into a 1st rib material layer excessively. Similarly, after the curable material is cured to form the stop layer, it is possible to prevent the curable material from penetrating into the second rib material layer formed on the stop layer. That is, it is possible to suppress the penetration of the curable material (blast suppression material) into the upper and lower rib material layers, and it is possible to obtain a PDP back plate having step ribs with small step amount variation.

  In the said invention, it is preferable that the said curable material is an ultraviolet curable resin or a thermosetting resin. This is because the stop layer can be easily formed.

  In the above invention, the step rib forming step includes a vertical rib forming pattern having a function of not being ground by blasting on the second rib material layer, and the second rib material layer in the horizontal rib forming region. A blast-resistant pattern forming step for forming the blast-resistant pattern having a pattern for forming a lateral rib having a function of delaying grinding compared to grinding of the second rib material layer in a rib non-formation region, and the blast resistance It is preferable to perform a blast process from a substantially vertical direction through the pattern to form the step rib. This is because the step rib can be easily formed by a single blasting process.

  In the said invention, the said level | step difference rib formation process forms the 1st blast resistance pattern formation which forms the 1st blast resistance pattern which has the pattern for vertical rib formation, and the pattern for horizontal rib formation on the said 2nd rib material layer A step, a first blasting step of forming a step rib intermediate by performing a blasting process from a substantially vertical direction via the first blasting resistance pattern, and peeling the first blasting resistance pattern, A first blast resistant pattern peeling step for exposing the rib intermediate, and a second blast resistant pattern made of a vertical rib forming pattern having a function not ground by blasting is formed on the exposed stepped rib intermediate. The second blast resistant pattern forming step and the second blast resistant pattern are subjected to blasting from a substantially vertical direction, and the step It is preferred to have a second blasting step of forming the rib, the. This is because it is possible to form a step rib having a smaller variation in the step amount.

  In the said invention, it is preferable that a said 1st blast-resistant pattern has the said pattern for vertical rib formation and the said pattern for horizontal rib formation which have a function which is not ground by blasting. For example, when the first blast resistant pattern is formed using a photosensitive material, it can be formed by a general exposure and development process.

  In the above invention, the first blast-resistant pattern is formed by grinding the vertical rib forming pattern having a function that is not ground by blasting, and grinding the second rib material layer in the horizontal rib forming region. It is preferable that the horizontal rib forming pattern has a function of delaying the grinding of the second rib material layer. This is because side etching can be actively used to promote grinding of the lateral ribs.

  In the above invention, the step rib forming step includes forming a blast resistant pattern having a vertical rib forming pattern and a horizontal rib forming pattern on the second rib material layer, and the blast resistant pattern forming step, A blasting process is performed from a substantially vertical direction through a blast resistance pattern, a first blasting process for forming a step rib intermediate, a blasting process in a direction along the vertical rib of the step rib intermediate, and By performing a blasting process in which the angle formed between the jet direction of the blast nozzle and the planar direction of the step rib intermediate body is an angle equal to or less than a selective grinding angle at which the lateral rib of the step rib intermediate body can be selectively ground, And a second blasting process for forming the step rib. In the second blasting process, by performing the blasting process obliquely from a specific shallow angle, only the lateral ribs of the step rib intermediate body can be selectively ground, and the step ribs can be easily formed. Because it can.

  In the said invention, it is preferable that the said blast-resistant pattern has the said pattern for vertical rib formation and the pattern for horizontal rib formation which have a function which is not ground by blasting. This is because, for example, when a blast-resistant pattern is formed using a photosensitive material, it can be formed by a general exposure development process.

  In the above invention, the blast-resistant pattern is formed by grinding the vertical rib forming pattern having a function that is not ground by blasting, and grinding the second rib material layer in the horizontal rib forming region. It is preferable that the horizontal rib forming pattern has a function of delaying the grinding of the second rib material layer. This is because side etching can be actively used to promote grinding of the lateral ribs.

  In the said invention, you may have the blast-resistant pattern peeling process which peels the said blast-resistant pattern after the said 1st blasting process and before the said 2nd blasting process. Moreover, in the said invention, you may have the blast-resistant pattern peeling process which peels the said blast-resistant pattern after the said 2nd blasting process. In any case, it is possible to form step ribs with small variations in the step amount.

  In this invention, there exists an effect that the backplate for PDP which has a level | step difference rib with a small dispersion | variation in level | step difference amount can be obtained.

  Hereinafter, the manufacturing method of the backplate for PDP of this invention is demonstrated in detail.

  FIG. 1 is a perspective view for explaining an example of a method for producing a PDP back plate according to the present invention. The PDP back plate and the like shown in FIG. 1 schematically represent a part of the PDP back plate and the like. Similarly, FIGS. 4, 9, 10, 12, and 17 to 20, which will be described later, schematically represent a part of the PDP back plate and the like.

  In the method for manufacturing the PDP back plate shown in FIG. 1, first, as shown in FIG. 1A, the substrate 1, the patterned address electrode 2 formed on the substrate 1, and the address electrode 2 are covered. A back plate forming member 10 having the dielectric layer 3 formed as described above is prepared (back plate forming member preparing step). Next, as shown in FIG. 1B, a first rib material layer 4a is formed on the dielectric layer 3 of the back plate forming member 10 (first rib material layer forming step), and then FIG. As shown in c), a curable material layer 5a made of an ultraviolet curable resin (curable material) is formed in a solid film shape on the first rib material layer 4a (curable material layer forming step). Next, as shown in FIG.1 (d), the curable material layer 5a is hardened by irradiating the ultraviolet-ray 6, and the stop layer 5 which suppresses grinding by a blast process is formed (stop layer formation process).

  Next, as shown in FIG.1 (e), the 2nd rib material layer 4b is formed on the stop layer 5 (2nd rib material layer formation process). Next, as shown in FIG. 1 (f), a blast resistant pattern 7A is formed on the second rib material layer 4b, and blasting 8 is performed (step rib forming step). In addition, since there are various embodiments in the step rib forming step, description thereof will be omitted, and will be described in detail in “6. Step rib forming step” described later. Thereafter, by firing the step ribs, the rib material is melted and united to form a vitreous rib, and at the same time, the organic matter contained in the ribs is burned out, and a rib made of an inorganic substance is formed. . Since the shape is almost maintained even if the rib dimensions are changed by firing, a PDP back plate having stepped ribs 4α having vertical ribs 4x and horizontal ribs 4y as shown in FIG. 1 (g) is obtained. .

  According to the present invention, a curable material layer is formed, and usually the curable material is cured immediately. Thereby, it can prevent that a sclerosing | hardenable material penetrate | infiltrates into a 1st rib material layer excessively. Similarly, after the curable material is cured to form the stop layer, it is possible to prevent the curable material from penetrating into the second rib material layer formed on the stop layer. That is, it is possible to suppress the penetration of the curable material (blast suppression material) into the upper and lower rib material layers, and it is possible to obtain a PDP back plate having step ribs with small step amount variation. Further, according to the present invention, the curable material layer is formed in a solid film shape instead of a stripe shape. Thereby, the horizontal rib which has a uniform line | wire width can be formed.

  FIG. 2 is a schematic cross-sectional view for explaining the effect of the present invention, and corresponds to the AA cross-sectional view of FIG. However, the schematic cross-sectional view shown in FIG. 2 shows a stage before the firing process. Here, when the stop layer is formed using a blast suppressing material having no curability, the blast suppressing material penetrates into the first rib material layer and the second rib material layer, and the first rib material layer and the second rib A part of the material layer becomes difficult to be ground. In particular, when a part of the second rib material layer formed on the stop layer becomes difficult to be ground, the second rib material layer 4b is formed on the stop layer 5 of the lateral rib 4y as shown in FIG. There is a problem that a part remains. A part of this second rib material layer becomes a factor of reducing exhaust efficiency and light emission efficiency. In contrast, in the present invention, a curable material layer is formed, and usually the curable material is immediately cured to form a stop layer. Therefore, the first rib material layer and the second rib material layer are curable. Infiltration of the material can be suppressed. As a result, as shown in FIG. 2 (b), the height of the lateral rib 4y can be defined at the position of the stop layer 5, a step rib with a small variation in the step amount can be formed, and the exhaust efficiency can be increased. And it can be set as the PDP back plate excellent in luminous efficiency.

Further, as shown in FIG. 3, the PDP back plate obtained by the present invention has a line width of a region corresponding to the stop layer of the vertical rib 4 x (region B in FIG. 3) so that the first rib material layer and the second rib It tends to be larger than the line width of the region corresponding to the rib material layer. For this reason, the fluorescent substance application area of the area | region comparatively close to the front plate for PDP can be increased. As a result, the luminous efficiency is improved and the luminance of the PDP can be improved. Similarly, the luminance in the oblique direction of the plasma display can be improved by increasing the display area.
Hereinafter, the manufacturing method of the backplate for PDP of this invention is demonstrated for every process.

1. Back plate forming member preparation step First, the back plate forming member preparation step in the present invention will be described. The back plate forming member preparation step in the present invention is a step of preparing a back plate forming member in which the substrate, the patterned address electrode, and the dielectric layer are laminated in this order (see FIG. 1A). ).

  The material of the substrate used in the present invention is not particularly limited as long as it has a predetermined heat resistance, and the same material as the substrate used for a general PDP back plate should be used. Can do. Specific examples include glass and the like. Among them, high strain point glass that generates a small amount of distortion during firing of a dielectric or rib material is preferable.

  The material of the address electrode used in the present invention is not particularly limited as long as it has conductivity, and the same material as that of the address electrode used for a general PDP back plate should be used. Can do. Specific examples include metals such as Ag. The address electrode used in the present invention may be a laminate of metal thin films, and specifically includes an electrode having a three-layer metal thin film such as Cr / Cu / Cr.

  Examples of a method for forming a patterned address electrode on a substrate include a photo paste method, a printing method, a thin film method, and the like. Among these, a photo paste method is preferable. Specifically, as the photo paste method, Ag paste containing a photosensitive resin is applied to the entire surface of the substrate by a screen printing method, dried, then exposed and developed in a predetermined pattern, and finally fired. The method etc. can be mentioned. Specific examples of the printing method include a method in which an Ag paste is printed in an electrode pattern using a screen plate, dried, and then fired to obtain a desired electrode. On the other hand, as the thin film method, specifically, a Cr / Cu / Cr three-layer metal thin film is formed on the entire surface of the substrate by a sputtering method, a resist is applied to the outermost layer of the metal thin film, and then dried. Examples include a method of performing exposure and development with a predetermined pattern, etching the exposed metal thin film, and finally stripping the resist.

  The material of the dielectric layer used in the present invention is not particularly limited as long as it has a desired dielectric constant, and is the same as the material of the dielectric layer used for a general PDP back plate. Can be used.

  Examples of the method for forming the dielectric layer include a screen printing method and a slit die coating method. Furthermore, a laminating method may be used in which a film in which a dielectric layer is laminated on a base film is laminated so as to cover the address electrodes. In the present invention, after the dielectric layer is formed, drying is usually performed. However, the dielectric layer may be fired as necessary. That is, in the present invention, step ribs may be formed using a back plate forming member having a dielectric layer after firing, or using a back plate forming member having a dielectric layer before firing, Baking may be performed simultaneously with the step rib firing.

2. First Rib Material Layer Forming Step Next, the first rib material layer forming step in the present invention will be described. The first rib material layer forming step in the present invention is a step of forming the first rib material layer on the dielectric layer of the back plate forming member (see FIG. 1B).

Examples of the rib material layer forming material used for forming the first rib material layer include glass paste. Further, the glass paste is usually a glass frit having an average particle size of about 3 μm such as BiO ₂ , ZnO, B ₂ O ₃ , a filler made of an inorganic component such as TiO ₂ , Al ₂ O ₃ , and a resin for making a paste. Contains ingredients and solvent.

  The film thickness of the first rib material layer varies depending on the shape of the target step rib, and is not particularly limited. In the present invention, the film thickness of the first rib material layer is a major factor that determines the height of the lateral rib. The film thickness of the first rib material layer is, for example, preferably within a range of 5 μm to 200 μm after firing, and more preferably within a range of 20 μm to 100 μm.

  Examples of the method for forming the first rib material layer include a method in which a rib material layer forming material is applied on the dielectric layer by a slit die coating method and dried. Application may be performed by a roll coating method or the like.

3. Curable Material Layer Forming Step Next, the curable material layer forming step in the present invention will be described. The curable material layer forming step in the present invention is a step of forming a curable material layer using a curable material on the first rib material layer (see FIG. 1C). In the present invention, a solid film-like curable material layer is usually formed, and a pattern-like curable material layer (stop layer) is not formed in accordance with the shape of the lateral rib as in Patent Document 1 described above. As a method of forming the curable material layer in the present invention most simply, for example, a method of forming a curable material layer on the entire surface of the first rib material layer can be mentioned.

  In the present invention, the curable material layer is usually formed using a curable material layer forming material. The curable material layer forming material contains at least a curable material. Examples of the curable material include a curable resin. Furthermore, examples of the curable resin include an ultraviolet curable resin and a thermosetting resin, and among these, an ultraviolet curable resin is preferable. This is because it can be cured in a relatively short time by irradiating with ultraviolet rays.

The ultraviolet curable resin is not particularly limited in particular as long as it is cured by irradiation of ultraviolet rays, such as ultraviolet irradiation dose in the range of ^{50mJ / cm 2 ~500mJ / cm 2} , 30 to 180 seconds It is preferable that the resin be completely cured under the condition of irradiation time within the range of. Examples of the ultraviolet curable resin include acrylic ultraviolet curable resins and unsaturated polyester ultraviolet curable resins.

  Although the said thermosetting resin will not be specifically limited if it hardens | cures by heating, For example, the heating temperature within the range of 50 to 200 degreeC, and the heating time within the range of 1 minute to 60 minutes are called. It is preferable that the resin be completely cured under certain conditions. Examples of the thermosetting resin include epoxy-based thermosetting resins, cyanate-based thermosetting resins, phenol-based thermosetting resins, urea-based thermosetting resins, and melamine-based thermosetting resins. .

  The curable material layer forming material is not particularly limited as long as it contains at least a curable material, and may contain only a solvent-free curable material. It may contain a material and a solvent, or may contain a curable material, a glass frit, and, if necessary, a solvent.

  When the curable material layer forming material contains only a solvent-free curable material, or when the curable material layer forming material contains a curable material and a solvent, the curable material layer The lower the viscosity of the forming material, the more easily the effect of the present invention is exhibited. This is because if the viscosity is low, penetration into the first rib material layer is likely to occur, and thus penetration can be effectively suppressed by using a curable material. In the present invention, the viscosity of the curable material layer forming material is preferably within a range of 1 Pa · s to 1000 Pa · s, particularly 10 Pa · s to 100 Pa · s, at room temperature.

  On the other hand, when the curable material layer forming material contains a curable material, a glass frit, and, if necessary, a solvent, the glass frit contained in the curable material layer forming material melts during firing, The bond between the first rib material layer and the second rib material layer can be further strengthened. Furthermore, the curable material layer forming material may contain a filler made of an inorganic component for adjusting the blast rate. In addition, about the glass frit, the filler which consists of an inorganic component, etc., the material similar to what is used for the material for rib material layer formation of the 1st rib material layer mentioned above can be used. In this case, the ratio of the curable material contained in the curable material layer is usually in the range of 3% by weight to 50% by weight, and preferably in the range of 5% by weight to 20% by weight. If the ratio of the curable material is too high, the strength of the stepped rib after firing may be low, and if the ratio of the curable material is too low, sufficient blast resistance may not be exhibited. Because.

  Moreover, as a solvent used for the material for curable material layer formation, the thing similar to the solvent of the material for rib material layer formation of the 1st rib material layer mentioned above can be used, for example.

  The method for forming the curable material layer is not particularly limited as long as it can form a desired curable material layer. For example, the material for forming the curable material layer is the first rib material. The method of apply | coating to a layer and drying as needed can be mentioned. Examples of the method for applying the curable material layer forming material include a screen printing method, a die coating method, a sputtering method, and the like, and among these, the screen printing method is preferable. Moreover, when apply | coating and drying the curable material layer forming material, it is preferable that the drying time is short. This is because it is possible to prevent the curable material from penetrating into the first rib material layer. The drying time is preferably, for example, within 30 minutes, particularly within 20 minutes. Moreover, it is preferable that the film thickness of the obtained curable material layer is a film thickness which can obtain the film thickness of the stop layer mentioned later.

4). Stop Layer Formation Step Next, the stop layer formation step in the present invention will be described. The stop layer forming step in the present invention is a step of curing the curable material layer and forming a stop layer that suppresses grinding by blasting (see FIG. 1D).

  The method of curing the curable material layer varies depending on the type of the curable material used, and examples thereof include a method of irradiating with ultraviolet rays and a method of heating. Moreover, it is preferable to appropriately select various conditions for curing (ultraviolet irradiation amount, ultraviolet irradiation time, heating temperature, heating time, etc.) according to the properties of the curable material used.

  In this invention, after forming a curable material layer, it is preferable to harden a curable material layer as early as possible. This is because it is possible to prevent the curable material from penetrating into the first rib material layer. In the present invention, after forming the curable material layer (after drying in the case of drying), it is preferably cured within 30 minutes, and more preferably within 20 minutes.

The stop layer used in the present invention is not particularly limited as long as it is harder to grind than the first rib material layer and the second rib material layer. Here, the bra straight stop layer and BR _A, bras straight first ribs material layer and BR _B, bras straight second ribs material layer and BR _C. In the present invention, “blast straight” refers to the grinding depth per unit time. Further, the “blast rate ratio” in the present invention refers to the ratio of blast rate when the blasting conditions are the same. In the present invention, the blast rate ratio BR _B / BR _A between the stop layer and the first rib material layer is, for example, in the range of 1 to 100, particularly in the range of 3 to 70, particularly in the range of 5 to 40. Is preferred. This is because within the above range, it is possible to appropriately protect the lateral ribs from being cut while the rib-unformed region is cut. The blast rate ratio BR _C / BR _A between the stop layer and the second rib material layer is, for example, in the range of 0.5 to 50, particularly in the range of 1 to 30, particularly in the range of 1.5 to 20. Is preferred. The blast rate ratio BR _C / BR _B between the first rib material layer and the second rib material layer is, for example, in the range of 0.05 to 2, particularly in the range of 0.1 to 1, particularly 0.2 to 0. It is preferable to be within the range of 7. If it is within the above range, it is possible to reduce grinding of the upper portion of the vertical rib by side etching when forming the horizontal rib.

  The film thickness of the stop layer is preferably in the range of 1 μm to 50 μm after firing, in particular in the range of 1 μm to 20 μm, in particular in the range of 2 μm to 10 μm.

5). Second Rib Material Layer Forming Step Next, the second rib material layer forming step in the present invention will be described. The 2nd rib material layer formation process in this invention is a process of forming a 2nd rib material layer on the said stop layer (refer FIG.1 (e)).

  The film thickness of the second rib material layer varies depending on the shape of the target step rib, and is not particularly limited. In the present invention, the film thickness of the second rib material layer is a major factor that determines the amount of step (the difference between the height of the vertical rib and the height of the horizontal rib). The film thickness of the second rib material layer is, for example, preferably in the range of 1 μm to 100 μm after firing, particularly in the range of 10 μm to 70 μm.

  In the present invention, the sum of the film thicknesses of the second rib material layer, the stop layer, and the first rib material layer is a major factor that determines the height of the vertical rib. The sum of the thicknesses of the second rib material layer, the stop layer, and the first rib material layer is, for example, in the range of 10 μm to 400 μm after firing, and preferably in the range of 50 μm to 200 μm.

  About the rib material layer forming material used for forming the second rib material layer, the method of forming the second rib material layer, etc., the contents described in the above “2. First rib material layer forming step” Since it is the same, description here is abbreviate | omitted. In the present invention, the rib material layer forming materials of the second rib material layer and the first rib material layer may be the same or different from each other.

6). Step Rib Forming Step Next, the step rib forming step in the present invention will be described. The step rib forming step in the present invention is a step of forming the step rib by forming a blast-resistant pattern on the second rib material layer and performing blasting (see FIG. 1 (f)). .

  The step rib forming step in the present invention is not particularly limited as long as a desired step rib can be formed. Hereinafter, specific examples of the step rib forming step will be described separately for the first to third embodiments.

(1) First Embodiment First, the step rib forming process of the first embodiment will be described. In the step rib forming step of the first embodiment, the vertical rib forming pattern having a function not to be ground by blasting on the second rib material layer, and the grinding of the second rib material layer in the horizontal rib forming region A blast resistant pattern forming step for forming the blast resistant pattern having a pattern for forming a lateral rib having a function of delaying the grinding of the second rib material layer in the rib non-forming region, and the blast resistant pattern And a blasting process for performing the blasting process from a substantially vertical direction to form the step ribs.

  FIG. 4 is a perspective view for explaining a step rib forming process of the first embodiment. In the step rib forming step shown in FIG. 4, first, as shown in FIG. 4A, the substrate 1, the patterned address electrode 2, the dielectric layer 3, the first rib material layer 4a, the stop layer 5, A member in which the two-rib material layer 4b is laminated in this order is used. This member is obtained through the above-described steps shown in FIGS. 1 (a) to 1 (e).

  Next, as shown in FIG.4 (b), the blast-resistant layer 7 which consists of dry film resist (DFR) is formed on the 2nd rib material layer 4b, and it becomes a pattern as shown in FIG.4 (c). Thus, exposure and development are performed to form a blast resistant pattern 7A having a vertical rib forming pattern 7x and a horizontal rib forming pattern 7y (blast resistant pattern forming step). In the first embodiment, the vertical rib forming pattern 7x has a function that is not ground by blasting. On the other hand, the lateral rib forming pattern 7y is obtained by grinding the second rib material layer in the lateral rib forming region 16 (region where the lateral rib is formed by the blasting process), and the rib non-forming region 17 (vertical rib forming pattern 7x). Further, the horizontal rib forming pattern 7y is not formed, and has a function of delaying the grinding of the second rib material layer in a region where the rib is not formed by blasting. The lateral rib forming region, the rib non-forming region, and the function will be described later with reference to FIG. Further, in FIG. 4C, by making the line width of the horizontal rib forming pattern 7y sufficiently smaller than the line width of the vertical rib forming pattern 7x, the horizontal rib forming region and the rib non-forming region are separated. Thus, a difference occurs in the degree of progress of grinding, and as a result, stepped ribs can be obtained by one grinding.

  Next, as shown in FIG. 4D, a blast process 8 is performed from a substantially vertical direction via the blast resistant pattern 7A (blast process step). Thereby, as shown in FIG. 4E, the step rib is formed in the state in which the blast resistant pattern 7A is formed. Next, as shown in FIG. 4F, the blast resistant pattern 7A is peeled off. Furthermore, by firing the step ribs, the rib material is melted and united to form a vitreous rib, and at the same time, the organic matter contained in the ribs is burned out, and a rib substantially made of an inorganic material is formed. . Since the shape is substantially maintained even if the rib dimensions are changed by firing, a back plate for PDP having stepped ribs 4α having vertical ribs 4x and horizontal ribs 4y as shown in FIG. 4G is obtained. .

  According to the first embodiment, a stop layer is formed on the first rib material layer, and the stop layer and a blast-resistant pattern having a specific function are used in combination, so that it can be easily performed by a single blast treatment. Step ribs can be formed. Conventionally, there has been a problem that it is difficult to accurately form a stripe-shaped stop layer. On the other hand, in the first embodiment, a major feature is that a step layer is formed by punching a part (rib non-formation region) of the stop material layer without patterning inside the rib material layer. There is. Thereby, as will be described later, it is possible to obtain stepped ribs having uniform horizontal rib heights, and to actively utilize side etching.

  In the first embodiment, since the stop layer can provide a temporary pool for grinding the rib material layer, the stop layer, a specific vertical rib forming pattern, and a specific horizontal rib forming pattern are provided. By combining, it is possible to obtain a stepped rib having a uniform horizontal rib height. The reason for this phenomenon will be described in detail with reference to FIG.

  FIG. 5 is a schematic cross-sectional view illustrating an example of a step rib forming process in the first embodiment. In FIG. 5, the region where the vertical rib is formed from the left (vertical rib forming region A), the region where the horizontal rib is formed (horizontal rib forming region B), the vertical rib forming pattern, and the horizontal rib forming pattern Are not formed, and a region where ribs are not formed by blasting (rib non-forming region C) is schematically shown.

  In the first embodiment, side etching can be positively utilized by forming a stop layer on the first rib material layer. By using this side etch, step ribs can be formed by a single blasting process even when a DFR that is not ground by a normal blasting process is formed in a matrix as shown in FIG. .

  As shown in FIG. 5A, a vertical rib forming pattern 7x is formed in the vertical rib forming region A. As shown in FIG. Here, it is assumed that the vertical rib forming pattern 7x is a pattern formed from DFR. On the other hand, in the lateral rib forming region B, a lateral rib forming pattern 7y is formed. Here, it is assumed that the horizontal rib forming pattern 7y is a pattern formed from DFR. That is, the vertical rib formation pattern 7x and the horizontal rib formation pattern 7y are formed by forming DFR in a matrix. The line width of the horizontal rib forming pattern 7y is sufficiently smaller than the line width of the vertical rib forming pattern 7x.

  As the blasting process proceeds, as shown in FIG. 5B, in the rib non-forming region C, the grinding of the second rib material layer 4b is completed, and the stop layer 5 is exposed. On the other hand, the vertical rib forming area A and the horizontal rib forming area B are not ground because the DFR pattern is formed.

  When the blasting process is further advanced, grinding of the stop layer 5 is started in the rib non-forming region C as shown in FIG. When the grinding of the stop layer 5 is started, the grinding of the stop layer 5 proceeds in the rib non-formation region C, and at the same time, the abrasive reflected from the stop layer 5 becomes the first in the longitudinal rib formation region A and the lateral rib formation region B. A side etch 9 for grinding the two-rib material layer 4b occurs. Here, as described above, the line width of the horizontal rib forming pattern 7y is sufficiently smaller than the line width of the vertical rib forming pattern 7x. Therefore, as shown in FIG. 5D, the second rib material layer 4b is removed while the horizontal rib forming pattern 7y remains in the horizontal rib forming region B. Since the DFR is formed in a matrix as described above, the horizontal rib forming pattern 7y is held by the vertical rib forming pattern 7x even after the second rib material layer 4b is removed. And remain in place. On the other hand, in the vertical rib formation region A, the second rib material layer 4b is somewhat ground and thinned, but the rib material layer 4b remains.

  This side etch phenomenon is noticeably caused by the presence of a stop layer that is harder to grind than the rib material layer. Further, when a stripe-like stop layer is formed inside the rib material layer as in the prior art, such a side etch is unlikely to occur because there is no stop layer in the rib non-formation region.

  When the blasting process is further advanced, as shown in FIG. 5E, the first rib material layer 4a is completely ground in the rib non-forming region C, and the stop layer 5 is almost ground in the lateral rib forming region B. It will be in a state that has not been done. On the other hand, the vertical rib forming area A is not ground because of the vertical rib forming pattern 7x. Finally, by separating the vertical rib forming pattern 7x in the vertical rib forming region A and the horizontal rib forming pattern 7y in the horizontal rib forming region B, a step rib is obtained.

Thus, by forming the stop layer on the first rib material layer, side etching can be actively utilized. As a result, as shown in FIG. Even when formed in a shape, the step rib can be formed by a single blasting process.
Hereinafter, the first embodiment of the step rib forming step will be described in detail.

(I) Blast-resistant pattern forming step The blast-resistant pattern forming step in the first embodiment is a vertical rib-forming pattern having a function not ground by blasting on the second rib material layer, and horizontal rib formation. Forming a blast resistant pattern having a pattern for forming a lateral rib having a function of delaying grinding of the second rib material layer in the region as compared with grinding of the second rib material layer in the rib non-forming region. (See FIG. 4 (c)).

(A) Vertical Rib Forming Pattern The vertical rib forming pattern in the first embodiment has a function that is not ground by blasting. When the vertical rib forming pattern is formed, the second rib material layer and the like located under the pattern are not ground in principle.

  The material for forming the vertical ribs is not particularly limited as long as a pattern that is not ground by blasting can be obtained. Especially, it is preferable that the pattern for vertical rib formation is a pattern formed with a photosensitive resist. This is because a desired pattern can be formed with high accuracy. The photosensitive resist may be a dry film resist or a liquid resist, but is preferably a dry film resist. This is because the dry film resist is usually hardly ground by blasting. Furthermore, since the dry film resist does not penetrate into the second rib material layer, the pattern can be formed with higher accuracy.

  The film thickness of the pattern for forming vertical ribs is not particularly limited as long as a pattern that is not ground by blasting can be formed, but is usually in the range of 10 μm to 100 μm. Further, the line width of the vertical rib forming pattern is a major factor that defines the top width of the vertical rib. The line width is, for example, preferably in the range of 10 μm to 200 μm, more preferably in the range of 30 μm to 150 μm. The interval between adjacent stripes varies depending on the use of the PDP back plate and the like, but is preferably in the range of 50 μm to 500 μm, and more preferably in the range of 100 μm to 300 μm.

  Examples of the method for forming the vertical rib forming pattern include a method in which a photosensitive resist layer is formed on the entire surface of the second rib material layer, and exposure development is performed.

(B) Horizontal rib forming pattern In the first embodiment, the horizontal rib forming pattern is obtained by grinding the second rib material layer in the horizontal rib forming region more than grinding the second rib material layer in the rib non-forming region. It has a function to delay. Specifically, as shown in FIG. 5 described above, this function is performed at a timing later than the timing of the grinding when the second rib material layer 4b in the rib non-forming region C is ground by the blast treatment 8. The function which grinds the 2nd rib material layer 4b of the horizontal rib formation area B is said. In the first embodiment, since the horizontal rib forming pattern has such a function, a difference occurs in the degree of progress of grinding between the horizontal rib forming region and the rib non-forming region. Stepped ribs can be obtained by one grinding.

  The material of the horizontal rib forming pattern is not particularly limited as long as the horizontal rib forming pattern having the above-described function can be obtained. Especially, it is preferable that the pattern for horizontal rib formation is a pattern formed with a photosensitive resist. This is because a desired pattern can be formed with high accuracy. The photosensitive resist may be a dry film resist or a liquid resist, but is preferably a dry film resist. This is because the dry film resist does not penetrate into the second rib material layer, so that the pattern can be formed with higher accuracy.

  In particular, in the first embodiment, the vertical rib forming pattern and the horizontal rib forming pattern are preferably patterns formed from a dry film resist. This is because a blast-resistant pattern can be formed by one exposure development. In this case, the dry film resist constituting the pattern for forming the lateral rib is usually hardly ground by blasting. On the other hand, as described above, the lateral rib forming pattern has a function of delaying the grinding of the second rib material layer in the lateral rib forming region as compared with the grinding of the second rib material layer in the rib non-forming region. In order to exhibit this function, in the first embodiment, it is preferable to appropriately devise the shape and the like of the lateral rib forming pattern.

  In the first embodiment, as shown in FIG. 6A, it is preferable that the line width of the horizontal rib forming pattern 7y be sufficiently smaller than the line width of the vertical rib forming pattern 7x. As shown in FIG. 5 described above, by actively utilizing side etching, the grinding of the second rib material layer in the lateral rib forming region is more effective than the grinding of the second rib material layer in the rib non-forming region. This is because it can be delayed. In the first embodiment, as shown in FIG. 6B, the lateral rib forming pattern 7y is preferably a pattern formed by dots of a dry film resist. This is because the effect of side etching can be further enhanced as compared with the pattern of FIG. Similarly, when the lateral rib forming pattern is a pattern as shown in FIGS. 6C to 6F, the effect of side etching can be further enhanced as compared with the pattern of FIG. it can.

  Here, the horizontal rib forming pattern 7y and the vertical rib forming pattern 7x shown in FIGS. 6A to 6F have a substantially lattice shape as a whole, and FIG. In 6 (f), the shape of the horizontal rib forming pattern 7y is different. The horizontal rib forming pattern 7y shown in FIG. 6A is a linear pattern and has a line width smaller than that of the vertical rib forming pattern 7x. Moreover, the pattern 7y for horizontal rib formation shown by FIG.6 (b) is a dot pattern. In the first embodiment, the shape of the dot-like pattern for forming the horizontal rib delays the grinding of the second rib material layer in the horizontal rib forming region than the grinding of the second rib material layer in the rib non-forming region. There is no particular limitation as long as the function can be exhibited. FIG. 6B shows an example in which the dot-shaped horizontal rib forming pattern 7y is formed linearly as a whole. Moreover, the pattern 7y for horizontal rib formation shown by FIG.6 (c) is a pattern which has a discontinuous part where a pattern interrupts and a line width reduces toward a discontinuous part. By reducing the line width, a pattern having no corners can be obtained, and the adhesion stability during blasting can be improved. In the first embodiment, the rate at which the line width decreases is not particularly limited. As shown in FIG. 6 (c), the line width is decreased so that the hypotenuse of the protrusion-shaped portion toward the discontinuous portion becomes a straight line. Alternatively, it may be reduced so that the hypotenuse of the protrusion-shaped portion toward the discontinuous portion becomes a curve.

  Further, the horizontal rib forming pattern 7y shown in FIG. 6D is a linear pattern having discontinuous portions where the pattern is interrupted. Further, the horizontal rib forming pattern 7y shown in FIG. 6E has a fine line portion between adjacent vertical rib forming patterns, and the line width decreases toward the fine line portion. By reducing the line width, a pattern having no corners can be obtained, and the adhesion stability during blasting can be improved. The rate at which the line width decreases is not particularly limited, and as shown in FIG. 6 (e), it may be decreased so that the hypotenuse of the connecting portion toward the thin line portion becomes a straight line, and the connection toward the thin line portion. You may reduce so that the hypotenuse of a part may turn into a curve. Further, the horizontal rib forming pattern 7y shown in FIG. 6F has an island portion formed between adjacent vertical rib forming patterns and a connecting portion for connecting the island portions. In the first embodiment, the shape of the island portion is not particularly limited, and can take any shape.

In the first embodiment, the line width of the vertical rib forming pattern is W _X, and the finest line width of the horizontal rib forming pattern is W _Y. In the first embodiment, W _Y / W _X is preferably in the range of, for example, 0 to 1.0. Here, the finest line width W _Y of the pattern for forming the horizontal rib may be zero. Specifically, when the horizontal rib forming pattern is a pattern as shown in FIGS. 6C and 6D, the most detailed line width W _Y of the horizontal rib forming pattern is 0. become.

On the other hand, when the lateral rib forming pattern is continuously formed, W _Y / W _X is in the range of 0.05 to 1.0, particularly in the range of 0.1 to 0.5, particularly 0. It is preferably within the range of 15 to 0.4. Specifically, the horizontal rib forming pattern is above in FIG. 6 (a), when a pattern such as shown in FIG. 6 (b), FIG. 6 (e) and FIG. 6 (f) is, W _Y It is preferable that / W _X is in the above range. As shown in FIG. 6B, even if the horizontal rib forming pattern 7y has a dot shape, it is assumed here that the horizontal rib forming pattern is formed continuously, is not considered a space between (code W _a is the line width of the transverse rib forming pattern in Figure 6 (b)). Further, if the transverse rib forming pattern are continuously formed, the line width W _Y in the horizontal rib forming pattern, for example in the range of 2Myuemu～150myuemu, preferably in the range of inter alia 8Myuemu～80myuemu. On the other hand, regardless of whether the horizontal rib forming pattern is continuous or discontinuous, the line width W _X of the vertical rib forming pattern is, for example, in the range of 20 μm to 150 μm, and in particular in the range of 40 μm to 100 μm. preferable.

  On the other hand, in the first embodiment, the pattern for forming the lateral rib may be a pattern that can be ground by blasting and is harder to grind than the second rib material layer. This is because the grinding of the second rib material layer in the lateral rib forming region can be delayed than the grinding of the second rib material layer in the rib non-forming region. FIG. 7 is a schematic plan view showing an example of a blast resistance pattern having such a lateral rib forming pattern. The blast resistance pattern shown in FIG. 7 is a vertical rib forming pattern 7x having a function that is not ground by blasting, and horizontal rib formation that can be ground by blasting and is harder to grind than the second rib material layer. And a pattern for use 7y.

  As an example of the lateral rib forming pattern that can be ground by blasting and is harder to grind than the second rib material layer, it is formed on the second rib material layer 4b as shown in FIG. And those containing a blast suppressing material. Examples of the blast suppressing material include a resin (blast suppressing resin). Furthermore, examples of the blast suppressing resin include cellulose resin, acrylic resin, thermosetting resin, and photosensitive resin. Further, the lateral rib forming pattern may be composed only of a blast suppressing material, or may be composed of a glass frit and a blast suppressing material. In the latter case, a filler made of an inorganic component may be contained in addition to the glass frit and the blast suppressing material.

  As another example of the lateral rib forming pattern that can be ground by blasting and harder to grind than the second rib material layer, as shown in FIG. 8B, the second rib material layer 4b is impregnated. What is formed in such a way can be mentioned. That is, in the first embodiment, the lateral rib forming pattern may be a pattern formed by an impregnated blast mask. This is because it is possible to cause a difference in the degree of progress of grinding between the lateral rib forming region and the rib non-forming region.

  Even when the pattern for forming the horizontal ribs is a pattern that can be ground by blasting and is harder to grind than the second rib material layer, as in the pattern shown in FIG. Side etching may be actively utilized by devising the shape of the rib forming pattern. In other words, the line width of the horizontal rib forming pattern may be made sufficiently smaller than the line width of the vertical rib forming pattern, or the horizontal rib forming pattern may be formed in a dot shape.

(Ii) Blasting process Next, the blasting process in the first embodiment will be described. The blasting process in the first embodiment is a process of performing the blasting process from a substantially vertical direction through the blast-resistant pattern to form the step ribs (see FIG. 4D). The “substantially vertical direction” in the present invention refers to a direction that can be regarded as a substantially vertical direction. Specifically, the angle formed with the vertically downward direction is preferably 45 ° or less, more preferably 10 ° or less, and further preferably 5 ° or less.

  The blasting process in the first embodiment is not particularly limited as long as it is a blasting process in which the rib non-forming region and the lateral rib forming region are ground and the vertical rib forming region is not ground. The material of the abrasive used for the blasting is not particularly limited as long as it can grind the second rib material layer and the like. For example, diamond, alumina, silicon carbide, calcium carbonate, glass beads And stainless steel. The particle size of the abrasive is preferably, for example, in the range of 3 μm to 50 μm, and more preferably in the range of 10 μm to 30 μm.

The blast pressure of the grinding material, for example in the range of ^{0.1kgf / cm 2 ~3.0kgf / cm 2} , preferably in the range Of these the ^{0.3kgf / cm 2 ~1.0kgf / cm 2} . The amount of spray of the abrasive is, for example, preferably in the range of 100 g / min to 6000 g / min, and more preferably in the range of 1000 g / min to 5000 g / min.

(Iii) Other steps In the first embodiment, usually, after the blast treatment step, a step of peeling the blast resistant pattern and a firing step of firing the step ribs are performed. The conditions such as the peeling method, the firing temperature, the firing time, and the firing method are the same as the conditions for a general PDP back plate, and thus the description thereof is omitted here.

(2) Second Embodiment Next, the step rib forming process of the second embodiment will be described. The step rib forming step of the second embodiment is a first blast resistant pattern forming step of forming a first blast resistant pattern having a vertical rib forming pattern and a horizontal rib forming pattern on the second rib material layer. And a first blasting step for forming a step rib intermediate by performing a blasting process from a substantially vertical direction through the first blast resistance pattern, and peeling the first blast resistance pattern to form the step rib. A first blast resistant pattern peeling step for exposing the intermediate, and a second blast resistant pattern comprising a vertical rib forming pattern having a function not ground by blasting on the exposed stepped rib intermediate. Blasting process is carried out from a substantially vertical direction through the two blast resistant pattern forming step and the second blast resistant pattern to form the step rib. A second blasting step of, and has a.

  The step rib forming step of the second embodiment can be further roughly divided into two forms according to the nature of the first blast resistance pattern. Hereinafter, the second embodiment will be described separately for the first embodiment and the second embodiment.

(I) 1st form of 2nd embodiment The 1st form of 2nd embodiment has the pattern for vertical rib formation and the pattern for horizontal rib formation in which a 1st blast-resistant pattern has a function which is not ground by a blast process. Is.

  FIG. 9 is a perspective view for explaining the step rib forming step of the first embodiment of the second embodiment. In the step rib forming step shown in FIG. 9, first, as shown in FIG. 9A, the substrate 1, the patterned address electrode 2, the dielectric layer 3, the first rib material layer 4a, the stop layer 5, A member in which the two-rib material layer 4b is laminated in this order is used. This member is obtained through the above-described steps shown in FIGS. 1 (a) to 1 (e).

  Next, as shown in FIG. 9 (b), the first blast resistance comprising the dry rib resist (DFR) and having the vertical rib forming pattern 7x and the horizontal rib forming pattern 7y on the second rib material layer 4b. A pattern 7A is formed (first blast resistant pattern forming step). In the first blast resistance pattern forming step, the vertical rib forming pattern 7x and the horizontal rib forming pattern 7y have a function that is not ground by blasting.

  Next, as shown in FIG. 9C, a blast process 8 is performed from a substantially vertical direction via the first blast resistance pattern 7A (first blast process step). Next, as shown in FIG. 9D, the step rib intermediate body 11 is exposed by peeling the first blast resistant pattern 7A (first blast resistant pattern peeling step). In the first embodiment of the second embodiment, a matrix-shaped step rib intermediate body 11 in which the heights of the vertical ribs and the horizontal ribs are usually equal is obtained.

  Next, as shown in FIG. 9 (e), a second blast resistance pattern 7A comprising a vertical rib forming pattern 7x having a function not ground by blasting is formed on the step rib intermediate body 11 (second resistance resistance). Blasting pattern forming process). Next, as shown in FIG. 9F, the blast process 8 is performed from the substantially vertical direction via the second blast resistance pattern 7A (second blast process step). Next, as shown in FIG. 9G, the step ribs are exposed by peeling the second blast resistance pattern 7A. Furthermore, by firing the step ribs, the rib material is melted and united to form a vitreous rib, and at the same time, the organic matter contained in the ribs is burned out, and a rib substantially made of an inorganic material is formed. . Since the shape is substantially maintained even if the rib dimensions change due to firing, a PDP back plate having stepped ribs 4α having vertical ribs 4x and horizontal ribs 4y as shown in FIG. 9 (h) is obtained. .

  In addition, about the material of a blast-resistant pattern in the 1st form of a 2nd embodiment, and various conditions in a blast process, since it is the same as that of the 1st embodiment mentioned above, description here is abbreviate | omitted.

(Ii) Second form of the second embodiment The second form of the second embodiment is a pattern in which the first blast-resistant pattern has a function of not being ground by blasting, and a pattern for forming a horizontal rib. And a lateral rib forming pattern having a function of delaying the grinding of the second rib material layer as compared with the grinding of the second rib material layer in the rib non-formation region.

  FIG. 10 is a perspective view for explaining the step rib forming step of the second embodiment of the second embodiment. In the step rib forming step shown in FIG. 10, first, as shown in FIG. 10A, the substrate 1, the patterned address electrode 2, the dielectric layer 3, the first rib material layer 4a, the stop layer 5, the first layer A member in which the two-rib material layer 4b is laminated in this order is used. This member is obtained through the above-described steps shown in FIGS. 1 (a) to 1 (e).

  Next, as shown in FIG. 10B, the first blast resistance having a pattern 7x for forming a vertical rib and a pattern 7y for forming a horizontal rib is formed of a dry film resist (DFR) on the second rib material layer 4b. A pattern 7A is formed (first blast resistant pattern forming step). In the first blast resistant pattern forming step, the vertical rib forming pattern 7x has a function that is not ground by blasting. On the other hand, the lateral rib forming pattern 7y has a function of delaying the grinding of the second rib material layer in the lateral rib forming region as compared with the grinding of the second rib material layer in the rib non-forming region. The blast resistance pattern in FIG. 10 (b) is the same as the blast resistance pattern in FIG. 6 (e). The function of the horizontal rib forming pattern 7y is also the same as that described in the first embodiment.

  Next, as shown in FIG. 10C, the blast process 8 is performed from a substantially vertical direction via the first blast resistance pattern 7A (first blast process step). Next, as shown in FIG.10 (d), the level | step difference rib intermediate body 11 is exposed by peeling the 1st blast resistance pattern 7A (1st blast resistance pattern peeling process). In the second mode of the second embodiment, the step rib generally includes a vertical rib and a horizontal rib that is lower than the vertical rib and the second rib material layer 4b remains on the stop layer 5. Intermediate 11 is obtained.

  Here, as the first blast resistance pattern used in the second embodiment of the second embodiment, the same blast resistance pattern as used in the first embodiment can be used. As described in the first embodiment, in the present invention, it is sufficiently possible to form the step ribs by a single blasting process (see FIG. 4D). However, depending on the blasting conditions and the like, a lateral rib in which the second rib material layer remains on the stop layer may be formed. Specifically, as shown in FIG. 11, in the lateral rib 11 y of the step rib intermediate body 11, the second rib material layer 4 b remains largely at the end of the lateral rib and remains small at the center portion of the lateral rib. In some cases, the variation in the height of the lateral rib 11y becomes large. Even in such a case, in the second embodiment of the second embodiment, a back plate for PDP with a further small variation in the height of the lateral ribs can be obtained by performing the second blasting process. Since each process shown in Drawing 10 (e)-Drawing 10 (h) is the same as each process shown in Drawing 9 (e)-Drawing 9 (h) of the 1st form of the 2nd embodiment mentioned above. The description here is omitted.

  In addition, since the blast-resistant pattern material and the various conditions in the blasting process in the second embodiment of the second embodiment are the same as those in the first embodiment described above, description thereof is omitted here.

(3) Third Embodiment Next, the step rib forming process of the third embodiment will be described. The step rib forming step of the third embodiment includes a blast resistant pattern forming step of forming a blast resistant pattern having a vertical rib forming pattern and a horizontal rib forming pattern on the second rib material layer, and A blasting process is performed from a substantially vertical direction through a blasting pattern to form a step rib intermediate body, and a blasting process is performed in a direction along the vertical rib of the step rib intermediate body. By performing a blasting process in which the angle formed by the nozzle injection direction and the planar direction of the step rib intermediate body is an angle equal to or less than a selective grinding angle at which the lateral rib of the step rib intermediate body can be selectively ground, A second blasting process for forming step ribs.

  The step rib forming step of the third embodiment can be further divided into two groups of a first form and a second form, and a third form and a fourth form, depending on the nature of the blast resistance pattern. . In addition, the first form and the second form have different timings for peeling off the blast resistant pattern. The same applies to the third embodiment and the fourth embodiment. Hereinafter, the third embodiment will be described by dividing it into a first form to a fourth form.

(I) 1st form of 3rd embodiment 1st form of 3rd embodiment has a pattern for vertical rib formation and a pattern for horizontal rib formation in which a blast-resistant pattern has a function which is not ground by blast processing. is there. Furthermore, the 1st form of a 3rd embodiment has a blast-resistant pattern peeling process which peels a blast-resistant pattern after a 1st blasting process and before a 2nd blasting process.

  FIG. 12 is a perspective view for explaining the step rib forming step of the first embodiment of the third embodiment. In the step rib forming step shown in FIG. 12, first, as shown in FIG. 12A, the substrate 1, the patterned address electrode 2, the dielectric layer 3, the first rib material layer 4a, the stop layer 5, the first layer A member in which the two-rib material layer 4b is laminated in this order is used. This member is obtained through the above-described steps shown in FIGS. 1 (a) to 1 (e).

  Next, as shown in FIG. 12B, a blast resistant pattern 7A made of dry film resist (DFR) and having a vertical rib forming pattern 7x and a horizontal rib forming pattern 7y on the second rib material layer 4b. (Blast-resistant pattern forming step). In the blast resistance pattern forming step, the vertical rib forming pattern 7x and the horizontal rib forming pattern 7y have a function that is not ground by blasting.

  Next, as shown in FIG. 12C, a blast process 8 is performed from a substantially vertical direction via the blast resistant pattern 7A (first blast process step). Next, as shown in FIG. 12D, the step rib intermediate body 11 is exposed by peeling the blast resistant pattern 7A (blast resistant pattern peeling step). In the first embodiment of the second embodiment, a matrix-shaped step rib intermediate body 11 in which the heights of the vertical ribs and the horizontal ribs are usually equal is obtained.

  Next, as shown in FIG. 12 (e), blasting 12 is performed in the direction along the longitudinal ribs 11 x of the step rib intermediate body 11, and the blast nozzle injection direction and the planar direction of the step rib intermediate body 11 are formed. A blasting process 12 is performed in which the angle is equal to or smaller than a specific angle. Thereby, a step rib as shown in FIG. Furthermore, by firing the step ribs, the rib material is melted and united to form a vitreous rib, and at the same time, the organic matter contained in the ribs is burned out, and a rib substantially made of an inorganic material is formed. . Since the shape is substantially maintained even if the rib dimensions are changed by firing, a PDP back plate having stepped ribs 4α having vertical ribs 4x and horizontal ribs 4y as shown in FIG. 12 (g) is obtained. .

  According to the first embodiment of the third embodiment, only the lateral rib of the step rib intermediate body is selectively ground by performing the blast treatment obliquely from a specific shallow angle during the second blast treatment step. The step rib can be easily formed.

  FIG. 13 is a schematic cross-sectional view illustrating the injection direction of the blast nozzle. As shown in FIG. 13, in the first embodiment of the third embodiment, the angle θ formed by the injection direction of the blast nozzle 13 of the blasting device and the planar direction of the step rib intermediate body 11 is a specific angle (selective grinding). Blast processing is performed so that the angle is equal to or less than the angle. In addition, the injection direction of a blast nozzle means the center direction, when a grinding material is injected with a certain width. Moreover, in the 1st form of a 3rd embodiment, a blast process is performed in the direction in alignment with the vertical rib 11x of the level | step difference rib intermediate body 11. FIG.

  When such a blasting process is performed, as shown in FIG. 14A, the tip of the lateral rib 11 y of the step rib intermediate body 11 (the portion corresponding to the second rib material layer 4 b) is gradually moved by the abrasive 14. To be ground. Since the stop layer 5 of the horizontal rib 11y is not usually ground by the abrasive 14, when the blasting process is performed for a predetermined time, the horizontal rib 11y having a uniform height is obtained as shown in FIG. 14B. .

  In the first embodiment of the third embodiment, the vertical ribs of the step rib intermediate body are not ground, but only the horizontal ribs of the step rib intermediate body are selectively ground. It is presumed that the incident angle is different and the density per unit area where the abrasive material collides with the rib is different. The abrasive material collides almost vertically with the lateral rib portion of the step rib intermediate body, whereas the abrasive material collides with the vertical rib portion of the step rib intermediate body at an extremely shallow angle with respect to the surface. Among the velocity components, the component perpendicular to the substrate is 1/10 or less, and the collision energy applied to the rib material is extremely small.

  In addition, when a rib material is inserted in a place where the abrasive material of the same density is flying in the airflow, the number of abrasive materials that collide per unit area of the rib material varies depending on the angle. Compared to the case where the substrate is set up vertically in the airflow, if the angle between the airflow direction and the substrate is tilted to 5 °, the collision probability of the abrasive is reduced to 1/10 or less.

  Further, since the surface of the vertical rib is flat, it is considered that the water surface effect acts on the abrasive that enters the vertical rib and the velocity in the direction perpendicular to the substrate is further reduced. The water surface effect is a phenomenon in which a large lift is generated when a flying object passes near the water surface (ground). As a specific example of the water surface effect, for example, a phenomenon in which a large lift is generated in an airplane flying in the vicinity of the sea surface can be cited.

The second blasting process in the first embodiment of the third embodiment is considered to utilize these effects. In other words, by performing blasting from a relatively shallow angle, the vertical ribs parallel to the abrasive flow direction make the incident angle of the abrasive material shallower and the impact energy is greatly reduced. The number of collisions per area is significantly reduced, and further, a large lift is generated in the abrasive material due to the influence of the water surface effect, which makes it difficult to cause grinding. On the other hand, with respect to the lateral rib perpendicular to the abrasive flow direction, even if a large lift is generated on the abrasive due to the effect of the water surface effect, grinding occurs because the abrasive directly collides from the vertical direction. Result. Thereby, anisotropic blasting can be performed in the first embodiment of the third embodiment.
Hereinafter, the first embodiment of the third embodiment of the step rib forming step will be described in detail.

(A) Blast-resistant pattern forming step and first blasting step The blast-resistant pattern forming step and the first blasting step in the first embodiment of the third embodiment are the first and second embodiments described above. Since it is the same as the content described in the aspect, description here is abbreviate | omitted.

(B) Second blasting process The second blasting process in the first embodiment of the third embodiment performs blasting in a direction along the vertical rib of the stepped rib intermediate body, and the blast nozzle injection direction and the above A step of forming the step rib by performing a blasting process in which an angle formed with a planar direction of the step rib intermediate body is an angle equal to or less than a selective grinding angle at which the lateral rib of the step rib intermediate body can be selectively ground. (See FIG. 12E).

Here, “selective grinding angle” means that when blasting is performed in a direction along the longitudinal rib of the stepped rib intermediate body, the longitudinal rib direction parallel to the abrasive flow is not ground, and the abrasive flow The transverse rib direction perpendicular to the angle means the angle to be ground. The selective grinding angle varies depending on the pitch and size of the step rib intermediate used, the type of abrasive and the blasting conditions. The “selective grinding angle” can be calculated by the following test. That is, a step rib intermediate body and a grinding material that are actually used are prepared, and further, a circular nozzle having an opening diameter of about 5 to 10 mm is prepared as a blast nozzle, and the abrasive material in the discharge port of the blast nozzle and the step rib intermediate body is prepared. A test is performed in which the distance to the contact point is about 100 to 200 mm, the blast pressure is about 1.0 kgf / cm ^2, and blasting is performed to the extent that a desired level difference is obtained. Tests with different blast nozzle angles were performed several times, and the resulting stepped ribs were observed with a scanning electron microscope (SEM) to evaluate the state in which the vertical ribs were ground. decide.

  The selective grinding angle varies depending on the type of the step rib intermediate and the abrasive used, and the blasting conditions, but is specifically 45 ° or less, particularly 10 ° or less, particularly 5 ° or less. It is preferable. The selective grinding angle may be 0 °. This is because even when the abrasive is jetted in parallel to the planar direction of the step rib intermediate body, only the lateral ribs can be selectively ground due to the influence of airflow, gravity and the like.

  In the first embodiment of the third embodiment, the angle formed between the jet direction of the blast nozzle and the plane direction of the step rib intermediate body is a specific angle along the longitudinal rib of the step rib intermediate body. Perform blasting. The blasting method is not particularly limited as long as it can form a desired stepped rib, but among them, a method capable of grinding in a large area is preferable. This is because the step rib can be formed efficiently.

  Examples of a method capable of grinding a large area include a method using a slit nozzle and a method using a plurality of circular nozzles arranged side by side. In the case of a method using a slit nozzle, specifically, as shown in FIG. 15A, a large area can be ground by using a nozzle 13 having a slit-shaped discharge port. On the other hand, in the case of using a method in which a plurality of circular nozzles are arranged side by side, specifically, as shown in FIG. 15B, a large area can be ground by using a plurality of nozzles 13 having a circular discharge port shape. Become.

  In the first embodiment of the third embodiment, the blasting process is performed in a direction along the vertical rib of the step rib intermediate body. The first embodiment of the third embodiment may be a method of performing blasting in one direction along the vertical rib of the step rib intermediate body, and blasting in both directions along the vertical rib of the step rib intermediate body. Although the method of performing a process may be sufficient, Especially, it is preferable that it is a method of performing a blast process to the both directions of the direction along the vertical rib of a level | step difference rib intermediate body. This is because grinding can be performed in a uniform shape. As a method for performing blasting in both directions along the vertical rib of the step rib intermediate body, for example, as shown in FIG. 16A, the discharge ports in the direction along the vertical rib 11x of the step rib intermediate body. The blast nozzles 13 are arranged so as to face each other, and the blasting process is sequentially performed so as not to disturb the mutual injection, and in the direction along the vertical ribs 11x of the step rib intermediate body as shown in FIG. A method of performing blasting by arranging the blast nozzle 13 so that the discharge ports are opposite to each other can be exemplified. Further, the method of performing the blasting process may be a method of performing the blasting process at the same time by arranging the blast nozzles disposed so as to face each other so as not to interfere with the mutual injection.

  In the first embodiment of the third embodiment, it is preferable to perform the blasting process while moving at least one of the blast nozzle and the step rib intermediate body. This is because uniform step ribs can be obtained. The moving direction is not particularly limited as long as it can be blasted in the direction along the vertical rib of the step rib intermediate body. In particular, for example, as shown in FIG. 17A, at least one of the blast nozzle 13 and the member 15 having the step rib intermediate body moves horizontally in a direction perpendicular to the direction along the vertical rib 11x of the step rib intermediate body. As shown in FIG. 17B, it is preferable that at least one of the blast nozzle 13 and the member 15 having the step rib intermediate body move horizontally in a direction parallel to the direction along the vertical rib 11x of the step rib intermediate body. . Alternatively, as shown in FIG. 17C, the member 15 having the step rib intermediate body may be sent in one direction (direction A) at a low speed while the blast nozzle 13 is swung at a high speed. If the amount of the member 15 having the step rib intermediate body sent during one reciprocation of the blast nozzle is made sufficiently smaller than the injection width of the blast nozzle, the nozzle will pass through the same location in the step rib intermediate body a plurality of times. This is because the blasting process can be performed so that the areas to be blasted always overlap, and the grinding can be performed in a more uniform shape. The blast nozzle 13 and the member 15 having the step rib intermediate body may be arranged to form 90 degrees with those illustrated in FIG. 17C, and feed blasting may be performed as described above.

(Ii) Second form of the third embodiment The second form of the third embodiment is one in which the blast-resistant pattern has a pattern for forming vertical ribs and a pattern for forming horizontal ribs having a function that is not ground by blasting. is there. Furthermore, the 2nd form of a 3rd embodiment has a blast-resistant pattern peeling process which peels a blast-resistant pattern after a 2nd blasting process.

  That is, the second embodiment of the third embodiment is the same as the first embodiment of the third embodiment except that the timing of the blast resistant pattern peeling step is different. Specifically, as shown in FIG. 18 (e), a blasting process 12 (second blasting process) is performed without peeling off the blast resistant pattern 7A, and as shown in FIG. The third embodiment is the same as the first embodiment except that the blast resistant pattern 7A is peeled off after the blasting process. According to the second embodiment of the third embodiment, it is possible to form step ribs with a smaller variation in step amount.

(Iii) The third form of the third embodiment The third form of the third embodiment is a pattern in which the blast-resistant pattern has a function of not being ground by blasting, and the second pattern in the lateral rib forming region. And a rib forming pattern having a function of delaying the grinding of the rib material layer more than the grinding of the second rib material layer in the rib non-formation region. Furthermore, the 3rd form of a 3rd embodiment has a blast-resistant pattern peeling process which peels a blast-resistant pattern after a 1st blasting process and before a 2nd blasting process.

  That is, the third embodiment of the third embodiment is the blast resistance pattern, except that the blast resistance pattern described in the first embodiment described above or the second embodiment of the second embodiment described above is used. This is the same as the first embodiment of the third embodiment. Specifically, as shown in FIG. 19 (b), the third embodiment is the same as the first embodiment except that a predetermined blast resistance pattern 7A is formed. According to the third embodiment of the third embodiment, it is possible to form a step rib with a smaller variation in the step amount.

(Iv) Fourth embodiment of the third embodiment The fourth embodiment of the third embodiment is a second embodiment in which the blast-resistant pattern has a function for preventing the blast-resistant pattern from being ground by the blasting process, and the second rib formation region. And a rib forming pattern having a function of delaying the grinding of the rib material layer more than the grinding of the second rib material layer in the rib non-formation region. Furthermore, the 4th form of a 3rd embodiment has a blast-resistant pattern peeling process which peels a blast-resistant pattern after a 2nd blasting process.

  That is, the fourth embodiment of the third embodiment is the same as the third embodiment of the third embodiment except that the timing of the blast resistant pattern peeling step is different. Specifically, as shown in FIG. 20 (e), the blasting process 12 (second blasting process) is performed without peeling off the blast resistant pattern 7A, and as shown in FIG. The third embodiment is the same as the third embodiment except that the blast resistant pattern 7A is peeled off after the blasting process. According to the fourth embodiment of the third embodiment, it is possible to form a step rib having a smaller variation in the step amount.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the technical idea described in the claims of the present invention has substantially the same configuration and exhibits the same function and effect regardless of the case. It is included in the technical scope of the invention.

  Hereinafter, the present invention will be described more specifically with reference to examples. In the examples, “parts” represents parts by weight, and “%” represents% by weight.

[Production example]
(1) Production of back plate forming member Photosensitive silver paste (DuPont Co., Ltd.) as an address electrode on a high strain point glass (“PD200” manufactured by Asahi Glass Co., Ltd.) having a size of 2080 mm × 1210 mm and a thickness of 1.8 mm. ) DC206) was solid-printed using a screen printing plate (“T250 mesh” manufactured by Tokyo Process Service Co., Ltd.) having an emulsion thickness of 5 μm and dried at 80 ° C. for 30 minutes. Next, it was exposed with a photomask having a pattern with an opening width of 50 μm and spray-developed with a 0.3% aqueous sodium carbonate solution at a development pressure of 1.5 kgf / cm ² to form a silver electrode pattern. Next, baking was performed at 600 ° C. to form an address electrode having a film thickness of 3 μm, a line width of 50 μm, and a pitch of 200 μm on the glass substrate.
Next, PLS-3232 (manufactured by Nippon Electric Glass) is printed on the address electrodes as a dielectric layer by screen printing, dried and fired to form a dielectric layer having a thickness of 10 μm, and a member for forming a back plate Was made.

(2) Preparation of first rib material layer First, a first rib material layer paste (first rib material layer forming material) having the following composition was prepared.
Glass frit (ZnO / SiO ₂ / B ₂ O ₃ / alkali metal oxide, thermal expansion coefficient 80 × 10 ⁻⁷ / ° C., softening point 550 ° C., average particle size 3 μm) 60 parts by weight Alumina (Iwatani Chemical Industry) RA-40 manufactured by Co., Ltd.) 20 parts by weight Ethylcellulose (Etocel STD-100FP manufactured by Dow Chemical Company) 2 parts by weight Terpineol 9 parts by weight Butyl carbitol acetate 9 parts by weight

  Next, the first rib material layer forming material was coated on the dielectric layer with a die coater and dried to prepare a first rib material layer having a thickness of 102 μm.

(3) Preparation of curable material layer and stop layer First, a paste for a curable material layer (a material for forming a curable material layer) containing an acrylate monomer, a photopolymerization initiator, terpineol and methyl ethyl ketone was prepared.

Next, the curable material layer forming material was coated on the first rib material layer by a screen printing method, and dried at 120 ° C. for 15 minutes. Furthermore, immediately after the drying was completed, an exposure apparatus (ultra-high pressure mercury lamp) was used to irradiate ultraviolet rays under the conditions of 300 mJ / cm ² and 1.2 minutes to produce a stop layer having a thickness of 7 μm.

(4) Production of second rib material layer First, a second rib material layer paste (second rib material layer forming material) having the following composition was produced.
Glass frit (ZnO / SiO ₂ / B ₂ O ₃ / alkali metal oxide, thermal expansion coefficient 80 × 10 ⁻⁷ / ° C., softening point 550 ° C., average particle size 3 μm) 60 parts by weight Alumina (Iwatani Chemical Industry) RA-40 manufactured by Co., Ltd.) 20 parts by weight Ethyl cellulose (Etocel STD-100FP manufactured by Dow Chemical Co., Ltd.) 3 parts by weight Terpineol 8.5 parts by weight Butyl carbitol acetate 8.5 parts by weight

  Next, the second rib material layer forming material was coated on the stop layer with a die coater and dried to prepare a second rib material layer. At this time, the sum of the film thicknesses of the second rib material layer, the stop layer, and the first rib material layer was 140 μm.

  Thus, a member was obtained in which the substrate, the patterned address electrode, the dielectric layer, the first rib material layer, the stop layer, and the second rib material layer were laminated in this order.

[Example 1]
In this example, a PDP back plate having step ribs was produced based on the method shown in FIG. 4 described above.

First, the member obtained in the production example is heated to 100 ° C., a dry film resist (manufactured by Tokyo Ohka Kogyo Co., Ltd., NB-235) is laminated on the second rib material layer of the member, and exposed through a photomask. went. The exposure condition was an irradiation amount of 250 mJ / cm ² . Next, spray development was performed using a 0.5% anhydrous sodium carbonate aqueous solution at a liquid temperature of 30 ° C. As a result, a pattern for forming vertical ribs (line width 85 μm, pitch 200 μm) and a pattern for forming horizontal ribs (line width 15 μm, pitch 600 μm) were produced.

  Next, blasting was performed from the vertical direction through a blast resistant pattern by sandblasting using S-9 # 1200 (a stainless steel abrasive material manufactured by Fuji Seisakusho) as an abrasive material. Thereafter, the blast-resistant pattern was peeled off using a 2.0% aqueous solution of sodium hydroxide at a liquid temperature of 30 ° C. Thereafter, firing was carried out at a peak temperature of 553 ° C., a holding time of 13 minutes, and a total firing time of 2 hours to obtain a PDP back plate having stepped ribs. In addition, Table 1 shows variations in the level difference of the level difference ribs before firing. When measuring the level difference, an “automatic 2 / 3-dimensional coordinate measuring machine (Socia Co., Ltd.)” was used to measure the laser height. Specifically, the vertical rib height is measured at a position between two adjacent horizontal ribs, and one of the two adjacent vertical ribs (one of which is a vertical rib whose vertical rib height is measured). The height of the horizontal rib was measured at a position where the height of the horizontal rib was measured, and the height of the step was calculated by subtracting the height of the horizontal rib from the height of the vertical rib. The amount of the step was measured at 45 points (a plurality of regions where the step ribs were formed on one substrate, and 45 points were measured for each surface).

[Example 2]
In this example, a PDP back plate having a step rib was produced based on the method shown in FIG. 9 described above.

First, the member obtained in the production example is heated to 100 ° C., a dry film resist (manufactured by Tokyo Ohka Kogyo Co., Ltd., NB-235) is laminated on the second rib material layer of the member, and exposed through a photomask. went. The exposure condition was an irradiation amount of 250 mJ / cm ² . Next, spray development was performed using a 0.5% anhydrous sodium carbonate aqueous solution at a liquid temperature of 30 ° C. This produced the 1st blast resistance pattern of the pattern for vertical rib formation (line width 85 micrometers, pitch 200 micrometers) and the pattern for horizontal rib formation (line width 15 micrometers, pitch 600 micrometers).

  Next, blasting was performed from the vertical direction through the first blast resistance pattern by sandblasting using S-9 # 1200 (a stainless steel abrasive material manufactured by Fuji Seisakusho) as an abrasive material. Thereafter, the first blast resistant pattern was peeled off at a liquid temperature of 30 ° C. using a 2.0% aqueous solution of sodium hydroxide. Thereby, a step rib intermediate (matrix rib) was obtained.

  Next, the 2nd blast resistance pattern which consists of a pattern for vertical rib formation was produced by the same method along the vertical rib of a level | step difference rib intermediate body.

  Next, blasting was performed from the vertical direction through the second blast resistance pattern by sandblasting using S-9 # 1200 (a stainless steel abrasive material manufactured by Fuji Seisakusho) as an abrasive material. Thereafter, the second blast resistant pattern was peeled off at a liquid temperature of 30 ° C. using a 2.0% aqueous solution of sodium hydroxide. Thereafter, the second blast resistant pattern was peeled off at a liquid temperature of 30 ° C. using a 2.0% aqueous solution of sodium hydroxide. Thereafter, firing was carried out at a peak temperature of 553 ° C., a holding time of 13 minutes, and a total firing time of 2 hours to obtain a PDP back plate having stepped ribs. In addition, Table 1 shows variations in the level difference of the level difference ribs before firing. The method for calculating the step amount is the same as that in the first embodiment.

[Example 3]
In this example, a PDP back plate having step ribs was produced based on the method shown in FIG.

First, the member obtained in the production example is heated to 100 ° C., a dry film resist (manufactured by Tokyo Ohka Kogyo Co., Ltd., NB-235) is laminated on the second rib material layer of the member, and exposed through a photomask. went. The exposure condition was an irradiation amount of 250 mJ / cm ² . Next, spray development was performed using a 0.5% anhydrous sodium carbonate aqueous solution at a liquid temperature of 30 ° C. As a result, a pattern for forming vertical ribs (line width 85 μm, pitch 200 μm) and a pattern for forming horizontal ribs (line width 15 μm, pitch 600 μm) were produced.

  Next, blasting was performed from the vertical direction through a blast resistant pattern by sandblasting using S-9 # 1200 (a stainless steel abrasive material manufactured by Fuji Seisakusho) as an abrasive material. Thereafter, the blast-resistant pattern was peeled off using a 2.0% aqueous solution of sodium hydroxide at a liquid temperature of 30 ° C. Thereby, a step rib intermediate (matrix rib) was obtained.

Next, blasting is performed from an oblique direction along the vertical ribs of the step rib intermediate body by sandblasting using S-9 # 1200 (a stainless steel abrasive material manufactured by Fuji Seisakusho) as a grinding material through a blast-resistant pattern. went. The blasting device uses a blast nozzle fixed to the tip of a robot arm, and performs blasting from an oblique direction by controlling the robot so that the spraying angle from the nozzle and the distance between the nozzle and the substrate are constant. As the nozzle, a round nozzle having a diameter of φ8 mm was used, the direction between the substrate and the abrasive injection was set to 30 °, and the distance between the nozzle tip and the processing point of the rib was set to 150 mm. By using a grinding material with an average particle diameter of 20 μm of the step rib intermediate body, setting the injection pressure to 0.5 kgf / cm ² , moving the nozzle back and forth in the direction along the vertical rib, and moving the nozzle in the direction along the horizontal rib Also, the substrate was moved at a sufficiently slow speed for grinding.

  Thereafter, firing was carried out at a peak temperature of 553 ° C., a holding time of 13 minutes, and a total firing time of 2 hours to obtain a PDP back plate having stepped ribs. In addition, Table 1 shows variations in the level difference of the level difference ribs before firing. The method for calculating the step amount is the same as that in the first embodiment.

[Example 4]
In this example, a PDP back plate having step ribs was produced based on the method shown in FIG.

First, the member obtained in the production example is heated to 100 ° C., a dry film resist (manufactured by Tokyo Ohka Kogyo Co., Ltd., NB-235) is laminated on the second rib material layer of the member, and exposed through a photomask. went. The exposure condition was an irradiation amount of 250 mJ / cm ² . Next, spray development was performed using a 0.5% anhydrous sodium carbonate aqueous solution at a liquid temperature of 30 ° C. This produced a blast-resistant pattern of vertical rib forming pattern (line width 85 μm, pitch 200 μm) and horizontal rib forming pattern (thickest part line width 75 μm, most detailed line width 11 μm, pitch 600 μm).

  Next, blasting was performed from the vertical direction through a blast resistant pattern by sandblasting using S-9 # 1200 (a stainless steel abrasive material manufactured by Fuji Seisakusho) as an abrasive material. Thereafter, the blast-resistant pattern was peeled off using a 2.0% aqueous solution of sodium hydroxide at a liquid temperature of 30 ° C. This obtained the level | step difference rib intermediate body.

Next, blasting is performed from an oblique direction along the vertical rib of the step rib intermediate body by sandblasting using S-9 # 1200 (a stainless steel abrasive material manufactured by Fuji Seisakusho) as a grinding material through a blast-resistant pattern. went. The blasting device uses a blast nozzle fixed to the tip of a robot arm, and performs blasting from an oblique direction by controlling the robot so that the spraying angle from the nozzle and the distance between the nozzle and the substrate are constant. As the nozzle, a round nozzle having a diameter of φ8 mm was used, the direction between the substrate and the abrasive injection was set to 30 °, and the distance between the nozzle tip and the processing point of the rib was set to 150 mm. Using an abrasive with an average particle diameter of 20 μm, setting the injection pressure to 0.5 kgf / cm ² , moving the nozzle back and forth in the direction along the vertical rib of the step rib intermediate body, moving the nozzle in the direction along the horizontal rib Also, the substrate was moved at a sufficiently slow speed for grinding.

  Thereafter, firing was carried out at a peak temperature of 553 ° C., a holding time of 13 minutes, and a total firing time of 2 hours to obtain a PDP back plate having stepped ribs. In addition, Table 1 shows variations in the level difference of the level difference ribs before firing. The method for calculating the step amount is the same as that in the first embodiment.

[Example 5]
In this example, a PDP back plate having step ribs was produced based on the method shown in FIG. Specifically, a PDP back plate having step ribs was produced in the same manner as in Example 4 except that the blast-resistant pattern was peeled off after the second blast treatment step. In addition, Table 1 shows variations in the level difference of the level difference ribs before firing. The method for calculating the step amount is the same as that in the first embodiment.

[Comparative Example 1]
Example 1 except that a paste for forming a stop layer (a material for forming a stop layer) having the following composition not containing a curable material was used instead of the paste for a curable material layer (a material for forming a curable material layer). A PDP back plate having step ribs was produced in the same manner as described above.
Glass frit (ZnO / SiO ₂ / B ₂ O ₃ / alkali metal oxide, thermal expansion coefficient 80 × 10 ⁻⁷ / ° C., softening point 550 ° C., average particle size 3 μm) 60 parts by weight Alumina (Iwatani Chemical Industry) RA-40 manufactured by Co., Ltd.) 15 parts by weight Ethyl cellulose (Etocel STD-100FP manufactured by Dow Chemical Co., Ltd.) 9 parts by weight Terpineol 8 parts by weight Butyl carbitol acetate 8 parts by weight Step ribs before firing Table 1 shows the variation in the step amount.

  As is clear from Table 1, it was confirmed that the variation in the step ribs obtained in Examples 1 to 5 was significantly smaller than the fluctuation of the step ribs obtained in Comparative Example 1. . This is considered to be because the curable material was cured in a short period of time, thereby preventing the curable material from excessively penetrating into the first rib material layer and the second rib material layer.

It is a perspective view explaining an example of the manufacturing method of the backplate for PDP of this invention. It is a schematic sectional drawing explaining the effect of this invention. It is a schematic sectional drawing explaining the backplate for PDP obtained by this invention. It is a perspective view explaining the level | step difference rib formation process of a 1st embodiment. It is a schematic sectional drawing explaining an example of the formation process of the level | step difference rib in a 1st embodiment. It is a schematic plan view which illustrates the blast resistance pattern used for the first embodiment. It is a schematic plan view which illustrates the blast resistance pattern used for the first embodiment. It is a schematic sectional drawing which illustrates the blast resistance pattern used for a 1st embodiment. It is a perspective view explaining the level | step difference rib formation process of the 1st form of a 2nd embodiment. It is a perspective view explaining the level | step difference rib formation process of the 2nd form of a 2nd embodiment. It is a schematic sectional drawing explaining the level | step difference rib intermediate body in the 2nd form of a 2nd embodiment. It is a perspective view explaining the level | step difference rib formation process of the 1st form of a 3rd embodiment. It is a schematic sectional drawing explaining the 2nd blast process in the 1st form of a 3rd embodiment. It is a schematic sectional drawing explaining the 2nd blast process in the 1st form of a 3rd embodiment. It is a perspective view explaining the blast nozzle used for the 1st form of a 3rd embodiment. It is a schematic sectional drawing explaining the 2nd blast process in the 1st form of a 3rd embodiment. It is a perspective view explaining the 2nd blast processing in the 1st form of a 3rd embodiment. It is a perspective view explaining the level | step difference rib formation process of the 2nd form of a 3rd embodiment. It is a perspective view explaining the level | step difference rib formation process of the 3rd form of a 3rd embodiment. It is a perspective view explaining the level | step difference rib formation process of the 4th form of a 3rd embodiment. It is a schematic sectional drawing which illustrates the back plate for conventional PDP. It is a perspective view which illustrates the back plate for conventional PDP.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Board | substrate 2 ... Address electrode 3 ... Dielectric layer 4a ... 1st rib material layer 4b ... 2nd rib material layer 4x ... Vertical rib 4y ... Horizontal rib 4 (alpha) ... Step rib 5a ... Hardening material layer 5 ... Stop layer 6 ... Ultraviolet rays 7 ... Blast resistant layer 7x ... Vertical rib forming pattern 7y ... Horizontal rib forming pattern 7A ... Blast resistant pattern 8 ... Blast treatment 9 ... Side etch 10 ... Back plate forming member 11 ... Step rib intermediate body 11x ... Step rib intermediate body longitudinal rib 11y ... Step rib intermediate body lateral rib 12 ... Blasting (from oblique direction)

Claims (11)

A substrate, a patterned address electrode formed on the substrate, a dielectric layer formed so as to cover the address electrode, and formed on the dielectric layer, and lower than the vertical rib and the vertical rib A method of manufacturing a back plate for a plasma display panel having a step rib having a lateral rib,
A back plate forming member preparing step of preparing a back plate forming member in which the substrate, the patterned address electrode and the dielectric layer are laminated in this order;
A first rib material layer forming step of forming a first rib material layer on the dielectric layer of the back plate forming member;
A curable material layer forming step of forming a curable material layer using a curable material on the first rib material layer;
A stop layer forming step of curing the curable material layer and forming a stop layer for suppressing grinding by blasting;
A second rib material layer forming step of forming a second rib material layer on the stop layer;
A step rib forming step of forming the step rib by forming a blast-resistant pattern on the second rib material layer and performing a blast treatment;
A method for manufacturing a back plate for a plasma display panel.   The method for manufacturing a back plate for a plasma display panel according to claim 1, wherein the curable material is an ultraviolet curable resin or a thermosetting resin. The step rib forming step includes
On the second rib material layer, the vertical rib forming pattern having a function that is not ground by blasting, and the grinding of the second rib material layer in the horizontal rib forming region are performed in the second rib forming region. A blast resistant pattern forming step of forming the blast resistant pattern having a pattern for forming a lateral rib having a function of delaying the grinding of the rib material layer; and
A blasting process for performing a blasting process from a substantially vertical direction through the blast-resistant pattern and forming the step ribs;
The method for manufacturing a back plate for a plasma display panel according to claim 1, wherein: The step rib forming step includes
On the second rib material layer, a first blast resistant pattern forming step of forming a first blast resistant pattern having a vertical rib forming pattern and a horizontal rib forming pattern;
A first blasting step of performing a blasting process from a substantially vertical direction through the first blasting-resistant pattern to form a step rib intermediate;
A first blast resistant pattern peeling step for peeling the first blast resistant pattern and exposing the stepped rib intermediate;
A second blast resistance pattern forming step of forming a second blast resistance pattern comprising a longitudinal rib forming pattern having a function not ground by blasting on the exposed stepped rib intermediate;
A second blasting step of performing a blasting process from a substantially vertical direction through the second blast-resistant pattern and forming the stepped ribs;
The method for manufacturing a back plate for a plasma display panel according to claim 1, wherein:   The back plate for a plasma display panel according to claim 4, wherein the first blast-resistant pattern has the vertical rib forming pattern and the horizontal rib forming pattern having a function of not being ground by blasting. Production method.   The first rib blasting pattern is formed by grinding the second rib material layer in the horizontal rib forming region and the second rib forming layer in the rib non-forming region. The method for manufacturing a back plate for a plasma display panel according to claim 4, further comprising: a pattern for forming the horizontal ribs having a function of delaying the grinding of the rib material layer. The step rib forming step includes
A blast resistant pattern forming step of forming a blast resistant pattern having a vertical rib forming pattern and a horizontal rib forming pattern on the second rib material layer;
A first blasting step of performing a blasting process from a substantially vertical direction through the blast-resistant pattern to form a step rib intermediate;
Blasting is performed in a direction along the longitudinal rib of the step rib intermediate body, and the angle formed by the blast nozzle injection direction and the planar direction of the step rib intermediate body selectively selects the lateral rib of the step rib intermediate body. A second blasting process for forming the step ribs by performing a blasting process at an angle equal to or less than a selective grinding angle that can be ground to
The method for manufacturing a back plate for a plasma display panel according to claim 1, wherein:   8. The method of manufacturing a back plate for a plasma display panel according to claim 7, wherein the blast resistant pattern has the vertical rib forming pattern and the horizontal rib forming pattern having a function of not being ground by blasting. .   The vertical rib forming pattern having the function that the blast resistant pattern is not ground by blasting, and the grinding of the second rib material layer in the lateral rib forming region, the second rib material in the rib non-forming region The method for manufacturing a back plate for a plasma display panel according to claim 7, further comprising: a horizontal rib forming pattern having a function of delaying the layer grinding.   10. The method according to any one of claims 7 to 9, further comprising a blast-resistant pattern peeling step for peeling off the blast-resistant pattern after the first blasting step and before the second blasting step. The manufacturing method of the back plate for plasma display panels as described in the said claim.   The plasma display panel according to any one of claims 7 to 9, further comprising a blast-resistant pattern peeling step for peeling off the blast-resistant pattern after the second blasting step. Method for manufacturing a back plate.

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