JP2010020255A5 - - Google Patents
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- Publication number
- JP2010020255A5 JP2010020255A5 JP2008183200A JP2008183200A JP2010020255A5 JP 2010020255 A5 JP2010020255 A5 JP 2010020255A5 JP 2008183200 A JP2008183200 A JP 2008183200A JP 2008183200 A JP2008183200 A JP 2008183200A JP 2010020255 A5 JP2010020255 A5 JP 2010020255A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- surface treatment
- moisture
- treated
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 9
- 238000004381 surface treatment Methods 0.000 claims 8
- 239000003795 chemical substances by application Substances 0.000 claims 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 2
- 239000006087 Silane Coupling Agent Substances 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000005755 formation reaction Methods 0.000 claims 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008183200A JP5157701B2 (ja) | 2008-07-14 | 2008-07-14 | 表面処理方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008183200A JP5157701B2 (ja) | 2008-07-14 | 2008-07-14 | 表面処理方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2010020255A JP2010020255A (ja) | 2010-01-28 |
JP2010020255A5 true JP2010020255A5 (de) | 2011-06-02 |
JP5157701B2 JP5157701B2 (ja) | 2013-03-06 |
Family
ID=41705188
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008183200A Active JP5157701B2 (ja) | 2008-07-14 | 2008-07-14 | 表面処理方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5157701B2 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010024484A (ja) * | 2008-07-17 | 2010-02-04 | Seiko Epson Corp | 表面処理装置および表面処理方法 |
KR102224835B1 (ko) * | 2021-01-06 | 2021-03-08 | (주)하이비젼시스템 | 결함 검사 분야에 적용 가능한 광학 프리즘 및 이를 이용한 암시야 조명계 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62251720A (ja) * | 1986-04-25 | 1987-11-02 | Toshiba Corp | 液晶素子の製造方法 |
JPH04345126A (ja) * | 1991-05-22 | 1992-12-01 | Fuji Photo Film Co Ltd | 液晶表示素子 |
JP2007025529A (ja) * | 2005-07-21 | 2007-02-01 | Seiko Epson Corp | 液晶装置及びその製造方法、並びに電子機器 |
JP2007206535A (ja) * | 2006-02-03 | 2007-08-16 | Seiko Epson Corp | 液晶装置の製造方法、液晶装置及び電子機器 |
JP4789704B2 (ja) * | 2006-06-07 | 2011-10-12 | シチズンファインテックミヨタ株式会社 | 液晶パネルの製造方法 |
JP2008071938A (ja) * | 2006-09-14 | 2008-03-27 | Seiko Epson Corp | 成膜装置 |
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2008
- 2008-07-14 JP JP2008183200A patent/JP5157701B2/ja active Active
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