JP2010013733A - Diffuser gravity support - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method and apparatus for supporting a gas distribution plate in a process chamber. <P>SOLUTION: The apparatus for supporting the gas distribution plate 20 in a chamber 100 comprises: a chamber; a backing plate 28 in the chamber having a center area and at least one opening present at the center area; a gas distribution plate in the chamber having a center area; and at least one support member 15 present within the at least one opening in the backing plate and engaged with the center area of the gas distribution plate, wherein the gas distribution plate is suspended by at least one support member. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

Background of the Invention

Field of Invention
[0001] Embodiments of the present invention generally relate to supplying one or more gases to a plasma chamber. More particularly, the present invention relates to supporting a gas distribution plate within a chamber.

Explanation of related technology
[0002] Flat panel displays use an active matrix consisting of insulators, conductors, and electronic devices such as thin film transistors (TFTs) for various devices such as television monitors, personal digital assistants (PDAs), and computer screens. Produces the flat screen used. In general, these flat panel displays are made from two thin panels of glass, polymeric material, or other suitable substrate material. A layer consisting of a matrix of liquid crystal material or metal contacts, a semiconductor active layer, and a dielectric layer are deposited by a series of steps and sandwiched between two thin panels that are connected to each other. A large area substrate is formed having at least one flat panel display bonded and mounted thereon. At least one of the panels includes a conductive film coupled to a power source that changes the orientation of the liquid crystal material and creates a patterned display on the screen surface.

  [0003] These processes typically require a large area substrate to be subjected to a series of multiple process steps that deposit the active matrix material onto the substrate. Chemical vapor deposition (CVD) and plasma enhanced chemical vapor deposition (PECVD) are one of the well-known processes for this deposition. These known processes bring the large area substrate to a gas distribution plate during deposition to bring the temperature of the large area substrate to about 300 ° C. to about 400 ° C. or higher and to ensure uniformity of the deposited layer. Or it needs to be kept in place with respect to the diffuser. The diffuser generally defines an area that is equal to or greater than the area of the substrate. If the diffuser bends for any reason during deposition, the process may not result in uniform deposition, resulting in an unusable flat panel display.

  [0004] Flat panel displays have dramatically increased in size over the last few years due to the market acceptance of this technology. Previous generation large area substrates had dimensions of about 500 mm × 650 mm and increased in size to about 1800 mm × about 2200 mm or more. This increase in size has resulted in an increase in the size of the diffuser to allow complete processing of the substrate. The larger size of the diffuser has led to new challenges for designing a diffuser that prevents sagging when exposed to high temperatures during deposition.

  [0005] A diffuser is generally a plate that is supported above a large area substrate at intervals, with a plurality of apertures adapted to disperse one or more process gases, Specifically, it has approximately the same area as the substrate to be processed. Diffusers are usually made from aluminum, are resistant to CVD or PECVD processes, are exposed to the effects of expansion and contraction, and are usually supported along the edge so that the spacing between the diffuser and the substrate is Controlled. However, this edge support scheme does not support the central portion at all, which tends to sag or creep over time due to gravity and is exacerbated by high process temperatures during the CVD or PECVD process. To do.

  [0006] The present invention relates generally to a method and apparatus for supporting a gas distribution plate or diffuser in a plasma chamber. In one embodiment, the diffuser is suspended by at least one support member located inside or centrally, which support member is coupled to the gas distribution plate and the chamber wall. The present invention is resistant to the high temperatures generated during plasma enhanced chemical vapor deposition and to prevent the diffuser from being deformed by forces generated by gravity and heat acting on the diffuser or by pressure generated by the pressure. It is. At least one support member is coupled between the diffuser and the backing plate in the chamber to adjust the planar orientation of the diffuser. The at least one support member is configured to adjust the diffuser profile before or after evacuating the chamber. In another embodiment, the at least one support member helps to adjust the diffuser profile by adjusting a plurality of screws coupled to the at least one support member. The gravity support may be attached to the diffuser without affecting the flow of one or more gases through the diffuser.

  [0007] In one embodiment, the at least one support member is a gravity support. The gravity support includes a gas inlet and provides a flow of gas that flows from the gas inlet to a plurality of orifices in the diffuser plate while simultaneously supporting the diffuser in the vertical direction. Also, the gravity support can be separated from the diffuser via an engagement mechanism. In another embodiment, the orifice ring is configured to couple to a gravity support, providing the diffuser with a mode of regulating gas flow.

  [0008] In another embodiment, the gas distribution plate is supported in the chamber by a first plate in the chamber, the first plate comprising a central comprising at least one hole formed therethrough. Has a region. Below the first plate is a second plate, such as a gas distribution plate, which is in engagement with at least one mesh that is vertically aligned with at least one hole in the first plate. Has a part. The at least one threaded support is adapted to engage the at least one mating portion, thereby supporting the gas distribution plate from the central region of the gas distribution plate. At least one threaded support is coupled between the diffuser and the backing plate. The backing plate is relatively thicker in cross section than the diffuser, and therefore provides a substantially static support. The diffuser is more malleable compared to the backing plate due to the relative thickness and diffuser perforation, which can be achieved by adjusting the diffuser profile by adjusting at least one threaded support. Makes it possible to adjust.

  [0009] In another embodiment, a method for changing the horizontal profile of a diffuser in a plasma chamber is described. The method includes the steps of supporting a diffuser having an engagement mechanism in a central region of the diffuser, engaging the support member with the engagement portion, and adjusting the support member to change the planarity of the diffuser. Prepare with steps. In one aspect, the method allows adjustment before or after decompressing the chamber. In one embodiment, the adjusting step comprises modifying the diffuser horizontal profile to have one of a planar horizontal profile, a concave horizontal profile, or a convex horizontal profile. Prepare.

  [0010] In another embodiment, the at least one support member is a pivot support. The pivot support includes a ball stud that is removably coupled to the upper pivot member. The upper pivot member is coupled to a backing plate in the chamber and the ball stud is adapted to removably couple to the diffuser. The ball stud has a threaded portion extending through the upper pivot member and provides for adjusting the horizontal profile of the diffuser by at least one nut coupled to the threaded portion. To do.

  [0011] In another embodiment, a method for depositing a thin film on a substrate is described. The method places a substrate on a substrate support that lies below the gas distribution plate in a process chamber, the gas distribution plate placing the substrate having an adjustable horizontal profile; And flowing a process gas through a plurality of openings arranged in the gas distribution plate, forming a plasma between the gas distribution plate and the substrate, and depositing a thin film on the substrate. The method may further comprise heating the process chamber to a temperature from about 350 ° C. to about 450 ° C. In one embodiment, the horizontal profile of the gas distribution plate has a concave shape. In another embodiment, the thin film is amorphous silicon. In another embodiment, the horizontal profile is adjusted using at least one support member, and in another embodiment, a plurality of support members are used to adjust the horizontal profile.

  [0012] In another embodiment, a method for adjusting a horizontal profile of a gas distribution plate is described, comprising providing a gas distribution plate having a planar periphery and a central region, and at least one coupled to the central region Adjusting one support member and forming a horizontal profile in a central region that is at least one of planar, concave, or convex relative to the periphery of the plane. In one embodiment, the adjusting step is performed under vacuum conditions.

  [0013] In another embodiment, a method for adjusting a horizontal profile of a gas distribution plate is described, providing a process chamber having a gas distribution plate between a backing plate and a substrate support; Measuring a distance between the body and the gas distribution plate; adjusting at least one support member coupled to the gas distribution plate and the backing plate; and planar, concave, or compared to the substrate support Forming a horizontal profile of the gas distribution plate that is at least one convex. In one embodiment, the adjusting step comprises rotating at least one support member. In another embodiment, the adjustment is performed when the process chamber is under vacuum. In another embodiment, the at least one support member is adapted to provide process gas to the gas distribution plate.

  [0014] In order that the above-described features of the invention may be understood in detail, a more detailed description of the invention briefly described above has been made by reference to certain embodiments, some of which have been It is shown in the accompanying drawings. It should be noted, however, that the attached drawings are only for purposes of illustrating exemplary embodiments of the invention and are therefore not to be considered as limiting the scope of the invention. This is because the present invention can realize an embodiment having other equivalent effects.

Detailed description

  [0041] Embodiments of the present invention generally provide an apparatus and method for supporting a gas distribution plate within a process chamber. In one embodiment, the at least one support member is configured to support the gas distribution plate and assists in preventing central sagging or warpage caused by gravity and high process temperatures, and thereby in the gas distribution plate Maintain the desired horizontal profile. The desired horizontal profile may be at least one of a planar horizontal profile, a convex horizontal profile, or a concave horizontal profile. The horizontal profile or horizontal orientation of a gas distribution plate or diffuser, as used herein, means a cross section of the gas distribution plate as shown in the related drawings. In all embodiments, the gas distribution plate has at least one support member coupled to the central region of the gas distribution plate, the central region being adjustable by adjusting the at least one support member; The gas distribution plate is provided with a horizontal profile that is at least one of planar, concave, or convex. To avoid confusion, common reference numerals indicating similar components in the drawings are used as much as possible.

  [0042] FIG. 1 illustrates a chemical vapor deposition (CVD) process or a plasma enhanced chemical vapor deposition (PECVD) process for processing a circuit of a flat panel display on a large area glass, polymer, or other suitable substrate. It is a side view of the chamber 100 suitable for. Chamber 100 is configured to form structures and devices on a large area substrate used in a liquid crystal display (LCD), or flat panel display, or a photovoltaic cell for a solar cell array. The structure may be a plurality of staggered inverted etch back channel (bottom gate) thin film transistors that may comprise a series of multiple deposition and mask steps. Other structures may include pn junctions to form diodes for photovoltaic cells.

[0043] The chamber 100 is configured to deposit a variety of materials on a large area substrate including conductors (eg, lTO, ZnO ₂ , W, Al, Cu, Ag, Au, Ru, etc.). Or alloys thereof), dielectrics (eg, Si, SiO ₂ , SiO _x N _y , HfO ₂ , HfSiO ₄ , ZrO ₂ , ZrSiO ₄ , TiO ₂ , Ta ₂ O ₅ , Al ₂ O ₃ , derivatives thereof) , Or combinations thereof), semiconductors (eg, Si, Ge, SiGe, their dopants, or derivatives thereof), barrier materials (eg, SiN _x , SiO _x N _y , Ti, TiN _x , TiSi _x N _{y, Ta, TaN x, TaSi} x N y , or derivatives thereof), and adhesion / seed material (e.g., Cu, Al, W, Ti , Ta, Ag, Au,, u, their alloys or a combination thereof) are included. Metal-containing compounds that may be deposited by chamber 100 include metals, metal oxides, metal nitrides, metal silicides, or combinations thereof. For example, the metal-containing compound may be tungsten, copper, aluminum, silver, gold, chromium, cadmium, tellurium, molybdenum, indium, tin, zinc, tantalum, titanium, hafnium, ruthenium, an alloy thereof, or a combination thereof. Including. Specific examples of conductive metal-containing compounds formed or deposited on a large area substrate by chamber 100, such as gate electrodes and other conductive layers, include indium tin oxide, zinc oxide, tungsten, copper, aluminum , Silver, derivatives thereof, or combinations thereof. The chamber 100 is also configured to deposit dielectrics and semiconductors that are in a polycrystalline, amorphous, or epitaxial state. For example, dielectrics and semiconductors may include silicon, germanium, carbon, their oxides, their nitrides, their dopants, or combinations thereof. Specific examples of dielectrics and semiconductors formed or deposited on a large area substrate by the chamber 100 include epitaxial silicon, polycrystalline silicon, amorphous silicon, silicon germanium, germanium, silicon dioxide, silicon oxynitride, silicon nitride, and the like Of dopants (eg, B, P, or As), derivatives thereof, or combinations thereof. The chamber 100 is also configured to contain a gas such as argon, hydrogen, helium, or a combination thereof for use as a purge or carrier gas (eg, Ar, H ₂ , N ₂ , He, their derivatives, or combinations thereof. One example of depositing an amorphous silicon thin film on a large area substrate using chamber 100 may be accomplished by using silane as a precursor gas in a hydrogen carrier gas.

  [0044] Examples of various apparatus and methods for depositing thin films on large area substrates using chamber 100 are named "Plasma Uniformity Control By Gas Diffuser Culture" filed on July 1, 2005. No. 11 / 173,210 (Attorney Docket No. APPM9230.P2), the specification of which is incorporated herein to the extent it does not conflict with the specification. Another example of various devices that may be formed using the chamber 100 is U.S. Patent Application No. 10 entitled “Plasma Uniformity Control by Gas Diffuser Hole Design”, filed July 12, 2004, which is entitled “Plasma Uniformity Control by Gas Diffuser Hole Design”. No. 889,683, and the title of the invention filed on April 20, 2004 is “Controlling the Properties and Uniform of Silicon Nitride Film by Controlling the Film 10th US Patent Application No. 8/29”. Which are incorporated herein by reference to the extent that they do not conflict with the present specification.

  The chamber 100 consists of a substrate support 12 such as a susceptor that supports the chamber sidewall 10, bottom 11, and large area substrate 14. The chamber 100 also has a port 6 such as a slit valve that assists in transferring large area substrates by selectively opening and closing. The chamber 100 also includes a lid having an exhaust channel 18 surrounding the gas injection manifold, the gas injection manifold being a cover plate 16, a first plate such as a backing plate 28, and a gas distribution that is, for example, a diffuser 20. It consists of a second plate, such as a plate. The diffuser 20 may be any solid that is substantially planar and adapted to provide a plurality of passages for one or more process gases from a gas source 5 coupled to the chamber 100. . The diffuser 20 is positioned above the substrate 14 and is suspended vertically by at least one support member, which in this embodiment is a diffuser gravity support 15. In this embodiment, the diffuser 20 is also supported away from the upper lip 55 of the exhaust channel 18 by a flexible suspension 57. The flexible suspension is disclosed in detail in US Pat. No. 6,477,980, entitled “Flexible Suspended Gas Distribution Manifold for A Plasma Chamber”, issued on November 12, 2002. The specification is incorporated herein to the extent that it does not conflict with the specification. The flexible suspension 57 is adapted to support the diffuser 20 away from the edge of the diffuser 20 and to allow the diffuser 20 to expand and contract. Other edge suspensions of the diffuser 20 may be used with the diffuser gravity support 15 and the diffuser support 15 may be used without the edge suspension. For example, the diffuser 20 may be supported around the diffuser 20 by an inflexible support, or may not be supported at the edge. The diffuser gravity support 15 may be coupled to a gas source 5 that supplies process gas to a gas block 17 attached to the support 15. The gas block 17 communicates with the diffuser 20 via a longitudinal lumen 19 in the support 15 and supplies process gas to a plurality of orifices 22 in the diffuser 20. An example of a diffuser that may be used in chamber 100 is US patent application Ser. No. 11 / 173,210 filed Jul. 1, 2005, entitled “Plasma Uniformity Control By Gas Diffuser Curve”. (Attorney Docket No. APPM9230.P2), the specification of which is already incorporated herein.

  [0046] The diffuser gravity support 15 is a substantially symmetric body coupled to the backing plate 28. The backing plate 28 is a substantially planar plate having a suitable lumen through the central region to accommodate the diffuser gravity support 15 and is supported at its periphery by the exhaust channel 18. The backing plate 28 is sealed around it by suitable O-rings 45 and 46 where the plate 28 and the exhaust channel 18 join, which protects the interior of the chamber 100 from the ambient environment and allows process gases to flow. Prevent leakage. The diffuser gravity support 15 extends upward from the backing plate 28 through the appropriate lumen of the cover 16. In this embodiment, the gravity support 15 to which the diffuser 20 is attached is adapted to remain substantially stationary in its predetermined position above the large area substrate 14 and the substrate support 12. The substrate support 12 is then adapted to lift and unload the substrate 14 to and from the transfer position and process position.

  In operation, process gas is flowed from the gas source 5 and the chamber 100 is depressurized to an appropriate pressure by the vacuum pump 29. One or more process gases flow along the gas block 17, the longitudinal lumen 19, the inclined lumen 19 a, and a large plenum 21 and diffuser 20 created between the backing plate 28 and the diffuser 20. It is arranged in a small plenum 23 inside. One or more process gases then flow from the large plenum 21 and the small plenum 23 along the plurality of orifices 22 in the diffuser 20 to create a process space 80 in the region below the diffuser 20. In operation, the large area substrate 14 is lifted to this process space 80 and one or more plasma excitation gases are disposed thereon and a structure is formed on the large area substrate 14. The plasma may be formed in the process space 80 by a plasma source 24 coupled to the chamber 100. The plasma source 24 may be a direct current power source, a radio frequency (RF) power source, or a remote plasma source. The RF power source may be inductively coupled or capacitively coupled to the chamber 100. The plasma may also be formed in the chamber 100 by other means, such as thermally induced plasma. Although a plasma source 24 is shown coupled to the gravity support 15 in this embodiment, the plasma source 24 may be coupled to other portions of the chamber 100.

  [0048] The diffuser 20 is made of or coated with a conductive material, so that the diffuser 20 may serve as an electrode in the chamber 100 and the substrate support 12 May be connected to ground 25, whereby the substrate support 12 may also serve as an electrode within the chamber 100. The material selected for the diffuser 20 may include steel, titanium, aluminum, or combinations thereof, and the surface may be polished or anodized. The substrate support may further be heated by an integrated heater such as a heating coil or resistance heater coupled to or disposed within the substrate support 12. The diffuser 20 may be made from one or more parts joined to each other and adapted to supply process gas, and is also provided with a chamber exhaust channel by insulating spacers 34, 35, 37, 38, and 41. 18 and wall 10 are electrically isolated.

  FIG. 2 is a plan view of the chamber cover 16 and shows the relative position of the diffuser gravity support 15 installed in the central region 210 of the cover 16. The central region 210 is defined herein as any location present within the perimeter of the cover 16, backing plate 28, and diffuser 20, which may provide a support point for the diffuser 20, Alternatively, the horizontal profile of the diffuser 20 may be changed. In addition, a longitudinal lumen 19 is shown, which extends along the gas block 17 and is surrounded by a collar 53. Also, the diffuser gravity support 15 may simply be used as a diffuser support in the central region 210 of the cover 16, and one or more gases may enter the diffuser 20 at other locations in the chamber 100. It may be supplied. Diffuser 20 and backing plate 28 not shown in this figure are typically installed below cover 16. The diffuser 20 and the backing plate 28 have dimensions that are substantially equal to the dimensions of the cover 16. The diffuser 20 and the backing plate 28 have a corresponding central region 210 that allows any of the components shown in this drawing to engage the diffuser 20 and the backing plate 28. May be. Further, the components depicted in this drawing may mate with backing plate 28 or may extend along backing plate 28.

  [0050] FIG. 3 is a plan view of another embodiment of the chamber cover 16, showing an alternate location of the diffuser gravity support 15 within the central region 210. FIG. As in FIG. 2, the diffuser 20 and backing plate 28 are not shown in this drawing, but they are typically installed below the cover 16. The diffuser 20 and the backing plate 28 have dimensions that are substantially equal to the dimensions of the cover 16. The diffuser 20 and the backing plate 28 have a corresponding central region 210 that allows any of the components shown in this drawing to engage the diffuser 20 and the backing plate 28. May be. Further, the components depicted in this drawing may mate with the backing plate 28 or may extend along the backing plate 28. The diffuser gravity support 15 is shown off-center in the cover 16 but is still present in the central region 210. The central region 210 can be any region (and corresponding location in the backing plate and diffuser) located in the center of the cover 16 and that region is defined as a support point for the diffuser 20. Instead of the process gas provided to the diffuser by the diffuser gravity support 15, a gas passage 300 is shown on the cover 16.

  [0051] FIG. 4 is a detailed side view of the diffuser support, showing the diffuser 20 supported by the diffuser gravity support 15 and surrounded by a symmetrical support sheet 51 suitably connected to the backing plate 28. A vertical support block 50 is provided. The longitudinal support block 50 is made from a material selected for strength and resistance to process chemicals, and is adapted to engage and be supported by the symmetrical support sheet 51. The material used for the longitudinal support block 50 may include steel, titanium, aluminum, or a combination thereof.

  [0052] FIG. 5 is a detailed exploded view of the diffuser gravity support 15 having a longitudinal support block 50 disposed within a symmetrical support sheet 51. FIG. Sheet 51 is placed along the appropriate lumen of backing plate 28 and connected by weld 52 or other methods known in the art. The support block 50 is sealed by suitable O-rings 4 and 8 placed against the inner wall of the support sheet 51. The outer diameter of the upper portion 56 of the support block 50 is less than or equal to the inner diameter of the upper region surface 66. Appropriate grooves are placed on the outer diameter of the upper portion 56 to fit the O-rings 4 and 8. These O-rings 4 and 8 are configured to prevent ambient atmosphere from entering the interior of the chamber 100 and to prevent one or more process gases from leaking out of the chamber 100, thereby The chamber 100 is sealed. The longitudinal support block 50 extends upwardly along the appropriate lumen of the cover 16, as can be seen in FIGS. The cover 16 supports an annular collar 53 that is in sealing communication with the cover 16 and the symmetrical support sheet 51. A plurality of screws 1 and 3 fasten the support block 50 to the support sheet 51 and will be described in detail below.

  [0053] Referring to FIGS. 5 and 6A, a plurality of screws 1 and 3 are shown in plan view of a longitudinal support block 50 that supports the support block 50 coupled to the diffuser 20. In addition, the support block 50 is fixed to the support sheet 51. The longitudinal support block 50 has a symmetrical flange portion 57 having a larger diameter than the central portion 58 of the support block 50. The flange portion 57 operates as a stopping device or a limiting device for the gravity support 15 by preventing vertical movement when the flange 57 and the support sheet 51 come into contact with each other. The flange portion 57 also serves as an adjustment mechanism by providing an interlocking connection to the plurality of jack screws 1 by cutting appropriate internal threads at selected locations on the flange 57. A plurality of individual lumens spaced appropriately in the flange 57 are in fixed communication with a suitably threaded hole disposed in the upper region 66 of the seat 51. Provides mechanical communication to the screw 3. Although four jack screws 1 and four fixing screws 3 are shown, the present invention is not limited to these numbers, and any number may be used to provide the diffuser 20 with the desired adjustment and support. May be. The gravity support 15 is coupled between the diffuser 20 and the backing plate 28. The backing plate 28 is relatively thicker in cross-section than the diffuser 20 and thus provides a support point that does not move substantially stationary. The diffuser 20 is typically more malleable compared to the backing plate 28 due to the relative thickness and perforations of the diffuser 20. This relative malleability makes it possible to adjust the diffuser profile by adjusting the flange portion 57 of the gravity support.

  [0054] In operation, the longitudinal support block 50 is inserted into a symmetric support sheet 51, and the diffuser 20 is connected to the support block 50 by an interlocking connection 60 described in detail below. . At this point, the diffuser is suspended by the diffuser gravity support 15 and flexible suspension 57 (described in FIG. 1). The diffuser gravity support 15 is then vertically adjusted by a plurality of jack screws 1 to diffuse to generate a desired horizontal profile that may be at least one of planar, concave, or convex. Allowing the device 20 to be operated. In one embodiment, the desired horizontal profile of the diffuser 20 is different from the horizontal profile of the substrate support 12. In another embodiment, the desired horizontal profile is similar to the horizontal profile of the substrate support 12. If the substrate support 12 is deflected or the central portion is higher than the periphery for some reason (or vice versa), the diffuser 20 substantially matches the horizontal profile of the substrate support 12. May be adjusted to provide a process space 80 between the substrate 14 and the diffuser 20 that is substantially equally spaced at any point. Alternatively, the diffuser 20 may be adjusted to match a horizontal profile determined by a user or process that is different from the horizontal profile of the substrate support 12, and the process space between the diffuser 20 and the substrate 14. 80 may not be equally spaced at any point. Alternatively, the horizontal profile of the diffuser 20 may be selected regardless of the horizontal profile of the substrate support 12.

  [0055] If the diffuser 20 is slack in any part of the central region and a planar horizontal profile is desired as the profile of the diffuser 20, the jack screw 1 communicates with the upper region 66 of the support sheet 51. May be adjusted to lift the central portion of the diffuser 20 accordingly, removing central sagging caused by gravity or reduced pressure from the diffuser 20. If the desired horizontal profile of the diffuser 20 is a convex horizontal profile, the diffuser 20 may be adjusted accordingly by the jack screw 1 to lift the central portion of the diffuser 20 as needed. Good. If the desired horizontal profile of the diffuser 20 is a concave horizontal profile, the jack screw 1 is lifted by appropriate rotation and a plurality of fixing screws 3 arranged in appropriate screw holes in the support sheet 51. Is pressed against the flange 57 and rotated appropriately to transmit the compression effect to the diffuser 20 and move the central portion of the diffuser 20 to a lower position or move the central portion of the diffuser 20 to a lower position. Thereby providing the diffuser 20 with a concave horizontal profile. Alternatively, the diffuser 20 may not require vertical adjustment and the fixation screw 3 may be adjusted to secure the diffuser in its position.

  [0056] Once the diffuser 20 has been adjusted to the desired posture and the diffuser 20 exhibits the desired horizontal profile, the locking nut or jam nut 2 is properly rotated to secure the jack screw 1 Thereby preventing subsequent movement of the jack screw 1 which may translate the diffuser 20. The plurality of fixing screws 3 are then tightened appropriately to prevent any subsequent movement of the parts associated with the gravity support 15. As described above, if a concave attitude is desired in the diffuser 20, the jack screw 1 may be rotated appropriately to tighten and the jam nut 2 is associated with the gravity support 15. Used to prevent subsequent movement of parts to be carried out. In other words, when the concave posture of the diffuser 20 is preferable, the fixing screw 3 serves to adjust, and the jack screw 1 and each jam nut 2 operate as a fixing mechanism.

  [0057] Although the process described above has been described in the surrounding environment, any adjustments made to the horizontal profile of the diffuser 20 by the disclosed process can be caused by pressure generated by the substrate support 12, backing plate 28, or diffusion. This may be done after depressurizing the chamber 100 to adjust the diffuser 20 to compensate for any deformation of the vessel 20. Any change caused by pressure may be measured and a desired horizontal profile of the diffuser 20 may be created. All openings in the chamber 100 that are not used for decompression may be sealed during this process, and the O-rings 4 and 8 allow movement of the longitudinal support block 50 and also provide proper sealing. Adapted to do. Regardless of whether in the ambient environment or in a vacuum, the adjustment parameters and the relative distance between the substrate support 12 and the diffuser 20 are at least when adjusting the horizontal profile of the diffuser. It may be determined by the operator using a measuring device such as a gauge.

  [0058] FIGS. 5 and 6B-6C illustrate one embodiment of an interlocking connection 60, which is depicted herein as a slot and key configuration. The longitudinal support block 50 is connected to the diffuser 20 by an interlocking connection 60 at positions below and near the backing plate 28. In one embodiment, the diffuser 20 is manufactured or modified to include a plurality of symmetric slot-like female connectors 31, and the support block 50 includes a plurality of symmetric key-like male connectors 32. Manufactured to include. The female connector 31 is included in the diffuser 20, and the male connector 32 is included in the support block 50. Although four female connectors 31 and four male connectors 32 are shown in these example drawings, it will be appreciated that a greater or lesser number may be used. Alternatively, the male connector 32 may be a threaded member adapted to mate with a suitable female thread in the diffuser 20, thereby creating the mating connection 60 by a screw connection.

  [0059] FIG. 6B shows a plan view of the intermeshing connection 60 and illustrates the section BB of FIG. A lower portion 59 of the longitudinal support block 50 is shown, showing the longitudinal lumen 19 and the inclined lumen 19a in detail, with a plurality of male connectors 32 in the region between the inclined lumens 19a. The diffuser 20 is shown and includes an orifice 22, a plurality of overhang portions 61 adapted to support the male connector 32, and a plurality of cutout portions 62 adapted to allow the male connector 32 to enter therein.

  [0060] Referring to FIG. 5, the male connector 32 has an outer diameter that is smaller than the outer diameter of the flange 57, as measured in terms of diameter, and is equal to or equal to the inner diameter of the shoulder region 65 of the support sheet 51. Has a smaller outer diameter. The upper region surface 66 of the support sheet 51 has an inner diameter that is larger than the inner diameter of the shoulder region 65. The lower portion 59 of the support block 50 has an outer diameter that is smaller than the outer diameter of the male connector 32 and an outer diameter that is smaller than the central portion 58. The upper portion 56 of the support block 50 has a smaller outer diameter than the flange 57 and a larger outer diameter than the central portion 58. In this diameter scheme, the support block 50 has two mechanical stops, one in the shoulder region 65 of the support sheet 51 and the other in the region below the flange 57 and In the upper region 66 of the support sheet 51 it is possible to provide.

  [0061] It can be seen that the mating connection 60 depicted in FIG. 6B is in an unsecured position to indicate the relative position of the tilted lumen 19a. Prior to the adjustment and fixing procedure already described in detail, the support block 50 is inserted into the support sheet 51 and the male connector 32 is inserted into the cut-out portion 62 present in the region between the overhang portions 61. These overhanging portions 61 and cutout portions 62 are part of the diffuser 20. Then, as shown in FIG. 5C, the support sheet 51 is rotated by 45 ° to a fixed position. The cut-out portion 62 remains as it is in the diffuser 20, and the male connector 32 is disposed directly below the overhang portion 61. The cut-out portion 62 creates a gap, such as a channel 501 that is substantially aligned with the inclined lumen 19a, which substantially flows from the longitudinal lumen 19 into the large plenum 21 and the small plenum 23. A layered gas flow may be provided. The process gas is then distributed through the plurality of orifices 22 of the diffuser 20 during the process. Note that the orifices 22 are also present in the area of the diffuser 20 occupied by the gravity support 15, thereby providing one or more gas flows through the diffuser 20 without compromise.

  FIG. 7 is a schematic diagram of another embodiment of a diffuser gravity support 15. A longitudinal support block 50 is shown comprising an extended lumen 19b extending from the longitudinal lumen 19, which communicates with a small plenum 23. The extension lumen 19b provides a larger amount of process gas to the small plenum 23, thereby the amount of process gas flowing into the process space 80 via the plurality of orifices 22 present below the longitudinal support block 50 and It may be added as an option to increase the flow.

  FIG. 8 is another embodiment of the diffuser gravity support 15. In this embodiment, the longitudinal support block 50 has a longitudinal lumen 19 that intersects a plurality of lateral lumens 19c. The longitudinal support block 50 has an annular gap 33 in the lower portion 59 that is adapted to enlarge the area of the small plenum 23 in the diffuser 20. In addition, a backing plate 28 is shown having a peripheral chamber 27 in the lower portion of the backing plate 28, which is adapted to increase the surface area of the large plenum 21.

  [0064] FIG. 9A is a plan view of the orifice ring 800. FIG. In this embodiment, the orifice ring 800 consists of at least two parts, such as a first curved member 810 and a second curved member 820. The first curved member has at least one cavity 840 adapted to receive the shaft of the screw 830. The screw 830 may have a threaded portion that may be received in the threaded cavity 850 of the second curved member 820. Other embodiments may be envisaged, such as an orifice ring 800 consisting of one part or more than two parts suitably joined and mounted in the chamber.

  [0065] FIG. 9B is a side view of the orifice ring 800 shown in FIG. 9A. Orifice ring 800 has an outer diameter 804, a first inner diameter 806, and a second inner diameter 808. The first inner diameter 806 is configured to surround the outer diameter of the lower portion 59 of the longitudinal support block 50. The second inner diameter 808 may be larger than the first inner diameter 806, and each inner diameter may be separated by an annular bevel 870. In addition, a plurality of orifice ring holes 860 are shown along the periphery of the orifice ring 800 below the annular bevel 870.

  [0066] FIG. 10A is a detailed view of a diffuser gravity support 15 similar to the embodiment depicted in FIG. The orifice ring 800 has a first curved member 810 and a second curved member 820 that surround the lower portion 59 of the longitudinal support block 50. Each curved member has a plurality of orifice ring holes 860 along the outer periphery, and in one embodiment, the orifice ring holes 860 are substantially aligned with the plurality of lateral lumens 19c. Be adapted. The orifice ring 800 provides a surface that regulates the flow of one or more process gases from the longitudinal lumen 19 to the process space 80. By changing the diameter of the hole 860, the gas flow may be limited to the diameter of the hole 860. In addition or alternatively, gas flow may be limited by changing the alignment of the holes 860 and the lateral lumen 19c.

  [0067] For example, when the gas flows along the diffuser gravity support 15, the gas travels through the longitudinal lumen 19 to the plurality of lateral lumens 19c with little restriction. May be. The plurality of orifice holes 860 may have a diameter smaller than the diameter of the plurality of lateral lumens 19c. Gas flowing out of the lateral lumen 19c may be restricted by the orifice ring hole 860 and a portion of the gas may flow into the gap space 910. Then, the gas in the gap space 910 may move downward through the channel 501 and into the annular gap 33, thereby replenishing the gas flow flowing along the orifice hole 22 from the small plenum 23. The flow unimpeded by the orifice ring 800 may travel through the orifice ring hole 860 and into the large plenum 21. Orifice ring 800 may be positioned such that a portion of the gas flowing through orifice ring hole 860 impinges on outer circumferential chamber 27 such that a portion of one or more gases redirects downward. Good. It is also contemplated by the present invention that the orifice ring 800 may not form the gap space 910, for example, the orifice ring may be manufactured with only one inner diameter. Alternatively or in combination, the lower portion 59 of the longitudinal support block 50 may include an extended lumen 19b to provide a flow path for one or more gases to the small plenum 23. . As described above, the orifice ring 800 may be manufactured, positioned, and adjusted based on the gas flow rate or amount determined by the user.

  [0068] FIG. 10B is a detailed view of a diffuser gravity support 15 similar to the embodiment depicted in FIG. The orifice ring 800 has a first curved member 810 and a second curved member 820 that surround the lower portion 59 of the longitudinal support block 50. Each curved member has a plurality of orifice ring holes 860 along the outer periphery, and in one embodiment, the orifice ring holes 860 are substantially aligned with the plurality of lateral lumens 19c. Be adapted. In another embodiment, the orifice ring hole 860 may not be perfectly aligned with the lateral lumen 19c. In this embodiment, the orifice ring 800 may be rotated to further restrict gas flow from the lateral lumen 19c to the large plenum 21.

  [0069] FIG. 11A is a plan view of another embodiment of a support member for supporting a gas distribution plate within a chamber. A backing plate 28 is shown and has a plurality of lumens 1063 formed throughout the central region 1010. Each of the plurality of lumens 1063 is adapted to receive a threaded support 1020 such as a bolt, and the threaded support 1020 is configured to mate with a corresponding mating portion of the diffuser 20. The diffuser 20 shown in this drawing is typically installed below the backing plate 28. The diffuser 20 has a dimension that is substantially equal to the dimension of the backing plate 28. The diffuser 20 has a corresponding central region 1010 adapted to allow the components depicted in this drawing to engage the diffuser 20. Although twelve lumens having a symmetrical pattern are shown in this embodiment, the plurality of lumens 1063 may have any pattern, number, and size in the backing plate 28. Also shown is an opening 1048 present in the backing plate 28 that is adapted to accommodate a gas supply system 1050 for supplying one or more process gases to the diffuser 20. The diffuser may also have suitable connection points formed in the diffuser to accommodate the gas supply system 1050.

  [0070] FIG. 11B is a plan view of another embodiment of a diffuser gravity support for supporting a gas distribution plate within a chamber. This embodiment is similar to the embodiment shown in FIG. 11A except for the pattern of the threaded support 1020 and the location of the off-center opening 1048. As in FIG. 11A, the diffuser 20 is not shown in this drawing, but is typically located below the backing plate 28. The diffuser 20 has a dimension that is substantially equal to the dimension of the backing plate 28. The diffuser 20 has a corresponding central region 1010 that can allow the components depicted in this drawing to engage the diffuser 20.

  [0071] FIG. 12 is a schematic partial side view of the diffuser 20 within the chamber 100. FIG. The chamber has a cover 16 with at least one opening 1048 in the central region adapted to receive a gas supply assembly 1050. The gas supply assembly 1050 is configured to receive one or more process gases from the gas supply source 5 and supply the process gases to the large plenum 21 via the lumen 1019. The process gas can then move to the process space 80 via the plurality of orifices 22 of the diffuser 20. As in the other embodiments, the diffuser 20 is adapted to couple to the plasma source 24 to achieve a plasma in the process space 80.

  [0072] Chamber 100 has a plurality of threaded supports 1020, such as bolts, that threaded supports 1020 pass through a first plate, such as backing plate 28, such as diffuser 20. Extends to the second plate. The gas supply assembly 1050 may be integrated with the backing plate 28, or the backing plate 28 is adapted to accommodate the gas supply assembly 1050 along the through hole 1070 of the backing plate 28. May be. The threaded support 1020 may be produced from a material that has high tensile strength and does not react with process chemicals, such as stainless steel, titanium, aluminum, or combinations thereof. The threaded support 1020 may be made from any of the materials described above and may be further coated with a process resistant coating such as aluminum. The backing plate 28 has a plurality of holes 1030 formed through the backing plate 28 in the central region. Each of the threaded supports 1020 is threaded and a portion of the screw is adapted to be received by a mating portion such as an internal thread 1040 in the diffuser 20, the mating portion being in the backing plate 28. Corresponds to a plurality of holes 1030. The internal thread is placed in a suitable lumen that does not interfere with the plurality of orifices 22 in the diffuser plate 20. Furthermore, a tubular partition 1063 and a cap plate 1065 that covers each tubular partition 1063 are shown. The cap plate 1065 allows access to the threaded support 1020 and, together with the tubular septum 1063, provides a sealed state from the surrounding environment. The cap plate 1065 is sealed to the cover 16 by screws 1068 together with an O-ring 1062 that is sealed by any known method, such as a clamping ring 1066 that covers the cap plate 1065, and exists between the cap plate 1065 and the cover 16. May be. Note that the gas supply assembly 1050 in this embodiment is adapted to remain stationary in its place within the chamber 100 and is sealed from the ambient atmosphere by any known method.

  [0073] In operation, the threaded support 1020 is inserted into the tubular septum 1063, through the hole 1030, and engaged with the respective female thread 1040 of the diffuser 20. The threaded support 1020 is rotated to adjust the planar orientation of the diffuser 20. In this embodiment, the central portion of the diffuser 20 is limited in vertical motion by a backing plate 28 that is designed to have a very large tolerance for forces such as gravity, vacuum, and heat. The backing plate 28 may bend by these forces, but not as much as occurs in the diffuser 20. Thus, the diffuser 20 may exhibit deformations caused by the forces described above, but the deformations are effectively stopped by the backing plate 28. It is also contemplated that force parameters may be defined and any known deformations in backing plate 28 and diffuser 20 may be offset by adjustment of threaded support 1020. The diffuser 20 may be adjusted to allow partial deformation, but the permitted deformation is such that the threaded support 1020 contacts a stop device, which in this example is a washer 1052. If the mechanical limit is reached, it is stopped at a predetermined point. A threaded support 1020 is coupled between the diffuser 20 and the backing plate 28. The backing plate 28 is much thicker in cross section than the diffuser 20 and thus provides a substantially static support point. The diffuser 20 is more malleable compared to the backing plate 28 due to the relative thickness and perforation of the diffuser 20, which can be achieved by adjusting the length of the threaded support 1020. Allows you to adjust the diffuser profile.

  [0074] In another aspect, at least one adjustment member 1032 such as a spacer may be used to maintain a static distance between the diffuser 20 and the backing plate 28, thereby The threaded support 1020 is used to fix the adjustment member 1032 in place. In this embodiment, the diffuser 20 may be formed to exhibit a desired horizontal profile by varying the thickness of the at least one adjustment member 1032. When attached, the at least one adjustment member 1032 may be thicker to form a convex horizontal profile in the central portion of the diffuser 20, or to form a concave horizontal profile. Further, it may be thinner. Then, the threaded support 1020 may be rotated into the female thread 1040 to fix the adjustment member 1032 in place. Although only one adjustment member 1032 is shown, the present invention is not limited thereto and any number of adjustment members 1032 may be used, for example, each threaded support 1020 coupled to it. One adjusting member may be provided. If the adjustment member 1032 is used, the vertical movement of the diffuser 20 is limited to some movement of the backing plate 28 in response to forces such as heat, pressure, and gravity.

  [0075] FIG. 13 is another embodiment of a support member for supporting the gas distribution plate, which in this embodiment is a pivot support 1300. The pivot support 1300 may be used alone or in combination with the diffuser gravity support 15. Also, the pivot support 1300 may be used alone or in combination with the threaded support 1020. The pivot support 1300 in this embodiment is positioned outward from the diffuser gravity support 15 and is coupled to the diffuser 20 and the backing plate 28. The pivot support 1300 includes a ball stud housing 1304 coupled to the diffuser 20 and a ball stud 1302 adapted to couple to an upper pivot member 1306 coupled to the backing plate 28. Ball stud 1302 is an elongated member having one end coupled to lower pivot member 1308 and the other end having a threaded portion 1310. Ball stud 1302 may be machined as an integral member with lower pivot member 1308 or may be a bolt or rod screwed or coupled to lower pivot member 1308. Upper pivot member 1306 is adapted to engage a support sheet 1322 formed on the upper surface of backing plate 28. The sealing block 1324 is adapted to couple to the upper surface of the backing plate 28 to house the upper portion of the upper pivot member 1306 and to help seal the chamber interior from the ambient environment. A cover cup 1326 is coupled to the upper surface of the backing plate 28 to cover the exposed portion of the pivot support 1300 and to further seal the interior of the chamber. To accommodate the pivot support 1300, the backing plate 28 allows unobstructed movement of the first lumen 1328 under the support sheet 1322 and the ball stud 1302 and ball stud housing 1304. Having an expanded lumen 1330 configured to:

  [0076] The lower pivot member 1308 is typically a spherical solid and the upper pivot member 1306 is spherical in shape and has a central lumen 1320 for receiving the ball stud 1302. Lower pivot member 1308 and upper pivot member 1306 are made from a material that exhibits mechanical strength with very little reactivity to process chemicals. Ball stud 1302 may be made from the same material used for lower pivot member 1308 and upper pivot member 1306. Materials used for ball stud 1302, upper pivot member 1306, or lower pivot member 1308 include stainless steel, titanium, or aluminum, and combinations thereof. If the elongated portion of the ball stud 1302 is made from a material that has some reactivity to process chemicals, a tubular shield 1332 made of aluminum may be coupled to the ball stud 1302.

  [0077] Lower pivot member 1308 is adapted to couple to ball stud housing 1304, which is adapted to couple to diffuser 20 by coupling mechanism 1312. Ball stud housing 1304 has a lower seat 1314 coupled to seat housing 1316, thereby housing lower pivot member 1308. The coupling mechanism 1312 in this embodiment is similar in design and function to the mating connection 60 described in FIGS. 5 and 6B-6C, except that it is reduced. The seat housing 1316 has a plurality of male connectors 1318 that selectively engage a plurality of slots (not shown) formed in the diffuser 20. The diffuser 20 has a plenum 1323 that helps process gas flow from the large plenum 21 to the process space 80 through a plurality of orifices 22 formed below the pivot support 1300.

  FIG. 14 is a detailed view of the diffuser 20 coupled to the pivot support 1300. Prior to coupling to diffuser 20 as shown, an operator may assemble ball stud housing 1304 away from backing plate 28 and diffuser 20. To facilitate assembly, the diffuser 20 and backing plate 28 may be removed from the chamber and placed in a suitable location for assembly. Ball stud 1302 may be coupled to seat housing 1316 by inserting an elongated portion of ball stud 1302 into a conical opening 1408 formed in seat housing 1316. To accommodate the lower pivot member 1308, the lower seat 1314 is inserted along a passage 1404 formed in the lower surface of the seat housing 1316. Lower seat 1314 and seat housing 1316 are configured to mate with threaded connection 1402. The seat housing 1316 may have an internal thread, and the lower seat 1314 may have an external thread. The passage 1404 is dimensioned to allow the lower sheet 1314 to pass therethrough and allow the screws to engage. The lower seat 1314 may be properly rotated until the upper portion of the lower seat contacts a shoulder 1406 formed in the seat housing 1316. The seat housing 1316 and the lower seat 1314 each have an inner surface that is shaped to accommodate and fit the lower pivot member 1308 while at the same time assisting in pivoting the ball stud 1302.

  [0079] A pin 1410 may be used to prevent the lower sheet from retracting the shoulder 1406 when the shoulder 1406 is brought into contact with the lower sheet 1314. When all ball studs 1302 are coupled to ball stud housing 1304, each ball stud housing 1304 is inserted into a slot formed in diffuser 20 that is adapted to mate with male connector 1318. Also good. Ball stud housing 1304 may be rotated by 45 ° and secured by a set screw 1412 inserted into a channel 1414 formed in seat housing 1316. Channel 1414 has a lower portion that is threaded and meshes with a screw on set screw 1412. Set screw 1412 is properly rotated to contact the shoulder formed in channel 1414. The set screw 1412 is configured to extend beyond the threaded portion of the channel 1414, which extends into engagement with a recess 1416 formed in the diffuser 20, whereby the ball stud housing 1304 is Further rotation is prevented. Once all the ball stud housings 1304 are coupled with the diffuser 20 and secured by set screws 1412, the diffuser 20 may be manipulated for further assembly and the ball stud housing 1304 remains intact. It may be in the state.

  FIG. 15 is a detailed view of pivot support 1300 coupled to backing plate 28. After installing a ball stud housing 1304 having a ball stud 1302 therein, the diffuser 20 may be joined to the backing plate 28. In this example, the backing plate 28 is positioned upside down outside the chamber, and the diffuser 20 having one or more ball studs 1302 coupled thereto is positioned upside down above the backing plate 28. Having the diffuser 20 in this position allows the threaded portion 1310 of the ball stud 1302 to hang down, and the threaded portion 1310 is formed on the backing plate 28 support. From the seat 1322, until it is exposed and protrudes, the operator can insert the ball stud 1302 into the expansion lumen 1330 and the first lumen 1328. The upper pivot member 1306 may then be attached by guiding the threaded portion 1310 along the central lumen 1320. As the threaded portion 1310 protrudes from the central lumen 1320, a nut 1516 may be coupled to the threaded portion 1310, thereby securely securing the upper pivot member 1306 to the ball stud 1302. To do. In another embodiment, the central lumen 1320 of the upper pivot member 1306 may include an internal thread, and the threaded portion 1310 of the ball stud 1302 may be coupled to the upper pivot member by a threaded connection.

  [0081] In one embodiment, the upper portion 1506 of the ball stud 1302 may have a small diameter portion 1504. The central lumen 1320 of the upper pivot member 1306 has a portion that accommodates an upper portion 1506 and a small diameter portion 1504 until the upper portion contacts the shoulder region 1508 formed in the upper pivot member 1306. Helps vertical movement within cavity 1320. Shoulder region 1508 serves as a vertical restriction for ball stud 1302, thereby stopping vertical movement of ball stud 1302 when upper portion 1506 contacts shoulder region 1508 during adjustment. The upper pivot member 1306 also includes at least one O-ring 1510 disposed in a recess formed in the upper pivot member 1306 to prevent process gas from leaking out of the chamber, and the ball stud 1302 and the upper pivot member. Adapted to form a vacuum seal with 1306. Pivot support 1300 also includes an O-ring 1512 disposed in a recess formed in backing plate 28 to prevent process gas from being lost and between upper pivot member 1306 and backing plate 28. Helps to vacuum seal. O-rings 1510 and 1512 may be made from a suitable material, such as a polymeric or rubber material adapted to withstand process conditions.

  [0082] The diffuser 20 and the backing plate 28 are coupled to each other by a plurality of pivot supports 1300 by a plurality of upper pivot members 1306 coupled to respective ball studs 1302 by nuts 1516. The diffuser 20 and backing plate 28 may be positioned face up at a predetermined position that should be positioned when the diffuser and backing plate are installed in the chamber. At this point, the diffuser gravity support 15 may be inserted into the support sheet 51 (FIG. 5) and rotated appropriately to couple to the diffuser 20. Alternatively, the diffuser 20 may use a gas supply assembly 1050 and a plurality of threaded supports 1020 (FIG. 12) may be coupled to the diffuser.

  [0083] The pivot support 1300 also includes a sealing block 1324 having a threaded portion 1310 of the ball stud 1302 and a central opening 1502 for receiving the nut 1516. The sealing block 1324 provides the upper pivot member 1306 with an upper support sheet 1526 configured to allow the upper pivot member 1306 to perform unrestricted movement. The central opening 1502 is configured to allow the upper pivot member 1306 and ball stud 1302 to move without the nut 1516 or optional washer 1526 contacting the sealing block 1324. The sealing block 1324 includes at least one O-ring 1514 that provides additional sealing between the backing plate 28 and the surrounding environment and by a plurality of fasteners 1524 such as bolts. Adapted to couple to a backing plate. The sealing block has an O-ring groove 1522 formed on the upper surface.

  FIG. 16 is a detailed view of another embodiment of a pivot support 1300 coupled to the diffuser 20. Cover cup 1326 is shown and is coupled to the top surface of sealing block 1324 by a plurality of cover bolts 1602. The cover bolt may be screwed into a corresponding hole formed in the sealing block, or may extend through the sealing block to an appropriately threaded hole formed in the backing plate, In some cases, the plurality of cover bolts 1602 uses a different pattern of holes in the backing plate 28 than the plurality of fasteners 1524 used to join the sealing block 1324. A cover O-ring 1604 made of polymer or rubber may be disposed in the O-ring groove 1522 to provide further sealing of the pivot support 1300 within the chamber. The cover cup 1326 also provides a covered area 1606 inside the cover cup 1326 to allow unobstructed movement of the threaded portion 1310 and nut 1516.

  [0085] FIG. 17A is a plan view of one embodiment of a backing plate 28 having a plurality of pivot supports 1300 coupled thereto. A plurality of pivot supports 1300 and diffuser gravity supports 15 are shown and are coupled to the backing plate 28 in the central region 1010. The diffuser 20 not shown in this drawing is typically installed below the backing plate 28. The diffuser 20 has a dimension that is substantially equal to the dimension of the backing plate 28. The diffuser 20 has a corresponding central region 1010 that may allow any of the components shown in this figure to engage the diffuser 20. In this embodiment, eight pivot supports 1300 having a symmetrical pattern are shown, but the pivot supports 1300 may have any pattern, number, and dimensions in the backing plate 28.

  [0086] FIG. 17B is a plan view of another embodiment of a backing plate 28 having a plurality of pivot supports 1300 and at least one opening 1048 for a gas supply system 1050. FIG. All components may be located in the central region 1010, or alternatively, a separate opening 1048a configured to accommodate an alternative gas supply system 1050a is located outside the central region 1010 in the backing plate. May be combined. The diffuser 20 not shown in this drawing is typically installed below the backing plate 28. The diffuser 20 has a dimension that is substantially equal to the dimension of the backing plate 28. The diffuser 20 has a corresponding central region 1010 that may allow any component present in the central region 1010 shown in this figure to engage the diffuser 20. . If an alternative gas supply system 1050a is used, the diffuser has a corresponding connection point formed on it that is adapted to accommodate another supply system. In this embodiment, eight pivot supports 1300 having a symmetrical pattern are shown, but the pivot supports 1300 may have any pattern, number, and dimensions in the backing plate 28.

  [0087] FIG. 17C is a plan view of another embodiment of a backing plate 28 similar to the embodiment shown in FIG. 17B, except that a plurality of threaded supports 1020 have been added in the central region 1010. . The diffuser 20 not shown in this drawing is typically installed below the backing plate 28. The diffuser 20 has a dimension that is substantially equal to the dimension of the backing plate 28. The diffuser 20 has a corresponding central region 1010 that may allow any component depicted in this drawing to engage the diffuser 20. In this embodiment, twelve threaded supports 1020 and eight pivot supports 1300 are shown in a symmetrical pattern, although multiple threaded supports 1020 and pivot supports 1300 can be It may have patterns, numbers, and dimensions. Also shown is an opening 1048 present in the backing plate 28 that is adapted to accommodate a gas supply system 1050 for supplying one or more process gases to the diffuser 20. In this embodiment, the diffuser also has a suitable connection point formed therein and houses a gas supply system 1050. An alternative gas passage 300 is also shown and may be used alone or in combination with the opening 1048 to provide process gas to the diffuser 20.

  [0088] The diffuser 20 is adapted to operate at a process temperature of about 350 ° C. to about 450 ° C., and depending on the material of the diffuser, some parts of the diffuser may be removed during the process cycle. May exhibit expansion and contraction. Various parts of the pivot support 1300 and corresponding parts of the backing plate 28 address this expansion or contraction by allowing lateral movement 1608 of the diffuser 20. First lumen 1328, conical opening 1408, and covered region 1606 provide clearance for movement of ball stud 1302 and expanded lumen 1330 provides clearance for movement of ball stud housing 1304. I will provide a. Accordingly, in response to any expansion and contraction that occurs in the diffuser 20, lateral movement 1608 of some portions of the diffuser 20 is possible. In one embodiment, the pivot support 1300 allows movement 1608 in the range of about 0.25 inches to about 0.5 inches of some portions of the diffuser 20.

  [0089] The diffuser 20 tends to sag in certain areas and may deform downward in the vertical direction, but some parts of the diffuser 20 move horizontally due to expansion or contraction. In this way, the same or other parts of the diffuser 20 can move vertically due to the radial path inherent in the design of the pivot support 1300. Vertical upward movement may be stopped by the upper surface 1610 of the expansion lumen 1330, which may serve as a stop device when the ball stud housing 1304 contacts the upper surface 1610. Alternatively or in addition, a threaded upper pivot member 1306 may be coupled to the ball stud 1302.

  [0090] In another embodiment, the pivot support 1300 predicts a known deformation of a particular region of the diffuser 20 in a horizontal motion and any vertical motion facilitated by the pivot support 1300. May be adjusted by known variations of a particular region of the diffuser 20. This embodiment describes a method of supporting a diffuser inside a chamber using a plurality of support members. When the diffuser 20 is suspended from the backing plate 28 and optional flexible suspension 57 at a specific height or distance above the substrate support 12 (FIG. 1), the diffuser gravity support 15 May be adjusted to a predetermined height and fixed in place as described in the description of FIGS. 5 and 6A. Based on the actual or desired distance between the substrate support and the portion of the diffuser 20 under the pivot support 1300, the pivot support 1300 already attached as described in the description of FIGS. The ball stud 1302 may have to be adjusted up or down by rotating the nut 1516 present in the threaded portion 1310. Once the respective portions of the diffuser under each pivot support 1300 are defined to be at a desired distance relative to the substrate support 12, the nut 1516 on the respective threaded portion 1310 is May be tightened and secured by a jam nut 1518.

  [0091] The distance between the substrate support and the diffuser is adjusted by an operator using one or more gauges for adjusting and measuring a plurality of regions between the diffuser and the substrate support. May be. These measurements are completed and the height of the diffuser above the substrate support is adjusted by adjusting the nut 1516 coupled to the threaded portion 1310 of the diffuser gravity support 15 and ball stud 1302. However, if it is found satisfactory, the nut 1516 may be loosened by appropriate rotation. Loosening this nut 1516 may lower the portion suspended by the respective pivot support 1300, thereby shortening the distance between the diffuser and the substrate support at the affected point. Absent. When the nut 1516 is loosened by a predetermined amount, the jam nut 1518 may be properly tightened against the nut 1516 to secure the nut 1516 in place. Loosening nut 1516 and then lowering the diffuser may be intentional to address known expansion or contraction deformations of some parts of the diffuser. And, when exposed to process conditions, these portions may be limited in deformation in the downward direction by contact between the nut 1516 and the upper pivot member 1306. A plurality of pivot supports 1300 pre-adjusted by an operator as described above may provide a diffuser horizontal profile in the process that is at all desired distances to the substrate support at any point. Alternatively, the diffuser 20 may be adjusted by some other method with or without taking into account the horizontal profile of the substrate support 12.

  [0092] Alternatively, loosening a particular nut 1516 coupled to the threaded portion 1310 may not cause the diffuser 20 to descend, and the nut 1516 does not contact the upper pivot member 1306. When the nut 1516 is loosened by a predetermined amount, the jam nut 1518 may be properly tightened against the nut 1516 to secure the nut 1516 in place. At this time, the diffuser 20 may be the same height as before the nut 1516 is loosened. Loosening the nut 1516 may be intentional to address known expansion or contraction deformations of some parts of the diffuser. And when exposed to process conditions, these portions may be capable of deforming vertically downward until the respective nut 1516 contacts the upper pivot member 1306. A plurality of pivot supports 1300 pre-adjusted by an operator as described above may provide a diffuser horizontal profile in the process that is at all desired distances to the substrate support at any point.

  [0093] All of the above-described methods of adjusting the profile of the diffuser are performed under vacuum conditions by capping the inlet or outlet which is not required to adjust the horizontal profile of the diffuser, It may be monitored and adjusted. For example, the gas block 17 (FIG. 1), the gas passage 300, or the opening 1048 may be sealed, and in embodiments using the pivot support 1300, the sealing block 1324 may be coupled to the backing plate 28. Good. Also, all other unused openings may be sealed and the chamber may be depressurized to an appropriate pressure that may cause some parts of the backing plate 28 or diffuser 20 to sag. In one embodiment, one or more gauges may be used by an operator to monitor and adjust the height of the diffuser relative to the substrate support at multiple points. In another embodiment, the diffuser profile may be adjusted by any method without considering the horizontal orientation of the substrate support. Adjustment may be performed by rotating adjustment members coupled to the diffuser, such as diffuser gravity support 15, threaded support 1020, and nut 1516 on pivot support 1300.

  [0094] If all adjustments are made under vacuum or in the ambient environment and the diffuser exhibits a desired horizontal profile, or a predetermined horizontal profile for predicting known deformation, the cover cup 1326 and Each cover, such as cover 16, may be coupled to a chamber. Caps and seals that are in place to facilitate negative pressure in the chamber during adjustment may be removed and the chamber may be ready for the process.

  [0095] An apparatus and method for manipulating the cross-sectional curvature or horizontal profile of a diffuser has been described. The diffuser may be manipulated to provide a horizontal profile that is one of planar, convex, or concave. The horizontal profile of the diffuser may be adjusted relative to the substrate support in the chamber. Without wishing to be bound by theory, if the substrate support exhibits a planar horizontal profile, and the diffuser exhibits a similar horizontal profile, it is fed into a process space, such as silane and hydrogen. It is believed that the process gas deposited will deposit amorphous silicon at a greater rate on the edge of the substrate as compared to deposition in the central region of the substrate. In one embodiment, the substrate support may assume a planar orientation and the diffuser's horizontal profile diffuses the process space allowing a larger amount of process gas to be guided above the substrate. In order to make it below the central region of the vessel, it is adjusted to be concave compared to a planar substrate support. This process space with a greater amount of process gas is believed to facilitate more uniform deposition across a large area substrate.

  [0096] Although several embodiments of the invention have been described, other and further embodiments of the invention may be devised without departing from the basic scope of the invention. The scope is defined in the claims.

It is a side view of a plasma chamber. It is a top view of one embodiment of a chamber cover. It is a top view of another embodiment of another chamber cover. FIG. 4 is a detailed view of one embodiment of a diffuser gravity support. FIG. 5 is a detailed exploded view of the diffuser gravity support shown in FIG. 4. It is a detailed top view of one embodiment of a gas block regulator and a meshing mechanism. It is detail drawing of the meshing mechanism in one side. It is a meshing mechanism detail drawing in another aspect. FIG. 6 is a schematic view of another embodiment of a diffuser gravity support. FIG. 6 is a partial schematic view of another embodiment of a diffuser gravity support. It is a top view of an orifice ring. It is a side view of an orifice ring. FIG. 6 is a partial schematic view of another embodiment of a diffuser gravity support including an orifice ring. FIG. 6 is a partial schematic view of another embodiment of a diffuser gravity support including an orifice ring. It is a top view of one embodiment of a backing plate. It is a top view of another embodiment of a backing plate. FIG. 6 is a partial schematic view of another embodiment of a diffuser gravity support. It is a figure which shows one Embodiment of a pivot support body. FIG. 4 is a detailed view of a diffuser coupled to a pivot support. FIG. 4 is a detailed view of a pivot support coupled to a backing plate. FIG. 4 is a detailed view of a pivot support 1300 coupled to a diffuser. FIG. 6 is a plan view of one embodiment of a backing plate having a plurality of pivot supports coupled to the backing plate. FIG. 6 is a plan view of another embodiment of a backing plate having a plurality of pivot supports. FIG. 6 is a plan view of another embodiment of a backing plate having a plurality of pivot supports and a plurality of threaded supports. FIG. 6 is a cross-sectional view of a diffuser having a concave horizontal profile. FIG. 6 is a cross-sectional view of a diffuser having a convex horizontal profile.

DESCRIPTION OF SYMBOLS 1 ... Screw, 2 ... Jam nut, 3 ... Screw, 4 ... O-ring, 5 ... Gas supply source, 6 ... Port, 8 ... O-ring, 10 ... Side wall, 11 ... Bottom, 12 ... Substrate support, 14 ... large area substrate, 15 ... diffuser gravity support, 16 ... cover plate, 17 ... gas block, 18 ... exhaust channel, 19 ... longitudinal lumen, 19a ... tilted lumen, 19b ... extended lumen, 19c ... lateral lumen, 20 ... diffuser, 21 ... large plenum, 22 ... orifice, 23 ... small plenum, 24 ... plasma source, 25 ... ground, 27 ... chamber, 28 ... backing plate, 29 ... vacuum pump, 31 ... Female connector, 32 ... Male connector, 33 ... Circular gap, 34, 35, 37, 38, 41 ... Insulating spacer, 45 ... O-ring, 46 ... O-ring, 50 ... Support block, 5 ... support sheet, 52 ... weld, 53 ... annular collar, 55 ... upper lip, 56 ... outer periphery of upper part, 57 ... flexible suspension, 57 ... flange, 58 ... middle part, 59 ... lower part, 60 ... Intermeshing connection, 61 ... Overhang portion, 62 ... Cut-out portion, 65 ... Shoulder region, 66 ... Inner diameter of upper region surface, 80 ... Process space, 100 ... Chamber, 210 ... Central region, 300 ... Gas passage, 501 ... Channel, 800 ... O-ring, 804 ... outer diameter, 806 ... first inner diameter, 808 ... second inner diameter, 810 ... first bending member, 820 ... second bending member, 830 ... screw shaft, 840 ... cavity, 850 ... threaded cavity, 860 ... hole, 870 ... annular bevel, 910 ... gap space, 1010 ... central region, 1019 ... lumen, 1020 ... threaded support Body, 1030 ... hole, 1032 ... adjustment member, 1040 ... female screw, 1048 ... opening, 1048a ... another opening, 1050 ... gas supply system, 1050a ... gas supply system, 1052 ... washer, 1062 ... O-ring, 1063 ... lumen, 1063 ... tubular partition wall, 1065 ... cap plate, 1066 ... clamping ring, 1068 ... screw, 1070 ... through hole, 1300 ... pivot support, 1302 ... ball stud, 1304 ... ball stud housing, 1306 ... upper pivot Members, 1308 ... lower pivot member, 1310 ... threaded portion, 1312 ... coupling mechanism, 1314 ... lower seat, 1316 ... seat housing, 1318 ... male connector, 1320 ... central lumen, 1322 ... support sheet , 1323 ... Plenum, 1324 ... Sealed bro 1326 ... cover cup, 1328 ... first lumen, 1330 ... expansion lumen, 1332 ... tubular shield, 1402 ... screw connection, 1404 ... passage, 1406 ... shoulder, 1408 ... conical opening, 1410 ... pin , 1412 ... screw, 1414 ... channel, 1416 ... recess, 1502 ... central opening, 1504 ... small diameter part, 1506 ... upper part, 1508 ... shoulder region, 1510 ... O-ring, 1512 ... O-ring, 1514 ... O -Ring, 1516 ... Nut, 1518 ... Jam nut, 1522 ... O-ring groove, 1524 ... Fastener, 1526 ... Upper support sheet, 1602 ... Cover bolt, 1604 ... O-ring, 1606 ... Covered area, 1608 ... Possible Lateral motion, 1610 ... upper surface.

Claims (36)

An apparatus for supporting a gas distribution plate in a chamber,
A chamber;
A backing plate in the chamber having a central region and at least one opening present in the central region;
A gas distribution plate in a chamber having a central region;
At least one support member that resides in at least one opening in the backing plate and engages a central region of the gas distribution plate, wherein the gas distribution plate is suspended by the at least one support member Members,
A device comprising:   The apparatus of claim 1, wherein the at least one support member is a diffuser gravity support.   The apparatus of claim 1, wherein the at least one support member is a threaded support.   The apparatus of claim 1, wherein the at least one support is a pivot support.   The apparatus of claim 1, wherein at least a portion of the gas distribution plate is supported around the periphery by a flexible connection coupled to the chamber.   The apparatus of claim 2, wherein the diffuser gravity support has a male engagement mechanism and the gas distribution plate has a female engagement mechanism.   The apparatus of claim 2, wherein the support member is configured to couple to a power source and to be electrically coupled to the gas distribution plate. The chamber
A substrate support having a planar horizontal profile, wherein the substrate support is disposed below the gas distribution plate and the gas distribution plate has a concave horizontal profile;
The apparatus of claim 1, further comprising:   The apparatus of claim 1, wherein the chamber further comprises a gas passage for supplying process gas to the gas distribution plate. A gas distribution plate for supplying process gas to a reaction zone in the process chamber,
A rectangular plate comprising a plurality of orifices formed therethrough and having a central region;
At least one female engagement mechanism formed in a central region adapted to receive at least one removable support member;
A gas distribution plate comprising:   The apparatus of claim 10, wherein the at least one female engagement mechanism is a screw connection.   The apparatus of claim 10, wherein the at least one female engagement mechanism is a plurality of slots adapted to engage a plurality of keys.   The apparatus of claim 10, wherein the removable support member is configured to supply process gas to the plurality of orifices.   The apparatus of claim 10, wherein the removable support member is configured to electrically couple to the rectangular plate.   The apparatus of claim 10, wherein the rectangular plate exhibits one of a planar horizontal profile, a concave horizontal profile, and a convex horizontal profile. A diffuser for supplying process gas to a reaction zone in the chamber,
A rectangular plate having a plurality of openings formed therethrough and having four edges and one central region;
A support coupled to each of the four edges;
At least one support member coupled to the central region, wherein by adjusting the at least one support member, the central region provides a horizontal profile that is one of planar, concave, or convex A support member that is adjustable so that
A diffuser comprising:   The diffuser according to claim 16, wherein the horizontal profile is concave and the horizontal profile of a substrate disposed on a substrate support in the chamber is planar.   A plurality of support members coupled to the central region, wherein one of the plurality of support members further comprises a support member coupled to the gas source and adapted to supply process gas to the rectangular plate. The diffuser according to claim 16.   The diffuser of claim 18, further comprising a plurality of female engagement mechanisms for receiving a plurality of support members. An apparatus adapted to support a gas distribution plate in a deposition chamber,
A rectangular plate having a central region and coupled to the deposition chamber;
At least one opening in the central region adapted to receive at least one removable support member;
A device comprising:   A diffuser below the rectangular plate, further comprising a diffuser having at least one female-engagement mechanism formed in the diffuser to accommodate at least one removable support member; The apparatus of claim 20.   The apparatus of claim 21, wherein the at least one female engagement mechanism is a plurality of slots adapted to engage a plurality of keys.   The apparatus of claim 21, wherein the at least one female engagement mechanism is a bolt adapted to engage a threaded connection formed in the diffuser.   The apparatus of claim 21, wherein the removable support member is configured to supply process gas to the plurality of orifices.   The apparatus of claim 21, wherein the removable support member is configured to electrically couple to the rectangular plate.   24. The rectangular plate of claim 21, wherein the rectangular plate is planar and the diffuser is configured to exhibit one of a planar horizontal profile, a concave horizontal profile, or a convex horizontal profile. apparatus. A diffuser for supplying process gas to a reaction zone in the chamber,
A rectangular plate having a plurality of openings formed therethrough and having four edges and one central region;
A support coupled to each of the four edges;
A horizontal direction, at least one support member adapted to couple to the central region, wherein the central region is one of planar, concave, or convex by adjusting the at least one support member; A support member that is adjustable to provide a profile;
A diffuser comprising:   28. The diffuser of claim 27, wherein the horizontal profile is concave and the horizontal profile of a substrate disposed on a substrate support in the chamber is planar. A plurality of support members coupled to the central region, wherein one of the plurality of support members is coupled to a gas source and adapted to supply process gas to the rectangular plate;
The diffuser of claim 27, further comprising:   28. The diffuser of claim 27, further comprising a plurality of female engagement mechanisms for receiving a plurality of support members. A support member for supporting the gas distribution plate,
A body having a first end and a second end, the second end having a male engagement mechanism adapted to couple to a female engagement mechanism disposed on the gas distribution plate A support member comprising a main body.   32. A support member according to claim 31, wherein the male engagement mechanism comprises a screw connection.   32. A support member according to claim 31, wherein the male engagement mechanism comprises a plurality of keys.   32. A support member according to claim 31, wherein the support member comprises a pivot support.   32. A support member according to claim 31, wherein the support member comprises a gravity support. A gas distribution plate for thin film deposition,
A rectangular plate having a plurality of orifices formed through the rectangular plate;
The central area and the periphery,
At least one female engagement mechanism formed in the central region, wherein the periphery is planar and the central region is concave;
A gas distribution plate comprising:

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