CN101921997A - Diffuser gravity support - Google Patents
Diffuser gravity support Download PDFInfo
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- CN101921997A CN101921997A CN2010101556562A CN201010155656A CN101921997A CN 101921997 A CN101921997 A CN 101921997A CN 2010101556562 A CN2010101556562 A CN 2010101556562A CN 201010155656 A CN201010155656 A CN 201010155656A CN 101921997 A CN101921997 A CN 101921997A
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- scatterer
- backboard
- chamber
- strut member
- rectangular plate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45565—Shower nozzles
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/332—Coating
- H01J2237/3321—CVD [Chemical Vapor Deposition]
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Plasma Technology (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
An apparatus and method for supporting a substantial center portion of a gas distribution plate is disclosed. At least one support member is capable of engaging and disengaging the diffuser with a mating connection without prohibiting flow of a gas or gases through the diffuser and is designed to provide vertical suspension to a diffuser that is supported at its perimeter, or capable of supporting the diffuser without a perimeter support. In one aspect, the at least one support member is a portion of a gas delivery conduit and in another embodiment is a plurality of support members separated from the gas delivery conduit. The at least one support member is capable of translating vertical lift, or vertical compression to a center area of the diffuser. A method and apparatus for controlling gas flow from the gas delivery conduit to the gas distribution plate is also disclosed.
Description
The present invention is filed on September 19th, 2005, and application number is 200510106396.9, is entitled as the dividing an application of patent application of " diffuser gravity support ".
Technical field
The present invention relates to supply gas to a plasma chamber, particularly relate to and in plasma chamber, to support a gas distribution grid.
Background technology
Flat-panel monitor uses electronic installation, as the active matrix and the thin film transistor (TFT) of isolator, conductor, produce be used for various as TV monitor, PDA(Personal Digital Assistant), mobile telephone, and the flat screen that installs such as computer screen.Generally, these flat-panel monitors are with two thin sheet glass, a polymer materials, or other baseplate material that is fit to is made.The matrix of a liquid crystal material layer or a metallic contact, the semiconductor active layer, and a dielectric layer by a series of successive steps be deposited the deposition and be sandwiched between two thin plates, these two thin plates link together in order to form a large-area substrates, and it has at least one flat-panel monitor position thereon.At least one flat-panel monitor will comprise one be connected to a power supply unit conducting film its, this power supply unit will change the direction of liquid crystal material and produce a pattern displaying on this screen surface.
These processing procedures need large-area substrates through several successive fabrication steps the active matrix material to be deposited on this substrate usually.Chemical vapor deposition (CVD) and plasma reinforced chemical vapour deposition (PECVD) are to be used for this more sedimentary currently known methodss.These known processing procedures need this large-area substrates to accept between depositional stage up to 300 ℃ to 400 ℃ or higher temperature, and are maintained at a fixed position with respect to a gas distribution grid or scatterer, in order to guarantee to be deposited the homogeneity of layer.The general area that limits of this scatterer, it is equal to or greater than the area of this substrate.If scatterer is twisted between depositional stage, then this processing procedure just can't produce uniform deposition, and this will produce a flat-panel monitor that can't use.
Flat-panel monitor increased owing to the relation of the market acceptance raising of this technology dimensionally significantly in recent years.The size of previous large-area substrates from generation to generation is about 500 millimeters and takes advantage of 650 millimeters, has now increased to about 1800 millimeters and has taken advantage of about 2200 millimeters or bigger size.Increase on this size has impelled scatterer also to increase dimensionally thereupon, with treatment substrate fully.Bigger scatterer size faces the challenge that needs design one can be exposed to the sagging scatterer of high temperature opposing of following time between depositional stage.
Scatterer typically is a plank, and it is supported on the top of this large-area substrates in mode spaced apart and has several and is used for and will disperses the perforate of process gas, and typically has and pending substrate area identical.Scatterer generally all is to be formed from aluminium and can to expand and shrink when standing this CVD or PECVD processing procedure and normally supported in order to the spacing of control between this scatterer and this substrate near the edge.Yet this edge supported design does not provide any support to middle body, and this will be elongated and produce sagging, and more serious under the high process temperatures during CVD or the PECVD processing procedure under the effect of gravity along with the time.
Summary of the invention
The present invention relates to be used for supporting a gas distribution grid or the method and apparatus of scatterer in a plasma chamber.In one embodiment, this scatterer is positioned at inside by one or is arranged on central strut member and supports, and this strut member is connected on the wall in gas distribution grid and this chamber.The present invention can make the pyritous of this scatterer during bearing plasma reinforced chemical vapour deposition simultaneously, advantageously avoids because the gravity, the heat that are applied to it or the distortion that strength produced that pressure brought out.This at least one strut member is connected between the backboard in this scatterer and this chamber, and can adjust the flat orientation of this scatterer.This at least one strut member constituted before or after this chamber vacuumizes, and adjusted the profile of this scatterer.In another embodiment, this at least one strut member is adjusted the profile of this scatterer by adjusting the some screws that are connected to this at least one strut member.This gravity support can be installed on this scatterer, and can not have influence on gas stream and cross this scatterer.
In one embodiment, this at least one strut member is a gravity support.This gravity support comprises a gas inlet, and the gas stream in several apertures on providing from this gas inlet to this diffuser plate, provides this scatterer vertical support simultaneously.This gravity support can also break away from by a coupling mechanism and this scatterer.In another embodiment, this orifice ring constitutes and is connected to this gravity support, and provides a gas stream adjustment capability for this scatterer.
In another embodiment, a gas distribution grid is supported on this chamber by first plate that is positioned at a chamber, and this first plate has a central area and is formed with at least one perforation on it.Below this first plate is one second plate, and as a gas distribution grid, it has at least one compatible portion and aligns with at least one perforation on this first plate.Adopt at least one threaded strut member to engage, support this gas distribution grid by a middle body at this gas distribution grid with this at least one compatible portion.This is at least one to have threaded portion to be connected between this scatterer and this backboard.This backboard is thicker than this scatterer on section, so provide an immobilized to support.Because relative thickness reaches the relation that perforation is arranged on diffuser plate, this scatterer more has flexibility for this backboard, and this can be adjusted the profile of this scatterer by adjusting this at least one threaded strut member.
In another embodiment, disclose a kind of method that is used for changing the horizontal profile of a scatterer in a plasma chamber.This method has comprised and supports a scatterer it has a coupling mechanism and is positioned at the middle section of this scatterer, a strut member is engaged with this compatible portion, and this strut member of adjustment changes the profile of this scatterer.On the one hand, this method can be implemented this adjustment before or after this chamber is applied in vacuum.In one embodiment, this adjustment comprises horizontal profile with this scatterer and changes over and have the horizontal profile of a planar, the horizontal profile of a concave surface, or at least a in the horizontal profile of a convex surface.
In another embodiment, this at least one strut member is a pivot support.This pivot support comprises a goalpost bolt, and it is connected to a head lamp brush guard pivot spare separably.This head lamp brush guard pivot spare is connected to the backboard in this chamber and this goalpost bolt is used for being connected to separably this scatterer.This goalpost bolt has a threaded portion, the adjustment that it extends through this head lamp brush guard pivot spare and the horizontal profile of this scatterer is provided by at least one nut that is connected to this threaded portion.
In another embodiment, provide a kind of method that deposits on film to a substrate.The step that this method comprises is positioned on the substrate support under the gas distribution grid for a substrate being placed on one of a reaction chamber, this gas distribution grid has a trimmable horizontal profile, allow a process gas flow through to be located at several perforates on this gas distribution grid, between this gas distribution grid and this substrate, form a plasma and deposit a film on this substrate.This method can further comprise with this process gas be heated to about 350 ℃ to about 450 ℃ temperature.In one embodiment, the horizontal profile of this gas distribution grid shows the shape of a concave surface.In another embodiment, this film is an amorphous silicon.In another embodiment, this horizontal profile is to use at least one strut member to be adjusted, and in another embodiment, several strut members are used to adjust this horizontal profile.
In another embodiment, put down in writing a kind of method of horizontal profile of adjustment one gas distribution grid, its step that comprises for provide a gas distribution grid its have a planar periphery and a middle section, adjustment is connected at least one strut member of this middle section, with the profile that forms a level in this middle section, this horizontal profile is a planar with respect to this planar periphery, at least a in profile concave surface or convex surface.In one embodiment, this adjustment is to carry out under the condition of vacuum.
In another embodiment, put down in writing a kind of method of horizontal profile of adjustment one gas distribution grid, its step that comprises is for providing a reaction chamber, it has a gas distribution grid between a backboard and a substrate support, the distance of measurement between this substrate support and this gas distribution grid, adjustment is connected at least one strut member and this backboard of this gas distribution grid, an and horizontal profile of this gas distribution grid of formation, this horizontal profile is a planar with respect to this substrate support, at least a in profile concave surface or convex surface.In one embodiment, this adjustment comprises this at least one strut member of rotation.In another embodiment, this adjustment is implemented during for vacuum at this reaction chamber.In another embodiment, this at least one strut member is suitable for providing a process gas to this gas distribution grid.
Description of drawings
The present invention to above summary more particularly illustrates by reference example and accompanying drawing, so that can understand aforementioned feature of the present invention in more detail.Yet, it should be noted that accompanying drawing only illustrates general embodiment of the present invention, therefore should not be considered as the restriction of invention scope, the present invention also can be contained other equivalent embodiment.
Fig. 1 is the side-view of a plasma chamber.
Fig. 2 is the top view of an embodiment of chamber lid.
Fig. 3 is the top view of another embodiment of chamber lid.
Fig. 4 is the exploded view of an embodiment of a diffuser gravity support.
Fig. 5 is an exploded view of the diffuser gravity support among Fig. 4.
Fig. 6 A is the thin portion top view of the embodiment of the adjustment of choke piece and coupling (mate) mechanism.
Fig. 6 B is the details drawing of the one side of a coupling mechanism.
Fig. 6 C is the details drawing on the other hand of a coupling mechanism.
Fig. 7 is the synoptic diagram of another embodiment of a diffuser gravity support.
Fig. 8 is the part synoptic diagram of another embodiment of a diffuser gravity support.
Fig. 9 A is the top view of an orifice ring.
Fig. 9 B is the side-view of an orifice ring
Figure 10 A one has comprised the part synoptic diagram of another embodiment of a diffuser gravity support of an orifice ring.
Figure 10 B one has comprised the part synoptic diagram of another embodiment of a diffuser gravity support of an orifice ring.
Figure 11 A is the top view of an embodiment of a backboard.
Figure 11 B is the top view of another embodiment of a backboard.
The part synoptic diagram of another embodiment of Figure 12 one diffuser gravity support.
Figure 13 is an embodiment of a pivot support.
Figure 14 is the details drawing that is connected to the scatterer of a pivot support.
Figure 15 is the details drawing that is connected to the pivot support of a backboard.
Figure 16 is the details drawing that is connected to the pivot support 1300 of a scatterer.
Figure 17 A has the top view that several pivot supports connect an embodiment of backboard thereon.
Figure 17 B is the top view of another embodiment with backboard of several pivot supports.
Figure 17 C is the top view of another embodiment with backboard of several pivot supports and several threaded strut members.
Figure 18 A is the sectional view of scatterer with horizontal profile of a concave surface.
Figure 18 B is the sectional view of scatterer with horizontal profile of a convex surface.
Description of reference numerals
1 screw, 2 jam nuts
3 screws, 4 O shapes ring
5 gas sources, 6 portholies
8 O shapes are encircled 10 sidewalls
11 bottoms, 12 substrate supports
14 large-area substrates, 15 diffuser gravity supports
16 cover plates, 17 choke pieces
19 vertical holes, 18 exhaust-ducts
The hole that the angled hole 19b of 19a extends
19c transverse holes 20 scatterers
21 big inflatable chamber 22 apertures
23 little inflatable chamber 24 plasma sources
25 ground connection, 27 tangent planes
28 backboards, 29 vacuum pumps
31 female connecting piece 32 public connecting pieces
33 annular spaces 34,35,37,38,41 dielectric spacer
45,46 O shapes are encircled the suspension elements of 47 deflections
50 back-up blocks, 51 supporting seats
52 welding, 53 annular collar
The external diameter on 55 upper lips, 56 tops
57 flange portions, 58 middle bodies
59 bottoms, 60 coupling connecting pieces
61 extensions 62 cut off the district
Surface, district in the 65 shoulder districts 66
100 chambeies, 80 processing procedure districts
210 middle sections, 300 gas passages
501 passages, 800 orifice rings
804 external diameters, 806 first internal diameters
808 second internal diameters, 810 first bools
The handle of 820 second bools, 830 screws
840 depressions, 850 threaded depressions
860 holes, 870 annular slopes
1019 holes, 1020 threaded strut members
1030 holes, 1032 adjustment parts
1040 box threads, 1048 openings
Another opening 1050 gas delivery systems of 1048a
1050a gas delivery system 1052 packing rings
1062 O shapes are encircled 1063 tubular baffle
1065 cover plates, 1066 clamp rings
1070 perforation of 1068 screws
1300 pivot supports, 1302 goalpost bolts
1304 goalpost bolt shells, 1306 head lamp brush guard pivot spares
1308 times pivot member 1310 threaded portions
1312 connection mechanisms, 1314 bases
1316 shell 1318 public connecting pieces
1320 medium pores, 1322 supporting seats
1324 sealing blocks, 1323 inflatable chambers
1326 tea cups with a cover, 1,328 first holes
The 1330 hole 1332 tubulose shields that enlarge
1402 threaded connecting piece 1404 passages
1406 shoulders, 1408 conical aperture
1410 pins, 1412 screws
1414 pipelines, 1416 recesses
1502 central openings, 1504 reduced parts
1508 shoulder districts, 1506 tops
1510,1512,1514 O shapes are encircled 1516 nuts
1518 jam nuts, 1522 O shape circular groove grooves
1524 mounting blocks, 1526 packing rings
1528 upper support seats, 1602 lid bolts
1604 lid O shapes are encircled 1606 lid area
1608 sidewise movements, 1610 upper surfaces
Embodiment
Embodiments of the invention typically provide a kind of Apparatus and method for of a gas distribution grid in a reaction chamber that be used for supporting.In one embodiment, at least one strut member constitutes to support this gas distribution grid to be resisted by gravity and central sagging or bowl-typeization that high process temperatures was caused, makes this gas distribution grid remain on a horizontal profile of wanting.This horizontal profile of wanting can be the horizontal profile of a planar, the horizontal profile of a concave surface, or at least a in the horizontal profile of a convex surface.The horizontal profile of a gas distribution grid used herein or scatterer or orientation are meant the section of this gas distribution grid as shown in the drawing.In all embodiments, this gas distribution grid has at least one strut member, it is connected to a middle section of this gas distribution grid, wherein by adjusting this at least one strut member, this middle section can be adjusted in order to present a gas distribution grid with a horizontal profile, this horizontal profile is a planar, at least a in profile concave surface or convex surface.For fear of obscuring, identical label is represented similar assembly in the accompanying drawings.
Fig. 1 is the side-view in a chamber 100, the Circuits System that this chamber be fit to implement to be used to make a flat-panel monitor is in a large-area glass, chemical vapor deposition (CVD) or plasma reinforced chemical vapour deposition (PECVD) processing procedure on polymkeric substance or other substrate that is fit to.This chamber 100 constitutes and forms structure and assembly on a large-area substrates, being used for liquid-crystal display (LCD) or flat-panel monitor, or in the manufacturing of the photoelectric cell of solar battery array.These structures can be (bottom-gate) thin film transistors of the alternate arrangement of several back of the body passage etchings conversions, and it comprises several deposition step and masks in proper order.Other structure comprises that also p-n connects face, in order to be formed for the diode of photoelectric cell.
Chamber 100 constitute the deposition various materials on a large-area substrates, comprise conducting material (as, ITO, ZnO2, W, Al, Cu, Ag, Au, Ru or their alloy), dielectric substance (as, Si, SiO2, SiOxNy, HfO2, HfSiO4, ZrO2, ZrSiO4, TiO2, Ta2O5, Al2O3, their derivative or composition, semiconductor material (as, Si, Ge, SiGe, their hotchpotch or derivative), resistance barrier material (as, SiNx, SiOxNy, Ti, TiNx, Ta, TaNx, TaSixNy, or their derivative) and bonding/kind of brilliant material (as, Cu, Al, W, Ti, Ta, Ag, Au, Ru, their alloy and their composition).Can comprise metal, metal oxide, metal nitride, metal silicide or their composition by chamber 100 sedimentary metallic mixtures.For example, the containing metal compound comprises tungsten, copper, aluminium, silver, gold, chromium, cadmium, tellurium, molybdenum, indium, tin, zinc, tantalum, hafnium, ruthenium, their alloy or their composition.The specific examples of the containing metal compound of the conduction on the large-area substrates be can be formed or be deposited on by chamber 100, as gate electrode and other conductive layer, indium tin oxide, zinc oxide, tungsten, copper comprised, aluminium, silver, their derivative or their composition.Chamber 100 also constitutes deposit dielectric material and the semiconductor material under polymorphic, armorphous or parasitic kenel.For example, dielectric substance and semiconductor material can comprise silicon, germanium, carbon, their oxide compound, their nitride, their hotchpotch or their composition.Can be formed or be deposited on dielectric substance on the large-area substrates by chamber 100 and the specific examples of semiconductor material comprises parasitic silicon, polymorphic silicon, amorphous silicon, SiGe, germanium, silicon-dioxide, silicon oxynitride, silicon nitride, they hotchpotch (as, B, P or As), their derivative or their composition.This chamber 100 also constitutes accepts gas, as argon gas, hydrogen, nitrogen, helium or their composition, be used as a rinsing gas or vector gas (as, Ar, H2, N2, He, their derivative, or their composition).Use an example on 100 deposited amorphous type film to large-area substrates of chamber to finish as the precursor gases in a hydrogen carrier gas by using silane.
Use chamber 100 to come the various device and methods of deposit film on a large-area substrates, can file an application on July 1st, 2005, name be called " by gaseous diffuser curvature control plasma homogeneity " (Plasma Uniformity Control By Gas Diffuser Curvature) 11/173, find in No. 210 U.S. Patent applications, the content of this application is incorporated into herein by quoting at this.Can use other example of the various assembly that chamber 100 forms to file an application on July 12nd, 2004, name be called " 10/889 of the design control plasma homogeneity (PlasmaUniformity Control By Gas Diffuser Hole Design) by the gaseous diffuser hole; No. 683 U.S. Patent applications; and filed an application on April 20th, 2004; name be called " control the silicon nitride performance by control film forming precursor) (Controlling the Properties of a Silicon Nitride Film byControlling the Film Forming Precursors) 10/829, find in No. 016 U.S. Patent application, the content of these two applications is incorporated into herein by quoting at this.
Chamber 100 comprises a chamber sidewall 10, one bottoms 11, one substrate supports 12, and as a pedestal, it supports a large-area substrates 14.This chamber 100 also has a porthole 6, and as a switch-valve, it can be by optionally opening and closing so that the transmission of this large-area substrates 14.This chamber 100 also comprises a lid, and it has the exhaust-duct 18 of an encirclement one gas inlet manifold, and this gas inlet manifold comprises a cover plate 16, one first plates, as a backboard 28, and one second plate, as a gas distribution grid, for example, a scatterer 20.This scatterer 20 can be any suitable plane physical objects, and it is suitable for to providing several passages from a process gas that is connected to the gas source 5 in this chamber 100.This scatterer 20 is placed on the top of this substrate 14, and by at least one strut member suspension vertically, this at least one strut member is a diffuser gravity support 15 in this embodiment.In this embodiment, scatterer 20 also is suspended on the upper lip 55 of this exhaust-duct 18 by the suspension elements 47 of a deflection.The name that the suspension elements write up of one deflection was authorized on November 12nd, 2002 be called " be used for the plasma reaction chamber deflection suspension gas distribution plate " (Flexibly Suspended GasDistribution Manifold for A Plasma Chamber) 6,477, in No. 980 United States Patent (USP)s, this patent is by being incorporated into herein in this application.The suspension elements 47 of this deflection is suitable for supporting the expansion and the contraction of edge and this scatterer 20 of tolerable of this scatterer 20.Other marginal branch support member of this scatterer 20 can be used with this diffuser gravity support 15, and this scatterer strut member 15 can use under the marginal branch support member not having.For example, scatterer 20 can be supported by the strut member of deflection not at its periphery, or does not have supported in its edge.This diffuser gravity support 15 can be connected to this gas source 5, and its supply process gas to is installed in the choke piece 17 on this strut member 15.This choke piece 17 links with these scatterers 20 by vertical holes 19 that are located in this strut member 15, and supply process gas several apertures 22 to the scatterer 20.An example that can be used in the scatterer in this chamber 100 is documented in filed an application on July 1st, 2005, name be called " by gaseous diffuser curvature control plasma homogeneity " (Plasma Uniformity Control By GasDiffuser Curvature) 11/173, in No. 210 U.S. Patent applications, this application has been incorporated into this specification sheets in preamble.
This diffuser gravity support 15 is one to be connected to this backboard 28 symmetric body haply.This backboard 28 is the plank of a general plane, and it has a suitable perforation and is positioned at a middle section, and this control is diffusing thinks highly of force support 15 in order to accept, and is supported by this exhaust-duct 18 at its periphery place.The periphery of this backboard 28 is sealed by suitable O shape ring 45 and 46 at the junction point of backboard 28 with exhaust-duct 18, and this can open the inside in this chamber 100 and isolated from atmosphere on every side and prevent the process gas leakage.This diffuser gravity support 15 extends upward from this backboard 28, is passed in a hole on this lid 16.In this embodiment, adhere to the position that this diffuser gravity support 15 of this scatterer 20 is suitable for above it is positioned at this large-area substrates 14 and substrate support 12 on it and kept transfixion, this substrate support 12 then is suitable for this substrate 14 being raise and reducing, and transmits between a transmission and process position.
In when operation, process gas flows out from gas source 5 this chamber 100 has been depressurized to a suitable pressure by a vacuum pump 29 when.One or more process gas this choke piece 17 of passing through by this vertical hole 19, passes angled hole 19a, is deposited over a big inflatable chamber 21 that is formed between backboard 28 and the diffusion gas 20 then, and a little inflatable chamber 23 that is arranged in scatterer 20.Then, these one or more process gas produce a processing procedure district 80 from pass through several apertures 22 on this scatterer 20 of this big inflatable chamber 21 and little inflatable chamber 23 in order to a zone under this scatterer 20.In when operation, the gas that this large-area substrates 14 is raised processing procedure district 80 so far and excitation of plasma is deposited thereon, in order to form structure on this large-area substrates 14.One plasma can be formed in this processing procedure district 80 by a plasma source 24 that is connected to this chamber 100.This plasma source 24 can be a direct current power supply, a radio frequency (RF) power supply, or a remote plasma source.This RF power supply can by inductively or electric capacity be connected to this chamber 100.One plasma can pass through other mechanism, the plasma that brings out as a heat, and be formed in this chamber 100.Though plasma source 24 is shown as and is connected to this gravity support 15 in this embodiment, plasma source 24 also can be connected to other position in this chamber 100.
Fig. 2 is the top view of this chamber lid 16, and its demonstration is positioned at the relative position of this diffuser gravity support 15 of a central area 210 of this chamber lid 16.This central area 210 is defined as in this article at this chamber lid 16, provides this scatterer 20 1 point of suppon in the periphery of this backboard 28 and this scatterer 20, maybe can change any position of the horizontal profile of this scatterer 20.Also shown in the figure is, and this vertical hole passes this choke piece 17 and surrounded by an annular collar 53.Central area 210 an interior scatterer strut member and the gases that this diffuser gravity support 15 also can only be used as this chamber lid 16 can be provided to this scatterer 20 in other position in this chamber 100.One scatterer 20 and backboard 28 (they are not shown at this) are positioned under this chamber lid 16 typically.The size of scatterer 20 and backboard 28 is substantially equal to the size of this chamber lid 16.Scatterer 20 and backboard 28 have corresponding central area 210, and this can make any assembly shown in this figure engage with scatterer 20 and backboard 28.In addition, the assembly shown in this figure can engage or extend through this backboard 28 with this backboard 28.
Fig. 3 is the top view of another embodiment of this chamber lid 16, and it shows the another location of this diffuser gravity support 15 in this central area 210.With Fig. 2 in the same manner, a scatterer 20 and backboard 28 be shown in this figure, but it typically is positioned under this chamber lid 16.The size of this scatterer 20 and backboard 28 is substantially equal to the size of this chamber lid 16.Scatterer 20 and backboard 28 have corresponding central area 210, and this can make any assembly shown in this figure engage with scatterer 20 and backboard 28.In addition, the assembly shown in this figure can engage or extend through this backboard 28 with this backboard 28.This diffuser gravity support 15 is shown the central authorities that depart from this chamber lid 16, but still in this central area 210.This central area 210 can by localized this chamber of a point of suppon of this scatterer 20 lid 16 by the localized any zone of middle ground (and the corresponding position on this backboard and scatterer).Show that a gas path 300 is on this chamber lid 16, as another option that offers this scatterer one process gas by diffuser gravity support 15.
Fig. 4 is a detailed side view of the strut member of this scatterer, and it shows a scatterer 20 that is supported by scatterer strut member 15, and it comprises a back-up block 50 longitudinally, and it is by this backboard 28 that symmetric supporting seat 51 surrounds and suitably is connected to.The material of making this longitudinal ligament piece 50 is selected with the characteristic of its intensity and anti-process chemistry thing, and is suitable for claiming seat 51 to engage and supported by this supporting seat with this symmetric.The material that is used for this longitudinal ligament piece 50 can comprise iron and steel, titanium, aluminium or their composition.
Fig. 5 is the exploded view of this diffuser gravity support 15, and it has a longitudinal ligament piece 50 and is arranged in this symmetric supporting seat 51.This 51 is configured to be passed in the hole on this backboard 28 and connects by other the known method in welding 52 or this technology.This back-up block 50 is sealed with the suitable O type ring 4 and 8 on the inwall that is arranged on this supporting seat 51.The external diameter on the top 56 of this back-up block 50 is less than or equal to the external diameter on surface, district 66.Suitable groove is set at and holds O shape ring 4 and 8 on the external diameter on top 56.These O shapes ring 4,8 constitutes atmosphere around can preventing and enters into the inside in this chamber 100 and prevent that process gas from going to outside this chamber 100, and then seals this chamber 100.This longitudinal ligament piece 50 extends up through the hole on this chamber lid 16, and is as be shown in figures 2 and 3.These chamber lid 16 supports one annular collar 53 itself and this chambeies lids 16 reach this symmetric support and do 51 sealing UNICOMs.Several screws 1 and 3 are bonded to this back-up block 50 on this supporting seat 51, and this will describe in detail hereinafter.
With reference to Fig. 5 and 6A, several screws 1,3 are displayed in the top view of this longitudinal ligament piece 50, and this back-up block 50 that these screws are used to support and will be connected to this scatterer 20 is bonded on this supporting seat 51.This longitudinal ligament piece 50 has a symmetrical flange portion 57, and it has a diameter greater than the middle body 58 of this back-up block 50.This flange portion 57 is as acting on as stop part of this gravity support 15 or the limited part by the vertical movement that prevents gravity support when this flange portion 57 contacts with this supporting seat 51.This flange portion 57 also provides a coupling connecting piece to several elevate a turnable ladder screws 1 and as an adjustment mechanism by the box thread at the select location place of this flange portion 57.Isolating several isolated holes on this flange portion 57 provide mechanical type UNICOM for several lock screw 3, and these lock screw are suitable for and the threaded hole UNICOM mechanically in the district 66 of going up that is arranged on this supporting seat 51.Though four elevate a turnable ladder screws 1 are arranged, and four lock screw 3 shown in the figure, the present invention is not limited to these numbers and can uses the screw of any number that the adjustment of being wanted is provided and support to this scatterer 20.This gravity support 15 is connected between this scatterer 20 and this backboard 28.The section of this backboard 28 is thicker than the section of scatterer 20, and therefore the immobilized point of suppon is provided.Because relative thickness reaches the relation that perforation is arranged on scatterer 20, this scatterer 20 is that flexibility is more arranged for this backboard 28.The profile of this scatterer can be assigned to be adjusted by the flange part of adjusting this gravity support for this relative flexibility.
In when operation, this longitudinal ligament piece 50 is inserted in this symmetric supporting seat 51, and this scatterer 20 is connected to this back-up block 50 by coupling connecting piece 60, and this will describe in detail hereinafter.At this moment, this scatterer is supported (see figure 1) by the suspension elements 47 of this diffuser gravity support 15 and deflection.This diffuser gravity support 15 vertically adjusts by these several elevate a turnable ladder screws 1 then, allow this scatterer 20 that will be controlled present a horizontal profile of wanting, the profile of this level can be a planar, at least a in profile concave surface or convex surface.In one embodiment, the horizontal profile of being wanted of this scatterer 20 is the horizontal profiles that are different from this substrate support 12.In another embodiment, this horizontal wheel of wanting expands with the horizontal profile of this substrate support 12 similar.If this substrate support 12 is bent or is higher than periphery (or vice versa) in centre, scatterer 20 can be adjusted in order to the horizontal outline of this substrate support 12, by providing a processing procedure district 80 between this substrate 14 and this scatterer 20, this processing procedure district all equates at every bit.Perhaps, this scatterer 20 can be adjusted to the profile of a level, the profile of this level determined and different with the horizontal profile of this substrate support 12 by user or processing procedure, might not equate at every bit with processing procedure district 80 between this substrate 14 between this scatterer 20.Perhaps, the horizontal profile of this scatterer 20 can do not consider under the horizontal profile of this substrate support 12 chosen.
Sagging and the horizontal profile of a planar is the profile of the scatterer 20 wanted if scatterer 20 is in any position of this middle section, then these elevate a turnable ladder screws 1 (district 66 of going up of itself and this supporting seat 51 links) can be adjusted in order to the central area with scatterer 20 because of it and raise, and alleviate by gravity or that vacuum caused was central sagging.If the horizontal profile of the scatterer of being wanted 20 is the horizontal profile of a convex surface, this scatterer 20 can be by these elevate a turnable ladder screw 1 adjustment in order to raise the central area of scatterer 20 when being necessary.If the horizontal profile of the scatterer of being wanted 20 is the horizontal profile of a concave surface, these elevate a turnable ladder screws 1 can be raised by suitably rotating, and in be arranged on some lock screw 3 in the threaded hole on this supporting seat 51 suitably rotation be in order to shifting the extrusion effect on this scatterer 20 and this middle body of this scatterer 20 passed position below one towards this flange portion 57, thereby the horizontal profile that produces a concave surface is on this scatterer 20.Perhaps, this scatterer 20 need not vertical adjustment and lock screw 3 can be adjusted in order to scatterer is locked on this position.
When scatterer 20 be adjusted to the orientation wanted and scatterer 20 show one want horizontal profile the time, one locking or chucking nut 2 are promptly suitably rotated in order to pin this elevate a turnable ladder screw 1, prevent to transfer to the subsequent motion of this elevate a turnable ladder screw 1 on this scatterer 20 thus.These some lock screw 3 are suitably screwed then in order to prevent that any part relevant with this gravity support 15 from having any follow-up motion.If want to have the profile of a concave surface on this scatterer 20, this elevate a turnable ladder screw 1 can suitably be rotated screwing, and these chucking nuts 2 are used to prevent that any part relevant with this gravity support 15 from having any follow-up motion.In other words, when wanting to allow this scatterer 20 that the horizontal profile of a concave surface is arranged, the effect of these lock screw 3 is to be used for adjusting, elevate a turnable ladder screw 1 and respectively to tighten 2 on nut be effect as lockout mechanism.
Though said process is that atmosphere gets off to describe around, but come adjustment that the horizontal profile of this scatterer 20 is done also can apply vacuum just enforcement after this chamber 100 via above-mentioned process, in order to adjust this scatterer 20 compensate because of pressure at this substrate support 12, caused distortion on this backboard 28 or the scatterer 20.The horizontal profile of the scatterer 20 that the change that any pressure causes all can be determined and be wanted all can produce.On this chamber 100 all be not the perforate that is used for the vacuum purpose all can be sealed during this processing procedure and O shape ring 4 and 8 be suitable for providing a suitable seal, allow this longitudinal ligament piece 50 motions simultaneously.No matter be atmosphere or under vacuum around, when when adjusting the horizontal profile of this scatterer, operator can use measuring apparatus, as at least one time meter, decide ordering parameter and the relative distance between substrate support 12 and scatterer 20.
Fig. 5 and 6B-6C show an embodiment of a coupling connecting piece 60, are the structure of a groove and key in this embodiment.This longitudinal ligament piece 50 is connected to this scatterer 20 by this coupling connecting piece 60 under one and with these backboard 28 position adjacent places.In one embodiment, this scatterer 20 is manufactured into and comprises a female connecting piece 31, and as several symmetrical channels, this back-up block 50 then is manufactured into and comprises a public connecting piece 32, as several symmetrical keys.Female connecting piece 31 is comprised in this scatterer 20, should then be comprised in this back-up block 50 by public affairs connecting piece 32.Though have four female connecting pieces 31 and four public connecting pieces 32 to be displayed among these exemplary figure, the more or less quantity of this number also can be used.Perhaps, public connecting piece 32 can be one screw member to be arranged it is suitable for being complementary with corresponding box thread on this scatterer 20, produces a coupling connecting piece 60 by the threaded connection part thus.
Fig. 6 B shows a top view of this coupling connecting piece 60, and it illustrates the B-B view of Fig. 5.This figure is depicted as relevant these vertical holes 19, bottom 59 of this longitudinal ligament piece 50 and the detailed part of angle hole 19a, and wherein several public connecting pieces 32 are in a zone between the 19a of these angle holes.This scatterer 20 has aperture 22, and it is suitable for supporting these public connecting pieces 32 several extensions 61, and several cut off district 62, and it constitutes public connecting piece 32 can be passed through.
With reference to Fig. 5, these public connecting pieces 32 have its external diameter less than this flange 57 of an external diameter, and it is equal to or less than the internal diameter in the shoulder district 65 of this supporting seat 51 to have an external diameter.The surface, district 66 of going up of this supporting seat 51 has its internal diameter greater than this shoulder district 65 of an internal diameter.The bottom 59 of back-up block 50 have an external diameter its less than the external diameter of these public connecting pieces 32 and have an external diameter its less than this middle body 58.The top 56 of this back-up block 50 have an external diameter its less than this flange 57 and have an external diameter its greater than this middle body 58.The design of this diameter allows this back-up block 50 that two mechanical stop sections can be provided: a shoulder district 65 that is positioned at this supporting seat 51, another is positioned at the zone of distinguishing under 66 of going up of flange 57 and this supporting seat 51.
The coupling connecting piece 60 that is shown among Fig. 6 B is in the position of a non-locking, in order to demonstrate the relative position of this angled hole 19a.Before adjustment and lock program mentioned above, this back-up block 50 is inserted in this supporting seat 51, and public connecting piece 32 is inserted in the cut-out district 62 in the zone between these extensions 61 of the part of scatterer 20.This supporting seat 51 is rotated 45 degree then to a latched position, shown in Fig. 5 C.These cut off district 62 and remain in this scatterer 20, and public connecting piece 32 then is placed under these extensions 61.Cut off district 62 and produce spaces, it is aimed at the hole 19a of this angle as passage 501, and these spaces can provide the air-flow laminar flow from this vertical hole 19, enter into this big inflatable chamber 21 and little inflatable chamber 23.Then, during processing procedure, process gas is scattered by several apertures 22 on this scatterer 20.What should be noted is that aperture 22 is still continued to extend by gravity support 15 occupied zones this scatterer 20, provides a unaffected gas stream by this scatterer 20 thus.
Fig. 7 is the synoptic diagram of another embodiment of this diffuser gravity support 15.Shown in this figure is one to have a longitudinal ligament piece 50 from these vertical hole 19 extended elongated hole 19b, and this vertical hole links with this little inflatable chamber 23.This elongated hole 19b can be added in order to provide relatively large process gas to this little inflatable chamber 23, increases the amount and the flow rate that flow to the process gas in this processing procedure district 80 via these apertures 22 that are positioned at this longitudinal ligament piece 50 thus.
Fig. 8 is another embodiment of this diffuser gravity support 15.In this embodiment, longitudinal ligament piece 50 has a vertical hole 19 itself and several transverse holes 19c intersection.This longitudinal ligament piece 50 has an annular space 33 in this bottom 59, and it is suitable for enlarging the area of the little inflatable chamber in this diffusion gas 20.This figure also demonstrates a backboard 28, and it has the tangent plane 27 of a circumference in the bottom, and this tangent plane is suitable for increasing the surface-area of this big inflatable chamber 21.
Fig. 9 A is the top view of an orifice ring 800.In this embodiment, this orifice ring 800 comprises at least two parts, as one first bool 810 and second bool 820.This first bool has at least one depression 840, and it is used to hold the handle of a screw 830.This screw 830 can have one and threaded portion be arranged it is accommodated in the threaded depression 850 of this second bool 820.Other embodiment also can be implemented, as the orifice ring 800 of a single-piece, or by more than two members via suitable combination and be installed in this chamber and the orifice ring of forming.
Fig. 9 B is a side-view of the orifice ring 800 among Fig. 9 A.This orifice ring 800 has an external diameter 804, one first internal diameters 806, and one second internal diameter 808.This first internal diameter 806 constitutes the external diameter of the bottom 59 that surrounds this longitudinal ligament piece 50.Big and each internal diameter of this second internal diameter 808 to the first internal diameters 806 can be separated by an annular slope 870.This figure also demonstrates the periphery that several holes choma hole 860 is set up around this orifice ring 800.
Figure 10 A is for similar with Fig. 8 and comprise the detailed partial graph of the diffuser gravity support 15 of this orifice ring 800.This orifice ring 800 has one first bool 810 and one second bool 820, and it surrounds the bottom 59 of this longitudinal ligament piece 50.Each bool all has several holes choma hole 860 and is centered around on the external diameter, and in this embodiment, these aperture annular distances are suitable for aiming at several transverse holes 19c.Orifice ring 800 provides from this vertical hole 19 to the adjustment function of a process gas in this processing procedure district 80.By changing the diameter in these holes 860, air-flow promptly can be subjected to the restriction of the diameter in hole 860.Perhaps, this air-flow can limit by the degree of registration that changes these holes 860 and this transverse holes 19c.
For example, when a gas stream during through this diffuser gravity support 15, can pass through this vertical hole 19 and do not arrive these transverse holes 19c of this gas not restrictedly.The diameter of these aperture annular distances 860 is littler than the diameter of these transverse holes 19c.Restriction and a part of gas that can be subjected to aperture annular distance 860 from transverse holes 19c effluent air can flow into the space 910 in a space.Pass through downwards then passage 501 and enter into this annular space 33 of gas in this void space 910, thus from this little inflatable chamber 23 make-up gas stream by aperture 22.Be not subjected to any airflow that orifice ring 800 hinders aperture annular distance 860 of can passing through and enter into big inflatable chamber 21.This orifice ring 800 is configured to allow the part of the aperture annular distance 860 of flowing through of this gas strike on this periphery tangent plane 27, thus with the gas turnover of a part downwards.The present invention can also not form a void space 910, can be manufactured into as this orifice ring and have only an internal diameter.Perhaps, the bottom 59 of this longitudinal ligament piece 50 can comprise an elongated hole 19b, flow to the stream of this little inflatable chamber 23 in order to this gas one to be provided.As indicated above, this orifice ring 800 can be manufactured according to the gas volume of specific gas flow rate or user's decision, places, and adjust.
Figure 10 B is the detailed partial graph that comprises the diffuser gravity support 15 of this orifice ring 800 with the embodiment class Sihe of Fig. 4.This orifice ring 800 has one first bool 810 and one second bool 820, and it surrounds the bottom 59 of this longitudinal ligament piece 50.Each bool all has several holes choma hole 860 and is centered around on the external diameter, and in this embodiment, these aperture annular distances are suitable for aiming at several transverse holes 19c.In another embodiment, these aperture annular distances 860 are not aimed at transverse holes 19c fully.In this embodiment, orifice ring 800 can be rotated the air-flow that flows to big inflatable chamber 21 in order to further restriction from these transverse holes 19c.
Figure 11 A is a top view that is used for a gas distribution grid is supported on another embodiment of the strut member in the chamber.One backboard 28 has several holes 1063 and is formed and passes a central area 1010.Each hole in these holes 1063 all is suitable for holding a threaded strut member 1020, and as a bolt, it constitutes with a corresponding compatible portion on this scatterer 20 and engages.One scatterer 20 (not shown) at this typically be positioned at this backboard 28 under.The size that this scatterer 20 has is substantially equal to the size of this backboard 28.Scatterer 20 have a correspondence central area 1010 its constitute any assembly that can make among this figure and engage with scatterer 20.Though there are 12 holes to be illustrated with symmetric form in this embodiment, these holes 1063 on this backboard 28 can be any pattern, number and sizes.Pattern is in the perforate 1048 on this backboard 28 that has shown in this figure, and it is fit to hold a gas delivery system 1050, in order to provide process gas to scatterer 20.This scatterer also can have a suitable tie point that is formed in it, in order to hold this gas delivery system 1050.
Figure 11 B one is used for supporting the top view of another embodiment of the diffuser gravity support of a gas distribution grid in a chamber.This embodiment and the embodiment that is shown among Figure 11 A are similar, and its difference is in the off-centre setting of the pattern of threaded strut member 1020 and perforate 1048.As shown in Figure 11 A, scatterer 20 is in this figure and not shown but be positioned at typically under this backboard 28.The size one that scatterer 20 has is substantially equal to the size of this backboard 28.Scatterer 20 have a correspondence central area 1010 its constitute any assembly that can allow among this figure and engage with scatterer 20.
Figure 12 is the schematic side view of the scatterer 20 in a chamber.This chamber has chamber lid 16 and offers at least one perforate 1048 on it and be positioned at its central area, and it is suitable for holding a gas delivery assembly 1050.This gas delivery assembly 1050 constitutes acceptance and also this process gas is delivered to a big inflatable chamber 21 via a hole 1019 from the process gas of a gas source 5.This process gas several holes 22 that is located on this scatterer 20 of passing through then arrives a processing procedure district 80.With at other embodiment in the same manner, scatterer 20 is suitable for being connected to a plasma source 24 allows a plasma can be formed in this processing procedure district 80.
This chamber 100 has several threaded strut members 1020, and as bolt, it extends through one first plate, as a backboard 28, arrives one second plate, as this scatterer 20.This gas delivery assembly 1050 can form as one with this backboard 28, or this backboard 28 can be suitable for holding this gas delivery assembly 1050, is passed in the perforation of one on this backboard 28 1070.These threaded strut members 1020 are with showing high tensile intensity and can not making with the material that the process chemistry thing reacts, as stainless steel, and titanium, aluminium, or their combination.A coating that can resist processing be made and can further be plated to these threaded strut members 1020 can with above-mentioned any material, as aluminium.This backboard 28 has several holes 1030 formation and passes this central authorities.In these threaded strut members 1020 each all is to have the screw thread of a screw thread and a part to be suitable for and the compatible portion on this scatterer 20, as box thread 1040, engages, and this compatible portion is corresponding to the several holes 1030 on this backboard 28.Box thread is set in the suitable hole, and this Kong Buhui interferes with the some holes 22 on this scatterer 20.Same in this figure, show be a tubular baffle 1063 and cover plate 1065 its cover each tubular baffle 1063.This cover plate 1065 provides near the approach of these threaded strut members 1020 and with this tubular baffle 1063 provides a sealing to isolate ambient atmosphere.This cover plate 1065 can be sealed with any known method, as the gripping ring 1066 on this cover plate 1065, and is fixed on this chamber lid 16 by a screw 1068, accompanies O shape ring 1062 therebetween.What should be noted is, this gas delivery assembly 1050 is suitable in this embodiment being still on the position in this chamber 100 and with any known method and is sealed to isolate with ambient atmosphere.
In when operation, these threaded strut members 1020 are inserted in these tubular baffle 1063, pass hole 1030, and engage with each box thread 1040 on the scatterer 20.These threaded strut members 1020 are rotated in order to adjust the horizontal profile of this scatterer 20.In this embodiment, the vertical movement of the central area of this scatterer 20 is subjected to the restriction of this backboard 28, and this backboard is designed to come to such as gravity, and vacuum and heat provide higher tolerance etc. strength.Backboard 28 is understood flexing for these strength, but does not reach the degree that scatterer 20 can experience as yet.In this way, scatterer 20 can show one by the distortion that above-mentioned these strength caused, but this distortion can be absorbed effectively by this backboard 28.The strength parameter also can be predetermined and any known distortion on this backboard 28 and scatterer 20 all can offset by the adjustment of these threaded strut members 1020.Scatterer 20 is adjustable to allow the distortion of part, but when these threaded strut members 1020 arrive a mechanical limit, as with a stop part (being a packing ring 1052 in this example) when contact, this distortion meeting of being allowed is stopped at a point of being scheduled to.These threaded strut members 1020 are connected between this scatterer 20 and this backboard 28.This backboard 28 is thicker than this scatterer 20 on section, thereby an immobilized point of suppon is provided.Because relative thickness and the relation of perforation is arranged on diffuser plate, this scatterer 20 is with respect to being that flexibility is more arranged for this backboard 28, and adjustment of profile of this scatterer 20 can be reached by the length of adjusting these threaded strut members 1020 for this.
In another form, at least one adjustment part 1032 as a distance piece, can be used to keep a static distance between this scatterer 20 and this backboard 28, uses these threaded strut members 1020 that adjustment part 1032 is fixed on the position thus.In this embodiment, scatterer 20 is manufactured shows a horizontal profile of wanting by the thickness that changes this at least one adjustment part 1032.This at least one adjustment part 1032 can be thicker, in order to forming the horizontal profile of a convex surface when mounted at the middle body of this scatterer 20, or can be thinner in order to form the profile of a concave surface.These threaded strut members 1020 can be threaded in the box thread 1040 then in order to adjustment part 1030 is locked on the address.Though have only an adjustment part 1030 to be illustrated, the present invention is not limited thereto, and number and any amount of adjustment part 1030 all can be used, for example, each threaded strut member 1020 all has an adjustment part and connects thereon.When having used adjustment part 1030, the vertical movement during strength such as scatterer 20 response heat, pressure and gravity is limited to any motion of this backboard 28.
Figure 13 is for being used for supporting a gas distribution grid, and it is another embodiment of the strut member of a pivot support 1300 in this embodiment.This pivot support 1300 can use separately or can use with diffuser gravity support 15.This pivot support 1300 is placed on these gravity support 15 peripheries and is connected to this scatterer 20 and this backboard 28.This pivot support 1300 comprises a goalpost bolt (ball stud) 1302, and its goalpost bolt shell 1304 that is suitable for being connected on this scatterer 20 with one is connected, and a head lamp brush guard pivot spare 1306, and it is connected to this backboard 28.This goalpost bolt 1302 is an elongated member, and it is connected to an end of pivot member 1308 and has a threaded portion 1310 in end opposite.This goalpost bolt 1302 can be processed into this time pivot member 1308 are same members, maybe can be one to be threaded into or to be connected to the bolt or the bar of this time pivot member 1308.This head lamp brush guard pivot spare 1306 is suitable for engaging with a supporting seat 1322 that is formed on the upper surface of this backboard 28.One sealing block 1324 is suitable for being connected to the upper surface of this backboard 28, is used for covering the top of this head lamp brush guard pivot spare 1306 and the seal inside in this chamber is got up and ambient atmosphere is isolated.The upper surface that one tea cup with a cover 1326 is connected to this backboard 28 is in order to the part that covers this pivot support 1300 and expose and the further inside in this chamber of sealing.In order to hold this pivot support 1300, this backboard 28 has one and is positioned at first hole 1328 under this supporting seat 1322 and a hole that enlarges 1330 it constitutes and allows this goalpost bolt 1302 and goalpost bolt shell 1304 that a uncrossed motion is arranged.
This time pivot member 1308 be generally a spherical solid member and this head lamp brush guard pivot spare 1306 in shape also for spherical, it has a medium pore in order to hold this goalpost bolt 1302.This time pivot member 1308 and this head lamp brush guard pivot spare 1306 all are that to have a material of minimum reactive physical strength for the process chemistry thing made by showing.This goalpost bolt 1302 can be with making this goalpost bolt 1302 with this time pivot member 1308 and this head lamp brush guard pivot spare 1306 identical materials, and the material of this time pivot member 1308 and this head lamp brush guard pivot spare 1306 comprises stainless steel, or aluminium, or their combination.If the longilineal part of this goalpost bolt 1302 is to be shown with the process chemistry thing by meeting to have some reactive materials to make, 1332 of tubulose shields made of aluminum can be connected to this goalpost bolt 1302.
This time pivot member 1308 is suitable for being connected to this goalpost bolt shell 1304 and this goalpost bolt shell 1304 and is suitable for seeing through a connection mechanism and being connected to this scatterer 20.This goalpost bolt shell 1304 has a base 1314 that is connected to a shell 1316, in order to cover this time pivot member 1308.Coupling connecting piece 60 shown in the design of this connection mechanism 1312 and function and Fig. 5 and the 6B-6C is similar in this embodiment, does not exist together only to be that its size is reduced.This shell 1316 has several male connectors 1318, its optionally be formed on this scatterer 20 on the groove (not shown) engage.Scatterer 20 has an inflatable chamber 1323, and it can make things convenient for process gas to flow to processing procedure district 80 from big inflatable chamber 21 by the some apertures 22 that are formed under this pivot support 1300.
Figure 14 is the detailed partial graph that is connected to the scatterer 20 of this pivot support 1300.Before being connected to this scatterer 20 as shown in figure, operator can be assembled in this goalpost bolt shell 1304 away from this backboard 28 and scatterer 20 places.For the ease of assembling, scatterer 20 and backboard 28 can be removed from the chamber and be placed assemble.This goalpost bolt 1302 can be inserted into by the longilineal part with this goalpost bolt 1302 in the conical perforate 1408 that is formed on this shell 1316 and be connected to this shell 1316.In order to want to cover this time pivot member 1308, this base 1314 is by the slotting passage 1404 that is formed on the lower surface of this shell 1316 that passes.The connecting piece 1402 that this base 1314 and this shell 1316 constitute by a screw-type engages.This shell 1316 can have box thread and this base 1314 has male thread.This passage 1404 be made to can allow this base 1314 by and can allow the size of threaded engagement.This base 1314 can suitably be rotated till the top and one of this base is formed on shoulder 1406 on this shell 1316 and contacts.Each all has seat shell 1316 and this base 1314 internal surface it is made to the shape that can cover and this time pivot member 1308 can be installed, and can make things convenient for the pivot of this goalpost bolt 1302 to move simultaneously.
When this shoulder 1406 was touched by this base 1314, a pin 1410 can be used to prevent that this base from retreating from this shoulder 1406.When all goalpost bolts 1302 all were connected to goalpost bolt shell 1304, each goalpost bolt shell 1304 all can be inserted in the groove that is formed on this scatterer 20, and these grooves are suitable for engaging with public connecting piece 1318.This goalpost bolt shell 1304 is rotated 45 degree and can be fixed by a flat head screw 1412 that is inserted in the pipeline 1414 that is formed on this shell 1316.This pipeline 1414 have a bottom its have screw thread and with this flat head screw 1412 on screw thread interlock mutually.This flat head screw 1412 is suitably rotated in order to contact with a shoulder that is formed on this pipeline 1414.This flat head screw 1412 constitutes the recess 1416 that the threaded portion that extends beyond this pipeline 1414 and this extension and be formed on this scatterer 20 and engages, with using the further rotation that prevents this goalpost bolt shell 1304.When all goalpost bolt shells 1304 have been connected to this scatterer 20 and during by flat head screw 1412 locking, scatterer 20 can be handled upside down further to assemble and this goalpost bolt shell 1304 still is held perfect.
Figure 15 is the detailed partial graph that is connected to the pivot support 1300 of this backboard 28.Include in it has been installed after the goalpost bolt shell 1304 of goalpost bolt 1302, scatterer 20 can be incorporated on this backboard 28.In this example, the scatterer 20 that this backboard 28 is placed on the outside in this chamber in the mode of putting upside down and is connected with one or more goalpost bolts 1302 on it is placed on this backboard 28 tops in the mode of putting upside down.Allow this scatterer 20 be arranged in to concede points on this position the threaded portion 1310 of column bolt 1302 can dangle and allow operator goalpost bolt 1302 can be inserted into the hole 1330 and first hole 1328 of this expansion downwards, be regardless of 1310 up to this screw thread and expose, and projection is passed till the supporting seat 1322 that is formed on this backboard 28.This head lamp brush guard pivot spare 1306 can be mounted by this medium pore 1320 is passed in these threaded portion 1310 guidings then.When this threaded portion 1310 protrudes out when passing this medium pore 1320, a nut 1516 can be connected on this threaded portion 1310, in order to this head lamp brush guard pivot spare 1306 is fixed on this goalpost bolt 1302.In another embodiment, the medium pore 1320 of this head lamp brush guard pivot spare 1306 can comprise that the threaded portion 1310 of box thread and this goalpost bolt 1302 can be connected to this head lamp brush guard pivot spare 1306 by threaded engagement.
In one embodiment, the top 1506 of goalpost bolt 1302 has a diameter and dwindles part 1504.The medium pore 1320 of this head lamp brush guard pivot spare 1306 has a part, it holds this top 1506 and this reduced part 1504 to promote the vertical movement in this medium pore 1320, till this top touches a shoulder district 1508 that is formed on this head lamp brush guard pivot spare 1306.A vertical constraints part that act as this goalpost bolt 1302 in this shoulder district 1508, therefore can the adjustment period between, any vertical movement of this goalpost bolt 1302 of block when this top 1506 touches this shoulder district 1508.This head lamp brush guard pivot spare 1306 also comprises at least one O shape ring 1510, and it is set in the recess that is formed on this head lamp brush guard pivot spare 1306, to prevent that process gas from revealing away and be vacuum-sealed between this goalpost bolt 1302 and this head lamp brush guard pivot spare 1306 in order to form one from this chamber.This pivot support 1300 also comprises O shape ring 1512, and it is set in the recess that is formed on this backboard 28, in order to the loss that prevents process gas with vacuum-sealing between this head lamp brush guard pivot spare 1306 and this backboard 28 is provided.These O shape rings 1510 and 1512 can be made with the material that is fit to, as polymeric material or the rubber material that can bear process conditions.
When these head lamp brush guard pivot spares 1306 are connected on each goalpost bolt 1302 by nut 1516, this scatterer 20 and this backboard 28 can be placed on the position in the mode of right side at last (right-side up), and this scatterer and this backboard 28 adopt this posture in being installed to this chamber the time.At this moment, this diffuser gravity support 15 can be inserted into this supporting seat 51 interior (Fig. 5) and suitably be rotated in order to be connected to this scatterer 20.Perhaps, this scatterer 20 can use a gas delivery assembly 1050 and several screw thread strut members 1020 (Figure 12) can be connected to this scatterer.
This pivot support 1300 also comprises a sealing block 1324, and it has threaded portion 1310 and the nut 1516 that a central opening 1502 is used for accepting this goalpost bolt 1302.Sealing piece 1324 provides a upper support seat 1528 to this head lamp brush guard pivot spare 1306, and it constitutes and can allow this head lamp brush guard pivot spare 1306 move without restriction.This central opening 1502 constitutes this head lamp brush guard pivot spare of tolerable 1306 and 1302 motions of this goalpost bolt, not this nut 1516 or packing ring 1526 contact sealing pieces 1324.Sealing block 1324 comprises at least one O shape ring 1514, and it provides one further to be sealed between this backboard 28 and the ambient atmosphere, and is suitable for as bolt, and being connected to this backboard by several mounting blocks 1524.The sealing piece also has an O shape annular groove 1522 that is formed on the upper surface.
Figure 16 is the detailed partial graph of another embodiment that is connected to the pivot support 1300 of this scatterer 20.This figure shows that a tea cup with a cover 1326 is connected to a upper surface of sealing piece 1324 by several lid bolts 1602.But be connected to the corresponding aperture that is formed on the sealing piece 1324 lid bolt screw-type, or the extensible sealing piece 1324 of passing arrives screw on this backboard, and these several lid bolts 1602 will use the hole pattern that is different from these several mounting blocks 1524 that are used for connecting sealing piece 1524 on this backboard 28 in this example.The lid O shape ring 1604 that one usefulness polymkeric substance or rubber are made can be set in this O shape annular groove 1522, in order to the further sealing of this pivot support 1300 in this chamber to be provided.This tea cup with a cover 1326 also provides a lid area 1606 in order to this threaded portion 1310 and this nut 1516 uncrossed motion to be arranged in the inside of this tea cup with a cover 1326.
Figure 17 A has several pivot supports 1300 to connect the top view of an embodiment of backboard 28 thereon.Several pivot supports 1300 and a diffuser gravity support 15 are connected to this backboard 28 in a central area 1010.One scatterer 20, it is not shown among this figure, typically is placed under this backboard 28.The size that this scatterer 20 has is substantially equal to the size of this backboard 28.Scatterer 20 have a correspondence central area 1010 its constitute any assembly that can allow among this figure and engage with scatterer 20.Though there are eight pivot supports 1300 to be illustrated with symmetric pattern in this embodiment, these pivot supports 1300 on this backboard 28 can be any pattern, number and size.
Figure 17 B is the top view of another embodiment of a backboard 28, and it has the opening 1408 of several pivot supports 1300 and at least one confession one gas delivery system 1050 usefulness.All component all can be positioned at a central area 1010, or constitutes another opening 1408a that holds another gas delivery system 1050a and can be connected to outside this central area 1010 of this backboard.One scatterer 20, it is not shown among this figure, typically is placed under this backboard 28.The size that this scatterer 20 has is substantially equal to the size of this backboard 28.Scatterer 20 have a correspondence central area 1010 its constitute any assembly that can allow among this figure and engage with scatterer 20.If this another gas delivery system 1050a is used, this scatterer will have a corresponding tie point that is formed in it, and it is suitable for holding this another gas delivery system.Though there are eight pivot supports 1300 to be illustrated with symmetric pattern in this embodiment, these pivot supports 1300 on this backboard 28 can be any pattern, number and sizes.
Figure 17 C be one with the top view of another embodiment of backboard 28 like Figure 17 category-B, its is in increased several screw thread strut members 1020 in this central area 1010 different with Figure 17 B.One scatterer 20, it is not shown among this figure, typically is placed under this backboard 28.The size that this scatterer 20 has is substantially equal to the size of this backboard 28.Scatterer 20 have a correspondence central area 1010 its constitute any assembly that can allow among this figure and engage with scatterer 20.Though have 12 screw thread strut members 1020 and eight pivot supports 1300 to be illustrated with symmetric form in this embodiment, these screw thread strut members 1020 on this backboard 28 and pivot support 1300 can be any pattern, number and sizes.On this backboard 28, be provided with an opening 1408 that is used for holding a gas delivery system 1050, in order to the supply process gas to this scatterer 20.In this embodiment, this scatterer will have a corresponding tie point that is formed in it, and it is suitable for holding this gas delivery system 1050.Also showing another gas path 300 among the figure and can being used to provides process gas to this scatterer 20 individually or with opening 1048.
In another embodiment, this pivot support 1300 can be adjusted in the deformation of specific region with this scatterer 20 that can predict sidewise movement that this pivot support 1300 provides and any vertical movement.This embodiment describes the method that several bracing members of a kind of usefulness are supported on a scatterer inside, one chamber.When this scatterer 20 is folded down one section specific height or during at this substrate support 12 (Fig. 1) top one segment distance from the suspension elements 47 of this backboard 28 and non-essential deflection, this diffuser gravity support 15 can be adjusted to a height of being scheduled to with describing and is locked on the position as Fig. 5 and 6A.According between actual between the part under these pivot supports 1300 of this substrate support and scatterer or the distance wanted, these have done adjustment up and down according to the pivot support of describing to be mounted 1300 needs of Figure 14 and 15 by the nut 1516 on the wheel part 1310 that is rotated in this goalpost bolt 1302.Being determined when each part under each pivot support 1300 of scatterer 20 is when being positioned at the distance of being wanted with respect to one of this substrate support 12, and this nut 1516 on each threaded portion 1310 can utilize a jam nut 1518 to be screwed and lock.
Distance between this substrate support and scatterer can use a surveying instrument to set by operator, in order to set and to measure a plurality of zones between this scatterer and this substrate support.When these measurements are done and scatterer height above this substrate support is adjusted to when satisfactory by the nut 1516 of adjusting this diffuser gravity support 15 and being connected to the threaded portion 1310 of this goalpost bolt 1302, nut 1516 can be unscrewed by suitable rotation.This of nut 1,516 one unscrews can cause by the part of 1300 suspensions of each pivot support and reduces, thereby has shortened the distance between the location point that this scatterer and this substrate support are being affected.When this nut 1516 was unscrewed a predetermined extent, this jam nut 1518 can screw this nut 1516 in order to nut 1516 is locked on the position.Nut 1516 unscrew and the decline of scatterer can be autotelic, with allow the part scatterer can expand and shrink.These parts of scatterer are when receiving process conditions, and it can be limited by contacting between this nut 1516 and this head lamp brush guard pivot spare 1306 in the distortion on the downward direction.These pivot supports that the personnel that are operated are adjusted as described above can produce a horizontal profile of this scatterer, and its any point all is positioned at the distance of being wanted with respect to this substrate support during processing procedure.Perhaps this scatterer 20 can be adjusted with relevant with the horizontal profile of this substrate support 12 or irrelevant any other method.
Perhaps, be connected to the unscrewing the reduction and the nut 1516 that can not cause scatterer 20 and will can not touch head lamp brush guard pivot spare 1306 of nut 1516 of threaded portion 1310.When nut 1516 was unscrewed to a predetermined degree, this jam nut 1518 can screw this nut 1516 in order to nut 1516 is locked on the position.This scatterer 20 now can be positioned at nut 1516 unscrew before on the sustained height.Nut 1516 unscrew and the decline of scatterer can be autotelic, with allow the part scatterer can expand and shrink.These parts of scatterer are when receiving process conditions, and it can be allowed up to this nut 1516 with till this head lamp brush guard pivot spare 1306 contacts in the distortion on the downward direction.These pivot supports that the personnel that are operated are adjusted as described above can produce a horizontal profile of this scatterer, and its any point all is positioned at the distance of being wanted with respect to this substrate support during processing procedure.
The method of all above-mentioned adjustment diffuser profile all can be implemented under vacuum condition by covering adjusting any inlet do not used on the horizontal profile of scatterer or outlet, monitors, and adjusts.For example, choke piece 17 (Fig. 1), gas passage 300, or opening 1048 can be sealed and in the embodiment that uses pivot support 1300, sealing block 1324 can be connected to backboard 28.Any perforate that does not use also can be sealed and this chamber can be depressurized to and allow the sagging suitable pressure of scatterer 20 of this backboard 28 or a part for a moment.In one embodiment, operator can use surveying instrument to monitor and adjust scatterer at the height of a plurality of location points with respect to this substrate support.In other embodiments, diffuser profile can use any method of not considering the horizontal profile of substrate support to adjust.Any adjustment all can be by being rotatably connected to the adjustment part of this scatterer, as diffuser gravity support 15, and screw thread strut member 1020, and the nut 1516 on this pivot support 1300 is implemented.
When all adjustment all are done under vacuum or ambient atmosphere, and scatterer shows a horizontal profile of wanting, or at a predetermined horizontal profile when expecting known distortion, each lid covers 16 as tea cup with a cover 1326 and chamber, can be connected to this chamber.The adjustment period between be in the position of easy formation negative pressure in this chamber lid and sealing member can be removed, and get ready for processing procedure in this chamber.
Be used for controlling the section sinuousness of a scatterer or the Apparatus and method for explanation hereinbefore of horizontal profile.This scatterer can be operated in order to presenting planar, convex surface, or a kind of horizontal profile in the profile of concave surface.The horizontal profile of scatterer can be adjusted with respect to a substrate support in this chamber.If substrate support shows the horizontal profile of planar and scatterer shows a similar horizontal profile, it is generally acknowledged the process gas that is provided to this processing procedure district, as silane and hydrogen, it is much bigger to be deposited on the amorphous silicon that the shared ratio of amorphous silicon on the edge of substrate is deposited on the central area of this substrate.In one embodiment, it is concave surface that the horizontal profile that substrate support can show a planar profile and this scatterer will be adjusted to respect to this planar substrate support, in order to produce a processing procedure district under a central area of this scatterer, this can make more process gas be introduced into the top of this substrate.It is generally accepted that this processing procedure district with more process gas can promote on large-area substrates the more deposition of uniformity.
Though the above is about embodiments of the invention, other and further embodiment of the present invention can be done not departing under the base region of the present invention, and scope of the present invention is determined by claim.
Claims (24)
1. plasma reinforced chemical vapour deposition apparatus comprises:
One chamber body;
One is arranged on the intrinsic scatterer in this chamber, this scatterer have first surface and with this first surface opposing second surface, this scatterer has several apertures of extending between this first surface and this second surface;
One backboard, this backboard have at least two perforates that penetrate; And
At least one strut member, setting penetrates at least one perforate of this backboard and is coupled to this backboard and this scatterer, this at least one strut member is removable, to regulate the interval between this first surface and this backboard when allowing this scatterer with respect to this backboard horizontal mobile.
2. device as claimed in claim 1 is characterized in that this scatterer comprises the seat of at least one fluting, and the seat of described fluting axially aligns with the perforate separately on this backboard.
3. device as claimed in claim 2 is characterized in that, the seat of this fluting comprises a female coupling seat, in order to receive this at least one strut member.
4. device as claimed in claim 2 is characterized in that, the seat of this fluting comprises threaded portion.
5. device as claimed in claim 2 is characterized in that, the seat of this fluting comprises one or more pivot member.
6. device as claimed in claim 1 is characterized in that, this at least one strut member comprises threaded portion.
7. device as claimed in claim 1 is characterized in that, this at least one strut member comprises one or more pivot member.
8. device as claimed in claim 1, also comprise and be arranged on the intrinsic substrate support in this chamber, this substrate support has the horizontal profile of planar, and this substrate support is provided with respect to this scatterer, and this scatterer has the profile with respect to the concave surface of the profile of substrate support.
9. plasma reinforced chemical vapour deposition apparatus comprises:
One chamber body;
One is arranged on the intrinsic pedestal in this chamber;
One backboard by this chamber body support;
One is arranged on the rectangular plate between this pedestal and this backboard, and this rectangular plate has a four edges and a middle section, and is formed with the perforate that several penetrate;
One strut member is couple at least two of four edges of this rectangular plate, and this strut member allows the expansion and the contraction of this rectangular plate; And
At least one adjustable support member, rotation is couple to the middle section of this rectangular plate.
10. device as claimed in claim 9 is characterized in that, the middle section of this rectangular plate is supported by this backboard.
11. device as claimed in claim 10 is characterized in that, this middle section by the rotation this at least one strut member be adjustable to a horizontal profile, this horizontal profile be plane, concave surface or convex surface at least one of them.
12. device as claimed in claim 10 is characterized in that, this middle section is adjustable to a horizontal profile, and this horizontal profile is parallel to the horizontal profile of this pedestal.
13. device as claimed in claim 10 is characterized in that, the horizontal profile of this rectangular plate is a concave surface, and the horizontal profile of this pedestal is a planar.
14. device as claimed in claim 9 also comprises:
Several are coupled to the strut member of this middle section, and wherein one of them of these several strut members is coupled to a gas source and in order to carry a process gas to this rectangular plate.
15. device as claimed in claim 9, wherein this rectangular plate comprises the seat of at least one fluting, and the seat of described fluting axially aligns with the perforate separately on this backboard.
16. device as claimed in claim 15 is characterized in that, the seat of this fluting comprises a female coupling seat, in order to receive this at least one strut member.
17. device as claimed in claim 15 is characterized in that, the seat of this fluting comprises threaded portion.
18. device as claimed in claim 15 is characterized in that, the seat of this fluting comprises one or more pivot member.
19. device as claimed in claim 9 is characterized in that, this at least one strut member comprises threaded portion.
20. a gas distribution grid that is used to carry the reaction zone in process gas to a treating chamber comprises:
One rectangular plate is formed with the aperture that several penetrate, and this rectangular plate has a middle section; And
At least one mother who is formed in this middle section is mated mechanism, and this at least one female mechanism of mating comprises several grooves, in order to receive at least one dismountable strut member.
21. gas distribution grid as claimed in claim 20 is characterized in that, this rectangular plate comprises four edges, and this strut member is couple to two in this four edges.
22. gas distribution grid as claimed in claim 21 is characterized in that, this strut member is a deflection, with expansion and the contraction that allows this rectangular plate.
23. gas distribution grid as claimed in claim 20 is characterized in that, this at least one female mechanism of mating comprises screw thread.
24. gas distribution grid as claimed in claim 20 is characterized in that, this at least one female mechanism of mating comprises one or more hinge mechanism.
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US61151204P | 2004-09-20 | 2004-09-20 | |
| US60/611,512 | 2004-09-20 | ||
| US65361705P | 2005-02-16 | 2005-02-16 | |
| US60/653,617 | 2005-02-16 | ||
| US11/188,922 US7429410B2 (en) | 2004-09-20 | 2005-07-25 | Diffuser gravity support |
| US11/188,922 | 2005-07-25 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200510106396.9A Division CN1758826B (en) | 2004-09-20 | 2005-09-19 | Diffuser gravity support and method for depositting a film on a substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101921997A true CN101921997A (en) | 2010-12-22 |
| CN101921997B CN101921997B (en) | 2016-12-14 |
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| CN102586755A (en) * | 2011-01-11 | 2012-07-18 | Snt能源技术有限公司 | Apparatus for chemical vapor deposition |
| CN109295435A (en) * | 2017-07-25 | 2019-02-01 | 汉民科技股份有限公司 | Cavity cover and top plate assembly for semiconductor process and film forming device |
| CN111601910A (en) * | 2018-06-20 | 2020-08-28 | 株式会社爱发科 | Vacuum processing apparatus and support shaft |
| CN112513325A (en) * | 2018-08-31 | 2021-03-16 | 应用材料公司 | Gas diffuser support structure with reduced particle generation |
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| US6772827B2 (en) * | 2000-01-20 | 2004-08-10 | Applied Materials, Inc. | Suspended gas distribution manifold for plasma chamber |
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| US6772827B2 (en) * | 2000-01-20 | 2004-08-10 | Applied Materials, Inc. | Suspended gas distribution manifold for plasma chamber |
| CN1501762A (en) * | 2002-11-14 | 2004-06-02 | 友达光电股份有限公司 | Plasma processing apparatus |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102586755A (en) * | 2011-01-11 | 2012-07-18 | Snt能源技术有限公司 | Apparatus for chemical vapor deposition |
| CN102586755B (en) * | 2011-01-11 | 2015-03-04 | 显示器生产服务株式会社 | Apparatus for chemical vapor deposition |
| CN109295435A (en) * | 2017-07-25 | 2019-02-01 | 汉民科技股份有限公司 | Cavity cover and top plate assembly for semiconductor process and film forming device |
| US10927455B2 (en) | 2017-07-25 | 2021-02-23 | Hermes-Epitek Corporation | Assembly of chamber lid and ceiling for semiconductor processes and film deposition |
| CN111601910A (en) * | 2018-06-20 | 2020-08-28 | 株式会社爱发科 | Vacuum processing apparatus and support shaft |
| CN111601910B (en) * | 2018-06-20 | 2022-11-01 | 株式会社爱发科 | Vacuum processing apparatus and support shaft |
| CN112513325A (en) * | 2018-08-31 | 2021-03-16 | 应用材料公司 | Gas diffuser support structure with reduced particle generation |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20060092886A (en) | 2006-08-23 |
| JP2010013733A (en) | 2010-01-21 |
| KR20100082334A (en) | 2010-07-16 |
| TW200611386A (en) | 2006-04-01 |
| KR101019766B1 (en) | 2011-03-08 |
| CN1758826A (en) | 2006-04-12 |
| JP5105335B2 (en) | 2012-12-26 |
| CN1758826B (en) | 2010-05-05 |
| JP2006121057A (en) | 2006-05-11 |
| JP4662144B2 (en) | 2011-03-30 |
| KR101019845B1 (en) | 2011-03-04 |
| TWI287279B (en) | 2007-09-21 |
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